CN104649468A - Emission treatment system for high-concentration nickel chloride produced during electroplating - Google Patents
Emission treatment system for high-concentration nickel chloride produced during electroplating Download PDFInfo
- Publication number
- CN104649468A CN104649468A CN201410617997.5A CN201410617997A CN104649468A CN 104649468 A CN104649468 A CN 104649468A CN 201410617997 A CN201410617997 A CN 201410617997A CN 104649468 A CN104649468 A CN 104649468A
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- CN
- China
- Prior art keywords
- pump
- water tank
- automatic
- nickel
- sludge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
- C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
- C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
- C02F11/122—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering using filter presses
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F2001/007—Processes including a sedimentation step
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/12—Halogens or halogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/20—Heavy metals or heavy metal compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/16—Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Chemically Coating (AREA)
Abstract
The invention discloses an emission treatment system for high-concentration nickel chloride produced during electroplating. The system comprises a basic solution water tank, a lifting pump, a chemical dosing box, an inclined tube precipitating tank, a first booster pump, a full-automatic suspension remover, a safety filter, a high pressure pump, a special nickel removing device and a pH returning water tank which are sequentially connected. The system further comprises a sludge pump, a sludge concentrating tank, a sludge filter press pump, a plate frame filter press, a thick water tank, a second booster pump, a full-automatic nickel remover and a full-automatic complex nickel remover. The system is automatic to run, automatic to clean, high in automation degree and simple to operate.
Description
Technical field
The present invention relates to electroplating wastewater blowdown process field, particularly relate to a kind of plating high density nickelous chloride discharge treating system.
Background technology
The nickelous chloride concentration that plating produces, up to the waste water of 300mg/L, needs to be filtered thus environment protection emission by a treatment system.
Therefore, urgently one is automatically run, is automatically cleaned, high-concentration sulfuric acid (chlorination) nickel process discharge (reaching table three emission treatment) system that level of automation is high and simple to operate.
Summary of the invention
The object of the present invention is to provide a kind of operation automatically, automatically clean, the one plating high density nickelous chloride discharge treating system that level of automation is high and simple to operate.
To achieve these goals, technical scheme of the present invention is: provide a kind of plating high density nickelous chloride discharge treating system, comprise connect successively stoste water tank, lift pump, dosing tank, inclined-tube settling box, the first topping-up pump, full-automatic oil removal device, cartridge filter, high-pressure pump, specially adjust back water tank except nickel film device and PH.
Described one plating high density nickelous chloride discharge treating system also comprises sludge treating system, described sludge treating system comprises the mud slush pump, sludge condensation case, sludge press filtration pump and the plate-and-frame filter press that connect successively, and the input terminus of described mud slush pump connects with described inclined-tube settling box.
Described high density nickelous chloride discharge treating system also comprises the system of refiltering, the described system that refilters comprises the dense water tank, the second topping-up pump, full-automatic except nickel device and full-automatic except complex compound nickel device connected successively, and the input terminus of described dense water tank connects with the described special dense water end (W.E.) removing nickel film device.
Compared with prior art, the present invention's one plating high density nickelous chloride discharge treating system automatically runs, automatically cleans, and level of automation is high and simple to operate.
By following description also by reference to the accompanying drawings, the present invention will become more clear, and these accompanying drawings are for explaining embodiments of the invention.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation electroplating high density nickelous chloride discharge treating system of the present invention.
Embodiment
With reference to figure 1, the present invention is a kind of electroplate high density nickelous chloride discharge treating system 100 comprise connect successively stoste water tank 10, lift pump 15, dosing tank 20, inclined-tube settling box 25, first topping-up pump 30, full-automatic oil removal device 35, cartridge filter 40, high-pressure pump 45, specially adjust back water tank 55 except nickel film device 50 and PH.
Described one plating high density nickelous chloride discharge treating system 100 also comprises sludge treating system.Described sludge treating system comprises the mud slush pump 61, sludge condensation case 62, sludge press filtration pump 63 and the plate-and-frame filter press 64 that connect successively, the input terminus of described mud slush pump 64 connects with described inclined-tube settling box 25, and the filtrate output terminal of plate-and-frame filter press 64 connects with stoste water tank 10.
Described one plating high density nickelous chloride discharge treating system 100 also comprises the system of refiltering.The described system that refilters comprises dense water tank 71, second topping-up pump 72, full-automatic except nickel device 73 and full-automatic except complex compound nickel device 74 connected successively, and the input terminus of described dense water tank 71 connects with the described special dense water end (W.E.) removing nickel film device 50.The described full-automatic direct emission compliance discharge of output terminal except complex compound nickel device 74 or connect with stoste water tank 10.
When the present invention's one plating high density nickelous chloride discharge treating system 100 works, nickelous chloride concentration up to the wastewater collection of 300mg/L to stoste water tank 10 aeration buffer memory, balanced water quality and quantity; By lift pump 15, waste water is squeezed into dosing tank 20, automatically add alkali adjust ph to 9-10 according to pH controller, aerating system is set bottom dosing tank 20, alkali fully can be reacted fast with waste water; The waste water gravity flow regulating pH value enters inclined-tube settling box 25, and the suspended solid in waste water carries out mud-water separation in inclined-tube settling box 25, places inclined tube in pond, the settling velocity of accelerate sludge.Base sludge is regularly evacuated to after sludge condensation case 62 concentrates by mud slush pump 61 and squeezes into plate-and-frame filter press 64 press filtration by sludge press filtration pump 63, and mud is transported outward, and pressing filtering liquid enters stoste water tank 10; Squeeze in full-automatic oil removal device 35 and in cartridge filter 40 successively by the first topping-up pump 30 after in inclined-tube settling box 25 supernatant liquor, the content of nickel is down to 20-30mg/L, fine particle thing in waste water is blocked, can reduce the content of nickel in water, then waste water is squeezed into special except nickel film device 50(employing U.S. imported with original packaging film by high-pressure pump 45).Because nickeliferous material meeting part adheres is on film, film device need regularly clean, and the water after cleaning drains into stoste water tank 10; Prove through test of many times, because nickel ion major part can stick to above film, the dense water nickel content of film device higher than 30mg/L, can not be reduced to 1-2mg/L on the contrary.Film produces water nickel stable content and reaches " plating pollutant emission standard " (GB21900-2008) table three standard lower than 0.1mg/L, after film product water enters pH readjustment water tank 55, automatically acid for adjusting pH value is added to 6-9 according to pH controller, aerating system is set at water tank bottom, acid fully can be reacted fast with waste water; The dense water of film enters dense water tank 61, dense water is squeezed into full-automatic except nickel device 63 and automatically except complex compound nickel device 64 successively by the second topping-up pump 62, except adopting import special in nickel device except nickel resin, adopt import to remove the resin of complex compound nickel except in complex compound nickel device, after the nickel in waste water and complexing nickel being removed, nickel stable content reaches " plating pollutant emission standard " (GB21900-2008) table three effluent standard lower than 0.1mg/L or gets back to stoste water tank 10;
The present invention's one plating high density nickelous chloride discharge treating system automatically runs, automatically cleans, and level of automation is high and simple to operate.
More than in conjunction with most preferred embodiment, present invention is described, but the present invention is not limited to the embodiment of above announcement, and should contain amendment that the various essence according to the present embodiment carries out, equivalent combinations.
Claims (3)
1. electroplate a high density nickelous chloride discharge treating system, it is characterized in that: comprise connect successively stoste water tank, lift pump, dosing tank, inclined-tube settling box, the first topping-up pump, full-automatic oil removal device, cartridge filter, high-pressure pump, specially adjust back water tank except nickel film device and PH.
2. a kind of plating high density nickelous chloride discharge treating system as claimed in claim 1, it is characterized in that: also comprise sludge treating system, described sludge treating system comprises the mud slush pump, sludge condensation case, sludge press filtration pump and the plate-and-frame filter press that connect successively, and the input terminus of described mud slush pump connects with described inclined-tube settling box.
3. a kind of plating high density nickelous chloride process discharge discharge treating system as claimed in claim 1, it is characterized in that: also comprise the system of refiltering, the described system that refilters comprises the dense water tank, the second topping-up pump, full-automatic except nickel device and full-automatic except complex compound nickel device connected successively, and the input terminus of described dense water tank connects with the described special dense water end (W.E.) removing nickel film device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410617997.5A CN104649468A (en) | 2014-11-06 | 2014-11-06 | Emission treatment system for high-concentration nickel chloride produced during electroplating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410617997.5A CN104649468A (en) | 2014-11-06 | 2014-11-06 | Emission treatment system for high-concentration nickel chloride produced during electroplating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104649468A true CN104649468A (en) | 2015-05-27 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410617997.5A Pending CN104649468A (en) | 2014-11-06 | 2014-11-06 | Emission treatment system for high-concentration nickel chloride produced during electroplating |
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| CN (1) | CN104649468A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1657448A (en) * | 2004-12-04 | 2005-08-24 | 海宁市海整整流器有限公司 | Recovering and using technology of water in electroplating |
| CN203307148U (en) * | 2013-05-22 | 2013-11-27 | 株洲南方宇航环保工业有限公司 | Comprehensive treatment system of industrial electroplating wastewater |
| CN103833163A (en) * | 2014-03-13 | 2014-06-04 | 江苏中加怡润环境科技有限公司 | Treatment method of electroplating wastewater |
| CN103880204A (en) * | 2012-12-19 | 2014-06-25 | 上海问鼎水处理工程有限公司 | Method for removing nickel ions from electroplating sewage |
| CN104071925A (en) * | 2014-07-14 | 2014-10-01 | 东莞汇金环境科技有限公司 | Zero-drainage treatment system and zero-drainage treatment method for nickel plating wastewater in steel workshop |
-
2014
- 2014-11-06 CN CN201410617997.5A patent/CN104649468A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1657448A (en) * | 2004-12-04 | 2005-08-24 | 海宁市海整整流器有限公司 | Recovering and using technology of water in electroplating |
| CN103880204A (en) * | 2012-12-19 | 2014-06-25 | 上海问鼎水处理工程有限公司 | Method for removing nickel ions from electroplating sewage |
| CN203307148U (en) * | 2013-05-22 | 2013-11-27 | 株洲南方宇航环保工业有限公司 | Comprehensive treatment system of industrial electroplating wastewater |
| CN103833163A (en) * | 2014-03-13 | 2014-06-04 | 江苏中加怡润环境科技有限公司 | Treatment method of electroplating wastewater |
| CN104071925A (en) * | 2014-07-14 | 2014-10-01 | 东莞汇金环境科技有限公司 | Zero-drainage treatment system and zero-drainage treatment method for nickel plating wastewater in steel workshop |
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| RJ01 | Rejection of invention patent application after publication | ||
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Application publication date: 20150527 |