CN104730794B - A kind of multi-layer film structure electrochromic display device (ECD) - Google Patents
A kind of multi-layer film structure electrochromic display device (ECD) Download PDFInfo
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- CN104730794B CN104730794B CN201510121404.0A CN201510121404A CN104730794B CN 104730794 B CN104730794 B CN 104730794B CN 201510121404 A CN201510121404 A CN 201510121404A CN 104730794 B CN104730794 B CN 104730794B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/155—Electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
- G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
- G02F1/1525—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material characterised by a particular ion transporting layer, e.g. electrolyte
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/1533—Constructional details structural features not otherwise provided for
- G02F2001/1536—Constructional details structural features not otherwise provided for additional, e.g. protective, layer inside the cell
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The present invention relates to a kind of multi-layer film structure electrochromic display device (ECD).Use electrochromism technology and photonic crystal technology, two kinds of electrochromic materials are replaced into film forming, form 1-D photon crystal, after ion implanting electrochromic layer, different changes can occur for different electrochromic material refractive indexes, cause the change of photonic crystal band, change the reflectance spectrum of device with this, so as to realize consecutive variations and the regulation and control of color.
Description
Technical field
The present invention relates to electrochromic material technical field, more particularly to a kind of electrochromic display device (ECD) of multi-layer film structure
And its manufacture method.
Background technology
Electrochromic material by changing extra electric field, can realize the optical property of material as reflected, through or absorb
Generation reversible change.Driving electrochromic device only needs to the power of very little, compared to conventional picture tube technology, with peace
Complete quick, small volume, is one of main flow of Display Technique of new generation.Its excellent properties can also be used for smart window, rearview mirror simultaneously
Deng.
Electrochromic device generally comprises electrode layer, electrochromic layer, dielectric substrate.By applying certain electricity to electrode
Ion such as lithium ion or hydrogen ion in pressure, electrolyte inject in electrochromic layer occurs reversible oxidation with abjection, material
Reduction reaction, the change of simultaneous material color.
For existing electrochromic display, mostly using single photochromic layer, such as patent CN200910023682.7
This kind of electrochromic display can realize two or more color transitions, but can not realize the continuously adjustabe of spectrum, i.e. face
The continuous change of color.
The present invention is based on electrochromism technology and photonic crystal technology, and two kinds of electrochromic materials are replaced into film forming, is formed
1-D photon crystal, after ion implanting electrochromic layer, different changes can occur for different electrochromic material refractive indexes
Change, for example tungsten oxide position high-index material, after injection ion, refractive index declines；Nickel oxide is low-index material, inject from
Refractive index rises after son, causes the change of photonic crystal band, changes the reflectance spectrum of device with this, so as to realize the company of color
Continuous change and regulation and control.
The content of the invention
In view of above-mentioned analysis, the present invention is intended to provide a kind of continuous change based in electrochromic limit of visible spectrum
The display device of change, to solve the problem of existing electrochromic display device variable color is single.
The purpose of the present invention is mainly achieved through the following technical solutions：
A kind of multi-layer film structure electrochromic display device (ECD) is using any materials as substrate, using magnetron sputtering method, successively sputter
Bottom electrode layer, ion storage layer, dielectric substrate, 1-D photon crystal photochromic layer, top electrode layer and protective layer.
Wherein substrate can be any flexible or rigid substrate, play a part of to support whole display；Bottom electrode layer and top
Electrode layer can be with identical, can also be different, and it is by transparent metal oxide such as tin-doped indium oxide, fluorine-doped tin oxide, aluminium
Doping zinc-oxide and metallic film are constituted with one or more of combinations in grid, and wherein metal oxide electrode is typically thick
50-500nm, the general thickness of metal electrode is 2-20nm；Ion storage layer can be any one electrochromic material, such as aoxidize
Tungsten, nickel oxide, titanium oxide, molybdenum oxide, vanadic anhydride, or the hybrid ionic storage layer of their wherein two or mores thickness
Degree is generally 100-400nm；Dielectric substrate is the material of a kind of electronic isolation and ion conducting, thickness that it must enough to prevent
Only electric pole short circuit, such as lithium carbonate, lithium phosphate, nitrogen lithium phosphate, lithium tantalate, lithium aluminate, lithium nitride, its thickness is generally 50-
500nm；Protective layer is by silica, magnesium fluoride or high polymer material composition, for protecting whole device and playing certain increasing
Effect thoroughly.
Wherein 1-D photon crystal layer is the periodic structure being made up of different refractivity material, and each cycle rolls over for a floor height
Rate material and one layer of low-index material composition are penetrated, it there can be 2-10 cycle；There is a kind of high folding in wherein each cycle
Penetrate rate material and a kind of low-index material is constituted；Wherein high-index material, after injection ion, refractive index reduction；Low folding
Penetrate after rate material, injection ion, refractive index rises；The thickness of wherein every kind of refraction materials is between 10-300nm.
The present invention has the beneficial effect that：
Existing electrochromism technology can only realize the display of one or more of colors, and the display of the present invention, Ke Yishi
Now the color in the long scope of all visible wavelengths is shown.Apply different voltages, device reflectance spectrum entirely can may be used
See in spectral region and move, show a variety of colors.
Other features and advantages of the present invention will be illustrated in the following description, also, the partial change from specification
Obtain it is clear that or being understood by implementing the present invention.The purpose of the present invention and other advantages can be by the explanations write
Specifically noted structure is realized and obtained in book, claims and accompanying drawing.
Brief description of the drawings
Accompanying drawing is only used for showing the purpose of specific embodiment, and is not considered as limitation of the present invention, in whole accompanying drawing
In, identical reference symbol represents identical part.
Fig. 1 is the schematic cross-section of device described in embodiment one
Fig. 2 is the photon crystal structure section matters figure in device
Fig. 3 is the schematic cross-section of device described in embodiment two
Fig. 4 is reflectance spectrum variation diagram when device applies voltage
Embodiment
The preferred embodiments of the present invention are specifically described below in conjunction with the accompanying drawings, wherein, accompanying drawing constitutes the application part, and
It is used for the principle for explaining the present invention together with embodiments of the present invention.
Embodiment one
A kind of multi-layer film structure electrochromic display device (ECD) 100, such as Fig. 1.Using any materials as substrate 10, magnetron sputtering is used
Method, successively sputter bottom electrode layer 20, ion storage layer 30, dielectric substrate 40,1-D photon crystal photochromic layer 50, top electrode layer 60
And protective layer 70.
Wherein substrate 10 can be any flexible or rigid substrate, play a part of to support whole display；Bottom electrode layer 20
Can be with identical with top electrode layer 60, can also be different, it is by transparent metal oxide such as tin-doped indium oxide, Fluorin doped oxidation
Tin, aluminium-doped zinc oxide are constituted,；Ion storage layer 30 can be any one electrochromic material, such as tungsten oxide, nickel oxide,
Titanium oxide, molybdenum oxide, vanadic anhydride, or their wherein two or mores mixing；Dielectric substrate 40 is that a kind of electronics is exhausted
Edge and the material of ion conducting, thickness that he must enough to prevent electric pole short circuit, for example lithium carbonate, lithium phosphate, nitrogen lithium phosphate,
Lithium tantalate, lithium aluminate, lithium nitride etc.；Protective layer 70 is whole for protecting by silica, magnesium fluoride or high polymer material composition
Device simultaneously plays certain anti-reflection effect.
Wherein 1-D photon crystal layer 50 is the periodic structure being made up of different refractivity material, and each cycle is a floor height
Refraction materials and one layer of low-index material composition.It is illustrated in figure 24 periodic structures.Wherein 51,53,55,57 be high folding
Rate material is penetrated, after injection ion, refractive index reduction；52nd, 54,56,58 be low-index material, is injected after ion, refractive index
Rise.
Embodiment two
A kind of multi-layer film structure electrochromic display device (ECD) 110, such as Fig. 3.Using any materials as substrate 10, magnetron sputtering is used
Method, successively sputtered ions barrier layer 11, bottom metallic electrode layer 19, bottom electrode layer 20, ion storage layer 30, dielectric substrate 40, one
Dimensional photonic crystal photochromic layer 50, top electrode layer 60, top metal electrode layer 61 and protective layer 70.
Wherein the rigid glass substrate of substrate 10, plays a part of to support whole display；Ion barrier 11 is general by dioxy
SiClx is constituted, to stop that the sodium ion in glass enters in device；Bottom metallic electrode layer 19 is with top metal electrode layer by layer 61 by gold
Belong to silverskin to constitute；Bottom electrode layer 20 and top electrode layer 60 can be with identical, can also be different, it be by transparent metal oxide such as
One or more of combination structures in tin-doped indium oxide, fluorine-doped tin oxide, aluminium-doped zinc oxide and metallic film and grid
Into；Ion storage layer 30 can be any one electrochromic material, such as tungsten oxide, nickel oxide, titanium oxide, molybdenum oxide, or
The mixing of their wherein two or mores, for storing ion；Dielectric substrate 40 is a kind of electronic isolation and ion is turned on
Material, it is thick to prevent electric pole short circuit, such as lithium carbonate, lithium phosphate, nitrogen lithium phosphate, lithium tantalate, lithium aluminate, nitrogen that he must be enough
Change lithium etc.；Protective layer 70 is by silica, magnesium fluoride or high polymer material composition, for protecting whole device and playing certain
Anti-reflection effect.
Wherein 1-D photon crystal layer 50 is the periodic structure being made up of different refractivity material, and each cycle is a floor height
Refraction materials and one layer of low-index material composition are identical with embodiment one.It is illustrated in figure 24 periodic structures.
Wherein 51,53,55,57 be high-index material, after injection ion, refractive index reduction；52nd, 54,56,58 be low-refraction material
After material, injection ion, refractive index rises.
After different voltages are applied to device, device is changed by reflection feux rouges to reflection blue-light reversible, variation diagram such as Fig. 4
It is shown.
In summary, the embodiments of the invention provide a kind of display based on electrochromism technology and photonic crystal technology
Device, after application of a voltage, reflectance spectrum continuously adjustabe can show all colours of visible waveband to device.
The foregoing is only a preferred embodiment of the present invention, but protection scope of the present invention be not limited thereto,
Any one skilled in the art the invention discloses technical scope in, the change or replacement that can be readily occurred in,
It should all be included within the scope of the present invention.
Claims (6)
1. a kind of multi-layer film structure electrochromic display device (ECD), it is characterised in that：Using magnetron sputtering method in substrate (10) successively
Sputter bottom electrode layer (20), ion storage layer (30), dielectric substrate (40), 1-D photon crystal photochromic layer (50), top electrode layer
And protective layer (70) (60)；
The 1-D photon crystal photochromic layer (50) is the periodic structure being made up of different refractivity material, and each cycle is one layer
High-index material and one layer of low-index material composition, the thickness of every kind of refraction materials is 10~300nm, and with 2
~10 cycles, the 1-D photon crystal photochromic layer (50) is membrane structure；
The bottom electrode layer (20) is made up of transparent metal oxide and metal electrode, and the transparent metal oxide is tin dope
Any of indium oxide, fluorine-doped tin oxide and aluminium-doped zinc oxide, thickness are 50-500nm；The metal electrode is metal
Any of film and grid, thickness are 2-20nm；
The thickness of the ion storage layer (30) is 100-400nm；
The thickness of the dielectric substrate (40) is 50-500nm.
2. multi-layer film structure electrochromic display device (ECD) according to claim 1, it is characterised in that：Ion storage layer (30) by
Following electrochromic material is constituted：Tungsten oxide, nickel oxide, titanium oxide, molybdenum oxide, vanadic anhydride, or their two of which
Or a variety of mixing.
3. multi-layer film structure electrochromic display device (ECD) according to claim 1, it is characterised in that：Dielectric substrate (40) is one
Kind of electronic isolation and the material of ion conducting, the thickness that the dielectric substrate (40) must enough is to prevent electric pole short circuit；With
The dielectric substrate (40) is by any of lithium carbonate, lithium phosphate, nitrogen lithium phosphate, lithium tantalate, lithium aluminate, lithium nitride structure
Into.
4. multi-layer film structure electrochromic display device (ECD) according to claim 1, it is characterised in that：Protective layer (70) is by dioxy
SiClx, magnesium fluoride or high polymer material composition, for protecting whole device and playing certain anti-reflection effect.
5. multi-layer film structure electrochromic display device (ECD) according to claim 1, it is characterised in that：Also include ion barrier
(11), bottom metallic electrode layer (19) and top metal electrode layer (61)；With
In substrate (10) successively sputtered ions barrier layer (11), bottom metallic electrode layer (19), bottom electrode layer (20), ion storage
Layer (30), dielectric substrate (40), 1-D photon crystal photochromic layer (50), top electrode layer (60), top metal electrode layer (61) and
Protective layer (70).
6. multi-layer film structure electrochromic display device (ECD) according to claim 5, it is characterised in that：The bottom metallic electrode layer
(19) it is made up of with top metal electrode layer (61) metal silverskin.
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| CN105350879A (en) * | 2015-09-28 | 2016-02-24 | 陈杨珑 | Building window having solar power generation function and method for manufacturing same |
| CN105204260A (en) * | 2015-09-28 | 2015-12-30 | 邱林新 | Solar power generation building based on electrochromism device and manufacturing method thereof |
| CN110184576B (en) * | 2019-06-18 | 2021-08-10 | 上海空间电源研究所 | Flexible inorganic electrogenerated variable emissivity material and preparation method and application thereof |
| CN110471231A (en) * | 2019-08-21 | 2019-11-19 | Oppo广东移动通信有限公司 | Housing unit and electronic equipment |
| CN111045269A (en) * | 2019-12-31 | 2020-04-21 | Oppo广东移动通信有限公司 | Photonic crystal color changing device, color changing method, shell and electronic equipment |
| KR102421041B1 (en) * | 2020-06-09 | 2022-07-14 | 에스케이씨 주식회사 | Flexible electrochromic device |
| CN112130391B (en) * | 2020-08-24 | 2021-11-05 | 北京理工大学 | Multilayer film capable of realizing real-time accurate color change based on electric field control |
| CN114253039A (en) * | 2020-09-22 | 2022-03-29 | 中国科学院苏州纳米技术与纳米仿生研究所 | Colorful electrochromic structure with high brightness, saturation and purity, device and manufacturing method |
| CN113005416B (en) * | 2021-03-01 | 2021-11-30 | 森科五金(深圳)有限公司 | Wine red film layer and preparation method thereof |
| CN113419392B (en) * | 2021-08-23 | 2021-11-12 | 深圳大学 | Self-powered electrochromic display device |
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| TW200928538A (en) * | 2007-12-26 | 2009-07-01 | Ind Tech Res Inst | Display device |
| CN102978674A (en) * | 2012-11-19 | 2013-03-20 | 哈尔滨工业大学 | Preparation method of electrochromic film having photonic crystal structure |
| CN104216192A (en) * | 2014-09-16 | 2014-12-17 | 哈尔滨工业大学 | Preparation method of novel fast-response high-contrast electrochromic device |
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| US7660029B2 (en) * | 2006-08-01 | 2010-02-09 | Universite De Moncton | Chromogenically tunable photonic crystals |
| EP2260534A4 (en) * | 2008-03-05 | 2014-04-09 | Opalux Inc | Photonic crystal electrical property indicator |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200928538A (en) * | 2007-12-26 | 2009-07-01 | Ind Tech Res Inst | Display device |
| CN102978674A (en) * | 2012-11-19 | 2013-03-20 | 哈尔滨工业大学 | Preparation method of electrochromic film having photonic crystal structure |
| CN104216192A (en) * | 2014-09-16 | 2014-12-17 | 哈尔滨工业大学 | Preparation method of novel fast-response high-contrast electrochromic device |
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