CN104875523A - Optical anti-fake element and product and method and device for manufacturing optical anti-fake element - Google Patents
Optical anti-fake element and product and method and device for manufacturing optical anti-fake element Download PDFInfo
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- CN104875523A CN104875523A CN201510266392.0A CN201510266392A CN104875523A CN 104875523 A CN104875523 A CN 104875523A CN 201510266392 A CN201510266392 A CN 201510266392A CN 104875523 A CN104875523 A CN 104875523A
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Abstract
The invention provides an optical anti-fake element and product and a method and device for manufacturing the optical anti-fake element. The method comprises the steps that a groove of a first printing roller is filled with a first radiation curing material; the first radiation curing material on the part except the groove of the first printing roller is removed; the first radiation curing material in the groove of the first printing roller makes contact with the upper surface of a base material; a first radiation curing source is used for carrying out radiation curing on the first radiation curing material, and the combining strength of the first radiation curing material and the base material is larger than that of the first radiation curing material and the first printing roller after radiation curing; the base material and the first printing roller are separated, and therefore the first radiation curing material can be peeled off the groove of the first printing roller and attached to the upper surface of the base material, and a micro image-text pattern is formed through the peeled first radiation curing material. By mean of the method and the device, efficient, batched and stable production can be achieved, and the public attraction and anti-fake capability can be improved through the optical anti-fake element and product.
Description
Technical field
The present invention relates to optical anti-counterfeiting field, particularly relate to a kind of optical anti-counterfeit element and product and prepare the method and apparatus of optical anti-counterfeit element.
Background technology
In order to prevent the forgery utilizing the means such as scanning and duplicating to produce, being widely used Techniques of Optical Security in all kinds of high safety such as banknote, card and the packing of product or high added value printed matter, and achieving extraordinary effect.
The optical anti-counterfeit element of same class respectively with microlens array and micro-picture and text array on two surfaces of base material is disclosed in the patent documents such as CN101563640, CN101443692, CN101120139, CN101346244, US5712731, US0034082, US4765656, US4892336, CN1271106, CN1552589, wherein, micro-picture and text array is positioned near the focal plane of microlens array, reproduces by More's amplification of microlens array to micro-picture and text array the pattern having certain depth of field or present dynamic effect.
For ensureing that the pattern that More amplifies all is easy to identify under different environment light source conditions, micro-picture and text array and background thereof need enough colors or luminance contrast, namely need to carry out painted to micro-picture and text array.Due to the structure of required micro-picture and text array very meticulous (about several micron), so general printing technology is difficult to reach this fineness.There is the method that two classes are painted at present.One class methods are as disclosed in the patent documents such as CN1906547A: the depression forming certain depth at micro-image-text area, utilize doctor blade process to be filled in depression by coloured material, and the excess stock outside micro-image-text area struck off substantially.Painted preferably for realizing, this method has larger restriction to the line thickness of micro-picture and text and cup depth and the two matching relationship.Another kind of painted way utilizes micro-nano structure, utilize the optical absorption structure of large depth-to-width ratio painted to the micro-picture and text realizing black as patent document US20030179364 discloses, patent document US20100307705A1 discloses and utilizes the metal Nano structure of nano particle filling or stepped ramp type to realize the painted of micro-picture and text.
Above colorize method also exists various defect: method disclosed in CN101379423 and US20030179364 is all difficult to realize the painted of colorize; The stepped ramp type structure that US20100307705A1 utilizes and the plane coverage mode of coating to described structure are difficult to realize aborning.
In addition, micro-printing processes such as current meticulous gravure, nano impression also can improve the fineness of printing figure message to a certain extent, but meticulous gravure is difficult to obtain the pattern line being less than 30 microns, and gravure needs larger pressure, easily cause the distortion of printed patterns and base material, affect the quality of picture and text.The emerging technologies such as nano impression do not have the feasibility copying production in enormous quantities.
A kind of typical way is in addition: adopt the radiation curing material with color characteristic extruded on gravure printing roller surface, then peel off, afterwards radiation curing is carried out to the radiation curing material separated after shaping, the defect of this method is because in extruded process, radiation curing material is non-solid, can not ensure that pattern on gravure printing roller is by complete copy, and the radiation curing material of non-solid will produce the distortion phenomenons such as the broadening of stroke when peeling off, groove simultaneously in roller can fill by the radiation curing material that inevitably remains, the efficiency of impact batch production and quality.
To sum up, need a kind of technology badly to prepare the optical anti-counterfeit element and optical anti-counterfeiting product with high-resolution, high-fineness and high-contrast pattern, and realize efficient, batch and steady production.
Summary of the invention
The invention provides a kind of optical anti-counterfeit element and product and prepare the method and apparatus of optical anti-counterfeit element, the method and equipment can realize efficiently, batch and stable production, and prepared optical anti-counterfeit element and product have micro-picture and text pattern of high-resolution, high-fineness and high-contrast, public's attraction of prepared optical anti-counterfeit element and product and anti-forgery ability can be improved.
The invention provides a kind of method preparing optical anti-counterfeit element, this optical anti-counterfeit element comprises base material and is positioned at the micro-picture and text pattern on described base material upper surface, and the method comprises:
In the groove of the first roller, fill the first radiation curing material, the recess width of described first roller be micron even sub-micrometer scale reach micron even sub-micrometer scale with the fineness of the identical micro-picture and text pattern that makes to distribute with the groove of described first roller;
Described first radiation curing material beyond the groove that removing is positioned at described first roller in part;
The first radiation curing material in the groove of described first roller is contacted with the upper surface of described base material;
Utilize the first radiation curing source to carry out radiation curing to described first radiation curing material, and after radiation curing, the bond strength of described first radiation curing material and described base material is greater than the bond strength of described first radiation curing material and described first roller; And
Described base material is separated with described first roller, to make described first radiation curing material peel off from the groove of described first roller and depend on the upper surface of described base material, thus form described micro-picture and text pattern by described first radiation curing material peeled off.
The present invention also provides a kind of optical anti-counterfeit element adopting said method to prepare.
The present invention also provides a kind of optical anti-counterfeiting product with above-mentioned optical anti-counterfeit element.
The present invention also provides a kind of equipment preparing optical anti-counterfeit element, and this optical anti-counterfeit element comprises base material and is positioned at the micro-picture and text pattern on described base material upper surface, and this equipment comprises:
Be with reeded first roller, the recess width of described first roller be micron even sub-micrometer scale reach micron even sub-micrometer scale with the fineness of the identical described micro-picture and text pattern that makes to distribute with the groove of described first roller;
First radiation curing material providing unit, for filling the first radiation curing material in the groove of described first roller;
Clearing cell, removes described first radiation curing material beyond the groove being positioned at described first roller in part after carrying out described filling in described first radiation curing material providing unit;
First osculating element, makes the first radiation curing material in the groove of described first roller contact with the upper surface of described base material after carrying out described removing in described clearing cell;
First radiation curing source, to described first radiation curing material carries out radiation curing after contacting for the first radiation curing material in the groove of described first roller with the upper surface of described base material; And
First separative element, after carrying out radiation curing in described first radiation curing source, described base material and described first roller are separated, to make described first radiation curing material peel off from the groove of described first roller and depend on the upper surface of described base material, thus form described micro-picture and text pattern by described first radiation curing material peeled off.
Recess width due to the first roller adopted in preparation in accordance with the present invention and Preparation equipment is micron even sub-micrometer scale, so can make micro-picture and text pattern of high-resolution, high-fineness; Because the first radiation curing material in part beyond the groove of the first roller is removed, and make the first radiation curing material namely depend on the upper surface of base material with solid-state form before stripping by radiation curing technology, so ensure that base material upper surface has micro-picture and text area of the pattern and the obvious contrast without micro-picture and text area of the pattern, and intactly can copy the groove of the first roller, ensure that optical anti-counterfeit element prepared in accordance with the present invention and optical anti-counterfeiting product have the anti-forgery ability of high contrast, stronger public's attraction and Geng Gao.And preparation in accordance with the present invention and Preparation equipment can realize efficiently, batch and stable production.
Accompanying drawing explanation
Shown in accompanying drawing, above-mentioned and other object of the present invention, Characteristics and advantages will be more clear.Reference numeral identical in whole accompanying drawing indicates identical part, and does not draw accompanying drawing according to actual size, and it is only for illustrating purport of the present invention.
Fig. 1 is the method flow diagram preparing optical anti-counterfeit element according to one embodiment of the present invention;
Fig. 2 a and 2b is profile and the top view of the optical anti-counterfeit element prepared according to one embodiment of the present invention respectively;
Fig. 3 is the profile of the optical anti-counterfeit element prepared according to one embodiment of the present invention;
Fig. 4 is the profile of the optical anti-counterfeit element prepared according to one embodiment of the present invention;
Fig. 5 is the schematic diagram preparing the equipment of optical anti-counterfeit element according to one embodiment of the present invention; And
Fig. 6 is another schematic diagram preparing the equipment of optical anti-counterfeit element according to one embodiment of the present invention.
Detailed description of the invention
Below in conjunction with embodiment, technical scheme of the present invention is clearly and completely described.Obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, the every other embodiment that those of ordinary skill in the art obtain under the prerequisite not making creative work, all falls within the scope of protection of the present invention.
As shown in Figure 1, in one embodiment, the invention provides a kind of method preparing optical anti-counterfeit element, this optical anti-counterfeit element comprises base material and is positioned at the micro-picture and text pattern on described base material upper surface, and the method comprises:
S1, in the groove of the first roller, fill the first radiation curing material, the recess width of described first roller be micron even sub-micrometer scale reach micron even sub-micrometer scale with the fineness of the identical micro-picture and text pattern that makes to distribute with the groove of described first roller.
Preferably, first radiation curing material is opaque, thus make on the upper surface of the final optical anti-counterfeit element formed, there is the difference that can to produce between the region of the first radiation curing material and the region without the first radiation curing material in transparency, to strengthen the contrast between these two regions, improve public's attraction of optical anti-counterfeit element prepared by preparation in accordance with the present invention and anti-forgery ability.
Preferably, first radiation curing material can also have specific color, make on the upper surface of the final optical anti-counterfeit element formed, there is the difference that can to produce between the first radiation curing material and the region without the first radiation curing material in color, to strengthen the contrast between these two regions, improve public's attraction of optical anti-counterfeit element prepared by preparation in accordance with the present invention and anti-forgery ability.
Preferably, first radiation curing material can also have color variation characteristic, described color variation characteristic can be such as the change with viewing angle and the color variation characteristic that produces, the color variation characteristic produced along with angle change that such as cholesteric liquid crystal material has after radiation curing.Similarly, can also make on the upper surface of the final optical anti-counterfeit element formed, there is the difference produced between the first radiation curing material and the region without the first radiation curing material on color variation characteristic.The color variation characteristic of the first radiation curing material improves public's attraction of optical anti-counterfeit element prepared by preparation in accordance with the present invention and anti-forgery ability.
Preferably, the first radiation curing material can be in the radiation curing materials such as uv radiation curing material, heat radiation curing materials, infra-red radiation curing materials, electron beam radiation cured material, visible radiation curing materials, photo-thermal mixed radiation curing materials any one or its combination.Typically, such as, the first radiation curing material can be any one or its combination in the materials such as esters of acrylic acid uv radiation curing material, epoxy resin uv radiation curing material, vinyl ethers uv radiation curing material, acrylate photo-thermal mixed radiation curing materials containing isocyanates.
Preferably, can the either method passed through in the methods such as coating, printing, evaporation, sputtering and deposition in the groove of the first roller, the first radiation curing material be filled.
Preferably, the cross sectional shape of the groove of the first roller preferably adopts rectangular configuration, and this will be conducive to the thickness uniformity of the first radiation curing material in the final micro-picture and text pattern formed.Certainly, the channel section shape of the first roller also can be such as the arbitrary shapes such as bevel, U-shaped, ellipse, polygon.
Recess width due to the first roller determines resolution ratio and the fineness of the final micro-picture and text pattern formed, also namely the recess width of the first roller is less, resolution ratio and the fineness of micro-picture and text pattern of final formation are higher, so, the recess width of the first roller is preferably less than 30 microns, more preferably be less than 15 microns, be more preferably less than 5 microns, be more preferably less than 1 micron.
In addition, the depth of groove of the first roller determines the filling thickness of the first radiation curing material in the groove of the first roller, this depth of groove filling thickness that is larger, the first radiation curing material is larger, and this is conducive to the reinforcement of the first radiation curing material color characteristic usually.So the depth of groove of the first roller is preferably greater than 0.1 micron, is more preferably greater than 1 micron, is more preferably greater than 5 microns.
Usually, the depth-to-width ratio of the groove of the first roller is larger, first radiation curing material is more difficult to be stripped out from the groove of the first roller in follow-up strip step, but the depth-to-width ratio of the groove of the first roller is larger, is more conducive to the color characteristic of reinforcement first radiation curing material and improves resolution ratio and the fineness of micro-picture and text pattern.Therefore, the depth-to-width ratio of the groove of the first roller should meet such condition, namely can be stripped out by the first radiation curing material from the groove of the first roller in follow-up strip step and make the first peeled off radiation curing material intactly can reduce the groove shapes of the first roller.First radiation curing material mentioned above especially uv radiation curing material all can be peeled off and intactly reduce the groove shapes of the first roller from the first roller groove of high-aspect-ratio, will be conducive to the continuous high quality of production of micro-picture and text pattern like this.
The first radiation curing material beyond the groove that S2, removing are positioned at described first roller in part.
The object of the first radiation curing material beyond the groove removing the first roller in part is in the first roller, form the first identical radiation curing material that to distribute with the groove of the first roller, makes the final high-resolution of formation, micro-picture and text pattern of high-fineness characterizes by the first radiation curing material similar shape in the groove of the first roller.Like this, just can according to the needs of design, freely formed micro-picture and text pattern of high-resolution, high-fineness by the permutation and combination of the groove of the first roller, make according to the preparation method of optical anti-counterfeit element of the present invention can efficiently, stable and perform in bulk.
Preferably, the first radiation curing material beyond the groove removing the first roller in part the method retaining the first radiation curing material in the groove of the first roller includes but not limited to following several:
(1) scrape: the surface of scraping the first roller with scraper or scraper etc., to be struck off with the first radiation curing material on exterior domain by the groove of the first roller, and the first radiation curing material in the groove of the first roller can not be subject to the impact of scraper or scraper substantially;
(2) extrude: utilize the cylinder roller of the materials such as metal to extrude the first roller, the first radiation curing material in the groove of the first roller cannot be squeezed out and be retained;
(3) wipe: if the rotation of above-mentioned cylinder roller and the first roller is asynchronous, then can be formed first edition roller and rub, thus to the groove of the first roller, there is with the first radiation curing material on exterior domain the effect of erasing;
(4) clean: utilize and with the first radiation curing material, the gas that dissolves or react can occur or liquid cleans with the first radiation curing material on exterior domain the groove of the first roller, described gas or liquid can such as adopt etchant gas, acid, aqueous slkali, organic solvent etc.
S3, the first radiation curing material in the groove of described first roller is contacted with the upper surface of described base material.
Preferably, the pressurizing unit of such as pressure roller and so on can be adopted to extrude base material, thus the upper surface of base material is contacted more fully with the first radiation curing material.
S4, utilize the first radiation curing source to carry out radiation curing to described first radiation curing material, and after radiation curing, the bond strength of described first radiation curing material and described base material is greater than the bond strength of described first radiation curing material and described first roller.
Kind according to the first radiation curing material is selected, the first radiation curing source can correspondingly adopt match ultraviolet light, heat, infrared, electron beam, visible ray, photo-thermal mixed radiation curing source etc.
Preferably, base material is at least translucent for the first radiation curing source, thus makes the first radiation curing source be positioned at below base material lower surface can carry out radiation curing through base material to the first radiation curing material.Such as, base material can be transparent PET material or other materials.
S5, described base material is separated with described first roller, to make described first radiation curing material peel off from the groove of described first roller and depend on the upper surface of described base material, thus form described micro-picture and text pattern by described first radiation curing material peeled off.
Preferably, before step S3, the method preparing optical anti-counterfeit element according to the present invention can also comprise: on the upper surface of base material, form the coating that can improve the bond strength of the first radiation curing material and base material.This coating can be formed on the upper surface of described base material by the method such as coating, printing, sputtering, deposition, evaporation.Preferably, this coating can be formed by the 3rd radiation curing material, and the 3rd radiation curing material also can be in the radiation curing materials such as uv radiation curing material, heat radiation curing materials, infra-red radiation curing materials, electron beam radiation cured material, visible radiation curing materials, photo-thermal mixed radiation curing materials any one or its combination.And, the 3rd radiation curing source can be utilized to carry out radiation curing to the 3rd radiation curing material.3rd radiation curing source can be selected according to the kind of the 3rd radiation curing material, and can be the radiation curing source such as ultraviolet light, heat, infrared, electron beam, visible ray, photo-thermal mixing.Certainly, in actual applications, if the first radiation curing material and base material upper surface can adhere to preferably, then described coating can not be formed in advance on the upper surface of base material.
It should be noted that, in steps of a method in accordance with the invention, first utilize in step s 4 which the first radiation curing source to carry out radiation curing to described first radiation curing material then just to carry out step S5 and be separated with described first roller to make described base material, after the advantage of such arrangement is that namely the first radiation curing material also completes solidification after the first roller place is shaping, when making base material be separated with the first roller, the first radiation curing material peels off from the first roller with solid-state form, thus ensure that micro-picture and text pattern of gained be to the micro-picture and text pattern in the first roller relatively complete copy (comprise to the first roller further groove shape copy and pattern stroke sharp keen without diffusion etc.), and farthest decrease the first radiation curing material remaining at the first roller place, improve efficiency and the quality of batch production.
Preferably, after step s 5, the second radiation curing source can be utilized to carry out one or many Post RDBMS, this the second radiation curing source can be cured the first radiation curing material and the coating be optionally previously formed on base material upper surface simultaneously, thus improve the state of cure of the first radiation curing material, or strengthen the bond strength of the coating on the first radiation curing material and base material or base material upper surface.Second radiation curing source also can be any one in the radiation curing source such as ultraviolet light, heat, infrared, electron beam, visible ray, photo-thermal mixing.
Preferably, after step s 5 or utilizing after the second radiation curing source carries out one or many Post RDBMS, the method preparing optical anti-counterfeit element according to the present invention can also comprise: on the lower surface of base material, form sampling synthesis layer, synthesizes layer carry out imaging to described micro-picture and text pattern to utilize described sampling.
Preferably, following methods can be adopted formed sampling synthesis layer to comprise: in the groove of the second roller, to fill the second radiation curing material, or on the lower surface of described base material, form the second radiation curing material; Described second roller is contacted with the lower surface of described base material; Utilize the 4th radiation curing source to carry out radiation curing to described second radiation curing material, and after radiation curing, the bond strength of described second radiation curing material and described base material is greater than the bond strength of described second radiation curing material and described second roller; And described base material is separated with described second roller, to make described second radiation curing material peel off from the groove of described second roller and depend on the lower surface of described base material, thus form described sampling synthesis layer by described second radiation curing material peeled off.
Preferably, the second radiation curing material can be in the radiation curing materials such as uv radiation curing material, heat radiation curing materials, infra-red radiation curing materials, electron beam radiation cured material, visible radiation curing materials, photo-thermal mixed radiation curing materials any one or its combination.And the 4th radiation curing source can be selected according to the kind of the second radiation curing material, such as, the radiation curing source such as the ultraviolet light of coupling, heat, infrared, electron beam, visible ray, photo-thermal mixing can correspondingly be adopted.
Certainly, additive method well known to those skilled in the art can also be adopted formed second radiation curing material of sampling synthesis needed for layer, such as evaporation, sputtering, deposition etc.
Preferably, sampling synthesis layer can be micro-lens arrays layer or other micro-sampling tool multiple that can carry out imaging to micro-picture and text pattern.Wherein, micro-lens arrays layer can be the aperiodic array be made up of multiple lenticule unit, randomness array, cyclic array, local period array or their any combination, lenticule unit simultaneously in micro-lens arrays layer can be refractive lenticule, diffraction type lenticule or their combination, wherein refractive lenticule can choose sphere, parabola, ellipsoid lenticule, cylindrical microlenses, or the lenticule based on geometric optics of other random geometry or their any combination, diffraction type lenticule can choose humorous diffraction microlens, planar diffraction lenticule, Fresnel zone plate.Wherein, except Fresnel zone plate, other lenticular concrete form can be chosen as continuous curve surface type or notch cuttype lens as lenticule unit.
Preferably, previously described micro-picture and text pattern can be arranged and formed by multiple micro-picture and text unit aperiodicity, randomness, periodicity and/or local period, and each micro-picture and text unit can be same to each other or different to each other.
Preferably, the cycle of the sampling synthesis layer of described periodicity or local period and micro-picture and text unit of micro-picture and text pattern can be 10 μm to 200 μm, is preferably 50 μm to 100 μm; The focal length of sampling synthesis layer can be 10 μm to 200 μm, is preferably 15 μm to 40 μm; The working depth of sampling synthesis layer is preferably less than 15 μm, is more preferably 0.5 μm to 10 μm.Preferably, the difference that the focal length of layer is synthesized in thickness and the sampling of base material is less than 3 microns, is more preferably less than 1 micron.
In one embodiment, the method preparing optical anti-counterfeit element according to the present invention can also comprise: on described sampling synthesis layer, form reflecting layer.The imaging of sampling synthesis layer to micro-picture and text pattern reflexes in human eye by this reflecting layer, thus can in the imaging of the micro-picture and text pattern of the upper surface unilateral observation of base material.
Preferably, described reflecting layer can be the multilayer dielectricity layer of single-layer medium layer (such as high refractive index medium layer), high refractive index medium layer and low refractive index dielectric layer composition, the sandwich construction that forms of metallic reflector or metallic reflector and dielectric layer.Different according to the structure in reflecting layer, reflex only can be played in reflecting layer, also can be attached with color or color variation characteristic.Reflecting layer can be formed by any means such as coating, printing, evaporation, sputtering, depositions.Preferably, can also be formed with pierced pattern in reflecting layer, wherein said pierced pattern can be macroscopic pattern, micro-word, meticulous lines etc.
In one embodiment, the present invention also provides a kind of and adopts prepared according to the methods of the invention optical anti-counterfeit element and the optical anti-counterfeiting product with this optical anti-counterfeit element.Such as, described optical anti-counterfeit element can be opened window safety line, and the thickness of this safety line is not more than 50 μm.Cheque paper with described opened window safety line may be used for the false proof of all kinds of high safety products such as banknote, passport, marketable securities.Described optical anti-counterfeit element can also be label, mark, wide bar, transparent window, overlay film etc., it can stick on various article by various bonding mechanism, be such as transferred on banknote, credit card, passport, the contour safety product of marketable securities and high value added product and each wrapping paper, packing box first-class.
Fig. 2 a and Fig. 2 b respectively illustrates the profile and top view that adopt the exemplary optics Security element prepared according to the preparation method of one embodiment of the present invention.As shown in Figure 2 a, this optical anti-counterfeit element comprises: base material 11; Be formed at micro-picture and text pattern stroke 21 of the high-fineness on the upper surface 111 of base material 11, high-resolution and high-contrast, the stroke width of this micro-picture and text pattern stroke 21 is 0.5 micron, its cross sectional shape is rectangle and this rectangle degree of depth is 0.5 micron.As shown in Figure 2 b, micro-picture and text pattern stroke 21 forms micro-picture and text unit 2, and the arrangement of micro-picture and text unit 2 constitutes macroscopical word 3.Owing to have employed according to above-mentioned preparation method of the present invention, make the stroke parameter of micro-picture and text unit 2 can have more various selection, the demand of the micro-picture and text pattern of high-fineness, high-resolution and high-contrast can be met, thus obtain micro-picture and text pattern with stronger anti-counterfeit capability, enhance the anti-counterfeit capability according to optical anti-counterfeit element of the present invention.
Fig. 3 is the profile adopting another exemplary optics Security element prepared according to the preparation method of one embodiment of the present invention, and this optical anti-counterfeit element comprises: base material 11; Be formed in the sampling synthesis layer 4 on the lower surface 112 of base material 11, such as, the cycle sphere microlens array that this sampling synthesis layer 4 can be made up of the spherical microlens unit of multiple rectangular arranged; And be formed in micro-picture and text pattern 5 of high-resolution, high-fineness and high-contrast on the upper surface 111 of base material 11, this micro-picture and text pattern 5 can be sampled synthesis layer 4 and to sample synthesis, thus can see the discernible specific image of human eye when lower surface 112 unilateral observation of human eye at base material 11.Wherein, the characteristics of image formed can for having the one or more effect characteristics in the effect such as sinking, floating, innervation, convergent-divergent, rotation, multichannel conversion, continuously depth of field change figure, 3-D graphic, continuous multiple frames animation.Relevant anti-counterfeiting characteristic can refer to Chinese patent application 201310596793.3,201410327932.7,200480040733.2.
Fig. 4 is the profile adopting the another exemplary optics Security element prepared according to the preparation method of one embodiment of the present invention, the difference part of the optical anti-counterfeit element shown in itself and Fig. 3 is, this optical anti-counterfeit element also comprises reflecting layer 6 further, thus make the direction of observation of human eye in upper surface 111 side of base material 11, also namely, the imaging that layer 4 is synthesized in sampling is reflexed in human eye by reflecting layer 6 after carrying out sampling synthesis also to micro-picture and text pattern 5 by sampling synthesis layer 4.
Because the micro-picture and text pattern 5 in optical anti-counterfeit element according to the present invention has high-resolution, high-fineness and high-contrast, so be conducive to improving sampling synthesis layer 4 the definition of image of synthesis of sample and contrast, make optical anti-counterfeit element according to the present invention be easy to identify and be difficult to forgery.
In one embodiment, as shown in Figure 5, the present invention also provides a kind of equipment preparing optical anti-counterfeit element, micro-picture and text pattern that this optical anti-counterfeit element comprises base material 11 and is positioned on the upper surface 111 of base material 11, this equipment comprises: with first roller 144 of fluted 1441, groove 1441 width of described first roller 144 be micron even sub-micrometer scale reach micron even sub-micrometer scale with the fineness of the identical described micro-picture and text pattern that makes to distribute with the groove 1441 of the first roller 144; First radiation curing material providing unit 15, for filling the first radiation curing material in the groove 1441 of the first roller 144; Clearing cell 16, removes described first radiation curing material beyond the groove 1441 being positioned at the first roller 144 in part after carrying out described filling in the first radiation curing material providing unit 15; First osculating element 147, makes the first radiation curing material in the groove 1441 of the first roller 144 contact with the upper surface 111 of base material 11 after carrying out described removing in clearing cell 16; First radiation curing source 148, to described first radiation curing material carries out radiation curing after contacting for the first radiation curing material in the groove 1441 of the first roller 144 with the upper surface 111 of described base material 11; And first separative element 140, after carrying out radiation curing in the first radiation curing source 148, base material 11 and the first roller 144 are separated, to make described first radiation curing material peel off from the groove 1441 of the first roller 144 and depend on the upper surface 111 of base material 11, thus form described micro-picture and text pattern by described first radiation curing material peeled off.
Preferably, the groove 1441 of the first roller 144 directly can be processed on the surface of the first roller 144 by chemical attack, laser etching process etc., and the micro fabrication such as laser direct-writing, electron beam exposure maybe can be adopted to obtain the reeded master of band and then copy as by the mode of electroforming the surface that metallic plate is coated on the first roller 144.Groove 1441 width of the first roller 144 obtained so just can be made to have the micron even size of sub-micrometer scale.
Preferably, the cross sectional shape of the groove 1441 of the first roller 144 preferably adopts rectangular configuration, and this will be conducive to the thickness uniformity of the first radiation curing material in the final micro-picture and text pattern formed.Certainly, groove 1441 cross sectional shape of the first roller 144 also can be such as the arbitrary shapes such as bevel, U-shaped, ellipse, polygon.
Groove 1441 width due to the first roller 144 determines resolution ratio and the fineness of the final micro-picture and text pattern formed, also namely groove 1441 width of the first roller 144 is less, resolution ratio and the fineness of micro-picture and text pattern of final formation are higher, so, groove 1441 width of the first roller 144 is preferably less than 30 microns, more preferably be less than 15 microns, be more preferably less than 5 microns, be more preferably less than 1 micron.
In addition, groove 1441 degree of depth of the first roller 144 determines the filling thickness of the first radiation curing material in the groove 1441 of the first roller 144, this depth of groove filling thickness that is larger, the first radiation curing material is larger, and this is conducive to the reinforcement of the first radiation curing material color characteristic usually.So groove 1441 degree of depth of the first roller 144 is preferably greater than 0.1 micron, is more preferably greater than 1 micron, is more preferably greater than 5 microns.
Usually, the depth-to-width ratio of the groove 1441 of the first roller 144 is larger, first radiation curing material is more difficult to be stripped out from the groove 1441 of the first roller 144 in follow-up strip operation, but the depth-to-width ratio of the groove 1441 of the first roller 144 is larger, is more conducive to the color characteristic of reinforcement first radiation curing material and improves resolution ratio and the fineness of micro-picture and text pattern.Therefore, the depth-to-width ratio of the groove 1441 of the first roller 144 should meet such condition, namely can be stripped out by the first radiation curing material from the groove 1441 of the first roller 144 in follow-up strip operation and make the first peeled off radiation curing material intactly can reduce groove 1441 shape of the first roller 144.
Preferably, first roller 144 can adopt the stronger material of patience particularly metal material make, thus ensure to remove by clearing cell 16 groove 1441 being positioned at the first roller 144 not to affect the first roller 144 life-span with the process of the first radiation curing material on exterior domain, make it possible to the optical anti-counterfeit element producing high-resolution, high-fineness and high-contrast expeditiously in batches.
In practical application, the first roller 144 is not limited to above-described materials and process and selects, and such as the first roller 144 can also adopt the materials such as pottery, resin, composite to be formed.
Preferably, as shown in Figure 5, the first radiation curing material providing unit 15 can comprise: the first radiation curing material groove 142, for storing the first radiation curing material; First draws roller 141, for drawing the first radiation curing material from the first radiation curing material groove 142; And first delivery roll 143, the first radiation curing material drawn for drawing roller 141 by first is delivered in the groove 1441 of the first roller 144.More preferably, first draws on roller 141 and can be equipped with scraper or scraper, to make being more evenly distributed thus making the first delivery roll 143 be coated with the first radiation curing material equably in the first roller 144 of the first radiation curing material on the first delivery roll 143, this scraper or scraper can also control the thickness of the first radiation curing material on the first delivery roll 143.The first radiation curing material providing unit 15 shown in Fig. 5 is similar to a kind of apparatus for coating, should be understood that, the structure of the first radiation curing material providing unit 15 is not limited to shown in Fig. 5, it can also be printing equipment well known to those skilled in the art, sputter equipment, precipitation equipment or evaporation coating device etc., thus makes the first radiation curing material providing unit 15 can fill the first radiation curing material by technology such as coating, printing, sputtering, deposition or evaporations in the groove 1441 of the first roller 144.
Preferably, clearing cell 16 can comprise kicker cylinder 145, the first radiation curing material beyond the groove 1441 removing the first roller 144 in part.Wherein, kicker cylinder 145 can be equipped with scraper or scraper, thus the surface of the first roller 144 can be scraped with scraper or scraper etc., to be struck off with the first radiation curing material on exterior domain by the groove 1441 of the first roller 144, and the first radiation curing material in the groove 1441 of the first roller 144 can not be subject to the impact of scraper or scraper substantially.Kicker cylinder 145 can also be the hard and cylinder roller of solid material such as metal, utilizes this cylinder roller to extrude the first roller 144, makes the first radiation curing material in the groove 1441 of the first roller 144 to be squeezed out and to be retained; Certainly, if the cylinder roller of the materials such as this metal is asynchronous with the rotation of the first roller 144, so along with the rotation of the first roller 144, relatively rotating between this cylinder roller and the first roller 144 can produce friction, this cylinder roller has the effect of extruding to the first roller 144 simultaneously, thus by the groove 1441 of the first roller 144 with the first radiation curing material erasing on exterior domain.In addition, kicker cylinder 145 can also utilize and with the first radiation curing material, the gas that dissolves or react can occur or liquid cleans with the first radiation curing material on exterior domain the groove 1441 of the first roller 144, and described gas or liquid can such as adopt etchant gas, acid, aqueous slkali, organic solvent etc.
Preferably, clearing cell 16 can also comprise rinse bath 146, fills the material cleaned the first radiation curing material in rinse bath 146, thus is cleaned up by the first radiation curing material that described kicker cylinder 145 takes in described rinse bath 146.
Preferably, first osculating element 147 can be pressure roller or pressurizing unit like this, and this first osculating element 147 can also extrude the upper surface 111 of described base material 11 is contacted more fully with described first radiation curing material to base material 11 while making base material 11 contact with the first roller 144.
Preferably, the equipment preparing optical anti-counterfeit element according to the present invention can also comprise coating formation unit 13, forms the coating of the bond strength that can improve the first radiation curing material and base material 11 for the first radiation curing material in the groove 1441 of the first roller 144 with the upper surface 111 of base material 11 before contacting on the upper surface 111 of base material 11.This coating formation unit 13 can pass through the method such as coating, printing, sputtering, deposition, evaporation and form described coating on the upper surface 111 of base material 11.
Preferably, coating formation unit 13 can comprise: coating groove 132, for storing described coating; Coating draws roller 131, for drawing described coating from coating groove 132; And coating delivery roll 133, the coating drawn for coating being drawn roller 131 is delivered to the upper surface 111 of base material 11.Preferably, coating is drawn on roller 131 can be equipped with scraper or scraper, be more evenly distributed to make the coating on coating delivery roll 133 thus make coating delivery roll 133 on the upper surface 111 of base material 11, transmit described coating equably, and this scraper or scraper can also control the coating material thickness on coating delivery roll 133.Should be understood that, the coating formation unit 13 shown in Fig. 5 is only a kind of example, can also form described coating by arbitrary equipment such as other coatings well known to those skilled in the art, printing, sputtering, deposition and evaporations on the upper surface 111 of base material 11.
Preferably, the equipment preparing optical anti-counterfeit element according to the present invention can also comprise the 3rd radiation curing source 134, for carrying out radiation curing when described coating is formed by the 3rd radiation curing material to described coating.
Preferably, the equipment preparing optical anti-counterfeit element according to the present invention can also comprise the second radiation curing source 149, one or many Post RDBMS is carried out after being separated with the first roller 144 at base material, to be cured the first radiation curing material and the described coating be optionally previously formed on the upper surface 111 of base material 11, thus improve the state of cure of the first radiation curing material, or strengthen the bond strength of the coating on the first radiation curing material and base material 11 or base material upper surface 111.According to the Material selec-tion of the first radiation curing material and possible described coating, the second radiation curing source 149 can be any one in the radiation curing source such as ultraviolet light, heat, infrared, electron beam, visible ray, photo-thermal mixing.
Preferably, as shown in Figure 6, the equipment preparing optical anti-counterfeit element according to the present invention can also comprise sampling synthesis layer forming unit 17, synthesizes layer for the sampling formed on the lower surface 112 of base material 11 described micro-picture and text pattern carries out imaging after being separated with the first roller 144 at base material 11.
Preferably, sampling synthesis layer forming unit 17 can comprise: be with the groove of reeded second roller 154, second roller 154 to distribute and distribute identical with the described pattern synthesized in layer of sampling; Second radiation curing material providing unit 17a, for providing the second radiation curing material or provide described second radiation curing material on the lower surface 112 of base material 11 in the groove of the second roller 154; Second osculating element 155, makes described second roller 154 contact with the lower surface 112 of base material 11 after providing described in completing at described second radiation curing material providing unit 17a; 4th radiation curing source 156, carries out radiation curing to described second radiation curing material after completing described operating of contacts at the second osculating element 155; And second separative element 158, for base material 11 and the second roller 154 being separated after described second radiation curing material is by radiation curing, to make described second radiation curing material peel off from the groove of the second roller 154 and depend on the lower surface 112 of base material 11, thus form described sampling synthesis layer by described second radiation curing material peeled off.An illustrative embodiments of above-mentioned synthesis layer forming unit 17 of just sampling, should be understood that, the technology and equipment of other preparation sampling synthesis layers well known to those skilled in the art all may be used for the sampling synthesis layer described in formation.
Preferably, the second radiation curing material providing unit 17a can comprise: the second radiation curing material groove 152, for storing described second radiation curing material; Second draws roller 151, for drawing described second radiation curing material from the second radiation curing material groove 152; And second delivery roll 153, the second radiation curing material drawn for drawing roller 151 by second is delivered to the groove of the second roller 154 or the lower surface 112 at base material 11.Preferably, second draws on roller 151 and can be equipped with scraper or scraper, be more evenly distributed to make the coating on the second delivery roll 153 thus make the second delivery roll 153 on the lower surface 112 of base material 11 or in the groove of the second roller 154, transmit the second radiation curing material equably, and this scraper or scraper can also control the thickness of the second delivery roll 153 second radiation curing material.Should be understood that, the second radiation curing material providing unit 17a shown in Fig. 6 is only a kind of example, can also provide the second radiation curing material by arbitrary equipment such as other coatings well known to those skilled in the art, printing, sputtering, deposition and evaporations.
Preferably, the second osculating element 155 can be pressure roller or pressurizing unit like this.
Preferably, sampling synthesis layer forming unit 17 can also comprise the 5th radiation curing source 157, one or many Post RDBMS is carried out after being separated with the second roller 154 at base material 11, thus improve the state of cure of the second radiation curing material, strengthen the bond strength of the lower surface 112 of the second radiation curing material and base material 11.According to the type of the second radiation curing material, the 5th radiation curing source 157 can be any one in the radiation curing source such as ultraviolet light, heat, infrared, electron beam, visible ray, photo-thermal mixing.
Preferably, the equipment preparing optical anti-counterfeit element according to the present invention can also comprise the reflecting layer forming unit (not shown) for forming reflecting layer on described sampling synthesis layer, this reflecting layer forming unit can form reflecting layer by any one method such as coating, printing, sputtering, deposition, evaporation, and the equipment in any formation reflecting layer well known to those skilled in the art can be adopted to realize.
Above-describedly prepare in the equipment of optical anti-counterfeit element, the first separative element 140 and the second separative element 158 can be same device, and it can be the conveyer that base material 11 can be driven to advance of such as conveyer belt and so on.As illustrated in Figures 5 and 6, this conveyer can drive base material 11 to advance along the direction shown in label 12, thus progressively completes the preparation according to optical anti-counterfeit element of the present invention.
Adopt of the present invention prepare optical anti-counterfeit element preparation method and equipment also can realize the making of the pattern of polychrome feature, such as by the unit 14 shown in base material Multiple through then out Fig. 6, or by this units in series multiple, wherein each unit adopts the radiation curing material of identical or different color characteristic respectively thus forms the pattern of polychrome feature.
Below some preferred embodiment of the present invention is only exemplarily described.But it will be understood by those skilled in the art that under the prerequisite not departing from design of the present invention and spirit, various equivalents or amendment can be made to the present invention, and the technical scheme so obtained also should belong to protection scope of the present invention.
Claims (39)
1. prepare a method for optical anti-counterfeit element, this optical anti-counterfeit element comprises base material and is positioned at the micro-picture and text pattern on described base material upper surface, and the method comprises:
In the groove of the first roller, fill the first radiation curing material, the recess width of described first roller be micron even sub-micrometer scale reach micron even sub-micrometer scale with the fineness of the identical micro-picture and text pattern that makes to distribute with the groove of described first roller;
Described first radiation curing material beyond the groove that removing is positioned at described first roller in part;
The first radiation curing material in the groove of described first roller is contacted with the upper surface of described base material;
Utilize the first radiation curing source to carry out radiation curing to described first radiation curing material, and after radiation curing, the bond strength of described first radiation curing material and described base material is greater than the bond strength of described first radiation curing material and described first roller; And
Described base material is separated with described first roller, to make described first radiation curing material peel off from the groove of described first roller and depend on the upper surface of described base material, thus form described micro-picture and text pattern by described first radiation curing material peeled off.
2. method according to claim 1, wherein, described first radiation curing material is opaque and/or have specific color and/or have color variation characteristic.
3. method according to claim 2, wherein, described first radiation curing material is uv radiation curing material, heat radiation curing materials, infra-red radiation curing materials, electron beam radiation cured material, visible radiation curing materials, in photo-thermal mixed radiation curing materials any one or its combination, preferably, described first radiation curing material is esters of acrylic acid uv radiation curing material, epoxy resin uv radiation curing material, vinyl ethers uv radiation curing material, in acrylate photo-thermal mixed radiation curing materials containing isocyanates any one or its combination.
4. method according to claim 1, wherein, fills described first radiation curing material by the either method in coating, printing, evaporation, sputtering and deposition in the groove of described first roller.
5. method according to claim 1, wherein, described first radiation curing material beyond the groove being positioned at described first roller by the either method removing in scraping, extrude, wipe and cleaning in part.
6. the method according to claim arbitrary in claim 1 to 5, after the first radiation curing material in the groove making described first roller contacts with the upper surface of described base material, the method also comprises: extrude described base material.
7. the method according to claim arbitrary in claim 1 to 6, after described base material is separated with described first roller, the method also comprises: utilize the second radiation curing source to carry out one or many Post RDBMS.
8. the method according to claim arbitrary in claim 1 to 7, wherein, the cross sectional shape of the groove of described first roller is any one or its combination in rectangle, bevel, U-shaped, ellipse, polygon.
9. the method according to claim arbitrary in claim 1 to 8, wherein, the recess width of described first roller is less than 30 microns, is preferably less than 15 microns, is more preferably less than 5 microns, is more preferably less than 1 micron.
10. the method according to claim arbitrary in claim 1 to 8, wherein, the depth of groove of described first roller is greater than 0.1 micron, is preferably more than 1 micron, is more preferably greater than 5 microns.
11. methods according to claim arbitrary in claim 1 to 10, before the first radiation curing material in the groove making described first roller contacts with the upper surface of described base material, the method also comprises:
The upper surface of described base material is formed the coating that can improve the bond strength of described first radiation curing material and described base material.
12. methods according to claim 11, wherein, described coating is formed by the 3rd radiation curing material, and the method also comprises: utilize the 3rd radiation curing source to carry out radiation curing to described 3rd radiation curing material.
13. methods according to claim arbitrary in claim 1 to 12, after the described micro-picture and text pattern of formation, the method also comprises: on the lower surface of described base material, form sampling synthesis layer, synthesizes layer carry out imaging to described micro-picture and text pattern to utilize described sampling.
14. methods according to claim 13, wherein, thickness and the described difference of sampling the focal length synthesizing layer of described base material are less than 3 microns, are preferably less than 1 micron.
15. methods according to claim 13 or 14, wherein, the lower surface of described base material are formed sampling synthesis layer and comprise:
In the groove of the second roller, fill the second radiation curing material, or on the lower surface of described base material, form the second radiation curing material;
Described second roller is contacted with the lower surface of described base material;
Utilize the 4th radiation curing source to carry out radiation curing to described second radiation curing material, and after radiation curing, the bond strength of described second radiation curing material and described base material is greater than the bond strength of described second radiation curing material and described second roller; And
Described base material is separated with described second roller, to make described second radiation curing material peel off from the groove of described second roller and depend on the lower surface of described base material, thus forms described sampling synthesis layer by described second radiation curing material peeled off.
16. according to claim 13 to the method described in arbitrary claim in 15, and the method also comprises: on described sampling synthesis layer, form reflecting layer.
17. 1 kinds of optical anti-counterfeit elements adopting the method in claim 1 to 16 described in arbitrary claim to prepare.
18. 1 kinds of optical anti-counterfeiting products with optical anti-counterfeit element according to claim 17.
19. 1 kinds of equipment preparing optical anti-counterfeit element, this optical anti-counterfeit element comprises base material and is positioned at the micro-picture and text pattern on described base material upper surface, and this equipment comprises:
Be with reeded first roller, the recess width of described first roller be micron even sub-micrometer scale reach micron even sub-micrometer scale with the fineness of the identical described micro-picture and text pattern that makes to distribute with the groove of described first roller;
First radiation curing material providing unit, for filling the first radiation curing material in the groove of described first roller;
Clearing cell, removes described first radiation curing material beyond the groove being positioned at described first roller in part after carrying out described filling in described first radiation curing material providing unit;
First osculating element, makes the first radiation curing material in the groove of described first roller contact with the upper surface of described base material after carrying out described removing in described clearing cell;
First radiation curing source, to described first radiation curing material carries out radiation curing after contacting for the first radiation curing material in the groove of described first roller with the upper surface of described base material; And
First separative element, after carrying out radiation curing in described first radiation curing source, described base material and described first roller are separated, to make described first radiation curing material peel off from the groove of described first roller and depend on the upper surface of described base material, thus form described micro-picture and text pattern by described first radiation curing material peeled off.
20. equipment according to claim 19, wherein, described first radiation curing material providing unit comprises:
First radiation curing material groove, for storing described first radiation curing material;
First draws roller, for drawing described first radiation curing material from described first radiation curing material groove; And
First delivery roll, the first radiation curing material drawn for drawing roller by described first is delivered in the groove of described first roller.
21. equipment according to claim 20, wherein, described first draws on roller and is equipped with scraper or scraper.
22. equipment according to claim 19,20 or 21, wherein, described clearing cell comprises:
Kicker cylinder, described first radiation curing material beyond the groove removing described first roller in part.
23. equipment according to claim 22, wherein, described kicker cylinder is positioned at described first radiation curing material beyond the groove of described first roller in part by the either method removing in scraping, extrude, wipe and cleaning.
24. equipment according to claim 22, wherein, described clearing cell also comprises rinse bath, for by described kicker cylinder, the first radiation curing material taken in described rinse bath cleans up.
25. according to claim 19 to the equipment described in arbitrary claim in 24, and described first osculating element is also for extruding described base material.
26. according to claim 19 to the equipment described in arbitrary claim in 25, and this equipment also comprises the second radiation curing source, after being separated with described first roller at described base material, carry out one or many Post RDBMS.
27. according to claim 19 to the equipment described in arbitrary claim in 26, and wherein, the cross sectional shape of the groove of described first roller is any one or its combination in rectangle, bevel, U-shaped, ellipse, polygon.
28. according to claim 19 to the equipment described in arbitrary claim in 27, and wherein, the recess width of described first roller is less than 30 microns, is preferably less than 15 microns, is more preferably less than 5 microns, is more preferably less than 1 micron.
29. according to claim 19 to the equipment described in arbitrary claim in 27, and wherein, the depth of groove of described first roller is greater than 0.1 micron, is preferably more than 1 micron, is more preferably greater than 5 microns.
30. according to claim 19 to the equipment described in arbitrary claim in 29, and wherein, described first roller is made up of the material of metal, pottery, resin or composite.
31. according to claim 19 to the equipment described in arbitrary claim in 30, this equipment also comprises coating formation unit, forms the coating of the bond strength that can improve described first radiation curing material and described base material before the first radiation curing material in the groove in described first roller contacts with the upper surface of described base material on the upper surface of described base material.
32. equipment according to claim 31, wherein, described coating formation unit comprises:
Coating groove, for storing described coating;
Coating draws roller, for drawing described coating from described coating groove; And
Coating delivery roll, the coating drawn for described coating being drawn roller is delivered to the upper surface of described base material.
33. equipment according to claim 32, wherein, described coating is drawn on roller and is equipped with scraper or scraper.
34. equipment according to claim 32, this equipment also comprises the 3rd radiation curing source, for carrying out radiation curing when described coating is formed by the 3rd radiation curing material to described coating.
35. according to claim 19 to the equipment described in arbitrary claim in 34, this equipment also comprises sampling synthesis layer forming unit, and after being separated with described first roller at described base material, layer is synthesized in the sampling formed on the lower surface of described base material described micro-picture and text pattern carries out imaging.
36. equipment according to claim 35, wherein, described sampling synthesis layer forming unit comprises:
Be with reeded second roller, the groove distribution of described second roller distributes identical with the described pattern synthesized in layer of sampling;
Second radiation curing material providing unit, provides the second radiation curing material or on the lower surface of described base material, provides described second radiation curing material in the groove in described second roller;
Second osculating element, makes described second roller contact with the lower surface of described base material after providing described in completing in described second radiation curing material providing unit;
4th radiation curing source, carries out radiation curing to described second radiation curing material after completing described operating of contacts at described second osculating element; And
Second separative element, for described base material and described second roller being separated after described second radiation curing material is by radiation curing, to make described second radiation curing material peel off from the groove of described second roller and depend on the lower surface of described base material, thus form described sampling synthesis layer by described second radiation curing material peeled off.
37. equipment according to claim 36, wherein, described second radiation curing material providing unit comprises:
Second radiation curing material groove, for storing described second radiation curing material;
Second draws roller, for drawing described second radiation curing material from described second radiation curing material groove; And
Second delivery roll, the second radiation curing material drawn for drawing roller by described second is delivered to the groove of described second roller or the lower surface at described base material.
38. equipment according to claim 35,36 or 37, this equipment also comprises the 5th radiation curing source, after being separated with described second roller at described base material, carry out one or many Post RDBMS.
39. equipment according to claim 35, this equipment also comprises the reflecting layer forming unit for forming reflecting layer on described sampling synthesis layer.
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| CN106891637A (en) * | 2015-12-17 | 2017-06-27 | 中钞特种防伪科技有限公司 | Optical anti-counterfeit element and preparation method thereof |
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| CN104875523B (en) | 2016-06-29 |
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Address after: 100070 No. 6 Spark Road, Science City, Beijing, Fengtai District Patentee after: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY Co.,Ltd. Patentee after: China Banknote Printing and Minting Group Co.,Ltd. Address before: 100070 No. 6 Spark Road, Science City, Beijing, Fengtai District Patentee before: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY Co.,Ltd. Patentee before: CHINA BANKNOTE PRINTING AND MINTING Corp. |
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