CN104633972A - Selective coating adopting gradually-changing antireflection layer and preparation method thereof - Google Patents
Selective coating adopting gradually-changing antireflection layer and preparation method thereof Download PDFInfo
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- CN104633972A CN104633972A CN201410743666.6A CN201410743666A CN104633972A CN 104633972 A CN104633972 A CN 104633972A CN 201410743666 A CN201410743666 A CN 201410743666A CN 104633972 A CN104633972 A CN 104633972A
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- antireflection layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Abstract
The invention relates to a solar selective coating and a preparation method thereof. The solar selective coating comprises an infrared reflection layer and an absorption layer located on the infrared reflection layer, wherein an antireflection layer is arranged outside the absorption layer, and the refractive index of the antireflection layer gradually changes in the range from the refractive index of the absorption layer to the refractive index of an environmental medium. By means of the preparation method, gradually changing of the refractive index of the antireflection layer from the absorption layer to the environmental medium is achieved, and gradually changing of the antireflection layer can be achieved by means of an inclination angle deposition technology (GLAD) so as to effectively grow a nano-structure film material. The solar selective coating adopts the stepped gradually-changing antireflection layer and is easy to produce, and sunlight absorption rate can be improved from 96% to 97.5%.
Description
Technical field
The invention belongs to material technology, coating technology field, be specifically related to a kind of solar selective coat with and preparation method thereof, this solar selective coat comprises the antireflection layer of gradually changed refractive index.
Background technology
Heat collecting element (HCE) is the building block of the hot electric power generating heat collector of solar groove type.Groove type heat collector is by gathering sunshine on a focal line with Linear Parabolic face speculum.Place heat collecting element in the position of this focal line, solar radiation is changed into heat.
Heat collecting element realizes commercialization, and its typical structure comprises the glass tube of a steel pipe and concentric installation.Stainless steel tube plates selective coating to raise the efficiency, glass tube adopts borosilicate glass tube, coated with antireflection coatings on it.An annular space is formed between glass tube and steel pipe.In order to raise the efficiency further, this annular space seals in two ends and vacuumizes.The sealing of annular space by installing expansion gear to realize between steel pipe and borosilicate glass tube.Expansion gear is by metal connecting ring, and one end is connected with glass tube, and the other end is connected with steel pipe.Expansion gear makes the line swell increment difference problem between steel pipe and glass tube be solved.
Selective coating should in solar spectrum high-selenium corn (low reflection), simultaneously high reverse--bias under heat collecting element targeted operating temperature.This transformation of coating on reflectivity is called as edge (edge).Obtain high-selenium corn, low transmitting at high operating temperatures, key is to form precipitous boundary curve in predetermined cutoff wavelength.This cutoff wavelength depends on the operating temperature of selective coating.Operating temperature is higher, and target cutoff wavelength is lower.Selective coating comprises infrared reflecting layer, is sun absorbed layer above infrared reflecting layer.It is very important for making absorbed layer transparent as far as possible to black body radiation under operating temperature.
Make more precipitous boundary curve, just may create interference effect.Absorbed layer is divided into several layers, and wherein the refractive index of every one deck is different, so just can obtain the interference effect wanted.Add one deck antireflection layer at the outermost layer of these coatings, absorption can be improved further.
In coating for selective absorption, traditional antireflection layer is the coating such as silica, aluminium oxide, SiN and AlN depositing thick layer about 70nm on selectively absorbing layers.This quarter-wave antireflection layer can play antireflecting effect to the wavelength of 280nm multiple.These 280nm multiples there will be a reflection minimum, between minimum, have one to reflect peak.For angle and wavelength on a large scale, this quarter-wave film layer can not show good performance.
Summary of the invention
The present invention is directed to the problems referred to above, a kind of selective coating of solar energy is provided, adopt the antireflection layer of gradually changed refractive index, effectively can improve the absorption efficiency of sunshine.
The technical solution used in the present invention is as follows:
A kind of solar selective coat, the absorbed layer comprising infrared reflecting layer He be located thereon, is provided with antireflection layer outside described absorbed layer, the refractive index of described antireflection layer in the refractive index of described absorbed layer to gradual change in the scope of the refractive index of surrounding medium.
Further, the refractive index of described antireflection layer is notch cuttype gradual change.
Further, described antireflection layer adopts glancing angle deposition technology (GLAD) deposition to realize.
Further, the thickness of described antireflection layer is 0.2-1 micron.
Prepare a method for above-mentioned solar selective coat, its step comprises:
1) on matrix, magnetron sputtering technique is adopted to prepare infrared reflecting layer;
2) on infrared reflecting layer, magnetron sputtering technique is adopted to prepare absorbed layer;
3) on absorbed layer, adopt glancing angle deposition technology (GLAD) to deposit antireflection layer, make the refractive index of antireflection layer in the refractive index of absorbed layer to gradual change in the scope of the refractive index of surrounding medium.
Solar selective coat of the present invention may be used for solar linear concentrating collector, and then this solar linear concentrating collector can be used for solar light-heat power-generation power station.
The present invention, in order to reduce reflection loss, makes the gradual change of refractive index realization from absorbed layer to surrounding medium of antireflection layer.The gradual change of antireflection layer can be realized by glancing angle deposition technology, can effectively grow nano structure membrane material in this way, realizes the nanoscale hole change designed.Compared with other deposition technique, glancing angle deposition technology can obtain the material of refractive index close to air.Antireflection layer due to complete gradual change is difficult to obtain, and the present invention preferably adopts the antireflection layer of notch cuttype gradual change, is easy to produce.Experimental result finds, sunshine transmitance can be made to bring up to 97.5% from 96% with the ladder gradual change antireflection layer of gross thickness 800nm.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of solar selective coat.
Fig. 2 is the SEM image of gradual change antireflection layer.
Fig. 3 is the corresponding relation figure of graded index and angle of deposit.
Detailed description of the invention
Below by specific embodiments and the drawings, the present invention will be further described.
Embodiment 1:
The present embodiment employing gross thickness is the Double-ladder gradual change antireflection layer of 200nm.The preparation method of the sunshine selective coating of the present embodiment, first prepares infrared reflecting layer 1 and absorbed layer 2, then prepares antireflection layer 3, as shown in Figure 1.
Wherein, the material of infrared reflecting layer can be silver, aluminium, copper, gold, tungsten, molybdenum, TiSi
2, ceramic material (as TiN, ito film) etc., preferably adopt magnetron sputtering technique preparation, the thickness of infrared reflecting layer is preferably 50 ~ 100nm.
Wherein, the material of absorbed layer can be ceramic-metal mixture, mix the ceramic layer etc. of semi-conducting material, preferred employing magnetron sputtering technique preparation, preferred double-decker (double-decker can make interference effect), the gross thickness of absorbed layer is preferably 80 ~ 120nm.
Wherein, the material of antireflection layer can be silica, aluminium oxide, SiN, AlN etc., and antireflection layer adopts glancing angle deposition technology (GLAD) preparation, and its thickness can at 0.2-1 micron.The refractive index of antireflection layer in the refractive index of described absorbed layer to gradual change in the scope of the refractive index of surrounding medium.Should be even transition in theory, but in order to actual operability, when producing preferably 2 ~ 3 layers.Adopt 200nm in the present embodiment, Double-ladder gradual change antireflection layer, every layer thickness is respectively about 100nm.
Fig. 2 is the SEM image of gradual change antireflection layer prepared by the present embodiment, and wherein 66 ° ,-66 °, 87 ° ,-87 ° represent angle of deposit, and 1 and 2 represent two-layer ladder.Fig. 3 is the corresponding relation figure of graded index and angle of deposit, and as seen from Figure 3, larger angle of deposit can obtain lower refractive index.
Sunshine selective coating prepared by the present embodiment, comprises the Double-ladder gradual change antireflection layer that gross thickness is 200nm, sunshine transmitance can be made to bring up to 97.5% from 96%.
Embodiment 2:
The preparation method of the sunshine selective coating of the present embodiment, first prepares infrared reflecting layer and absorbed layer, then prepares antireflection layer.
Wherein, antireflection layer adopts glancing angle deposition technology (GLAD), and its thickness can between 0.2 ~ 1 micron, and adopt gross thickness to be three layers of ladder gradual change antireflection layer of 800nm in the present embodiment, every layer thickness is respectively about 267nm.
Sunshine selective coating prepared by the present embodiment, comprises three layers of ladder gradual change antireflection layer that gross thickness is 800nm, sunshine transmitance can be made to bring up to 97.5% from 96%.
Above embodiment is only in order to illustrate technical scheme of the present invention but not to be limited; those of ordinary skill in the art can modify to technical scheme of the present invention or equivalent replacement; and not departing from the spirit and scope of the present invention, protection scope of the present invention should be as the criterion with described in claim.
Claims (9)
1. a solar selective coat, it is characterized in that, the absorbed layer comprising infrared reflecting layer and be located thereon, is provided with antireflection layer outside described absorbed layer, the refractive index of described antireflection layer in the refractive index of described absorbed layer to gradual change in the scope of the refractive index of surrounding medium.
2. solar selective coat as claimed in claim 1, is characterized in that: the refractive index of described antireflection layer is notch cuttype gradual change.
3. solar selective coat as claimed in claim 1, is characterized in that: described antireflection layer adopts the preparation of glancing angle deposition technology.
4. solar selective coat as claimed in claim 1, is characterized in that: the thickness of described antireflection layer is 0.2-1 micron.
5. solar selective coat as claimed in claim 1, is characterized in that: described antireflection layer is Double-ladder gradual change antireflection layer.
6. solar selective coat as claimed in claim 1, is characterized in that: described antireflection layer is three layers of ladder gradual change antireflection layer.
7. prepare a method for solar selective coat described in claim 1, its step comprises:
1) on matrix, magnetron sputtering technique is adopted to prepare infrared reflecting layer;
2) on infrared reflecting layer, magnetron sputtering technique is adopted to prepare absorbed layer;
3) on absorbed layer, adopt glancing angle deposition deposition techniques antireflection layer, make the refractive index of antireflection layer in the refractive index of absorbed layer to gradual change in the scope of the refractive index of surrounding medium.
8. one kind comprises the solar linear concentrating collector of solar selective coat according to any one of claim 1 to 6.
9. one kind comprises the solar light-heat power-generation power station of the concentrating collector of solar linear described in claim 8.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410743666.6A CN104633972A (en) | 2013-12-09 | 2014-12-08 | Selective coating adopting gradually-changing antireflection layer and preparation method thereof |
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| CN201310659806 | 2013-12-09 | ||
| CN2013106598067 | 2013-12-09 | ||
| CN201410743666.6A CN104633972A (en) | 2013-12-09 | 2014-12-08 | Selective coating adopting gradually-changing antireflection layer and preparation method thereof |
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| CN104633972A true CN104633972A (en) | 2015-05-20 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951051A (en) * | 2016-06-16 | 2016-09-21 | 哈尔滨工业大学 | Method of preparing graded refractive index antireflection film by adopting oblique sputtering process |
| WO2020097811A1 (en) * | 2018-11-14 | 2020-05-22 | 香港科技大学深圳研究院 | Full-ceramic and high-temperature solar energy selective absorbing coating and manufacturing method therefor |
| EP3622570A4 (en) * | 2017-05-11 | 2021-01-27 | BOE Technology Group Co., Ltd. | Display panel, manufacturing method thereof, and display apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040263983A1 (en) * | 2003-05-02 | 2004-12-30 | Lockheed Martin Corporation | Anti-reflective coatings and structures |
| CN101793437A (en) * | 2009-12-31 | 2010-08-04 | 沈阳百乐真空技术有限公司 | Multi-purpose solar spectrum selective absorbing coating and preparation method thereof |
| CN102439488A (en) * | 2009-05-22 | 2012-05-02 | 仁荷大学校产学协力团 | Modified oblique incident angle deposition apparatus, method for manufacturing non-reflective optical thin film using the same, and non-reflective optical thin film |
-
2014
- 2014-12-08 CN CN201410743666.6A patent/CN104633972A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040263983A1 (en) * | 2003-05-02 | 2004-12-30 | Lockheed Martin Corporation | Anti-reflective coatings and structures |
| CN102439488A (en) * | 2009-05-22 | 2012-05-02 | 仁荷大学校产学协力团 | Modified oblique incident angle deposition apparatus, method for manufacturing non-reflective optical thin film using the same, and non-reflective optical thin film |
| CN101793437A (en) * | 2009-12-31 | 2010-08-04 | 沈阳百乐真空技术有限公司 | Multi-purpose solar spectrum selective absorbing coating and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951051A (en) * | 2016-06-16 | 2016-09-21 | 哈尔滨工业大学 | Method of preparing graded refractive index antireflection film by adopting oblique sputtering process |
| EP3622570A4 (en) * | 2017-05-11 | 2021-01-27 | BOE Technology Group Co., Ltd. | Display panel, manufacturing method thereof, and display apparatus |
| WO2020097811A1 (en) * | 2018-11-14 | 2020-05-22 | 香港科技大学深圳研究院 | Full-ceramic and high-temperature solar energy selective absorbing coating and manufacturing method therefor |
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Application publication date: 20150520 |