CN104874569B - EUV reflector cleaning device - Google Patents
EUV reflector cleaning device Download PDFInfo
- Publication number
- CN104874569B CN104874569B CN201510229051.6A CN201510229051A CN104874569B CN 104874569 B CN104874569 B CN 104874569B CN 201510229051 A CN201510229051 A CN 201510229051A CN 104874569 B CN104874569 B CN 104874569B
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- CN
- China
- Prior art keywords
- atom
- ball valve
- generating means
- spheroid
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention discloses an EUV reflector cleaning device. The EUV reflector cleaning device comprises an H<0> atom generating device (1) and a vacuum cavity (2); and a ball valve (3) and a guiding injection pool (4) which are mutually connected are successively disposed between the H<0> atom generating device (1) and the vacuum cavity (2). Compared with an existing cleaning device, the cleaning device is additionally equipped with the ball valve (3) for H<0> atom concentration adjustment and the guiding injection pool (4) for H<0> atom guide, and the EUV reflector cleaning device has the advantages that the EUV reflector cleaning device is simple in structure, reasonable in design, high in cleaning efficiency and convenient to use, H<0> atom injection concentration is adjustable, and the optical element cleaning effect is good.
Description
Technical field
The present invention relates to the life search field of EUV multilayer film optical element, specifically provide a kind of EUV mirror and clean device.
Background technology
At present, research finds in EUV projection optical system optical element multi-layer film surface cleans, H0Atomic adsorption determines its cleaning rate and cleaning performance at the concentration of optical element multi-layer film surface.Therefore, it is achieved H0Atomic concentration controlled and ensure its uniformly, quick adsorption be to improve cleaning rate and cleaning performance essential condition at optical element multi-layer film surface.
Realized in the past EUV projection optical system optical element multi-layer film surface clean in, hydrogen atom direction is not guided, concentration regulation, it is achieved increase/reduce H0The device that atom is absorbed by optical element.Therefore, research and develop a kind of cleaning device being capable of above-mentioned functions, become people's problem demanding prompt solution.
Summary of the invention
In consideration of it, it is an object of the invention to provide a kind of EUV mirror to clean device, cannot realize H at least to solve to clean device in the past0Atom carries out guiding and regulating H0The problems such as atomic concentration.
The technical scheme that the present invention provides, specifically, a kind of EUV mirror cleans device, it includes H0Atom generating means 1 and vacuum chamber 2, it is characterised in that: at described H0The ball valve 3 and Guide spray pond 4 being interconnected it is disposed with between atom generating means 1 and described vacuum chamber 2.
Preferably, described Guide spray pond 4 includes:
Pilot conduits 41, it includes connecting end 411 and free end 412, and described connection end 411 is connected with described ball valve 3, and described free end 412 is inserted in inside described vacuum chamber 2；
Adapter sleeve 42, it is outside that it is set in described pilot conduits 41, and the fixing connection of connection end 411 of described adapter sleeve 42 one end and described pilot conduits 41, and the other end is tightly connected with described vacuum chamber 2.
Further preferably, the free end 412 of described pilot conduits 41 is provided with the reflecting plate 4121 that radially direction extends.
Further preferably, described pilot conduits 41 is gradually successively decreased to described free end 412 bore by described connection end 411.
Further preferably, described pilot conduits 41 and described reflecting plate 4121 are made by quartz.
Further preferably, described ball valve 3 includes:
Valve body 31；
Spheroid 32, it rotates and is arranged at described valve body 31 inside, and is provided with the duct 321 of through both sides on described spheroid 32；
Valve rod 33, it is connected with the upper end of described spheroid 32, and described valve rod 33 can drive described spheroid 32 to rotate relative to described valve body 31, makes the both sides pipeline connection/closure in the duct 321 on described spheroid 32 and described valve body 31.
Further preferably, described ball valve 3 is made up of quartz.
Further preferably, described ball valve 3 is by quartz connecting tube 5 and described H0Atom generating means 1 connects, and described quartz connecting tube 5 is set in described H0On the transmitting pipeline of atom generating means 1, and described quartz connecting tube 5 one end is connected with the valve body 31 of described ball valve 3, the other end and described H0The housing seal of atom generating means 1 connects.
Further preferably, described H0Atom generating means 1, ball valve 3, Guide spray pond 4 and vacuum chamber 2 are all coaxially disposed.
The EUV mirror that the present invention provides cleans device, at H0Have additional ball valve and Guide spray pond between atom generating means and vacuum chamber, wherein, by the change of ball valve pore size, regulate and control H0The injection concentration of atom, is guided by Guide spray pond, it is ensured that H simultaneously again0Atom can uniformly, the optical element multi-layer film surface that is cleaned by vacuum chamber of quick adsorption, thus improve cleaning performance and the cleaning efficiency of optical element.
The EUV mirror that the present invention provides cleans device, has simple in construction, reasonable in design, easy to use, H0Atom injection concentration is adjustable, and optical element cleaning performance is good, cleaning efficiency advantages of higher.
Accompanying drawing explanation
Fig. 1 is the structural representation that EUV mirror cleans device.
Detailed description of the invention
With specific embodiment, the present invention is further expalined below, but is not limited to protection scope of the present invention.
The H to injection cannot be realized to solve conventional EUV mirror cleaning device0The problems such as atom carries out concentration regulation and direction guides, and the cleaning performance causing optical element is poor, and cleaning efficiency is slow, present embodiment provides a kind of EUV mirror and clean device, and it is compared existing cleaning device, is additionally arranged H0Atomic concentration adjusting means and H0Atom guider, it is specifically, see Fig. 1, including the H being sequentially connected with and connecting0Atom generating means 1, ball valve 3, Guide spray pond 4 and vacuum chamber 2, wherein, described H0Atom generating means 1 is used for providing H0Atom, H0After atom is carried out flow concentration regulation by ball valve 3, then guided by Guide spray pond 4, be ejected into the anti-multi-layer film surface being cleaned by optical element terminating in vacuum chamber 2, it is achieved the cleaning of optical element.Owing to can be realized H by ball valve in cleaning device in the whole series0The regulation of atom injection concentration, realizes H by the guiding in Guide spray pond0Atom and the spray angle regulation of optical element, be finally reached H0Atom can uniformly, quick adsorption in the purpose of optical element multi-layer film surface, improve cleaning performance and the cleaning rate of optical element.
Wherein, see Fig. 1, Guide spray pond 4 includes pilot conduits 41, this pilot conduits 41 includes connecting end 411 and free end 412, and connection end 411 is connected with ball valve 3, and it is internal that free end 412 is inserted in described vacuum chamber 2, in the outer cover of pilot conduits 41 equipped with adapter sleeve 42, this adapter sleeve 42 one end is fixing with the connection end 411 of pilot conduits 41 to be connected, and the other end is tightly connected with vacuum chamber 2, H0Atom carries out being directed in vacuum chamber through pilot conduits.
In order to improve the cleaning performance of this cleaning device, improvement as technical scheme, seeing Fig. 1, the free end 412 in pilot conduits 41 is provided with the reflecting plate 4121 that radially direction extends, and can realize spraying in optical element surface back reflection H out by arranging of this reflecting plate0Atom is reflected in the surface of optical element again, improves H0The uniformity coefficient of atom, it is achieved H0Atom can quick adsorption to optical element surface, improve the speed cleaned.
As the further improvement of technical scheme, see Fig. 1, be directed to pipeline 41 and be designed as gradually being successively decreased to described free end 412 bore by described connection end 411, improve H0Atom is injected into the intensity in vacuum chamber, thus further speeds up H0Atomic adsorption is to the speed of optical element surface.
In order to prevent Guide spray pond during guiding, occur to absorb H0The phenomenon of atom, causes H0The loss of atom, as the further improvement of technical scheme, utilizes quartz material for H0The characteristic that Atomic Absorption is little, is both designed as being made up of quartz by described pilot conduits 41 and described reflecting plate 4121, to reduce H0Atom is guiding the absorbed probability of process.
Wherein, the concrete structure of ball valve 3, see Fig. 1, including valve body 31, be provided with the duct 321 being provided with through both sides on spheroid 32, and spheroid 32 in valve body 31 inner rotation, connecting in the upper end of spheroid 32 has valve rod 33, described valve rod 33 can drive described spheroid 32 to rotate relative to described valve body 31, makes the both sides pipeline connection/closure in the duct 321 on described spheroid 32 and described valve body 31；Designed by the structure of this ball valve 3, spheroid rotation can be carried out by driving valve rod, change the pore size that in spheroid, duct is identical with valve body, and then realize H0The purpose of atomic concentration regulation.
In order to reduce H0Atom is by ball valve surfacing absorbing probability, it is ensured that H0The concentration transmission of atom, utilizes quartz material for H0The little characteristic of absorption of atom, is designed as being made up of quartz by ball valve 3.
Ball valve 3 and H for convenience0Connection between atom generating means 1, as the improvement of technical scheme, sees Fig. 1, by ball valve 3 by quartz connecting tube 5 and H0Atom generating means 1 connects, and described quartz connecting tube 5 is set in H0On the transmitting pipeline of atom generating means 1, and quartz connecting tube 5 one end is connected with the valve body 31 of ball valve 3, the other end and H0The housing seal of atom generating means 1 connects, it is achieved ball valve 3 and H0The purpose that atom generating means 1 connects.
In order to improve H0Atom transmission in the whole series clean device is unobstructed, as technical scheme, by described H0Atom generating means 1, ball valve 3, Guide spray pond 4 and vacuum chamber 2 are all coaxially disposed.
The introduction of technique scheme is all to carry out writing according to the mode gone forward one by one, and highlights the difference of each embodiment, and its similar portion can be with cross-reference, the not solution of influence technique problem and the generation of technique effect.
Embodiment 1
A concrete case study on implementation is described below, and this case is preferred embodiment, is not limited to the present invention, and for a person skilled in the art, the present invention can have various modifications and variations.All within the spirit and principles in the present invention, any modification, equivalent substitution and improvement etc. made, should be included within the scope of the present invention.
Seeing Fig. 1, clean device for a kind of EUV mirror, concrete making and structure are as follows:
A vacuum flange 6 and B vacuum flange 7(low-expansion alloy material 4J32), quartz connecting tube 5, valve handle 33, valve body 31, spheroid 32, Guide spray pond 4, reflecting plate 4121 be (quartz material), optical element 11(K9 glass), vacuum chamber 2(stainless steel material).
A vaccum seal ring 12(anaerobic copper band), B vaccum seal ring 8(anaerobic copper band), H0Atomic generator 1, A fastening bolt 14, A clamp nut 13, B clamp nut 9, B fastening bolt 10 are by design performance and dimensional requirement outsourcing.
1) quartz connecting tube 5 is sintered with A vacuum flange 6 it is connected；Again B vacuum flange 7 is sintered with adapter sleeve 42 in Guide spray pond 4 and be connected, then by H0Atom water conservancy diversion reflecting plate 4121 is connected with free end 412 sintering of pilot conduits 41 in Guide spray pond 4, more respectively with two coaxial apertures of valve body 31 in quartz ball valve 3, two assemblies after the connection of above-mentioned sintering is connected sintering respectively.
2) complete 1) after again quartz spheroid 32 is loaded in valve body 31, and ensure in valve body 31 that quartz spheroid 32 external diameter inner tube circular arc respectively with quartz connecting tube 5 and Guide spray pond 4 passes through mutually；Quartz body cap is put on quartz valve body (in quartz body cap, circular hole seals with quartz spheroid junction vacuseal grease, it is ensured that junction rotates and seals) sintering afterwards seal, be finally installed to by valve rod 33 on quartz spheroid 32 and sintered connection.
Wherein, when Guide spray pond 4 is connected with vacuum chamber 2, B vacuum flange 7 and flange in vacuum chamber 2 are by B vaccum seal ring 8, then (during installation, in guarantee assembly, reflecting plate 4121 is positioned at Fig. 1 position, it is ensured that H to be fastenedly connected sealing by B clamp nut 9, B fastening bolt 100Atom water conservancy diversion orientation is accurately ejected into optical element 11)；Afterwards by H0In atomic generator 1, flange passes through A vaccum seal ring 12, then is fastenedly connected sealing by A clamp nut 13, A fastening bolt 14.
Use this cleaning device to carry out minute surface cleaning process to be: first allow H0Atomic generator 1 operating emission H0Atom, regulation rotates valve handle 33 and changes the throttling openings of sizes formed between duct 321 and the valve body 31 of quartz spheroid 32, makes the H by Guide spray pond 30Atomic concentration changes, it is achieved that H0The regulation and control of atom cleaning optical element multi-layer film surface concentration and guiding.
Claims (5)
1. EUV mirror cleans a device, and it includes H0Atom generating means (1) and vacuum chamber (2), it is characterised in that: at described H0The ball valve (3) and Guide spray pond (4) being interconnected it is disposed with between atom generating means (1) and described vacuum chamber (2)；
Described Guide spray pond (4) including:
Pilot conduits (41), it includes connecting end (411) and free end (412), and described connection end (411) is connected with described ball valve (3), and described free end (412) is inserted in inside described vacuum chamber (2)；
Adapter sleeve (42), it is outside that it is set in described pilot conduits (41), and the fixing connection with the connection end (411) of described pilot conduits (41) of described adapter sleeve (42) one end, and the other end is tightly connected with described vacuum chamber (2)；
The free end (412) of described pilot conduits (41) is provided with the reflecting plate (4121) that radially direction extends；
Described pilot conduits (41), described reflecting plate (4121) and described ball valve (3) are made by quartz.
2. clean device according to EUV mirror described in claim 1, it is characterised in that: described pilot conduits (41) is gradually successively decreased to described free end (412) bore by described connection end (411).
3. clean device according to EUV mirror described in claim 1, it is characterised in that described ball valve (3) including:
Valve body (31)；
Spheroid (32), it rotates and is arranged at described valve body (31) inside, and is provided with the duct (321) of through both sides on described spheroid (32)；
Valve rod (33), it is connected with the upper end of described spheroid (32), described valve rod (33) can drive described spheroid (32) to rotate relative to described valve body (31), makes the both sides pipeline connection/closure in the duct (321) on described spheroid (32) and described valve body (31).
4. clean device according to EUV mirror described in claim 3, it is characterised in that: described ball valve (3) is by quartz connecting tube (5) and described H0Atom generating means (1) connects, and described quartz connecting tube (5) is set in described H0On the transmitting pipeline of atom generating means (1), and described quartz connecting tube (5) one end is connected with the valve body (31) of described ball valve (3), the other end and described H0The housing seal of atom generating means (1) connects.
5. clean device according to EUV mirror described in claim 1, it is characterised in that: described H0Atom generating means (1), ball valve (3), Guide spray pond (4) and vacuum chamber (2) are all coaxially disposed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510229051.6A CN104874569B (en) | 2015-05-07 | 2015-05-07 | EUV reflector cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510229051.6A CN104874569B (en) | 2015-05-07 | 2015-05-07 | EUV reflector cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104874569A CN104874569A (en) | 2015-09-02 |
| CN104874569B true CN104874569B (en) | 2017-01-11 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510229051.6A Expired - Fee Related CN104874569B (en) | 2015-05-07 | 2015-05-07 | EUV reflector cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104874569B (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040011381A1 (en) * | 2002-07-17 | 2004-01-22 | Klebanoff Leonard E. | Method for removing carbon contamination from optic surfaces |
| WO2009121385A1 (en) * | 2008-04-03 | 2009-10-08 | Carl Zeiss Smt Ag | Cleaning module and euv lithography device with cleaning module |
| CN103197508B (en) * | 2013-03-06 | 2014-11-12 | 华中科技大学 | Analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation |
| CN203229772U (en) * | 2013-03-25 | 2013-10-09 | 大同凡元兴科技有限公司 | Simple plasma washing machine |
| CN104565424A (en) * | 2013-10-25 | 2015-04-29 | 大丰超威机械有限公司 | Top assembling type fixed ball valve capable of pushing valve seats open by utilizing air pressure |
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2015
- 2015-05-07 CN CN201510229051.6A patent/CN104874569B/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN104874569A (en) | 2015-09-02 |
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| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170111 Termination date: 20190507 |