CN104505712B - Charged film emission electrode in a kind of space and preparation method thereof and application - Google Patents
Charged film emission electrode in a kind of space and preparation method thereof and application Download PDFInfo
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- CN104505712B CN104505712B CN201410847966.9A CN201410847966A CN104505712B CN 104505712 B CN104505712 B CN 104505712B CN 201410847966 A CN201410847966 A CN 201410847966A CN 104505712 B CN104505712 B CN 104505712B
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- 229910052697 platinum Inorganic materials 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 239000010937 tungsten Substances 0.000 claims abstract description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 7
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Abstract
Charged film emission electrode in a kind of space and preparation method thereof and application, it is related to technical field of air purification, the charged film emission electrode in space, including emitter stage film layer, located at the inert insulating layers and emitting facet of emitter stage film layer upper and lower surface, one or more mixing of emitter stage film layer comprising platinum, gold, indium oxide, graphite, CNT, carbon fiber, Graphene, tungsten；It is its little, little power consumption that takes up room, reliable and stable；After its preparation method includes one or more mixing by materials such as platinum, gold, indium oxide, graphite, CNT, carbon fiber, Graphene, tungsten, it is coated in by the way of chemical plating, vacuum sputtering or serigraphy on inert insulating layers, emitter stage film layer is formed on inert insulating layers；One layer of inert insulating layers are added on the surface of emitter stage film layer；Cutting emitting facet, the method simply easily realize that the charged film emission electrode in the space can be applicable to the electrical installations such as Household Air Purifier, the air-conditioning with purification function.
Description
Technical field
The present invention relates to technical field of air purification, more particularly to one kind can stablize, high efficiency to spatial emission electricity
Lotus simultaneously causes the charged emission electrodes such as oxygen molecule, particulate matter, before anion generator, electrostatic particle thing capturing device
End charge device.
Background technology
The transmitting of the space charge in air under normal temperature and pressure, is mainly carried out in the way of Point Corona Discharge, with transmitting
The voltage of pole, radius of curvature are closely relevant.The anion generator that constituted with this principle, electro-static precipitation front end charge device, one
As use metal needle point, metal prickle, conductive filament（Tungsten filament）, carbon fiber bundle etc. as emitter stage, have open, line in structure
Board-like, pin etc..After certain voltage is applied to emitter stage, its sophisticated electric-field intensity reaches certain numerical value, electronics ease
Go out to cause corona discharge, and then the air molecule to sophisticated periphery（Mainly oxygen molecule）Or dust particles are charged.
There is problems with traditional charge device：1st, the installing space for needing is larger；If the 2, point discharge is controlled not
When being also easy to produce ozone；3rd, metal needle point or filament surfaces are oxidized easily or adsorption particle thing, and guiding discharge curvature changes,
And then affect flash-over characteristic.
Domestic air pollution aims at particulate matter from finishing pollution（PM2.5）Based on pollution, air purifier and tool
Market is occurred in for more and more products such as the air-conditioning of air-cleaning function, fan, warm-air driers.Electrostatic precipitation purification style is with which
The advantages of energy-conservation, noise are low, filter can be reused, has extensive market application space, and space charge device is quiet
The requisite part of electrofilter.
One of essential condition of space corona discharge is the radius of curvature of discharge end, and radius is less, meets and produces corona electricity
The driving power supply voltage that field intensity needs is lower, therefore, the radius of curvature of discharge end how is reduced, into the technology of urgent need to resolve
Problem.
The content of the invention
An object of the present invention is to avoid weak point of the prior art and provide a kind of charged film in space and send out
Radio pole, it is the little, little power consumption that takes up room of the charged film emission electrode in the space, reliable and stable, while being easily installed, drive letter
It is single.
The second object of the present invention is to avoid weak point of the prior art and provide a kind of charged film in space and send out
The preparation method of radio pole, the preparation method are simply easily realized.
The third object of the present invention is to avoid weak point of the prior art and provide a kind of charged film in space and send out
The application of radio pole, the charged film emission electrode in the space can be used for anion generator or electrostatic particle thing capturing device
The electrical installations such as front end charge device, it is possible to obtain extremely low thickness, easily form corona condition.
An object of the present invention is achieved through the following technical solutions：
There is provided a kind of space charged film emission electrode,
Including emitter stage film layer that is conductive and possessing the low work function of chemical stability, electronics, the emitter stage film layer includes
The raw material mixing of one or more mixing arbitrary proportions of platinum, gold, indium oxide, graphite, CNT, carbon fiber, Graphene, tungsten
Form；
Also include the inert insulating layers located at emitter stage film layer upper and lower surface；
And for the emitting facet to spatial emission electronics.
The emitting facet is provided with cutting chamfering.
The length of the emitting facet cutting chamfering is the 1/4 to 3/4 of the thickness of the charged film emission electrode in space.
The resistance of the resistance of the emitter stage film layer is less than 1 megaohm.
The thickness of the emitter stage film layer is 0.1 to 100 micron.
The inert insulating layers are fluoroplastics.
The thickness of the inert insulating layers is 0.1 to 0.5 millimeter.
Beneficial effects of the present invention：A kind of charged film emission electrode in space of the present invention has：
（1）Transmitting anion that can be stable, may replace traditional pin type, corona wire form, the emission electrode of prickle formula；
（2）With electric charge surface launching quantity in a balanced way, emission effciency is high, can the follow-up dust part of matched well, performance
It is stable.
（3）Simple structure, it is easy to molded design, it is easy to install, safeguard and clear up.
（4）Size is little, can reduce and take up room.
（5）The potential hazards such as ozone, sparking are not produced, it is reliable and stable.
（6）It is suitable for manufacturing anion emission electrode, particulate matter charge device or ion wind emission electrode, suitable for home use
Electrical equipment is used.
The second object of the present invention is achieved through the following technical solutions：
The preparation method for providing a kind of charged film emission electrode in space, comprises the following steps：
Step one：By the platinum, gold, indium oxide, graphite, CNT, carbon fiber, Graphene, tungsten one or more
After raw material mixing, it is coated in by the way of chemical plating, vacuum sputtering or serigraphy on inert insulating layers, i.e., described lazy
Property insulating barrier on formed emitter stage film layer；
Step 2：One layer of inert insulating layers are added on the surface of the emitter stage film layer；
Step 3：Cut the emitting facet.
It is further comprising the steps of behind the step 3：
Step 4：The chamfering is repaired out using the sharp keen knife edge in the emitting facet, the charged film in space is prepared into and is sent out
Radio pole.
Beneficial effects of the present invention：A kind of preparation method of the charged film emission electrode in space that the present invention is provided is simply easy
Realize.
The third object of the present invention is achieved through the following technical solutions：
A kind of application of the charged film emission electrode in space is provided, the charged film emission electrode in the space be applied to bear from
The front end charge device of electronic generator or electrostatic particle thing capturing device, using high voltage power supply constant current-supplying or by current limliting electricity
Resistance power supply, the high voltage power supply are direct current or direct-current superposition pulse power source, and voltage is 3KV to 12KV；Electric current is controlled for constant-current source
Or by resistance limit, emission current intensity be 0.1 to 1 microampere/it is per cm.
Beneficial effects of the present invention：
A kind of charged film emission electrode in space of the present invention is used for anion generator or electrostatic particle thing trapping dress
The electrical installations such as the front end charge device put, the electrical installation obtain extremely low thickness, easily form corona condition.
Description of the drawings
Invention is described further using accompanying drawing, but the embodiment in accompanying drawing does not constitute any limitation of the invention,
For one of ordinary skill in the art, on the premise of not paying creative work, can be obtaining which according to the following drawings
Its accompanying drawing.
Fig. 1 is a kind of structural representation of the charged film emission electrode in space of the present invention.
Fig. 2 is a kind of charged film emission electrode in space and current-limiting resistance and the connection signal of high voltage power supply of the present invention
Figure.
Fig. 3 is a kind of discharge monomer structural representation of the charged film emission electrode in space of the present invention.
Fig. 4 is a kind of electric discharge couple structure schematic diagram of the charged film emission electrode in space of the present invention.
Fig. 5 is the schematic diagram that a kind of charged film emission electrode in space of the present invention is applied to filter.
Include in figure：
1 --- emitter stage film layer；
2 --- inert insulating layers；
3 --- emitting facet；
4 --- cutting chamfering；
5 --- current-limiting resistance；
6 --- high voltage power supply；
7 --- earth electrode；
8 --- Uni-ESP filters.
Specific embodiment
The invention will be further described with the following Examples.
Embodiment 1.
The charged film emission electrode in a kind of space of the present embodiment, as depicted in figs. 1 and 2, including conductive and possess chemistry
The emitter stage film layer 1 of the low work function of stability, electronics, the emitter stage film layer 1 are mixed comprising platinum and golden bi-material；
Also include the inert insulating layers 2 located at 1 upper and lower surface of emitter stage film layer；And for the cutting transmitting terminal to spatial emission electronics
Face 3.
The thickness of the emitter stage film layer 1 is 0.1 micron.
The resistance of the resistance of the emitter stage film layer 1 is less than 5 kilo-ohms.
The inert insulating layers 2 are polytetrafluoroethylene (PTFE) (PTFE).
The thickness of the inert insulating layers 2 is 0.1 millimeter.
The cutting chamfering length of the emitting facet for the thickness of the charged film in space 1/4.
The charged film emission electrode in space of above structure has advantages below：
（1）Transmitting anion that can be stable, may replace traditional pin type, corona wire form, the emission electrode of prickle formula；
（2）With electric charge surface launching quantity in a balanced way, emission effciency is high, can the follow-up dust part of matched well, performance
It is stable.
（3）Simple structure, it is easy to molded design, it is easy to install, safeguard and clear up.
（4）Size is little, can reduce and take up room.
（5）The potential hazards such as ozone, sparking are not produced, it is reliable and stable.
（6）It is suitable for manufacturing anion emission electrode, particulate matter charge device or ion wind emission electrode, suitable for home use
Electrical equipment is used.
（7）The cutting emitting facet 3 is provided with cutting chamfering 4, can reduce because of electric discharge curvature half caused by corona diffusion
Footpath increases.
Embodiment 2.
A kind of preparation method of the charged film emission electrode in space of embodiment 1, comprises the following steps：
Step one：After by platinum, gold mixing, it is coated in by the way of chemical plating on polytetrafluoroethylene (PTFE) (PTFE) layer, that is, is existed
Emitter stage film layer 1 is formed on polytetrafluoroethylene (PTFE) (PTFE) layer；
Step 2：On the surface of the emitter stage film layer 1 using uv-curable glue one layer of polytetrafluoroethylene (PTFE) of bonding；
Step 3：Cut the emitting facet 3；
Step 4：The chamfering is cut in the emitting facet 3.
The preparation method of the charged film emission electrode in space of the present embodiment, it is simple easily to realize, it is placed in two-layer polytetrafluoroethyl-ne
Emitter stage film layer 1 between alkene (PTFE), by way of cutting so as to be exposed to discharge space, forms the pole of radius of curvature
Little corona discharge body.
Embodiment 3.
The charged film emission electrode in a kind of space of the present embodiment, as shown in figure 1, including conduction and possessing chemically stable
Property, the emitter stage film layer 1 of the low work function of electronics, the emitter stage film layer 1 includes carbon fiber, the three kinds of materials mixing of Graphene and tungsten
Together；Also include the inert insulating layers 2 located at 1 upper and lower surface of emitter stage film layer；And for cutting to spatial emission electronics
Cut emitting facet 3.
The thickness of the emitter stage film layer 1 is 100 microns.
The resistance of the resistance of the emitter stage film layer 1 is less than 15 kilo-ohms.
The inert insulating layers 2 are Kynoar（PVDF）.
The thickness of the inert insulating layers 2 is 0.5 millimeter.
The cutting chamfering length of the emitting facet for the thickness of the charged film in space 3/4.
The charged film emission electrode in space of above structure has advantages below：
（1）Transmitting anion that can be stable, may replace traditional pin type, corona wire form, the emission electrode of prickle formula；
（2）With electric charge surface launching quantity in a balanced way, emission effciency is high, can the follow-up dust part of matched well, performance
It is stable.
（3）Simple structure, it is easy to molded design, it is easy to install, safeguard and clear up.
（4）Size is little, can reduce and take up room.
（5）The potential hazards such as ozone, sparking are not produced, it is reliable and stable.
（6）It is suitable for manufacturing anion emission electrode, particulate matter charge device or ion wind emission electrode, suitable for home use
Electrical equipment is used.
（7）The cutting emitting facet 3 is provided with cutting chamfering 4, can reduce because of electric discharge curvature half caused by corona diffusion
Footpath increases.
Embodiment 4.
A kind of preparation method of the charged film emission electrode in space of embodiment 3, comprises the following steps：
Step one：After carbon fiber, Graphene and tungsten are mixed, Kynoar is coated in by the way of serigraphy
（PVDF）On layer, i.e., in Kynoar（PVDF）Upper formation emitter stage film layer 1；
Step 2：Pass through one strata vinylidene of uv-curable glue bonding on the surface of the emitter stage film layer 1（PVDF）；
Step 3：Cut the emitting facet 3；
Step 4：The chamfering is cut in the emitting facet 3.
The preparation method of the charged film emission electrode in space of the present embodiment, it is simple easily to realize, it is placed in two-layer polyvinylidene fluoride
Alkene（PVDF）Between emitter stage film layer 1, by way of cutting so as to be exposed to discharge space, form the pole of radius of curvature
Little corona discharge body.
Embodiment 5.
The charged film emission electrode in a kind of space of the present embodiment, as shown in figure 1, including conduction and possessing chemically stable
Property, the emitter stage film layer 1 of the low work function of electronics, the emitter stage film layer 1 include indium oxide；Located at following table in emitter stage film layer 1
The inert insulating layers 2 in face；For the cutting emitting facet 3 to spatial emission electronics.
The thickness of the emitter stage film layer 1 is 50 microns.
The resistance of the resistance of the emitter stage film layer 1 is less than 10 kilo-ohms.
The inert insulating layers 2 are flame-retardant modified Merlon（PC）.
The thickness of the inert insulating layers 2 is 0.3 millimeter.
The chamfering length for the thickness of the charged film in space 1/2.
The charged film emission electrode in space of above structure has advantages below：
（1）Transmitting anion that can be stable, may replace traditional pin type, corona wire form, the emission electrode of prickle formula；
（2）With electric charge surface launching quantity in a balanced way, emission effciency is high, can the follow-up dust part of matched well, performance
It is stable.
（3）Simple structure, it is easy to molded design, it is easy to install, safeguard and clear up.
（4）Size is little, can reduce and take up room.
（5）The potential hazards such as ozone, sparking are not produced, it is reliable and stable.
（6）It is suitable for manufacturing anion emission electrode, particulate matter charge device or ion wind emission electrode, suitable for home use
Electrical equipment is used.
（7）The cutting emitting facet 3 is provided with cutting chamfering 4, can reduce because of electric discharge curvature half caused by corona diffusion
Footpath increases.
Embodiment 6.
A kind of preparation method of the charged film emission electrode in space of embodiment 5, comprises the following steps：
Step one：Indium oxide is coated in by the way of vacuum sputtering flame-retardant modified Merlon（PC）On layer, i.e.,
In flame-retardant modified Merlon（PC）Emitter stage film layer 1 is formed on layer；
Step 2：Pass through one layer of flame-retardant modified Merlon of bi-component glue bonding on the surface of the emitter stage film layer 1
（PC）；
Step 3：Cut the emitting facet 3；
Step 4：The chamfering is cut in the emitting facet 3.
Transparent emitter stage film layer 1 can be obtained using vacuum sputtering mode, the space lotus of good appearance is may be made with
Electric installation.
The preparation method of the charged film emission electrode in space of the present embodiment, it is simple easily to realize, it is placed in two-layer flame-retardant modified
Merlon（PC）Between emitter stage film layer 1, by way of cutting so as to be exposed to discharge space, form curvature half
The minimum corona discharge body in footpath.
Embodiment 7.
A kind of preparation method of the charged film emission electrode in space, comprises the following steps：
Step one：By indium oxide adopt the mode of vacuum sputtering to be coated in thickness for 0.3mm modified poly ester plastics（PET）
On, i.e., in modified poly ester plastics（PET）The upper thickness that formed is 1 micron and emitter stage film layer 1 of the resistance value less than 100 ohm；
Step 2：It is glued polyester that a layer thickness be 0.3mm by ultra-violet curing on the surface of the emitter stage film layer 1 to mould
Material（PET）；
Step 3：Cut the emitting facet 3；
Step 4：5 millimeters of shearing width, top cuts；
Step 5：The pointed chamfering that angle is 15 degree is cut out in the emitting facet 3.
Transparent emitter stage film layer 1 can be obtained using vacuum sputtering mode, the space lotus of good appearance is may be made with
Electric installation.
The preparation method of the charged film emission electrode in space of the present embodiment, it is simple easily to realize, it is placed in two-layer flame-retardant modified
Merlon（PC）Between emitter stage film layer 1, by way of cutting so as to be exposed to discharge space, form curvature half
The minimum corona discharge body in footpath.
The using effect of the charged film emission electrode in space that test is made：1 to 8 kilovolt high of connection emitter stage film layer
6 negative pole of voltage source, tests the negative ion amount of sophisticated 15 centimeters using anion generator, and numerical value is at 6,000,000 to 10,000,000
Between individual.Get a desired effect.Persistently it is powered 360 hours, anion quantity does not decay.
Embodiment 8.
A kind of preparation method of the charged film emission electrode in space, comprises the following steps：
Step one：In the flame-retardant modified Merlon that thickness is 0.3mm（PC）Upper serigraphy graphene microchip is conductive
Coating, resistance value are 1000 ohm, i.e., in flame-retardant modified Merlon（PC）Emitter stage film layer 1 is formed on layer；
Step 2：A layer thickness is connect for 0.25mm flame-retardant modified by AB is gluing on the surface of the emitter stage film layer 1
Merlon（PC）；
Step 3：Emitting facet 3 as shown in Figure 4 is cut out using laser cutting machine.
The preparation method of the charged film emission electrode in space of the present embodiment, it is simple easily to realize, it is placed in two-layer flame-retardant modified
Merlon（PC）Between emitter stage film layer 1, by way of cutting so as to be exposed to discharge space, form curvature half
The minimum corona discharge body in footpath.
The using effect of the charged film emission electrode in space that test is made：Great circle ring portion is connect into the ground connection of power supply
End, roundlet ring portion connect the negative high-voltage end of high voltage power supply 6,9 kilovolts of voltage.
Diaphragm is placed in the air channel that wind speed is 1 metre per second (m/s), the anion concentration of 10 centimeters of leeward, numerical value is tested
Between 6 million to 1,500 ten thousand, mean value is 9,000,000.
As shown in figure 5, diaphragm to be placed in 8 front end of Uni-ESP filters of Yujie New Material Co., Ltd., Dongguan City's production
10 millimeters, built-in test air channel, wind speed 1.5m/S test air intake, the natural dust content at air-out position respectively, and computational efficiency is
99%。
The assembled bipolar discharging structure of the present embodiment can more stable emission current.
Above example illustrate, the present invention the charged film emission electrode in space, can effectively to spatial emission bear from
Son, and it is charged to the particulate matter in air.
Finally it should be noted that above example is only illustrating technical scheme, rather than to present invention guarantor
The restriction of shield scope, although having made to explain to the present invention with reference to preferred embodiment, one of ordinary skill in the art should
Work as understanding, technical scheme can be modified or equivalent, without deviating from the reality of technical solution of the present invention
Matter and scope.
Claims (9)
1. the charged film emission electrode in a kind of space, it is characterised in that：
Including emitter stage film layer that is conductive and possessing the low work function of chemical stability, electronics, the emitter stage film layer include platinum,
Gold, indium oxide, graphite, CNT, carbon fiber, Graphene, the raw material of one or more arbitrary proportions of tungsten are mixed；
Also include the inert insulating layers located at emitter stage film layer upper and lower surface；
And for the emitting facet to spatial emission electronics；
The emitting facet is provided with cutting chamfering.
2. the charged film emission electrode in a kind of space as claimed in claim 1, it is characterised in that：The emitting facet cutting is fallen
The length at angle for the thickness of the charged film emission electrode in space 1/4 to 3/4.
3. the charged film emission electrode in a kind of space as claimed in claim 1, it is characterised in that：The electricity of the emitter stage film layer
The resistance of resistance is less than 1 megaohm.
4. the charged film emission electrode in a kind of space as claimed in claim 1, it is characterised in that：The thickness of the emitter stage film layer
Spend for 0.1 to 100 micron.
5. the charged film emission electrode in a kind of space as claimed in claim 1, it is characterised in that：The inert insulating layers are fluorine
Plastics.
6. the charged film emission electrode in a kind of space as claimed in claim 1, it is characterised in that：The thickness of the inert insulating layers
Spend for 0.1 to 0.5 millimeter.
7. a kind of preparation method of the charged film emission electrode in space described in claim 1 to 6 any one, its feature exist
In：Comprise the following steps：
Step one：By one or more raw materials of the platinum, gold, indium oxide, graphite, CNT, carbon fiber, Graphene, tungsten
After mixing, be coated in by the way of chemical plating, vacuum sputtering or serigraphy on inert insulating layers, i.e., it is exhausted in the inertia
Emitter stage film layer is formed in edge layer；
Step 2：One layer of inert insulating layers are added on the surface of the emitter stage film layer；
Step 3：Cut the emitting facet.
8. the preparation method of the charged film emission electrode in a kind of space as claimed in claim 7, it is characterised in that：Also include with
Lower step：
Step 4：The chamfering is repaired out using the sharp keen knife edge in the emitting facet, the charged film transmitting electricity in space is prepared into
Pole.
9. a kind of application of the charged film emission electrode in space described in claim 1 to 6 any one, it is characterised in that：Institute
The front end charge device that the charged film emission electrode in space is applied to anion generator or electrostatic particle thing capturing device is stated,
Power using high voltage power supply constant current-supplying or by current-limiting resistance, the high voltage power supply is direct current or direct-current superposition pulse power source,
Voltage is 3KV to 12KV；Electric current is that constant-current source is controlled or limited by resistance, and emission current intensity is 0.1 to 1 microampere/per li
Rice.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS61174569A (en) * | 1985-01-29 | 1986-08-06 | Canon Inc | Ion generating device |
| CN1352462A (en) * | 2001-12-07 | 2002-06-05 | 清华大学 | Double insulation layer thin film field emitting cathode |
| JP2008283021A (en) * | 2007-05-11 | 2008-11-20 | Seiko Epson Corp | Organic electronic device |
| CN202522666U (en) * | 2012-03-15 | 2012-11-07 | 齐齐哈尔大学 | Point discharging measuring device |
| CN204481328U (en) * | 2014-12-31 | 2015-07-15 | 东莞市宇洁新材料有限公司 | The charged film emission electrode in a kind of space |
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