CN104526929A - Wafer lens array mold with moth eye imitative random array nanometer sunken structures and preparation method of wafer lens array mold - Google Patents
Wafer lens array mold with moth eye imitative random array nanometer sunken structures and preparation method of wafer lens array mold Download PDFInfo
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- CN104526929A CN104526929A CN201510010087.5A CN201510010087A CN104526929A CN 104526929 A CN104526929 A CN 104526929A CN 201510010087 A CN201510010087 A CN 201510010087A CN 104526929 A CN104526929 A CN 104526929A
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Abstract
The invention relates to a wafer lens array mold with moth eye imitative random array nanometer sunken structures and a preparation method of the wafer lens array mold. The wafer lens array mold is made of a silicon material or a germanium material, and micro-lens sunken curved surface section molds are evenly distributed on the surface of the mold and form an array; the moth eye imitative random array nanometer sunken structure is distributed on the surface of each sunken curved surface section mold, the sizes and the adjacent intervals of the nanometer sunken structures are distributed at random, the bottom diameter of the nanometer sunken structures ranges from 10 nm to 100 nm, the top diameter of the nanometer sunken structures ranges from 50 nm to 300 nm, the center interval of every two adjacent nanometer sunken structures ranges from 100 nm to 500 nm, and the height of the nanometer sunken structures ranges from 100 nm to 1500 nm; a two-dimensional random array moth eye imitative nanometer convex structure is arranged on the surface of each polymer material wafer micro-lens prepared through the wafer lens array molds in batches, the broadband spectrum anti-reflection effect of visible light wavebands can be achieved without plating anti-reflection films, and the technological process is greatly simplified.
Description
Technical field
The present invention relates to a kind of mould processing wafer lens array sheet, be specifically related to a kind of wafer lens arra mould with imitative moth eye random array nm recesses structure and preparation method thereof.
Background technology
Wafer optical lens array sheet refers to the optical microlens processing some in a plane wafer substrate according to specific array arrangement form, and lens material can be optical grade polymeric material, also can be optical glass material.
Recently, the most promising technology that wafer optical camera (Wafer Level Camera, WLC) manufactures as low cost mobile phone camera of future generation by main mobile phone vendor commercial city.Wafer optical camera refers to, lens subassembly manufactures on 2 cun-8 cun optics wafers, optics wafer and cmos image sensor wafer is stacked afterwards, finally this stacking wafer is cut into thousands of minisize pick-up head module.Nearly all large-scale camera vendor all uses WLC solution in consideration.The concept of WLC has the potentiality of reduction manufacture and packaging cost, can also improve quality further by manual work step is replaced with full-automatic wafer level processes step.
WLC solution is applied by numerous producer, but also there is some technical barriers, and wherein anti-reflection is exactly a major issue.The processing of wafer lens arra is the main technique link of wafer optical camera module optical mirror slip processing.Wafer lens arra mainly through based on the mould with lens face type reprint or the way such as impression is processed.Owing to comprising multiple logical optical lens face in miniature video camera module, in order to ensure the optical transmittance of whole imaging system, the reflectivity of each lens face must be strict controlled in less than 1%.Therefore, wafer lens arra reprint process after must plate anti-reflection film to improve optical transmittance.Because 8 cun of array lens sheet thickness are thin, area is comparatively large, in plating anti-reflection film process, easily occur the situations such as buckling deformation.Once generation warpage, wafer array lens sheet will not reach alignment precision in follow-up stacking Alignment Process flow process, cause waste product to occur.In addition, traditional sucrose anti-reflection film, due to different with lens material hot expansibility, also has difficulties in subsequent reflow weldering process, in addition the high transmittance anti-reflection film also more complicated of the large spectral region of Large visual angle.
Imitative moth eye nanostructured is proved the antireflection effect that can be implemented in wide spectral range by theory and practice.Imitative moth eye nano thread structure, utilizes its great depth-to-width ratio to be limited between nano wire by light, reaches anti-reflection object, is the best nanostructured of current anti-reflection performance.The method of existing processing moth eye nanostructured mainly, utilize secondary holographic exposure and dry etching method to form imitative moth eye two-dimensional nanostructure on a planar base, utilize this planar substrates mould in heat cure or ultraviolet photocureable material, reprint the suprabasil anti-reflection nanostructured of out-of-plane afterwards.This method can only process imitative moth eye nanostructured substantially on planar substrates material.Planar substrates mould also can reprint PDMS(and gather methyl dioxy silane) etc. on flexible material, form flexible substrates mould, can be used for being formed roller cylindrical die, process two-dimensional nanostructure on a thin film substrate.
But above imitative moth eye nanometer anti-reflection structure processing method can not process the two dimension met the demands and imitate moth eye nanostructured in the curved surface face type of similar lens surface.Because curved substrate is difficult to utilize holographic exposure to form uniform two-dimensional nanostructure pattern.Especially more difficultly on wafer lens surfaces process uniform two-dimensional nanostructure pattern, because an array lens sheet exists numerous lens curved surface, exposure method is difficult to form uniform nano graph.Have the method for the direct plasma treatment of bibliographical information application surface to produce two-dimensional nanostructure at lens surfaces, but the geometric properties of the nanostructured obtained is irregular, the requirement that commercial Application realizes high-transmission rate can not be met.There is bibliographical information to utilize the metal die method of anodic oxidation reactions method manufacture with two-dimensional nanostructure of aluminum, but also only cover plane mould.The present inventor has applied for the wafer lens arra mould patent (application number: 201410630217.0) of the anodic oxidation reactions based on aluminum before this, utilize this mould directly to copy to process the wafer lens array sheet with imitative moth eye array nanostructured, do not need plating anti-reflection film to reach high-transmission rate.In certain applications occasion, there is mechanical performance not and the coefficient of expansion problem of mating as mould base material in aluminum.
Summary of the invention
The invention discloses a kind of wafer lens arra mould with imitative moth eye random array nm recesses structure based on silicon or germanium material and preparation method thereof, directly can copy the wafer lens array sheet processed with imitative moth eye random array nanostructured, as shown in Figure 1, it does not need to plate anti-reflection film, and can to reach the wide spectral of visible light wave range anti-reflection, effective reduction reflection, not only greatly simplify the technological process of wafer lens array sheet processing, and avoid medium anti-reflection film that Reflow Soldering temperature causes and to break the problem such as to come off, there is obvious real economy benefit.
Technical solution of the present invention is implemented as follows:
A kind of wafer lens arra mould with imitative moth eye random array nm recesses structure, be characterized in: described wafer lens arra mould is made by silicon or germanium material, diameter is between 2 cun ~ 8 cun, the surface of wafer lens arra mould is uniform-distribution with micro lens concave curvature pattern and the form of formation array; Described die wafer each micro lens concave curvature pattern on the surface, be distributed with imitative moth eye random array nm recesses structure, size and the adjacent spacing of nm recesses structure are random distribution, wherein: the base diameter of nm recesses structure is between 10-100nm, top diameter is between 50-300nm, the center distance of adjacent nano sunk structure is between 100-500nm, and the height of nm recesses structure is between 100-1500nm; The each polymeric material wafer micro-lens sheet adopting described wafer lens arra mould to copy to process, its surface has two-dimensional random arrays to imitate moth eye nano projection structure, and this random array nano projection structure is for reducing the optical reflection of micro-lens surface.
Described silicon or germanium material are monocrystalline silicon, monocrystalline germanium, polysilicon, polycrystalline germanium, the one in germanic chalcogenide glass material; Add the range of choice of wafer lens arra mould base material.
With a preparation method for the wafer lens arra mould of imitative moth eye random array nm recesses structure, concrete steps are as follows:
Step 1: first silicon or germanium material are processed into 2 cun of die wafers to 8 cun of diameters;
Step 2: utilize Ultraprecise polished and turning or milling, described mold work end face is processed with smooth flat and array lens curved surface shiny surface type reprint core rod, within surface smoothness reaches 10nm;
Step: 3: layer of metal or glass block are enclosed in bottom, strengthens the general thickness of mould;
Step 4: generate one deck continuous print metallic gold film or metal silverskin at described mold work end face, thickness of metal film is between 5-100nm;
Step 5: to the silicon or the germanium mould short annealing process that are coated with continuous metal film under vacuum or inert gas environment, make metallic diaphragm self-solidifying be polymerized to the nano-metal particle of random distribution, the size of nano-metal particle is between 10-100nm;
Step 6: utilize reactive ion etching system to etch with the silicon of nano-metal particle or germanium die wafer operative end surface, and reach etching depth;
Step 7: wash the metal nanoparticle remaining in silicon or germanium substrate surface with acid solution; Namely the wafer lens arra mould with imitative moth eye random array nm recesses structure is generated.
Described argent film is by following method: a kind of method in chemical silver mirror reaction, evaporation coating method, sputtering method, epitaxial growth method generates.
Described metallic gold film is by following method: evaporation coating method, sputtering method, and a kind of method in epitaxial growth method generates.
Beneficial effect of the present invention is: the wafer lens arra mould with imitative moth eye nanostructured utilizing the present invention to design, directly can go out the wafer lens with imitative moth eye nanostructured by batch duplicating, this wafer lens does not need plating anti-reflection film can reach the wide spectral of visible light wave range and reduce reflecting effect, greatly simplify the technological process of wafer lens processing, and avoid anti-reflection film that Reflow Soldering temperature causes and to break the problem such as to come off.
Accompanying drawing explanation
Fig. 1 is the wafer lens array sheet schematic diagram with imitative moth eye random array nanostructured;
Fig. 2 is the wafer lens arra mould structure schematic diagram with imitative moth eye random array nm recesses structure;
Fig. 3 is the wafer lens arra mould preparation method schematic diagram with imitative moth eye random array nm recesses structure.
1, wafer substrate, 2, micro-optical lens face, 3, random array nano projection structure, 4, mold base, 5, micro lens concave curvature pattern face, 6, imitative moth eye random array nm recesses structure.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described in detail, but embodiment is not limited to the present invention, and all employings analog structure of the present invention, method and similar change thereof, all should list protection scope of the present invention in.
The invention discloses a kind of wafer lens arra mould with imitative moth eye random array nm recesses structure based on silicon or germanium material and preparation method thereof, directly can copy the wafer lens array sheet with imitative moth eye random array nanostructured, as shown in Figure 1.In the wafer substrate 1 of described wafer lens array sheet; Multiple micro-optical lens face 2 is had according to certain array distribution; Each micro-optical lens face 2 is distributed with again random array nano projection structure 3, the nanostructured on the similar moth eye of this random array nano projection structure, there is the function of the light reflection reducing optical lens face.Namely the wafer lens array sheet with imitative moth eye random array nanostructured in Fig. 1 has the high-transmission rate in wide spectral when not plating anti-reflection film, can directly apply to camera module group assembling.
A kind of wafer lens arra mould with imitative moth eye random array nm recesses structure disclosed by the invention, structure as shown in Figure 2.Described mold base 4 is silicon or the germanium material wafer of a kind of 2 cun to 8 cun, be dispersed with multiple micro lens concave curvature pattern face 5 in its surface in the form of an array, this wafer form is suitable for the batch production manufacture of polymer micro lens, and the encapsulation process of support wafer rank.Here silicon or germanium material can be monocrystalline silicon or monocrystalline germanium, also can be polysilicon or polycrystalline germanium, also can be germanic chalcogenide glass material, as GeAsSe and GeSeTe, which increase the range of choice of wafer lens arra mould base material, expand the actual adaptability of this kind of mould.This type of material is relatively applicable to being produced by Ultra-precision Turning mode.Be distributed with imitative moth eye random array nm recesses structure 6 on the surface at each micro lens concave curvature pattern of described mould, look down from perpendicular to surface direction, size and the adjacent spacing of nm recesses structure are random distribution.The bottommost diameter of nm recesses structure is between 10-100nm generally, and top diameter is between 50-300nm, and the center distance of adjacent nano sunk structure is between 100-500nm, and the height of nm recesses structure is between 100-1500nm.The randomness of nm recesses physical dimension and spacing is conducive to the antireflective effect of the micro-lens sheet finally copying out.Utilize described wafer lens arra mould to copy and process polymeric material wafer microlens array sheet, as shown in Figure 1, duplicated each micro lens surface has two-dimensional random arrays to imitate moth eye nano projection structure, this random array nano projection structure makes the interfacial refraction rate of micro lens produce a gradual change, effectively can reduce the optical reflection of micro-lens surface.
A kind of wafer lens arra mould with imitative moth eye random array nm recesses structure disclosed in this invention, its preparation method as shown in Figure 3:
Step 1: first silicon or germanium material are processed into 2 cun of die wafers to 8 cun of diameters;
Step 2: utilize Ultraprecise polished and turning or milling, described mold work end face is processed with smooth flat and array lens curved surface shiny surface type reprint core rod, within surface smoothness reaches 10nm;
Step: 3: layer of metal or glass block are enclosed in bottom, strengthens the general thickness of mould;
Step 4: generate one deck continuous print metallic gold film or metal silverskin at described mold work end face, thickness of metal film is between 5-100nm;
Step 5: to the silicon or the germanium mould short annealing process that are coated with continuous metal film under vacuum or inert gas environment, make metallic diaphragm self-solidifying be polymerized to the nano-metal particle of random distribution, the size of nano-metal particle is between 10-100nm;
Step 6: utilize reactive ion etching system to etch with the silicon of nano-metal particle or germanium die wafer operative end surface, and reach etching depth;
Step 7: wash the metal nanoparticle remaining in silicon or germanium substrate surface with acid solution; Namely the wafer lens arra mould with imitative moth eye random array nm recesses structure is generated.
At die face plating silverskin for silver mirror reaction, the silver nitrate of debita spissitudo, NaOH and ammoniacal liquor are mixed to form silver ammino solution by equal proportion proportioning, it is mixed with the debita spissitudo D/W of same volume, at room temperature redox reaction occurs, form metal silverskin.In the present invention, the detailed process of silicon or germanium mould redox silver mirror reaction is: described silicon or germanium mold work end face are put into silver ammino solution, mix with D/W, at room temperature there is redox silver mirror reaction, namely form metal silverskin at silicon or germanium die surface; Control the reaction time, the uniformly continous silverskin that 10-100nm is thick can be prepared.
To the silicon or the germanium mould short annealing process that are coated with continuous metal film under vacuum or inert gas environment, metallic diaphragm self-solidifying is made to be polymerized to the nano-metal particle of random distribution.Diameter and the adjacent spacing of nano-metal particle are random distribution, relevant with annealing conditions with original metal thicknesses of layers, but control annealing parameter and can control the size of nano-metal particle and spacing generally at proper range.Nano-metal particle layer is now just equivalent to the mask of one deck nano graph structure.Utilize reactive ion etching system to carry out etching processing to silicon or germanium substrate, form the depression of silicon or germanium substrate; Control etching parameters and time, the size that makes silicon or germanium substrate are caved in reaches requirement; Finally remain in the metal nanoparticle of substrate surface with acid solution cleaning, finally define wafer lens arra silicon or germanium mould that random distribution imitates moth eye nm recesses structure.Utilize this mould to copy final array lens sheet, prepare the wafer array lens sheet with imitative moth eye nanostructured.
Claims (5)
1. the wafer lens arra mould with imitative moth eye random array nm recesses structure, it is characterized in that: described wafer lens arra mould is made by silicon or germanium material, diameter is between 2 cun ~ 8 cun, the surface of wafer lens arra mould is uniform-distribution with micro lens concave curvature pattern and the form of formation array; Described die wafer each micro lens concave curvature pattern on the surface, be distributed with imitative moth eye random array nm recesses structure, size and the adjacent spacing of nm recesses structure are random distribution, wherein: the base diameter of nm recesses structure is between 10-100nm, top diameter is between 50-300nm, the center distance of adjacent nano sunk structure is between 100-500nm, and the height of nm recesses structure is between 100-1500nm; The each polymeric material wafer micro-lens sheet adopting described wafer lens arra mould to copy to process, its surface has two-dimensional random arrays to imitate moth eye nano projection structure, and this random array nano projection structure is for reducing the optical reflection of micro-lens surface.
2. a kind of wafer lens arra mould with imitative moth eye random array nm recesses structure according to claim 1, it is characterized in that: described silicon or germanium material, monocrystalline silicon, monocrystalline germanium, polysilicon, polycrystalline germanium, the one in germanic chalcogenide glass material.
3., with a preparation method for the wafer lens arra mould of imitative moth eye random array nm recesses structure, be characterised in that:
Step 1: first silicon or germanium material are processed into 2 cun of die wafers to 8 cun of diameters;
Step 2: utilize Ultraprecise polished and turning or milling, described mold work end face is processed with smooth flat and array lens curved surface shiny surface type reprint core rod, within surface smoothness reaches 10nm;
Step: 3: layer of metal or glass block are enclosed in bottom, strengthens the general thickness of mould;
Step 4: generate one deck continuous print metallic gold film or metal silverskin at described mold work end face, thickness of metal film is between 5-100nm;
Step 5: to the silicon or the germanium mould short annealing process that are coated with continuous metal film under vacuum or inert gas environment, make metallic diaphragm self-solidifying be polymerized to the nano-metal particle of random distribution, the size of nano-metal particle is between 10-100nm;
Step 6: utilize reactive ion etching system to etch with the silicon of nano-metal particle or germanium die wafer operative end surface, and reach etching depth;
Step 7: wash the metal nanoparticle remaining in silicon or germanium substrate surface with acid solution; Namely the wafer lens arra mould with imitative moth eye random array nm recesses structure is generated.
4. the preparation method of the wafer lens arra mould with imitative moth eye random array nm recesses structure according to claim 2, is characterized in that: described metal silverskin is by following method: a kind of method in chemical silver mirror reaction, evaporation coating method, sputtering method, epitaxial growth method generates.
5. the preparation method of the wafer lens arra mould with imitative moth eye random array nm recesses structure according to claim 2, it is characterized in that: described metallic gold film is by following method: evaporation coating method, sputtering method, a kind of method in epitaxial growth method generates.
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Cited By (4)
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| CN105425324A (en) * | 2015-12-17 | 2016-03-23 | 沈阳理工大学 | Manufacturing and imaging analysis of non-uniform curved microlens array |
| CN109655945A (en) * | 2018-12-25 | 2019-04-19 | 华中科技大学 | A kind of compound eye microlens array and preparation method thereof |
| CN113167935A (en) * | 2018-12-12 | 2021-07-23 | 海利亚克有限公司 | Silicon Fresnel lens on glass substrate for solar concentrator and method of manufacture |
| CN114083817A (en) * | 2021-11-15 | 2022-02-25 | 华天慧创科技（西安）有限公司 | Mold suitable for WLO optical product and manufacturing method thereof |
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| JP2005250446A (en) * | 2004-02-06 | 2005-09-15 | Victor Co Of Japan Ltd | Micro lens array and method of manufacturing replication mold for the same |
| JP2006035394A (en) * | 2004-07-29 | 2006-02-09 | Toppan Printing Co Ltd | Manufacturing method for die for forming micro lens |
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| CN113167935A (en) * | 2018-12-12 | 2021-07-23 | 海利亚克有限公司 | Silicon Fresnel lens on glass substrate for solar concentrator and method of manufacture |
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| CN114083817A (en) * | 2021-11-15 | 2022-02-25 | 华天慧创科技（西安）有限公司 | Mold suitable for WLO optical product and manufacturing method thereof |
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