CN104503071B - Micro objective conversion equipment - Google Patents
Micro objective conversion equipment Download PDFInfo
- Publication number
- CN104503071B CN104503071B CN201410779091.3A CN201410779091A CN104503071B CN 104503071 B CN104503071 B CN 104503071B CN 201410779091 A CN201410779091 A CN 201410779091A CN 104503071 B CN104503071 B CN 104503071B
- Authority
- CN
- China
- Prior art keywords
- lifting platform
- displacement bimorph
- connector
- nosepiece
- lateral load
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/24—Base structure
- G02B21/248—Base structure objective (or ocular) turrets
Abstract
The present invention provides a kind of micro objective conversion equipment, including：Nosepiece, uses position for installing a plurality of micro objectives and turning to specific micro objective；Displacement bimorph lifting platform, annulus cylindricality, upper surface can carry out elevating movement；Installation pedestal, annulus cylindricality, upper end are connected with the lower surface of displacement bimorph lifting platform, for fixing and supporting displacement bimorph lifting platform；Connector, through displacement bimorph lifting platform and installation pedestal, top is connected with the upper surface of displacement bimorph lifting platform, and bottom is connected with the upper end of Nosepiece so that displacement bimorph lifting platform drives Nosepiece to move up and down by connector；Characterized in that, also including：Lateral load eliminating machine, is arranged between installation pedestal and connector, for offsetting the lateral load of Nosepiece generation.
Description
Technical field
The present invention relates to flying-spot microscope field, more particularly to a kind of micro objective based on displacement bimorph lifting platform turns
Changing device.
Background technology
As the development of Micrometer-Nanometer Processing Technology is progressively enriched and fine, microcircuit, micro optical element, micromechanics and other
Various micro-structurals continuously emerge so that the demand of measurement Microstructures Topography is urgent all the more.Micro-structure surface is tied by microcosmic
The complex three-dimensional structure of structure unit composition, its measurement are typically necessary by direct or indirectly micro- amplification, and are required
There are higher lateral resolution and longitudinal frame.Meanwhile, different from measurement smooth surface, measurement micro-structure surface will not only be surveyed
The roughness in scale face or flaw, also want profile, form variations and the position deviation of measurement surface.
Interfere the product that microscopy is that Through Optical Interference Spectra and microscopic system combine, by increasing micro- putting on interferometer
Big vision system, improves the lateral resolution of interference pattern such that it is able to realize the 3 d surface topography measurement of micro-nano structure.With
The development of computer technology, modern control technology and image processing techniques, interferes microscopy to occur in that certainty of measurement reaches
Nano level monochromatic light phase-shifting interferometry (PSI) and white light vertical scanning interferometric method (VSI).Both interferes microscopic measuring method
It is required for microcobjective to carry out longitudinal scanning so that confocal microscope can be according to the size of reception light intensity value by whole object plane
The height of point carries out micrometric measurement.
Microcobjective longitudinal scanning can be realized by common linear electrical guide rail.But it is micro- for similar interference
The accurate three-dimensional measurement field such as measurement and confocal micro-measurement, is often difficult to reach based on the linear electrical guide rail of various motors
The requirement of resolution ratio.Now it is accomplished by using displacement bimorph lifting platform, the piezoelectricity lifting for being based particularly on flexible hinge amplification is flat
Platform is driven come the lifting for providing microcobjective.
Longitudinal scanning microscope often also needs to provide the switching between multiple object lens using Nosepiece, so as to cut
Object lens are dismounted when changing object lens manually need not.However, after Nosepiece loads onto multiple microcobjectives, its asymmetrical structure meeting
Cause to drive the displacement bimorph lifting platform of its lifting to be subject to lateral load.If based on the piezoelectricity hoistable platform that flexible hinge amplifies
Lateral load is born, the life-span that may result in displacement bimorph lifting platform greatly shortens.
Content of the invention
The present invention be directed to what the problems referred to above were carried out, it is therefore intended that provide one kind and can eliminate asymmetrical micro objective
Micro objective conversion equipment of the converter to the lateral load caused by displacement bimorph lifting platform.
The present invention for achieving the above object, employs following technical scheme：
The present invention provides a kind of micro objective conversion equipment, including：Nosepiece, for installing a plurality of microscopes
Specific micro objective is simultaneously turned to and uses position by object lens；Displacement bimorph lifting platform, annulus cylindricality, upper surface can be carried out
Elevating movement；Installation pedestal, annulus cylindricality, upper end are connected with the lower surface of displacement bimorph lifting platform, for fixing and propping up bulging
Dielectric displacement lifting platform；Connector, through displacement bimorph lifting platform and installation pedestal, the upper surface of top and displacement bimorph lifting platform
It is connected, bottom is connected with the upper end of Nosepiece so that displacement bimorph lifting platform drives Nosepiece by connector
Move up and down；Characterized in that, also including：Lateral load eliminating machine, is arranged between installation pedestal and connector, uses
In the lateral load for offsetting Nosepiece generation.
According to the micro objective conversion equipment of the present invention, can also have the feature that：Wherein, lateral load is eliminated
Mechanism has：At least two slide rails, are separately positioned on the inner surface of installation pedestal, and the bearing of trend of slide rail is lifted with displacement bimorph
The direction of motion of the upper surface of platform is parallel；And the slide block corresponding with the number of slide rail, fasten with slide rail respectively, and with even
Fitting is fixedly linked.
According to the micro objective conversion equipment of the present invention, can also have the feature that：Wherein, lateral load is eliminated
Mechanism is linear motion bearing, cylindrical on installation pedestal inner surface, inner circle and the connector phase of the linear motion bearing
Contact.
The effect of invention and effect
According to micro objective conversion equipment involved in the present invention, because being provided between connector and installation pedestal
Lateral load eliminating machine, so as to offset the lateral load produced by the asymmetric Nosepiece for being provided with multiple object lens, because
This can protect displacement bimorph lifting platform not affected by lateral load, improve the service life of displacement bimorph lifting platform.
Description of the drawings
Fig. 1 is the structural representation of the micro objective conversion equipment of embodiment one；
Fig. 2 is the longitudinal profile schematic diagram of the lateral load eliminating machine of embodiment one；
Fig. 3 is the horizontal section schematic diagram of the lateral load eliminating machine of embodiment two；And
Fig. 4 is the longitudinal profile schematic diagram of the lateral load eliminating machine of embodiment two.
Specific embodiment
Below in conjunction with accompanying drawing, micro objective conversion equipment involved in the present invention is elaborated.
<Embodiment one>
Fig. 1 is the structural representation of the micro objective conversion equipment of embodiment one.
As shown in figure 1, micro objective conversion equipment 10 includes Nosepiece 11, displacement bimorph lifting platform 12, installs
Pedestal 13, connector 14 and lateral load eliminating machine 15.
Installation site (not shown) of the Nosepiece 11 with a plurality of micro objectives is different for installing
Micro objective.In FIG, object lens 16 and object lens 17 are only depicted as signal.Nosepiece 11 can be around its axis rotation
Turn, required micro objective is turned to position is used, the object lens 16 in such as Fig. 1.
Displacement bimorph lifting platform 12 is annulus column construction, the piezoelectricity that its upper surface can be in displacement bimorph lifting platform 12
Close elevating movement is carried out under the driving of ceramic (not shown).
Installation pedestal 13 is also round Ring-cylindrical structure, and the lower surface of its upper end and displacement bimorph lifting platform 12 is fixedly linked,
For supporting and fixing displacement bimorph lifting platform 12.
Connector 14 is used for connecting displacement bimorph lifting platform 12 and Nosepiece 11, the top of connector 14 and piezoelectric position
The upper surface for moving lifting platform 12 is fixedly linked, and the upper end of bottom and Nosepiece 11 is fixedly linked.
Lateral load eliminating machine 15 is arranged between installation pedestal 13 and connector 14, is turned for offsetting micro objective
The lateral load that parallel operation 11 is produced.
Fig. 2 is the longitudinal profile schematic diagram of the lateral load eliminating machine of embodiment one.
As shown in figure 1, in the present embodiment, lateral load eliminating machine 15 is slided with slide rail 18, slide rail 19 and accordingly
Block 20 and slide block 21.
Slide rail 18 and the relative inner surface for being arranged on installation pedestal 13 to ground of slide rail 19.
Slide block 20 and slide block 21 are separately fixed on connector 14, and are fastened with slide rail 18 and slide rail 19 respectively.Connection
When part 14 is moved up and down, slide block 20 and slide block 21 are slided up and down respectively on slide rail 18 and slide rail 19.
As shown in Figure 1, 2, the upper surface of displacement bimorph lifting platform 12 carries out close elevating movement, is carried by connector 14
Dynamic Nosepiece 11 carries out elevating movement, so as to the focus of micro objective 16 is adjusted to measured object (not shown)
Surface, to carry out microexamination.
Because Nosepiece 11 is mounted with different micro objectives in different installation sites, and only one of which is micro-
Endoscope objective lenses are located at and use position, and therefore Nosepiece 11 is unsymmetric structure, can be to displacement bimorph when elevating movement is carried out
Lifting platform 12 causes lateral load.Lateral load eliminating machine 15 is by slide rail 18 and cooperation and 19 and of slide rail of slide block 20
The lateral load that Nosepiece 11 is produced by the cooperation of slide block 21 is offset, so that displacement bimorph lifting platform 12 will not be subject to horizontal stroke
To load.
<Embodiment two>
In the present embodiment, the Nosepiece 11 of micro objective conversion equipment 10, displacement bimorph lifting platform 12, installation
The structure of pedestal 13 and connector 14 is identical with embodiment one, and micro objective conversion equipment 10 is also comprising laterally negative
Carry eliminating machine 15.
Fig. 3 is the horizontal section schematic diagram of the lateral load eliminating machine of embodiment two；
Fig. 4 is the longitudinal profile schematic diagram of the lateral load eliminating machine of embodiment two.
As shown in Figure 3,4, the lateral load eliminating machine in the present embodiment is linear motion bearing 22.
As shown in Figure 3,4, the cylindrical inner surface installed in installation pedestal 13 of linear motion bearing 22, inner circle and connector
14 outer surface matches.Linear motion bearing 22 includes the multiple bearing balls 23 for being centered around 14 circumference of connector.
When the upper surface of displacement bimorph lifting platform 12 drives Nosepiece 11 to carry out elevating movement by connector 14,
Connector 14 is slided on bearing ball 23, is to contact, enables connector 14 smoothly between connector 14 and bearing ball 23
Motion, and the lateral load counteracting that Nosepiece 11 can be produced by linear motion bearing 22, so that piezoelectric position is shifted
Drop platform 12 will not be subject to lateral load.
The effect of embodiment and effect
According to the micro objective conversion equipment of embodiment one and two, because being provided between connector and installation pedestal
Lateral load eliminating machine, by the cooperation of slide rail and slide block, or the point between linear motion bearing and connector is contacted, and is offset
The lateral load being provided with produced by the asymmetric Nosepiece of multiple object lens, therefore can protect displacement bimorph lifting platform
Do not affected by lateral load, the service life of displacement bimorph lifting platform is improved, enables the micro objective conversion equipment steady
Surely operate.
Certainly, micro objective conversion equipment involved in the present invention is not merely defined in the knot described in above example
Structure, these are only the basic explanation under present inventive concept, and any equivalent transformation that is made according to technical scheme, all
Protection scope of the present invention should be belonged to.
Claims (3)
1. a kind of micro objective conversion equipment, including：
Nosepiece, uses position for installing a plurality of micro objectives and turning to the specifically micro objective
Put；
Displacement bimorph lifting platform, annulus cylindricality, upper surface can carry out elevating movement；
Installation pedestal, annulus cylindricality, upper end are connected with the lower surface of the displacement bimorph lifting platform, described for fixing and support
Displacement bimorph lifting platform；
Connector, through the displacement bimorph lifting platform and the installation pedestal, the institute of top and the displacement bimorph lifting platform
State upper surface to be connected, bottom is connected with the upper end of the Nosepiece so that the displacement bimorph lifting platform passes through the company
Fitting is moved up and down driving the Nosepiece；
Characterized in that, also including：
Lateral load eliminating machine, is arranged between the installation pedestal and the connector, for offsetting object lens conversion
The lateral load that device is produced.
2. micro objective conversion equipment according to claim 1, it is characterised in that：
Wherein, the lateral load eliminating machine has：At least two slide rails, are separately positioned on the interior table of the installation pedestal
Face, the bearing of trend of the slide rail are parallel with the direction of motion of the upper surface of the displacement bimorph lifting platform；And with institute
The corresponding slide block of the number of slide rail is stated, is fastened with the slide rail respectively, and be fixedly linked with the connector.
3. micro objective conversion equipment according to claim 1, it is characterised in that：
Wherein, the lateral load eliminating machine is linear motion bearing, the linear motion bearing cylindrical installed in the peace
On dress base inner surface, inner circle is contacted with the connector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410779091.3A CN104503071B (en) | 2014-12-16 | 2014-12-16 | Micro objective conversion equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410779091.3A CN104503071B (en) | 2014-12-16 | 2014-12-16 | Micro objective conversion equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104503071A CN104503071A (en) | 2015-04-08 |
| CN104503071B true CN104503071B (en) | 2017-03-08 |
Family
ID=52944480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410779091.3A Expired - Fee Related CN104503071B (en) | 2014-12-16 | 2014-12-16 | Micro objective conversion equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104503071B (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10121732A1 (en) * | 2001-05-04 | 2002-11-07 | Leica Microsystems | Microscope and method for operating a microscope |
| US9335532B2 (en) * | 2001-10-16 | 2016-05-10 | Hamilton Thorne, Inc. | Laser assembly for use with a microscope |
| DE10309138A1 (en) * | 2003-02-28 | 2004-09-16 | Till I.D. Gmbh | microscope device |
-
2014
- 2014-12-16 CN CN201410779091.3A patent/CN104503071B/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN104503071A (en) | 2015-04-08 |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170308 Termination date: 20191216 |
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| CF01 | Termination of patent right due to non-payment of annual fee |