CN104880161A - Method for measuring solid material surface roughness by using elliptical polarization parameter - Google Patents

Method for measuring solid material surface roughness by using elliptical polarization parameter Download PDF

Info

Publication number
CN104880161A
CN104880161A CN201510341853.6A CN201510341853A CN104880161A CN 104880161 A CN104880161 A CN 104880161A CN 201510341853 A CN201510341853 A CN 201510341853A CN 104880161 A CN104880161 A CN 104880161A
Authority
CN
China
Prior art keywords
field
solid material
optics
ellipsometric parameter
parameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201510341853.6A
Other languages
Chinese (zh)
Other versions
CN104880161B (en
Inventor
裘俊
冉东方
金荣
赵军明
刘林华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harbin Institute of Technology
Original Assignee
Harbin Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harbin Institute of Technology filed Critical Harbin Institute of Technology
Priority to CN201510341853.6A priority Critical patent/CN104880161B/en
Publication of CN104880161A publication Critical patent/CN104880161A/en
Application granted granted Critical
Publication of CN104880161B publication Critical patent/CN104880161B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The invention provides a method for measuring solid material surface roughness by using elliptical polarization parameters, and relates to a method for measuring solid material surface roughness. Objectives are to solve problems in the prior art that an atomic force microscope in an existing measuring method is slow in speed, a scanning electron microscope requires a measured sample to be conductive, and precision of a light-section microscope is not high. The method is realized through the following technical scheme: step 1, performing analog computation on rough surface characteristic parameters of different solid materials, that is, through a three-dimensional finite-difference time-domain method to obtain space electromagnetic field distribution of the near-field of a solid material rough surface; step 2, through near-to-far-field transformation to obtain a complex electric field E of a far field, calculating radiation polarization characteristic on a mirror reflection direction, and establishing a database; step 3, after a solid material is produced, measuring the optical elliptical polarization parameters on the surface of the solid material, and comparing with the database, to obtain root-mean-square roughness and correlation length. The method is applied in the field of measuring surface roughness.

Description

A kind of method utilizing ellipsometric parameter to measure solid material surface roughness
Technical field
The present invention relates to the method measuring solid material surface roughness.
Background technology
Surfaceness refer to that finished surface has compared with Small Distance and small peak valley unevenness.Real surface is all coarse, and the tool such as wearing quality, sealing, anti-fatigue ability of material surface roughness to this sample has a direct impact, and also affects the assembly quality of part, vibration & noise and power consumption and serviceable life etc.Moreover, surfaceness also has critical role in fields such as optical properties of material, infrared target imagings.The measurement of surfaceness becomes an important process of part quality detection.R.m.s. roughness (root-mean-square, σ) and auto-correlation length (correlation length, τ) can be used to characterize.The definition of r.m.s. roughness is:
σ = ⟨ ζ ( r ) 2 ⟩
Wherein, ζ (r) is the surface elevation at r place, meets following condition:
<ζ(r)>=0
In reality, the r.m.s. roughness of a lot of material surface all meets Gaussian distribution:
&lang; &zeta; ( r ) &zeta; ( r &prime; ) &rang; = &sigma; 2 exp &lsqb; - ( | x 1 - x 2 | 2 &tau; 2 ) + ( | y 1 - y 2 | 2 &tau; 2 ) &rsqb;
τ is auto-correlation length.
Optics ellipsometry method is that Rothen proposed first in 1945, and he has designed and produced First ellipsometer, and the thickness of 0.3A that used this ellipsometer measurement to arrive, than interference light mensuration at least more than accurate ten times.The measurement parameter used is optics ellipsometric parameter, and existing measuring method is as slow in contact measurement method speed such as atomic force microscope, probe-type contourgraphs; Scanning electron microscope needs to measure sample the restrictive condition such as can to conduct electricity; Optical means is as light-section microscope, and existing instrument generally can only measure mean accuracy 0.5 micron and above roughness, and precision is not high.
Summary of the invention
The object of the invention is in order to solve prior art measuring method speed slow, need to measure sample and can conduct electricity and mean accuracy 0.5 micron and above roughness can only be measured, the problem that precision is not high, and propose a kind of method utilizing ellipsometric parameter measure surface roughness.
Above-mentioned goal of the invention is achieved through the following technical solutions:
A kind of method utilizing ellipsometric parameter to measure solid material surface roughness is specifically carried out according to following steps:
Step one, analog computation is carried out to different solid material rough surface features parameter, namely tried to achieve the spatial electromagnetic field distribution in this solid material rough surface near field by Three-dimensional Time Domain method of finite difference;
Wherein, described near field is be less than the electromagnetic field in 10 wavelength coverages;
External electromagnetic field refers to telegram in reply field and magnetic field
Rough surface features parameter refers to r.m.s. roughness and auto-correlation length;
Step 2, tried to achieve the telegram in reply field in far field by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Wherein, described far field is often referred to distance sample is 10 5electromagnetic field outside individual wavelength;
Step 3, after solid material has been produced, the optics ellipsometric parameter of the instrument of measured surface radiation polarisation characteristic to this solid material surface is utilized to measure, and compare with the optics ellipsometric parameter in database, obtain r.m.s. roughness and the auto-correlation length of this solid material surface.
A kind of method utilizing ellipsometric parameter to measure solid material surface roughness is specifically carried out according to following steps:
Step one, analog computation is carried out to different solid material rough surface features parameter, namely tried to achieve the spatial electromagnetic field distribution in this solid material rough surface near field by Three-dimensional Time Domain method of finite difference (FDTD);
Wherein, described near field is be less than the electromagnetic field in 10 wavelength coverages;
External electromagnetic field refers to telegram in reply field and magnetic field
Rough surface features parameter refers to r.m.s. roughness and auto-correlation length;
Step 2, tried to achieve the telegram in reply field in far field by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Wherein, described far field is often referred to distance sample is 10 5electromagnetic field outside individual wavelength;
Step 3, after solid material has been produced, optics ellipsometric parameter is recorded successively by the scanning area of measured surface radiation polarisation characteristic instrument, and compare with the optics ellipsometric parameter in database, obtain r.m.s. roughness and the auto-correlation length of this solid material surface, in computer, need according to the precision of solid material the error range setting corresponding optics ellipsometric parameter;
Error range is: | the optics ellipsometric parameter of the ellipsometric parameter calculated in database-record |≤accuracy value that arranges is needed according to solid material precision;
If when the optics ellipsometric parameter recorded is in error allowed band, then this solid material surface roughness meets the requirements;
If when the optics ellipsometric parameter recorded is not in error allowed band, then this solid material surface roughness is undesirable;
Computer record is used to occur the solid material numbering of error or directly use mechanical arm to be taken out by this solid material, Real-Time Monitoring solid material surface roughness.
Invention effect
Adopt a kind of method utilizing ellipsometric parameter to measure solid material surface roughness of the present invention,
The present invention uses FDTD method for numerical simulation to try to achieve the spatial electromagnetic field distribution in rough surface near field; Obtain far field electromagnetic field by Near-far fields transfer, then extract the telegram in reply field of specular reflection direction from far field space elect magnetic field component calculates the radiation polarisation characteristic of the telegram in reply field component of specular reflection direction, and radiation polarisation characteristic uses optics ellipsometric parameter to represent, building database; Then utilize the ellipsometric parameter of the apparatus measures part sample measuring ellipsometric parameter, and measurement result and database are contrasted, obtain roughness, described roughness uses r.m.s. roughness and auto-correlation length to represent.Synthesizing map 3, Fig. 4 are known, and ellipsometric parameter all can produce regular change with r.m.s. roughness σ and auto-correlation length τ, and ellipsometric parameter all can produce regular change with the change of root-mean-square height and auto-correlation length.This regularity ensure that the feasibility obtaining solid parameter roughness by measuring ellipsometric parameter.
Optics ellipsometry is indirect measurement method, has the advantages such as speed is fast, harmless, and faster than atomic force microscope, probe-type contourgraph speed, ellipsometric parameter has high sensitivity; Compared with scanning electron microscope, the present invention does not need to measure sample and can conduct electricity; Through calculating herein, use wavelength is the incident wave of 4 μm, and precision of its detection silicon rough surface can reach 10nm, and the precision of most of light-section microscope is about 0.5 μm, and the precision of ellipsometry improves an order of magnitude.If detection optical constant and the larger material of air difference, as metal etc., the detection accuracy of ellipsometry can further improve.When other conditions are identical, if the incident wave using wavelength shorter, ellipsometry detection accuracy also can further improve.
Accompanying drawing explanation
Fig. 1 is process flow diagram of the present invention;
Fig. 2 is r.m.s. roughness is σ=0.05 μm, the rough surface schematic diagram of auto-correlation length τ=0.5 μm;
Fig. 3 is incident wave wavelength is 4 microns, and when τ=0.05 μm and τ=1 μm, ellipsometric parameter is with the changing trend diagram of σ;
Fig. 4 is incident wave wavelength is 4 microns, and when σ=0.1 μm and σ=0.2 μm, ellipsometric parameter is with the variation tendency of τ.
Embodiment
Embodiment one: composition graphs 1 illustrates present embodiment, a kind of method utilizing ellipsometric parameter to measure solid material surface roughness is specifically carried out according to following steps:
Step one, analog computation is carried out to different solid material rough surface features parameter, namely tried to achieve the spatial electromagnetic field distribution in this solid material rough surface near field by Three-dimensional Time Domain method of finite difference (FDTD);
Wherein, described near field is be less than the electromagnetic field in 10 wavelength coverages;
External electromagnetic field refers to telegram in reply field and magnetic field
Rough surface features parameter refers to r.m.s. roughness and auto-correlation length;
Step 2, tried to achieve the telegram in reply field in far field by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Wherein, described far field is often referred to distance sample is 10 5electromagnetic field outside individual wavelength;
Step 3, after solid material has been produced, the optics ellipsometric parameter of the instrument of measured surface radiation polarisation characteristic to this solid material surface is utilized to measure, and compare with the optics ellipsometric parameter in database, obtain r.m.s. roughness and the auto-correlation length of this solid material surface.
Embodiment two: present embodiment and embodiment one are unlike the telegram in reply field of being tried to achieve far field in described step 2 by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Detailed process is:
The radiation polarisation characteristic calculating specular reflection direction adopts following formula to calculate:
Radiation polarisation characteristic uses optics ellipsometric parameter to represent; Optics ellipsometric parameter is divided into: optics ellipsometric parameter reflectance ratio real part Ψ and optics ellipsometric parameter reflectance ratio imaginary part △; Telegram in reply field be divided into with with set when calculating;
&rho; = t a n &Psi; exp ( i &Delta; ) = r &RightArrow; p r &RightArrow; s = E &RightArrow; r p E &RightArrow; i p / E &RightArrow; r s E &RightArrow; i s
In formula: for p direction complex reflection coefficient, for s direction complex reflection coefficient, for p direction reflected field vector, for p direction incident electric field vector, for s direction reflected field vector, for s direction incident electric field vector, r digital reflex, i refers to incidence.
Embodiment three: a kind of method utilizing ellipsometric parameter to measure solid material surface roughness is specifically carried out according to following steps:
Step one, analog computation is carried out to different solid material rough surface features parameter, namely tried to achieve the spatial electromagnetic field distribution in this solid material rough surface near field by Three-dimensional Time Domain method of finite difference (FDTD);
Wherein, described near field is be less than the electromagnetic field in 10 wavelength coverages;
External electromagnetic field refers to telegram in reply field and magnetic field
Rough surface features parameter refers to r.m.s. roughness and auto-correlation length;
Step 2, tried to achieve the telegram in reply field in far field by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Wherein, described far field is often referred to distance sample is 10 5electromagnetic field outside individual wavelength;
Step 3, after solid material has been produced, optics ellipsometric parameter is recorded successively by the scanning area of measured surface radiation polarisation characteristic instrument, and compare with the optics ellipsometric parameter in database, obtain r.m.s. roughness and the auto-correlation length of this solid material surface, in computer, need according to the precision of solid material the error range setting corresponding optics ellipsometric parameter;
Error range is: | the optics ellipsometric parameter of the optics ellipsometric parameter calculated in database-record |≤accuracy value that arranges is needed according to solid material precision
If when the optics ellipsometric parameter recorded is in error allowed band, then this solid material surface roughness meets the requirements;
If when the optics ellipsometric parameter recorded is not in error allowed band, then this solid material surface roughness is undesirable;
Computer record is used to occur the solid material numbering of error or directly use mechanical arm to be taken out by this solid material, Real-Time Monitoring solid material surface roughness.
Embodiment four: present embodiment and embodiment three are unlike the telegram in reply field of being tried to achieve far field in described step 2 by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database; Detailed process is:
The radiation polarisation characteristic calculating specular reflection direction adopts following formula to calculate:
Radiation polarisation characteristic uses optics ellipsometric parameter to represent; Optics ellipsometric parameter is divided into: optics ellipsometric parameter reflectance ratio real part Ψ and optics ellipsometric parameter reflectance ratio imaginary part △; Telegram in reply field be divided into with with set when calculating;
&rho; = t a n &Psi; exp ( i &Delta; ) = r &RightArrow; p r &RightArrow; s = E &RightArrow; r p E &RightArrow; i p / E &RightArrow; r s E &RightArrow; i s
In formula: for p direction complex reflection coefficient, for s direction complex reflection coefficient, for p direction reflected field vector, for p direction incident electric field vector, for s direction reflected field vector, for s direction incident electric field vector, r digital reflex, i refers to incidence.
Embodiment 1: the first situation, when τ is constant, calculates the situation of change of ellipsometric parameter with σ.Fig. 3 be τ=0.05 μm and τ=1 μm time, ellipsometric parameter is with the situation of change of σ.Horizontal ordinate is σ, and ordinate is ellipsometric parameter numerical value.In Fig. 3, the ellipsometer that the data of σ=0.05 μm, τ=0.05 μm are Fig. 2 institute presentation surface calculates result.In Fig. 2, r.m.s. roughness is the height that σ affects roughness fluctuating, and auto-correlation length τ affects the density degree risen and fallen.
As can be seen from Figure 3, in ellipsometric parameter, when τ=0.05 μm, reflectance ratio real part Ψ increases with the increase of σ, and reflectance ratio imaginary part △ reduces with the increase of σ.When τ=1 μm, reflectance ratio real part Ψ reduces with the increase of σ, and reflectance ratio imaginary part △ reduces with the increase of σ.
The second situation, when σ is constant, calculates the situation of change of ellipsometric parameter with τ.Fig. 4 be σ=0.1 μm and σ=0.2 μm time, ellipsometric parameter is with the situation of change of τ.As can be seen from the figure, in ellipsometric parameter, when σ=0.1 μm, reflectance ratio real part Ψ increases rear reduction with the increase line of τ, and reflectance ratio imaginary part △ increases with the increase of τ.When σ=0.2 μm, reflectance ratio real part Ψ reduces with the increase of τ, and reflectance ratio imaginary part △ increases with the increase of τ.
Synthesizing map 3, Fig. 4 are known, and ellipsometric parameter all can produce regular change with r.m.s. roughness σ and auto-correlation length τ.This change makes to become possibility by measuring ellipsometric parameter inverting roughness.When sample is through measuring the instrument of ellipsometric parameter, measures the ellipse inclined numerical value obtaining sample, and contrasting with above-mentioned result of calculation.Roughness value corresponding to ellipsometric parameter is the roughness of this sample.

Claims (4)

1. utilize ellipsometric parameter to measure a method for solid material surface roughness, it is characterized in that: a kind of method utilizing ellipsometric parameter to measure solid material surface roughness is specifically carried out according to following steps:
Step one, analog computation is carried out to different solid material rough surface features parameter, namely tried to achieve the spatial electromagnetic field distribution in this solid material rough surface near field by Three-dimensional Time Domain method of finite difference;
Wherein, described near field is be less than the electromagnetic field in 10 wavelength coverages;
External electromagnetic field refers to telegram in reply field and magnetic field
Rough surface features parameter refers to r.m.s. roughness and auto-correlation length;
Step 2, tried to achieve the telegram in reply field in far field by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Wherein, described far field is often referred to distance sample is 10 5electromagnetic field outside individual wavelength;
Step 3, after solid material has been produced, the optics ellipsometric parameter of the instrument of measured surface radiation polarisation characteristic to this solid material surface is utilized to measure, and compare with the optics ellipsometric parameter in database, obtain r.m.s. roughness and the auto-correlation length of this solid material surface.
2. a kind of method utilizing ellipsometric parameter to measure solid material surface roughness according to claim 1, be is characterized in that: the telegram in reply field of being tried to achieve far field in described step 2 by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database; Detailed process is:
The radiation polarisation characteristic calculating specular reflection direction adopts following formula to calculate:
Radiation polarisation characteristic uses optics ellipsometric parameter to represent; Optics ellipsometric parameter is divided into: optics ellipsometric parameter reflectance ratio real part Ψ and optics ellipsometric parameter reflectance ratio imaginary part △; Telegram in reply field be divided into with with set when calculating;
&rho; = t a n &Psi; exp ( i &Delta; ) = r &RightArrow; p r &RightArrow; s = E &RightArrow; r p E &RightArrow; i p / E &RightArrow; r s E &RightArrow; i s
In formula: for p direction complex reflection coefficient, for s direction complex reflection coefficient, for p direction reflected field vector, for p direction incident electric field vector, for s direction reflected field vector, for s direction incident electric field vector, r digital reflex, i refers to incidence.
3. utilize ellipsometric parameter to measure a method for solid material surface roughness, it is characterized in that: a kind of method utilizing ellipsometric parameter to measure solid material surface roughness is specifically carried out according to following steps:
Step one, analog computation is carried out to different solid material rough surface features parameter, namely tried to achieve the spatial electromagnetic field distribution in this solid material rough surface near field by Three-dimensional Time Domain method of finite difference;
Wherein, described near field is be less than the electromagnetic field in 10 wavelength coverages;
External electromagnetic field refers to telegram in reply field and magnetic field
Rough surface features parameter refers to r.m.s. roughness and auto-correlation length;
Step 2, tried to achieve the telegram in reply field in far field by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database;
Wherein, described far field is often referred to distance sample is 10 5electromagnetic field outside individual wavelength;
Step 3, after solid material has been produced, optics ellipsometric parameter is recorded successively by the scanning area of measured surface radiation polarisation characteristic instrument, and compare with the optics ellipsometric parameter in database, obtain r.m.s. roughness and the auto-correlation length of this solid material surface, in computer, need according to the precision of solid material the error range setting corresponding optics ellipsometric parameter;
Error range is: | the optics ellipsometric parameter of the optics ellipsometric parameter calculated in database-record |≤accuracy value that arranges is needed according to solid material precision;
If when the optics ellipsometric parameter recorded is in error allowed band, then this solid material surface roughness meets the requirements;
If when the optics ellipsometric parameter recorded is not in error allowed band, then this solid material surface roughness is undesirable;
Computer record is used to occur the solid material numbering of error or directly use mechanical arm to be taken out by this solid material, Real-Time Monitoring solid material surface roughness.
4. a kind of method utilizing ellipsometric parameter to measure solid material surface roughness according to claim 3, be is characterized in that: the telegram in reply field of being tried to achieve far field in described step 2 by Near-far fields transfer extract the radiation polarisation characteristic of the telegram in reply field component calculating specular reflection direction of specular reflection direction from far field space elect magnetic field, radiation polarisation characteristic uses optics ellipsometric parameter to represent, and building database; Detailed process is:
The radiation polarisation characteristic calculating specular reflection direction adopts following formula to calculate:
Radiation polarisation characteristic uses optics ellipsometric parameter to represent; Optics ellipsometric parameter is divided into: optics ellipsometric parameter reflectance ratio real part Ψ and optics ellipsometric parameter reflectance ratio imaginary part △; Telegram in reply field be divided into with with set when calculating;
&rho; = t a n &Psi; exp ( i &Delta; ) = r &RightArrow; p r &RightArrow; s = E &RightArrow; r p E &RightArrow; i p / E &RightArrow; r s E &RightArrow; i s
In formula: for p direction complex reflection coefficient, for s direction complex reflection coefficient, for p direction reflected field vector, for p direction incident electric field vector, for s direction reflected field vector, for s direction incident electric field vector, r digital reflex, i refers to incidence.
CN201510341853.6A 2015-06-18 2015-06-18 A kind of method that utilization ellipsometric parameter measures solid material surface roughness Active CN104880161B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510341853.6A CN104880161B (en) 2015-06-18 2015-06-18 A kind of method that utilization ellipsometric parameter measures solid material surface roughness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510341853.6A CN104880161B (en) 2015-06-18 2015-06-18 A kind of method that utilization ellipsometric parameter measures solid material surface roughness

Publications (2)

Publication Number Publication Date
CN104880161A true CN104880161A (en) 2015-09-02
CN104880161B CN104880161B (en) 2017-07-28

Family

ID=53947750

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510341853.6A Active CN104880161B (en) 2015-06-18 2015-06-18 A kind of method that utilization ellipsometric parameter measures solid material surface roughness

Country Status (1)

Country Link
CN (1) CN104880161B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108344698A (en) * 2018-02-24 2018-07-31 哈尔滨工业大学 Ellipse folk prescription method based on electromagnetism first principle inverting rough surface optical constant
CN110470608A (en) * 2019-08-15 2019-11-19 杭州电子科技大学 A kind of method and device using polarization imaging measurement object smoothness

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0676033B1 (en) * 1992-12-28 1998-05-06 Microspace Mess- Und Sensortechnik Gmbh Process and device for measuring geometries of technical surfaces
CN102082108A (en) * 2010-10-26 2011-06-01 华中科技大学 Method and device for rapidly measuring sidewall appearance of micro-nano deep groove structure
CN103115927A (en) * 2013-02-04 2013-05-22 中国人民解放军国防科学技术大学 Nondestructive testing method for optical glass polishing sub-surface damages
US20130278926A1 (en) * 2010-12-27 2013-10-24 Hitachi High-Technologies Corporation Measuring Apparatus
CN104502282A (en) * 2015-01-21 2015-04-08 哈尔滨工业大学 Polarization property numerical computation method considering photonic crystal surface oxidation film distribution

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0676033B1 (en) * 1992-12-28 1998-05-06 Microspace Mess- Und Sensortechnik Gmbh Process and device for measuring geometries of technical surfaces
CN102082108A (en) * 2010-10-26 2011-06-01 华中科技大学 Method and device for rapidly measuring sidewall appearance of micro-nano deep groove structure
US20130278926A1 (en) * 2010-12-27 2013-10-24 Hitachi High-Technologies Corporation Measuring Apparatus
CN103115927A (en) * 2013-02-04 2013-05-22 中国人民解放军国防科学技术大学 Nondestructive testing method for optical glass polishing sub-surface damages
CN104502282A (en) * 2015-01-21 2015-04-08 哈尔滨工业大学 Polarization property numerical computation method considering photonic crystal surface oxidation film distribution

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108344698A (en) * 2018-02-24 2018-07-31 哈尔滨工业大学 Ellipse folk prescription method based on electromagnetism first principle inverting rough surface optical constant
CN110470608A (en) * 2019-08-15 2019-11-19 杭州电子科技大学 A kind of method and device using polarization imaging measurement object smoothness

Also Published As

Publication number Publication date
CN104880161B (en) 2017-07-28

Similar Documents

Publication Publication Date Title
CN101655352B (en) Measurement method of three-dimensional speckle strain measurement device
CN104613883B (en) The wet-film thickness difference measurement of sheet metal printed coating and uniformity appraisal procedure
CN103591888B (en) The measuring method of large-caliber off-axis non-spherical optical element geometric parameter
PI et al. Measure strain distribution using digital image correlation (DIC) for tensile tests
CN102426170B (en) Holographic inversion detection method for micro-cracks on damaged layer of subsurface of brittle material
CN109540007B (en) Measuring method and measuring device for ultra-thick film
Shen et al. Study on laser speckle correlation method applied in triangulation displacement measurement
CN106595501A (en) Method of measuring thickness or uniformity of optical thin film
JP2015143666A (en) Dielectric refraction index detection method and apparatus therefor, film thickness detection method and apparatus therefor, and surface roughness detection method and apparatus therefor
CN114543690A (en) Optical characteristic modeling method, photoacoustic measurement method and device
Chen et al. Full-field wafer level thin film stress measurement by phase-stepping shadow Moire/spl acute
Leach et al. Infidelity and the calibration of optical surface topography measuring instruments
Pang et al. An investigation of plastic behaviour in cold-rolled aluminium alloy AA2024-T3 using laser speckle imaging sensor
CN104880161A (en) Method for measuring solid material surface roughness by using elliptical polarization parameter
CN106018201B (en) Mixing field particle size measurement procedure based on mean filter
CN101986097B (en) Method for eliminating defocusing error and tilt error in spherical surface shape interference detection at high precision
Wang et al. Laser integrated measurement of surface roughness and micro-displacement
CN104655496B (en) The method of testing conducted oneself with dignity on the influence of off axis reflector mirror surface-shaped
CN103559329A (en) Method for measuring rough nano structure feature parameters in optical scattering measurement
Djuzhev et al. Non-destructive method of surface mapping to improve accuracy of mechanical stresses measurements
CN108344698B (en) Ellipsometry method for inverting rough surface optical constant based on electromagnetic first-order principle
Zuev et al. Measuring the geometric parameters of ice by phase triangulation method in a limited volume with refraction of optical signals
CN115112016A (en) Three-dimensional size detection method for surface defects of optical element
Xue et al. Measurement of thin liquid film thickness in pipes based on optical interferometry
CN109781043A (en) Heat exchange fin key parameter calculation method and analytical calculation platform

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
EXSB Decision made by sipo to initiate substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant