JPH06216100A - Method for controlling liquid concentration - Google Patents
Method for controlling liquid concentrationInfo
- Publication number
- JPH06216100A JPH06216100A JP376393A JP376393A JPH06216100A JP H06216100 A JPH06216100 A JP H06216100A JP 376393 A JP376393 A JP 376393A JP 376393 A JP376393 A JP 376393A JP H06216100 A JPH06216100 A JP H06216100A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- liquid concentration
- time
- value
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体や液晶の製造工
程における洗浄やウエットエッチング工程に用いられる
液の濃度コントロール方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for controlling the concentration of a liquid used in a cleaning or wet etching process in a semiconductor or liquid crystal manufacturing process.
【0002】[0002]
【従来の技術】液の濃度コントロール装置は、図5に示
すように基板1を浸漬させて洗浄やエッチングあるいは
染色する液槽2の液濃度を計測するセンサ3、そして原
液4を注入するバルブ5およびセンサ3から出力される
液濃度値によりバルブ5の開閉を制御するコントローラ
6で構成されている。また、液槽2内の液をポンプ7に
より吸引し、フィルタ8にて液中のダストを除去した
後、液槽2に液を戻している。従来、液濃度のコントロ
ールのシーケンスは図6に示すように目標値がセンサ値
より大きい場合、バルブ5を開にして原液を注入し、所
定時間経過後バルブ5を閉にし注入をとめる。そしてセ
ンサのサンプリング時間経過後、再度目標値とセンサ値
の比較を行い両者が一致するまで繰り返し注入を行う。
この方式では、注入量は1種類しかなく、コントロール
時間を短縮させるため、図7に示すように目標値とセン
サ値との差を例えば3種類に区分して、バルブ5の開閉
時間を変化させて3種類の量を注入する方法があり、図
8に示すようにコントロール時間は短縮される。2. Description of the Related Art As shown in FIG. 5, a liquid concentration control device comprises a sensor 3 for measuring the liquid concentration of a liquid tank 2 for immersing a substrate 1 for cleaning, etching or dyeing, and a valve 5 for injecting a stock solution 4. And a controller 6 that controls opening and closing of the valve 5 according to the liquid concentration value output from the sensor 3. Further, the liquid in the liquid tank 2 is sucked by the pump 7, the dust in the liquid is removed by the filter 8, and then the liquid is returned to the liquid tank 2. Conventionally, as shown in FIG. 6, when the target value is larger than the sensor value, the sequence for controlling the liquid concentration is to open the valve 5 to inject the stock solution, and after a predetermined time has elapsed, close the valve 5 to stop the injection. After the sensor sampling time has elapsed, the target value and the sensor value are compared again, and repeated injections are performed until they match.
In this method, there is only one injection amount and the control time is shortened. Therefore, as shown in FIG. 7, the difference between the target value and the sensor value is divided into, for example, three types, and the opening / closing time of the valve 5 is changed. There is a method of injecting three kinds of doses, and the control time is shortened as shown in FIG.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、このよ
うな従来の液濃度コントロール方法では、図9に示すよ
うにセンサのサンプリング時間が液濃度安定時間より小
さい場合は、原液注入終了後でも液濃度値は上昇しつづ
け目標値を越えてしまうことになる。However, in such a conventional liquid concentration control method, when the sampling time of the sensor is shorter than the liquid concentration stabilization time as shown in FIG. Will continue to rise and exceed the target value.
【0004】また、液濃度コントロール装置の製作後、
液濃度安定時間を計測してその値をセンサのサンプリン
グ時間とすれば、目標値を液濃度値は越えてしまうこと
にはならないが、製作後初めてコントロールの時間や精
度といった性能が判明することになり、必要とされる性
能を満足しないおそれが生ずる。After manufacturing the liquid concentration control device,
If you measure the liquid concentration stabilization time and use that value as the sampling time for the sensor, the liquid concentration value will not exceed the target value, but the performance such as control time and accuracy will be known only after manufacturing. Therefore, there is a possibility that the required performance is not satisfied.
【0005】そこで、本発明は設計段階にてコントール
性能を明確にする液濃度コントロール方法を提供するこ
とを目的とする。Therefore, it is an object of the present invention to provide a liquid concentration control method for clarifying the control performance at the design stage.
【0006】[0006]
【課題を解決するための手段】この目的を達成するため
本発明の液濃度コントロール方法は、液槽の液量と循環
流量から設定される液濃度安定時間をシーケンスに組み
込んだものである。In order to achieve this object, the liquid concentration control method of the present invention incorporates a liquid concentration stabilization time set from the liquid amount in the liquid tank and the circulation flow rate into a sequence.
【0007】さらに、原液注入量に対する液濃度変化量
から設定される注入必要量をシーケンスに組み込んだも
のである。Further, the required injection amount set from the change amount of the liquid concentration with respect to the injection amount of the original liquid is incorporated in the sequence.
【0008】[0008]
【作用】この方法により、液濃度値は目標値を越えるこ
とはなく、設計段階にてコントロールの時間や精度とい
った性能が判明する。According to this method, the liquid concentration value does not exceed the target value, and the performance such as control time and accuracy is clarified at the design stage.
【0009】さらに、第2の発明によりコントロール時
間を必要最小限にすることができる。Further, the control time can be minimized by the second invention.
【0010】[0010]
【実施例】以下、本発明の実施例について図を参照して
説明する。Embodiments of the present invention will be described below with reference to the drawings.
【0011】図1は本発明の第1の発明の実施例を示す
ものである。目標値がセンサ値より大きい場合、バルブ
5を開にして原液を注入し、所定時間経過後バルブ5を
閉にし注入をとめる。そして液濃度安定時間を算出し、
その時間経過後、再度目標値とセンサ値の比較を行い両
者が一致するまで繰り返し注入を行う。液濃度安定時間
は槽液量を循環流量で割った値、すなわち槽2内の液が
ポンプ7により循環するのに要する時間であり、循環流
量に対して注入量が充分小さければ、1回の循環時間に
て液濃度は安定する。FIG. 1 shows an embodiment of the first invention of the present invention. When the target value is larger than the sensor value, the valve 5 is opened to inject the stock solution, and after a lapse of a predetermined time, the valve 5 is closed to stop the injection. Then calculate the liquid concentration stabilization time,
After the lapse of that time, the target value and the sensor value are compared again, and repeated injection is performed until they match. The liquid concentration stabilization time is a value obtained by dividing the tank liquid amount by the circulation flow rate, that is, the time required for the liquid in the tank 2 to circulate by the pump 7. If the injection amount is sufficiently small with respect to the circulation flow rate, The liquid concentration stabilizes during the circulation time.
【0012】[0012]
【表1】 [Table 1]
【0013】図2,図3,図4,(表1)は第2の発明
の実施例を示すものである。目標値がセンサ値より大き
い場合、目標値とセンサ値の差を最小注入可能量に対す
る液濃度変化値で割った値、すなわち注入必要回数を算
出し、その回数に最小注入可能量を掛けた値、すなわち
注入必要量を算出し、この量に対応してバルブ5の開閉
時間をコントローラ6により制御し、注入すれば図3に
示すようにコントロール時間を必要最小限にすることが
できる。図4,(表1)は半導体の基板の染色工程にお
ける染色液の濃度コントロールの具体例である。FIGS. 2, 3, and 4 (Table 1) show an embodiment of the second invention. If the target value is greater than the sensor value, the difference between the target value and the sensor value is divided by the liquid concentration change value for the minimum injectable amount, that is, the required number of injections is calculated, and the value is multiplied by the minimum injectable amount. That is, if the required injection amount is calculated, and the controller 6 controls the opening / closing time of the valve 5 in accordance with this amount, the control time can be minimized as shown in FIG. FIG. 4 (Table 1) is a specific example of controlling the concentration of the dyeing solution in the step of dyeing a semiconductor substrate.
【0014】[0014]
【発明の効果】液濃度安定時間をコントロールシーケン
スに組み込んでいるため、液濃度値は目標値を越えるこ
となく、必要とされる性能を満足するとともに設計段階
にて性能を明確にすることができる。Since the liquid concentration stabilization time is incorporated in the control sequence, the liquid concentration value does not exceed the target value, the required performance can be satisfied, and the performance can be clarified at the design stage. .
【0015】また、目標値までの必要な量を注入する第
2の発明によりコントロール時間を最小限にすることが
できる。Further, the control time can be minimized by the second aspect of the present invention in which a required amount up to the target value is injected.
【図1】本発明の第1の発明の実施例における液濃度コ
ントロールのフローチャートFIG. 1 is a flow chart of liquid concentration control in an embodiment of the first invention of the present invention.
【図2】第2の発明の実施例における液濃度コントロー
ルのフローチャートFIG. 2 is a flow chart of liquid concentration control in the embodiment of the second invention.
【図3】第2の発明の実施例における液濃度値とコント
ロール時間の関係を示す特性曲線図FIG. 3 is a characteristic curve diagram showing the relationship between the liquid concentration value and the control time in the embodiment of the second invention.
【図4】第2の発明の実施例における半導体の基板の染
色工程における染色液の液濃度変化を示した特性曲線図FIG. 4 is a characteristic curve diagram showing a change in solution concentration of a dyeing solution in a step of dyeing a semiconductor substrate in an example of the second invention
【図5】一般的な液濃度コントロール装置の構成図FIG. 5 is a block diagram of a general liquid concentration control device.
【図6】同装置を用いた従来の液濃度コントロールのフ
ローチャートFIG. 6 is a flowchart of a conventional liquid concentration control using the same device.
【図7】同装置を用いた従来の液濃度コントロールのフ
ローチャートFIG. 7 is a flowchart of a conventional liquid concentration control using the same device.
【図8】同方法を用いた場合の液濃度値とコントロール
時間の関係を示す特性曲線図FIG. 8 is a characteristic curve diagram showing the relationship between the liquid concentration value and control time when the same method is used.
【図9】同方法を用いた場合の液濃度値とコントロール
時間の関係を示す特性曲線図FIG. 9 is a characteristic curve diagram showing the relationship between the liquid concentration value and control time when the same method is used.
1 基板 2 液槽 3 センサ 4 原液 5 バルブ 1 substrate 2 liquid tank 3 sensor 4 stock solution 5 valve
Claims (2)
濃度安定時間をシーケンスに組み込むことを特徴とする
液濃度コントロール方法。1. A method for controlling a liquid concentration, characterized in that a liquid concentration stabilization time set from a liquid amount in a liquid tank and a circulation flow rate is incorporated into a sequence.
定される注入必要量をシーケンスに組み込むことを特徴
とする請求項1記載の液濃度コントロール方法。2. The liquid concentration control method according to claim 1, wherein a required injection amount set from a liquid concentration change amount with respect to the original liquid injection amount is incorporated into the sequence.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP376393A JPH06216100A (en) | 1993-01-13 | 1993-01-13 | Method for controlling liquid concentration |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP376393A JPH06216100A (en) | 1993-01-13 | 1993-01-13 | Method for controlling liquid concentration |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06216100A true JPH06216100A (en) | 1994-08-05 |
Family
ID=11566216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP376393A Pending JPH06216100A (en) | 1993-01-13 | 1993-01-13 | Method for controlling liquid concentration |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06216100A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6725119B1 (en) | 1999-09-30 | 2004-04-20 | Nec Electronics Corporation | Cleaning-apparatus line configuration and designing process therefor |
JP2010109064A (en) * | 2008-10-29 | 2010-05-13 | Tosoh Corp | Etching method |
CN104902688A (en) * | 2014-03-04 | 2015-09-09 | 宇宙电路板设备(深圳)有限公司 | Etching liquid adding method, device, and system |
-
1993
- 1993-01-13 JP JP376393A patent/JPH06216100A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6725119B1 (en) | 1999-09-30 | 2004-04-20 | Nec Electronics Corporation | Cleaning-apparatus line configuration and designing process therefor |
JP2010109064A (en) * | 2008-10-29 | 2010-05-13 | Tosoh Corp | Etching method |
CN104902688A (en) * | 2014-03-04 | 2015-09-09 | 宇宙电路板设备(深圳)有限公司 | Etching liquid adding method, device, and system |
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