CN104520465A - 带有磨损识别层的切削刀具 - Google Patents

带有磨损识别层的切削刀具 Download PDF

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Publication number
CN104520465A
CN104520465A CN201380041233.XA CN201380041233A CN104520465A CN 104520465 A CN104520465 A CN 104520465A CN 201380041233 A CN201380041233 A CN 201380041233A CN 104520465 A CN104520465 A CN 104520465A
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layer
identification layer
wear
wear identification
individual
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CN104520465B (zh
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塞巴斯蒂安·汉普施
法伊特·席尔
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Walter AG
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Walter AG
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C5/00—Milling-cutters
    • B23C5/16—Milling-cutters characterised by physical features other than shape
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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    • C—CHEMISTRY; METALLURGY
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    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23C2228/10—Coating
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Abstract

本发明涉及一种刀具，包括：基体本体，该基体本体优选地由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成；可选的磨损保护涂层，该磨损保护涂层具有被沉积在基体本体上的一个或更多个层；以及单层磨损识别层(A)或者多层磨损识别层(B)，该单层磨损识别层(A)或多层磨损识别层(B)作为被布置在基体本体或磨损保护涂层的顶部上的外层，该多层磨损识别层(B)包括布置在彼此之上的至少四个单独层，所述单层或多层通过借助于PVD工艺沉积元素金属、金属合金或导电金属化合物而产生。本发明的特征在于，所述单层磨损识别层(A)的单独层或者所述多层磨损识别层(B)的至少一个单独层包含至少两种不同的金属，且所述磨损识别层包括如下区域，该区域通过从所述磨损识别层的上表面向下至不延伸超过该磨损识别层的整个厚度的穿透深度对所述磨损识别层中的材料进行阳极氧化而产生，且所述单层磨损识别层(A)的单独层具有100nm至10μm范围内的厚度，或者所述多层磨损识别层(B)中的每一个单独层具有0.5nm至1μm范围内的厚度，且所述单层磨损识别层(A)的单独层或者所述多层磨损识别层(B)的包含至少两种不同金属的所述至少一个单独层在所述阳极氧化之前和在所述磨损识别层的没有被阳极氧化的区域中具有至少两种不同的相。

Description

带有磨损识别层的切削刀具
技术领域
本发明涉及一种刀具，该刀具包括：基体本体，该基体本体优选地由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成；可选的单层或多层磨损保护涂层，该单层或多层磨损保护涂层沉积在基体本体上；和磨损识别层，该磨损识别层作为最外层布置在基体本体或磨损保护涂层上，且本发明涉及一种用于生产该刀具的方法。
背景技术
切削刀具，特别是那些用于金属去除加工的切削刀具(其也包括可更换的切削刀片和切削板)，包括基体或基本本体，在该基体或基体上可选地沉积有单层或多层磨损保护涂层。基体通常由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成且磨损保护涂层由凭借CVD或PVD工艺涂敷的硬质物质制成。带有硬质物质的涂层设计用以改进用于特定应用的刀具的切削性能和减少刀具的磨损。
还已知，切削刀具设置有具有装饰和/或指示功能的通常薄的最外层，例如有利地在颜色上与下方的磨损保护涂层不同的TiN、ZrN、TiC、HfC或HfN最外层。除具有纯装饰目的之外，这种层也可以有利地用于磨损识别，这是因为当刀具被使用时，它们磨损且下方的层变得可见，使得可以利用肉眼看到刀具是否已经被使用和使用的强度如何。
EP 1 762 638描述了一种切削刀片，该切削刀片包括：硬质金属基体；多层涂层，该多层涂层由硬质材料制成且用于保护以防磨损；和ZrN的最外指示层，该最外指示层借助于PVD而初始涂敷<1μm的厚度且随后再次通过刷涂或磨料喷砂而被从切削面和切削刃去除，这是因为ZrN层本身具有不利的摩擦性能，该不利的摩擦性能可对切削刃和切削面处的切削性能具有不利的影响。
DE 10 2004 010 285和DE 100 48 899还描述了带有金黄色TiN或TiC、HfC或HfN的指示覆盖涂层的切削刀具，该指示覆盖涂层在颜色上不同于下方的磨损保护涂层，并且设计用以使得能够用肉眼区分使用过的切削刀具和未使用的切削刀具。
带有装饰和/或指示功能的已知覆盖层(其在下面称为磨损识别层)的颜色变化的范围非常有限。磨损识别层经常使用的氮化物和碳化物具有例如金黄色颜色。除此之外，某些已知的磨损识别涂层具有不利的摩擦性能，该不利的摩擦性能对金属切削工艺和刀具的磨损特性具有不利的影响。用于生产磨损识别涂层的某些已知材料当受到在许多金属加工工艺中出现的高温或温度变化时也不是足够稳定的。
发明内容
发明目的
因此，本发明的潜在目的是提供一种用于切削刀具的带有装饰和/或指示功能的涂层(磨损识别层)，该涂层比较容易生产且生产便宜，该涂层允许良好的磨损识别，该涂层是温度稳定的，该涂层具有对切削工艺和刀具的磨损特性较少的摩擦不利影响并且同时能够以比已知的磨损识别涂层宽的颜色范围来生产该涂层。
发明说明
根据本发明，该目的通过一种刀具来实现，该刀具包括：
基体本体，该基体本体优选地由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成；
可选的单层或多层磨损保护涂层，该单层或多层磨损保护涂层沉积在基体本体上；以及
单层磨损识别层(A)或多层磨损识别层(B)，该单层磨损识别层(A)作为最外层布置在基体本体或磨损保护涂层上，该多层磨损识别层(B)包括被布置在彼此之上的至少四个单独层，凭借PVD工艺沉积元素金属、金属合金或导电金属化合物来生产该单层磨损识别层(A)或多层磨损识别层(B)，其中，
单层磨损识别层(A)的单独层或者多层磨损识别层(B)的至少一个单独层包含至少两种不同的金属，
磨损识别层包括如下区域，通过从磨损识别层的外表面至不延伸超过磨损识别层的总厚度的穿透深度对磨损识别层的材料进行阳极氧化而产生该区域，
单层磨损识别层(A)的单独层具有从100nm至10μm范围的厚度，或者多层磨损识别层(B)的每一个单独层具有从0.5nm至1μm范围的厚度，且
包含至少两种不同金属的单层磨损识别层(A)的单独层或者多层磨损识别层(B)的所述至少一个单独层在阳极氧化之前和在磨损识别层的没有被阳极氧化的区域中具有至少两种不同的相。
本发明包括并且区分具有也称为单层结构的单层磨损识别层(A)的实施例的形式和具有也称为多层结构的多层磨损识别层(B)的实施例的形式。
单层磨损识别层(A)仅包括单层，但是由于在该层的PVD沉积之后执行的阳极氧化，其包括：从磨损识别层的外表面延伸到层内的区域(其中层的材料以氧化状态存在)；和从氧化区域延伸到基体本体或磨损保护涂层的表面的区域(其中层的材料以非氧化状态存在)。
多层磨损识别层(B)包括至少四个单独层且优选地可以包括多达2000个单独层，其中多层磨损识别层(B)由于在PVD沉积之后执行的阳极氧化而包括：从最外单独层的外表面延伸到多层磨损识别层(B)内的区域(其中材料以氧化状态存在)；和从氧化区域延伸到基体本体或磨损保护涂层的表面的区域(其中层的材料以非氧化状态存在)。阳极氧化的穿透深度可以延伸多个单独层。可替代地，也可以对多层磨损识别层(B)的仅最外侧的单独层进行阳极氧化。优选地，阳极氧化终止于多层磨损识别层(B)内的两个单独层之间的交界面处。
根据本发明的磨损识别层与已知的装饰和指示层(比如例如TiN)相比具有明显的优点，该已知的装饰和指示层由于其对例如铸铁的高度亲和力而具有像用于加工这种材料的刀具的涂层一样的缺点。在其表面处，根据本发明的磨损识别层具有氧化性能，从摩擦观点来看与已知的氮化物或碳化物相比这具有显著优点。因此，这些摩擦有利的性能减少了对于刀具的切削性能和磨损特性的不利影响。
取决于采用的金属或采用的导电金属化合物以及阳极氧化的程度和层厚度，根据本发明的磨损识别层具有良好水平至高水平的温度稳定性，由于此原因，它们特别适合于用于金属去除加工的刀具，其中经常发生非常高的温度或温度变化应力。
根据本发明的磨损识别层的另外优点是：取决于使用的金属或使用的导电金属化合物以及阳极氧化的程度和穿透深度，可以产生涵盖几乎整个可见颜色图谱的非常强的颜色效果、很大数目的不同的颜色和亮度水平。这样，不仅可以产生用于磨损识别的外表面涂层，而且也可以由不同的颜色标记刀具，使得使用者可以单独地基于颜色来区分不同种类的刀具或不同类型的刀具。因此，根据本发明的磨损识别层可以专门具有磨损识别功能或除磨损识别功能之外可以用于对刀具进行颜色编码。与已知的磨损识别层相比，根据本发明的磨损识别层可以具有更高的颜色亮度。当生产根据本发明的磨损识别层时的用于阳极氧化所需要的电压可以变化。
就此而言没有把它们自己束缚于理论，发明人假定：根据本发明的磨损识别层的颜色效果基于光的反射，该光穿过由阳极氧化产生的磨损识别层的外侧区域撞击到磨损识别层的非氧化的内侧区域上。干涉效果提供了所被观察到的颜色。在特定情形中，颜色效果也可以基于磨损识别层的阳极氧化的外侧区域的固有颜色。
本发明的一个基本特征是：包含至少两种不同金属的单层磨损识别层(A)的单独层或多层磨损识别层(B)的所述至少一个单独层在阳极氧化之前和在磨损识别层的没有阳极氧化的区域中具有至少两种不同的相。令人惊讶地发现，由于在磨损识别层的至少一个单独层中存在至少两种不同的相，因此可以产生与那些已知的或可比较的涂层不同的颜色色度，在那些已知的或可比较的涂层中单独层不具有在至少一个单独层中的至少两种不同的相。
对于本发明的目的，在磨损识别层的多相层内的术语“相”表示相同晶体结构和化学成分的区域。对于本发明的目的，两种不同的相或者具有相同的晶体结构和不同的化学成分，或者具有不同的晶体结构和相同的化学成分，或者具有不同的晶体结构和不同的化学成分。
根据本发明可以在X射线衍射图谱中展示在阳极氧化之前和在没有阳极氧化区域中的单层磨损识别层(A)的单独层的多相性质。本领域专家将熟悉这一方法且将从图谱中立即看到该层是否是单相层或两相层或多相层。在包括布置在彼此之上的至少四个单独层的多层磨损识别层(B)中，在X射线衍射图谱中多个不同的相对于多层磨损识别层的仅一个层的精确分配不是立即可能的，这是因为该方法作为整体在多个层上进行测量。然而，在包含至少两种不同金属的单独层内的多个相可以借助于电子衍射(ED)在带有制备横截面的试件上凭借透射电镜术(TEM)来展示。明显地，该方法也适合于展示单层磨损识别层(A)的单独层的多个相。
在本发明的第一变型中，磨损识别层具有单个层，即，其由通过借助于PVD工艺而沉积元素形式的、金属合金形式的或导电金属化合物形式的至少两种不同的金属来生产的单独层组成。单独层具有从100nm至10μm范围的厚度和至少两个不同的相。如果单独层包含例如两种不同的金属M1和M2，则不同的相可以是金属M1的第一金属相、金属M2的第二金属相以及金属M1和M2的中间相。不同的相可以在X射线衍射图谱中展示。令人惊讶地发现，在单层磨损识别层由带有至少两种不同金属的单个层组成且在单个层内具有至少两种不同的相的情况下，可以获得比仅包含单种金属的单个层大的亮度和清晰度的颜色。
在本发明的第二变型中，磨损识别层具有多个层，即，其由借助于PVD工艺沉积的且布置在彼此之上的至少四个单独层组成。每一个单独层均包含金属或多种不同的金属，其中可以沉积元素形式的、金属合金形式的或导电金属化合物形式的金属。多层磨损识别层的每一个单独层均具有从0.5nm至1μm范围的厚度。多层磨损识别层的至少一个单独层具有至少两种不同的相。
在PVD沉积之后，使磨损识别层经受阳极氧化。在阳极氧化期间，涂覆的刀具作为阳极连接在电解液浴中。氧化在预定的电压下进行选定的时间段，该电压例如可位于20至150V的范围内且也可以在该范围之外，该时间段可以位于10秒至300秒的范围内或在该范围之外。施加的电压、氧化的持续时间、选择的电解液和最终磨损识别层的成分是决定阳极氧化在基体方向上从磨损识别层的外表面穿透的深度的关键参数。根据穿透深度，获得不同的颜色效果。阳极氧化的参数选择成使得氧化进行到不延伸超过磨损识别层的总厚度的穿透深度，这是因为假定根据本发明的磨损识别层的颜色效果基于磨损识别层的非氧化内侧区域上的光反射。因此有利的是，通过调节阳极氧化的穿透深度来获得磨损识别层的这种非氧化区域。
在阳极氧化之前在包含至少两种不同金属的单独层内存在的相和在没有阳极氧化的区域中的相可以借助于X射线衍射分析和/或TEM来识别。在磨损识别层的经受阳极氧化的区域中，不同的相在X射线衍射图谱或TEM中不再是可辨别的。X射线衍射分析和TEM的方法对于本领域专家将是已知的且不需要进一步解释。X射线衍射分析图谱中的不同的相的区分可以通过比较峰值位置与相对应的已知参考的那些峰值位置来进行。例如，单独金属的相通过与纯金属的参考图谱比较来识别，且中间相通过与相对应的合金的参考图谱比较来识别。借助于TEM区分不同的相借助于电子衍射来实现。
在本发明的实施例的一个优选形式中，单层磨损识别层(A)的单独层具有从250nm至5μm的厚度，优选地具有从400nm至2μm的厚度，特别优选地具有从500nm至1.2μm的厚度。如果单层磨损识别层(A)的单独层太薄，则存在如下危险，即：阳极氧化将在磨损识别层的总厚度上向下进行到下方的磨损保护涂层或向下进行到基体且磨损保护涂层或基体受到阳极氧化的通常酸性的电解质的侵害。如果具有单层结构的磨损识别层的单独层太厚，则这具有对涂层的摩擦性能不利的影响且因此对金属切削工艺和刀具的磨损特性不利的影响。除此之外，如果单独层太厚，则存在如下危险，即：在切削工艺期间层容易从基体或磨损保护涂层分离。
在本发明的实施例的一个优选形式中，多层磨损识别层(B)包括4至2000，优选地20至500，特别优选地50至100个布置在彼此之上的单独层。单独层是非常薄的，优选地它们具有从5nm至250nm的厚度，特别优选地具有从10nm至100nm的厚度。如果单独层的数目太少，且单独层具有减小的厚度，则存在如下危险，即：阳极氧化将在磨损识别层的总厚度上向下进行到下方的磨损保护涂层或向下进行到基体且磨损保护涂层或者基体受到阳极氧化的通常酸性的电解质的侵害。如果单独层的数目太大，则磨损识别层的总厚度非常大，这可对涂层的摩擦性能有不利的影响且因此对切削工艺和刀具的磨损特性具有不利的影响。除此之外，如果磨损识别层太厚，则存在如下危险，即：在切削工艺期间层将变得容易从基体或磨损保护涂层分离。
在本发明的实施例的另外优选形式中，单层磨损识别层(A)或多层磨损识别层(B)中包含的金属选自Nb、Ti、Zr、Al、Ta、W、Hf、V、Mo和Si。如果导电金属化合物在PVD工艺中被沉积，则这些优选地选自之前提到的金属的氮化物、碳化物和硼化物，前提是这些是导电的。
在包含至少两种不同金属的单层磨损识别层(A)的单独层或多层磨损识别层(B)的单独层中所包含的金属特别优选地是Ti和Si。金属Ti和Si的组合传递明亮颜色且允许产生在可见光谱中的大量不同的颜色。在仅包含金属Ti和Si的单独层的X射线衍射图谱中，识别至少三种相，即，金属Ti相、金属Si和至少一种中间TiSi相，从X射线衍射图谱评估的金属Ti和Si相的比例相对于所述至少一种中间TiSi相来说是高的。
图1中显示了仅包含金属Ti和Si的单独层的X射线衍射图谱。借助于电弧PVD工艺由包含Ti和Si(85:15的原子百分比)的靶以0.8μm的层厚以160A的蒸发器电流、2Pa的Ar压力和10V的偏压来沉积该单独层。
在本发明的实施例的另外优选形式中，在包含至少两种不同金属的单层磨损识别层(A)的单独层或多层磨损识别层(B)的单独层中所包含的金属借助于PVD工艺而由混合金属靶沉积，该混合金属靶包括单独层中存在的所有金属。
在本发明的实施例的另外优选形式中，多层磨损识别层(B)具有从2nm至20μm，优选地从10nm至5μm，特别优选地从100nm至1μm的总层厚。如果总层厚太小，则存在如下危险，即：阳极氧化在磨损识别层的总厚度上向下进行到下方的磨损保护涂层或向下进行到基体且磨损保护涂层或者基体受到阳极氧化的通常酸性的电解质的侵害。如果磨损识别层的总层厚太大，则这可具有对涂层的摩擦性能不利的影响且因此对刀具的切削工艺和磨损特性不利的影响。除此之外，如果磨损识别层太厚，则存在如下危险，即：在切削工艺期间层将容易从基体或磨损保护涂层分离。
在本发明的实施例的一个特别优选的形式中，单层或多层磨损保护涂层，优选地是多层磨损保护涂层(其优选地包括至少一个不导电层，且特别优选地包括氧化铝层)布置在磨损识别层下方的基体本体上。
在不导电磨损保护层(非常特别优选地在氧化铝层)(该不导电磨损保护涂层由于其硬度和耐磨性而有利地在用于金属切削加工的许多刀具中以其自己或与硬质材料的其它层组合地用作磨损保护层)上施加根据本发明的磨损识别层，这具有特定的优点，即，在磨损识别层的阳极氧化工艺期间，所谓的刺穿由于位于磨损识别层下方的不导电层而不能够在阳极氧化工艺期间发生。于是，磨损识别层可以制造得非常薄。
在本发明的实施例的另外优选形式中，用于涂敷由金属、金属合金或导电金属化合物制成的磨损识别层的单独层的PVD工艺可以选自电弧蒸发、HIPIMS和双磁控溅射。根据不同的层成分使用不同成分的靶来沉积多层磨损识别层。这里，沉积可以利用相同的PVD工艺由不同的靶实现。然而，对于不同的靶也可以使用不同的PVD工艺。特别是，当要生产非常薄的层时，可以在PVD工艺中沉积带有交替的不同层成分的多层磨损识别层，其中不同的靶分布在反应器中不同的位置中，且例如通过在转位台等等上多次旋转来使所要涂覆的刀具本体的侧部重复地依次经过不同的靶。
在本发明的实施例的另外优选形式中，优选地通过利用颗粒喷砂介质的磨料喷砂工艺、通过研磨或者通过刷涂来从刀具的选定区域再次去除磨损识别层。例如在切削刃上和在端面上，当在某些区域中的磨损识别层可能对用于特定提议应用的刀具赋予不利性能时，或者简单地为了赋予刀具期望的光学特性，可能希望刀具的这些区域具有作为最外侧表面的基体本体或磨损保护涂层的表面。此外，研磨工艺比如例如喷砂方法或刷涂，可以用于去除磨损识别层，以便使相对应区域的表面粗糙度平滑或影响在磨损保护涂层和可选择地还有外侧基体区域中的固有应力条件。如已知的，利用特定喷砂介质的喷砂工艺可用于减轻硬质材料层中的张应力和/或施加压缩应力，利用这些例如可以改善层的粘附和磨损性能。
磨损识别层的阳极氧化在电解液浴中在DC电压下实现且持续一定时间，该时间选择成使得从磨损识别层的外表面至比磨损识别层的总厚度小的穿透深度实现该阳极氧化。合适的电解液浴的示例是具有25-50％磷酸和1-5％草酸的水溶液。
本发明还包括一种方法，该方法用于生产根据本发明在本文前面描述的种类的刀具，其中通过PVD工艺对刀具涂敷根据本发明在本文描述的种类的磨损识别层，该刀具包括基体本体，该基体本体由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成，该刀具可选地具有被沉积在基体本体上的单层或多层磨损保护涂层，并且然后使磨损保护层在电解液浴中经受阳极氧化。阳极氧化在DC电压下有利地执行并持续一定时间，该时间选择成使得从磨损识别层的外表面至比磨损识别层的总厚度小的穿透深度实现该阳极氧化。该方法是简单的且便宜的并且给予生产许多不同颜色的可能性。
对于原始公开的目的，应指出，从本说明书和所附权利要求书向本领域专家揭示的所有特征，甚至当它们以具体术语仅结合某些另外的特征被描述时，可以单独地组合且也可以与本文公开的特征或特征组的其它特征组合，前提是这没有被明确地排除或者技术原因使得这样的组合不可能或无意义。本文将仅给出了所有可设想的特征组合的非全面详尽的描述以保持说明简单和易读。
将进一步参考下面的示例和附图解释本发明的另外的优点、特征和可能应用。
附图说明
图1显示了根据示例1的包含金属Ti和Si的磨损识别层在阳极氧化之前的X射线衍射图谱。
图2显示了根据示例2的包含金属Ti和Al的磨损识别层在阳极氧化之前的X射线衍射图谱。
图3显示了根据示例3的包含金属Ti和Al的磨损识别层在阳极氧化之前的X射线衍射图谱。
图4显示了根据比较示例1的包含金属Ti的磨损识别层在阳极氧化之前的X射线衍射图谱。
图5显示了根据比较示例2的包含金属Zr的磨损识别层在阳极氧化之前的X射线衍射图谱。
具体实施方式
对于以下示例，借助于电弧蒸发(电弧PVD)在PVD涂覆设备(Flexicoat；Hauzer Techno Coating)中为硬质金属基体(该硬质金属基体具有带有Al2O3最外层的磨损保护涂层)提供单层或多层磨损保护层。沉积参数在相应的示例中给出。
然后，所涂覆的硬质金属基体在水电解液浴(electrolyte bath)中在不同电压Uanod下经受阳极氧化持续一定阳极氧化时间tanod。由阳极氧化产生的氧化物的厚度基本上与所施加的电压成比例。
对于根据示例产生的层的在图中所示的X射线衍射图谱的峰值与已知的参考图谱(PDF卡)的峰值位置进行比较，以便识别层中包含的相。在图中，与相关联的峰值因此用相同的数字(例如1、2、3或4)来标记。源于基体本体的峰值用字母“S”标记。在每一种情形中使用的PDF卡的数字以图的标题指示。
示例1：根据本发明的单层磨损识别层的生产
对于磨损识别层获得了以下颜色：
Uanod 颜色
35V 蓝色
85V 粉红紫
120V 淡绿
借助于PVD工艺沉积的磨损识别层在阳极氧化之前经受X射线衍射分析。图1中再现了X射线衍射图谱。利用纯钛、纯硅和钛-硅合金的参考图谱获得的峰值的比较表明：沉积的单层具有至少三种不同的金属相，即金属钛相、金属硅相和中间钛-硅相。在大约53°2-θ下的另外未识别的峰值显示了另外的可能的中间相，然而，该峰值在已知参考图谱中未发现，这导致人们得出结论，即该相尚未作为参考被记录或公布。
示例2：根据本发明的单层磨损识别层的生产
对于磨损识别层获得了以下颜色：
Uanod 颜色
50V 绿色
80V 黄色
借助于PVD工艺而沉积的磨损识别层在阳极氧化之前经受X射线衍射分析。图2中再现了X射线衍射图谱。利用纯钛、纯铝和钛-铝合金的参考图谱获得的峰值的比较表明：沉积的单层具有至少两种不同的金属相，即金属钛相和金属铝相。在大约43°2-θ下的另外未识别的峰值显示了另外的可能的中间钛-铝相，然而，该峰值在已知参考图谱中未发现，这导致人们得出结论即该相尚未作为参考被记录或公布。
示例3：根据本发明的多层磨损识别层的生产
对于磨损识别层获得了以下颜色：
在PVD工艺期间沉积的磨损保护涂层在阳极氧化之前经受X射线衍射分析。图3中再现了X射线衍射图谱。利用纯钛、纯铝和钛-铝合金的参考图谱获得的峰值的比较表明：沉积的单层具有至少两种不同的金属相，即金属钛相和金属铝相。在大约37°2-θ下的另外未识别的峰值显示了另外的可能的中间钛-铝相，然而，该峰值在已知参考图谱中未发现，这导致人们得出结论即该相尚未作为参考被记录或公布。
电子衍射(TEM)揭露在该多层的层的至少一个单独层内存在在X射线衍射分析中发现的相中的至少两种不同的相。因为在X射线衍射分析中观察到三种相并且仅两种不同层成分交替地沉积在彼此之上，所以X射线衍射分析表明在单独层中的一个中存在至少两种不同的相。
比较示例1：单层磨损识别层的生产
对于该磨损识别层获得了以下颜色：
Uanod 颜色
20V: 粉红色
40V: 蓝色
在PVD工艺期间沉积的磨损识别层在阳极氧化之前经受X射线衍射分析。在图4中再现了X射线衍射图谱。利用纯钛的参考图谱获得的峰值的比较表明了沉积的单层由单个金属Ti相组成。
比较示例2：单层磨损识别层的生产
对于该磨损识别层获得了以下颜色：
Uanod 颜色
50V: 淡蓝
85V: 黄色
在PVD工艺期间沉积的磨损识别层在阳极氧化之前经受X射线衍射分析。在图5中再现了X射线衍射图谱。利用纯锆的参考图谱获得的峰值的比较表明了沉积的单层由单个金属Zr相组成。
根据示例1至3的本发明的磨损识别层与比较示例的层相比显示了明显较好的耐刮擦性和耐磨损性以及视觉评估较高的颜色亮度。
附图标记/附图说明
图1的附图标记/附图说明：
S  基体PDF 25-1047
1  Si PDF 40-932
2  Ti PDF 5-682
3  TiSi PDF 27-907
4  未识别
I  强度(任意单位)
图2的附图标记/附图说明：
S  基体PDF 25-1047
1  Ti PDF 5-682
2  Al PDF 4-787
3  未识别的TiAl相
I  强度(任意单位)
图3的附图标记/附图说明：
S  基体PDF 25-1047
1  Ti PDF 5-682
2  Al PDF 4-787
3  未识别的TiAl相
I  强度(任意单位)
图4的附图标记/附图说明：
S  基体PDF 25-1047
1  Ti PDF 5-682
I  强度(任意单位)
图5的附图标记/附图说明：
S  基体PDF 25-1047
1  Zr PDF 5-665
I  强度(任意单位)

Claims (13)

1.一种刀具，包括：
基体本体，所述基体本体优选地由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成；
可选的单层或多层磨损保护涂层，所述单层或多层磨损保护涂层沉积在所述基体本体上；以及
单层磨损识别层(A)或者多层磨损识别层(B)，所述单层磨损识别层(A)作为最外层沉积在所述基体本体或所述磨损保护涂层上，所述多层磨损识别层(B)包括布置在彼此之上的至少四个单独层，所述单层磨损识别层(A)或者所述多层磨损识别层(B)通过借助于PVD工艺沉积元素金属、金属合金或导电金属化合物而产生，
其特征在于，
所述单层磨损识别层(A)的单独层或者所述多层磨损识别层(B)的至少一个单独层包含至少两种不同的金属，
所述磨损识别层包括如下区域，所述区域通过从所述磨损识别层的外表面至不延伸超过所述磨损识别层的总厚度的穿透深度对所述磨损识别层的材料进行阳极氧化而产生，
所述单层磨损识别层(A)的所述单独层具有从100nm至10μm范围内的厚度，或者所述多层磨损识别层(B)的每一个单独层具有从0.5nm至1μm范围内的厚度，且
包含至少两种不同金属的所述单层磨损识别层(A)的所述单独层或者所述多层磨损识别层(B)的所述至少一个单独层在阳极氧化之前和在所述磨损识别层的没有被阳极氧化的区域中具有至少两种不同的相。
2.根据权利要求1所述的刀具，其特征在于，所述单层磨损识别层(A)的所述单独层具有从250nm至5μm的厚度，优选地具有从400nm至2μm的厚度，特别优选地具有从500nm至1.2μm的厚度，或者所述多层磨损识别层(B)的所述单独层每一个均具有从5nm至250nm的厚度，优选地具有从10nm至100nm的厚度。
3.根据前述权利要求中的一项所述的刀具，其特征在于，所述单层磨损识别层(A)或所述多层磨损识别层(B)中包含的金属选自Nb、Ti、Zr、Al、Ta、W、Hf、V、Mo和Si。
4.根据前述权利要求中的一项所述的刀具，其特征在于，在包含至少两种不同金属的所述单层磨损识别层(A)的所述单独层或所述多层磨损识别层(B)的所述单独层中包含的金属是Ti和Si。
5.根据前述权利要求中的一项所述的刀具，其特征在于，在包含至少两种不同的金属的所述单层磨损识别层(A)的所述单独层或所述多层磨损识别层(B)的所述单独层中包含的金属借助于所述PVD工艺由混合金属靶沉积，所述混合金属靶包含在所述单独层中存在的所有金属。
6.根据前述权利要求中的一项所述的刀具，其特征在于，所述多层磨损识别层(B)包括4至2000，优选地20至500，特别优选地50至100个布置在彼此之上的单独层。
7.根据前述权利要求中的一项所述的刀具，其特征在于，所述多层磨损识别层(B)具有从2nm至20μm，优选地从10nm至5μm，特别优选地从100nm至1μm的总层厚。
8.根据前述权利要求中的一项所述的刀具，其特征在于，在所述PVD工艺期间沉积的所述导电金属化合物选自相应金属的氮化物、碳化物和硼化物，前提是所述化合物是导电的。
9.根据前述权利要求中的一项所述的刀具，其特征在于，单层或多层磨损保护涂层，优选地是多层磨损保护涂层，被布置在所述基体本体上，处于所述磨损识别层下方，所述单层或多层磨损保护涂层优选地包括至少一个不导电层，特别是优选地包括氧化铝层。
10.根据前述权利要求中的一项所述的刀具，其特征在于，用于涂敷由金属、金属合金或导电金属化合物制成的所述磨损识别层的所述单独层的所述PVD工艺选自电弧蒸发、HIPIMS和双磁控溅射。
11.根据前述权利要求中的一项所述的刀具，其特征在于，通过研磨或者通过刷涂，将所述磨损识别层从所述刀具的选定区域再次去除，优选地通过利用颗粒喷砂介质的磨料喷砂工艺。
12.一种用于生产根据前述权利要求中的一项所述的带有磨损识别层的刀具的方法，其中借助于PVD工艺由金属、金属合金或导电金属化合物对刀具涂敷磨损识别层，所述刀具包括基体本体，所述基体本体由硬质金属、金属陶瓷、陶瓷、钢或高速钢制成，所述刀具可选地具有被沉积在所述基体本体上的单层或多层磨损保护涂层，并且然后使所述磨损识别层在电解液浴中经受阳极氧化。
13.根据权利要求12所述的方法，其中所述阳极氧化在DC电压下执行且持续一定时间，所述时间选择成使得从所述磨损识别层的外表面至比所述磨损识别层的总厚度小的穿透深度实现所述阳极氧化。
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