CN104480468A - Dry type etching machine and gathering device for gathering magnetic particles in gas - Google Patents

Dry type etching machine and gathering device for gathering magnetic particles in gas Download PDF

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Publication number
CN104480468A
CN104480468A CN201410856121.6A CN201410856121A CN104480468A CN 104480468 A CN104480468 A CN 104480468A CN 201410856121 A CN201410856121 A CN 201410856121A CN 104480468 A CN104480468 A CN 104480468A
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CN
China
Prior art keywords
magnetic
device unit
filtration device
gas
housing
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410856121.6A
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Chinese (zh)
Inventor
肖文欢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to CN201410856121.6A priority Critical patent/CN104480468A/en
Priority to PCT/CN2015/070634 priority patent/WO2016106845A1/en
Publication of CN104480468A publication Critical patent/CN104480468A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C1/00Magnetic separation
    • B03C1/02Magnetic separation acting directly on the substance being separated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/08Apparatus, e.g. for photomechanical printing surfaces

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Filtering Materials (AREA)

Abstract

The invention relates to a dry type etching machine and a gathering device for gathering magnetic particles in the gas. The dry type etching machine sequentially comprises an etching device, an air draft device and the gathering device in the gas flowing direction, wherein the gathering device is arranged between the etching device and the air draft device. The gathering device comprises a casing and a magnetic filtering unit arranged in the casing. Channels are formed between the magnetic filtering unit and the casing, and/ or in the magnetic filtering unit, wherein the magnetic filtering unit can adsorb the magnetic particles in the gas flowing through the channels to prevent the magnetic particles from being deposited in the air draft device, therefore, the air draft efficiency of the air draft device is increased, and the service life of the air draft device is prolonged.

Description

Dry-etching machine and the capturing device for magnetic-particle in captured gas
Technical field
The present invention relates to a kind of dry-etching machine and a kind of capturing device for magnetic-particle in captured gas.
Background technology
Dry-etching machine along gas flow direction comprise successively etching system, can from the extractor fan of withdrawing gas in etching system and the exhaust gas processing device that can purify extractor fan expellant gas, and the pipeline for each device is connected in turn.
The etching system of this dry-etching machine can produce the gas with a large amount of magnetic-particle when carrying out dry etching to special object to be etched, the low-temperature polycrystalline silicon layer (i.e. the semiconductor active layer of array substrate) that is such as mixed with metal.The main component of this magnetic-particle comprises aluminum chloride, and (chemical formula is AlCl 3) and the muriate of molybdenum (chemical formula is MoCl x).
After dry-etching machine frequently uses, can there is deposition in the inside of extractor fan in magnetic-particle, reduce air suction efficiency and the work-ing life of extractor fan significantly.Meanwhile, magnetic-particle also can be piled up in the corner of pipeline and bottleneck, affects the smoothness of gas in pipelines.
Summary of the invention
In order to solve the problem, the object of this invention is to provide a kind of dry-etching machine, it can avoid magnetic-particle to deposit in the inside of extractor fan, thus promotes air suction efficiency and the work-ing life of extractor fan.Meanwhile, the object of the invention is to additionally provide a kind of capturing device for magnetic-particle in captured gas, it can magnetic-particle effectively in captured gas.
The invention provides a kind of dry-etching machine, it comprise can generating strap be magnetic particle gas etching system and from the extractor fan of withdrawing gas in etching system, and the capturing device for the magnetic-particle in captured gas between etching system and extractor fan can be arranged on.Capturing device comprises the housing with import and outlet, and is arranged on the Magnetic filtration device unit in housing.Between Magnetic filtration device unit and housing, and/or be formed in Magnetic filtration device unit with import with export the passage be all communicated with.Wherein, Magnetic filtration device unit is configured to when gas stream is through passage, can magnetic-particle in adsorbed gas.
In one embodiment, the passage in Magnetic filtration device unit twist or spiral type.
In one embodiment, Magnetic filtration device unit comprises multiple magnetic sheath be socketed successively, and passage comprises the multiple circular clearances be formed between magnetic sheath, and is arranged on the opening for being communicated with each circular clearance on each magnetic sheath, and adjacent opening offsets one from another.
In one embodiment, in housing, be provided with filtration core, the first surface that filtration core comprises the inwall fitting in housing with to be located on first surface and with export the blind hole be connected, and connect with passage and there is the second surface of multiple groove.
In one embodiment, capturing device also comprises the cooling mechanism that can dispel the heat to Magnetic filtration device unit.
In one embodiment, Magnetic filtration device unit is made up of magnetic fiber material.
In one embodiment, described dry-etching machine also comprises and the exhaust gas processing device that can purify described extractor fan expellant gas.
Present invention also offers a kind of capturing device for magnetic-particle in captured gas, it comprises the housing with import and outlet, and is arranged on the Magnetic filtration device unit in housing.Wherein, Magnetic filtration device unit be formed between housing and/or in Magnetic filtration device unit with import with export the passage be all communicated with, Magnetic filtration device unit is configured to when gas stream is through passage, can magnetic-particle in adsorbed gas.
In one embodiment, the passage in Magnetic filtration device unit twist or spiral type.
In one embodiment, Magnetic filtration device unit comprises multiple magnetic sheath be socketed successively, and passage comprises the multiple circular clearances be formed between magnetic sheath, and is arranged on the opening for being communicated with each circular clearance on each magnetic sheath, and adjacent opening offsets one from another.
In one embodiment, in housing, be provided with filtration core, the first surface that filtration core comprises the inwall fitting in housing with to be located on first surface and with export the blind hole be connected, and connect with passage and there is the second surface of multiple groove.
In one embodiment, capturing device also comprises the cooling mechanism that can dispel the heat to Magnetic filtration device unit.
In one embodiment, Magnetic filtration device unit is made up of magnetic fiber material.
By the magnetic-particle in its capturing device captured gas, magnetic-particle can be avoided thus to enter in extractor fan and to deposit according to dry-etching machine of the present invention, thus improve air suction efficiency and the work-ing life of extractor fan.Simultaneously, in pipeline and exhaust gas processing device that this capturing device can also be avoided magnetic-particle to enter into being in capturing device downstream, pipeline and the exhaust gas processing device of magnetic-particle clog downstream can be avoided thus, especially avoid the corner in blocking pipe and bottleneck.
In addition, easily, use safety, is convenient to practice and extension application for, assembling simple according to the structure of dry-etching machine of the present invention and capturing device.
Accompanying drawing explanation
Also will be described in more detail the present invention with reference to accompanying drawing based on embodiment hereinafter.Wherein:
Fig. 1 is the structural representation according to dry-etching machine of the present invention;
Fig. 2 is the longitudinal sectional view of the capturing device according to dry-etching machine of the present invention; And
Fig. 3 is the transverse sectional view of the capturing device according to dry-etching machine of the present invention.
Parts identical in the accompanying drawings use identical Reference numeral.Accompanying drawing is not according to the scale of reality.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
Fig. 1 shows according to dry-etching machine 50 of the present invention.This dry-etching machine 50 comprises etching system 20.Etching system 20 can produce the gas with a large amount of magnetic-particle when carrying out dry etching to special object to be etched, the low-temperature polycrystalline silicon layer (i.e. the semiconductor active layer of array substrate) that is such as mixed with metal.The main component of this magnetic-particle comprises the muriate of AlCl3 aluminum chloride and MoClx molybdenum.These magnetic-particles only have can appear magnetic after magnetization, its can by band magnetic material, such as electro-magnet or permanent magnet attract.
Meanwhile, this dry-etching machine 50 also comprises and from the extractor fan 30 of withdrawing gas in etching system 20, and can be arranged on the capturing device 10 between etching system 20 and extractor fan 30.Wherein, extractor fan 30 is chosen as vacuum fan.In addition, this dry-etching machine 50 also can comprise the exhaust gas processing device 40 be connected with extractor fan 30.This exhaust gas processing device 40 can dust in Purge gas and pollutent, to discharge clean and clean gas.Wherein, described etching system 20 and exhaust gas processing device 40 all belong to well known to those skilled in the art, and no further details to be given herein.
Each device in dry-etching machine 50 of the present invention is connected in turn by pipeline, pipeline comprises the first pipeline 21 of connecting etching system 20 and capturing device 10 and is connected the second pipe 22 of capturing device 10 and extractor fan 30, and the 3rd pipeline 23 of connection extractor fan 30 and exhaust gas processing device 40.Wherein, the bottleneck 23a occurred in the corner 22a occurred in second pipe 22 and the 3rd pipeline 23 and corner 23b belongs to easy blocking position, existing dry-etching machine needs periodic cleaning usually, and dry-etching machine 50 of the present invention can address this problem, detail as per hereafter.
As shown in Figures 2 and 3, capturing device 10 comprises roughly cylindrical housing 5.Certainly, housing 5 also can be other shapes.Housing 5 has import 2 and outlet 3.Capturing device 10 also comprises the Magnetic filtration device unit 6 be arranged in housing 5.Between Magnetic filtration device unit 6 and housing 5, and/or be formed with passage 7 in Magnetic filtration device unit 6.Passage 7 and the import 2 on housing 5 with export 3 and be all communicated with.Because Magnetic filtration device unit 6 has magnetic, therefore it can adsorb the magnetic-particle in the gas flowing through passage 7.In this way, magnetic-particle can be avoided to enter into and to be in the extractor fan 30 in capturing device 10 downstream, magnetic-particle can be avoided thus to deposit in extractor fan 30, thus improve air suction efficiency and the work-ing life of extractor fan 30.
Simultaneously, in the pipeline that capturing device 10 can also be avoided magnetic-particle to enter into being in capturing device 10 downstream and exhaust gas processing device 40, pipeline and the exhaust gas processing device 40 of magnetic-particle clog downstream can be avoided thus, especially the easy blocking position of blocking pipe is avoided, easy blocking position and corner 22a and bottleneck 23a and corner 23b, refer to Fig. 1.
In a preferred embodiment, Magnetic filtration device unit 6 is made up of magnetic fiber material.Because magnetic fiber material itself has a lot of space, therefore lacunose magnetic fiber material not only can guarantee that Magnetic filtration device unit 6 has good permeability, but also can hold more magnetic-particle, extends the work-ing life of Magnetic filtration device unit 6.Meanwhile, magnetic-particle forms macrobead after piling up, and gas also can be allowed between macrobead to pass through.In addition, the magnetic fiber material of porous can alleviate the weight of capturing device 10.In addition, Magnetic filtration device unit 6 also can be with magnetic material to make by other, such as electro-magnet or permanent magnet.
In order to improve the adsorptive power of Magnetic filtration device unit 6, the passage 7 in Magnetic filtration device unit 6 can be configured to volution or spiral type.That is, the medullary ray of passage 7 is similar to spiral-line or line of whirl.In this way, the mobile route of gas can be increased, extend trapping or adsorption time, improve the trapping ability of Magnetic filtration device unit 6.
In addition, the trapping ability of Magnetic filtration device unit 6 can also be improved in the following manner.Magnetic filtration device unit 6 comprises multiple magnetic sheath 61 be socketed successively.Passage 7 comprises the multiple circular clearances 71 be formed between each magnetic sheath 61, and is arranged on the opening 72 for being communicated with each circular clearance 71 on each magnetic sheath 61.Wherein, adjacent opening 72 is arranged to offset one from another.Preferably, adjacent any two openings 72 are respectively near top and the bottom of housing 5.Because the opening 72 staggered can increase the mobile route of gas, extend the trapping time, improve the trapping ability of Magnetic filtration device unit 6.
In a preferred embodiment, in housing 5, filtration core 8 is provided with.Filtration core 8 has the first surface 81 fixing with the inwall of housing 5, and the second surface 82 connected with passage 7.Filtration core 8 can cylindrical or semisphere.Not magnetic particle can be removed by filtration core 8.Filtration core 8 is preferably polypropylene foldable filter element, its be a kind of advanced person fixed Depth Filtration core, filtering accuracy scope can from 0.1um to 60um.Filtration core shown in Fig. 2 is cylindrical, and its end face is first surface 81, and bottom surface and periphery are second surface 82.Wherein, first surface 81 be provided with and export 3 blind holes be connected 83, to improve the ventilation property of filtration core 8.In addition, second surface 82 is provided with multiple groove 84, groove 84 can increase the air inlet area during air inlet of filtration core 8, can promote the filtration efficiency of filtration core 8 thus.
But because the temperature of the gas etching rear generation is higher, can reduce the magnetic of Magnetic filtration device unit 6 thus affect trapping effect, therefore dry-etching machine 50 of the present invention also comprises the cooling mechanism 9 that can dispel the heat to Magnetic filtration device unit 6.After cooling mechanism 9 pairs of Magnetic filtration device unit 6 dispel the heat, the trapping effect of Magnetic filtration device unit 6 can be improved, its work-ing life can also be extended simultaneously.In addition, the mode of this cooling also helps the gathering of magnetic-particle, again improves trapping effect.
In one embodiment, cooling mechanism 9 elects Water-cooled heat radiation mechanism as.This Water-cooled heat radiation mechanism comprises that to be wrapped in housing 5 outer and form the overcoat 91 of annular chamber 94, and arranges the water inlet 92 at two ends and the water outlet 93 of annular chamber 94.When pump is sent to cooling fluid in annular chamber 94, just radiating and cooling can be carried out to Magnetic filtration device unit 6.
By the magnetic-particle in its capturing device 10 captured gas, magnetic-particle can be avoided to enter in extractor fan 30 and to deposit, air suction efficiency and the work-ing life of extractor fan 30 can be promoted thus according to dry-etching machine 50 of the present invention.Simultaneously, in the pipeline that this capturing device 10 can also be avoided magnetic-particle to enter into being in capturing device 10 downstream and exhaust gas processing device 40, pipeline and the exhaust gas processing device 40 of magnetic-particle clog downstream can be avoided thus, especially the easy blocking position in blocking pipe is avoided, described easy blocking position and corner 22a and bottleneck 23a and corner 23b.
Although invention has been described with reference to preferred embodiment, without departing from the scope of the invention, various improvement can be carried out to it and parts wherein can be replaced with equivalent.Especially, only otherwise there is structural hazard, the every technical characteristic mentioned in each embodiment all can combine in any way.The present invention is not limited to specific embodiment disclosed in literary composition, but comprises all technical schemes fallen in the scope of claim.

Claims (10)

1. a dry-etching machine, comprise can generating strap be magnetic particle gas etching system and the extractor fan of described gas can be aspirated in described etching system, and the capturing device for trapping the magnetic-particle in described gas be arranged between described etching system and extractor fan, wherein said capturing device comprises the housing with import and outlet, and the Magnetic filtration device unit be arranged in described housing, between wherein said Magnetic filtration device unit and housing, and/or be formed in described Magnetic filtration device unit with described import with export the passage be all communicated with, described Magnetic filtration device unit is configured to when described gas stream is through described passage, the magnetic-particle in described gas can be adsorbed.
2. dry-etching machine according to claim 1, is characterized in that, the described passage in described Magnetic filtration device unit twist or spiral type.
3. dry-etching machine according to claim 1, it is characterized in that, described Magnetic filtration device unit comprises multiple magnetic sheath be socketed successively, described passage comprises the multiple circular clearances be formed between described magnetic sheath, and the opening for being communicated with each described circular clearance be arranged on each described magnetic sheath, adjacent described opening offsets one from another.
4. dry-etching machine according to claim 3, it is characterized in that, filtration core is provided with in described housing, the first surface that described filtration core comprises the inwall fitting in described housing be located at the blind hole be connected on described first surface and with described outlet, and connect with described passage and there is the second surface of multiple groove.
5. the dry-etching machine according to any one of claim 1 to 4, is characterized in that, also comprises the cooling mechanism that can dispel the heat to described Magnetic filtration device unit.
6. the dry-etching machine according to any one of claim 1 to 4, is characterized in that, described Magnetic filtration device unit is made up of magnetic fiber material.
7. the capturing device for magnetic-particle in captured gas, comprise the housing with import and outlet, and the Magnetic filtration device unit be arranged in described housing, wherein, described Magnetic filtration device unit be formed between housing and/or in described Magnetic filtration device unit with described import with export the passage be all communicated with, described Magnetic filtration device unit is configured to, when described gas stream is through described passage, can adsorb the magnetic-particle in described gas.
8. capturing device according to claim 7, is characterized in that, the described passage in described Magnetic filtration device unit twist or spiral type.
9. capturing device according to claim 7, it is characterized in that, described Magnetic filtration device unit comprises multiple magnetic sheath be socketed successively, described passage comprises the multiple circular clearances be formed between described magnetic sheath, and the opening for being communicated with each described circular clearance be arranged on each described magnetic sheath, adjacent described opening offsets one from another.
10. the capturing device according to any one of claim 7 to 9, is characterized in that, described Magnetic filtration device unit is made up of magnetic fiber material.
CN201410856121.6A 2014-12-31 2014-12-31 Dry type etching machine and gathering device for gathering magnetic particles in gas Pending CN104480468A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201410856121.6A CN104480468A (en) 2014-12-31 2014-12-31 Dry type etching machine and gathering device for gathering magnetic particles in gas
PCT/CN2015/070634 WO2016106845A1 (en) 2014-12-31 2015-01-13 Dry etching machine and gathering device for gathering magnetic particles in gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410856121.6A CN104480468A (en) 2014-12-31 2014-12-31 Dry type etching machine and gathering device for gathering magnetic particles in gas

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107956554A (en) * 2017-11-20 2018-04-24 南京理工大学 High-efficiency low-pollution dynamical system based on nano-fluid fuel
CN108019253A (en) * 2017-11-20 2018-05-11 南京理工大学 Magnetism granule filter
CN109424392A (en) * 2017-08-31 2019-03-05 南京理工大学 High-efficient low polluting combustion system based on nano-fluid fuel
CN110314764A (en) * 2019-06-25 2019-10-11 广东粤东机械实业有限公司 A kind of steam derusting device

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* Cited by examiner, † Cited by third party
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IT201700040561A1 (en) * 2017-04-12 2018-10-12 2 Zeta Srl FILTRATION SYSTEM FOR GAS CONTAINING METALLIC PARTICLES

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013071A (en) * 1983-07-01 1985-01-23 Canon Inc Evacuating system of device for vapor phase method
JPS60159178A (en) * 1984-01-27 1985-08-20 Nec Corp Dry etching device
US20050000201A1 (en) * 2001-08-10 2005-01-06 Keiji Tanaka Apparatus for and method of trapping products in exhaust gas
US20130248112A1 (en) * 2012-03-21 2013-09-26 International Business Machines Corporation Vacuum trap

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6315819B1 (en) * 1996-11-15 2001-11-13 Nec Corporation Apparatus for making exhaust gas non-toxic
JP2002153726A (en) * 2000-11-21 2002-05-28 Akiji Nishiwaki Exhaust gas treatment device
JP2004160312A (en) * 2002-11-11 2004-06-10 Masuhiro Kokoma Pfc gas decomposition system and method used for the same
GB0521944D0 (en) * 2005-10-27 2005-12-07 Boc Group Plc Method of treating gas
GB0522088D0 (en) * 2005-10-28 2005-12-07 Boc Group Plc Plasma abatement device
CN103556152B (en) * 2013-11-11 2015-08-05 浙江科菲科技股份有限公司 A kind of mixed chlorinated copper spent etching solution synthetical recovery treatment process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013071A (en) * 1983-07-01 1985-01-23 Canon Inc Evacuating system of device for vapor phase method
JPS60159178A (en) * 1984-01-27 1985-08-20 Nec Corp Dry etching device
US20050000201A1 (en) * 2001-08-10 2005-01-06 Keiji Tanaka Apparatus for and method of trapping products in exhaust gas
US20130248112A1 (en) * 2012-03-21 2013-09-26 International Business Machines Corporation Vacuum trap

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109424392A (en) * 2017-08-31 2019-03-05 南京理工大学 High-efficient low polluting combustion system based on nano-fluid fuel
CN109424392B (en) * 2017-08-31 2021-06-04 南京理工大学 Efficient low-pollution combustion system based on nano fluid fuel
CN107956554A (en) * 2017-11-20 2018-04-24 南京理工大学 High-efficiency low-pollution dynamical system based on nano-fluid fuel
CN108019253A (en) * 2017-11-20 2018-05-11 南京理工大学 Magnetism granule filter
CN107956554B (en) * 2017-11-20 2024-04-05 南京理工大学 Efficient low-pollution power system based on nanofluid fuel
CN110314764A (en) * 2019-06-25 2019-10-11 广东粤东机械实业有限公司 A kind of steam derusting device

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