CN104832882B - The lighting apparatus of a kind of even smooth film and the use even smooth film and the backlight of display - Google Patents
The lighting apparatus of a kind of even smooth film and the use even smooth film and the backlight of display Download PDFInfo
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- CN104832882B CN104832882B CN201510179341.4A CN201510179341A CN104832882B CN 104832882 B CN104832882 B CN 104832882B CN 201510179341 A CN201510179341 A CN 201510179341A CN 104832882 B CN104832882 B CN 104832882B
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- smooth film
- even smooth
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/08—Refractors for light sources producing an asymmetric light distribution
Abstract
The present invention relates to lighting apparatus and the backlight of display device, more particularly to a kind of even smooth film of double-decker and its use the lighting apparatus of the even smooth film and the backlight of display.In order to solve the problems, such as that the even light effect of existing even smooth film is poor, the present invention provides a kind of even smooth film and the lighting apparatus and display device backlight using the even smooth film.The light film includes base membrane layer, first microstructured layers and the second microstructured layers, second microstructured layers are located at the upper surface of base membrane layer, first microstructured layers are located at the upper surface of the second microstructured layers, the structure lines that the upper surface of first microstructured layers is intersected with cross section are first structure lines, and the structure lines that the upper surface of second microstructured layers is intersected with cross section are the second structure lines；The first structure line is height undulations, and second structure lines are height undulations.The even light effect of even smooth film provided by the invention is preferable.
Description
Technical field
The present invention relates to the back light source technique field of lighting apparatus and display device, more particularly to a kind of double-decker are even
The lighting apparatus of light film and its use even smooth film and the backlight of display.
Background technology
Even smooth film can cover LED lamp bead, make that LED's is luminous more uniform, soft, and change its field angle, make LED
Lamp bead has specific irradiation range.Even smooth film is applied usually in the backlight of lighting apparatus and display device, can be passed through
The different degrees of change of field angle, realizes that the uniformly light-emitting even lamp bead of LED light group is reduced, so as to reduce the entirety of equipment
Power consumption, beneficial to environmental protection.
The light-emitting surface of even smooth film has special microstructure, and light is injected from the incidence surface of even smooth film, penetrated from light-emitting surface
When going out, optical path direction can be upset by the microstructure multiple reflections of light-emitting surface, refraction, finally make light-emitting surface it is luminous more
Uniformly, it is soft.Therefore, the structure of light-emitting surface plays a leading role the even light action of even smooth film, and finally determines light from going out
Distributional pattern after smooth surface injection.
Chinese patent application 200920319175.3 provides a kind of spherical light homogenizing member, is closely pasted by substrate layer and structure sheaf
Conjunction forms, and structure sheaf is the transparent non-isodiametric hemispherical configuration of irregular dense distribution, and substrate layer is transparent polymer.Light
When the light that source is sent passes through hemisphere face from inside to outside, for the big light of some incidence angles by reflecting away, some incidence angles are small
Light then by spheric reflection, ultimately form dome shape scattering through multiple reflections, playing makes light emitting species softer uniform
Effect.Such a even smooth film light-emitting surface is single layer structure, its spherical structure no matter how arrange in pairs or groups by its diameter, can not be completely covered whole
A film surface so that there are some flat regions on basement membrane, i.e., the smooth gap between sphere.These smooth gaps can not play
Even light action so that the light extraction in these regions is relatively bright (light Relatively centralized, not dispersed), cause this kind it is even
The effect and non-optimal of light film.
Chinese patent application 201210342331.4 provides a kind of even smooth film, the incidence surface and/or light extraction of the even smooth film
Face is provided with main structure, is provided with some minor structures in the main structure, main structure by string state function curve and straight line separately
Connection composition, minor structure by the groove structure identical with main structure extending direction, bulge-structure or both structure composition.So
And the even smooth film light-emitting surface is also single layer structure, the main structure profile of its light-emitting surface is made of string state function curve, based on string state
The form and periodicity of function curve, it is relatively flat at its wave crest and trough.Though these Wave crest and wave troughs are because of its minor structure
Presence can also play certain even light action, it is but relatively weak so that the light extraction in these regions is relatively bright, and (light is opposite to be collected
In, it is not dispersed), i.e., the luminous of the even smooth film is not complete and homogeneous.It is similar with patent 200920319175.3, patent Shen
201210342331.4 optical path change also please be played because its light-emitting surface only relies on single layer structure, cause its even light effect not most
It is good.
The content of the invention
In order to solve the problems, such as that the even light effect of existing even smooth film is poor, the present invention provide a kind of even smooth film of double-decker and
Using the lighting apparatus and display device backlight of the even smooth film, by the double-deck micro-structure of even smooth film light-emitting surface, to entering light
The light that face is injected carries out multiple reflections and/or refraction, contributes to the light Jing Guo first layer micro-structure in the micro- knot of the second layer
Structure is further upset, is dissipated, and produces the even light effect for being much better than individual layer light-emitting surface micro-structure.
In order to realize this purpose, the present invention uses following technical scheme：
The present invention provides a kind of even smooth film, and the light film includes base membrane layer, the first microstructured layers and the second microstructured layers,
Second microstructured layers are located at the upper surface of base membrane layer, and the first microstructured layers are located at the upper surface of the second microstructured layers, described
The lower surface of base membrane layer is the incidence surface in face of light source, and the upper surface of first microstructured layers is light-emitting surface；Described first is micro-
The structure lines that the upper surface of structure sheaf is intersected with cross section are first structure lines, the upper surface of second microstructured layers with it is transversal
The structure lines that face is intersected are the second structure lines；First microstructured layers are that first structure line edge is prolonged perpendicular to the direction of cross section
The three-dimensional structure to be formed is stretched, second micro-structure is the three-dimensional that the second structure lines edge is extended to form perpendicular to the direction of cross section
Structure；The first structure line is height undulations, and second structure lines are height undulations.
First microstructured layers are fitted tightly over the upper surface of the second microstructured layers.
The microstructured layers and the perpendicular face of length direction are cross section, also referred to as end face.
First microstructured layers are referred to as the first micro-structure, and second microstructured layers are referred to as the second micro-structure.
The upper surface of first micro-structure is first structure line along the face extended to form perpendicular to the direction of cross section, institute
The upper surface for stating the second micro-structure is the face that the second structure lines edge is extended to form perpendicular to the direction of cross section.
Further, the lower surface of the base membrane layer is provided with into light micro-structure, it is described enter light micro-structure and first micro- knot
Structure is identical or different.Further, it is described enter together with the upper surface of light micro-structure fits closely with the following table of base membrane layer.Into one
Step, it is described enter light micro-structure the structure lines of lower surface of end face be made of semi arch and straightway, the semi arch and straight
Line segment is alternately arranged.
The slope of curve larger part of the first structure line and the slope of curve smaller part of second structure lines are mutual
Staggeredly.
The shape of the first structure line and the main structure of the second structure lines can be identical or different, the cycle can it is identical or
Difference, but the slope of curve larger part of first structure line and the slope of curve smaller part of second structure lines must be handed over mutually
It is wrong.
Further, in the even smooth film, the refractive index RI of first microstructured layers1Scope be：1.57-
1.62, the refractive index RI of second microstructured layers2Scope be：1.46-1.51, the RI1More than RI2, the RI1Subtract
RI2The scope of the poor Δ RI of gained is：0.06-0.16.
Further, the refractive index difference Δ RI of first, second micro-structure is 0.08-0.10.
Further, in the even smooth film, the first structure line has main structure and minor structure, the main structure
Covered with minor structure on surface；The main structure has height undulations, and the minor structure also has height undulations.Or
Person, the first structure line do not have minor structure.
Further, in the even smooth film, second structure lines have main structure and minor structure, the main structure
Covered with minor structure on surface；The main structure has height undulations, and the minor structure has height undulations.Or
Person, second structure lines do not have minor structure.
Further, covered with minor structure on the surface of the main structure.The main structure line has fixed repetition week
Phase, the cycle have fixed length and height.The minor structure has the fixed repetition period, and the cycle has solid
Fixed length and height.Minor structure on the surface of a cycle of the main structure has 2-100 cycle.
Further, the height H of the repetition period of the main structure of the first structure line1Scope be：0.05-0.5mm,
Length P1Scope be：0.1mm-1.0mm, the height A of the repetition period of minor structure1Scope be 0.005-0.05mm.Further
, the height H of the repetition period of the main structure of the first structure line1Scope be：0.2-0.5mm, length P1Scope be：
0.4mm-1.0mm, the height A of the repetition period of minor structure1Scope be 0.01-0.05mm.
The maximum height H of the repetition period of the main structure of the first structure line1Peak on first structure line with
Horizontal vertical range where peak on second structure lines.The length P of the repetition period1It is two phases of main structure
Horizontal distance between adjacent minimum point or peak.
Further, the height H of the repetition period of the main structure of second structure lines2Scope be：0.05-0.5mm,
Length P2Scope be：0.1mm-1.0mm, the height A of the repetition period of minor structure2Scope be：0.005-0.05mm.Into one
Step, the height H of the repetition period of the main structure of second structure lines2Scope be：0.2-0.5mm, length P2Scope
It is：0.4mm-1.0mm, the height A of the repetition period of minor structure2Scope be 0.01-0.05mm.
The maximum height H of the repetition period of the main structure of second structure lines2Peak on the second structure lines with
The vertical range of the upper surface of base membrane layer.State the length P of repetition period2It is two adjacent minimum points or peak of main structure
Between horizontal distance.
Further, in the even smooth film, the main structure of the first structure line and/or the main structure of the second structure lines
Formed by connected bad circular arc.
Further, in the even smooth film, the main structure of the first structure line and/or the main structure of the second structure lines
It is connected to form by bad circular arc and straightway, the bad circular arc and straightway are alternately arranged.
Further, in the even smooth film, the main structure of the first structure line and/or the main structure of the second structure lines
For trigonometric function curve.Further, the trigonometric function curve is the tracks of line voltage.
Further, the minor structure of the first structure line and/or the minor structure of the second structure lines are by connected bad circular arc
Formed.
Further, the minor structure of the first structure line and/or the minor structure of the second structure lines are by bad circular arc and straight line
Section is connected to form, and the bad circular arc and straightway are alternately arranged.
Further, the minor structure of the first structure line and/or the minor structure of the second structure lines are trigonometric function curve.
Further, the minor structure is concavo-convex sub- curve.The sub- curve of bumps relative to main structure surface height
Rise and fall, the sub- curve of bumps has fixed cycle length and height.Further, in a repetition period of main structure
It is interior, there is the minor structure for including 4-40 cycle.Further, it is covered on the outer surface of a cycle of the main structure
The amount of cycles that minor structure has is 10-20.
The sub- curve of bumps is from convex and be alternately connected to form to recessed curve.Concavo-convex sub- curve it is adjacent
It is known as one of concavo-convex sub- curve between the peak of convex curve, or between the adjacent minimum point to recessed curve
Cycle.The height of concavo-convex sub- curve refers to peak and the vertical range of adjacent minimum point in a cycle.
Further, the main structure of the first structure line is the tracks of line voltage, the length P of repetition period1For 0.4-
1.0mm, height H1For 0.2-0.5mm, the minor structure is the first concavo-convex sub- curve, and the height A of the first concavo-convex sub- curve1For
0.01-0.05mm.The main structure of second structure lines is the tracks of line voltage, the length P of repetition period2For 0.41.0mm,
Height H2For 0.25-0.5mm, the upper surface of the main structure of the second structure lines has minor structure, and the minor structure is second concavo-convex
Sub- curve, and the height A of the second concavo-convex sub- curve2For 0.01-0.05mm.The main structure of first structure line and the second structure lines
The cycle of main structure is equal, and phase difference is 90 ° or 270 °.The son being covered on the outer surface of a cycle of the main structure
The amount of cycles that structure has is 10-20.
Further, the main structure of the first structure line is the tracks of line voltage, the length P of repetition period1For
0.5mm, height H1For 0.25mm, the minor structure is the first concavo-convex sub- curve, and the height A of the first concavo-convex sub- curve1For
0.025mm.The main structure of second structure lines is the tracks of line voltage, the length P of repetition period2For 0.5mm, height H2For
0.25mm, the upper surface of the main structure of the second structure lines have a minor structure, and the minor structure is the second concavo-convex sub- curve, and second
The height A of concavo-convex sub- curve2For 0.025mm.The main structure of first structure line is equal with the cycle of the main structure of the second structure lines,
And phase difference is 90 ° or 270 °.
The present invention also provides a kind of method for preparing the even smooth film, the described method includes following step：
(1) in the upper surface coated UV solidified resin of transparent base film layer, rolled, cured with the mould with complementary structure
After form the second microstructured layers；If incidence surface also contains micro-structure, need before the second micro-structure is applied, preferentially in base membrane layer
Lower surface coated UV solidified resin, is rolled also with the mould with complementary structure, is formed after curing into light micro-structure；
(2) in the upper surface coated UV solidified resin of the second microstructured layers, rolled with the mould with complementary structure, Gu
The first microstructured layers are formed after change.
The present invention also provides a kind of lighting apparatus, the lighting apparatus includes the even smooth film and illuminating source, described
Illuminating source is arranged on the incidence surface of the even smooth film.
The present invention also provides a kind of backlight of display, the backlight includes the even smooth film and illuminating source,
The illuminating source is arranged on the incidence surface of the even smooth film.
Above-mentioned illuminating source can be 1 or multiple.
Further.Within a repetition period of the main structure of the first structure line, having includes 4-40 cycle
Minor structure, the minor structure is the first concavo-convex sub- curve of Curvature varying, and the first concavo-convex sub- curve is smoothed curve.
Periodic width (the W of described first concavo-convex sub- curve1) by first structure line main structure a cycle length
Determined with the quantity in the cycle of a cycle indent convex portion curve, the height of the first concavo-convex sub- curve, be referred to as amplitude or
Claim fluctuation range (A1) it is 0.005-0.05mm.
Within a repetition period of the main structure of second structure lines, there is the minor structure for including 4-40 cycle,
The minor structure is the second concavo-convex sub- curve of Curvature varying, and the second concavo-convex sub- curve is smoothed curve.
Periodic width (the W of described second concavo-convex sub- curve2) by the second structure lines main structure a cycle length
Determined with the quantity in the cycle of a cycle indent convex portion curve, the height of the second concavo-convex sub- curve, be referred to as amplitude or
Claim fluctuation range (A2) it is 0.005-0.05mm.
Further, the main structure of the first structure line and the second structure lines is string state function curve, and cycle phase is same,
And phase differs 90 ° or 270 ° (slope of curve larger part and smaller part are interlaced).Or the first structure line and the second knot
The main structure of structure line is the curve (referred to as circular arc function curve) that circular arc is connected to form, the first structure line and the second knot
The cycle phase of structure line is same, and slope of curve larger part and smaller part are interlaced.Or the first structure line and the second structure lines
Main structure shape it is different, be respectively one of string state function curve and circular arc function curve, the week of circular arc function curve
Phase is the half in the cycle of string state function curve, and slope of curve larger part and smaller part are interlaced.
Compared with prior art, product provided by the present invention has following functions：The present invention is by providing a kind of even light
The lighting apparatus of film and the use even smooth film and the backlight of display device, using two layers of micro-structure, carry out light multiple
Reflection and repeatedly refraction, will further upset in the second microstructured layers by the light of the first microstructured layers, dissipate, reach remote
Better than the Luminescence Uniformity of individual layer light-emitting surface micro-structure.
Brief description of the drawings
Fig. 1 is the basic light path schematic diagram in the even light unit of existing even smooth film；
Fig. 2 is the even smooth schematic diagram for the even smooth film that light-emitting surface is individual layer micro-structure；
Fig. 3 is the even smooth schematic diagram for the even smooth film that light-emitting surface is double-deck micro-structure；
Fig. 4 is the dimensional structure diagram for the even smooth film that the embodiment of the present invention 1 provides；
Fig. 5 is the cross-sectional structure schematic diagram for the even smooth film that the embodiment of the present invention 1 provides；
Fig. 6 is the cross-sectional structure schematic diagram for the even smooth film that the embodiment of the present invention 10 provides；
Fig. 7 is the cross-sectional structure schematic diagram for the even smooth film that the embodiment of the present invention 13 provides；
Fig. 8 is the cross-sectional structure schematic diagram for the even smooth film that the embodiment of the present invention 14 provides；
Fig. 9 is the cross-sectional structure schematic diagram for the even smooth film that the embodiment of the present invention 15 provides；
Figure 10 is the cross-sectional structure signal for the even smooth film that the embodiment of the present invention 16 provides；
Figure 11 is the cross-sectional structure schematic diagram for the even smooth film that comparative example 1 provides.
In figure：1：Incidence surface；2：Light-emitting surface；3：Even smooth film；4：Illuminating source；
5：Incident ray；6：It is totally reflected light；7：Refracted light；
8：Incident angle α (relative to basement membrane)；9：Incident angle β (relative to even light unit)
10：Base membrane layer；20：Microstructured layers；21：Even light unit；
211：The less structure lines of slope；212：The larger structure lines of slope；
201：First microstructured layers；202：First microstructured layers；
221：First structure line；222：Second structure lines；
231：First concavo-convex sub- curve；232：Second concavo-convex sub- curve；
241：The sub- curve of first circular arc；242：The sub- curve of second circular arc；
(1)：Wave beam, based on refracted light, field angle is small；
(2)：Wave beam, including refraction and reflection light, field angle it is big；
Embodiment
Further illustrate technical scheme below with reference to the accompanying drawings and specific embodiments.
First, with reference to Figure of description 1,2,3, the even smooth principle for being easy to smooth film even to double-decker understands：
Fig. 1 is the basic light path schematic diagram in the even light unit of existing even smooth film micro-structure.In the micro-structure of even smooth film 3,1
It is light-emitting surface for incidence surface, 2,10 be base membrane layer, and 20 be the micro-structure (part) of light-emitting surface, and 21 be even light unit, and 4 be the light that shines
Source, 5 be incident ray, and 6 be the total reflection light by even light unit surface, and 7 be the refracted light by even light unit surface,
8 incident angle α for incident ray relative to base membrane layer, 9 incident angle β for incident ray relative to even light unit surface.
Fig. 2 is the even smooth schematic diagram for the even smooth film that light-emitting surface is individual layer micro-structure, as shown in Fig. 2, individual layer micro-structure 20
In light path, there are two lightlike lines：When the less structure lines 211 of the slope Jing Guo even light unit 21, light reflects, wave beam
(1) based on refracted light 7, field angle is smaller；But during the larger structure lines 212 of slope Jing Guo even light unit 21, light hair
Raw refraction and reflection, wave beam (2) include refracted light 7 and reflection light 6, and field angle is larger.
Fig. 3 is the even smooth schematic diagram for the even smooth film that light-emitting surface 2 is double-deck micro-structure, as shown in figure 3, the bilayer micro-structure
Respectively the first micro-structure 201, the second micro-structure 202, the second micro-structure 202 are located at the upper surface of basement membrane 10, the first micro-structure
201 are located at the upper surface of the second micro-structure 202.First structure line 221 is smooth sine wave curve, and the second structure lines 222 are
Smooth sine wave curve, first structure line 221 and the phase difference of first structure line 222 are 270 °, by the second micro-structure 202
And the light do not upset fully, fully upset after the first micro-structure 201, therefore the even smooth film of double-deck micro-structure can
To play more preferable even light effect.
As shown in Fig. 4 to Figure 10, the present invention provides a kind of even smooth film, and the light film 3 includes base membrane layer 10, first micro- knot
201 and second microstructured layers 202 of structure layer, second microstructured layers 202 are located at the upper surface of base membrane layer 10, the first microstructured layers
201 are located at the upper surface of the second microstructured layers 202, and the lower surface of the base membrane layer 10 is the incidence surface 1 in face of light source, and described the
The upper surface of one microstructured layers 201 is light-emitting surface 2.The line that the upper surface of first microstructured layers 201 is intersected with cross section is
First structure line 221, the line that the upper surface of second microstructured layers 202 is intersected with cross section is the second structure lines 222.It is described
First structure line 221 is height undulations, and second structure lines 222 are height undulations.
In all examples below and comparative example, the thickness of base membrane layer, material, the material all same of microstructured layers.Its
In, the thickness of base membrane layer is 0.25mm, material PET, and the material of all first microstructured layers and the second microstructured layers is ultraviolet
Light-cured resin.UV-cured resin is generally by unsaturated polyester (UP), epoxy acrylate, urethane acrylate, polyester third
One or more of oligomer components in olefin(e) acid ester, polyether acrylate, acroleic acid esterification polyacrylic resin, epoxy resin are led to
Cross free radical or cation triggers, is polymerized.
Embodiment 1
The present invention provides a kind of even smooth film, and as shown in Figure 4,5, the light film 3 includes base membrane layer 10, the first microstructured layers
201 and second microstructured layers 202, second microstructured layers 202 be located at the upper surface of base membrane layer 10, the first microstructured layers 201
Positioned at the upper surface of the second microstructured layers 202, the lower surface of the base membrane layer 10 is the incidence surface 1 in face of light source, described first
The upper surface of microstructured layers 201 is light-emitting surface 2.The line that the upper surface of first microstructured layers 201 is intersected with cross section is the
One structure lines 221, the line that the upper surface of second microstructured layers 202 is intersected with cross section is the second structure lines 222.Described
One structure lines 221 are height undulations, and second structure lines 222 are height undulations.Wherein, the first micro-structure 201
It is first structure line 221 along the structure extended to form perpendicular to the direction of cross section, RI1For 1.59, the first structure line 221
With main structure and minor structure, the surface of the main structure is covered with minor structure；The main structure has height undulations, institute
Stating minor structure also has height undulations.
As shown in Figure 4,5, the main structure of the first structure line 221 is the tracks of line voltage, the length P of repetition period1
For 0.5mm, height H1For 0.25mm, the upper surface of the main structure of the first structure line 221 has a minor structure, and the one of main structure
The outer surface in a cycle contains the smoothly connected minor structure with 10 cycles, and the minor structure is the first concavo-convex sub- curve
231, and the amplitude A of the first concavo-convex sub- curve 2311For 0.025mm；Second microstructured layers 202 are the second structure lines 222 along vertical
In the structure that cross-sectional direction extends to form, RI2For 1.49,
Second structure lines have main structure and minor structure, and the surface of the main structure is covered with minor structure；The master
Structure has height undulations, and the minor structure also has height undulations.The main structure of second structure lines 222 is
The tracks of line voltage, the length P of repetition period2For 0.5mm, height H2For 0.25mm, the main structure of the second structure lines 222 it is upper
Surface has a minor structure, and the outer surface of a cycle of the main structure of the second structure lines 222, which is provided with, contains 10 cycles
Smoothly connected minor structure, the minor structure are the second concavo-convex sub- curves 232, and the amplitude A of the second concavo-convex sub- curve 2322For
0.025mm；The main structure of first structure line 221 is equal with the cycle of the main structure of the second structure lines 222, and phase difference is 270 °；
Δ RI is 0.1；
Embodiment 2
Such as a kind of even smooth film that embodiment 1 provides, wherein, the main structure of first structure line 221 and the second structure lines 222
The cycle of main structure is equal, and phase differs 90 °.
Embodiment 3
As embodiment 1 provide even smooth film, wherein, RI1For 1.62, RI2For 1.46, Δ RI is 0.16.
Embodiment 4
As embodiment 1 provide even smooth film, wherein, RI1For 1.57, RI2For 1.51, Δ RI is 0.06.
Embodiment 5
As embodiment 1 provide even smooth film, wherein, the length P of the repetition period of the main structure of first structure line 2211For
0.1mm, height H1For 0.05mm, the amplitude A of the first concavo-convex sub- curve 2311For 0.005mm；The main structure of second structure lines 222
Repetition period length P2For 0.1mm, height H2For 0.05mm, the amplitude A of the described second concavo-convex sub- curve 2322For
0.005mm。
Embodiment 6
As embodiment 1 provide even smooth film, wherein, the length P of the repetition period of the main structure of first structure line 2211For
1.0mm, height H1For 0.5mm, the amplitude A of the first concavo-convex sub- curve 2311For 0.05mm；The main structure of second structure lines 222
The length P of repetition period2For 1.0mm, height H2For 0.5mm, the amplitude A of the second concavo-convex sub- curve 2322It is for 0.05mm, Δ RI
0.08。
Embodiment 7
As embodiment 1 provide even smooth film, wherein, the length P of the repetition period of the main structure of first structure line 2211For
0.4mm, height H1For 0.2mm, the outer surface of a cycle of the main structure of first structure line 221, which is provided with, contained for 4 week
The smoothly connected minor structure of phase, the minor structure are the first concavo-convex sub- curves, the amplitude A of the first concavo-convex sub- curve 2311For
0.05mm；The length P of the repetition period of the main structure of second structure lines 2222For 0.4mm, height H2For 0.2mm, the second structure lines
The outer surface of a cycle of 222 main structure is provided with the smoothly connected minor structure for containing 4 cycles, the minor structure
It is the second concavo-convex sub- curve, the amplitude A of the second concavo-convex sub- curve 2322For 0.05mm.
Embodiment 8
As embodiment 7 provide even smooth film, wherein, the outer surface of a cycle of the main structure of first structure line 221 is set
The smoothly connected minor structure for containing 40 cycles is equipped with, the minor structure is the first concavo-convex sub- curve, and the first concavo-convex son is bent
The amplitude A of line 2311For 0.005mm；The outer surface of a cycle of the main structure of second structure lines 222, which is provided with, contains 40
The smoothly connected minor structure in a cycle, the minor structure are the second concavo-convex sub- curves, the amplitude A of the second concavo-convex sub- curve 2322
For 0.005mm.
Embodiment 9
As embodiment 7 provide even smooth film, wherein, the outer surface of a cycle of the main structure of first structure line 221 is set
The smoothly connected minor structure for containing 20 cycles is equipped with, the minor structure is the first concavo-convex sub- curve, and the first concavo-convex son is bent
The amplitude A of line 2311For 0.01mm；The outer surface of a cycle of the main structure of second structure lines 222, which is provided with, contains 20
The smoothly connected minor structure in cycle, the minor structure are the second concavo-convex sub- curves, the amplitude A of the second concavo-convex sub- curve 2322For
0.01mm。
Embodiment 10
The even smooth film of one kind provided by the invention, as shown in fig. 6,1 is incidence surface, 2 be light-emitting surface, and 10 be base membrane layer；It is described
First structure line 221 has main structure and minor structure, and the surface of the main structure is covered with minor structure；The main structure has height
Low undulations, the minor structure also have height undulations.The RI of first micro-structure 2011For 1.59, first structure line
221 main structure is the tracks of line voltage, the length P of repetition period1For 0.4mm, height H1For 0.2mm, the table of the main structure
Covered with minor structure, the minor structure is the sub- curve 241 of the first circular arc in face, and the outer surface of a cycle of the main structure covers
The sub- curve 241 of first circular arc in 20 cycles, the radian (Rad of the sub- curve 241 of circular arc in a cycle1) it is 0.25 π；Second is micro-
The RI of structure 2022For 1.49, second structure lines 222 have main structure and a minor structure, the surface of the main structure covered with
Minor structure；The main structure has height undulations, and the minor structure also has height undulations.Second structure lines 222
Main structure be the tracks of line voltage, the length P of repetition period2For 0.4mm, height H2For 0.2mm, the master of the second structure lines 222
The upper surface of structure has a minor structure, and the minor structure is the sub- curve 242 of the second circular arc, a cycle of the main structure it is outer
Surface covers the sub- curve 242 of the second circular arc in 20 cycles, the radian (Rad of the sub- curve 242 of the second circular arc2) it is 0.25 π；First
The main structure of structure lines is equal with the cycle of the main structure of the second structure lines, and phase differs 270 °；Δ RI is 0.1.
Embodiment 11
As embodiment 10 provide even smooth film, wherein, the first structure line 221 does not have minor structure.First knot
Structure line 221 is the tracks of line voltage, the length P of repetition period1For 0.4mm, height H1For 0.2mm, the cycle of first structure line with
The cycle of the main structure of second structure lines is equal, and phase differs 270 °.
Embodiment 12
As embodiment 10 provide even smooth film, wherein, the outer surface of a cycle of the main structure of first structure line 221 is covered
40 sections of sub- curves 241 of (being referred to as 40 cycles) the first circular arc, the radian (Rad of the sub- curve 241 of one section of circular arc are covered1) be
0.25π；The upper surface of the main structure of second structure lines 222 has minor structure, and the minor structure is the sub- curve 242 of the second circular arc,
The outer surface of a cycle of the main structure covers 20 sections of the sub- curve 242 of the second circular arc, the arc of the sub- curve 242 of two circular arcs
Spend (Rad2) it is 0.25 π.
Embodiment 13
The even smooth film of one kind provided by the invention, wherein, as shown in fig. 7,1 is incidence surface, 2 be light-emitting surface, and 10 be base membrane layer；
The RI of first micro-structure 2011For 1.59, the main structure of first structure line 221 is the tracks of line voltage, the length P of repetition period1
For 0.4mm, height H1For 0.2mm, the surface of the main structure of the first structure line 221 is covered with minor structure, the minor structure
It is the sub- curve 241 of the first circular arc, the outer surface of a cycle of the main structure contains 20 sections and (was referred to as 20 week
Phase) the sub- curve 241 of the first circular arc, the radian of the sub- curve 241 of the first circular arc is 0.25 π.The RI of second micro-structure 2022For 1.49,
Second structure lines 222 are the tracks of line voltage, the length P of repetition period2For 0.4mm, height H2For 0.2mm, the second structure lines
The upper surface of 222 main structure has a minor structure, and the minor structure is the second concavo-convex sub- curve 232, one of the main structure
The outer surface in cycle covers the second concavo-convex sub- curve 232 comprising 10 cycles, the amplitude A of the second concavo-convex sub- curve 2322For
0.02mm；The main structure of first structure line is equal with the cycle of the main structure of the second structure lines, and phase differs 270 °；Δ RI is
0.1；
Embodiment 14
The even smooth film of one kind provided by the invention, as shown in figure 8,1 is incidence surface, 2 be light-emitting surface, and 10 be base membrane layer；First
The RI of micro-structure 2011For 1.59, first structure line 221 is connected the curve of composition for circular arc, the length P of repetition period1For
0.2mm, height H1For 0.1mm, the first micro-structure 201 is free of minor structure；The RI of second micro-structure 2022For 1.49, the second structure
The main structure of line 222 is the tracks of line voltage, the length P of repetition period2For 0.4mm, height H2For 0.2mm, the second structure lines
The upper surface of 222 main structure has a minor structure, and the minor structure is the second concavo-convex sub- curve 232, one of the main structure
The outer surface in cycle covers the second concavo-convex sub- curve 232 comprising 10 cycles, the amplitude A of the second concavo-convex sub- curve 2322For
0.02mm；The two neighboring minimum point of the first structure line 221 respectively correspond to the second structure lines main structure it is adjacent most
High point and minimum point.Δ RI is 0.1；
Embodiment 15
The even smooth film of one kind provided by the invention, as shown in figure 9,1 is incidence surface, 2 be light-emitting surface, and 10 be base membrane layer；First
The RI of micro-structure 2011For 1.59, first structure line 221 is the curve that circular arc is connected to form, the length P of repetition period1For
0.2mm, height H1For 0.1mm, first structure line 221 is free of minor structure；The RI of second micro-structure 2022For 1.49, the second structure
The main structure of line 222 is the tracks of line voltage, the length P of repetition period2For 0.4mm, height H2For 0.2mm, second structure
Covered with minor structure, the minor structure is the sub- curve 242 of the second circular arc on the surface of the main structure of line 222, the one of the main structure
The outer surface in a cycle contains the sub- curve 242 of 20 section of second circular arc, the radian (Rad of the sub- curve 242 of the second circular arc2) it is 0.25
π；The two neighboring minimum point of the first structure line 221 respectively correspond to the second structure lines main structure adjacent peak and
Minimum point.Δ RI is 0.1；
Embodiment 16
The even smooth film of one kind provided by the invention, as shown in Figure 10,1 is incidence surface, and 2 be light-emitting surface, and 10 be base membrane layer；First
The RI of micro-structure 2011For 1.57, the main structure of first structure line 221 is the tracks of line voltage, the length P of repetition period1For
0.4mm, height H1For 0.2mm, a cycle contains the concavo-convex sub- curve of smoothly connected first in 10 cycles, and first is recessed
The amplitude A of convex portion curve1For 0.02mm；The RI of second micro-structure 2022For 1.49, the main structure of the second structure lines 222 is sine
Function curve, the length P of repetition period2For 0.4mm, height H2For 0.2mm, a cycle contains the smooth phase in 10 cycles
The concavo-convex sub- curve of second even, the amplitude A of the second concavo-convex sub- curve 2322For 0.02mm；First structure line and the second structure lines
Cycle is equal, and phase differs 270 °；Δ RI is 0.1；In addition, the lower surface of base membrane layer 10 is provided with into light microstructured layers 11,
It is described enter together with the upper surface of light micro-structure fits closely with the following table of base membrane layer, it is described enter light micro-structure end face following table
The structure lines in face are made of semi arch and straightway, and the semi arch and straightway are alternately arranged, the length of the straightway with
The length of the diameter of semi arch is identical.It is described enter light micro-structure be along the three-dimensional that is extended to form perpendicular to the direction of end face by end face
Structure.It is described enter light micro-structure structure lines there is the fixed cycle, the length of a cycle is 0.4mm, is highly 0.2mm.
Comparative example 1
There is provided a kind of even smooth film of individual layer as a comparison case, as shown in figure 11,1 is incidence surface, and 2 be light-emitting surface, and 10 be basement membrane
Layer；Micro-structure 201 is the stretched vertically structure of first structure line 221, RI1For 1.59, the main structure of structure lines 221 is sinusoidal letter
Number curve, the length P of repetition period1For 0.4mm, height H1For 0.2mm, a cycle of main structure contains the first of 20 sections
The sub- curve 241 of circular arc, radian (Rad1) it is 0.25 π；
The optical of the even smooth film that even smooth film provided in an embodiment of the present invention and comparative example provide is tested in the following manner
Energy.
Light transmittance is tested：The diaphragm to be measured of an A4 size is taken, is put into light transmittance/mist degree tester and measures its light transmittance
Value.
Luminescence Uniformity：Direct-light-type backlight or illuminating LED lamp group are covered with correspondingly sized diaphragm to be measured, using photograph
Degree meter repeatedly measures the illumination of diverse location, and use spends (minimum/maximum %) and represents the luminous uniformity together.Neat degree with
Percentage represents that the uniformity of the neat higher expression light of degree is higher, represents that the even photosensitiveness of even smooth film is better.
Table 1
| Light transmittance (%) | Luminescence Uniformity (%) | |
| Embodiment 1 | 91.52 | 92.56 |
| Embodiment 2 | 91.34 | 92.72 |
| Embodiment 3 | 90.59 | 94.42 |
| Embodiment 4 | 92.32 | 91.73 |
It can be compared by the test result of embodiment in table 11,2 and drawn, in the case where other specification is constant, only changed
The phase difference of the main structure of first structure line and the main structure of the second structure lines (90 ° or 270 °), but still keep its slope larger
Place and smaller part mutual dislocation, the light transmittance and outgoing light homogeneity of double-deck even smooth film are basically unchanged.
It can be compared by the test result of embodiment in table 11,3,4 and drawn, in the case where other specification is constant, work as RI1
It is high, RI2When extremely low, Δ RI is maximum, and Δ RI is bigger, and outgoing light homogeneity is better.However, Δ RI is bigger, the printing opacity of even smooth film
Rate is lower, while in view of the cost of raw material problem of extreme refractive index, generally selects moderate Δ RI preferable, i.e. Δ RI is preferably
0.08-0.10；
Table 2
| Light transmittance (%) | Luminescence Uniformity (%) | |
| Embodiment 1 | 91.52 | 92.56 |
| Embodiment 5 | 86.35 | 95.17 |
| Embodiment 6 | 92.67 | 91.35 |
| Embodiment 7 | 93.52 | 88.24 |
| Embodiment 8 | 86.52 | 95.45 |
| Embodiment 9 | 90.72 | 93.36 |
It can be compared by the test result of embodiment in table 21,5,6 and drawn, the length of the repetition period of the main structure of structure lines
The amplitude of the concavo-convex sub- curve of degree, height and minor structure can influence light transmittance and outgoing light homogeneity to a certain extent, especially
The width of the concavo-convex sub- curve of minor structure as crucial even light unit is (by the length of a cycle of the main structure of structure lines and one
The quantity in the cycle of a cycle fovea superior convex portion curve determines) and amplitude to the influence bigger of light transmittance and outgoing light homogeneity.
It can be compared by the test structure of embodiment in table 21,7,8,9 and drawn, if the form of the main structure of structure lines, one
Length, the height of a repetition period is fixed, when the sub- curve of minor structure bumps is less (such as embodiment 7), has higher light transmittance,
But outgoing light homogeneity is relatively low；When concavo-convex sub- curve is more (such as embodiment 8), there is higher outgoing light homogeneity, but light transmittance compared with
It is low；When concavo-convex sub- curve moderate number be 10-20 cycle (such as embodiment 1,6,9), at the same have higher light transmittance with
Outgoing light homogeneity.The minor structure for the even smooth film that embodiment 5 provides is also 10 cycles (relative to the main structure of a cycle), but
The light transmittance of the even smooth film is poor, so, the combined influence of the comprehensive performance of even smooth film by Multiple factors.
Table 3
| Light transmittance (%) | Luminescence Uniformity (%) | |
| Embodiment 10 | 88.27 | 89.13 |
| Embodiment 11 | 91.27 | 87.46 |
| Embodiment 12 | 87.11 | 90.59 |
It can be compared by the test structure of embodiment 10-12 in table 3 and drawn, one of all parameters of micro-structure are fixed,
And another micro-structure its structure lines form, length, height it is fixed when, when the sub- curve of its circular arc is less (such as embodiment 11),
With higher light transmittance, but outgoing light homogeneity is relatively low；It is equal with higher light extraction when the sub- curve of circular arc is more (such as embodiment 12)
Evenness, but light transmittance is relatively low；When the sub- curve moderate number of circular arc is 20 cycles (such as embodiment 10), while have higher
Light transmittance and outgoing light homogeneity.It can also be drawn by table 3 and table 1, the data of table 2, when minor structure is concavo-convex sub- curve, printing opacity
Rate and even photosensitiveness are preferable.
Table 4
| Light transmittance (%) | Luminescence Uniformity (%) | |
| Embodiment 13 | 89.87 | 90.83 |
| Embodiment 14 | 92.47 | 88.64 |
| Embodiment 15 | 93.38 | 87.69 |
| Embodiment 16 | 93.53 | 94.61 |
It can be drawn by the test structure of embodiment 13-15 in table 4, when two layers of microstructure form is variant or even completely not
When consistent, as long as ensureing that the slope larger part of its structure lines and smaller part are staggered, double-deck even smooth film still has higher saturating
Light rate and outgoing light homogeneity.If incidence surface also has any micro-structure (embodiment 16), light transmittance and outgoing light homogeneity are certain
It can further be lifted in degree and (compare embodiment 13).
Table 5
| Light transmittance (%) | Luminescence Uniformity (%) | |
| Embodiment 10 | 88.27 | 89.13 |
| Comparative example 1 | 85.70 | 83.12 |
It can be drawn by the test result of embodiment 10 in table 5 and comparative example 1, the even smooth film of bilayer provided by the invention, profit
With the double-deck micro-structure of light-emitting surface, the multiple reflections of light and repeatedly refraction are carried out, by by first layer structure of emergent light surface
Light is further upset in the second layer, is dissipated, and produces the Luminescence Uniformity for being much better than individual layer light-emitting surface micro-structure, and light transmittance
Higher.Particularly, 1-4 of the embodiment of the present invention, the even smooth film that embodiment 6,9 and 16 provides have preferable light transmittance and even at the same time
Photosensitiveness.Wherein, the comprehensive performance for the even smooth film that embodiment 16 provides is best.
The foregoing is only a preferred embodiment of the present invention, is not intended to limit the scope of the present invention.It is every
The equivalent changes and modifications that content is done according to the present invention, are encompassed by the scope of the claims of the present invention.
Claims (8)
- A kind of 1. even smooth film, it is characterised in that the light film includes base membrane layer, the first microstructured layers and the second microstructured layers, Second microstructured layers are located at the upper surface of base membrane layer, and the first microstructured layers are located at the upper surface of the second microstructured layers, described The lower surface of base membrane layer is the incidence surface in face of light source, and the upper surface of first microstructured layers is light-emitting surface；Described first is micro- The structure lines that the upper surface of structure sheaf is intersected with cross section are first structure lines, the upper surface of second microstructured layers with it is transversal The structure lines that face is intersected are the second structure lines；First microstructured layers are that first structure line edge is prolonged perpendicular to the direction of cross section The three-dimensional structure to be formed is stretched, second micro-structure is the three-dimensional that the second structure lines edge is extended to form perpendicular to the direction of cross section Structure；The first structure line is height undulations, and second structure lines are height undulations；The first structure line With main structure and minor structure, covered with minor structure on the surface of the main structure；The main structure has height undulations, The minor structure also has height undulations；Second structure lines have main structure and minor structure, the table of the main structure Covered with minor structure on face；The main structure has height undulations, and the minor structure has height undulations；Described The slope of curve larger part of the main structure of one structure lines and the slope of curve smaller part of the main structure of second structure lines are mutual Staggeredly.
- 2. even smooth film according to claim 1, it is characterised in that the refractive index RI of first microstructured layers1Scope It is：1.57-1.62 the refractive index RI of second microstructured layers2Scope be：1.46-1.51, the RI1More than RI2, it is described RI1Subtract RI2The scope of the poor Δ RI of gained is：0.06-0.16.
- 3. even smooth film according to claim 1, it is characterised in that the main structure and/or the second knot of the first structure line The main structure of structure line is formed by connected bad circular arc.
- 4. even smooth film according to claim 1, it is characterised in that the main structure and/or the second knot of the first structure line The main structure of structure line is connected to form by bad circular arc and straightway, and the bad circular arc and straightway are alternately arranged.
- 5. even smooth film according to claim 1, it is characterised in that the main structure and/or the second knot of the first structure line The main structure of structure line is trigonometric function curve.
- A kind of 6. method for preparing the even smooth film described in one of claim 1-5, it is characterised in that the described method includes following steps Suddenly：(1) in the upper surface coated UV solidified resin of transparent base film layer, rolled with the mould with complementary structure, shape after curing Into the second microstructured layers；If incidence surface also contains micro-structure, need before the second micro-structure is applied, preferentially in the following table of base membrane layer Face coated UV solidified resin, is rolled also with the mould with complementary structure, is formed after curing into light micro-structure；(2) in the upper surface coated UV solidified resin of the second microstructured layers, rolled with the mould with complementary structure, after curing Form the first microstructured layers.
- 7. a kind of lighting apparatus, it is characterised in that the lighting apparatus includes the even smooth film and hair described in one of claim 1-5 Radiant, the illuminating source are arranged on the incidence surface of the even smooth film.
- 8. a kind of backlight of display, it is characterised in that the backlight includes the even smooth film described in one of claim 1-5 And illuminating source, the illuminating source are arranged on the incidence surface of the even smooth film.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101140331A (en) * | 2006-07-27 | 2008-03-12 | 三星电子株式会社 | Dual prism sheet and backlight assembly having the same |
| JP2010210904A (en) * | 2009-03-10 | 2010-09-24 | Hitachi Maxell Ltd | Optical diffusion sheet, and backlight device and liquid crystal display device using the same |
| CN102121666A (en) * | 2010-12-28 | 2011-07-13 | 友达光电股份有限公司 | Diffusion sheet and backlight module |
| CN102878527A (en) * | 2012-09-14 | 2013-01-16 | 张家港康得新光电材料有限公司 | Light uniformizing film and illuminating equipment using light uniformizing film |
| CN103823263A (en) * | 2014-03-10 | 2014-05-28 | 宁波东旭成新材料科技有限公司 | Composite prismatic lens |
-
2015
- 2015-04-16 CN CN201510179341.4A patent/CN104832882B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101140331A (en) * | 2006-07-27 | 2008-03-12 | 三星电子株式会社 | Dual prism sheet and backlight assembly having the same |
| JP2010210904A (en) * | 2009-03-10 | 2010-09-24 | Hitachi Maxell Ltd | Optical diffusion sheet, and backlight device and liquid crystal display device using the same |
| CN102121666A (en) * | 2010-12-28 | 2011-07-13 | 友达光电股份有限公司 | Diffusion sheet and backlight module |
| CN102878527A (en) * | 2012-09-14 | 2013-01-16 | 张家港康得新光电材料有限公司 | Light uniformizing film and illuminating equipment using light uniformizing film |
| CN103823263A (en) * | 2014-03-10 | 2014-05-28 | 宁波东旭成新材料科技有限公司 | Composite prismatic lens |
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