CN104492324A - Light resistance decondensation machine - Google Patents
Light resistance decondensation machine Download PDFInfo
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- CN104492324A CN104492324A CN201410735017.1A CN201410735017A CN104492324A CN 104492324 A CN104492324 A CN 104492324A CN 201410735017 A CN201410735017 A CN 201410735017A CN 104492324 A CN104492324 A CN 104492324A
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- Prior art keywords
- photoresistance
- container
- machine
- adjacent
- coagulates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F29/00—Mixers with rotating receptacles
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Centrifugal Separators (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
The invention discloses a light resistance decondensation machine. The light resistance decondensation machine comprises a machine stand, a rotating component, at least one transmission component and a motor, wherein the rotating component is arranged on the machine stand and is used for driving a light resistance container to rotate; the light resistance container is filled with a light resistance material; each transmission component is connected with the rotating component; the motor is arranged on the machine stand, is connected with the at least one transmission component and is used for driving the rotating component to rotate by virtue of the transmission components.
Description
[technical field]
The present invention relates to display floater production technical field, particularly a kind ofly coagulate machine for the photoresistance solution in display floater processing procedure.
[background technology]
At present, the resolution ratio of display floater has ever-increasing trend.
In order to adapt to this trend, the particle diameter being applied to the particle of the photoresist in CF (Color Filter, colored filter) substrate needs enough little.
But described photoresist is before being set on described CF substrate, and generally can carry out rise again (recovery temperature) under inactive state and normal temperature condition, this process of rising again generally needs more than 12 hours.
In the process that this rises again, the described photoresist be positioned in photoresistance container is in the long-time state stagnated, now, molecule in described photoresist partly can flock together because of " Fan Dewaer stress effect ", therefore, the larger particle of some particle diameters can then be formed in the described photoresist in described photoresistance container.
The particle that these particle diameters are larger can increase the weight of production line and photoresist is set to load in described CF substrate, also can affect yield and the display quality of described CF substrate simultaneously.
Therefore, be necessary to propose a kind of new technical scheme, to solve the problems of the technologies described above.
[summary of the invention]
The object of the present invention is to provide a kind of photoresistance solution to coagulate machine, it can prevent the photoresist in photoresistance container from condensing.
For solving the problem, technical scheme of the present invention is as follows:
A kind of photoresistance solution coagulates machine, and described photoresistance solution is coagulated machine and comprised: a board; One revolving member, is arranged on described board, and described revolving member rotates for driving photoresistance container, and wherein, described photoresistance container is equipped with photoresist; At least one driving member, is connected with described revolving member; One motor, is arranged on described board, and described motor is connected with at least one described driving member, for driving described revolving member to rotate by described driving member.
Coagulate in machine in above-mentioned photoresistance solution, described revolving member comprises: at least two Rotational Cylindrical, and Rotational Cylindrical described in adjacent two is used for the described photoresistance container of common carrying, and for jointly driving described photoresistance container to rotate.
Coagulate in machine in above-mentioned photoresistance solution, described in adjacent two, the first rotating shaft of Rotational Cylindrical is in the same plane, and be parallel to each other, have one first gap described in adjacent two between Rotational Cylindrical, described first gap is less than the diameter of the maximum inscribed circle of the cross section of described photoresistance container; Described in adjacent two, the rotation direction of Rotational Cylindrical is identical, and described in adjacent two, the velocity of rotation of Rotational Cylindrical is identical.
Coagulate in machine in above-mentioned photoresistance solution, described in adjacent two, the first rotating shaft of Rotational Cylindrical is positioned on same level or inclined-plane.
Coagulate in machine in above-mentioned photoresistance solution, described revolving member comprises: one first rotating basis, for carrying and fixing described photoresistance container, and for driving described photoresistance container around the second axis of rotation.
Coagulate in machine in above-mentioned photoresistance solution, described first rotating basis is used for one end of fixing described photoresistance container; Described photoresistance solution is coagulated machine and is also comprised: the second rotating basis, and described second rotating basis is used for the other end of fixing described photoresistance container, and for assisting described photoresistance container to rotate, the rotating shaft of described second rotating basis and described second rotating shaft conllinear.
Coagulate in machine in above-mentioned photoresistance solution, the 3rd angle between described second rotating shaft and horizontal plane is in 0 to 90 scope spent.
Coagulate in machine in above-mentioned photoresistance solution, described revolving member comprises: at least two roller set, and roller set described in adjacent two is used for the described photoresistance container of common carrying, and for jointly driving described photoresistance container to rotate; Wherein, described roller set comprises at least two rollers, and roller described in described roller set at least two is serially connected with in the 3rd rotating shaft.
Coagulate in machine in above-mentioned photoresistance solution, 3rd rotating shaft of roller set described in adjacent two is in the same plane, and be parallel to each other, have one second gap described in adjacent two between roller set, described second gap is less than the diameter of the maximum inscribed circle of the cross section of described photoresistance container; Described in adjacent two, the rotation direction of roller set is identical, and described in adjacent two, the velocity of rotation of roller set is identical.
Coagulate in machine in above-mentioned photoresistance solution, the 3rd rotating shaft of roller set described in adjacent two is positioned on same level or inclined-plane.
Hinge structure, the present invention can make the photoresist in photoresistance container constantly move, thus prevents photoresist from condensing.
For foregoing of the present invention can be become apparent, preferred embodiment cited below particularly, and coordinate institute's accompanying drawings, be described in detail below.
[accompanying drawing explanation]
Fig. 1 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the first embodiment of machine;
Fig. 2 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the second embodiment of machine;
Fig. 3 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 3rd embodiment of machine;
Fig. 4 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 4th embodiment of machine;
Fig. 5 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 5th embodiment of machine;
Fig. 6 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 6th embodiment of machine;
Fig. 7 is the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 7th embodiment of machine.
[detailed description of the invention]
The word " embodiment " that this description uses means to be used as example, example or illustration.In addition, the article " " used in this description and claims usually can be interpreted as meaning " one or more ", can know unless otherwise or from context and determine singulative.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the first embodiment of machine with reference to figure 1, Fig. 1.
The photoresistance solution of the present embodiment is coagulated machine and is comprised board 101, revolving member, driving member 103 and motor 102.
Described revolving member is arranged on described board 101, and described revolving member rotates for driving photoresistance container 105, and wherein, described photoresistance container 105 is equipped with photoresist.Described photoresistance container 105 is cylinder.
Described driving member 103 is connected with described revolving member.Particularly, described driving member 103 comprises gear train, and described gear train comprises first gear and at least the second gear, and described first gear intercouples with described second gear and is connected.Described first gear is for driving described second pinion rotation be of coupled connections with it.
Described motor 102 is arranged on described board 101, and described motor 102 is connected with at least one described driving member 103, for driving described revolving member to rotate by described driving member 103.Motor rotary shaft and described first gear of described motor 102 fix, and rotate around described motor rotary shaft to make described first gear.
In the present embodiment, described revolving member comprises at least two Rotational Cylindrical 104, Rotational Cylindrical 104 described in adjacent two is for jointly carrying described photoresistance container 105, and for jointly driving described photoresistance container 105 to rotate, condense (making described photoresist be in loose condition (of surface)) to prevent described photoresist.First rotating shaft of described second gear and described Rotational Cylindrical 104 fixes.
In the present embodiment, described in adjacent two, the first rotating shaft of Rotational Cylindrical 104 is in the same plane, and be parallel to each other, described in adjacent two, there is between Rotational Cylindrical 104 one first gap, described first gap is less than the diameter of the maximum inscribed circle of the cross section of described photoresistance container 105, described photoresistance container 105 can be made like this can be positioned in Rotational Cylindrical 104 described in adjacent two, and can not to drop in described first gap.
Described in adjacent two, the first rotating shaft of Rotational Cylindrical 104 is positioned in same level.
Described in adjacent two, the rotation direction of Rotational Cylindrical 104 is identical, and described in adjacent two, the velocity of rotation of Rotational Cylindrical 104 is identical.
Improve as one, the surface of described Rotational Cylindrical 104 is provided with the first cushion pad, described first cushion pad is used for contacting with described photoresistance container 105, and the active force for applying to be provided by described Rotational Cylindrical 104 to described photoresistance container 105, rotates to make described photoresistance container 105.
Pass through technique scheme, the described photoresist in described photoresistance container 105 can be made constantly to move (described photoresist is subject to continuous stirring), thus prevent described photoresist from condensing, that is, prevent from being combined as a whole between the molecule of described photoresist.
In addition, technique scheme can also make the time of moving back needed for ice (rising again) process reducing described photoresist.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the second embodiment of machine with reference to figure 2, Fig. 2.The present embodiment is similar to above-mentioned first embodiment, and difference is:
In the present embodiment, described in adjacent two, the first rotating shaft of Rotational Cylindrical 104 is positioned on same inclined-plane.First angle of described first rotating shaft and horizontal plane is in the scope of 1 degree to 89 degree.Such as, described first angle is: 1 degree, 5 degree, 10 degree, 15 degree, 25 degree, 30 degree, 35 degree, 40 degree, 45 degree, 50 degree, 55 degree, 60 degree, 65 degree, 70 degree, 75 degree, 80 degree, 85 degree, 89 degree, etc.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 3rd embodiment of machine with reference to figure 3, Fig. 3.The present embodiment is similar to above-mentioned first embodiment, and difference is:
In the present embodiment, described revolving member comprises at least two roller set 301.Roller set 301 described in adjacent two for jointly carrying described photoresistance container 105, and for jointly driving described photoresistance container 105 to rotate.
Wherein, described roller set 301 comprises at least two rollers, and described in described roller set 301 at least two, roller is serially connected with in the 3rd rotating shaft 302.Described 3rd rotating shaft 302 of described roller set 301 fixes with described second gear.
In the present embodiment, 3rd rotating shaft 302 of roller set 301 described in adjacent two is in the same plane, and be parallel to each other, have one second gap described in adjacent two between roller set 301, described second gap is less than the diameter of the maximum inscribed circle of the cross section of described photoresistance container 105.
Described in adjacent two, the rotation direction of roller set 301 is identical, and described in adjacent two, the velocity of rotation of roller set 301 is identical.
Such as, the 3rd rotating shaft 302 of roller set 301 described in adjacent two is positioned in same level.
The surface of described roller is provided with the second cushion pad, and described second cushion pad is used for contacting with described photoresistance container 105, and the active force for applying to be provided by described roller set 301 to described photoresistance container 105, rotates to make described photoresistance container 105.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 4th embodiment of machine with reference to figure 4, Fig. 4.The present embodiment is similar to above-mentioned 3rd embodiment, and difference is:
In the present embodiment, the 3rd rotating shaft 302 of roller set 301 described in adjacent two is positioned on same inclined-plane.Described 3rd rotating shaft 302 is in the scope of 1 degree to 89 degree with the second angle of horizontal plane.Such as, described second angle is: 1 degree, 5 degree, 10 degree, 15 degree, 25 degree, 30 degree, 35 degree, 40 degree, 45 degree, 50 degree, 55 degree, 60 degree, 65 degree, 70 degree, 75 degree, 80 degree, 85 degree, 89 degree, etc.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 5th embodiment of machine with reference to figure 5, Fig. 5.The present embodiment is similar to above-mentioned first embodiment, and difference is:
In the present embodiment, described revolving member comprises the first rotating basis 501.Described first rotating basis 501 for carrying and fixing described photoresistance container 105, and for driving described photoresistance container 105 around the second axis of rotation.
Described first rotating basis 501 is for one end of fixing described photoresistance container 105.Particularly, described first rotating basis 501 has clamping part, and described clamping part is for clamping one end of described photoresistance container 105.
The 3rd angle between described second rotating shaft and horizontal plane is in 0 to 90 scope spent.Such as, in the present embodiment, the 3rd angle between described second rotating shaft and horizontal plane is 0 degree.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 6th embodiment of machine with reference to figure 6, Fig. 6.The present embodiment is similar to above-mentioned 5th embodiment, and difference is:
In the present embodiment, described photoresistance solution is coagulated machine and is also comprised the second rotating basis 601.Described second rotating basis 601 for the other end of fixing described photoresistance container 105, and for assisting described photoresistance container 105 to rotate, the rotating shaft of described second rotating basis 601 and described second rotating shaft conllinear.
Be the schematic diagram that photoresistance solution of the present invention coagulates the duty of the 7th embodiment of machine with reference to figure 7, Fig. 7.The present embodiment is similar to the above-mentioned 5th or the 6th embodiment, and difference is:
In the present embodiment, described 3rd angle between described second rotating shaft and horizontal plane is 20 degree.Described 3rd angle can also be 5 degree, 10 degree, 15 degree, 25 degree, 30 degree, 35 degree, 40 degree, 45 degree, 50 degree, 55 degree, 60 degree, 65 degree, 70 degree, 75 degree, 80 degree, 85 degree, etc.
Although illustrate and describe the present invention relative to one or more implementation, those skilled in the art are based on to the reading of this description and accompanying drawing with understand and will expect equivalent variations and amendment.The present invention includes all such amendments and modification, and only limited by the scope of claims.Especially about the various functions performed by said modules, term for describing such assembly is intended to the random component (unless otherwise instructed) corresponding to the appointed function (such as it is functionally of equal value) performing described assembly, even if be not structurally equal to the open structure of the function in the exemplary implementations performing shown in this article description.In addition, although the special characteristic of this description relative in some implementations only one be disclosed, this feature can with can be such as expect and other Feature Combinations one or more of other favourable implementations for given or application-specific.And, " comprise " with regard to term, " having ", " containing " or its distortion be used in detailed description of the invention or claim with regard to, such term is intended to comprise " to comprise " similar mode to term.
In sum; although the present invention discloses as above with preferred embodiment; but above preferred embodiment is also not used to limit the present invention; those of ordinary skill in the art; without departing from the spirit and scope of the present invention; all can do various change and retouching, the scope that therefore protection scope of the present invention defines with claim is as the criterion.
Claims (10)
1. photoresistance solution coagulates a machine, it is characterized in that, described photoresistance solution is coagulated machine and comprised:
One board;
One revolving member, is arranged on described board, and described revolving member rotates for driving photoresistance container, and wherein, described photoresistance container is equipped with photoresist;
At least one driving member, is connected with described revolving member;
One motor, is arranged on described board, and described motor is connected with at least one described driving member, for driving described revolving member to rotate by described driving member.
2. photoresistance solution according to claim 1 coagulates machine, it is characterized in that, described revolving member comprises:
At least two Rotational Cylindrical, Rotational Cylindrical described in adjacent two is used for the described photoresistance container of common carrying, and for jointly driving described photoresistance container to rotate.
3. photoresistance solution according to claim 2 coagulates machine, it is characterized in that, described in adjacent two, the first rotating shaft of Rotational Cylindrical is in the same plane, and be parallel to each other, have one first gap between Rotational Cylindrical described in adjacent two, described first gap is less than the diameter of the maximum inscribed circle of the cross section of described photoresistance container;
Described in adjacent two, the rotation direction of Rotational Cylindrical is identical, and described in adjacent two, the velocity of rotation of Rotational Cylindrical is identical.
4. photoresistance solution according to claim 3 coagulates machine, it is characterized in that, described in adjacent two, the first rotating shaft of Rotational Cylindrical is positioned on same level or inclined-plane.
5. photoresistance solution according to claim 1 coagulates machine, it is characterized in that, described revolving member comprises:
One first rotating basis, for carrying and fixing described photoresistance container, and for driving described photoresistance container around the second axis of rotation.
6. photoresistance solution according to claim 5 coagulates machine, it is characterized in that, described first rotating basis is used for one end of fixing described photoresistance container;
Described photoresistance solution is coagulated machine and is also comprised:
Second rotating basis, described second rotating basis is used for the other end of fixing described photoresistance container, and for assisting described photoresistance container to rotate, the rotating shaft of described second rotating basis and described second rotating shaft conllinear.
7. photoresistance solution according to claim 5 coagulates machine, it is characterized in that, the 3rd angle between described second rotating shaft and horizontal plane is in 0 to 90 scope spent.
8. photoresistance solution according to claim 1 coagulates machine, it is characterized in that, described revolving member comprises:
At least two roller set, roller set described in adjacent two is used for the described photoresistance container of common carrying, and for jointly driving described photoresistance container to rotate;
Wherein, described roller set comprises at least two rollers, and roller described in described roller set at least two is serially connected with in the 3rd rotating shaft.
9. photoresistance solution according to claim 8 coagulates machine, it is characterized in that, 3rd rotating shaft of roller set described in adjacent two is in the same plane, and be parallel to each other, have one second gap between roller set described in adjacent two, described second gap is less than the diameter of the maximum inscribed circle of the cross section of described photoresistance container;
Described in adjacent two, the rotation direction of roller set is identical, and described in adjacent two, the velocity of rotation of roller set is identical.
10. photoresistance solution according to claim 9 coagulates machine, it is characterized in that, the 3rd rotating shaft of roller set described in adjacent two is positioned on same level or inclined-plane.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410735017.1A CN104492324A (en) | 2014-12-05 | 2014-12-05 | Light resistance decondensation machine |
| PCT/CN2014/094167 WO2016086463A1 (en) | 2014-12-05 | 2014-12-18 | Photoresist deflocculation machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410735017.1A CN104492324A (en) | 2014-12-05 | 2014-12-05 | Light resistance decondensation machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104492324A true CN104492324A (en) | 2015-04-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410735017.1A Pending CN104492324A (en) | 2014-12-05 | 2014-12-05 | Light resistance decondensation machine |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN104492324A (en) |
| WO (1) | WO2016086463A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106292184A (en) * | 2016-08-17 | 2017-01-04 | 武汉华星光电技术有限公司 | One prevents photoresistance coacervation device |
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| CN103084088A (en) * | 2011-11-01 | 2013-05-08 | 王建刚 | Mortar mixing and stirring device |
| CN203316052U (en) * | 2013-05-16 | 2013-12-04 | 安徽奥丰汽车配件有限公司 | Driving device of novel stirring system |
| CN203648447U (en) * | 2013-11-22 | 2014-06-18 | 洛阳市谱瑞慷达耐热测试设备有限公司 | Reagent stirrer special for fluoroanalyzer |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS53100166A (en) * | 1977-02-14 | 1978-09-01 | Nobu Ariyama | Powder treatment apparatus |
| CN201260949Y (en) * | 2008-09-04 | 2009-06-24 | 浙江华越芯装电子股份有限公司 | Silver colloid rolling semiautomatic agitating apparatus for cementing semiconductor chip |
| CN201357062Y (en) * | 2009-02-19 | 2009-12-09 | 上海神开石油化工装备股份有限公司 | Gas mixing device |
| CN201404790Y (en) * | 2009-03-07 | 2010-02-17 | 任增武 | Four-wheel drive tumbling barrel agitator |
| CN202516509U (en) * | 2012-01-12 | 2012-11-07 | 佛山市雅佳新型节能高分子材料有限公司 | Novel paint mixer |
| CN203281260U (en) * | 2013-05-07 | 2013-11-13 | 浙江江山三友电子有限公司 | Shaftless stirring machine for fluorescent powder |
-
2014
- 2014-12-05 CN CN201410735017.1A patent/CN104492324A/en active Pending
- 2014-12-18 WO PCT/CN2014/094167 patent/WO2016086463A1/en active Application Filing
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103084088A (en) * | 2011-11-01 | 2013-05-08 | 王建刚 | Mortar mixing and stirring device |
| CN203316052U (en) * | 2013-05-16 | 2013-12-04 | 安徽奥丰汽车配件有限公司 | Driving device of novel stirring system |
| CN203648447U (en) * | 2013-11-22 | 2014-06-18 | 洛阳市谱瑞慷达耐热测试设备有限公司 | Reagent stirrer special for fluoroanalyzer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106292184A (en) * | 2016-08-17 | 2017-01-04 | 武汉华星光电技术有限公司 | One prevents photoresistance coacervation device |
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| Publication number | Publication date |
|---|---|
| WO2016086463A1 (en) | 2016-06-09 |
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Application publication date: 20150408 |