CN104575698B - Transparent conductive film structure - Google Patents

Transparent conductive film structure Download PDF

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CN104575698B
CN104575698B CN201310467701.1A CN201310467701A CN104575698B CN 104575698 B CN104575698 B CN 104575698B CN 201310467701 A CN201310467701 A CN 201310467701A CN 104575698 B CN104575698 B CN 104575698B
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substrate
transparency conducting
nano
conducting layer
microns
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CN104575698A (en
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刘西湖
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Plasmag Tech Inc
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Plasmag Tech Inc
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Abstract

The present invention discloses a kind of transparent conductive film structure, including a substrate and a transparency conducting layer, and transparency conducting layer is arranged on the surface of the substrate, and the substrate can be glass substrate or plastic base.Multiple nano-silver threads and multiple conducting polymer particles are dispersed with inside the transparency conducting layer of the present invention, respectively the length of the nano-silver thread is staggered between 10 microns to 70 microns and along in-plane, which is PEDOT:PSS.The transparent conductive film structure of the present invention has the surface resistance less than 100 Ω/ and the light transmittance higher than 87%, can solve the problems, such as the prior art decline of light transmittance and extension of manufacturing time caused by due to must have in twice the technique of film in manufacturing process.

Description

Transparent conductive film structure
Technical field
The present invention relates to a kind of structure of transparent conductive film, especially a kind of transparent conductive film applied to touch panel Structure.
Background technology
Scientific development is at a tremendous pace, and many mobile electronic devices are not only increasingly light and short, and the function having also is cured Come more complicated thus also more and more high to the requirement of the endurance of battery.Especially smartphone and tablet computer be in recent years A burst of sale whirlwind is swept in 3C consumer electronics markets, almost has become electronic product indispensable in modern life.
Light and short in order to pursue, many electronic devices are given up keyboard and are changed using touch-controlling interface, to reduce because using Volume caused by keyboard increases.And the use of the most common mode of touch-controlling interface is to use touch panel, especially with throwing Penetrate capacitance type touch-control panel.
For projected capacitive touch panel, electrode must be formed using transparent conductive film, and transparent electricity It is ITO (Indium Tin Oxide, tin indium oxide) to lead the most-often used material of film.
The surface resistance value of traditional ito thin film simultaneously can not accomplish still to possess 87% less than 100 Ω/ on deflection ground The above light transmittance, if in order to allow the surface resistance value of ITO to increase its thickness less than 100 Ω/, ITO layer at this time is in addition to saturating Light rate can will be low outer, it is easier to cracking occur and impracticable.
In the various alternative materials of the ITO of industry research and development at present, with the metal grill made by nanometer silver granuel or copper particle Based on (Metal Mesh), nano-sized carbon tube layer or nano-silver thread etc..Wherein under the dual consideration of conductivity and light transmittance, gold It is the research and development mainstream in current alternative materials to belong to grid and nano-silver thread.
Fig. 1 is please referred to, a kind of conductive film 9 of the prior art using metal grill or nano-silver thread is disclosed, it includes Substrate 91, metal grill or nano-silver thread layer 92 and protective layer 93.Using metal grill or nano-silver thread layer 92 as touch-control One of panel characteristic must exactly be further formed protective layer 93 to protect metal grill or nano-silver thread layer 92.The guarantor Sheath 93 is made of the chemicals to acid or alkaline matter insensitiveness, example acryl, is not had electric conductivity usually therefore to be measured The surface resistance of metal grill or nano-silver thread layer 92 is just less susceptible to, and non-general existing four-point probe can measure easily, need to change With (probe needs coarseer especially) compared with specific apparatus.In addition the problem of metal grill method is that mist degree (haze) is excessively high, often More than 2.5%, the demand less suitable for touch panel to mist degree, therefore application is upper just toward area of solar cell development.
Although being can reach by the way of nano-silver thread layer less than 100 Ω/, even lower than 50 Ω/, this kind of material Layer protective layer must be further arranged on the layer in method, the technique for causing to have film in twice in manufacturing process, no The decline of light transmittance is only caused to also result in the extension of manufacturing time, cost increases.
Therefore, if the surface resistance by the conductive film of touch panel is needed to decrease below 100 Ω/, while light transmission Rate must reach 87% or more again, and membrane process in twice is not needed in the manufacturing process of conductive film, and the prior art has no Method meets its demand.
Invention content
It is an object of the invention to propose a kind of structure of transparent conductive film, the prior art is solved because must in manufacturing process Must have the technique of film in twice and caused by light transmittance decline and manufacturing time extension the problem of.
To achieve the above object, the present invention proposes a kind of structure of transparent conductive film, including a substrate and an electrically conducting transparent Layer, wherein substrate can be plastic base or glass substrate, and transparency conducting layer is set to the surface of substrate, is wrapped in transparency conducting layer Contain carrier, multiple nano-silver threads and multiple conducting polymer particles.The length of the nano-silver thread is at 10 microns to 70 microns Between and be staggered along in-plane, the conducting polymer particle is PEDOT:PSS particles (poly- 3,4- dioxoethyls thiophene Pheno/polystyrolsulfon acid particle), the nano-silver thread is distributed in the conducting polymer uniform particle in carrier.
In one of the structure of transparent conductive film of present invention concept, nano-silver thread and the conduction of transparency conducting layer The weight ratio of both polymer particles is 1:1 to 7:Between 1 range.
In one of the structure of transparent conductive film of present invention concept, using the total weight of transparency conducting layer as base Plinth, the content of nano-silver thread is in 0.5 weight percent between the range of 3.0 weight percent.
In one of the structure of transparent conductive film of present invention concept, substrate is pet substrate (poly terephthalic acid Second diester substrate), thickness is between 25 microns to 200 microns.
In one of the structure of transparent conductive film of present invention concept, substrate is glass substrate, and thickness is micro- 50 Rice is between 4000 microns.
In one of the structure of transparent conductive film of present invention concept, the thickness of the transparency conducting layer is micro- 0.02 Rice is between 0.5 micron.
In one of the structure of transparent conductive film of present invention concept, a conductive protecting layer is further included, is set to The surface of the transparency conducting layer.
In one of the structure of transparent conductive film of present invention concept, the conductive protecting layer includes PEDOT: PSS conducting polymers particle (poly- 3,4- ethylenedioxythiophenes/polystyrolsulfon acid conducting polymer particle), carbon nanotubes or stone Black alkene, the i.e. conductive protecting layer can include PEDOT:PSS conducting polymers particle, carbon nanotubes or graphene etc. are any Material, and the material is scattered in the conductive protecting layer.
In one of the structure of transparent conductive film of present invention concept, the transparency conducting layer further includes nano-sized carbon Pipe or graphene, i.e. transparency conducting layer more can include any material such as carbon nanotubes or graphene, and the material divides It dissipates in the transparency conducting layer.
To sum up, it is combined with nano-silver thread by by conducting polymer particle, transparent conductive film knot proposed by the invention The surface resistance of the transparency conducting layer of structure can decrease below 100 Ω/, while light transmittance can reach 87% or more, and mist degree can 2.5% hereinafter, solving variety of problems possessed by the prior art.In addition, it is only necessary to which the process of upper film can be completed transparent together The manufacture of conducting membrane structure.
Below in conjunction with the drawings and specific embodiments, the present invention will be described in detail, but not as a limitation of the invention.
Description of the drawings
Fig. 1 is the cross-sectional view of the prior art.
Fig. 2 is the cross-sectional view of the first embodiment of the present invention.
Fig. 3 is the cross-sectional view of the second embodiment of the present invention.
Wherein, reference numeral:
1 structure of transparent conductive film
11 substrates
12 transparency conducting layers
121 carriers
122 nano-silver threads
123 conducting polymer particles
13 conductive protecting layers
2 structure of transparent conductive film
9 conductive films
91 substrates
92 metal net layers
93 protective layers.
Specific implementation mode
Fig. 2 is please referred to, for the cross-sectional view of the specific embodiment of the present invention, discloses a transparent conductive film knot Structure 1 includes mainly a substrate 11 and a transparency conducting layer 12.In the present embodiment, substrate 11 is PET materials, electrically conducting transparent Layer 12 is set to the surface of substrate 11, includes carrier 12 1, multiple nano-silver threads 122 and multiple conductions in transparency conducting layer 12 Polymer particles 123.
In the present embodiment, the used nano-silver thread 122 produced by Cambrios companies, length is at 10 microns To between 70 microns, diameter is between 10 nanometers to 60 nanometers, and in being staggered in the horizontal direction on the surface of substrate 11.
The high molecular material for having electric conductivity is various, such as polyacetylene (Polyacetylene), polyaniline (Polyaniline) and polypyrrole (Polypyrrole), poly- pheno (Polythiophene) etc..However it is led in touch panel Domain, it is still necessary to consider the characteristic of light transmittance and highly conductive degree, thus most widely used conducting polymer composite is on the market at present Poly (3,4-ethylenedioxythiophene)-PEDOT (poly- 3,4- ethylenedioxythiophenes) of poly- pheno system, product is mostly with mixed Exist with the mode of the aqueous solution of Polystyrenesulfonic acid-PSS (polystyrolsulfon acid).The present embodiment is used Conducting polymer particle 123 be the PEDOT that is produced of Heraeus companies:PSS conducting polymer composites, conductivity can Up to 1000S.cm.
The conductive layer of the present embodiment includes the compound of nano-silver thread 122 and conducting polymer particle 123 simultaneously, only needs one The process of film can form surface resistance less than 100 Ω/ on the substrate 11 on road, and mist degree is less than 2.5% or less and light transmittance is high In 87% transparent conductive film layer 12.And the present embodiment is applicable to production procedure (the roll-to-roll production of Roll to Roll Flow), contribute to mass production.
The manufacturing method of the structure of transparent conductive film of the present invention further explained below.
One, the selection of substrate
Substrate, which can be glass substrate either plastic base, plastic base, can select to use PET materials.PET base material It must consider to be avoided that PET film face scratches in coating process, therefore PET is easier to scratch face and has Hard-coat films (cured film) Protector Preferably.
Furthermore it must consider the adherence with conducting polymer coating fluid, therefore selecting has the PET person of priming paint (primer) preferable.
In addition, it is still necessary to consider that the penetrability of its light of applying conductive macromolecule PET film could reach>87%.
The PET base material (model FE-PET, RHPA0) of Far East New Era Company is through light peneration (Transmittance) Measurement has 91%, in addition the also PET base material of Mitsubishi, can all meet above-mentioned characteristic.
Two, the formulation selection of waterborne conductive liquid
It is as follows according to material property component design one:
Note:Assistant director of a film or play's agent (DMSO, EG) i.e. assistant director of a film or play's agent (dimethyl sulfoxide (DMSO), ethylene glycol)
An obtained conductive material solution coating will be formulated on pet substrate, wet film film thickness is 12.31 to 13.85 micro- Rice takes out cooling then after 110 DEG C of baking ovens toast 3 minutes, and carry out electrically with the test of light transmittance.
Formula one is the original formulation of the present invention, is higher than 200 according to the surface resistance value of the conductive film made by formula one Ω/□.After the adjustment for carrying out each ingredient based on formula one, surface resistance value can be reduced to 100 Ω/ hereinafter, but still having The problems such as irregular colour and uneven film thickness, makes whole light transmittance be only capable of reaching 82%.
After further attempting to add suitable thermal stabilizer Ciba123DW and UV absorbents Ciba477DW, successfully To the transparent conductive film of 100 Ω of surface resistance value/ or less and 87% or more light transmittance, improved based on formula one Formula two is as follows:
Using the structure of transparent conductive film made by formula two, when the thickness of dry film of transparency conducting layer 12 is micro- between 0.2 When rice is between 0.6 micron, whole light transmittance can reach 87% or more, and the surface resistance value of conductive layer can be less than 100 Ω/ □。
To sum up, the structure of transparent conductive film 1 of the present embodiment by simultaneously use conducting polymer 123 and nano-silver thread 122, when the thickness of dry film of transparent conductive film 12 is when between 0.2 micron to 0.6 micron, with 87% or more light transmittance with And the surface resistance less than 100 Ω/.In addition, also only needing upper membrane process together during fabrication, touch panel not only may conform to Performance requirement, it helps mass production.
Fig. 3 is please referred to, is the cross-sectional view of the second embodiment of the present invention, discloses a kind of transparent conductive film knot Structure 2.The main difference of the present embodiment and first embodiment is to further include a conductive protecting layer 13, is set to transparent conductive film 12 surface is mainly used to further ensure that the nano-silver thread 122 in transparent conductive film 12 will not be by follow-up touch surface template die The acid or alkali of the etch process of block are corroded, and surface resistance value is caused to increase.In addition, compared to conventional touch panel protective layer by Isolation material is made, and the conductive protecting layer 13 of the present embodiment is due to electrical conductivity, can be used four-point probe instrument straight The surface resistance value measured to conducting membrane structure 2 is connect, the convenience of product test is improved.Conductive protecting layer 13 does not include nano silver Line, but include PEDOT:PSS conducting polymers particle, carbon nanotubes or graphene or other similar conductive materials.
Certainly, the present invention can also have other various embodiments, without deviating from the spirit and substance of the present invention, ripe Various corresponding change and deformations, but these corresponding change and deformations can be made according to the present invention by knowing those skilled in the art The protection domain of the claims in the present invention should all be belonged to.

Claims (6)

1. a kind of structure of transparent conductive film is made of a substrate and a transparency conducting layer, it is characterised in that:
The transparency conducting layer is set to the surface of the substrate, which is waterborne conductive liquid, is by carrier, Duo Gena Rice silver wire is formed with multiple conducting polymer particles, which includes water-base resin, solvent and wetting agent, the nano-silver thread Length is staggered between 10 microns to 70 microns and along in-plane, which is poly- 3,4- dioxies second Base thiophene/polystyrolsulfon acid particle, the nano-silver thread are distributed in the conducting polymer uniform particle in the carrier;The nanometer Silver wire and the weight ratio of the conducting polymer particle are 1:1 to 7:Between 1 range;Using the total weight of the transparency conducting layer as base Plinth, the content of the nano-silver thread is in 0.5 weight percent between the range of 3.0 weight percent;The thickness of the transparency conducting layer Degree is between 0.02 micron to 0.5 micron.
2. a kind of structure of transparent conductive film is made of, feature a substrate, a transparency conducting layer and a conductive protecting layer It is:The conductive protecting layer is set to the surface of the transparency conducting layer;And
The transparency conducting layer is set to the surface of the substrate, which is waterborne conductive liquid, is by carrier, Duo Gena Rice silver wire is formed with multiple conducting polymer particles, which includes water-base resin, solvent and wetting agent, the nano-silver thread Length is staggered between 10 microns to 70 microns and along in-plane, which is poly- 3,4- dioxies second Base thiophene/polystyrolsulfon acid particle, the nano-silver thread are distributed in the conducting polymer uniform particle in the carrier;The nanometer Silver wire and the weight ratio of the conducting polymer particle are 1:1 to 7:Between 1 range;Using the total weight of the transparency conducting layer as base Plinth, the content of the nano-silver thread is in 0.5 weight percent between the range of 3.0 weight percent;The thickness of the transparency conducting layer Degree is between 0.02 micron to 0.5 micron.
3. a kind of structure of transparent conductive film is made of, feature a substrate, a transparency conducting layer and a conductive protecting layer It is:The conductive protecting layer is set to the surface of the transparency conducting layer, and the conductive protecting layer includes poly- 3,4- dioxoethyls thiophene Pheno/polystyrolsulfon acid conducting polymer particle, carbon nanotubes or graphene;And
The transparency conducting layer is set to the surface of the substrate, which is waterborne conductive liquid, is by carrier, Duo Gena Rice silver wire is formed with multiple conducting polymer particles, which includes water-base resin, solvent and wetting agent, the nano-silver thread Length is staggered between 10 microns to 70 microns and along in-plane, which is poly- 3,4- dioxies second Base thiophene/polystyrolsulfon acid particle, the nano-silver thread are distributed in the conducting polymer uniform particle in the carrier;The nanometer Silver wire and the weight ratio of the conducting polymer particle are 1:1 to 7:Between 1 range;Using the total weight of the transparency conducting layer as base Plinth, the content of the nano-silver thread is in 0.5 weight percent between the range of 3.0 weight percent;The thickness of the transparency conducting layer Degree is between 0.02 micron to 0.5 micron.
4. structure of transparent conductive film as described in any one of claims 1 to 3, it is characterised in that:The substrate is poly- to benzene two Formic acid diethylester substrate, thickness is between 25 microns to 200 microns of range.
5. structure of transparent conductive film as described in any one of claims 1 to 3, it is characterised in that:The substrate is glass substrate, Thickness is between 50 microns to 4000 microns of range.
6. structure of transparent conductive film as described in any one of claims 1 to 3, it is characterised in that:The carrier further includes heat Stabilization agent and UV absorbents.
CN201310467701.1A 2013-10-09 2013-10-09 Transparent conductive film structure Active CN104575698B (en)

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CN104861776A (en) * 2015-06-02 2015-08-26 北京化工大学 Anti-settling and self-leveling silver nanowire conductive printing ink and method for preparing transparent conducting thin film by using same
CN105259715A (en) * 2015-11-20 2016-01-20 深圳市华星光电技术有限公司 Patterned electrode manufacturing method, liquid crystal display panel and liquid crystal display panel manufacturing method
CN106683790A (en) * 2016-12-02 2017-05-17 天津宝兴威科技股份有限公司 Preparation method of novel nano-silver conductive thin film
CN106782771A (en) * 2016-12-02 2017-05-31 天津宝兴威科技股份有限公司 A kind of novel nanometer silver composite conductive thin film
CN106775133B (en) 2017-03-27 2020-03-03 上海天马有机发光显示技术有限公司 Flexible touch display panel and flexible touch display device
CN109031812B (en) * 2018-08-14 2021-05-04 合肥微晶材料科技有限公司 Special flexible transparent conductive film for handwriting board and flexible handwriting film based on same
CN110070965A (en) * 2019-03-26 2019-07-30 天津大学 A kind of multi-layer-structure transparent conductive film and preparation method thereof
CN110305353A (en) * 2019-06-06 2019-10-08 华南理工大学 Starch base bottom AgNW/PEDOT flexible conductive film and preparation method thereof
CN110267406A (en) * 2019-06-27 2019-09-20 湖南纳昇印刷电子科技有限公司 A kind of ultrathin flexible EL sheet and preparation method thereof
CN115129174A (en) * 2021-03-26 2022-09-30 宸鸿科技(厦门)有限公司 Touch control element and display device comprising same

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