CN104865257B - EUV multilayer films carbon pollutes experimental provision - Google Patents
EUV multilayer films carbon pollutes experimental provision Download PDFInfo
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- CN104865257B CN104865257B CN201510213471.5A CN201510213471A CN104865257B CN 104865257 B CN104865257 B CN 104865257B CN 201510213471 A CN201510213471 A CN 201510213471A CN 104865257 B CN104865257 B CN 104865257B
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Abstract
Experimental provision is polluted the present invention relates to a kind of EUV multilayer films carbon, belongs to technical field of semiconductors.Single experimental result, and the reliability and comparative low technical problem of experiment can only be detected by solving EUV multilayer films carbon pollution experimental provision in the prior art.The EUV multilayer films carbon pollution experimental provision of the present invention includes cavity for focusing, the first slide valve, transition vacuum chamber, angle valve, exposure vacuum chamber, optical filter, mass spectrograph, dusty gas volume control device, the first vavuum pump, three-dimensional adjusting mechanism, sample holder fixed mechanism, EUV photodiodes, the second slide valve, preparation vacuum chamber, sample feed mechanism, sample holder, sample delivery mechanism and the second vavuum pump.The device can complete Focus Exposure and the defocus exposure of sample, and the distinctiveness of sample diverse location exposes, and the vacuum in device will not be destroyed all the time, and experimental reliability is high.
Description
Technical field
The invention belongs to technical field of semiconductors, and in particular to a kind of EUV multilayer films carbon pollutes experimental provision.
Background technology
Extreme ultraviolet photolithographic (EUVL) is the main flow photoetching technique of existing great scale integrated circuit manufacture craft.Extreme ultraviolet
Quarter, machine was operated in Soft X-Ray Region, and photon energy is high, so must be worked under clean high vacuum environment.If photoetching system
The vacuum of system is low, and serious carbon pollution will occur in a short time for multi-layer film surface, cause the reflectivity of multilayer film rapid
Reduction, for example, be coated with a piece of speculum of multilayer film if subjected to pollution, reflectivity is reduced to 67% from 68%, for the throwing of six mirrors
For shadow, three mirror illuminators, 14% can be then reduced from light source to silicon chip luminous flux, so that the service life of litho machine
It is greatly lowered, and photoetching cost will be increased by frequently changing multilayer film optical element.Accordingly, it would be desirable to be polluted to the carbon of EUV multilayer films
Situation is studied, the further sedimentation mechanism of in-depth multi-layer film surface carbon pollution, and refine out effective carbon growth inhibition side
Method and carbon pollution minimizing technology.
EUV multilayer films carbon of the prior art pollution experimental provision mainly include cavity for focusing, slide valve, transition vacuum chamber,
Angle valve, exposure vacuum chamber, optical filter, mass spectrograph, dusty gas volume control device, vacuum gauge meter and vavuum pump, sample are fixed
It is placed in exposure vacuum chamber.Pollute and test for EUV multilayer films carbon, if to obtain comprehensive, careful and deep experiment
As a result, Focus Exposure and the defocus exposure of study sample, and the distinctiveness of sample diverse location is needed to expose.But due to existing reality
Sample is fixedly installed in experiment device, so needing to open exposure vacuum chamber replacing sample, can so destroy the true of exposure vacuum chamber
Reciprocal of duty cycle, causes the difference of multiple samples environmental factor in experimentation, influences the reliability of experiment and comparative.
The content of the invention
Single experiment knot can only be detected present invention aim to address the pollution experimental provision of EUV multilayer films carbon in the prior art
Really, and experiment reliability and comparative low technical problem there is provided a kind of EUV multilayer films carbon pollute experimental provision.
The technical scheme that the present invention solves above-mentioned technical problem is as follows.
EUV multilayer films carbon pollutes experimental provision, including cavity for focusing, the first slide valve, transition vacuum chamber, angle valve, exposure are very
Cavity, optical filter, mass spectrograph, dusty gas volume control device and the first vavuum pump；
Also include, three-dimensional adjusting mechanism, sample holder fixed mechanism, EUV photodiodes, preparation vacuum chamber, the second lock
Plate valve, sample feed mechanism, sample holder, sample delivery mechanism and the second vavuum pump；
The three-dimensional adjusting mechanism is from X to vacuum linear, Y-direction vacuum linear and Z-direction vacuum line
Property governor motion composition, the X is vertical two-by-two to, Y-direction and Z-direction, and X, to parallel to EUV beam directions, three-dimensional adjusting mechanism is set
Put in exposure vacuum chamber；
The sample holder fixed mechanism and EUV photodiodes are fixed on three-dimensional adjusting mechanism, and sample holder is fixed
Mechanism and EUV photodiodes are moved with three-dimensional adjusting mechanism along X to, Y-direction and Z-direction；
The preparation vacuum chamber is connected by the second slide valve with exposure vacuum chamber；
The sample feed mechanism is made up of the first vacuum feed-in device and supporter, and the first vacuum feed-in device is fixed on
On the outer wall for preparing vacuum chamber, the push rod of the first vacuum feed-in device is stretched into preparation vacuum chamber, and the supporter is fixed on first
On the push rod of vacuum feed-in device, supporter, which is provided with multiple grooves, each groove, places a sample holder；
The sample delivery mechanism is made up of the second vacuum feed-in device and clamp, and the second vacuum feed-in device is fixed on standard
On the outer wall of standby vacuum chamber, the push rod of the second vacuum feed-in device is stretched into preparation vacuum chamber, and the clamp is fixed on the second vacuum
Sample holder in the top of the push rod of feed-in device, clamp gripping supporter groove, it is through the second slide valve that sample holder is defeated
Deliver on three-dimensional adjusting mechanism and fixed by sample holder fixed mechanism, and grip the sample holder that is fixed on after detection and fix machine
Sample holder on structure, is transmitted back in the groove of supporter；
Second vavuum pump is connected with preparing vacuum chamber；
EUV light beams in the cavity for focusing are transmitted to exposure vacuum chamber through transition vacuum chamber, irradiating sample, and through sample
Incident EUV light electric diode.
Further, the direction of motion of the push rod of the first vacuum feed-in device is parallel to EUV beam directions, described second
The direction of motion of the push rod of vacuum feed-in device is perpendicular to EUV beam directions.
Further, the push rod and the second slide valve of the second vacuum feed-in device are coaxial.
Further, the sample holder is made up of base plate and baffle plate, and base plate is provided with logical provided with center in groove, groove
Hole, sample is fixed in groove by baffle plate, and the edge of baffle plate is fixed on the edge of base plate, after EUV light beam irradiating samples, warp
Central through hole incident EUV light electric diode in groove.
Further, the X is the 3rd vacuum feed-in device to vacuum linear, and the 3rd vacuum feed-in device is fixed on
On the outer wall for exposing vacuum chamber, the push rod of the 3rd vacuum feed-in device is stretched into exposure vacuum chamber, and push rod the direction of motion in EUV
The parallel direction of light beam, the Y-direction vacuum linear is identical with the structure of Z-direction vacuum linear, by
Four vacuum feed-in devices, vacuum guide rail, spring, slide unit and bearing composition, bearing are provided with rectangular channel, and vacuum guide rail is fixed on bearing
Both sides upper and positioned at rectangular channel, slide unit is arranged on vacuum guide rail, and one end of spring is fixed on slide unit, and the other end is fixed on
On bearing, the 4th vacuum feed-in device is fixed on bearing, and under the action of the spring, the top of the 4th vacuum feed-in device all the time with
Slide unit is contacted；The bearing of Z-direction vacuum linear is fixed on the push rod of the 3rd vacuum feed-in device, and Y-direction vacuum is linearly adjusted
The bearing of section mechanism is fixed on the slide unit of Z-direction vacuum linear.
Further, the slide unit of the Y-direction vacuum linear is provided with central through hole.
Further, the sample holder fixed mechanism is fixed on the surface of the slide unit of Y-direction vacuum linear, institute
State the back side that EUV photodiodes are fixed on the slide unit of Y-direction vacuum linear.
Further, the sample holder fixed mechanism is the spring leaf that two sections are L-shaped, the short end of two spring leafs
It is fixed on the side of the slide unit of Y-direction vacuum linear, the edge of the long tight sample holder of side pressure.
Further, the spring is two, and relative to the setting substantially symmetrical about its central axis of the 4th vacuum feed-in device.
Further, the vacuum guide rail is symmetrical relative to rectangular channel.
Compared with prior art, the beneficial effects of the invention are as follows：
The EUV multilayer films carbon pollution experimental provision of the present invention can change sample in device, and realize the three-dimensional of sample
It is accurately positioned, so that Focus Exposure and the defocus exposure of sample are completed, and the distinctiveness of sample diverse location exposes, and then obtain
Obtain the different exposure areas of sample, different exposure positions, different exposure light intensity, difference exposure dose and different dusty gas situations
Under carbon pollution experimental result, the vacuum in device will not be destroyed all the time, experimental reliability and comparative height.With it is existing
Experimental provision can only provide single experimental result and compare, and carbon pollution experimental provision of the invention can cover kinds of experiments situation,
Comprehensive kinds of experiments means, kinds of experiments condition of arranging in pairs or groups, obtain comprehensive, careful and deep experimental result, so as to deepen many
The sedimentation mechanism of membrane surface carbon pollution, and refine out effective carbon growth inhibition method and carbon pollution minimizing technology.
Brief description of the drawings
Fig. 1 pollutes the top view of experimental provision for the EUV multilayer films carbon of the present invention；
Fig. 2 is the structural representation of the three-dimensional adjusting mechanism of the present invention；
Fig. 3 is the structural representation of the sample holder of the present invention；
Fig. 4 is the structural representation of the sample feed mechanism of the present invention；
Fig. 5 is the structural representation of the Y-direction vacuum linear of the present invention；
Fig. 6 is the sectional view along the line A-A in Fig. 5；
Fig. 7 is fixed on the partial schematic diagram in Y-direction vacuum linear for the sample holder of the present invention；
In figure, 1, cavity for focusing, the 2, first slide valve, 3, transition vacuum chamber, 4, angle valve, 5, exposure vacuum chamber, 6, optical filter,
7th, mass spectrograph, 8, dusty gas volume control device, the 9, first vavuum pump, 10, three-dimensional adjusting mechanism, 10-1, X are linear to vacuum
Governor motion, 10-2, Y-direction vacuum linear, 10-2-1, the 4th vacuum feed-in device, 10-2-2, vacuum guide rail, 10-2-
3rd, spring, 10-2-4, slide unit, 10-2-5, bearing, 10-2-5-1, rectangular channel, 10-3, Z-direction vacuum linear, 11, sample
Product holder fixing mechanism, 12, EUV photodiodes, 13, prepare vacuum chamber, the 14, second slide valve, 15, sample feed mechanism,
15-1, the first vacuum feed-in device, 15-2, supporter, 16, sample holder, 16-1, base, 16-2, baffle plate, 17, specimen-transfer mechanism
Structure, the 18, second vavuum pump.
Embodiment
The present invention is further illustrated below in conjunction with Fig. 1-7.
EUV multilayer films carbon pollutes experimental provision, including cavity for focusing 1, the first slide valve 2, transition vacuum chamber 3, angle valve 4, exposure
Light vacuum chamber 5, optical filter 6, mass spectrograph 7, dusty gas volume control device 8, the first vavuum pump 9, three-dimensional adjusting mechanism 10, sample
Product holder fixing mechanism 11, EUV photodiodes 12, preparation vacuum chamber 13, the second slide valve 14, sample feed mechanism 15, sample
Product support 16, the vavuum pump 18 of sample delivery mechanism 17 and second.
Wherein, the direction of propagation of cavity for focusing 1, transition vacuum chamber 3, exposure vacuum chamber 5 along EUV light source is from front to back along same
Optical axis is set gradually, and transition vacuum chamber 3 is made up of cylindrical tube and conically shaped, cylindrical tube and the equal both ends open of conically shaped, circle
One end of pillar buoy is connected with cavity for focusing 1 by the first slide valve 2, and the big opening end of the other end and conically shaped is tightly connected, cone
The small openend of shape cylinder is stretched into exposure vacuum chamber 5, and transition vacuum chamber 3 and cavity for focusing 1, the contact site of exposure vacuum chamber 5
Seal.When first slide valve 2 is opened, cavity for focusing 1 is connected with transition vacuum chamber 3, during closing, transition vacuum chamber 3 and cavity for focusing 1
It is isolated from each other.More than one flange port, based on connecting the first vacuum gauge, the first vacuum can be provided with by exposing on vacuum chamber 5
Vacuum in rule meter measurement exposure vacuum chamber 5, it can also be multiple that the first vacuum gauge meter, which can be one,.
One end of angle valve 4 is connected with transition vacuum chamber 3, and the other end is connected with exposure vacuum chamber 5, when obtaining vacuum, angle
Valve 4 is opened, and transition vacuum chamber 3 is connected with exposure vacuum chamber 5, and after vacuum is obtained, angle valve 4 is closed, and transition vacuum chamber 3 and exposure are true
Cavity 5 is isolated from each other.
In experimentation, the EUV light source in cavity for focusing 1 can produce fragment, although be suppressed by the fragment in cavity for focusing 1
Device can reduce most fragment, but still some fragment can enter in exposure vacuum chamber 5, so as to influence normally entering for experiment
OK；And various dusty gas can be filled with experimentation, in exposure vacuum chamber 5, these dusty gas, which may enter, to be focused on
Chamber 1, and then accelerate the pollution of EUV multi-layer mirrors；Therefore, based on this 2 points, it is necessary to completely cut off cavity for focusing using optical filter 6
1 and exposure vacuum chamber 5；The sealing of optical filter 6 is fixed on the small openend of the conically shaped of transition vacuum chamber 3.Optical filter 6 is by Zr films
It is made, both with the function of obtaining 13.5nm wavelength, but also with the function of isolation vacuum, the diameter of general optical filter 6 is in 16mm
Within, and close to sample；Because the thickness of Zr films only has 150-200nm, so, when experiment obtains vacuum, it must ensure
The pressure of the both sides of optical filter 6 is consistent, and Zr films otherwise can be caused to rupture.
Mass spectrograph 7 is connected with exposure vacuum chamber 5, for detecting the hydrocarbon (small partial pressure) in exposure vacuum chamber 5.
Dusty gas volume control device 8 is connected with exposure vacuum chamber 5, and dusty gas volume control device 8 can be controlled
The flow and species of dusty gas, thus realize it is a variety of under the conditions of sample exposure, to obtain comprehensive, careful and deep reality
Test result.
First vavuum pump 9 is connected with exposure vacuum chamber 5, for being vacuumized to transition vacuum chamber 3 and exposure vacuum chamber 5.The
One vavuum pump 9 is made up of a molecular pump and a dry pump.
Three-dimensional adjusting mechanism 10 is from X to vacuum linear 10-1, Y-direction vacuum linear 10-2 and Z-direction
Vacuum linear 10-3 is constituted, wherein, X to, Y-direction, Z-direction it is vertical two-by-two, and X is to parallel to EUV beam directions.X to
Vacuum linear 10-1 is fixed on the outer wall of exposure vacuum chamber 5, and the push rod of from X to vacuum linear 10-1 are stretched
Enter to expose in vacuum chamber 5, and push rod the direction of motion EUV light beams parallel direction, X to vacuum linear 10-1 use
In regulation sample holder in the displacement parallel to EUV beam directions, this function can make sample obtain different light intensity and different exposures
The experimental result of light area.Y-direction vacuum linear 10-2 is identical with Z-direction vacuum linear 10-3 structure,
By the 4th vacuum feed-in device 10-2-1, vacuum guide rail 10-2-2, spring 10-2-3, slide unit 10-2-4 and bearing 10-2-5 groups
Into bearing 10-2-5 is provided with rectangular channel 10-2-5-1, and rectangular channel 10-2-5-1 provides space, vacuum for slide unit 10-2-4 movements
Guide rail 10-2-2 is fixed on bearing 10-2-5, and vacuum guide rail 10-2-2 two guide rails relative to 10-2-5-1 pairs of rectangular channel
Claim, slide unit 10-2-4 is arranged on vacuum guide rail 10-2-3, and spring 10-2-3 one end is fixed on slide unit 10-2-4, the other end
It is fixed on bearing 10-2-5, the 4th vacuum feed-in device 10-2-1 is fixed on bearing 10-2-5, and in spring 10-2-3 work
Under, the 4th vacuum feed-in device 10-2-1 top is contacted with slide unit 10-2-4 all the time, and spring 10-2-3 is generally two, and phase
For the 4th vacuum feed-in device 10-2-1 setting substantially symmetrical about its central axis, spring 10-2-3 elastic force direction and the 4th vacuum feed-in device
10-2-1 thrust direction is parallel, and slide unit 10-2-4 is in the presence of the 4th vacuum feed-in device 10-2-1 and spring 10-2-3, edge
Vacuum guide rail 10-2-2 is moved and positioned.It is linear to vacuum that Z-direction vacuum linear 10-3 bearing 10-2-5 is fixed on X
On governor motion 10-1 push rod, Y-direction vacuum linear 10-2 bearing 10-2-5 is fixed on Z-direction vacuum linear regulation
On mechanism 10-3 slide unit 10-2-4, Y-direction vacuum linear 10-2 slide unit 10-2-4 is provided with central through hole, is used for
By EUV light beams, the slide unit 10-2-4 surfaces that the face that definition EUV light beams are first passed through is Y-direction vacuum linear 10-2, after
The face passed through is the Y-direction vacuum linear 10-2 slide unit 10-2-4 back sides.Y-direction vacuum linear 10-2 and Z
Sample holder 16 is adjusted respectively in the position with the both direction perpendicular to EUV beam directions to vacuum linear 10-3
Move, this function can realize the exposure of sample different piece, make sample each several part or multiple samples obtain different carbon layers having thicknesses and
The experimental result of form.
Sample holder 16 is fixed on three-dimensional adjusting mechanism 10 by sample holder fixed mechanism 11, and general sample holder fixes machine
Structure 11 can use two sections for the spring clip of L-type, and the short end of spring clip is fixed on Y-direction vacuum linear 10-2's
Slide unit 10-2-4 side, long end is located at Y-direction vacuum linear 10-2 slide unit 10-2-4 surface, for compressing sample
The edge of product support 16.
EUV photodiodes 12 receive the incident light of EUV light beams, and produce electric signal, and EUV photodiodes 12 can be consolidated
The Y-direction vacuum linear 10-2 slide unit 10-2-4 back side is scheduled on, and with being fixed on sample holder fixed mechanism 11
Sample holder 16 it is relative.
Prepare vacuum chamber 13, the second slide valve 14, sample feed mechanism 15, sample holder 16, the and of sample delivery mechanism 17
Second vavuum pump 18 constitutes preparation of samples device, and preparation of samples device can improve conventional efficient, reduce the time for changing sample.
Wherein, prepare vacuum chamber 13 to be connected with exposure vacuum chamber 5 by the second slide valve 14, the second slide valve 14 is opened
When, prepare vacuum chamber 13 and connected with exposure vacuum chamber 5, when the second slide valve 14 is closed, prepare vacuum chamber 13 and exposure vacuum chamber 5
It is isolated from each other；Prepare that multiple flange ports can be provided with vacuum chamber 13, based on connecting the second vacuum gauge, the measurement of the second vacuum gauge
Amount prepares the vacuum in vacuum chamber 13.
Sample feed mechanism 15 includes the first vacuum feed-in device 15-1 and supporter 15-2, the first vacuum feed-in device 15-1 are solid
It is scheduled on the outer wall for preparing vacuum chamber 13, the first vacuum feed-in device 15-1 push rod is stretched into preparation vacuum chamber 13, the first vacuum
Feed-in device 15-1 pushrod movement direction is parallel with EUV beam directions, and supporter 15-2 is fixed on the first vacuum feed-in device 15-1
Push rod on, moved with push rod along EUV light beam parallel directions, supporter 15-2 is provided with multiple grooves, in each groove
A sample holder 16 can be placed (sample is housed on sample holder).
Sample holder 16 is made up of base plate 16-1 and baffle plate 16-2, and base plate 16-1, which is provided with to be provided with groove, groove, to be used for
By the central through hole of EUV light beams, sample is placed in groove, and baffle plate 16-2 is provided with central through hole, baffle plate 16-2 center
The inward flange of through hole is pressed on the edge of sample, and baffle plate 16-2 edge is fixed by screws on base plate 16-1 edge, gear
Plate 16-2 can be EUV light beams in square ring structure, cavity for focusing 1 after transition vacuum chamber 3, into exposure vacuum chamber 5, irradiate sample
Product, the light beam of center section passes sequentially through central through hole in groove and Y-direction vacuum linear 10-2 after sample
Slide unit 10-2-4 central through hole incident EUV light electric diode 12.
Sample delivery mechanism 17 is made up of the second vacuum feed-in device and clamp, and the second vacuum feed-in device is fixed on preparation vacuum
On the outer wall of chamber 13, the push rod of the second vacuum feed-in device is stretched into preparation vacuum chamber 13, the fortune of the push rod of the second vacuum feed-in device
Dynamic direction is in Y-direction, and clamp is fixed on the top of the push rod of the second vacuum feed-in device, and clamp being capable of pushing away with the second vacuum feed-in device
Bar is moved, the sample holder 16 in gripping supporter 15-2 groove, and sample holder 16 is delivered into the Y in exposure vacuum chamber 5
To on vacuum linear 10-2, sample holder 16 is fixed on Y-direction vacuum by sample holder fixed mechanism 11 and linearly adjusted
Save on mechanism 10-2, clamp can also grip the sample holder 16 of the fixation of sample holder fixed mechanism 11, and sample holder 16 is defeated
Send back in the support frame 15-2 grooves for preparing vacuum chamber 13, preferably in the push rod and the second slide valve 14 of the second vacuum feed-in device
Heart axle is coaxial.
Second vavuum pump 18 is connected with preparing vacuum chamber 13, for being vacuumized to preparing vacuum chamber 13, the second vavuum pump 17
It is made up of a molecular pump and a dry pump.
The present invention EUV multilayer films carbon pollution experimental provision the course of work be：Before the experiment, by specimen-transfer mechanism
The clamp of structure 17, which is retracted, to be prepared in vacuum chamber 13, is closed the first slide valve 2 and the second slide valve 14, angle valve 4 is opened, using first
Vavuum pump 9 is vacuumized to transition vacuum chamber 3 and exposure vacuum chamber 5, is vacuumized using 18 pairs of preparation vacuum chambers 13 of the second vavuum pump,
Exposure vacuum chamber 5 is detected using the first vacuum gauge meter and the second vacuum gauge meter respectively and prepares the vacuum of vacuum chamber 13, is measured
Vacuum quite and when reaching requirement, close angle valve 4, open the first slide valve 2 and the second slide valve 14, control sample feeding
Mechanism 15 makes sample be in the direction of motion of the clamp of sample delivery mechanism 17, the sample on clamp clamping sample feed mechanism 15
Product, through the second slide valve 14, are transported on three-dimensional adjusting mechanism 10, and sample holder 16 is solid by sample holder fixed mechanism 11
Fixed, then the clamp of sample delivery mechanism 17 is retracted into preparation vacuum chamber 13, closes the second slide valve 14, opens dusty gas
Volume control device 8, conveys dusty gas into exposure vacuum chamber 5, starts exposure experiments, in experimentation, EUV light beams
Position is constant, and EUV light beams enter after transition vacuum chamber 3 exposes vacuum chamber 5, irradiating sample, the central light beam of irradiating sample, according to
The slide unit 10-2-4 of central through hole and Y-direction vacuum linear 10-2 in the secondary groove by sample holder 16 center
Through hole, incident EUV light electric diode 12, when EUV photodiodes 12 have signal, illustrates that sample is in exposure status,
By finely tuning three-dimensional adjusting mechanism 10, the three-dimensional motion of sample holder 16 can be adjusted, can both make sample along perpendicular to EUV light
Shu Fangxiang is moved, and different piece is exposed under EUV irradiation, realizes the distinctiveness exposure of sample different piece, sample can be made again
Product realize the exposure under different light-intensity conditions, after the completion of experiment, then open the second lock along being moved parallel to EUV beam directions
Plate valve 14, the sample holder 16 after pollution is fetched, be placed on the support frame of sample feed mechanism 15 by sample delivery mechanism 17
In 15-2 groove, then sample feed mechanism 15 feeds next sample and tested next time.
The device of the present invention can not destroy exposure vacuum chamber 5 by three-dimensional adjusting mechanism 10 and preparation of samples device
Vacuum on the premise of change sample, it is ensured that the homogeneity of multiple samples environmental factor in experimentation, and experiment
As a result reliability and comparative, can be that the research of carbon pollution mechanism and the formulation of carbon deposition layer cleaning strategy are provided more
Rationally with effective experimental result.
Claims (9)
1.EUV multilayer films carbon pollutes experimental provision, including cavity for focusing (1), the first slide valve (2), transition vacuum chamber (3), angle valve
(4), exposure vacuum chamber (5), optical filter (6), mass spectrograph (7), dusty gas volume control device (8) and the first vavuum pump (9)；
Characterized in that, also including, three-dimensional adjusting mechanism (10), sample holder fixed mechanism (11), EUV photodiodes
(12) vacuum chamber (13), the second slide valve (14), sample feed mechanism (15), sample holder (16), sample delivery mechanism, are prepared
And the second vavuum pump (18) (17)；
The three-dimensional adjusting mechanism (10) is from X to vacuum linear (10-1), Y-direction vacuum linear (10-2)
With Z-direction vacuum linear (10-3) composition, the X is vertical two-by-two to, Y-direction and Z-direction, and X is to parallel to EUV light beam sides
To three-dimensional adjusting mechanism (10) is arranged in exposure vacuum chamber (5)；
The X is the 3rd vacuum feed-in device to vacuum linear (10-1), and it is true that the 3rd vacuum feed-in device is fixed on exposure
On the outer wall of cavity (5), the push rod of the 3rd vacuum feed-in device is stretched into exposure vacuum chamber (5), and push rod the direction of motion in EUV
The structure of the parallel direction of light beam, the Y-direction vacuum linear (10-2) and Z-direction vacuum linear (10-3)
It is identical, by the 4th vacuum feed-in device (10-2-1), vacuum guide rail (10-2-2), spring (10-2-3), slide unit (10-2-4) and
Bearing (10-2-5) is constituted, and bearing (10-2-5) is provided with rectangular channel (10-2-5-1), and vacuum guide rail (10-2-2) is fixed on branch
On seat (10-2-5) and positioned at the both sides of rectangular channel (10-2-5-1), slide unit (10-2-4) is arranged on vacuum guide rail (10-2-2)
On, one end of spring (10-2-3) is fixed on slide unit (10-2-4), and the other end is fixed on bearing (10-2-5), the 4th vacuum
Feed-in device (10-2-1) is fixed on bearing (10-2-5), and in the presence of spring (10-2-3), the 4th vacuum feed-in device
The top of (10-2-1) is contacted with slide unit (10-2-4) all the time；The bearing (10-2-5) of Z-direction vacuum linear (10-3)
On the push rod for being fixed on the 3rd vacuum feed-in device, the bearing (10-2-5) of Y-direction vacuum linear (10-2) is fixed on Z-direction
On the slide unit (10-2-4) of vacuum linear (10-3)；
The sample holder fixed mechanism (11) and EUV photodiodes (12) are fixed on three-dimensional adjusting mechanism (10), sample
Holder fixing mechanism (11) and EUV photodiodes (12) are moved with three-dimensional adjusting mechanism (10) along X to, Y-direction and Z-direction；
The preparation vacuum chamber (13) is connected by the second slide valve (14) with exposure vacuum chamber (5)；
The sample feed mechanism (15) is made up of the first vacuum feed-in device (15-1) and supporter (15-2), first vacuum
Feed-in device (15-1) is fixed on the outer wall for preparing vacuum chamber (13), and the push rod of the first vacuum feed-in device (15-1) stretches into preparation very
In cavity (13), the supporter (15-2) is fixed on the push rod of the first vacuum feed-in device (15-1), on supporter (15-2)
Provided with multiple grooves, a sample holder (16) is placed in each groove；
The sample delivery mechanism (17) is made up of the second vacuum feed-in device and clamp, and the second vacuum feed-in device is fixed on standard
On the outer wall of standby vacuum chamber (13), the push rod of the second vacuum feed-in device is stretched into preparation vacuum chamber (13), and the clamp is fixed on
Sample holder (16) in the top of the push rod of second vacuum feed-in device, clamp gripping supporter (15-2) groove, through second
Sample holder (16) is delivered on three-dimensional adjusting mechanism (10) and fixed by sample holder fixed mechanism (11) by slide valve (14),
And the sample holder (16) being fixed on sample holder fixed mechanism (11) after detection is gripped, it is transmitted back to supporter (15-2)
In groove；
Second vavuum pump (18) connects with preparing vacuum chamber (13)；
EUV light beams in the cavity for focusing (1) are transmitted to exposure vacuum chamber (5) through transition vacuum chamber (3), irradiating sample, and
Through sample incident EUV photodiodes (12).
2. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the first vacuum feed-in
The direction of motion of the push rod of device (15-1) is parallel to EUV beam directions, the direction of motion of the push rod of the second vacuum feed-in device
Perpendicular to EUV beam directions.
3. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the second vacuum feed-in
The push rod of device and the second slide valve (14) are coaxial.
4. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the sample holder (16)
It is made up of base plate and baffle plate, base plate, which is provided with groove, groove, is provided with central through hole, and sample is fixed in groove by baffle plate,
The edge of baffle plate is fixed on the edge of base plate, after EUV light beam irradiating samples, through the central through hole incident EUV light electricity in groove
Diode (12).
5. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the Y-direction vacuum is linearly adjusted
The slide unit (10-2-4) for saving mechanism (10-2) is provided with central through hole.
6. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the sample holder is fixed
Mechanism (11) is fixed on the surface of the slide unit (10-2-4) of Y-direction vacuum linear (10-2), the EUV photodiodes
(12) it is fixed on the back side of the slide unit (10-2-4) of Y-direction vacuum linear (10-2).
7. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the sample holder is fixed
Mechanism (11) is the spring leaf that two sections are L-shaped, and the short end of two spring leafs is fixed on Y-direction vacuum linear (10-
2) side of slide unit (10-2-4), the edge of the long tight sample holder of side pressure (16).
8. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the spring (10-2-3)
For two, and relative to the setting substantially symmetrical about its central axis of the 4th vacuum feed-in device (10-2-1).
9. EUV multilayer films carbon according to claim 1 pollutes experimental provision, it is characterised in that the vacuum guide rail (10-
It is 2-2) symmetrical relative to rectangular channel (10-2-5-1).
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| CN111258340B (en) * | 2020-03-13 | 2021-06-29 | 中国科学院长春光学精密机械与物理研究所 | Stable-flow EUV carbon pollution experiment gas supply device |
| CN111257232A (en) * | 2020-03-19 | 2020-06-09 | 中国科学院长春光学精密机械与物理研究所 | Carbon pollution experimental device for multilayer film optical element for efficiently collecting EUV light |
| CN111965110A (en) * | 2020-08-12 | 2020-11-20 | 中国科学院上海高等研究院 | Multi-functional vacuum experiment system of compact |
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