CN104900301A - Transparent conductive film - Google Patents

Transparent conductive film Download PDF

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Publication number
CN104900301A
CN104900301A CN201410081520.XA CN201410081520A CN104900301A CN 104900301 A CN104900301 A CN 104900301A CN 201410081520 A CN201410081520 A CN 201410081520A CN 104900301 A CN104900301 A CN 104900301A
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China
Prior art keywords
grid
branched structure
sideline
nesa coating
described grid
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CN201410081520.XA
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Chinese (zh)
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CN104900301B (en
Inventor
戴叶
方运
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Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
OFilm Group Co Ltd
Anhui Jingzhuo Optical Display Technology Co Ltd
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Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
Shenzhen OFilm Tech Co Ltd
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Priority to CN201410081520.XA priority Critical patent/CN104900301B/en
Publication of CN104900301A publication Critical patent/CN104900301A/en
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  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

A transparent conductive film comprises a transparent substrate and a conductive layer. The transparent substrate has two opposite surfaces. The conductive layer is arranged on at least one surface of the transparent substrate. The conductive layer comprises a plurality of mutually-crossed conductive wires, wherein the plurality of conductive wires intersect to form a grid. The grid comprises a plurality of repeated grid units. Each grid unit is formed by enclosing a plurality of grid edge lines jointly, and the adjacent grid edge lines intersect to form a top point of the grid unit. At least one grid edge line or at least one top point of each grid unit is provided with a branch structure, wherein the branch structure is a conductive wire section connected with the grid edge line. According to the transparent conductive film, the branch structures break the original grid period; through image Fourier transform, an image added with the branch structures can be found; the amplitude is lower; moire phenomenon can be improved favorably; moire fringes are eliminated; and visual effect is improved.

Description

Nesa coating
Technical field
The present invention relates to touch screen technology, particularly relate to a kind of nesa coating.
Background technology
Nesa coating is a kind of film having satisfactory electrical conductivity and have high transmission rate at visible light wave range.Current nesa coating has been widely used in the fields such as flat panel display, photovoltaic device, contact panel and electromagnetic shielding, has the extremely wide market space.
Metal has higher conductivity and bendable folding endurance, and the metal grill collocation that superfine metal wire is consisted of certain arrangement mode can form the good nesa coating of conductivity on transparent substrate material.This technology has been widely used in the fields such as flat panel display, touch-control, photovoltaic device and electromagnetic shielding.Compared to traditional ITO transparent conductive material, metal grill has the advantages such as high conductivity, bent, cost is lower.
In mesh design, how to evade the difficult problem that Moire fringe is puzzlement designer always.The formation of Moire fringe defines new periodic structure after being the periodic structure superposition due to two-layer rule and causes.
For traditional nesa coating, it is attached to display device usually, as the surface of LCD, OLED.The rhythmic lattice structure of grid tool on nesa coating, and the display device dot structure also well-regulated periodic structure of tool.Although above-mentioned two-layer periodic structure is not easily discovered by human eye separately, the Moire fringe formed after superposition, is easily discovered by human eye, affects visual effect.
Summary of the invention
Based on this, be necessary to provide a kind of nesa coating eliminating Moire fringe.
A kind of nesa coating, comprising:
Transparent substrates, comprises two relative surfaces; And
Conductive layer, be arranged at least one surface of described transparent substrates, described conductive layer comprises many cross one another conductive threads, many described conductive thread intersects to form grid, described grid comprises the grid cell of multiple repetition, described grid cell is surrounded jointly by many grid sidelines, and the summit forming described grid cell is intersected in adjacent two described grid sidelines;
Wherein, at least one grid sideline in grid cell described at least one or at least one described summit place is provided with branched structure, and described branched structure is the conduction line segment be connected with described grid sideline or described summit.
Wherein in an embodiment, described branched structure is straightway, curved section or broken line.
Wherein in an embodiment, one end of described branched structure starts from the described grid sideline be connected with it, and the other end extends to the side in described grid sideline.
Wherein in an embodiment, the ultimate range that described branched structure departs from described grid sideline is less than or equal to 1/4 of the length in grid sideline the shortest in described grid cell.
Wherein in an embodiment, the length in described grid sideline is 200 ~ 600 μm, and the distance that described branched structure departs from described grid sideline is 5 ~ 50 μm.
Wherein in an embodiment, described branched structure is arranged at the mid point in described grid sideline.
Wherein in an embodiment, two relative in described grid cell described grid sidelines are provided with described branched structure.
Wherein in an embodiment, the shape and the bearing of trend that are arranged at described branched structure on different grid sidelines are identical.
Wherein in an embodiment, in whole described grid, the spacing of two adjacent described branched structures is equal.
Wherein in an embodiment, in described grid cell, its described grid sideline of adjacent two is provided with described branched structure.
Wherein in an embodiment, in described grid cell, the described branched structure on adjacent two described grid sidelines forms angle in their extension direction.
Wherein in an embodiment, in whole described grid, the spacing being positioned at two the adjacent described branched structures on same bearing of trend is equal.
Wherein in an embodiment, at least one surface of described transparent substrates is provided with latticed groove, and described conductive layer is contained in described latticed groove;
Or described nesa coating also comprises the transparent polymeric layer be located at least one surface of described substrate, described transparent polymeric layer is provided with latticed groove away from a side surface of described substrate, and described conductive layer is contained in described latticed groove.
Wherein in an embodiment, the two ends of described branched structure extend respectively to the both sides in the described grid sideline be connected with it, and the two ends of described branched structure lay respectively at the both sides in described grid sideline.
Wherein in an embodiment, the distance that coupled described grid sideline is departed from the two ends of described branched structure is equal.
Wherein in an embodiment, the axially symmetric structure that described branched structure is is axle with coupled described grid sideline.
In above-mentioned nesa coating, at least one grid sideline in its at least one grid cell or at least one summit are provided with branched structure, branched structure is the conduction line segment be connected with grid sideline.The cycle of original grid broken up by branched structure, and by the Fourier transform to figure, can find the image adding branched structure, its amplitude is lower, is conducive to improving moore phenomenon, eliminates Moire fringe, improves visual effect.
Accompanying drawing explanation
Fig. 1 is the generalized section of the nesa coating in first embodiment of the invention;
Fig. 2 is the generalized section of the nesa coating in second embodiment of the invention;
Fig. 3 (a) to Fig. 3 (e) is the structural representation of the different embodiments of the bottom of groove latticed in the nesa coating shown in Fig. 1;
Fig. 4 is the generalized section of the nesa coating in third embodiment of the invention;
Fig. 5 is the generalized section of the nesa coating in fourth embodiment of the invention;
Fig. 6 is the generalized section of the nesa coating in fifth embodiment of the invention;
Fig. 7 (a) to Fig. 7 (e) is the structural representation of the different embodiments of conductive layer in touch sensing shown in Fig. 1.
Embodiment
For the ease of understanding the present invention, below with reference to relevant drawings, the present invention is described more fully.Better embodiment of the present invention is given in accompanying drawing.But the present invention can realize in many different forms, is not limited to execution mode described herein.On the contrary, provide the object of these execution modes be make to disclosure of the present invention understand more thorough comprehensively.
It should be noted that, when element is called as " being fixed on " another element, directly can there is element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may there is centering elements simultaneously.Term as used herein " vertical ", " level ", "left", "right" and similar statement just for illustrative purposes, do not represent it is unique execution mode.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present invention understand usually.The object of term used in the description of the invention herein just in order to describe concrete execution mode, is not intended to be restriction the present invention.Term as used herein " and/or " comprise arbitrary and all combinations of one or more relevant Listed Items.
Refer to Fig. 1, the nesa coating 100 in present pre-ferred embodiments, comprise transparent substrates 110 and conductive layer 130.
Transparent substrates 110 comprises two relative surfaces.Conductive layer 130 be arranged at transparent substrates 110 at least one on the surface.
Specifically in the present embodiment, at least one of transparent substrates 110 offers latticed groove 112 on the surface, and conductive layer 130 is contained in latticed groove 112.By technology such as impressions, directly form latticed groove 112 structure on the surface of transparent substrates 110, in groove, filled conductive material forms conductive layer 130.Wherein transparent substrates 110 is that thermoplastic is as Merlon (PC), polymethyl methacrylate (PMMA) etc.Now transparent substrates 110 is only single layer structure.The electric conducting material of conductive layer 130 is conducting metal, carbon nano-tube, Graphene ink or conducting polymer.
In other embodiments, see also Fig. 2, nesa coating 100 also can comprise transparent polymeric layer 120, and transparent polymeric layer 120 is located at least one surface of transparent substrates 110.Wherein, transparent substrates 110 can be made up of flexible materials such as PETG (PET), Merlon (PC) or polymethyl methacrylates (PMMA), also can be made up of the rigid transparent material such as glass, quartz.Transparent polymeric layer 120 can be solidified the plastic material such as glue or hot-setting adhesive by UV and made.Latticed groove 112 is opened on the surface of transparent polymeric layer 120 away from transparent substrates 110.
Refer to Fig. 3 (a) to Fig. 3 (e), latticed groove 112 shown in Fig. 3 (a) for bottom be the micro-groove of " V " font, latticed groove 112 shown in Fig. 3 (b) for bottom be the micro-groove of " W " font, latticed groove 112 shown in Fig. 3 (c) for bottom be the micro-groove of arc, latticed groove 112 shown in Fig. 3 (d) for bottom be corrugated micro-groove, the micro-groove that the latticed groove 112 shown in Fig. 3 (e) is combined with " V " character form structure for bottom is arc.
Latticed groove 112 for bottom be the micro-groove of the shapes such as " V " font, " W " font, arc or waveform, conductive ink in latticed like this groove 112 is when oven dry, conductive ink polycondensation, be not easy the phenomenon occurring that the electric conducting material after drying disconnects, and the contact area increased bottom electric conducting material and groove 112, thus increase electric conducting material to the absorption affinity bottom groove 112.
Being appreciated that latticed groove 112 is not limited to said structure, can also be other shape bottom it, only need meet out-of-flatness bottom latticed groove 112.
It is pointed out that and see also Fig. 4, conductive layer 130 is also formed on transparent substrates 110 by techniques such as exposure, development, etchings.Electric conducting material can be metal, metal oxide, conducting polymer etc.
See also Fig. 5 and Fig. 6; nesa coating 100 also comprises protective clear layer 150, and protective clear layer 150 is covered in protective clear layer 150 on surface that transparent substrates 110 is provided with conductive layer 130 and effectively can prevents the oxidation of the electric conducting material of conductive layer 130 or be polluted by introduced contaminants.Concrete, the material of protective clear layer 150 can be ultraviolet cured adhesive, impression glue or Merlon.
Conductive layer 130 be arranged at transparent substrates 110 at least one on the surface.See also Fig. 7 (a), conductive layer 130 comprises many cross one another conductive threads 131, and many conductive threads 131 intersect to form grid (figure does not mark), and grid comprises the grid cell 133 of multiple repetition.Grid cell 133 is surrounded jointly by many grid sideline 133a, and adjacent two grid sideline 133a intersect the summit forming grid cell 133.
Wherein, at least one grid sideline 133a at least one grid cell 133 or at least one summit place is provided with branched structure 133b.Branched structure 133b is the conduction line segment be connected with grid sideline 133a or summit.
Concrete in the present embodiment, single grid cell 133 has two groups of parallel conductive threads 131 to intersect to form.Grid cell 133 is specially diamond structure.Be appreciated that grid cell 133 also can be the parallelogram sturcutres such as rectangle or the parallel mutually hexagonal structure of opposite side.
Two grid sideline 133a relative in grid cell 133 are provided with branched structure 133b.Each grid all has two branched structure 133b.Branched structure 133b is arranged at the mid point of grid sideline 133a.Branched structure 133b is straightway, and it is organized grid sideline 133a with another and parallels.The shape and the bearing of trend that are arranged at different grid sideline 133a top set structure 133b are identical.In whole grid, the spacing of two adjacent branched structure 133b is equal.
The aperture opening ratio of grid is more than or equal to 90%.So-called aperture opening ratio, its computational methods are, in grid pattern, the area on its per unit area shared by electric conducting material, the i.e. duty ratio of electric conducting material in grid pattern.Aperture opening ratio is larger, and the content of electric conducting material in grid pattern is less, and distribute thinner, light transmittance is better.For nesa coating 100, it needs to ensure certain light transmittance, therefore the aperture opening ratio of its grid is more than or equal to 90%.
The two ends of branched structure 133b extend respectively to the both sides of the grid sideline 133a be connected with it, and the two ends of branched structure 133b lay respectively at the both sides of grid sideline 133a.The distance that coupled grid sideline 133a is departed from the two ends of branched structure 133b is equal.
The length of grid sideline 133a is 200 μm, and the length of the branched structure 133b of linear section structure is 50 μm.In other embodiments, grid sideline 133a and branched structure 133b is not limited to above-mentioned length, the end of demand fulfillment branched structure 133b does not overlap with other grid sideline 133a, namely, branched structure 133b, except the grid sideline 133a or summit with its place overlaps, does not overlap with the grid sideline 133a of its place grid cell 133 or contiguous grid cell 133 or summit.Wherein in some embodiments, the ultimate range that branched structure 133b departs from grid sideline 133a is less than or equal to 1/4 of the length of grid sideline 133a the shortest in grid cell 133, such as, the length of grid sideline 133a can change in the scope of 200 ~ 600 μm, and the distance that branched structure 133b departs from grid sideline 133a can change in the scope of 5 ~ 50 μm.For the branched structure 133b of linear section structure, the distance that grid sideline 133a is departed from its end is the ultimate range that branched structure 133b departs from grid sideline 133a, therefore the distance that grid sideline 133a is departed from end is 5 ~ 50 μm.
Be appreciated that branched structure 133b is arranged at other position of grid sideline 133a, be not limited to the mid point of grid sideline 133a.When ensureing that aperture opening ratio is not less than 90%, optionally can arrange quantity and the length of branched structure 133b on the 133a of grid sideline, as grid sideline 133a can arrange multiple branched structure 133b, and multiple branched structure 133b length is variant.Branched structure 133b also can be one end and starts from the grid sideline 133a be connected with it, and the other end extends to the side of grid sideline 133a, and without the need to extending to the both sides of grid sideline 133a simultaneously.
Meanwhile, branched structure 133b can be arranged on each conductive thread 131 or optionally be arranged on some conductive thread 131, as neighboring grid cells 133 interval is arranged.In addition, the quantity also alterable of branched structure 133b in single grid cell 133, as a grid sideline 133a in a grid cell 133 can arrange two branched structure 133b; Angle also alterable between branched structure 133b and grid sideline 133a, as in a grid cell 133, the angle of branched structure 133b and grid sideline 133a is 30 °, in other grid cells, the angle in branched structure connected grid sideline is different angle.
In another embodiment, see also Fig. 7 (b), in grid cell 133, its two adjacent grid sideline 133a are provided with branched structure 133b.In single grid cell 133, the branched structure 133b on two adjacent grid sideline 133a forms angle in their extension direction.In whole grid, the branched structure 133b be positioned on same conductive thread is parallel, that is, the angle that the branched structure 133b on two adjacent grid sideline 133a is formed in their extension direction is all identical, and the spacing of adjacent two branched structure 133b on same bearing of trend is equal.
Be appreciated that in whole grid, the angle that the branched structure 133b on two adjacent grid sideline 133a is formed in their extension direction can be not exclusively equal.
In another embodiment, see also Fig. 7 (c), branched structure 133b is arranged at the summit place of grid cell 133.Further, the grid sideline 133a of branched structure 133b and grid cell 133 forms angle.
In another embodiment, see also Fig. 7 (d) and Fig. 7 (e), branched structure 133b also can be curved section or broken line.The distance that coupled grid sideline 133a is departed from the two ends of branched structure 133b is equal.The axially symmetric structure that branched structure 133b is is axle with coupled grid sideline 133a.Be appreciated that branched structure 133b also can be unsymmetric structure.
In above-mentioned nesa coating 100, at least one grid sideline 133a in its at least one grid cell 133 or at least one summit are provided with branched structure 133b, branched structure 133b is the conduction line segment be connected with grid sideline 133a.Branched structure 133b has broken up the cycle of original grid, and by the Fourier transform to figure, can find the image adding branched structure 133b, its amplitude is lower, and this is conducive to improving moore phenomenon, eliminates Moire fringe, improves visual effect.
The above embodiment only have expressed several execution mode of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection range of patent of the present invention should be as the criterion with claims.

Claims (17)

1. a nesa coating, is characterized in that, comprising:
Transparent substrates, comprises two relative surfaces; And
Conductive layer, be arranged at least one surface of described transparent substrates, described conductive layer comprises many cross one another conductive threads, many described conductive thread intersects to form grid, described grid comprises the grid cell of multiple repetition, described grid cell is surrounded jointly by many grid sidelines, and the summit forming described grid cell is intersected in adjacent two described grid sidelines;
Wherein, at least one grid sideline in grid cell described at least one or at least one described summit place is provided with branched structure, and described branched structure is the conduction line segment be connected with described grid sideline or described summit.
2. nesa coating according to claim 1, is characterized in that, described branched structure, except the described grid sideline or summit with its place overlaps, does not overlap with the grid sideline of grid cell described in its place or contiguous described grid cell or summit.
3. nesa coating according to claim 1, is characterized in that, described branched structure is straightway, curved section or broken line.
4. nesa coating according to claim 1, is characterized in that, one end of described branched structure starts from the described grid sideline be connected with it, and the other end extends to the side in described grid sideline.
5. nesa coating according to claim 1, is characterized in that, the ultimate range that described branched structure departs from described grid sideline is less than or equal to 1/4 of the length in grid sideline the shortest in described grid cell.
6. nesa coating according to claim 5, is characterized in that, the length in described grid sideline is 200 ~ 600 μm, and the distance that described branched structure departs from described grid sideline is 5 ~ 50 μm.
7. nesa coating according to claim 1, is characterized in that, described branched structure is arranged at the mid point in described grid sideline.
8. nesa coating according to claim 1, is characterized in that, two relative in described grid cell described grid sidelines are provided with described branched structure.
9. nesa coating according to claim 8, is characterized in that, the shape and the bearing of trend that are arranged at described branched structure on different grid sidelines are identical.
10. nesa coating according to claim 9, is characterized in that, in whole described grid, the spacing of two adjacent described branched structures is equal.
11. nesa coatings according to claim 1, is characterized in that, in described grid cell, its described grid sideline of adjacent two are provided with described branched structure.
12. nesa coatings according to claim 11, is characterized in that, in described grid cell, the described branched structure on adjacent two described grid sidelines forms angle in their extension direction.
13. nesa coatings according to claim 12, is characterized in that, in whole described grid, the spacing being positioned at two the adjacent described branched structures on same bearing of trend is equal.
14. nesa coatings according to claim 1, is characterized in that, at least one surface of described transparent substrates is provided with latticed groove, and described conductive layer is contained in described latticed groove;
Or described nesa coating also comprises the transparent polymeric layer be located at least one surface of described substrate, described transparent polymeric layer is provided with latticed groove away from a side surface of described transparent substrates, and described conductive layer is contained in described latticed groove.
15. nesa coatings according to claim 1, is characterized in that, the two ends of described branched structure extend respectively to the both sides in the described grid sideline be connected with it, and the two ends of described branched structure lay respectively at the both sides in described grid sideline.
16. nesa coatings according to claim 15, is characterized in that, the distance that coupled described grid sideline is departed from the two ends of described branched structure is equal.
17. nesa coatings according to claim 16, is characterized in that, the axially symmetric structure that described branched structure is is axle with coupled described grid sideline.
CN201410081520.XA 2014-03-06 2014-03-06 Nesa coating Active CN104900301B (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6275621B1 (en) * 1998-03-02 2001-08-14 Texas Instruments Incorporated Moire overlay target
JP2004255706A (en) * 2003-02-26 2004-09-16 Teijin Dupont Films Japan Ltd Transparent conductive laminated film
CN103309509A (en) * 2013-06-04 2013-09-18 苏州欧菲光科技有限公司 Conductive film
CN203366779U (en) * 2013-07-30 2013-12-25 南昌欧菲光科技有限公司 Conductive film
CN203760097U (en) * 2014-03-06 2014-08-06 南昌欧菲光科技有限公司 Transparent conductive film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6275621B1 (en) * 1998-03-02 2001-08-14 Texas Instruments Incorporated Moire overlay target
JP2004255706A (en) * 2003-02-26 2004-09-16 Teijin Dupont Films Japan Ltd Transparent conductive laminated film
CN103309509A (en) * 2013-06-04 2013-09-18 苏州欧菲光科技有限公司 Conductive film
CN203366779U (en) * 2013-07-30 2013-12-25 南昌欧菲光科技有限公司 Conductive film
CN203760097U (en) * 2014-03-06 2014-08-06 南昌欧菲光科技有限公司 Transparent conductive film

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Address after: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi

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Patentee after: SUZHOU OFILM TECH Co.,Ltd.

Address before: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi

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