CN104689587A - Liquid ring type vacuum pump system for chlorinated benzene vacuum rectification - Google Patents
Liquid ring type vacuum pump system for chlorinated benzene vacuum rectification Download PDFInfo
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- CN104689587A CN104689587A CN201510112083.8A CN201510112083A CN104689587A CN 104689587 A CN104689587 A CN 104689587A CN 201510112083 A CN201510112083 A CN 201510112083A CN 104689587 A CN104689587 A CN 104689587A
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Abstract
The invention discloses a liquid ring type vacuum pump system for chlorinated benzene vacuum rectification. The liquid ring type vacuum pump system comprises a rectification tower, a vacuum distributing table, a liquid ring vacuum pump, a circulating tank, a first circulating pump, a dryer and a cooler, wherein the rectification tower is linked with the vacuum distributing table, the vacuum distributing table is linked with a gas inlet of the liquid ring vacuum pump, a gas outlet of the liquid ring vacuum pump is linked with a liquid inlet of the circulating tank, a liquid outlet of the circulating tank is linked with the dryer through the first circulating pump, the dryer is linked with the cooler, and an outlet of the cooler is linked with a liquid inlet of the liquid ring vacuum pump. Chlorination liquid after removal of inorganic impurities is adopted as a circulating liquid working medium of the system, the use of the liquid ring type vacuum pump can make up for the inadequacy of the prior art, the vacuum degree is higher, and the requirements of a vacuum rectification process can be well met. Due to the adoption of the chlorination liquid as the working medium of the system, which is the same as materials needing rectification treatment, the system does not generate waste liquid discharge and does not need matched waste water treatment facilities, so that the waste water treatment cost is reduced.
Description
Technical field
The invention belongs to organic chemical industry's production technology intermediate pump application, in particular for the liquid-ring vacuum pump system of chlorated liquid rectification under vacuum purifying in benzene chloride production.
Technical background
The production of Benzene Chloride (monochloro-benzene) adopt benzene and chlorine under the effect of catalyst iron hoop in chlorination reactor hybrid reaction produce, chlorated liquid is generated, wherein containing a small amount of polystream, micro-chlorine, watery hydrochloric acid (mass content 0 ~ 0.5%), ferric trichloride and unreacted benzene completely after chlorination reaction.Chlorated liquid is after the inorganic impurities such as the ferric trichloride in washing, alkali cleaning removing chlorated liquid, acid and chlorine, again through the chloride of rectifying and separating benzene with other benzene, finally obtain monochloro-benzene finished product, because the boiling point of monochloro-benzene is higher, and dichloro-benzenes can decompose releasing corrosive gas at relatively high temperatures, cause the damage of equipment, therefore the purifying of monochloro-benzene often adopts rectification under vacuum, and this just needs to be equipped with vacuum fabrication systems.
In existing benzene chloride production, after chlorination reaction, the vacuum of distillation process is produced by water-jet pump, its schematic diagram as shown in Figure 1, principle is: the liquid water in vacuum cycle tank 21, through vacuum cycle water pump 22 extraction, form the working media with certain pressure, in water ejector 23, spray at a high speed formation high-speed jet by nozzle to suction chamber, gas in suction chamber is forced to carry to mix with it by high-speed jet, form gas-liquid mixed stream, enter diffuser, thus the pressure of suction chamber is reduced, in the container 24 be connected with suction chamber, pressure also reduces simultaneously, form vacuum, at the expansion segment of diffuser, the kinetic energy of mixing jet is pressure energy, speed reduces pressure and raises, gas is further compressed, together with water outside excavationg pump, in vacuum cycle tank 21, air-water is separated, air release enters air, water is by vacuum cycle water pump 22 cycling and reutilization, to go round and begin again the object reaching and vacuumize, although water-jet pump can meet the requirement to vacuum in technique, but still existing defects and deficiency: the low vacuum that water-jet pump produces, nozzle easily damages, there is leak source in system, air easily enters system, vacuum is caused to decline, rectification temperature is raised, and dichloro-benzenes has thermal sensitivity, high temperature easily decomposes release corrosive gas, certain damage is had to equipment, the working media of water-jet pump is water, absorbs the gas phase media extracted out with air-flow, dissolves in working medium water, and produce waste water, follow-up needs processes waste water, increases cost.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of liquid-ring vacuum pump system for Benzene Chloride rectification under vacuum, the circulating fluid working media of native system adopts the chlorated liquid having removed inorganic impurity, the use of liquid-ring vacuum pump can make up the deficiencies in the prior art, and vacuum is higher, more can meet the requirement of rectification under vacuum technique, because the working media of this liquid-ring vacuum pump adopts chlorated liquid, identical with needing the material of rectification process, this system is made not have discharging of waste liquid, without the need to being equipped with waste water disposal facility, save cost for wastewater treatment.
For solving the problems of the technologies described above, the invention provides a kind of liquid-ring vacuum pump system for Benzene Chloride rectification under vacuum, comprise rectifying column, vacuum dispense station, liquid-ring vacuum pump, circulating slot, the first circulating pump, drier and cooler, rectifying column and vacuum dispense station are connected, vacuum dispense station and liquid ring vacuum pump steam inlet are connected, liquid-ring vacuum pump gas outlet connects with the inlet of circulating slot, the liquid outlet of circulating slot is connected with drier by the first circulating pump, drier connects cooler, and cooler outlet and liquid-ring vacuum pump inlet are connected.
For the purpose of concise description problem, below to the liquid-ring vacuum pump system for Benzene Chloride rectification under vacuum of the present invention all referred to as native system.
Start the first circulating pump, the chlorated liquid removing inorganic impurity in circulating slot is pumped into drier, flow into cooler after drying, temperature enters liquid-ring vacuum pump after declining, and by liquid-ring vacuum pump, liquid is pumped into circulating slot, is rotated the spatial variations caused between pendular ring by adjacent blades in liquid-ring vacuum pump, the reciprocal air compression formed, form vacuum at liquid ring vacuum pump steam inlet place, open the valve of the rectifying column of connection, namely rectifying column produces vacuum.
For the purpose of concise description problem, below to the liquid-ring vacuum pump system for Benzene Chloride rectification under vacuum of the present invention all referred to as native system.
The working media of native system adopts the chlorated liquid having removed inorganic impurity, identical with the material of required rectification under vacuum, makes whole system not have discharging of waste liquid, without the need to supporting wastewater treatment, reduces the cost of wastewater treatment, because working media is only at circulating slot, first circulating pump, drier, cooler, circulate in liquid-ring vacuum pump and circulating slot, make whole system without leak source, better tightness, the vacuum produced is higher, the requirement that more can meet rectification under vacuum technique utilizes postorder alkali liquor absorption Systemic absorption tail gas, the air pollution that the volatilization decreasing corrosive gas brings, higher vacuum can be produced just because of native system, thus reduction rectification temperature, decrease the pyrolytic rate of dichloro-benzenes, effectively prevent dichloro-benzenes and decompose the corrosive gas of release to device damage.
As improvement of the present invention, be also associated with vacuum buffer tank between described vacuum dispense station and described liquid-ring vacuum pump, the import of vacuum buffer tank connects with vacuum dispense station, and the outlet of vacuum buffer tank connects with the air inlet of liquid-ring vacuum pump.In the rectifying column that can prevent unexpected vacuum from causing like this, material adverse current enters liquid-ring vacuum pump, avoids because logistics adverse current causes liquid-ring vacuum pump to damage.
As a further improvement on the present invention, the gaseous phase outlet of circulating slot is connected with tail gas spray tower, the second circulating pump is had between the import of tail gas spray tower and outlet, the outlet of tail gas spray tower is connected with treatment tank by valve, the tail gas extracted out by rectifying column enters tail gas spray tower through circulating slot, after cyclic absorption, enter treatment tank process, the environmental pollution preventing from the tail gas of rectifying column from entering air causing.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of existing water-jet pump.
Fig. 2 is the schematic diagram of native system.
Detailed description of the invention
Below in conjunction with detailed description of the invention, the invention will be further described.
As shown in Figure 2:
For the liquid-ring vacuum pump system of Benzene Chloride rectification under vacuum, comprise rectifying column 1, vacuum dispense station 2, vacuum buffer tank 3, liquid-ring vacuum pump 4, circulating slot 5, first circulating pump 6, drier 7 and cooler 8: vacuum dispense station 2 is connected with needing two rectifying columns 1 vacuumized, vacuum dispense station 2 connects with the import of vacuum buffer tank 3, the outlet of vacuum buffer tank 3 connects with the air inlet of liquid-ring vacuum pump 4, the gas outlet of liquid-ring vacuum pump 4 connects the inlet of circulating slot 5, circulating slot 5 liquid outlet is connected with drier 7 by the first circulating pump 6, drier 7 connects with cooler 8 import, cooler 8 exports and connects with the inlet of liquid-ring vacuum pump 4, the pipeline that cooler 8 connects with liquid-ring vacuum pump 4 there is flowmeter 9, vacuum buffer tank 3 top has gas outlet, carries out tail gas emptying, circulating slot 5 top has gas outlet, and the gas outlet of circulating slot 5 connects with cooler 8, and the gas of volatilization in circulating slot 5 is after cooler 8 cools in rework solution ring vacuum pump 4, the gaseous phase outlet of circulating slot 5 is connected with tail gas spray tower 10, the second circulating pump 11 is had between the upper outlet of tail gas spray tower 10 and bottom inlet, the outlet of tail gas spray tower 10 is connected with treatment tank 12 by valve, and tail gas spray tower 10 top has gas outlet, conveniently carries out tail gas emptying.
Start the first circulating pump 6, the inlet of liquid-ring vacuum pump 4 is entered after having removed dry and cooler 8 cooling of the chlorated liquid drying device 7 of inorganic impurity in dashpot 5, form vacuum at liquid-ring vacuum pump 4 air inlet place, open the valve of rectifying column 1, in rectifying column 1, namely produce vacuum.
The tail gas extracted out by rectifying column 1 enters tail gas absorbing system through circulating slot 5, namely enters tail gas spray tower 10, after alkali lye cyclic absorption, and the process of decontaminated water treatment process.
The concrete service condition of native system:
It should be noted that, liquid-ring vacuum pump system of the present invention is not only applicable to the rectification under vacuum purifying of monochloro-benzene in benzene chloride production, also the technique that other needs rectification under vacuum is applicable to, just when being used in other rectification under vacuum, need working media to be replaced with the material identical with needing the material of rectification under vacuum.
Claims (3)
1. for the liquid-ring vacuum pump system of Benzene Chloride rectification under vacuum, comprise rectifying column, vacuum dispense station, liquid-ring vacuum pump, circulating slot, the first circulating pump, drier and cooler, it is characterized in that: rectifying column and vacuum dispense station are connected, vacuum dispense station and liquid ring vacuum pump steam inlet are connected, liquid-ring vacuum pump gas outlet connects with the inlet of circulating slot, the liquid outlet of circulating slot is connected with drier by the first circulating pump, drier connects cooler, and cooler outlet and liquid-ring vacuum pump inlet are connected.
2. as claimed in claim 1 for the liquid-ring vacuum pump system of Benzene Chloride rectification under vacuum, it is characterized in that: between described vacuum dispense station and described liquid-ring vacuum pump, be also associated with vacuum buffer tank, the import of vacuum buffer tank connects with vacuum dispense station, and the outlet of vacuum buffer tank connects with the air inlet of liquid-ring vacuum pump.
3. as claimed in claim 1 or 2 for the liquid-ring vacuum pump system of Benzene Chloride rectification under vacuum, it is characterized in that: the gaseous phase outlet of described circulating slot is connected with tail gas spray tower, have the second circulating pump between the import of tail gas spray tower and outlet, the outlet of tail gas spray tower is connected with treatment tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510112083.8A CN104689587A (en) | 2015-03-13 | 2015-03-13 | Liquid ring type vacuum pump system for chlorinated benzene vacuum rectification |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510112083.8A CN104689587A (en) | 2015-03-13 | 2015-03-13 | Liquid ring type vacuum pump system for chlorinated benzene vacuum rectification |
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| CN104689587A true CN104689587A (en) | 2015-06-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510112083.8A Pending CN104689587A (en) | 2015-03-13 | 2015-03-13 | Liquid ring type vacuum pump system for chlorinated benzene vacuum rectification |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107340346A (en) * | 2017-08-07 | 2017-11-10 | 安徽东至广信农化有限公司 | The quick determination method of micro dichloro-benzenes in a kind of chlorination benzaldehyde product |
| CN114853570A (en) * | 2022-05-13 | 2022-08-05 | 山东阿斯德科技有限公司 | Method for treating wastewater in formamide production device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB683781A (en) * | 1949-08-22 | 1952-12-03 | Ets Barbet Soc | Improvement in the functioning of continuous vacuum distillation or rectification apparatus |
| GB821983A (en) * | 1956-08-27 | 1959-10-14 | Bayer Ag | Vacuum distillation process |
| CN201692678U (en) * | 2010-03-18 | 2011-01-05 | 南京蓝星化工新材料有限公司 | Vacuum system |
| CN202015510U (en) * | 2011-03-25 | 2011-10-26 | 南通星辰合成材料有限公司 | Device for realizing vacuum rectification and vacuum evaporation of bisphenol A by using liquidring vacuum pump |
| US20140066653A1 (en) * | 2012-09-06 | 2014-03-06 | Celanese International Corporation | Processes For Purifying Acetic Anhydride and Method of Making Same |
| CN204502443U (en) * | 2015-03-13 | 2015-07-29 | 安徽八一化工股份有限公司 | For the liquid-ring vacuum pump system of Benzene Chloride rectification under vacuum |
-
2015
- 2015-03-13 CN CN201510112083.8A patent/CN104689587A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB683781A (en) * | 1949-08-22 | 1952-12-03 | Ets Barbet Soc | Improvement in the functioning of continuous vacuum distillation or rectification apparatus |
| GB821983A (en) * | 1956-08-27 | 1959-10-14 | Bayer Ag | Vacuum distillation process |
| CN201692678U (en) * | 2010-03-18 | 2011-01-05 | 南京蓝星化工新材料有限公司 | Vacuum system |
| CN202015510U (en) * | 2011-03-25 | 2011-10-26 | 南通星辰合成材料有限公司 | Device for realizing vacuum rectification and vacuum evaporation of bisphenol A by using liquidring vacuum pump |
| US20140066653A1 (en) * | 2012-09-06 | 2014-03-06 | Celanese International Corporation | Processes For Purifying Acetic Anhydride and Method of Making Same |
| CN204502443U (en) * | 2015-03-13 | 2015-07-29 | 安徽八一化工股份有限公司 | For the liquid-ring vacuum pump system of Benzene Chloride rectification under vacuum |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107340346A (en) * | 2017-08-07 | 2017-11-10 | 安徽东至广信农化有限公司 | The quick determination method of micro dichloro-benzenes in a kind of chlorination benzaldehyde product |
| CN114853570A (en) * | 2022-05-13 | 2022-08-05 | 山东阿斯德科技有限公司 | Method for treating wastewater in formamide production device |
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