Summary of the invention
Based on this, be necessary to provide a kind of nesa coating eliminating Moire fringe.
A kind of nesa coating, comprising:
Transparent substrates, comprises two relative surfaces; And
Conductive layer, be arranged at least one surface of described transparent substrates, described conductive layer comprises many cross one another conductive threads, many described conductive thread intersects to form grid, described grid comprises the grid cell of multiple repetition, described grid cell is surrounded jointly by many grid sidelines, and the summit forming described grid cell is intersected in adjacent two described grid sidelines;
Wherein, at least one grid sideline in grid cell described at least one or at least one described summit place is provided with branched structure, and described branched structure is the conduction line segment be connected with described grid sideline or described summit.
Wherein in an embodiment, described branched structure is straightway, curved section or broken line.
Wherein in an embodiment, one end of described branched structure starts from the described grid sideline be connected with it, and the other end extends to the side in described grid sideline.
Wherein in an embodiment, the ultimate range that described branched structure departs from described grid sideline is less than or equal to 1/4 of the length in grid sideline the shortest in described grid cell.
Wherein in an embodiment, the length in described grid sideline is 200 ~ 600 μm, and the distance that described branched structure departs from described grid sideline is 5 ~ 50 μm.
Wherein in an embodiment, described branched structure is arranged at the mid point in described grid sideline.
Wherein in an embodiment, two relative in described grid cell described grid sidelines are provided with described branched structure.
Wherein in an embodiment, the shape and the bearing of trend that are arranged at described branched structure on different grid sidelines are identical.
Wherein in an embodiment, in whole described grid, the spacing of two adjacent described branched structures is equal.
Wherein in an embodiment, in described grid cell, its described grid sideline of adjacent two is provided with described branched structure.
Wherein in an embodiment, in described grid cell, the described branched structure on adjacent two described grid sidelines forms angle in their extension direction.
Wherein in an embodiment, in whole described grid, the spacing being positioned at two the adjacent described branched structures on same bearing of trend is equal.
Wherein in an embodiment, at least one surface of described transparent substrates is provided with latticed groove, and described conductive layer is contained in described latticed groove;
Or described nesa coating also comprises the transparent polymeric layer be located at least one surface of described substrate, described transparent polymeric layer is provided with latticed groove away from a side surface of described substrate, and described conductive layer is contained in described latticed groove.
Wherein in an embodiment, the two ends of described branched structure extend respectively to the both sides in the described grid sideline be connected with it, and the two ends of described branched structure lay respectively at the both sides in described grid sideline.
Wherein in an embodiment, the distance that coupled described grid sideline is departed from the two ends of described branched structure is equal.
Wherein in an embodiment, the axially symmetric structure that described branched structure is is axle with coupled described grid sideline.
In above-mentioned nesa coating, at least one grid sideline in its at least one grid cell or at least one summit are provided with branched structure, branched structure is the conduction line segment be connected with grid sideline.The cycle of original grid broken up by branched structure, and by the Fourier transform to figure, can find the image adding branched structure, its amplitude is lower, is conducive to improving moore phenomenon, eliminates Moire fringe, improves visual effect.
Embodiment
For the ease of understanding the present invention, below with reference to relevant drawings, the present invention is described more fully.Better embodiment of the present invention is given in accompanying drawing.But the present invention can realize in many different forms, is not limited to execution mode described herein.On the contrary, provide the object of these execution modes be make to disclosure of the present invention understand more thorough comprehensively.
It should be noted that, when element is called as " being fixed on " another element, directly can there is element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may there is centering elements simultaneously.Term as used herein " vertical ", " level ", "left", "right" and similar statement just for illustrative purposes, do not represent it is unique execution mode.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present invention understand usually.The object of term used in the description of the invention herein just in order to describe concrete execution mode, is not intended to be restriction the present invention.Term as used herein " and/or " comprise arbitrary and all combinations of one or more relevant Listed Items.
Refer to Fig. 1, the nesa coating 100 in present pre-ferred embodiments, comprise transparent substrates 110 and conductive layer 130.
Transparent substrates 110 comprises two relative surfaces.Conductive layer 130 be arranged at transparent substrates 110 at least one on the surface.
Specifically in the present embodiment, at least one of transparent substrates 110 offers latticed groove 112 on the surface, and conductive layer 130 is contained in latticed groove 112.By technology such as impressions, directly form latticed groove 112 structure on the surface of transparent substrates 110, in groove, filled conductive material forms conductive layer 130.Wherein transparent substrates 110 is that thermoplastic is as Merlon (PC), polymethyl methacrylate (PMMA) etc.Now transparent substrates 110 is only single layer structure.The electric conducting material of conductive layer 130 is conducting metal, carbon nano-tube, Graphene ink or conducting polymer.
In other embodiments, see also Fig. 2, nesa coating 100 also can comprise transparent polymeric layer 120, and transparent polymeric layer 120 is located at least one surface of transparent substrates 110.Wherein, transparent substrates 110 can be made up of flexible materials such as PETG (PET), Merlon (PC) or polymethyl methacrylates (PMMA), also can be made up of the rigid transparent material such as glass, quartz.Transparent polymeric layer 120 can be solidified the plastic material such as glue or hot-setting adhesive by UV and made.Latticed groove 112 is opened on the surface of transparent polymeric layer 120 away from transparent substrates 110.
Refer to Fig. 3 (a) to Fig. 3 (e), latticed groove 112 shown in Fig. 3 (a) for bottom be the micro-groove of " V " font, latticed groove 112 shown in Fig. 3 (b) for bottom be the micro-groove of " W " font, latticed groove 112 shown in Fig. 3 (c) for bottom be the micro-groove of arc, latticed groove 112 shown in Fig. 3 (d) for bottom be corrugated micro-groove, the micro-groove that the latticed groove 112 shown in Fig. 3 (e) is combined with " V " character form structure for bottom is arc.
Latticed groove 112 for bottom be the micro-groove of the shapes such as " V " font, " W " font, arc or waveform, conductive ink in latticed like this groove 112 is when oven dry, conductive ink polycondensation, be not easy the phenomenon occurring that the electric conducting material after drying disconnects, and the contact area increased bottom electric conducting material and groove 112, thus increase electric conducting material to the absorption affinity bottom groove 112.
Being appreciated that latticed groove 112 is not limited to said structure, can also be other shape bottom it, only need meet out-of-flatness bottom latticed groove 112.
It is pointed out that and see also Fig. 4, conductive layer 130 is also formed on transparent substrates 110 by techniques such as exposure, development, etchings.Electric conducting material can be metal, metal oxide, conducting polymer etc.
See also Fig. 5 and Fig. 6; nesa coating 100 also comprises protective clear layer 150, and protective clear layer 150 is covered in protective clear layer 150 on surface that transparent substrates 110 is provided with conductive layer 130 and effectively can prevents the oxidation of the electric conducting material of conductive layer 130 or be polluted by introduced contaminants.Concrete, the material of protective clear layer 150 can be ultraviolet cured adhesive, impression glue or Merlon.
Conductive layer 130 be arranged at transparent substrates 110 at least one on the surface.See also Fig. 7 (a), conductive layer 130 comprises many cross one another conductive threads 131, and many conductive threads 131 intersect to form grid (figure does not mark), and grid comprises the grid cell 133 of multiple repetition.Grid cell 133 is surrounded jointly by many grid sideline 133a, and adjacent two grid sideline 133a intersect the summit forming grid cell 133.
Wherein, at least one grid sideline 133a at least one grid cell 133 or at least one summit place is provided with branched structure 133b.Branched structure 133b is the conduction line segment be connected with grid sideline 133a or summit.
Concrete in the present embodiment, single grid cell 133 has two groups of parallel conductive threads 131 to intersect to form.Grid cell 133 is specially diamond structure.Be appreciated that grid cell 133 also can be the parallelogram sturcutres such as rectangle or the parallel mutually hexagonal structure of opposite side.
Two grid sideline 133a relative in grid cell 133 are provided with branched structure 133b.Each grid all has two branched structure 133b.Branched structure 133b is arranged at the mid point of grid sideline 133a.Branched structure 133b is straightway, and it is organized grid sideline 133a with another and parallels.The shape and the bearing of trend that are arranged at different grid sideline 133a top set structure 133b are identical.In whole grid, the spacing of two adjacent branched structure 133b is equal.
The aperture opening ratio of grid is more than or equal to 90%.So-called aperture opening ratio, its computational methods are, in grid pattern, the area on its per unit area shared by electric conducting material, the i.e. duty ratio of electric conducting material in grid pattern.Aperture opening ratio is larger, and the content of electric conducting material in grid pattern is less, and distribute thinner, light transmittance is better.For nesa coating 100, it needs to ensure certain light transmittance, therefore the aperture opening ratio of its grid is more than or equal to 90%.
The two ends of branched structure 133b extend respectively to the both sides of the grid sideline 133a be connected with it, and the two ends of branched structure 133b lay respectively at the both sides of grid sideline 133a.The distance that coupled grid sideline 133a is departed from the two ends of branched structure 133b is equal.
The length of grid sideline 133a is 200 μm, and the length of the branched structure 133b of linear section structure is 50 μm.In other embodiments, grid sideline 133a and branched structure 133b is not limited to above-mentioned length, the end of demand fulfillment branched structure 133b does not overlap with other grid sideline 133a, namely, branched structure 133b, except the grid sideline 133a or summit with its place overlaps, does not overlap with the grid sideline 133a of its place grid cell 133 or contiguous grid cell 133 or summit.Wherein in some embodiments, the ultimate range that branched structure 133b departs from grid sideline 133a is less than or equal to 1/4 of the length of grid sideline 133a the shortest in grid cell 133, such as, the length of grid sideline 133a can change in the scope of 200 ~ 600 μm, and the distance that branched structure 133b departs from grid sideline 133a can change in the scope of 5 ~ 50 μm.For the branched structure 133b of linear section structure, the distance that grid sideline 133a is departed from its end is the ultimate range that branched structure 133b departs from grid sideline 133a, therefore the distance that grid sideline 133a is departed from end is 5 ~ 50 μm.
Be appreciated that branched structure 133b is arranged at other position of grid sideline 133a, be not limited to the mid point of grid sideline 133a.When ensureing that aperture opening ratio is not less than 90%, optionally can arrange quantity and the length of branched structure 133b on the 133a of grid sideline, as grid sideline 133a can arrange multiple branched structure 133b, and multiple branched structure 133b length is variant.Branched structure 133b also can be one end and starts from the grid sideline 133a be connected with it, and the other end extends to the side of grid sideline 133a, and without the need to extending to the both sides of grid sideline 133a simultaneously.
Meanwhile, branched structure 133b can be arranged on each conductive thread 131 or optionally be arranged on some conductive thread 131, as neighboring grid cells 133 interval is arranged.In addition, the quantity also alterable of branched structure 133b in single grid cell 133, as a grid sideline 133a in a grid cell 133 can arrange two branched structure 133b; Angle also alterable between branched structure 133b and grid sideline 133a, as in a grid cell 133, the angle of branched structure 133b and grid sideline 133a is 30 °, in other grid cells, the angle in branched structure connected grid sideline is different angle.
In another embodiment, see also Fig. 7 (b), in grid cell 133, its two adjacent grid sideline 133a are provided with branched structure 133b.In single grid cell 133, the branched structure 133b on two adjacent grid sideline 133a forms angle in their extension direction.In whole grid, the branched structure 133b be positioned on same conductive thread is parallel, that is, the angle that the branched structure 133b on two adjacent grid sideline 133a is formed in their extension direction is all identical, and the spacing of adjacent two branched structure 133b on same bearing of trend is equal.
Be appreciated that in whole grid, the angle that the branched structure 133b on two adjacent grid sideline 133a is formed in their extension direction can be not exclusively equal.
In another embodiment, see also Fig. 7 (c), branched structure 133b is arranged at the summit place of grid cell 133.Further, the grid sideline 133a of branched structure 133b and grid cell 133 forms angle.
In another embodiment, see also Fig. 7 (d) and Fig. 7 (e), branched structure 133b also can be curved section or broken line.The distance that coupled grid sideline 133a is departed from the two ends of branched structure 133b is equal.The axially symmetric structure that branched structure 133b is is axle with coupled grid sideline 133a.Be appreciated that branched structure 133b also can be unsymmetric structure.
In above-mentioned nesa coating 100, at least one grid sideline 133a in its at least one grid cell 133 or at least one summit are provided with branched structure 133b, branched structure 133b is the conduction line segment be connected with grid sideline 133a.Branched structure 133b has broken up the cycle of original grid, and by the Fourier transform to figure, can find the image adding branched structure 133b, its amplitude is lower, and this is conducive to improving moore phenomenon, eliminates Moire fringe, improves visual effect.
The above embodiment only have expressed several execution mode of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection range of patent of the present invention should be as the criterion with claims.