CN104630839A - Electroplating liquid and electroplating method of ethylenediamine cyanide-free copper plating - Google Patents
Electroplating liquid and electroplating method of ethylenediamine cyanide-free copper plating Download PDFInfo
- Publication number
- CN104630839A CN104630839A CN201310553802.0A CN201310553802A CN104630839A CN 104630839 A CN104630839 A CN 104630839A CN 201310553802 A CN201310553802 A CN 201310553802A CN 104630839 A CN104630839 A CN 104630839A
- Authority
- CN
- China
- Prior art keywords
- electroplate liquid
- plating
- electroplating
- content
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
The present invention discloses an electroplating liquid and an electroplating method of ethylenediamine cyanide-free copper plating. The electroplating liquid comprises 80-120 g/L of CuSO4.5H2O, 60-75 g/L of ethylenediamine, 10-20 g/L of citrate, and 3-5 g/L of nitrate. According to the electroplating liquid of the present invention, the ethylenediamine is adopted as the coordination agent, and the citrate is adopted as the auxiliary coordination agent, such that the electroplating liquid has characteristics of good dispersion, good deep plating ability, high cathode current efficiency, and excellent plating liquid performance. In addition, the plating layer obtained through electroplating under the alkaline condition has characteristics of low porosity and good quality.
Description
Technical field
The present invention relates to the technical field of copper plating process, particularly relate to a kind of electroplate liquid and electro-plating method of quadrol cyanide-free copper electroplating.
Background technology
Copper has good electroconductibility and thermal conductivity, and comparatively soft, easy polishing, is soluble in nitric acid, is also soluble in the vitriol oil of heating, acts on very slow in hydrochloric acid and dilute sulphuric acid.Be easy in atmosphere be oxidized (especially in a heated condition), itself color and gloss will be lost after oxidation, in damp atmosphere, generating one deck ventilation breather with carbonic acid gas or oxide compound effect, when being subject to sulfide effect, brown or black thin film will be generated.
Due to the calibration of copper current potential, thus it is easy to deposit on other metal.Using copper as bottom, when using together with bright nickel and tiny crack chromium, very good corrosion stability coating can be obtained.Copper coating effectively can be protected the etch of zine pressure casting acid and alkali nickel plating solution and dissolve, and thus prevent displacement plating, and when electro-galvanizing die casting, copper is absolutely necessary as bottom.Equally, copper facing before steel part nickel plating chromium, is easily polished to very high surface luminous intensity, thus can reduce polishing and the polishing cost of some steel part.So copper coating is commonly used to the bottom as gold and silver, nickel and chromium coating.In addition, owing to having good electroconductibility, copper coating is also widely used on printed-wiring board (PWB).Copper can stop the scattering and permeating of carbon, nitrogen effectively, and the copper coating of low porosity, as a kind of blocking layer, is also widely used in nitriding and the carburization process of steel matrix part.
The covering power of cyanide electroplating plating solution and leveling ability good, coating crystallization is careful, good with the bonding force of matrix, and technology maturation, technological operation is simple, has been widely used in the bottoming coating of various metal matrix material for a long time.But the toxicity of prussiate is large, and lethal quantity is only 50mg, and China has put into effect relevant decree policy and prohibitted the use prussiate to electroplate.Thus, cyanide-free copper electroplating becomes a trend of following electro-coppering development.
The character of existing cyanide-free copper electroplating ubiquity plating solution is not ideal enough, the technological deficiency that quality of coating is not strong, these seriously constrain cyanide-free copper electroplating industrially completely replace have cyanogen copper facing.
Summary of the invention
In view of this, one aspect of the present invention provides a kind of electroplate liquid of quadrol cyanide-free copper electroplating, and the plating solution performance of this electroplate liquid is excellent, and quality of coating is good.
An electroplate liquid for quadrol cyanide-free copper electroplating, comprises the CuSO that content is 80 ~ 120g/L
45H
2the Citrate trianion that the quadrol that O, content are 60 ~ 75g/L, content are 10 ~ 20g/L, content are the nitrate of 3 ~ 5g/L.
Wherein, the CuSO that content is 100g/L is comprised
45H
2the Citrate trianion that the quadrol that O, content are 70g/L, content are 13g/L, content are the nitrate of 4g/L.
Wherein, described Citrate trianion is ammonium citrate.
In the technical scheme of above electroplate liquid, quadrol is selected to be coordination agent.Cupric standard potential is+0.340V, and the degree of polarization of simple copper ion plating solution is lower, and the velocity of discharge of copper is very fast.Carry out electroplating that the coating obtained is coarse, bonding force is bad according to simple salt plating solution.Add quadrol, it can form stable complexing ion with bivalent cupric ion coordination, and the better simply bivalent cupric ion of the discharge potential of complexing ion when cathodic deposition is more negative, and namely degree of polarization is larger.Thus, complexing ion electric discharge is more steady, makes the more careful smooth of coating.
Select Citrate trianion as auxiliary complexing agent.Citrate trianion is preferably Tripotassium Citrate, Trisodium Citrate or ammonium nitrate.Citrate trianion can form the complexing ion of mixed ligand body with bivalent cupric ion together with quadrol.Citrate trianion can improve the dispersive ability of plating solution, strengthens the shock absorption of plating solution, promotes anode dissolution, increases the luminance brightness of permissible current density and raising coating.Citrate trianion is ammonium nitrate more preferably.The ammonium ion that ammonium nitrate contains can improve Deposit appearance.
Select nitrate as conducting salt.Nitrate can improve the upper limit, minimizing pin hole, the service temperature reducing plating solution, the raising dispersive ability of working current density, but obviously reduces current efficiency.Nitrate is preferably ammonium nitrate, and ammonium nitrate effectively can improve the current density of allowing than adding saltpetre or SODIUMNITRATE and improve quality of coating.
The present invention provides a kind of electro-plating method on the other hand, and it is good that the method can make to electroplate by the plating solution of excellent performance the quality of coating obtained.
The above-mentioned electroplate liquid of a kind of use carries out electric plating method, comprises the following steps:
(1) electroplate liquid is prepared: in water, dissolve each feed composition form electroplate liquid, described often liter of electroplate liquid contains 80 ~ 120g CuSO
45H
2o, 60 ~ 75g quadrol, 10 ~ 20g Citrate trianion, 3 ~ 5g nitrate;
(2) insert with pretreated negative electrode and anode and pass into electric current in described electroplate liquid and electroplate.
Wherein, described electric current is monopulse rectangular wave current; The pulsewidth of described monopulse rectangular wave current is 1 ~ 3ms, and dutycycle is 5 ~ 30%, and average current density is 3 ~ 5A/dm
2.
Wherein, in described step (2), the pH of electroplate liquid is 9 ~ 10.
Wherein, the temperature of electroplate liquid is 50 ~ 60 DEG C.
Wherein, the time of plating is 30 ~ 60min.
Wherein, in described step (2), the area ratio of negative electrode and positive electrode is (1/2 ~ 2): 1.
In the technical scheme of above electro-plating method, monopulse rectangular wave current is defined as at t
1passing into current density in time is J
pelectric current, at t
2without passing into electric current in time, it is a kind of intermittent pulse current.Dutycycle is defined as t
1/ (t
1+ t
2), frequency is 1/(t
1+ t
2), mean current is defined as J
pt
1/ (t
1+ t
2).Compare with DC electrodeposition, thickness and the ion concentration distribution of electrostatic double layer all change; While adding electrochemical polarization, reduce concentration polarization, the direct effect of generation is, the coating that pulse plating obtains than DC electrodeposition coating evenly, crystallization is finer and closely woven.Moreover, pulse plating also has: hardness and the wear resistance of (1) coating are all high; (2) solution dispersibility and covering power good; (3) decrease the super plating of part edge, coating distributing homogeneity is good, can save plating solution consumption.
Using the steel plate of low-carbon (LC) as negative electrode, take copper sheet as anode.Pre-treatment comprises anticathode sand papering and subsequent oil removing.This use sand papering can polish twice, and first time with flint paper such as 200 object sand paperings, can be used fine sandpaper, such as, can use W28 abrasive paper for metallograph for the second time.This oil removing can first adopt chemical alkali liquor oil removing then to adopt the dehydrated alcohol oil removing of 95%.Wherein, chemical alkali lye can comprise 40 ~ 60g/L NaOH, 50 ~ 70g/L Na
3pO
4, 20 ~ 30g/L Na
2cO
3with 3.5 ~ 10g/L Na
2siO
3.
In the present invention, electroplate liquid stirs in energising electroplating process, and the rotating speed of stirring controls in stirring at low speed, is 100 ~ 400rpm.Stirring power reduces copper complexing ion and concentration gradient, thickness of diffusion layer and a large amount of liberation of hydrogen near electrode surface and causes the increase of cathodic area pH value, is conducive to the deposition of metal ion; Can promote that again coating thickens the uniform composition with coating continuously; The copper complexing ion that the electrolysis initial stage can also be made to produce shifts out cathodic area rapidly, thus improves quality of coating.
Plating solution of the present invention is coordination agent with quadrol, take Citrate trianion as auxiliary complexing agent, and make plating solution have good dispersion force and depth capability, cathode efficiency is high, and plating solution performance is excellent.The porosity that employing electroplates the coating of acquisition in the basic conditions at plating solution is low, and quality of coating is good.
Embodiment
Below in conjunction with embodiment, the present invention is described in further detail.
According to formulated electroplate liquid described in embodiment 1 ~ 6, be specially:
The quality of other feed composition is taken according to formula electronic balance.Dissolving this component raw material respectively by suitable quantity of water and mixed pours in beaker, then, adds water move to pre-determined volume, adds caustic soda and regulates pH to 9 ~ 10.
The electroplate liquid of formulated described in embodiment 1 ~ 6 and comparative example is used to carry out electric plating method:
(1) negative electrode adopts the Q235 steel plate of 10mm × 10mm × 0.2mm specification.Metalluster is exposed with the polishing of W28 abrasive paper for metallograph to surface again after first tentatively being polished with 200 order waterproof abrasive papers by steel plate.Successively through temperature be 50 ~ 70 DEG C chemical alkali liquor oil removing, distilled water flushing, 95% dehydrated alcohol oil removing, distilled water flushing.The formula of chemistry alkali lye is 40 ~ 60g/LNaOH, 50 ~ 70g/L Na
3pO
4, 20 ~ 30g/L Na
2cO
3with 3.5 ~ 10g/L Na
2siO
3.
(2) with the copper sheet of 10mm × 10mm × 0.2mm specification for anode, by level and smooth for sand papering, deionized water rinsing and oven dry before plating.
(3) by the electroplate liquid in pretreated anode and negative electrode immersion plating groove, just plating tank is placed in thermostat water bath, and is plating tank installation electric blender, the stirring rod of electric blender is inserted in electroplate liquid.Bath temperature to be regulated makes temperature of electroplating solution maintain 50 ~ 60 DEG C, and after mechanical stirring rotating speed is adjusted to 100 ~ 400rpm, make pulse power supply, the pulsewidth of pulsed current is 1 ~ 3ms, and dutycycle is 5 ~ 30%, and average current density is 3 ~ 5A/dm
2.After 30 ~ 60min to be energised, cut off the power supply of electroplanting device.Take out steel plate, use distilled water cleaning, drying.
Embodiment 1
The formula of electroplate liquid is as follows:
Plating technology condition: the pulsewidth of monopulse rectangular wave current is 1ms, and dutycycle is 30%, and average current density is 3A/dm
2;
ph is 9, and temperature is 50 DEG C, and electroplating time is 60min.
Embodiment 2
The formula of electroplate liquid is as follows:
Plating technology condition: the pulsewidth of monopulse rectangular wave current is 1ms, and dutycycle is 25%, and average current density is 3.5A/dm
2; PH is 9.5, and temperature is 55 DEG C, and electroplating time is 50min.
Embodiment 3
The formula of electroplate liquid is as follows:
Plating technology condition: the pulsewidth of monopulse rectangular wave current is 2ms, and dutycycle is 20%, and average current density is 4A/dm
2; PH is 10, and temperature is 60 DEG C, and electroplating time is 45min.
Embodiment 4
The formula of electroplate liquid is as follows:
Plating technology condition: the pulsewidth of monopulse rectangular wave current is 2ms, and dutycycle is 15%, and average current density is 4.5A/dm
2; PH is 11, and temperature is 50 DEG C, and electroplating time is 30min.
Embodiment 5
The formula of electroplate liquid is as follows:
Plating technology condition: the pulsewidth of monopulse rectangular wave current is 3ms, and dutycycle is 5%, and average current density is 5A/dm
2; PH is 10.3, and temperature is 60 DEG C, and electroplating time is 35min.
Embodiment 6
The formula of electroplate liquid is as follows:
Plating technology condition: the pulsewidth of monopulse rectangular wave current is 3ms, and dutycycle is 10%, and average current density is 4.5A/dm
2; PH is 10.5, and temperature is 55 DEG C, and electroplating time is 40min.
With reference to following methods, dispersive ability test is carried out to the plating solution of embodiment 1 ~ 6:
The dispersive ability of plating solution adopts far and near cathode method (Haring-Blue method) to measure.Measure the Hull groove that groove adopts the Hull Cell267ml model of Kocour company of the U.S., interior dimensions is 150mm × 50mm × 70mm.Negative electrode selects thickness to be the copper sheet of 0.5mm, and working face is of a size of 50mm × 50mm; Anode is plating nickel plate with holes; Plating electric current 1A, electroplating time 30min.
The dispersive ability calculation formula of plating solution is:
Dispersive ability=[K-(the Δ M of plating solution
1/ Δ M
2)]/(K-1) (result represents with percentage);
In formula, K is negative electrode far away to the distance of anode and nearly negative electrode to the ratio of distances constant of anode, and in this test, K gets 2; Δ M
1for the increment (g) after plating on nearly negative electrode; Δ M
2for the increment (g) after plating on negative electrode far away.
With reference to following methods, covering power test is carried out to the plating solution of embodiment 1 ~ 6:
Endoporus method is adopted to measure.Negative electrode selects internal diameter 110mm, and pipe range is the copper pipe of 50mm, and one end is closed.During test, the distance of the mouth of pipe and anode is fixed on 80mm, test current 0.2A, electroplating time 30min.According to following formulae discovery:
Covering power=endoporus coating length/pipe range (result represents with percentage).
With reference to following methods, Surface flat test is carried out to the plating solution of embodiment 1 ~ 6:
Roughmeter method is adopted to test Surface flat.To Hull Cell specimen surface metal spraying emery process to be tested, make its surfaceness homogeneous, then use the RA200 type roughmeter of Shanghai Gao Zhi precision instrument company limited to measure the surfaceness of its plating front and back, according to following formulae discovery Surface flat:
The mean roughness of medullary ray before Surface flat=(mean roughness of the mean roughness-plating CB of the front medullary ray of plating)/plating, result is expressed as a percentage;
In above-mentioned formula, center line average roughness refers to the medullary ray along Hull Cell test piece width, until the mean value of low current density end METHOD FOR CONTINUOUS DETERMINATION 5 times from high electric current close end 2cm place.Originally now the groove of Hull described in method is the Hull groove of the Hull Cell267ml model adopting Kocour company of the U.S., and the electric current of hull trough test is 0.8A//dm
2.
With reference to following methods, current efficiency test is carried out to the plating solution of embodiment 1 ~ 6:
Copper voltameter method is adopted to measure.Negative electrode to be tested and copper voltameter cleaned and dry up rear electronic scale weighing, then insert in electrodeposit groove by two negative electrodes simultaneously, be energized 10 ~ 30min, take out and clean dry up after use electronic scale weighing.According to following formulae discovery:
Current efficiency=(1.186 × cathode quality to be measured)/(electrochemical equivalent of copper voltameter quality × cathodic deposition metal to be measured) × 100%.Here, electrochemical equivalent=molar mass ÷ (depositing ions valency × 26.8), unit is g.A
-1.h
-1.In the embodiment of the present invention, cupric electrochemical equivalent is 1.186g.A
-1.h
-1.
Speed test is plated with reference to the plating solution of following methods to embodiment 1 ~ 6:
Mass method is adopted to measure sedimentation rate.Be 10 with sensitivity
-4electronic balance weighing sample plating before and after quality.By the acquisition sedimentation rate of poor quality of unit time, unit surface, press formulae discovery below:
Plating speed=(after plating before sample mass-plating sample mass)/(specimen surface to be plated long-pending × plating time).Each Data duplication is measured three times and is got its mean value.
Test with reference to the bonding force of following methods to the coating of embodiment 1 ~ 6:
The method adopting line to draw lattice measures the bonding force of coating, and being 30 degree with one cutting edge by electrodeposition cladding, converted steel draws parallel lines or the 1mm that 2mm of being separated by drawn by cutter
2square lattice.Whether the coating observing line tilts or peels off.Should master the dynamics during line, a cutter just can scratch coating, arrives matrix metal.
With reference to following methods, porosity test is carried out to the coating of embodiment 1 ~ 6:
The large young pathbreaker of porosity is directly connected to the corrosion resisting property of coating, adopts paster method to press GB5935-86 standard detection.The etchant solution that the potassium ferricyanide solution of 10g/L and the sodium chloride solution of 20g/L are tested as porosity.Operation steps is: after wiped clean of being deoiled by coating surface, is close to coating surface with the filter paper soaking into etchant solution, and the two can not have gap.Buy the fully wetting filter paper of etchant solution solution by glass stick or degreasing swab stick, supplement a solution at interval of 1min, taken off by filter paper after 5min, dry after clean with distilled water flushing, record hole is counted.Be placed on airing on cleaned glass plate, the number of number Bluepoint.Substitute into formulae discovery voidage below:
Number/tested area (individual/the cm of porosity=spot
2)
When calculating number of apertures, do following calculating by spot diameter size: hot spot diameter is less than 1mm, and with a porosimeter at often; Be greater than 1mm and be less than 3mm often o'clock with three porosimeters; Be greater than 3mm and be less than 5mm, often with ten porosimeters.
The test result of the coating of embodiment 1 ~ 6 and comparative example and the performance of plating solution is as follows:
As can be seen from the above table, in embodiment 1 ~ 6, consider from the integration test effect of plating solution and coating, the dispersive ability of the formula plating solution of embodiment 6, depth capability, Surface flat, current efficiency and plating speed, the porosity of coating and bonding force will be got well compared with other embodiment.Thus, this formula is screening formulation of the present invention, and the preferred plating conditions of its correspondence is the pulsewidth of monopulse rectangular wave current is 3ms, and dutycycle is 10%, and average current density is 4.5A/dm
2; PH is 10.5, and temperature is 55 DEG C, and electroplating time is 40min.
It should be noted that and understand, when not departing from the spirit and scope of accompanying claim the present invention for required protection, various amendment and improvement can be made to the present invention of foregoing detailed description.Therefore, the scope of claimed technical scheme is not by the restriction of given any specific exemplary teachings.
Applicant states, the present invention illustrates detailed process equipment and process flow process of the present invention by above-described embodiment, but the present invention is not limited to above-mentioned detailed process equipment and process flow process, namely do not mean that the present invention must rely on above-mentioned detailed process equipment and process flow process and could implement.Person of ordinary skill in the field should understand, any improvement in the present invention, to equivalence replacement and the interpolation of ancillary component, the concrete way choice etc. of each raw material of product of the present invention, all drops within protection scope of the present invention and open scope.
Claims (9)
1. an electroplate liquid for quadrol cyanide-free copper electroplating, is characterized in that, comprises the CuSO that content is 80 ~ 120g/L
45H
2the Citrate trianion that the quadrol that O, content are 60 ~ 75g/L, content are 10 ~ 20g/L, content are the nitrate of 3 ~ 5g/L.
2. electroplate liquid according to claim 1, is characterized in that, comprises the CuSO that content is 100g/L
45H
2the Citrate trianion that the quadrol that O, content are 70g/L, content are 13g/L, content are the nitrate of 4g/L.
3. electroplate liquid according to claim 1, is characterized in that, described Citrate trianion is ammonium citrate.
4. use the electroplate liquid electric plating method described in claim 1, it is characterized in that, comprise the following steps:
(1) electroplate liquid is prepared: in water, dissolve each feed composition form electroplate liquid, described often liter of electroplate liquid contains 80 ~ 120g CuSO
45H
2o, 60 ~ 75g quadrol, 10 ~ 20g Citrate trianion, 3 ~ 5g nitrate;
(2) insert with pretreated negative electrode and anode and pass into electric current in described electroplate liquid and electroplate.
5. method according to claim 4, is characterized in that, described electric current is monopulse rectangular wave current; The pulsewidth of described monopulse rectangular wave current is 1 ~ 3ms, and dutycycle is 5 ~ 30%, and average current density is 3 ~ 5A/d
m 2.
6. method according to claim 4, is characterized in that, in described step (2), the pH of electroplate liquid is 9 ~ 10.
7. method according to claim 4, is characterized in that, the temperature of electroplate liquid is 50 ~ 60 DEG C.
8. method according to claim 4, is characterized in that, the time of plating is 30 ~ 60min.
9. method according to claim 4, is characterized in that, in described step (2), the area ratio of negative electrode and positive electrode is (1/2 ~ 2): 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310553802.0A CN104630839A (en) | 2013-11-08 | 2013-11-08 | Electroplating liquid and electroplating method of ethylenediamine cyanide-free copper plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310553802.0A CN104630839A (en) | 2013-11-08 | 2013-11-08 | Electroplating liquid and electroplating method of ethylenediamine cyanide-free copper plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104630839A true CN104630839A (en) | 2015-05-20 |
Family
ID=53210073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310553802.0A Pending CN104630839A (en) | 2013-11-08 | 2013-11-08 | Electroplating liquid and electroplating method of ethylenediamine cyanide-free copper plating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104630839A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106757231A (en) * | 2016-12-27 | 2017-05-31 | 武汉延锋时代检测技术服务有限公司 | A kind of aluminium alloy part chrome-faced technique |
-
2013
- 2013-11-08 CN CN201310553802.0A patent/CN104630839A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106757231A (en) * | 2016-12-27 | 2017-05-31 | 武汉延锋时代检测技术服务有限公司 | A kind of aluminium alloy part chrome-faced technique |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104630837A (en) | Electroplating liquid and electroplating method of anthraquinone dye system acid copper plating | |
| CN105154931A (en) | Platinum electroplating solution comprising dihydrogen dinitrosulfatoplatinate and electroplating method adopting platinum electroplating solution | |
| CN105274589A (en) | Alkaline cyanogen-free copper plating electroplating liquid and electroplating method thereof | |
| CN104264195A (en) | Mercaptoiminazole cyanide-free gold-electroplating solution and electroplating method thereof | |
| CN105274588A (en) | Succinimide cyanogen-free monovalent copper plating electroplating liquid and electroplating method thereof | |
| CN105297087A (en) | Electroplating liquid for hydroxylamine reducing agent cyanide-free univalence copper plating and electroplating method | |
| CN104630846A (en) | Electroplating solution for EDTA salt cyanide-free copper plating and electroplating method | |
| CN105132961A (en) | Electroplating solution for hydroxymethyldimethyl cyanide-free monovalent copper plating, and electroplating method thereof | |
| CN104630847A (en) | Electroplating solution for HEDP cyanide-free copper plating and electroplating method | |
| CN105177643A (en) | Electroplating solution for acidic copper plating by phenol dye system and electroplating method thereof | |
| CN105200464A (en) | Hydrazine reducing agent cyanide-free cuprous electroplating solution and electroplating method | |
| CN104630845A (en) | Electroplating solution for composite organic phosphonic acid cyanide-free copper plating and electroplating method | |
| CN105297088A (en) | Electroplate liquid for acid copper plating of triphenylmethane dye system and electroplating method | |
| CN104233385A (en) | Electroplating liquid for non-cyanide plating gold by thiazole and electroplating method thereof | |
| CN104630839A (en) | Electroplating liquid and electroplating method of ethylenediamine cyanide-free copper plating | |
| CN104611742A (en) | Cr-Ni alloy plating solution and electroplate method | |
| CN105441995A (en) | Glucosaminic-acid cyanide-free gold-plating electroplating liquid and electroplating method thereof | |
| CN104630836A (en) | Electroplating liquid and electroplating method of diethylenetriamine cyanide-free copper plating | |
| CN105297089A (en) | Arsenic-contained sulfite cyanide-free plated gold electroplating liquid and electroplating method | |
| CN104630835A (en) | Electroplating liquid and method of triethanolamine cyanide-free copper plating | |
| CN105316719A (en) | Electroplate liquid and electroplate method for cyanide-free gold plating of thallium-contained sulfite | |
| CN105316718A (en) | Electroplate liquid and electroplate method for cyanide-free gold electroplating of sulfite | |
| CN105441997A (en) | Glutamic-acid cyanide-free gold-plating electroplating liquid and electroplating method thereof | |
| CN104630840A (en) | Electroplating liquid and electroplating method of phthalocyanine system acid copper plating | |
| CN105112956A (en) | Acidic dinitrodiammineplatinum ammoniacal plating solution and plating method of Pt |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150520 |