CN104599919A - Electric field potential gradient generation device and control method thereof - Google Patents
Electric field potential gradient generation device and control method thereof Download PDFInfo
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- CN104599919A CN104599919A CN201410782447.9A CN201410782447A CN104599919A CN 104599919 A CN104599919 A CN 104599919A CN 201410782447 A CN201410782447 A CN 201410782447A CN 104599919 A CN104599919 A CN 104599919A
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- electric field
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- ring plate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/08—Arrangements for controlling intensity of ray or beam
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Abstract
The invention discloses an electric field potential gradient generation device and a control method thereof. The electric field potential gradient generation device comprises an electric field potential gradient generation module, an ion generation system and a signal processing system; the electric field potential gradient generation module is formed by a plurality of electric field ring pieces and a plurality of insulation ring bodies; the intensity of the electric field can be controlled by a circuit control system; the ion flow enters the electric field potential gradient generation module to obtain a constant speed and accordingly the flight time of the ion flow can be obtained, the type of ions can be analyzed through the processing of the signal processing system, and the purpose of the detection on substances in a gas medium is achieved. The electric field potential gradient generation device can serve as an analyzer to be applied to a precision analysis instrument.
Description
Technical field
The present invention relates to a kind of electric field potential gradient generating means and control method thereof, under cooperatively interacting with circuit control system, ion current flies in the electric field, circuit control system controlling potential gradient electric field process.By to the analysis of drawing ion, reach the object that the material in gas medium is detected.The present invention can be applied in sophisticated analytical instruments as ion source.
Background technology
Ion (electric charge) migration is the analytical technology characterized chemical ion material based on the difference of gaseous ions different in gas phase migration velocity in the electric field.Ion current enters in electric potential gradient field (i.e. electric field strength E, unit V/cm), and the constant speed that just can obtain (is referred to as migration velocity V
d,unit, cm/s).Migration velocity (or migration rate) V of ion
dbe directly proportional with electric field strength E, i.e. V
d(K is ion mobility coefficient to=KE, unit cm
2/ VS).Therefore, the generation of electric field and control procedure extremely important for the detection of ion current.It can be applied to the public safety field such as illicit drugs inspection, explosive detection.
Summary of the invention
Electric charge can move in the electric field, illustrates that electric charge receives the effect of electric field force, and the size of electric field force can be calculated by Coulomb's law.Ion motion follows Coulomb's law, and Gauss theorem is the differential form of Coulomb's law.Gauss theorem shows, electric field strength only depends on the algebraical sum of electric charge in this occluding surface to the flux of any enclosed curved surface, has nothing to do, also have nothing to do with the distribution situation of closed surface exterior charging with the distribution situation of electric charge in closed surface.Ampère circuital theorem shows, in electrostatic field, electric field strength is zero along the integration of any closed circuit.The face that the point that current potential is equal is linked to be is equipotential surface, and equipotential surface electric field intensity inside high is equal.Electric potential gradient is the gradient of electric field normal direction.The travel motion of ion follows above-mentioned principle, the migration velocity V of ion
d=KE illustrates that the migration velocity of ion is relevant with electric field strength.Just constant electric field and uniform electric field should be had to obtain constant Ion transfer speed.And uniform electric field E=△ U/d, △ U is electric charge point-to-point transmission potential difference, d is that electric charge is along point-to-point transmission power line distance.Electric field potential gradient generating means of the present invention comprises electric field potential gradient generation module, ion generation system and signal processing system, and ion generation system produces ion current; Electric field potential gradient generation module is made up of multiple electric field ring plate and multiple insulation ring body, and described multiple electric field ring plate is made up of the identical metal ring plate of structure, because electric field ring plate inner potential is equal, therefore can form equipotential surface; Described multiple insulation ring body is made up of the identical insulating material of structure, multiple insulation ring body isolates multiple electric field ring plate, equal potential difference △ U is applied between two electric field ring plates, whole electric field potential gradient generation module produces uniform electric field-uniform electric field, ion current to move acquisition constant speed along direction of an electric field, thus the flight time of ion current can be calculated, just can analyze the kind of ion, reach the object that the material in gas medium is detected.Ion generation system in the present invention can adopt radioactive source, corona discharge source, electrospray ionization source or photoionization source etc., and have the function producing ion current, be not particularly limited at this, interface coordinates with the present invention.Signal processing system adopts sophisticated analytical instruments signal processing system to generate the information of tested substance.
The control method of electric field potential gradient generating means of the present invention, comprises the steps: that ion generation system is opened, and produces ion current and enters electric field potential gradient generation module; Microprocessor unit is given between every two electric field ring plates by electric field unit and is applied equal potential difference, makes electric field potential gradient generation module produce uniform electric field; Ion current is moved into signal processing system along direction of an electric field under the effect of uniform electric field power.
The invention has the beneficial effects as follows: the kind that can analyze ion, reach the object that the material in gas medium is detected.The present invention can be applied in sophisticated analytical instruments as analyzer.
Accompanying drawing explanation
Fig. 1 is the external structure schematic diagram of electric field potential gradient generating means of the present invention.
Fig. 1 a is the structural representation of intermediate ion generation systems interface of the present invention.
Fig. 1 a1 is the structural representation of A electric field ring plate in the present invention.
Fig. 1 a2 is the structural representation of A insulation ring body in the present invention.
Fig. 1 b1 is the structural representation of B electric field ring plate in the present invention.
Fig. 1 b2 is the structural representation of B insulation ring body in the present invention.
Fig. 1 c1 is the structural representation of C electric field ring plate in the present invention.
Fig. 1 c2 is the structural representation of C insulation ring body in the present invention.
Fig. 1 d1 is the structural representation of D electric field ring plate in the present invention.
Fig. 1 d2 is the structural representation of D insulation ring body in the present invention.
Fig. 1 e1 is the structural representation of E electric field ring plate in the present invention.
Fig. 1 e2 is the structural representation of E insulation ring body in the present invention.
Fig. 1 f1 is the structural representation of F electric field ring plate in the present invention.
Fig. 1 f2 is the structural representation of F insulation ring body in the present invention.
Fig. 1 g1 is the structural representation of G electric field ring plate in the present invention.
Fig. 1 g2 is the structural representation of G insulation ring body in the present invention.
Fig. 1 h1 is the structural representation of H electric field ring plate in the present invention.
Fig. 1 h2 is the structural representation of H insulation ring body in the present invention.
Fig. 1 i1 is the structural representation of I electric field ring plate in the present invention.
Fig. 1 i2 is the structural representation of I insulation ring body in the present invention.
Fig. 1 j1 is the structural representation of J electric field ring plate in the present invention.
Fig. 1 j2 is the structural representation of J insulation ring body in the present invention.
Fig. 1 k1 is the structural representation of K electric field ring plate in the present invention.
Fig. 1 k2 is the structural representation of K insulation ring body in the present invention.
Fig. 1 l1 is the structural representation of L electric field ring plate in the present invention.
Fig. 1 l2 is the structural representation of L insulation ring body in the present invention.
Fig. 1 m1 is the structural representation of M electric field ring plate in the present invention.
Fig. 1 m2 is the structural representation of M insulation ring body in the present invention.
Fig. 1 n1 is the structural representation of N electric field ring plate in the present invention.
Fig. 1 n2 is the structural representation of N insulation ring body in the present invention.
Fig. 1 o1 is the structural representation of O electric field ring plate in the present invention.
Fig. 1 o2 is the structural representation of O insulation ring body in the present invention.
Fig. 1 p1 is the structural representation of P electric field ring plate in the present invention.
Fig. 1 p2 is the structural representation of P insulation ring body in the present invention.
Fig. 1 q1 is the structural representation of Q electric field ring plate in the present invention.
Fig. 1 q2 is the structural representation of Q insulation ring body in the present invention.
Fig. 1 r1 is the structural representation of R electric field ring plate in the present invention.
Fig. 1 r2 is the structural representation of R insulation ring body in the present invention.
Fig. 2 is the operation principle schematic diagram of electric field potential gradient generating means of the present invention.
Fig. 3 is the control circuit principle schematic of electric field potential gradient generating means of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described.
See Fig. 1 and Fig. 3, which show the main composition of each unit of electric field potential gradient generating means and interrelated.1 is ion generation system, can adopt radioactive source, corona discharge source, electrospray ionization source or photoionization source etc. in the present embodiment, has the function producing ion current, is not particularly limited at this.Signal processing system 58 is signal processing system when the present invention accesses sophisticated analytical instruments, is not particularly limited at this.21 is ion generation system 1 and interface of the present invention, and as shown in Figure 1a, 211 is edge on binding ring, closely cooperates with ion generation system 1.212 is edge under binding ring, closely cooperates with electric field potential gradient generating means of the present invention.Ion current passes through from middle circular hole under electric field force effect.In the ordinary course of things, atomic weight unit is the cluster ion of 14 ~ 500, and when moving in the electric field of 150V/cm ~ 300V/cm, migration rate, generally between 1m/s ~ 10m/s, calculates migration rate COEFFICIENT K at 0.8cm with this
2/ VS ~ 2.4cm
2between/VS.The multi-disc electric field ring plate structure adopted in the present embodiment is identical, and the multi-disc dead ring body structure of employing is identical.Electric field ring plate is one with insulation ring body and combines, and under Circuits System controls, the electric potential gradient △ U that upper and lower two panels electric field ring plate is formed is identical, therefore, can produce uniform uniform electric field in overall structure.Adopt 2700V ~ 3600V high pressure in the present embodiment, △ U is between 150V ~ 200V.
See Fig. 1 a1 and Fig. 1 a2, form A electric potential gradient unit.22 is A electric field ring plate, and 23 is A insulation ring body.221 is A electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.222 is lead end, is connected with the D1 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control A electric potential gradient unit, makes it produce uniform electric field.A insulation ring body 23 adopts tetrafluoroethene material, and 233 is lead-in wire end slot, and A electric field ring plate lead end 222 passes through from here, and 231 is edge on binding ring, closely cooperates along 212 with under binding ring.232 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 b1 and Fig. 1 b2, form B electric potential gradient unit.24 is B electric field ring plate, and 25 is B insulation ring body.241 is B electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.242 is lead end, is connected with the D2 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control B electric potential gradient unit, makes it produce uniform electric field.B insulation ring body 25 adopts tetrafluoroethene material, and 253 is lead-in wire end slot, and B electric field ring plate lead end 242 passes through from here, and 251 is edge on binding ring, closely cooperates along 232 with under binding ring.252 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 c1 and Fig. 1 c2, form C electric potential gradient unit.26 is C electric field ring plate, and 27 is B insulation ring body.261 is C electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.262 is lead end, is connected with the D3 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control C electric potential gradient unit, makes it produce uniform electric field.C insulation ring body 27 adopts tetrafluoroethene material.273 is lead-in wire end slot, and C electric field ring plate lead end 262 passes through from here, and 271 is edge on binding ring, closely cooperates along 252 with under binding ring.272 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 d1 and Fig. 1 d2, form D electric potential gradient unit.28 is D electric field ring plate, and 29 is D insulation ring body.281 is D electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.282 is lead end, is connected with the D4 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control D electric potential gradient unit, makes it produce uniform electric field.D insulation ring body 29 adopts tetrafluoroethene material.293 is lead-in wire end slot, and D electric field ring plate lead end 282 passes through from here, and 291 is edge on binding ring, closely cooperates along 272 with under binding ring.292 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 e1 and Fig. 1 e2, form E electric potential gradient unit.30 is E electric field ring plate, and 31 is E insulation ring body.301 is E electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.302 is lead end, is connected with the D5 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control E electric potential gradient unit, makes it produce uniform electric field.E insulation ring body 31 adopts tetrafluoroethene material.313 is lead-in wire end slot, and E electric field ring plate lead end 302 passes through from here, and 311 is edge on binding ring, closely cooperates along 292 with under binding ring.312 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 f1 and Fig. 1 f2, form F electric potential gradient unit.32 is F electric field ring plate, and 33 is F insulation ring body.321 is F electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.322 is lead end, is connected with the D6 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control F electric potential gradient unit, makes it produce uniform electric field.F insulation ring body 33 adopts tetrafluoroethene material.333 is lead-in wire end slot, and F electric field ring plate lead end 322 passes through from here, and 331 is edge on binding ring, closely cooperates along 312 with under binding ring.332 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 g1 and Fig. 1 g2, form G electric potential gradient unit.34 is G electric field ring plate, and 35 is F insulation ring body.341 is G electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.342 is lead end, is connected with the D7 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control G electric potential gradient unit, makes it produce uniform electric field.F insulation ring body 35 adopts tetrafluoroethene material.353 is lead-in wire end slot, and G electric field ring plate lead end 342 passes through from here, and 351 is edge on binding ring, closely cooperates along 332 with under binding ring.352 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 h1 and Fig. 1 h2, form H electric potential gradient unit.36 is H electric field ring plate, and 37 is H insulation ring body.361 is H electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.362 is lead end, is connected with the D8 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control H electric potential gradient unit, makes it produce uniform electric field.H insulation ring body 37 adopts tetrafluoroethene material.373 is lead-in wire end slot, and H electric field ring plate lead end 362 passes through from here, and 371 is edge on binding ring, closely cooperates along 352 with under binding ring.372 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 i1 and Fig. 1 i2, form I electric potential gradient unit.38 is I electric field ring plate, and 39 is I insulation ring body.381 is I electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.382 is lead end, is connected with the D9 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control I electric potential gradient unit, makes it produce uniform electric field.I insulation ring body 39 adopts tetrafluoroethene material.393 is lead-in wire end slot, and I electric field ring plate lead end 382 passes through from here, and 391 is edge on binding ring, closely cooperates along 372 with under binding ring.392 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 j 1 and Fig. 1 j2, form J electric potential gradient unit.40 is J electric field ring plate, and 41 is J insulation ring body.401 is J electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.402 is lead end, is connected with the D10 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control J electric potential gradient unit, makes it produce uniform electric field.J insulation ring body 41 adopts tetrafluoroethene material.413 is lead-in wire end slot, and J electric field ring plate lead end 402 passes through from here, and 411 is edge on binding ring, closely cooperates along 392 with under binding ring.412 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 k1 and Fig. 1 k2, form K electric potential gradient unit.42 is K electric field ring plate, and 43 is K insulation ring body.421 is K electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.422 is lead end, is connected with the D11 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control K electric potential gradient unit, makes it produce uniform electric field.K insulation ring body 43 adopts tetrafluoroethene material.433 is lead-in wire end slot, and K electric field ring plate lead end 422 passes through from here, and 431 is edge on binding ring, closely cooperates along 412 with under binding ring.432 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 l1 and Fig. 1 l2, form L electric potential gradient unit.44 is L electric field ring plate, and 45 is K insulation ring body.441 is L electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.442 is lead end, is connected with the D12 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control L electric potential gradient unit, makes it produce uniform electric field.L insulation ring body 45 adopts tetrafluoroethene material.453 is lead-in wire end slot, and L electric field ring plate lead end 442 passes through from here, and 451 is edge on binding ring, closely cooperates along 432 with under binding ring.452 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 m1 and Fig. 1 m2, form M electric potential gradient unit.46 is M electric field ring plate, and 47 is M insulation ring body.461 is M electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.462 is lead end, is connected with the D13 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control M electric potential gradient unit, makes it produce uniform electric field.M insulation ring body 47 adopts tetrafluoroethene material.473 is lead-in wire end slot, and M electric field ring plate lead end 462 passes through from here, and 471 is edge on binding ring, closely cooperates along 452 with under binding ring.472 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 n1 and Fig. 1 n2, form N electric potential gradient unit.48 is N electric field ring plate, and 49 is N insulation ring body.481 is N electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.482 is lead end, is connected with the D14 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control N electric potential gradient unit, makes it produce uniform electric field.N insulation ring body 49 adopts tetrafluoroethene material.493 is lead-in wire end slot, and N electric field ring plate lead end 482 passes through from here, and 491 is edge on binding ring, closely cooperates along 472 with under binding ring.492 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 o1 and Fig. 1 o2, form O electric potential gradient unit.50 is O electric field ring plate, and 51 is O insulation ring body.501 is O electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.502 is lead end, is connected with the D15 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control O electric potential gradient unit, makes it produce uniform electric field.O insulation ring body 51 adopts tetrafluoroethene material.513 is lead-in wire end slot, and O electric field ring plate lead end 502 passes through from here, and 511 is edge on binding ring, closely cooperates along 492 with under binding ring.512 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 p1 and Fig. 1 p2, form P electric potential gradient unit.52 is P electric field ring plate, and 53 is P insulation ring body.521 is P electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.522 is lead end, is connected with the D16 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control P electric potential gradient unit, makes it produce uniform electric field.P insulation ring body 53 adopts tetrafluoroethene material.533 is lead-in wire end slot, and P electric field ring plate lead end 522 passes through from here, and 531 is edge on binding ring, closely cooperates along 512 with under binding ring.532 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 q1 and Fig. 1 q2, form Q electric potential gradient unit.54 is Q electric field ring plate, and 55 is Q insulation ring body.541 is Q electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.542 is lead end, is connected with the D17 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control Q electric potential gradient unit, makes it produce uniform electric field.Q insulation ring body 55 adopts tetrafluoroethene material.553 is lead-in wire end slot, and Q electric field ring plate lead end 542 passes through from here, and 551 is edge on binding ring, closely cooperates along 532 with under binding ring.552 is edge under binding ring.Ion current passes through from middle circular hole under electric field force effect.
See Fig. 1 r1 and Fig. 1 r2, form R electric potential gradient unit.56 is R electric field ring plate, and 57 is R insulation ring body.561 is R electric field ring plate substrate, provides uniform electric field that ion current is moved from middle circular hole along direction of an electric field under high potential effect.562 is lead end, is connected with the D18 place of electric field unit in circuit control system 59, produces electric field by providing high potential herein.The electric potential gradient of circuit control system 59 control R electric potential gradient unit, makes it produce uniform electric field.R insulation ring body 57 adopts tetrafluoroethene material.573 is lead-in wire end slot, and R electric field ring plate lead end 562 passes through from here, and 571 is edge on binding ring, closely cooperates along 552 with under binding ring.572 is edge under binding ring, closely cooperates with signal processing system 58.Ion current passes through entering signal treatment system 58 from middle circular hole under electric field force effect, obtains the information of material to be detected after signal processing system 58 processes.
See Fig. 2, under the effect of circuit control system 59, ion generation system 1 is opened, and produces photon stream and enters electric field potential gradient generation module, entering signal treatment system 58 under the effect of electric field force.Circuit control system 59 controls whole process.
See Fig. 3, it illustrates the operation principle of circuit control system 59 of the present invention.First, containing power subsystem, for circuit control system 59 provides power supply; Then, containing electric field unit, complete the control procedure of electric field potential gradient.Whole controlled process in microprocessor unit, and can be set by push-button unit, shows in liquid crystal display.Microprocessor unit adopts the LPC2138 series of ARM, 32 risc architecture 512Kflash.This circuit is only a kind of physical circuit connected mode realizing aforementioned function, not as the restriction connected other possibility circuit.
Claims (3)
1. an electric field potential gradient generating means, is characterized in that, this device comprises electric field potential gradient generation module, ion generation system and signal processing system, and described ion generation system produces ion current; Described electric field potential gradient generation module is made up of multiple electric field ring plate and multiple insulation ring body, described multiple electric field ring plate is made up of the identical metal ring plate of structure, described multiple insulation ring body is made up of the identical insulating material of structure, multiple insulation ring body isolates multiple electric field ring plate, equal potential difference is applied between two electric field ring plates, whole electric field potential gradient generation module produces uniform electric field, ion current to move acquisition constant speed along direction of an electric field, thus can calculate the flight time of ion current; Described signal processing system adopts the signal processing system of sophisticated analytical instruments, generates the information of tested substance.
2. a kind of electric field potential gradient generating means as claimed in claim 1, is characterized in that, described ion generation system is radioactive source or corona discharge source or electrospray ionization source or photoionization source.
3. the control method of a kind of electric field potential gradient generating means as claimed in claim 1, it is characterized in that, the method comprises the steps:
Ion generation system is opened, and produces ion current and enters electric field potential gradient generation module;
Microprocessor unit is given between every two electric field ring plates by electric field unit and is applied equal potential difference, makes electric field potential gradient generation module produce uniform electric field;
Ion current is moved into signal processing system along direction of an electric field under the effect of uniform electric field power.
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| CN201410782447.9A CN104599919A (en) | 2014-12-16 | 2014-12-16 | Electric field potential gradient generation device and control method thereof |
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| CN201410782447.9A CN104599919A (en) | 2014-12-16 | 2014-12-16 | Electric field potential gradient generation device and control method thereof |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100065740A1 (en) * | 2007-04-12 | 2010-03-18 | Shimadzu Corporation | Ion trap mass spectromter |
| CN103871820A (en) * | 2012-12-10 | 2014-06-18 | 株式会社岛津制作所 | Ion mobility analyzer and combination unit thereof and ion mobility analysis method |
-
2014
- 2014-12-16 CN CN201410782447.9A patent/CN104599919A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100065740A1 (en) * | 2007-04-12 | 2010-03-18 | Shimadzu Corporation | Ion trap mass spectromter |
| CN103871820A (en) * | 2012-12-10 | 2014-06-18 | 株式会社岛津制作所 | Ion mobility analyzer and combination unit thereof and ion mobility analysis method |
Non-Patent Citations (2)
| Title |
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| 刘欣: "《用于离子迁移色谱仪的负电晕放电电子源的研究》", 《中国博士学位论文全文数据库 工程科技Ⅱ辑》 * |
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