CN104656174B - Sub-wavelength photon screen compound eye - Google Patents
Sub-wavelength photon screen compound eye Download PDFInfo
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- CN104656174B CN104656174B CN201510103547.9A CN201510103547A CN104656174B CN 104656174 B CN104656174 B CN 104656174B CN 201510103547 A CN201510103547 A CN 201510103547A CN 104656174 B CN104656174 B CN 104656174B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
- G02B5/188—Plurality of such optical elements formed in or on a supporting substrate
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Abstract
The present invention relates to a kind of optical imaging device, specially sub-wavelength photon screen compound eye, including incident light source, M sub-wavelength photon screen, metal level, substrate, focal plane；Described substrate one hemisphere of formation, has metal level outside described substrate, described focal plane is located at the hemispheroidal centre of sphere of substrate, described M sub-wavelength photon screen distribution is on the metal layer, the incident ray of described incident light source is respectively from each sub-wavelength photon screen vertical incidence, and incident ray is focused on focal plane simultaneously.The sub-wavelength photon screen compound eye that the present invention is provided, both there is high resolution, capacity usage ratio can be improved again, expand sensitive volume, it is played a driving role in the practical of field such as high resolution microscope, lightweight astronomical telescope, weapon visions, is with a wide range of applications.
Description
Technical field
The present invention relates to a kind of optical imaging device, specially sub-wavelength photon screen compound eye.
Background technology
2001, German L.Kipp professors published an article on Nature periodicals, propose that photon sieves are general first
Read, after be translated as " photon screen ".Photon screen is a kind of new diffraction optics image device, and it is with being randomly dispersed in light penetrating ring band
On aperture replace formed by the light penetrating ring band of Fresnel structure, hole diameter is more than correspondence light penetrating ring bandwidth, focusing
Energy plays actively impact.By optimization design, it can effectively suppress secondary and Advanced Diffraction, so as to improve the contrast of imaging
And resolving power, it might even be possible to break traditions the diffraction imaging limit, realizes that super-resolution is imaged.
But, the aperture focusing energy being distributed only on light penetrating ring band plays actively impact, and other regions, such as light tight
The presence in the region on annulus, light penetrating ring band between aperture etc. will weaken focus energy, negative influence be produced, so as to cause to spread out
The drastically decline of efficiency or capacity usage ratio is penetrated, most energy of light source are wasted.According to foreign literature report and theory
Analysis is understood, even in completely ideally, the capacity usage ratio of plain edition photon screen also only 10% or so, and this is that it is difficult to
Practical fatal part.
In order to overcome this problem, domestic and foreign scholars propose multi-wavelength photon screen and mixed type photon sieve structure.Such as：1)
Univ Florida USA Chung et al. devises dual wavelength and multi-wavelength photon screen, and traditional photon screen is carried out into region point
Cut, one wavelength of each region correspondence weakens wavelength sensitivity of the photon screen to incident light, but due to the segmentation in region, make
Capacity usage ratio natively very low photon screen further off-energy.At the same time, due to photon screen in different zones
Structure it is different, bring no small difficulty to manufacturing process；2) evergreen seminar is thanked to by Chinese Academy of Sciences Microelectronics Institute, in
The Hu Song seminars of photoelectric technology research institute of the academy of sciences of state, wait proposition mixed type photon screen, combine Fresnel zone plate and light
The structure of son sieve, designs printing opacity aperture only on partial light permeability annulus, and not all light penetrating ring band is all distributed printing opacity aperture, passes through
Optimization design, the structure improves capacity usage ratio to a certain extent, but unobvious.
Existing photon sieve structure is difficult to increase substantially capacity usage ratio, how to design a kind of new photon screen knot
Structure, while high resolution is retained, also has the advantages that the high and photosensitive angular region of capacity usage ratio is wide, it has also become industry is badly in need of
The key issue of solution.
The content of the invention
For above-mentioned technical problem, the present invention provides a kind of sub-wavelength photon screen compound eye structural, is retaining high resolution
Meanwhile, also have the advantages that the high and photosensitive angular region of capacity usage ratio is wide, specific technical scheme is：
Sub-wavelength photon screen compound eye, including incident light source, M sub-wavelength photon screen, metal level, substrate, focal plane；Described
Has metal level outside substrate one hemisphere of formation, described substrate, described focal plane is located at the hemispheroidal centre of sphere of substrate, described
The distribution of M sub-wavelength photon screen on the metal layer, the incident ray of described incident light source is respectively from each sub-wavelength photon
Vertical incidence is sieved, incident ray is focused on focal plane simultaneously.
Equivalent to one ommatidium of each sub-wavelength photon screen, M sub-wavelength photon screen constitutes a compound eye structural.
Angle between adjacent sub-wavelength photon screen incident ray is to be followed successively by θ1、θ2、……、θM-1, sub-wavelength photon screen
The incident ray scope that compound eye receives is θ=θ1+θ2+……+θM-1.Angle between adjacent sub-wavelength photon screen incident ray can
Set according to actual needs, equal angular can be taken, different angles can also be taken, but each other can not be overlapping.
Region between adjacent sub-wavelength photon screen is lighttight, therefore is ensureing that adjacent sub-wavelength photon screen is nonoverlapping
Under the premise of, gap should be as small as possible between adjacent sub-wavelength photon screen.
The incident light source that all sub-wavelength photon screens are used is co-wavelength light source, can be realized by simple geometrical light-path.
Sub-wavelength photon screen is made up of a series of printing opacity apertures, and sub-wavelength photon screen is distributed on the metal layer, metal level
It is plated on substrate, metal layer thickness is about tens microns, sub-wavelength photon screen is close on the sphere of substrate and metal level formation,
Approximately tangent with sphere, spherical radius is the focal length of sub-wavelength photon screen.Metal layer material is light-proof material, generally chromium,
Gold, aluminium, copper etc.；Backing material is light transmissive material, generally common quartz glass, lucite, vitreous silica etc..
The optimized method of structural parameters of sub-wavelength photon screen is：
(1) according to design needs, hemispheroidal spherical radius, ball where sub-wavelength photon screen compound eye size and substrate are determined
Radius surface is the focal length f of sub-wavelength photon screen；
(2) according to the principle not overlapped each other between adjacent sub-wavelength photon screen, determine sub-wavelength photon screen quantity M and
Entrance pupil bore D；
(3) by designed central wavelength λ, entrance pupil bore D, focal length f, sub-wavelength photon sieve structure parameter is determined, sub- ripple is calculated
Long photon screen annulus number N：
The appropriate window function of selection, optimization determines the quantity of distribution printing opacity aperture and hole on each annulus of sub-wavelength photon screen
Footpath size.
The sub-wavelength photon screen compound eye that the present invention is provided, is inspired, the vision of compound eye insect by compound eye insect visual system
System is made up of multiple independent ommatidiums, and quantity is individual from several to tens of thousands of, and each ommatidium is independently photosensitive and is imaged, greatly
Improve sensitive volume, it might even be possible to three-dimensional imaging, such as：Fly, dragonfly etc..The Asia designed similar to Compound Eye of Insects, the present invention
Wavelength photons sieve compound eye, both with high resolution, and capacity usage ratio can be improved again, expand sensitive volume, to it in high-resolution
The practical of field such as force microscope, lightweight astronomical telescope, weapon vision play a driving role, and are with a wide range of applications.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention；
Fig. 2 is photon screen compound eye and common photon screen performance comparision.
Embodiment
The embodiment of the present invention is described with reference to the drawings, as shown in Figure 1：Sub-wavelength photon screen compound eye, including incidence
Light source 1, M sub-wavelength photon screen 2, metal level 3, substrate 4, focal plane 5；Described one hemisphere of formation of substrate 4, described lining
Bottom 4 is outer to have metal level 3, and described focal plane 5 is located at the hemispheroidal centre of sphere of substrate 4, and M described sub-wavelength photon screen 2 is distributed
On metal level 3, the incident ray of described incident light source 1 is respectively from each vertical incidence of sub-wavelength photon screen 2, incident ray
It is focused on simultaneously on focal plane 5.
The design requirement of the embodiment is：Compound eye is semi-spherical shape, radius of a ball r=200mm, the number of sub-wavelength photon screen 2
The angle measured between M=5, the adjacent incident ray of sub-wavelength photon screen 2 takes identical numerical value, θ0=θ1=θ2=θ3=θ4=θ5=
30 °, you can receive angular range, theta=θ of light1+θ2+θ3+θ4=120 °.
The light transmissive material of substrate 4 is quartz glass, and the material of metal level 3 is chromium；
The parameter of sub-wavelength photon screen is：Designed central wavelength λ=635nm, focal length f=200mm, entrance pupil bore D=
50mm；
By designed central wavelength λ, entrance pupil bore D, focal length f, the structural parameters of sub-wavelength photon screen 2 are determined, sub-wavelength is calculated
Photon screen annulus number N：
Connes window functions are selected to optimize the quantity and pore size of printing opacity aperture on each annulus.
In order to which focusing performance and capacity usage ratio to sub-wavelength photon screen compound eye and common photon screen carry out detailed pair
Than analysis, Fig. 2 is the normalized distribution of radial direction light intensity on focal plane, and dotted line represents common photon screen, and solid line represents photon screen and answered
Eye, ordinate is normalized intensity, dimensionless, and abscissa is radial distance, unit for μm.Figure it is seen that photon screen is multiple
The focusing performance of eye and common photon screen has no significant difference, but the normalized intensity of photon screen compound eye is significantly greater than common photon
Sieve, because photon screen compound eye has widened photosensitive angular region, is subjected to the incident light of greater angle scope, has been superimposed 5 sons
The energy of eye, improves capacity usage ratio.
Claims (1)
1. sub-wavelength photon screen compound eye, it is characterised in that：Including incident light source (1), M sub-wavelength photon screen (2), metal level
(3), substrate (4), focal plane (5)；Described substrate (4) one hemisphere of formation, described substrate (4) has metal level (3) outside,
Described focal plane (5) is located at substrate (4) hemispheroidal centre of sphere, and M described sub-wavelength photon screen (2) is distributed in metal level (3)
On, the incident ray of described incident light source (1) is respectively from each sub-wavelength photon screen (2) vertical incidence, and incident ray is simultaneously
Be focused on focal plane (5), adjacent sub-wavelength photon screen incident ray each other can not be overlapping, adjacent sub-wavelength photon screen it
Between region be lighttight；
The optimized method of structural parameters of sub-wavelength photon screen is：
(1) according to design needs, hemispheroidal spherical radius where sub-wavelength photon screen compound eye size and substrate, sphere half are determined
Footpath is the focal length f of sub-wavelength photon screen；
(2) according to the principle not overlapped each other between adjacent sub-wavelength photon screen, the quantity M and entrance pupil of sub-wavelength photon screen are determined
Bore D；
(3) by designed central wavelength λ, entrance pupil bore D, focal length f, sub-wavelength photon sieve structure parameter is determined, sub-wavelength light is calculated
Son sieve annulus number N：
<mrow>
<mi>N</mi>
<mo>&ap;</mo>
<mfrac>
<msup>
<mi>D</mi>
<mn>2</mn>
</msup>
<mrow>
<mn>4</mn>
<mi>&lambda;</mi>
<mi>f</mi>
</mrow>
</mfrac>
</mrow>
The appropriate window function of selection, optimization determines that the quantity of distribution printing opacity aperture and aperture are big on each annulus of sub-wavelength photon screen
It is small.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510103547.9A CN104656174B (en) | 2015-03-10 | 2015-03-10 | Sub-wavelength photon screen compound eye |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510103547.9A CN104656174B (en) | 2015-03-10 | 2015-03-10 | Sub-wavelength photon screen compound eye |
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| Publication Number | Publication Date |
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| CN104656174A CN104656174A (en) | 2015-05-27 |
| CN104656174B true CN104656174B (en) | 2017-08-29 |
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Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6720936B1 (en) * | 2002-05-09 | 2004-04-13 | Bbnt Solutions Llc | Adaptive antenna system |
| US6954310B2 (en) * | 2003-09-25 | 2005-10-11 | University Of Florida Research Foundation, Inc. | High resolution multi-lens imaging device |
| US7986113B2 (en) * | 2006-05-05 | 2011-07-26 | Virgin Islands Microsystems, Inc. | Selectable frequency light emitter |
| US10042091B2 (en) * | 2012-09-29 | 2018-08-07 | Purdue Research Foundation | Holey optical device |
| CN104034517B (en) * | 2014-07-04 | 2016-07-06 | 西华大学 | A kind of sub-wavelength photon screen focusing performance detection method |
| CN104199135B (en) * | 2014-09-18 | 2016-09-21 | 中国科学院光电技术研究所 | Long-focus deep sector partition photon sieve for laser direct writing |
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2015
- 2015-03-10 CN CN201510103547.9A patent/CN104656174B/en active Active
Non-Patent Citations (1)
| Title |
|---|
| "光子筛及其优化设计";胡百泉 等;《激光与光电子学进展》;20101231(第1期);第012302-1至012302-6页 * |
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