CN104846374A - Automatic liquid adding etching tank - Google Patents
Automatic liquid adding etching tank Download PDFInfo
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- CN104846374A CN104846374A CN201510311260.5A CN201510311260A CN104846374A CN 104846374 A CN104846374 A CN 104846374A CN 201510311260 A CN201510311260 A CN 201510311260A CN 104846374 A CN104846374 A CN 104846374A
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- etching
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- bath
- probe
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Abstract
The invention discloses an automatic liquid adding etching tank which comprises an etching tank (1), an auxiliary etching tank (2), a detection device (3) and an etching pump (4), wherein an etching agent pipe (5) is arranged on the etching tank (1); the inlet of the etching agent pipe (5) is connected with the etching pump (4); the outlet of the etching agent pipe (5) is positioned in the etching tank (1); the etching pump (4) is connected with the auxiliary etching tank (2); the detection device (3) is communicated with the bottom of the etching tank (1); a hydrometer (31) and a probe (32) are arranged in the detection device (3); the hydrometer (31) is positioned on the lower part of the probe (32); a controller (6) is arranged on the side wall of the etching tank (1); and the etching pump (4) and the probe (32) are electrically connected with the controller (6). The automatic liquid adding etching tank disclosed by the invention has the beneficial effects that the structure is simple, the labor intensity is reduced, and the manual cost is reduced.
Description
Technical field
The present invention relates to circuit card processing unit (plant), particularly a kind of etching bath of automatic liquid-feeding.
Background technology
Along with the improvements of electron trade, China's wiring board industry development also broad-based recovery thereupon, China will become PCB industrial base the biggest in the world in recent years, account for world market about 30% at present, in printed circuit board production process, etching is a very important technique, and must use a large amount of etching solutions during etching.
Along with the carrying out of etching, copper is constantly dissolved, and in liquid medicine, the content of univalent copper ion rises, and this constantly need add etching solution bivalent cupric ion to maintain normal etch-rate.The interpolation of ammoniacal liquor and ammonium chloride is all generally with adding etching solution manually, and artificial interpolation labour intensity is large, and etching solution concentration management and control limit of error is large.
Summary of the invention
The object of the invention is to the shortcoming overcoming prior art, the etching bath that a kind of structure is simple, reduce the automatic liquid-feeding of labour intensity and reduction human cost is provided.
Object of the present invention is achieved through the following technical solutions: a kind of etching bath of automatic liquid-feeding, it comprises etching bath, etching auxiliary tank, proofing unit and etching pump, described etching bath is provided with etching reagent pipe, the entrance of etching reagent pipe is connected with etching pump, the outlet of etching reagent pipe is positioned at etching bath, described etching pump is connected with etching auxiliary tank, described proofing unit is communicated with the bottom of etching bath, specific gravity hydrometer and probe is provided with in proofing unit, specific gravity hydrometer is positioned at the bottom of probe, the sidewall of described etching bath is provided with a controller, etching pump and probe are electrically connected with controller.
Described controller be provided with artificial dosing pilot lamp, dosing pilot lamp and stop pilot lamp.
The pipeline that described etching pump is connected with etching reagent pipe is provided with a magnetic valve, and magnetic valve is electrically connected with controller
The present invention has the following advantages: etching bath of the present invention, detects CU in etching bath by specific gravity hydrometer
2+content, automatically add appropriate etching solution by etching pump simultaneously, thus make the CU in etching bath
2+content be in all the time in rational scope, ensure that the quality that circuit card etches, and without the need to artificial interpolation, reduce labour intensity, simultaneously also a people can keep an eye on multiple etching bath, save manpower, reduced human cost.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention
In figure, 1-etching bath, 2-etches auxiliary tank, 3-proofing unit, and 4-etches pump, 5-etching reagent pipe, 6-controller, 7-magnetic valve, 31-specific gravity hydrometer, and 32-pops one's head in, and the artificial dosing pilot lamp of 61-, 62-dosing pilot lamp, 63-stops pilot lamp.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described, and protection scope of the present invention is not limited to the following stated:
As shown in Figure 1, a kind of etching bath of automatic liquid-feeding, it comprises etching bath 1, etching auxiliary tank 2, proofing unit 3 and etching pump 4, described etching bath 1 is provided with etching reagent pipe 5, the entrance of etching reagent pipe 5 is connected with etching pump 4, the outlet of etching reagent pipe 5 is positioned at etching bath 1, described etching pump 4 is connected with etching auxiliary tank 2, described proofing unit 3 is communicated with the bottom of etching bath 1, specific gravity hydrometer 31 and probe 32 is provided with in proofing unit 3, specific gravity hydrometer 31 is positioned at the bottom of probe 32, the sidewall of described etching bath 1 is provided with a controller 6, etching pump 4 and probe 32 are electrically connected with controller 6, etching solution CU is controlled by specific gravity hydrometer 31 Magnetic Induction
2+content, if CU
2+content exceeds and arranges management and control scope, i.e. CU
2+the words exceeded standard, specific gravity hydrometer 31 in proofing unit 3 can float and top probe 32 contact induction, probe 32 sends signal to controller 6, and the dosing pilot lamp 62 of controller 6 is shinny, simultaneously, controller 6 controls etching pump 4 and works, fresh sub-liquid in etching auxiliary tank 2 is delivered in etching bath, and when etching bath 1 inner liquid medicine has added to after in specific gravity range, specific gravity hydrometer 31 can decline, etching pump 4 quits work, and completes automatic interpolation.
In the present embodiment, described controller 6 be provided with artificial dosing pilot lamp 61, dosing pilot lamp 62 and stop pilot lamp 63, in a particular state, can Artificial Control be passed through, start the interpolation that etching pump 4 carries out etching solution, now, artificial dosing pilot lamp 61 is lighted, and in time stopping adding moment liquid, stops pilot lamp 63 to light, when manually adding etching solution or automatic interpolation etching solution, pilot lamp 63 is stopped to extinguish.
In the present embodiment, the pipeline that described etching pump 4 is connected with etching reagent pipe 5 is provided with a magnetic valve 7, magnetic valve 7 is electrically connected with controller 6, magnetic valve 7 is in normally off, when etching pump 4 and working, controller 6 just Controlling solenoid valve 7 is opened, and magnetic valve 7 can prevent the etching solution in etching bath 1 from refluxing, and ensures the etching liquid level stabilizing in etching bath 1.
Working process of the present invention is as follows: specific gravity hydrometer 31 Magnetic Induction controls etching solution CU
2+content, if CU
2+content exceeds and arranges management and control scope, i.e. CU
2+exceed standard, the specific gravity hydrometer 31 in proofing unit 3 can float and top probe 32 contact induction, and probe 32 sends signal to controller 6, the dosing pilot lamp 62 of controller 6 is shinny, meanwhile, controller 6 controls etching pump 4 and works, and opens magnetic valve 7, fresh sub-liquid in etching auxiliary tank 2 is delivered in etching bath 1, when etching bath 1 inner liquid medicine has added to after in specific gravity range, specific gravity hydrometer 31 can decline, and etching pump 4 quits work, magnetic valve 7 cuts out, and completes automatic interpolation.
Claims (3)
1. the etching bath of an automatic liquid-feeding, it is characterized in that: it comprises etching bath (1), etching auxiliary tank (2), proofing unit (3) and etching pump (4), described etching bath (1) is provided with etching reagent pipe (5), the entrance of etching reagent pipe (5) is connected with etching pump (4), the outlet of etching reagent pipe (5) is positioned at etching bath (1), described etching pump (4) is connected with etching auxiliary tank (2), described proofing unit (3) is communicated with the bottom of etching bath (1), specific gravity hydrometer (31) and probe (32) is provided with in proofing unit (3), specific gravity hydrometer (31) is positioned at the bottom of probe (32), the sidewall of described etching bath (1) is provided with a controller (6), etching pump (4) and probe (32) are electrically connected with controller (6).
2. the etching bath of a kind of automatic liquid-feeding according to claim 1, is characterized in that: described controller (6) be provided with artificial dosing pilot lamp (61), dosing pilot lamp (62) and stop pilot lamp (63).
3. the etching bath of a kind of automatic liquid-feeding according to claim 1, is characterized in that: the pipeline that described etching pump (4) is connected with etching reagent pipe (5) is provided with a magnetic valve (7), and magnetic valve (7) is electrically connected with controller (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510311260.5A CN104846374A (en) | 2015-06-09 | 2015-06-09 | Automatic liquid adding etching tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510311260.5A CN104846374A (en) | 2015-06-09 | 2015-06-09 | Automatic liquid adding etching tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104846374A true CN104846374A (en) | 2015-08-19 |
Family
ID=53846349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510311260.5A Pending CN104846374A (en) | 2015-06-09 | 2015-06-09 | Automatic liquid adding etching tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104846374A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106215798A (en) * | 2016-08-26 | 2016-12-14 | 奥特斯维能源（太仓）有限公司 | A kind of accurate formulation and the method monitoring oxide etching buffer concentration in real time |
| CN108363418A (en) * | 2018-02-08 | 2018-08-03 | 江西景旺精密电路有限公司 | A kind of liquid medicine automatic detection device and detection method |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11100684A (en) * | 1997-09-26 | 1999-04-13 | Asahi Denka Kogyo Kk | Specific gravity measuring instrument for etchant |
| CN101538715A (en) * | 2009-04-15 | 2009-09-23 | 苏州市飞莱克斯电路电子有限公司 | Flexible circuit board etching liquid concentration control device |
| CN201924078U (en) * | 2010-12-27 | 2011-08-10 | 深圳市翔宇电路有限公司 | Etching solution automatic adding device |
| CN203416507U (en) * | 2013-07-02 | 2014-01-29 | 苏州福莱盈电子有限公司 | Automatic cleaning etching apparatus of PCB |
| CN203807560U (en) * | 2014-03-26 | 2014-09-03 | 昆山市鸿运通多层电路板有限公司 | Medicine liquid proportion digital display and automatic addition system |
| CN204676155U (en) * | 2015-06-09 | 2015-09-30 | 成都虹华环保科技股份有限公司 | A kind of etching bath of automatic liquid-feeding |
-
2015
- 2015-06-09 CN CN201510311260.5A patent/CN104846374A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11100684A (en) * | 1997-09-26 | 1999-04-13 | Asahi Denka Kogyo Kk | Specific gravity measuring instrument for etchant |
| CN101538715A (en) * | 2009-04-15 | 2009-09-23 | 苏州市飞莱克斯电路电子有限公司 | Flexible circuit board etching liquid concentration control device |
| CN201924078U (en) * | 2010-12-27 | 2011-08-10 | 深圳市翔宇电路有限公司 | Etching solution automatic adding device |
| CN203416507U (en) * | 2013-07-02 | 2014-01-29 | 苏州福莱盈电子有限公司 | Automatic cleaning etching apparatus of PCB |
| CN203807560U (en) * | 2014-03-26 | 2014-09-03 | 昆山市鸿运通多层电路板有限公司 | Medicine liquid proportion digital display and automatic addition system |
| CN204676155U (en) * | 2015-06-09 | 2015-09-30 | 成都虹华环保科技股份有限公司 | A kind of etching bath of automatic liquid-feeding |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106215798A (en) * | 2016-08-26 | 2016-12-14 | 奥特斯维能源（太仓）有限公司 | A kind of accurate formulation and the method monitoring oxide etching buffer concentration in real time |
| CN108363418A (en) * | 2018-02-08 | 2018-08-03 | 江西景旺精密电路有限公司 | A kind of liquid medicine automatic detection device and detection method |
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| C06 | Publication | ||
| PB01 | Publication | ||
| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150819 |
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| RJ01 | Rejection of invention patent application after publication |