CN104451590A - Vacuum system and vacuum coating method - Google Patents
Vacuum system and vacuum coating method Download PDFInfo
- Publication number
- CN104451590A CN104451590A CN201410628164.9A CN201410628164A CN104451590A CN 104451590 A CN104451590 A CN 104451590A CN 201410628164 A CN201410628164 A CN 201410628164A CN 104451590 A CN104451590 A CN 104451590A
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- China
- Prior art keywords
- chamber
- inlet side
- vacuum
- hold
- transition chamber
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a vacuum system and a vacuum coating method. The vacuum system comprises a conveying device which sequentially passes through an inlet end lock chamber, an inlet buffer chamber, an inlet end transition chamber, a technical chamber, an outlet end transition chamber, an outlet end buffer chamber and an outlet end lock chamber which are arranged in a manner of being isolated from one another, wherein the inlet end lock chamber and the outlet end lock chamber are respectively connected with a mechanical pump so as to be emptied; the inlet end transition chamber, the technical chamber and the outlet end transition chamber are respectively connected with a molecular pump so as to be emptied; the inlet end buffer chamber and the outlet end buffer chamber are respectively used for regulating the conveying speed of the conveying device. The vacuum system can be used for effectively preventing entrance of air during coating.
Description
Technical field
The present invention relates to magnetron sputtering field, particularly, relate to a kind of vacuum system and vacuum coating method.
Background technology
In the prior art, the plating conditions of glass is required it is very harsh, have when plated film air to enter the film that glass will be caused to plate ineligible, defective, avoid entering of air when glass so how can be allowed to carry out plated film, become a kind of problem needing solution badly.
Summary of the invention
The object of the invention is to overcome vacuum system of the prior art the has air problem entered when plated film, provide a kind of vacuum system and vacuum coating method, this vacuum system effectively can prevent having air to enter during plated film.
To achieve these goals, the invention provides a kind of vacuum system, this vacuum system comprise e Foerderanlage, described e Foerderanlage successively by lock room, inlet side, inlet side surge chamber, inlet side transition chamber, the chamber of isolated setting, go out to hold transition chamber, go out to hold surge chamber and go out end lock room, wherein, lock room, described inlet side and described go out end lock room be connected to mechanical pump to find time, described inlet side transition chamber, chamber and go out to hold transition chamber to be connected to molecular pump to find time, described inlet side surge chamber and go out to hold surge chamber to adjust the transfer rate of e Foerderanlage respectively.
Preferably, inlet side channel isolation is communicated with between described chamber and described inlet side transition chamber; Described chamber and described go out to hold between transition chamber be communicated with out end channel isolation.
Preferably, described inlet side channel isolation and describedly go out to hold channel isolation to be all open ports pipeline.
Preferably, the pumping hole of described molecular pump is provided with pneumatic power lifting valve, bleeds to control described molecular pump.
Preferably, lock room, described inlet side, inlet side transition chamber, go out end lock room and go out to hold on transition chamber and be all provided with cover plate, described cover plate is sealed by sealing-ring.
Preferably, described mechanical pump is standard sliding vane rotary pump, slide valve pump or dry pump.
The invention provides a kind of vacuum coating method, according to above-mentioned vacuum system, the method comprises:
S101, is placed in the lock room, described inlet side of the first vacuum environment by membrane to be plated;
S102, inlet side is locked membrane described to be plated in room by described drive unit with the first actuating speed successively respectively through the inlet side surge chamber and the inlet side transition chamber that have the second vacuum environment;
S103, is sent to the chamber of second vacuum environment to carry out plated film by described drive unit with the second actuating speed by the membrane described to be plated in the transition chamber of inlet side;
S104, by the membrane described to be plated in chamber by described drive unit with the second actuating speed be sent to the second vacuum environment go out to hold transition chamber;
S105, by the membrane described to be plated going out to hold in transition chamber by described drive unit with the first actuating speed be sent to the second vacuum environment go out to hold surge chamber;
S106, locks room by the end that goes out that the membrane described to be plated going out to hold in surge chamber is sent to the first vacuum environment by described drive unit with the first actuating speed.
Preferably, the pressure of described first vacuum environment is 10
-4torr.
Preferably, the pressure of described first vacuum environment is 10-3torr.
Preferably, be communicated with inlet side channel isolation between described chamber and described inlet side transition chamber to carry out Signal transmissions, be communicated with out end channel isolation between described chamber and described inlet side transition chamber to carry out Signal transmissions.
By above-mentioned embodiment, vacuum system of the present invention overcomes the transformation be provided with from black vacuum to high vacuum by inlet side surge chamber, glass is found time complete here, before can carrying out plated film, glass does temporary transient stop here, it can also be used to isolation technology room, prevents gas from entering coating chamber from lock room.Inlet side transition chamber completes the transformation of the slow transmission speed needed from normal transmission speed to plated film, also for carrying out vacuum insulation further and vacuumizing.
Other features and advantages of the present invention are described in detail in embodiment part subsequently.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and forms a part for specification sheets, is used from explanation the present invention, but is not construed as limiting the invention with embodiment one below.In the accompanying drawings:
Fig. 1 is the structural representation of the embodiment that vacuum system of the present invention is described.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.Should be understood that, embodiment described herein, only for instruction and explanation of the present invention, is not limited to the present invention.
In the present invention, when not doing contrary explanation, the noun of locality such as " upper and lower, left and right " of use typically refers to concrete structure as shown in Figure 1 up and down, and it is interior and outer that " inside and outside " refers on concrete profile.It is far away and near that " far away, near " refers to relative to certain device.
The invention provides a kind of vacuum system, this vacuum system comprise e Foerderanlage, described e Foerderanlage successively by lock room, inlet side, inlet side surge chamber, inlet side transition chamber, the chamber of isolated setting, go out to hold transition chamber, go out to hold surge chamber and go out end lock room, wherein, lock room, described inlet side and described go out end lock room be connected to mechanical pump to find time, described inlet side transition chamber, chamber and go out to hold transition chamber to be connected to molecular pump to find time, described inlet side surge chamber and go out to hold surge chamber to adjust the transfer rate of e Foerderanlage respectively.
By above-mentioned embodiment, the lock room, inlet side of vacuum system of the present invention can make glass enter black vacuum environment from air; Inlet side surge chamber can complete the transformation from black vacuum to high vacuum, glass is found time complete here, before can carrying out plated film, glass does temporary transient stop here, it is also used for isolation technology room, prevent gas from entering chamber from lock room, inlet side, inlet side transition chamber completes the transformation of the slow transmission speed needed from normal transmission speed to plated film, also for carrying out vacuum insulation further and vacuumizing; Can be there is several process island in chamber, have a gas barrier district before or after each process island, glass carries out plated film in each process island, utilize be arranged on pump take out part or valve chamber in two-phonon process measuring apparatus can monitor transmitance; Go out to hold transition chamber that glass can be made to accelerate to leave chamber; Going out to hold transition chamber to complete plated film transmission speed slowly and, to the conversion of normal transmission speed, in addition, isolation technology room can also be helped, preventing gas from entering chamber from going out end lock room; Go out to hold surge chamber can before going out end lock room can receive glass, it temporarily can preserve glass, in addition, can also help isolated vacuum room, prevents gas from being entered from going out end lock room by slit valve; Going out end lock room can make glass complete conversion from vacuum chamber to atmospheric environment.
Below in conjunction with accompanying drawing, 1 couple of the present invention is further detailed, and in the present invention, the method for being carried out vacuum plating by this system also belongs to the scope of protection of the invention.
In this kind of embodiment, between described chamber and described inlet side transition chamber, be communicated with inlet side channel isolation; Described chamber and described go out to hold between transition chamber be communicated with out end channel isolation; The present invention utilizes a long opening conduit being called gas barrier passage, communication can be carried out with the gas barrier room on side in process island, the cross section of access portal is smaller, so just can allow to there are some pressure reduction between the plated film part and adjacent room of process island, by this passage, differential pump can assist isolation plated film position, prevent gas from entering process island from other room body, thus the pollution suffered by the gas of process island is dropped to minimum, due to suitable sputtering pressure will be maintained, so this decreases the gas load of molecular pump simultaneously.In this kind preferably embodiment, described inlet side channel isolation and describedly go out to hold channel isolation to be all open ports pipeline.
In this kind of embodiment, the pumping hole of described molecular pump is provided with pneumatic power lifting valve, bleeds to control described molecular pump.
In this kind of embodiment, according to correct vacuum practical experience, during structure room body, the position of junction chamber body flange must adopt one-sided welding, double-faced forming welding technique.The weld seam of having family in body should be continuous print, the skip welding used by such welding and outside is contributed to hunting leak and reduces possible false leak.Lock room and transition chamber all assemble a cover plate with seal with O ring, and this O shape circle is fixed on cover plate flange, utilizes liquid driven to open cover plate; On chamber, each unit has oneself cover plate; Sputtering source cathode assembly is suspended from the cover plate of each process portion.Turbo-molecular pump is assemblied on each pump cover, therefore, lock room, described inlet side, inlet side transition chamber, goes out end lock room and go out to hold can by being provided with cover plate and being sealed by sealing-ring on transition chamber.
In this kind of embodiment, in order to realize above-mentioned functions, described mechanical pump is preferably standard sliding vane rotary pump, slide valve pump or dry pump.
The present invention also provides a kind of vacuum coating method, and according to above-mentioned vacuum system, the method comprises:
S101, is placed in the lock room, described inlet side of the first vacuum environment by membrane to be plated;
S102, inlet side is locked membrane described to be plated in room by described drive unit with the first actuating speed successively respectively through the inlet side surge chamber and the inlet side transition chamber that have the second vacuum environment;
S103, is sent to the chamber of second vacuum environment to carry out plated film by described drive unit with the second actuating speed by the membrane described to be plated in the transition chamber of inlet side;
S104, by the membrane described to be plated in chamber by described drive unit with the second actuating speed be sent to the second vacuum environment go out to hold transition chamber;
S105, by the membrane described to be plated going out to hold in transition chamber by described drive unit with the first actuating speed be sent to the second vacuum environment go out to hold surge chamber;
S106, locks room by the end that goes out that the membrane described to be plated going out to hold in surge chamber is sent to the first vacuum environment by described drive unit with the first actuating speed.
When processing glass, time every sheet glass enters or leaves, lock room, inlet side and go out end lock room all must put an air, in order to accelerate pumping speed, a Large Copacity Roots blower pump has been installed in each lock room, then parallelly in the exit of topping-up pump is connected to some mechanical pumps.Although these pump groups are very fast, lock room can only be extracted into black vacuum.Chamber, lock room, inlet side, go out end lock room and inlet side surge chamber and go out to hold surge chamber also to adopt mechanical pump group, also adopt high-vacuum pump (turbo-molecular pump) in some cases.
In this kind of method, the pressure of described first vacuum environment is 10-4torr.
In this kind of method, the pressure of described first vacuum environment is 10
-3torr, this is the pressure range that the process gas of process island must keep.
In this kind of method, be communicated with inlet side channel isolation between described chamber and described inlet side transition chamber to carry out Signal transmissions, be communicated with out end channel isolation between described chamber and described inlet side transition chamber to carry out Signal transmissions.
Below the preferred embodiment of the present invention is described in detail by reference to the accompanying drawings; but; the present invention is not limited to the detail in above-mentioned embodiment; within the scope of technical conceive of the present invention; can carry out multiple simple variant to technical scheme of the present invention, these simple variant all belong to protection scope of the present invention.
It should be noted that in addition, each concrete technical characteristic described in above-mentioned embodiment, in reconcilable situation, can be combined by any suitable mode, in order to avoid unnecessary repetition, the present invention illustrates no longer separately to various possible array mode.
In addition, also can carry out arbitrary combination between various different embodiment of the present invention, as long as it is without prejudice to thought of the present invention, it should be considered as content disclosed in this invention equally.
Claims (10)
1. a vacuum system, it is characterized in that, this vacuum system comprise e Foerderanlage, described e Foerderanlage successively by lock room, inlet side, inlet side surge chamber, inlet side transition chamber, the chamber of isolated setting, go out to hold transition chamber, go out to hold surge chamber and go out end lock room, wherein, lock room, described inlet side and described go out end lock room be connected to mechanical pump to find time, described inlet side transition chamber, chamber and go out to hold transition chamber to be connected to molecular pump to find time, described inlet side surge chamber and go out to hold surge chamber to adjust the transfer rate of e Foerderanlage respectively.
2. vacuum system according to claim 1, is characterized in that, is communicated with inlet side channel isolation between described chamber and described inlet side transition chamber; Described chamber and described go out to hold between transition chamber be communicated with out end channel isolation.
3. vacuum system according to claim 2, is characterized in that, described inlet side channel isolation and describedly go out to hold channel isolation to be all open ports pipeline.
4. vacuum system according to claim 1, is characterized in that, the pumping hole of described molecular pump is provided with pneumatic power lifting valve, bleeds to control described molecular pump.
5. vacuum system according to claim 1, is characterized in that, lock room, described inlet side, inlet side transition chamber, goes out end lock room and goes out to hold on transition chamber and be all provided with cover plate, and described cover plate is sealed by sealing-ring.
6. vacuum system according to claim 1, is characterized in that, described mechanical pump is standard sliding vane rotary pump, slide valve pump or dry pump.
7. a vacuum coating method, is characterized in that, the vacuum system according to claim 1-5, and the method comprises:
S101, is placed in the lock room, described inlet side of the first vacuum environment by membrane to be plated;
S102, inlet side is locked membrane described to be plated in room by described drive unit with the first actuating speed successively respectively through the inlet side surge chamber and the inlet side transition chamber that have the second vacuum environment;
S103, is sent to the chamber of second vacuum environment to carry out plated film by described drive unit with the second actuating speed by the membrane described to be plated in the transition chamber of inlet side;
S104, by the membrane described to be plated in chamber by described drive unit with the second actuating speed be sent to the second vacuum environment go out to hold transition chamber;
S105, by the membrane described to be plated going out to hold in transition chamber by described drive unit with the first actuating speed be sent to the second vacuum environment go out to hold surge chamber;
S106, locks room by the end that goes out that the membrane described to be plated going out to hold in surge chamber is sent to the first vacuum environment by described drive unit with the first actuating speed.
8. vacuum coating method according to claim 6, is characterized in that, the pressure of described first vacuum environment is 10
-4torr.
9. vacuum coating method according to claim 6, is characterized in that, the pressure of described first vacuum environment is 10
-3torr.
10. vacuum coating method according to claim 6, it is characterized in that, be communicated with inlet side channel isolation between described chamber and described inlet side transition chamber to carry out Signal transmissions, be communicated with out end channel isolation between described chamber and described inlet side transition chamber to carry out Signal transmissions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410628164.9A CN104451590A (en) | 2014-11-10 | 2014-11-10 | Vacuum system and vacuum coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410628164.9A CN104451590A (en) | 2014-11-10 | 2014-11-10 | Vacuum system and vacuum coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104451590A true CN104451590A (en) | 2015-03-25 |
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ID=52898325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410628164.9A Pending CN104451590A (en) | 2014-11-10 | 2014-11-10 | Vacuum system and vacuum coating method |
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| Country | Link |
|---|---|
| CN (1) | CN104451590A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106282928A (en) * | 2016-08-10 | 2017-01-04 | 福建新福兴玻璃有限公司 | A kind of coating film on glass production line |
-
2014
- 2014-11-10 CN CN201410628164.9A patent/CN104451590A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106282928A (en) * | 2016-08-10 | 2017-01-04 | 福建新福兴玻璃有限公司 | A kind of coating film on glass production line |
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Application publication date: 20150325 |