CN104690969A - Bionic irregular micro nano composite structure manufacturing process based on 3D ejection printing technique - Google Patents
Bionic irregular micro nano composite structure manufacturing process based on 3D ejection printing technique Download PDFInfo
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- CN104690969A CN104690969A CN201510070121.8A CN201510070121A CN104690969A CN 104690969 A CN104690969 A CN 104690969A CN 201510070121 A CN201510070121 A CN 201510070121A CN 104690969 A CN104690969 A CN 104690969A
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Abstract
The invention discloses a bionic irregular micro nano composite structure manufacturing process based on a 3D ejection printing technique. The bionic irregular micro nano composite structure manufacturing process comprises the following process steps: 1, patterning a mother set; 2, performing 3D ejection printing; 3, preparing a substrate; and 4, transferring and embossing. The bionic irregular micro nano composite structure manufacturing process can be used for manufacturing a micro nano composite structure of a gecko strip and has the advantages of high efficiency, low cost, large-scale manufacturing potential and the like.
Description
Technical field
The present invention relates to 3D to print, particularly a kind of manufacture craft of the bionical special-shaped micron and nanometer composite structure based on 3D jet printing technology.
Background technology
Gecko can walk freely on smooth wall, and can lose money instead of making money on the ceiling.This is because there is adhesive force special between gecko pin with the body surface acted on mutually, but the mechanism of action of this adhesive force, and since becoming several century, one to the puzzle be difficult to resolve.
By surface sweeping Electronic Speculum, Russell and Ruibal finds that gecko every foot bottom has about 500,000 tiny bristles, the size of every root bristle is about 30-130 μm, and the end of bristle is branched into again hundreds of more tiny fine hair.American scientist Autumn etc. studies discovery by experiment, very little between the firm fluff structures of this micro-nano compound and contact surface molecule, thus creates " van der waals force ".Although the adhesion that every root bristle produces is very faint, millions of add up after be but enough to support the health of gecko.The potential use of this bionical " gecko band " is a lot, the safety device that such as climber uses, the gloves of the high viscosity that goalkeeper uses, and the medical bandage only relying on " van der waals force " just can stick easily etc.And in the middle of current bionical " gecko band " manufacture craft, there is complex process (as needs make mask plate, photoetching, turn over mould), high cost (as adopted polysilicon, ICP etching), process repeatability is poor, is difficult to problem prepared by large area.
Therefore, be necessary to propose a kind of for " gecko band " structure can be realized, and there is high efficiency, low cost, possess the micro-nano compound structure manufacture craft that large area prepares the advantages such as potentiality.
Summary of the invention
Given this, the invention provides a kind of bionical special-shaped micro-nano compound structure manufacturing process based on 3D jet printing technology, this technique comprises:
A () mother matrix patterning step, prepares micro-structural by photoetching and dark dry etch process on monocrystalline silicon mother matrix;
B () jet printing step, first carries out low-surface-energy process to substrate patterned in step (a), then by jet printing technique resin deposition microlens array in substrate, and carry out ultra-violet curing;
C () prepares substrate step, other substrate applies ultraviolet-curing resin, selects the resin material identical with step (b);
(d) transfer imprint step, mother matrix after the substrate of step (c) gained being processed with step (b) docks and carries out transfer and impresses, and applies certain pressure, carries out ultra-violet curing, then the demoulding, the resin material on final mother matrix is transferred in substrate.
The above-mentioned manufacturing process shifting stamping technique in conjunction with 3D jet printing technology and nanometer, has high efficiency, the process advantage of low cost, has large area simultaneously and prepare prospect.
Accompanying drawing explanation
Fig. 1 a to 1d is the Making programme figure preparing submicron order structure on mother matrix shown in one embodiment of the present of invention, wherein:
Fig. 1 a is spin coating electron beam adhesive technique, and Fig. 1 b is electron beam exposure technique, and Fig. 1 c is dark dry etch process, and Fig. 1 d goes or stays membrane process; 11 is monocrystalline silicon mother matrix, and 12 is electron beam adhesive, and 13 is the electron beam adhesive after development, and 14 is the monocrystalline silicon after dark dry etching;
Fig. 2 prepares microlens array flow chart for the jet printing shown in one embodiment of the present of invention, wherein: Fig. 2 a is low-surface-energy treatment process, and Fig. 2 b jet printing technique; 21 is patterned silicon mother matrix, and 22 is low-surface-energy C4F8 layer, and 23 is resin lenslet array;
Fig. 3 is the transfer impression flow chart shown in one embodiment of the present of invention, and wherein: Fig. 3 a is that ultra-violet curing glue revolves figure technique, Fig. 3 b is transfer imprint step, and Fig. 3 c is demoulding step; 31 is quartz substrate, and 32 is ultraviolet-curing resin, and 33 is the resin of stamp transfer;
The scanning electron microscope (SEM) photograph that Fig. 4 prepares micro-nano compound structure structure for the quartz substrate shown in one embodiment of the present of invention shifting impression.
Detailed description of the invention
In one embodiment, the invention discloses a kind of bionical special-shaped micro-nano compound structure manufacturing process based on 3D jet printing technology, this technique comprises:
A () mother matrix patterning step, prepares micro-structural by photoetching and dark dry etch process on monocrystalline silicon mother matrix;
B () jet printing step, first carries out low-surface-energy process to substrate patterned in step (a), then by jet printing technique resin deposition microlens array in substrate, and carry out ultra-violet curing;
C () prepares substrate step, other substrate applies ultraviolet-curing resin, selects the resin material identical with step (b);
(d) transfer imprint step, mother matrix after the substrate of step (c) gained being processed with step (b) docks and carries out transfer and impresses, and applies certain pressure, carries out ultra-violet curing, then the demoulding, the resin material on final mother matrix is transferred in substrate.
For this embodiment, adopt above-mentioned processing step to prepare bionical micro-nano compound structure, can the disposable structure by different characteristic size be transferred on ultra-violet curing glue, and two-layer configuration is same material, there is stronger stability and longer service life; As the substrate of mother matrix, can reuse, can easily with the ultraviolet-curing resin demoulding through surface treatment, uniformity is better; The 3D jet printing technology adopted belongs to increasing material technology of preparing, and stock utilization is high, greatly reduces cost; And adopt transfer impression, lower to the requirement of Embosser, even if when not applying force of impression, rely on the natural flow of resin also can make the natural adhesion of the resin on substrate and mother matrix, technique is comparatively easy.More excellent, the transfer impression of micro-contact is better.
More excellent, in another embodiment: described other substrate can be rigid basement as quartz, silicon chip, also can be flexible substrates as PET, PDMS etc., depend on its application.That is, this embodiment for rigidity and flexible two class substrates all applicable.
More excellent, in another embodiment: described microstructure features is of a size of submicron order, and resin is filled to microstructure portion, mother matrix defines initial micro-nano compound structure.
For this embodiment, can disposablely make the structure of the micron order in this area and submicron order be transferred on ultra-violet curing glue, and two-layer configuration is same material, there is stronger stability and longer service life; As the substrate with submicron order structure of mother matrix, can reuse, can easily with the ultraviolet-curing resin demoulding through surface treatment, uniformity is better; The 3D jet printing technology adopted also is convenient to realize the higher speed preparing micron order figure; Drop after 3D jet printing on mother matrix has the microlens structure of sphere pattern due to surface tension self-assembling formation, and it is spherical for shifting micron scale construction in the rear substrate of impression, can obtain special-shaped bionical submicron order structure.
More excellent, in another embodiment: in step (b), by regulating jet printing parameter, including but not limited to spray printing number of times, droplet size, to change lenticular diameter and height, and then changing the pattern of micro-nano compound structure.Obviously, this embodiment gives the implementation by jet printing parameter change micro-nano compound structure.
More excellent, in another embodiment: in step (d), utilize the principle of similar compatibility, resin lenslet and the suprabasil resin contact being spin-coated on step (C) gained, through applying certain pressure and curing schedule, both have stronger adhesion, and the resin after the demoulding on mother matrix is transferred in substrate.Should be embodiment, it discloses a kind of how contact and the technical scheme shifted.
More excellent, in another embodiment: for being transferred to for suprabasil resin, originally the side, bottom surface being filled in the resin of mother matrix microstructure portion becomes the top of resin in substrate after transfer impression, and has the submicron order structure contrary with structure on mother matrix; Accordingly, lenticular top then becomes the bottom of resin in substrate.With regard to this embodiment, drop after 3D jet printing on mother matrix has the microlens structure of sphere pattern due to surface tension self-assembling formation, after transfer impression, in substrate, micron scale construction is spherical, special-shaped bionical submicron order structure can be obtained, if further combined with the submicron order structure on top, so this composite construction compares pattern straight up and down, obviously has better adhesion and wider adhesion angle.
Below in conjunction with accompanying drawing and other embodiment, the present invention is further described in detail:
(1) as shown in fig. la, spin coating one deck electron beam adhesive 12 on transparent quartz substrate 11, and carry out front baking, pre-bake temperature is 90 DEG C, and the time is 5min;
(2) as shown in figure ib, by the graphical electron beam adhesive 13 of electron beam exposure technique, the uv-exposure time is 10s, and developer solution is electron beam adhesive developer solution, and developing time is 30s, and carries out rear baking, and rear baking temperature is 95 DEG C, and the time is 10min;
(3) as shown in figure ic, with the photoresist after exposure imaging for mask, adopt reactive ion etching process to prepare micro-structural on quartz substrate, the reacting gas of employing is C4F8 and CF4, and throughput is respectively 45sccm and 15sccm.By changing etch period and etching the depth-to-width ratio that power can regulate quartz surfaces micro-structural;
(4) as shown in accompanying drawing 1d, residual electron beam adhesive mask is washed by the NaOH solution of debita spissitudo;
(5) as depicted in figure 2, the silicon base 21 with micro-structural prepares silicon fluoride hydrophobic layer 22, object is the surface energy in order to reduce silicon mother matrix, is conducive to follow-up releasing process simultaneously;
(6) as shown in accompanying drawing 2b, the mode of jet printing is adopted to have submicron order structure and the silicon base of carrying out surface hydrophobicity process preparing resin lenslet array 23 further and carries out ultra-violet curing, hardening time is 5 minutes, and the arrangement of microlens array and dutycycle can design as required;
(7) as depicted in figure 3 a, spin coating ultraviolet-curing resin 32 in the substrate 31 will carrying out contact impression, such as thickness is 1 micron.This resin is commaterial with preparing microlens array resin used, to ensure good bond strength.In this step, resin 32 is not first cured.Substrate 31 in this step, can be rigid basement as quartz, silicon chip, also can be flexible substrates as PET, PDMS, depends on its application.
(8) then, as shown in fig. 3b, contact printing is carried out in substrate 21 and the substrate 31 in Fig. 3 a, apply the impression of 10N, imprint time is 5 minutes, carries out ultra-violet curing again in moulding process to ultraviolet-curing resin 32, and the time is 5 minutes.
(9) as shown in accompanying drawing 3c, carry out demoulding step, after the demoulding completes quartz substrate 21 microlens array and 21 on micro-structural be all transferred in substrate 31.
Fig. 4 is then for transfer impression in the quartz substrate shown in one embodiment of the present of invention prepares the scanning electron microscope (SEM) photograph of micro-nano compound structure structure.
More than utilize specific case to set forth principle of the present disclosure and embodiment, the explanation of above embodiment just understands technical scheme of the present disclosure and core concept thereof for helping; For those skilled in the art, according to thought of the present disclosure, all will change in specific embodiments and applications, in sum, this description should not be construed as restriction of the present disclosure.
Claims (5)
1., based on a manufacturing process for the bionical special-shaped micro-nano compound structure of 3D jet printing technology, comprise the steps:
A () mother matrix patterning step, prepares micro-structural by photoetching and dark dry etch process on monocrystalline silicon mother matrix;
B () jet printing step, first carries out low-surface-energy process to substrate patterned in step (a), then by jet printing technique resin deposition microlens array in substrate, and carry out ultra-violet curing;
C () prepares substrate step, other substrate applies ultraviolet-curing resin, selects the resin material identical with step (b);
(d) transfer imprint step, mother matrix after the substrate of step (c) gained being processed with step (b) docks and carries out transfer and impresses, and applies certain pressure, carries out ultra-violet curing, then the demoulding, the resin material on final mother matrix is transferred in substrate.
2. manufacturing process as claimed in claim 1, is characterized in that: preferred, described microstructure features is of a size of submicron order, and resin is filled to microstructure portion, and mother matrix defines initial micro-nano compound structure.
3. manufacturing process as claimed in claim 1, is characterized in that: in step (b), by regulating jet printing parameter, include but not limited to spray printing number of times, droplet size, to change lenticular diameter and height, and then changes the pattern of micro-nano compound structure.
4. manufacturing process as claimed in claim 2, it is characterized in that: in step (d), utilize the principle of similar compatibility, resin lenslet and the suprabasil resin contact being spin-coated on step (C) gained, through applying certain pressure and curing schedule, both have stronger adhesion, and the resin after the demoulding on mother matrix is transferred in substrate.
5. manufacturing process as claimed in claim 4, it is characterized in that: for being transferred to for suprabasil resin, originally the side, bottom surface being filled in the resin of mother matrix microstructure portion becomes the top of resin in substrate after transfer impression, and has the submicron order structure contrary with structure on mother matrix; Accordingly, lenticular top then becomes the bottom of resin in substrate.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108501361A (en) * | 2017-02-28 | 2018-09-07 | 香港理工大学 | Nano-micro structure part rapid molding device and quick molding method |
CN110801063A (en) * | 2019-10-31 | 2020-02-18 | 上海航天控制技术研究所 | Multifunctional spacesuit glove based on dry adhesion material |
CN112060568A (en) * | 2020-07-27 | 2020-12-11 | 南京大学 | Photocuring additive manufacturing method |
US10994468B2 (en) | 2018-04-11 | 2021-05-04 | Clemson University Research Foundation | Foldable composite structures |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101101441A (en) * | 2007-08-07 | 2008-01-09 | 山东大学 | Large area periodic array three-dimensional microstructure preparation method |
CN101329509A (en) * | 2008-07-29 | 2008-12-24 | 西安交通大学 | Method for manufacturing drag reduction surface |
US20110171432A1 (en) * | 2008-08-27 | 2011-07-14 | Namil Koo | Nanoimprint method |
CN103235482A (en) * | 2013-04-28 | 2013-08-07 | 苏州大学 | PDMS (polydimethylsiloxane)-based functional polymer patterning method |
CN103576450A (en) * | 2013-11-07 | 2014-02-12 | 无锡英普林纳米科技有限公司 | Method for preparing nanoscale thickness thin film and structure on curved surface substrate |
CN104181770A (en) * | 2014-09-10 | 2014-12-03 | 青岛理工大学 | Method for manufacturing micro/nano composite structure based on 4D printing and nanoimprint lithography |
-
2015
- 2015-02-10 CN CN201510070121.8A patent/CN104690969B/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101101441A (en) * | 2007-08-07 | 2008-01-09 | 山东大学 | Large area periodic array three-dimensional microstructure preparation method |
CN101329509A (en) * | 2008-07-29 | 2008-12-24 | 西安交通大学 | Method for manufacturing drag reduction surface |
US20110171432A1 (en) * | 2008-08-27 | 2011-07-14 | Namil Koo | Nanoimprint method |
CN103235482A (en) * | 2013-04-28 | 2013-08-07 | 苏州大学 | PDMS (polydimethylsiloxane)-based functional polymer patterning method |
CN103576450A (en) * | 2013-11-07 | 2014-02-12 | 无锡英普林纳米科技有限公司 | Method for preparing nanoscale thickness thin film and structure on curved surface substrate |
CN104181770A (en) * | 2014-09-10 | 2014-12-03 | 青岛理工大学 | Method for manufacturing micro/nano composite structure based on 4D printing and nanoimprint lithography |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108501361A (en) * | 2017-02-28 | 2018-09-07 | 香港理工大学 | Nano-micro structure part rapid molding device and quick molding method |
CN108501361B (en) * | 2017-02-28 | 2021-03-05 | 香港理工大学 | Rapid forming device and rapid forming method for nano-micro structural part |
US10994468B2 (en) | 2018-04-11 | 2021-05-04 | Clemson University Research Foundation | Foldable composite structures |
CN110801063A (en) * | 2019-10-31 | 2020-02-18 | 上海航天控制技术研究所 | Multifunctional spacesuit glove based on dry adhesion material |
CN112060568A (en) * | 2020-07-27 | 2020-12-11 | 南京大学 | Photocuring additive manufacturing method |
CN112060568B (en) * | 2020-07-27 | 2022-01-28 | 南京大学 | Photocuring additive manufacturing method |
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