CN104762594A - Method for solving poor imaging of hemispherical concave mirror - Google Patents

Method for solving poor imaging of hemispherical concave mirror Download PDF

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Publication number
CN104762594A
CN104762594A CN201510147654.1A CN201510147654A CN104762594A CN 104762594 A CN104762594 A CN 104762594A CN 201510147654 A CN201510147654 A CN 201510147654A CN 104762594 A CN104762594 A CN 104762594A
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China
Prior art keywords
setting
concave mirror
mgf2
optical
plated film
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Granted
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CN201510147654.1A
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Chinese (zh)
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CN104762594B (en
Inventor
马云燕
彭伟森
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Shanghai Xinzhi precision optics Co., Ltd
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JIANGSU SHUANGYI OPTICAL INSTRUMENT CO Ltd
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Priority to CN201510147654.1A priority Critical patent/CN104762594B/en
Publication of CN104762594A publication Critical patent/CN104762594A/en
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Publication of CN104762594B publication Critical patent/CN104762594B/en
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  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention discloses a method for solving poor imaging of a hemispherical concave mirror. The method comprises the following steps: (1) designing a thin film; (2) setting the specification of optical reflectivity; (3) setting a coating processing film system; and (4) performing vacuum coating. According to the method disclosed by the invention, the design is reasonable, the structure is simple, the effect is reliable, the coating process requirements of hemispherical concave mirror lenses in the lens production process can be really met, and the product quality is ensured. According to comprehensive tests in multiple aspects, the maximum value of the optical reflectivity of the hemispherical concave mirror is 1.2 percent or below, when the average value of the optical reflectivity value is 0.8 percent or below, the color difference does not exist on the whole imaging surface, the hemispherical concave mirror is easy to produce and process, the stability is high, and the optical imaging requirement can be completely met.

Description

A kind ofly solve the bad method of hemisphere concave mirror imaging
Technical field
The present invention relates to eyeglass production technical field, particularly relate to the method that in lens optical vacuum plating, the imaging of hemisphere concave mirror is bad.
Background technology
At present, semisphere concave mirror is widely used in reverse image, monitoring instrument equipment, because its effect is obvious, all actively promotes both at home and abroad.Lens optical plated film is the critical process of hemisphere concave mirror imaging effect quality.Nearly hemisphere concave mirror plated film usually can because of difference of altitude (distance in eyeglass concave surface centerand edge portion) reason, cause the aberration at the edge of concave surface abrasive surface larger, thus there is " ghost " (there is obvious colour-difference the margin and center position of image) in imaging of taking pictures after causing lens assembling, major cause is: 1, the plated film specification of setting and optical band claimed range wide not, the highest setting 420-780nm is not enough to accomplish the plated film scope that concave mirror is comprehensively wider; 2, Film Design aspect, the thickness collocation between each layer is accurate not to concave mirror, so at current optical mirror slip field of vacuum coating, after solving concave mirror assembling, imaging occurs that the phenomenon of " ghost " just seems extremely important.
Summary of the invention
In order to overcome the deficiencies in the prior art, the object of the present invention is to provide and a kind ofly solve the bad method of hemisphere concave mirror imaging, is that film by designing wide wave band and the setting of plated film processing of films system obtain the bad method of a kind of hemisphere concave mirror imaging.
Object of the present invention is realized by following technical solution: a kind ofly solve the bad method of hemisphere concave mirror imaging, comprises the following steps: 1) film design, 2) optical reflectivity specification setting, 3) plated film processing of films system setting, 4) vacuum plating; Be characterised in that:
1), film design: use TFC thin film design software to set the scope of wide wave band: 425nm-1050nm;
2), optical reflectivity specification setting: 425nm-1050nm:Rmax < 1.2%, Rave < 0.8%;
3), plated film processing of films system setting: H4:TiO2 and La2O3 mixture, MGF2 magnesium fluoride;
Title H4 MGF2 H4 MGF2 H4 MGF2 H4 MGF2
Optical thickness 04.058 0.1347 0.846 0.1 2.8011 0.2445 0.4633 1.2115
Physical thickness 26.84 13.48 56.01 10.01 185.26 24.47 30.64 121.24
Process period 45″ 40″ 108″ 24″ 336″ 66″ 53″ 372″
4), vacuum plating: the optical mirror slip setting film system is placed in vacuum plating unit, eyeglass to be coated faces down and is placed in the collar, again the eyeglass collar is placed on coating equipment running card umbrella, shut vacuum chamber door to vacuumize, 30 minutes pumpdown times of setting, coating temperature 320 ± 20 DEG C, plated film vacuum tightness is at below 2.0*10-5Torr plated film, and plated film terminates namely to obtain optical mirror slip.
The present invention, reasonable in design, simple structure, reliable effect, can conscientiously meet the processing requirement that in eyeglass production process, hemisphere concave surface is glasses lens plated, guarantee quality product.Through many-sided integration test, hemisphere concave mirror optical reflectivity maximum value will below 1.2%, and mean value will below 0.8% time, whole imaging surface does not have aberration and is easy to process for processing, and stability is strong, can reach optical imagery requirement completely again.
Embodiment
For reaching the requirement (i.e. the requirement of " ghost " phenomenon elimination) of optical reflectivity, first selected processing conditions: vacuum plating unit, pumpdown time more than 30 minutes, coating temperature 320 ± 20 DEG C, below plated film vacuum tightness 2.0*10-5Torr.
Secondly, set by plated film processing of films system: CH4:TiO2 and La2O3 mixture, MGF2(magnesium fluoride).
Title H4 MGF2 H4 MGF2 H4 MGF2 H4 MGF2
Optical thickness 04.058 0.1347 0.846 0.1 2.8011 0.2445 0.4633 1.2115
Physical thickness 26.84 13.48 56.01 10.01 185.26 24.47 30.64 121.24
Process period 45″ 40″ 108″ 24″ 336″ 66″ 53″ 372″
The scope of optical band is broadened (ultra broadband wave band), requires constantly to improve the setting of film system by Rmax < 1.2%, Rave < 0.8% these 2, finally determine that the scope of optical band is between 425nm ~ 1050nm.Like this, after the setting of film system is relatively fixing, the scope of optical band is fixed by film design (TFC optical thin film design software): 425nm ~ 1050nm.Like this, the imaging of hemisphere concave mirror is bad just can thoroughly solve, and can reach manufacturing requirements completely.
The above-mentioned embodiment enumerated is only illustration of the present invention, is not restriction made for the present invention.The present invention can also adopt alternate manner to implement, and does not state one by one at this.Every employing is equal to the technical scheme of replacement or equivalent transformation formation, all belongs to the scope of protection of present invention.

Claims (1)

1. solve the method that the imaging of hemisphere concave mirror is bad, comprise the following steps: 1) film design, 2) optical reflectivity specification setting, 3) plated film processing of films system setting, 4) vacuum plating; Be characterised in that:
1), film design: use TFC thin film design software to set the scope of wide wave band: 425nm-1050nm;
2), optical reflectivity specification setting: 425nm-1050nm:Rmax < 1.2%, Rave < 0.8%;
3), plated film processing of films system setting: H4:TiO2 and La2O3 mixture, MGF2 magnesium fluoride;
Title H4 MGF2 H4 MGF2 H4 MGF2 H4 MGF2 Optical thickness 04.058 0.1347 0.846 0.1 2.8011 0.2445 0.4633 1.2115 Physical thickness 26.84 13.48 56.01 10.01 185.26 24.47 30.64 121.24 Process period 45″ 40″ 108″ 24″ 336″ 66″ 53″ 372″
4), vacuum plating: the optical mirror slip setting film system is placed in vacuum plating unit, eyeglass to be coated faces down and is placed in the collar, again the eyeglass collar is placed on coating equipment running card umbrella, shut vacuum chamber door to vacuumize, 30 minutes pumpdown times of setting, coating temperature 320 ± 20 DEG C, plated film vacuum tightness is at below 2.0*10-5Torr plated film, and plated film terminates namely to obtain optical mirror slip.
CN201510147654.1A 2015-03-31 2015-03-31 A kind of hemisphere concave mirror that solves is imaged bad method Active CN104762594B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510147654.1A CN104762594B (en) 2015-03-31 2015-03-31 A kind of hemisphere concave mirror that solves is imaged bad method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510147654.1A CN104762594B (en) 2015-03-31 2015-03-31 A kind of hemisphere concave mirror that solves is imaged bad method

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CN104762594A true CN104762594A (en) 2015-07-08
CN104762594B CN104762594B (en) 2017-03-15

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995002199A1 (en) * 1993-07-08 1995-01-19 Hughes Training, Inc. Composite mirror and fabrication method with precipitated reflective coating
CN102508361A (en) * 2011-10-31 2012-06-20 北京空间机电研究所 Spatial large view field, superwide spectral band and multispectral imaging optical system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995002199A1 (en) * 1993-07-08 1995-01-19 Hughes Training, Inc. Composite mirror and fabrication method with precipitated reflective coating
CN102508361A (en) * 2011-10-31 2012-06-20 北京空间机电研究所 Spatial large view field, superwide spectral band and multispectral imaging optical system

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Effective date of registration: 20180910

Address after: 212300 block A, 19 Chuang Chuang garden, Danyang Development Zone, Zhenjiang, Jiangsu.

Patentee after: Jiangsu Xin Shi Tong Photoelectric Technology Co., Ltd.

Address before: 212300 1 Danyang Road, Danyang Development Zone, Jiangsu

Patentee before: Jiangsu Shuangyi Optical Instrument Co., Ltd.

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Effective date of registration: 20190313

Address after: 223700 Siyang Economic Development Zone, Suqian City, Jiangsu Province, No. 11 FutureMiddle Road

Patentee after: Jiangsu Ouda Optics Co., Ltd.

Address before: 212300 block A, 19 Chuang Chuang garden, Danyang Development Zone, Zhenjiang, Jiangsu.

Patentee before: Jiangsu Xin Shi Tong Photoelectric Technology Co., Ltd.

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Effective date of registration: 20191223

Address after: Room c506a-19, University Business Park, No. 99, University Road, Xuzhou hi tech Industrial Development Zone, Xuzhou City, Jiangsu Province

Patentee after: Xuzhou Tiancheng Intelligent Technology Co., Ltd

Address before: 223700 Siyang Economic Development Zone, Suqian City, Jiangsu Province, No. 11 FutureMiddle Road

Patentee before: Jiangsu Ouda Optics Co., Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20200513

Address after: 200000 floors 1 and 2, building 10, No. 255, Beihe Road, Jiading District, Shanghai

Patentee after: Shanghai Xinzhi precision optics Co., Ltd

Address before: Room c506a-19, University Business Park, No. 99, University Road, Xuzhou hi tech Industrial Development Zone, Xuzhou City, Jiangsu Province

Patentee before: Xuzhou Tiancheng Intelligent Technology Co., Ltd