CN104902688B - A kind of etching solution adding method, apparatus and system - Google Patents
A kind of etching solution adding method, apparatus and system Download PDFInfo
- Publication number
- CN104902688B CN104902688B CN201410077485.4A CN201410077485A CN104902688B CN 104902688 B CN104902688 B CN 104902688B CN 201410077485 A CN201410077485 A CN 201410077485A CN 104902688 B CN104902688 B CN 104902688B
- Authority
- CN
- China
- Prior art keywords
- proportion
- current value
- hydrochloric acid
- oxidant
- desired value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
The present invention is suitable for etching technique field, provides a kind of etching solution adding method, apparatus and system, and this method includes：Obtain proportion current value, hydrochloric acid current value, the oxidant current value in etching solution；Proportion current value is compared with preset proportion desired value, generate the first difference between the two, hydrochloric acid current value is compared with preset hydrochloric acid desired value, generate the second difference between the two, oxidant current value is compared with preset oxidant desired value, generates third difference between the two；Obtain corresponding first adding proportion of the first difference, the second difference, third difference, the second adding proportion, third adding proportion；First adding proportion, the second adding proportion, third adding proportion are multiplied respectively with the preset addition period, generate the first addition time, the second addition time, third addition time；The time is added according to the first addition time, the second addition time, third, adds clear water, hydrochloric acid, oxidant respectively.
Description
Technical field
The invention belongs to etching technique field more particularly to a kind of etching solution adding method, apparatus and systems.
Background technology
On printed circuit board production line, generally use etching solution is etched printed circuit board.At present on the market
Etching solution add-on system generally carries out analysis to etching solution using multiple independent liquid medicine analyzers mutually and sub- liquid adds
Liquid medicine is enabled to keep activity, to meet the quality requirement of board production quotient's automated circuit plate production.
By taking proportion as an example, in general, in etching solution add-on system, according to desired value and proportion output switching regulator is measured
Signal is added, and signal is added by switching regulator, control constant displacement pump adds sub- liquid into etching solution.Due to there was only switching regulator addition
Signal, therefore only on or off two states, such as:Desired value is 1.5, and current value exports addition signal, relay less than 1.5
Device is closed；Current value is opened a way higher than 1.5 no added signals, relay.
Therefore, can not be accurately controlled in etching solution add-on system or can not fine adjustment quantitative pump to the additive amount of liquid medicine,
Its shortcomings that there are following two aspects：
In a first aspect, adding sub- liquid into etching solution, sub- liquid is the liquid for being added to etching solution.Such as clear water is added,
Etching solution can be too fast or changes current value slowly excessively, and the numerical fluctuations of liquid medicine are larger, and etching solution add-on system is to current value
Control accuracy it is relatively low, influence production circuit board quality.
Second aspect, the consumption for adding sub- liquid is larger, causes the waste of sub- liquid, such as adds oxidant, causes to aoxidize
The waste of agent.
Invention content
The embodiment of the present invention is designed to provide a kind of etching solution adding method, it is intended to solve etching solution addition system
Can not be accurately controlled in system or can not fine adjustment quantitative pump to the additive amount of liquid medicine, the numerical fluctuations of liquid medicine are larger, control accuracy
Relatively low, the sub- liquid of addition consumption larger the problem of leading to the quality for the circuit board for influencing to produce and causing the waste of sub- liquid.
The embodiment of the present invention is achieved in that a kind of etching solution adding method, including：
Obtain proportion current value, hydrochloric acid current value, the oxidant current value in etching solution；
The proportion current value is compared with preset proportion desired value, generates the first difference between the two,
The hydrochloric acid current value is compared with preset hydrochloric acid desired value, generates the second difference between the two,
The oxidant current value is compared with preset oxidant desired value, generates third difference between the two；
In the correspondence table pre-established, the first difference, the second difference, third difference corresponding of generation is obtained
One adding proportion, the second adding proportion, third adding proportion；
First adding proportion, the second adding proportion, third adding proportion are multiplied respectively with the preset addition period,
Generate the first addition time, the second addition time, third addition time；
The time is added according to the first of generation the addition time, the second addition time, third, adds clear water, hydrochloric acid, oxygen respectively
Agent；
Wherein, proportion current value is the ratio of the density of the currently detected etching solution of proportion monitor and the density of clear water
Value, hydrochloric acid current value are the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant is current
Value is the numerical value that the voltage value conversion of the currently detected redox reaction of oxidant monitor generates；
Wherein, the correspondence between difference and adding proportion is stored in corresponding table；
Wherein, the oxidant includes but not limited to sodium chlorate, hydrogen peroxide.
The another object of the embodiment of the present invention is to provide a kind of etching solution adding set, including：
First acquisition unit, for obtaining the proportion current value in etching solution, hydrochloric acid current value, oxidant current value；
Comparing unit generates between the two for the proportion current value to compare with preset proportion desired value
The hydrochloric acid current value is compared with preset hydrochloric acid desired value, the second difference between the two is generated, by institute by the first difference
Oxidant current value is stated compared with preset oxidant desired value, generates third difference between the two；
Second acquisition unit, in the correspondence table pre-established, the first difference, the second difference, third for obtaining generation are poor
It is worth corresponding first adding proportion, the second adding proportion, third adding proportion；
Generation unit, by first adding proportion, the second adding proportion, third adding proportion and preset addition period
It is multiplied respectively, generates the first addition time, the second addition time, third addition time；
Adding device adds respectively for adding the time according to the first of generation the addition time, the second addition time, third
Add clear water, hydrochloric acid, oxidant；
Wherein, proportion current value is the ratio of the density of the etching solution of proportion monitor current detection and the density of clear water
Value, hydrochloric acid current value are the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant is current
Value is the numerical value that the voltage value conversion of the currently detected redox reaction of oxidant monitor generates；
Wherein, the correspondence between difference and adding proportion is stored in corresponding table；
Wherein, the oxidant includes but not limited to sodium chlorate, hydrogen peroxide.
The another object of the embodiment of the present invention is to provide a kind of etching solution add-on system, including above-mentioned etching solution
Adding set, a proportion monitor, a hydrochloric acid monitor, an oxidant monitor, the constant displacement pump of an access clear water or solenoid valve,
One loads the constant displacement pump of the constant displacement pump of hydrochloric acid and a loading oxidant, wherein the proportion monitor passes through the etching medicine
Water adding set is connected with the constant displacement pump of access clear water or solenoid valve, and the hydrochloric acid monitor is added by the etching solution and filled
It sets and is connected with the constant displacement pump for loading hydrochloric acid, the oxidant monitor passes through the etching solution adding set and loading oxidant
Constant displacement pump be connected.
When in embodiments of the present invention, by being added according to the first of generation the addition time, the second addition time, third
Between, clear water, hydrochloric acid, oxidant are added respectively, so that etching solution add-on system can control additive amount of the constant displacement pump to liquid medicine,
The numerical fluctuations that solve liquid medicine are larger, control accuracy is relatively low, the larger circuit for causing to influence to produce of the consumption of the sub- liquid of addition
The quality of plate and the problem of cause the waste of sub- liquid, effectively controls liquid medicine etch capabilities, reduces fluctuation, enable the circuit of production
The quality of plate keeps highly stable, while reducing the usage amount for adding sub- liquid, reduces operating cost.
Description of the drawings
Fig. 1 is the implementation flow chart of etching solution adding method provided in an embodiment of the present invention；
Fig. 2 is the structure diagram of etching solution adding set provided in an embodiment of the present invention.
Specific implementation mode
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.
Fig. 1 is a kind of implementation flow chart of etching solution adding method provided in an embodiment of the present invention, and details are as follows：
In step S101, proportion current value, hydrochloric acid current value, the oxidant current value in etching solution are obtained；
Wherein, in etching solution add-on system control panel main program, pass through the proportion monitor in processing solution tank, detection erosion
The ratio of the density of liquid medicine and the density of clear water is carved, the proportion in etching solution is obtained.
By hydrochloric acid monitor, the numerical value of the current value conversion generation of the conductivity detected obtains hydrochloric acid current value.
By oxidant monitor, the number that the voltage value conversion of currently detected redox reaction generates is detected
Value obtains oxidant current value.
Wherein, proportion current value is the ratio of the density of the currently detected etching solution of proportion monitor and the density of clear water
Value, hydrochloric acid current value are the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant is current
Value is the numerical value that the voltage value conversion of the currently detected redox reaction of oxidant monitor generates；
Wherein, processing solution tank loads etching solution.
In step s 102, the proportion current value is compared with preset proportion desired value, is generated between the two
The hydrochloric acid current value is compared with preset hydrochloric acid desired value, the second difference between the two is generated, by institute by the first difference
Oxidant current value is stated compared with preset oxidant desired value, generates third difference between the two；
Wherein, proportion desired value, hydrochloric acid desired value, oxidant desired value are preset threshold value, can be that user sets certainly,
It can be system default.
In step s 103, in the correspondence table pre-established, the first difference, the second difference, third for obtaining generation are poor
It is worth corresponding first adding proportion, the second adding proportion, third adding proportion；
Wherein, the correspondence between difference and adding proportion is stored in corresponding table.
In step S104, by first adding proportion, the second adding proportion, third adding proportion and preset addition
Period is multiplied respectively, generates the first addition time, the second addition time, third addition time；
Wherein, the addition period can be understood as the pulse period.
Wherein, the first adding proportion, the second adding proportion, third adding proportion can be understood as duration of pulse with
The ratio of pulse period, that is, duty ratio.
Wherein, the first addition time, the second addition time, third addition time can be understood as duration of pulse.
In step S105, the time is added according to the first of generation the addition time, the second addition time, third, is added respectively
Add clear water, hydrochloric acid, oxidant；
Wherein, clear water is added according to the first of generation the addition time, hydrochloric acid, root is added according to the second of generation the addition time
Oxidant is added according to the third addition time of generation.
Wherein, proportion current value is the ratio of the density of the currently detected etching solution of proportion monitor and the density of clear water
Value, hydrochloric acid current value are the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant is current
Value is the numerical value that the voltage value conversion of the currently detected redox reaction of oxidant monitor generates.
Wherein, oxidant includes but not limited to sodium chlorate, hydrogen peroxide.
In the present embodiment, the time is added according to the first of generation the addition time, the second addition time, third, added respectively
Add clear water, hydrochloric acid, oxidant, advantage as follows:
1, liquid medicine etch capabilities can be effectively controlled, fluctuation is reduced, order does plate quality and keeps highly stable.
2, the usage amount for adding sub- liquid is reduced, operating cost is reduced.
3, the mistake addition being led to due to unit exception and/or faulty operation can be prevented.
4, the high-speed production of support circuits plate.
As a preferred embodiment of the present invention, a unified interface is set in control panel, using unified number
According to format respectively with proportion monitor, hydrochloric acid monitor, oxidant monitor communicated, so as to avoid proportion monitor,
The case where hydrochloric acid monitor, oxidant monitor is required to a controller, while avoiding due to type and brand disunity,
External form, probe are inconsistent, and sampling box need to be specifically designed the case where could integrating so that a control panel can control three and quantify
Pump three seed liquors of addition.
As a preferred embodiment of the present invention, the proportion desired value includes that different production lines is not corresponding year-on-year
Weight at least one of desired value and the corresponding different specific weight desired value of different formulations, the hydrochloric acid desired value include different life
At least one of the corresponding different hydrochloric acid desired values of producing line and the corresponding different hydrochloric acid desired values of different formulations, the oxidant
Desired value includes the corresponding different oxidant desired values of different production lines and the corresponding different oxidant desired values of different formulations
At least one of.
In the present embodiment, since different production line services is different, the different target value that different business needs.It therefore can
First establish production line and the correspondence of desired value so that desired value includes the corresponding different specific weight target of different production lines
The corresponding different hydrochloric acid desired values of value, different production lines, the corresponding different oxidant desired values of different production lines, in order to
It can directly invoke in step s 102.
In the present embodiment, since various boards need different clear water desired values, hydrochloric acid desired value, oxidant target
Value, i.e., different formulas.For example, clear water desired value, salt acid target required for circuit board and ordinary circuit board in accurate device
Value, oxidant desired value are different.Therefore various boards and different target value can first be established（Formula）Correspondence so that mesh
Scale value includes the corresponding clear water desired value of circuit board, hydrochloric acid desired value, oxidant desired value（Formula）, in order to subsequently can basis
Different circuit boards selects the formula of different production, in order to directly invoke in step s 102.
As a preferred embodiment of the present invention, when the proportion desired value includes the corresponding different specific weight of different formulations
When desired value, when the hydrochloric acid desired value includes the corresponding different hydrochloric acid desired value of different formulations, when the oxidant target
Value include different formulations it is corresponding difference oxidant desired value when, it is described respectively by the proportion current value, hydrochloric acid current value, oxygen
Agent current value generates difference between the two compared with preset proportion desired value, hydrochloric acid desired value, oxidant desired value
When, including：
Obtain the formula produced in real time；
The proportion current value is compared with the proportion desired value in the formula, generates the proportion current value and institute
State the first difference being formulated between corresponding proportion desired value；
The hydrochloric acid current value is compared with the hydrochloric acid desired value in the formula, generates the hydrochloric acid current value and institute
State the second difference being formulated between corresponding hydrochloric acid desired value；
The oxidant current value is compared with the oxidant desired value in the formula, it is current to generate the oxidant
Third difference between value oxidant desired value corresponding with the formula.
As a preferred embodiment of the present invention, which is characterized in that according to the first of generation the addition time, the second addition
Time, third add the time, add clear water, hydrochloric acid, oxidant respectively, specially：
According to the first of generation the addition time, the pwm pulse of control output to the first constant displacement pump, the control addition period is inscribed
First constant displacement pump for entering clear water is opened or the solenoid valve of access clear water is opened in the control addition period, described clear to add
Water；
Wherein, the first addition time was the duration of pulse.
According to the first addition time, the pwm pulse of control output to the first constant displacement pump, so that the first constant displacement pump receives
It is opened after pwm pulse, clear water is added according to pwm pulse duration.
Wherein, the solenoid valve of access clear water is opened in the control addition period, directly connects clear water water inlet.
According to the second of generation the addition time, the pwm pulse of control output to the second constant displacement pump, the control addition period is built-in
Second constant displacement pump for carrying hydrochloric acid is opened, to add the hydrochloric acid；
Wherein, the second addition time was the duration of pwm pulse.
According to the second addition time, the pwm pulse of control output to the second constant displacement pump, so that the second constant displacement pump receives
It is opened after pwm pulse, hydrochloric acid is added according to pwm pulse duration.
It is added the time according to the third of generation, the pwm pulse of control output to third constant displacement pump, the control addition period is built-in
The third constant displacement pump of oxygen carrier agent is opened, to add the oxidant.
Wherein, the third addition time is the duration of pwm pulse.
It is added the time according to third, the pwm pulse of control output to third constant displacement pump, so that third constant displacement pump receives
It is opened after pwm pulse, oxidant is added according to pwm pulse duration.
Wherein, oxidant includes but not limited to sodium chlorate, hydrogen peroxide.
Wherein, pulse can be existing any one pulse, such as square-wave pulse, rectangular pulse, sharp pulse etc..
With PWM (English：Pulse Width Modulation, Chinese：Pulse width modulation) for, increase it and adds ratio
The addition effective time in example, that is, fixed cycle（The duration of pulse）So that the time of the sub- liquid of addition of constant displacement pump
Increase, correspondingly, the additive amount of sub- liquid also increases.
For example, 60 seconds constant displacement pumps that can export 0.6L, it is 10% to adjust adding proportion, and the addition time is 6 seconds, and 6 seconds are pulse
Duration, constant displacement pump can just open after receiving pulse, therefore the sub- liquid of 60 seconds output 0.06L of constant displacement pump, so as to
Control additive amount of the constant displacement pump to sub- liquid.
As a preferred embodiment of the present invention, further include：
In real time detection environmental information, the environmental information include outage information, termination of pumping information, production information, enter plate information,
One kind or combinations thereof in sensor information, temperature information；
Judge whether the environmental information meets default environmental abnormality condition, the environmental abnormality condition includes that shutdown is different
Often, termination of pumping is abnormal, stop production exception, lacks one kind or combinations thereof in plate exception, sensor abnormality, temperature anomaly；
If so, stopping adding sub- liquid, and export alarm signal.
In embodiments of the present invention, etching solution add-on system connects multiple sensors, is examined in real time by multiple sensors
Environmental information is surveyed, the environmental information includes outage information, termination of pumping information, production information, enters plate information, sensor information, temperature
Spend one kind or combinations thereof in information.
The operation conditions of unit is analyzed.For outage information, termination of pumping information, production information, enter plate information, sensing
Device information, temperature information etc. synchronize monitoring.
After comprehensive analysis environment above data, judge whether environmental information meets default environmental abnormality condition, environmental abnormality
Condition include shut down abnormal, termination of pumping is abnormal, it is abnormal to stop production, lack plate exception, sensor abnormality, one kind in temperature anomaly or
A combination thereof,
If so, stopping adding sub- liquid, and alarm signal is exported, and is shown on the touch screen interface of etching solution add-on system
Show alarm information, allow a user to quick process problem, to effectively prevent (such as temperature when liquid medicine or unit occur abnormal
Target zone is not reached), it causes accidentally to add enabling system out of hand, influences the quality of the circuit board of production, cause user time
And pecuniary loss problem, the normal production for ensuring that the validity of system, ensure that circuit board.
Fig. 2 is a kind of structure diagram of etching solution adding set provided in an embodiment of the present invention, for convenience of description, only
Show part related to the present embodiment.
Reference Fig. 2, the etching solution adding set, including：
First acquisition unit, for obtaining the proportion current value in etching solution, hydrochloric acid current value, oxidant current value；
Comparing unit generates between the two for the proportion current value to compare with preset proportion desired value
The hydrochloric acid current value is compared with preset hydrochloric acid desired value, the second difference between the two is generated, by institute by the first difference
Oxidant current value is stated compared with preset oxidant desired value, generates third difference between the two；
Second acquisition unit, in the correspondence table pre-established, obtaining the first difference of generation, the second difference,
Corresponding first adding proportion of three differences, the second adding proportion, third adding proportion；
Generation unit is used for first adding proportion, the second adding proportion, third adding proportion and preset addition
Period is multiplied respectively, generates the first addition time, the second addition time, third addition time；
Adding device adds respectively for adding the time according to the first of generation the addition time, the second addition time, third
Add clear water, hydrochloric acid, oxidant；
Wherein, proportion current value is the ratio of the density of the etching solution of proportion monitor current detection and the density of clear water
Value, hydrochloric acid current value are the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant is current
Value is the numerical value that the voltage value conversion of the currently detected redox reaction of oxidant monitor generates；
Wherein, the correspondence between difference and adding proportion is stored in corresponding table；
Wherein, the oxidant includes but not limited to sodium chlorate, hydrogen peroxide.
Further, in the apparatus, the proportion desired value includes the corresponding different specific weight target of different production lines
At least one of corresponding with different formulations different specific weight desired value of value, the hydrochloric acid desired value include different production line pair
At least one of corresponding different hydrochloric acid desired values of different hydrochloric acid desired values and different formulations answered, the oxidant desired value
Including in the corresponding different oxidant desired values of different production lines and the corresponding different oxidant desired values of different formulations extremely
Few one kind.
Further, in the apparatus, the comparing unit further includes：
First obtains subelement, for obtaining the formula produced in real time；
First comparing subunit, it is raw for the proportion current value to compare with the proportion desired value in the formula
At the first difference between proportion current value proportion desired value corresponding with the formula；
Second comparing subunit, it is raw for the hydrochloric acid current value to compare with the hydrochloric acid desired value in the formula
At the second difference between hydrochloric acid current value hydrochloric acid desired value corresponding with the formula；
Third comparing subunit, for by the oxidant current value compared with the oxidant desired value in the formula
Compared with generating the third difference between oxidant current value oxidant desired value corresponding with the formula.
Further, in the apparatus, the adding device, including：
First adding device, for according to the first of generation the addition time, the PWM arteries and veins of control output to the first constant displacement pump
The solenoid valve of clear water is opened or accessed in the control addition period to punching, first constant displacement pump that clear water is accessed in the control addition period
It opens, to add the clear water；
Second adding device, for according to the second of generation the addition time, the PWM arteries and veins of control output to the second constant displacement pump
Punching, second constant displacement pump that hydrochloric acid is loaded in the control addition period is opened, to add the hydrochloric acid；
Third adding device, for being added the time according to the third of generation, the PWM arteries and veins of control output to third constant displacement pump
The third constant displacement pump of punching, control addition period built-in oxygen carrier agent is opened, to add the oxidant.
Further, in the apparatus, further include：
Detection unit, for detecting environmental information in real time, the environmental information includes outage information, termination of pumping information, production
Information enters one kind or combinations thereof in plate information, sensor information, temperature information；
Judging unit, for judging whether the environmental information meets default environmental abnormality condition, the environmental abnormality item
Part include shut down abnormal, termination of pumping is abnormal, it is abnormal to stop production, lack plate exception, sensor abnormality, one kind in temperature anomaly or its
Combination；
Stop unit is used for if so, stopping adding sub- liquid；
Output unit is used for if so, output alarm signal.
The present invention provides a kind of etching solution add-on system, including the monitoring of above-mentioned etching solution adding set, a proportion
Device, a hydrochloric acid monitor, an oxidant monitor, one access clear water constant displacement pump or solenoid valve, one load hydrochloric acid constant displacement pump,
And one load oxidant constant displacement pump, wherein the proportion monitor is clear by the etching solution adding set and access
The constant displacement pump or solenoid valve of water are connected, and the hydrochloric acid monitor is quantified by the etching solution adding set and loading hydrochloric acid
Pump is connected, and the oxidant monitor is connected by the etching solution adding set with the constant displacement pump for loading oxidant.
Device provided in an embodiment of the present invention can be applied in aforementioned corresponding embodiment of the method, and details are referring to above-mentioned reality
The description of example is applied, details are not described herein.
Through the above description of the embodiments, it is apparent to those skilled in the art that the present invention can borrow
Help software that the mode of required common hardware is added to realize, naturally it is also possible to which by hardware, but the former is more preferably in many cases
Embodiment.Based on this understanding, the portion that technical scheme of the present invention substantially in other words contributes to the prior art
Dividing can be expressed in the form of software products, which is stored in the storage medium that can be read, and such as count
The floppy disk of calculation machine, hard disk or CD etc., including some instructions are used so that a computer equipment（Can be PLC, individual calculus
Machine, server or network equipment etc.）Execute the method described in each embodiment of the present invention.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, all answer by the change or replacement that can be readily occurred in
It is included within the scope of the present invention.Therefore, protection scope of the present invention should be subject to the protection scope in claims.
Claims (10)
1. a kind of etching solution adding method, which is characterized in that including：
Obtain proportion current value, hydrochloric acid current value, the oxidant current value in etching solution, wherein the proportion current value, salt
Sour current value, oxidant current value are obtained by same interface；
The proportion current value is compared with preset proportion desired value, generates the first difference between the two,
The hydrochloric acid current value is compared with preset hydrochloric acid desired value, generates the second difference between the two,
The oxidant current value is compared with preset oxidant desired value, generates third difference between the two；
In the correspondence table pre-established, the first difference, the second difference, third difference corresponding first for obtaining generation adds
Add ratio, the second adding proportion, third adding proportion；
First adding proportion, the second adding proportion, third adding proportion are multiplied respectively with the preset addition period, generated
First addition time, the second addition time, third add the time；
The time is added according to the first of generation the addition time, the second addition time, third, adds clear water, hydrochloric acid, oxidation respectively
Agent；
Wherein, proportion current value is the ratio of the density of the currently detected etching solution of proportion monitor and the density of clear water,
Hydrochloric acid current value is the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant current value is
The numerical value that the voltage value conversion of the currently detected redox reaction of oxidant monitor generates；
Wherein, the correspondence between difference and adding proportion is stored in corresponding table；
Wherein, the oxidant includes sodium chlorate or hydrogen peroxide.
2. according to the method described in claim 1, it is characterized in that, the proportion desired value includes that different production lines is corresponding
At least one of different specific weight desired value and the corresponding different specific weight desired value of different formulations, the hydrochloric acid desired value include not
At least one of the corresponding different hydrochloric acid desired values of same production line and the corresponding different hydrochloric acid desired values of different formulations, it is described
Oxidant desired value includes the corresponding different oxidant desired values of different production lines and the corresponding different oxidants of different formulations
At least one of desired value.
3. according to the method described in claim 2, it is characterized in that, when the proportion desired value includes that different formulations are corresponding not
When with proportion desired value, when the hydrochloric acid desired value includes the corresponding different hydrochloric acid desired value of different formulations, when the oxidation
When agent desired value includes different formulations corresponding different oxidant desired value, respectively by the proportion current value, hydrochloric acid current value,
Oxidant current value generates difference between the two compared with preset proportion desired value, hydrochloric acid desired value, oxidant desired value
When value, including：
Obtain the formula produced in real time；
The proportion current value is compared with the proportion desired value in the formula, the proportion current value is generated and matches with described
The first difference between the corresponding proportion desired value in side；
The hydrochloric acid current value is compared with the hydrochloric acid desired value in the formula, the hydrochloric acid current value is generated and matches with described
The second difference between the corresponding hydrochloric acid desired value in side；
The oxidant current value is compared with the oxidant desired value in the formula, generate the oxidant current value with
The third difference being formulated between corresponding oxidant desired value.
4. according to the method described in claim 1, it is characterized in that, according to the first of generation addition the time, second addition the time,
Third adds the time, adds clear water, hydrochloric acid, oxidant respectively, specially：
According to the first of generation the addition time, the pwm pulse of control output to the first constant displacement pump, access is clear in the control addition period
First constant displacement pump of water is opened or the solenoid valve of access clear water is opened in the control addition period, to add the clear water；
According to the second of generation the addition time, the pwm pulse of control output to the second constant displacement pump, control loads salt in the addition period
Second constant displacement pump of acid is opened, to add the hydrochloric acid；
It is added the time according to the third of generation, the pwm pulse of control output to third constant displacement pump, control addition period built-in oxygen carrier
The third constant displacement pump of agent is opened, to add the oxidant.
5. according to the method described in claim 1, it is characterized in that, further including：
Detection environmental information in real time, the environmental information include outage information, termination of pumping information, production information, enter plate information, sensing
One kind or combinations thereof in device information, temperature information；
Judge whether the environmental information meets default environmental abnormality condition, the environmental abnormality condition includes shutting down exception, stopping
Pump is abnormal, stop production exception, lacks one kind or combinations thereof in plate exception, sensor abnormality, temperature anomaly；
If so, stopping adding sub- liquid, and export alarm signal.
6. a kind of etching solution adding set, which is characterized in that including：
First acquisition unit, for obtaining the proportion current value in etching solution, hydrochloric acid current value, oxidant current value, wherein
The proportion current value, hydrochloric acid current value, oxidant current value are obtained by same interface；
Comparing unit generates first between the two for the proportion current value to compare with preset proportion desired value
The hydrochloric acid current value is compared with preset hydrochloric acid desired value, the second difference between the two is generated, by the oxygen by difference
Agent current value generates third difference between the two compared with preset oxidant desired value；
Second acquisition unit obtains the first difference, the second difference, third difference point of generation in the correspondence table pre-established
Not corresponding first adding proportion, the second adding proportion, third adding proportion；
Generation unit distinguishes first adding proportion, the second adding proportion, third adding proportion and preset addition period
It is multiplied, generates the first addition time, the second addition time, third addition time；
Adding device, for adding the time according to the first of generation the addition time, the second addition time, third, addition is clear respectively
Water, hydrochloric acid, oxidant；
Wherein, proportion current value is the ratio of the density of the etching solution of proportion monitor current detection and the density of clear water, salt
Sour current value is the numerical value that the current value conversion of the currently detected conductivity of hydrochloric acid monitor generates, and oxidant current value is oxygen
The numerical value that the voltage value conversion of the currently detected redox reaction of agent monitor generates；
Wherein, the correspondence between difference and adding proportion is stored in corresponding table；
Wherein, the oxidant includes sodium chlorate or hydrogen peroxide.
7. device according to claim 6, which is characterized in that the comparing unit further includes：
First obtains subelement, for obtaining the formula produced in real time；
First comparing subunit generates institute for the proportion current value to compare with the proportion desired value in the formula
State the first difference between proportion current value proportion desired value corresponding with the formula；
Second comparing subunit generates institute for the hydrochloric acid current value to compare with the hydrochloric acid desired value in the formula
State the second difference between hydrochloric acid current value hydrochloric acid desired value corresponding with the formula；
Third comparing subunit, it is raw for the oxidant current value to compare with the oxidant desired value in the formula
At the third difference between oxidant current value oxidant desired value corresponding with the formula.
8. device according to claim 6, which is characterized in that the adding device, including：
First adding device, for according to the first of generation the addition time, the pwm pulse of control output to the first constant displacement pump, control
First constant displacement pump of access clear water is opened in the system addition period or the solenoid valve of access clear water is opened in the control addition period,
To add the clear water；
Second adding device, for according to the second of generation the addition time, the pwm pulse of control output to the second constant displacement pump, control
Second constant displacement pump that hydrochloric acid is loaded in the system addition period is opened, to add the hydrochloric acid；
Third adding device, for being added the time according to the third of generation, the pwm pulse of control output to third constant displacement pump, control
The third constant displacement pump of system addition period built-in oxygen carrier agent is opened, to add the oxidant.
9. device according to claim 6, which is characterized in that further include：
Detection unit, in real time detect environmental information, the environmental information include outage information, termination of pumping information, production information,
Enter one kind or combinations thereof in plate information, sensor information, temperature information；
Judging unit, for judging whether the environmental information meets default environmental abnormality condition, the environmental abnormality condition packet
It includes shutdown exception, termination of pumping exception, stop abnormal, the scarce plate exception of production, sensor abnormality, one kind in temperature anomaly or its group
It closes；
Stop unit is used for if so, stopping adding sub- liquid；
Output unit is used for if so, output alarm signal.
10. a kind of etching solution add-on system, which is characterized in that including the etching solution described in claim 6 to 9 any one
Adding set, a proportion monitor, a hydrochloric acid monitor, an oxidant monitor, the constant displacement pump of an access clear water or solenoid valve,
One loads the constant displacement pump of the constant displacement pump of hydrochloric acid and a loading oxidant, wherein the proportion monitor passes through the etching medicine
Water adding set is connected with the constant displacement pump of access clear water or solenoid valve, and the hydrochloric acid monitor is added by the etching solution and filled
It sets and is connected with the constant displacement pump for loading hydrochloric acid, the oxidant monitor passes through the etching solution adding set and loading oxidant
Constant displacement pump be connected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410077485.4A CN104902688B (en) | 2014-03-04 | 2014-03-04 | A kind of etching solution adding method, apparatus and system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410077485.4A CN104902688B (en) | 2014-03-04 | 2014-03-04 | A kind of etching solution adding method, apparatus and system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104902688A CN104902688A (en) | 2015-09-09 |
| CN104902688B true CN104902688B (en) | 2018-09-07 |
Family
ID=54034991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410077485.4A Active CN104902688B (en) | 2014-03-04 | 2014-03-04 | A kind of etching solution adding method, apparatus and system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104902688B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107522317A (en) * | 2017-09-15 | 2017-12-29 | 佛山市澳霆环境设备制造有限公司 | A kind of multi-functional swimming pool water treatment system |
| CN115019492A (en) * | 2022-05-30 | 2022-09-06 | 惠州市特创电子科技股份有限公司 | Liquid medicine feeding early warning method and device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1310776A2 (en) * | 2001-11-13 | 2003-05-14 | Andreas Kreindl | Monitoring system for vehicle tanks |
| CN101004598A (en) * | 2006-01-17 | 2007-07-25 | 奇奕国际股份有限公司 | Automated etching control system, equipment, and method |
| CN101170063A (en) * | 2006-10-26 | 2008-04-30 | 株式会社平间理化研究所 | Etching liquid management device |
| CN101200327A (en) * | 2006-12-15 | 2008-06-18 | 上海轻工业研究所有限公司 | Method for adjusting pH value of waste water |
| CN101727023A (en) * | 2008-10-28 | 2010-06-09 | 浩硕科技股份有限公司 | Method for controlling concentration of etching solution |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06216100A (en) * | 1993-01-13 | 1994-08-05 | Matsushita Electric Ind Co Ltd | Method for controlling liquid concentration |
-
2014
- 2014-03-04 CN CN201410077485.4A patent/CN104902688B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1310776A2 (en) * | 2001-11-13 | 2003-05-14 | Andreas Kreindl | Monitoring system for vehicle tanks |
| CN101004598A (en) * | 2006-01-17 | 2007-07-25 | 奇奕国际股份有限公司 | Automated etching control system, equipment, and method |
| CN101170063A (en) * | 2006-10-26 | 2008-04-30 | 株式会社平间理化研究所 | Etching liquid management device |
| CN101200327A (en) * | 2006-12-15 | 2008-06-18 | 上海轻工业研究所有限公司 | Method for adjusting pH value of waste water |
| CN101727023A (en) * | 2008-10-28 | 2010-06-09 | 浩硕科技股份有限公司 | Method for controlling concentration of etching solution |
Non-Patent Citations (2)
| Title |
|---|
| 废蚀刻液研究现状与展望;巨佳，王吉坤;《云南化工》;20091231;第36卷(第6期);全文 * |
| 酸性氯化铜液蚀刻化学及蚀刻液再生方法评述;王红华等;《印制电路信息》;20081010;第2页的第2.1节的第1-2段 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104902688A (en) | 2015-09-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102369493B (en) | Energy monitoring device and control method therefor | |
| CN103542875A (en) | Arrangement and Method for Calibrating at Least Two Sensors in Parallel | |
| EP2827155A1 (en) | Analytical gateway device for measurement devices | |
| CN104902688B (en) | A kind of etching solution adding method, apparatus and system | |
| CN112114652B (en) | Voltage control method and device, electronic equipment and readable storage medium | |
| CN111211937B (en) | Method, device and system for testing stability of server link signals | |
| CN100428183C (en) | Automated etching control system, equipment, and method | |
| CN103257669A (en) | Electronic device and method with overclocking mode | |
| CN117891671A (en) | Medical service terminal supervision method, system, electronic equipment and storage medium | |
| CN113176792A (en) | Device control method, device, storage medium and electronic device | |
| CN102900675A (en) | System for detecting working condition and diagnosing fault of centrifugal pump | |
| JP2007034669A (en) | Power consumption monitoring system, and method and program therefor | |
| CN116878769A (en) | Liquid leakage detection method, device, terminal and medium for liquid cooling system | |
| KR20150069940A (en) | Fuel battery system and detecting method of water content thereof | |
| CN102505933A (en) | Variable range metering device of oil well gas liquid metering separator | |
| CN106507588A (en) | A kind of method of automatic detection unnecessary component in PCB | |
| CN204556557U (en) | Water-quality test with TDS and temperature sensing function is popped one's head in | |
| CN201081742Y (en) | Flow integrating instrument | |
| JP5907926B2 (en) | Monitoring device and program | |
| CN201751859U (en) | Generator parameter on-line detecting system | |
| US9891141B2 (en) | Measuring device of process automation technology | |
| CN104808595B (en) | A kind of etching solution monitoring method and device | |
| JP2578181B2 (en) | Water quality abnormality detection device | |
| CN102913465A (en) | Working condition detection and fault diagnosis method of centrifugal pump | |
| CN102043692B (en) | Method for testing power supply management pause function |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |