CN104446667B - Method and device for producing surface self-cleaning tiles - Google Patents
Method and device for producing surface self-cleaning tiles Download PDFInfo
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- CN104446667B CN104446667B CN201410603783.2A CN201410603783A CN104446667B CN 104446667 B CN104446667 B CN 104446667B CN 201410603783 A CN201410603783 A CN 201410603783A CN 104446667 B CN104446667 B CN 104446667B
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- plated film
- ceramic tile
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- cleaning
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Abstract
The invention discloses a method for producing surface self-cleaning tiles. The method comprises the following steps: performing dip-coating, performing water jet cutter coating and performing roller kiln sintering, namely performing dip-coating on tiles and drying to form a sol-gel film I on the surface; performing water jet cutter coating and drying to form a sol-gel film II on the sol-gel film I; and finally, performing roller kiln sintering to form a nanometer self-cleaning film on the tile surface. The device for producing surface self-cleaning tiles disclosed by the invention sequentially comprises a sample introduction platform, a dip-coating machine, a drying device, a water jet cutter coating machine, a roller kiln and a discharging platform. According to the method and the device for producing the surface self-cleaning tiles disclosed by the invention, the thickness and uniformity of the surface coating layer can be strictly controlled, and finally a nanoparticle coating with excellent surface self-cleaning performance is obtained.
Description
Technical field
The invention belongs to building Material Field, it is related to a kind of preparation method of special ceramic tile and corresponding device, especially
It is related to a kind of method and device producing self-cleaning surface ceramic tile.
Background technology
Ceramic tile is a kind of common constructure decorative material, is widely used in interior and exterior decoration, the ceramic tile currently commonly used
Generally existing is easily adhered to by dirt, needs the problem of fixed time cleaning, and clear after the organic pollution such as ceramic tile surface adhesion greasy dirt
Wash difficulty, need special abluent could clean successfully, considerably increase labor intensity.
Surface nanotechnology is the new technique in substrate surface preparation with self-cleaning nano structure function layer, nano surface work(
Ergosphere ultraviolet irradiation under, can by the organic efficients such as the greasy dirt of outdoor tile surface attachment be degraded into carbon dioxide and
Water；Meanwhile, nano surface functional layer has good hydrophilicity, and hardly possible is combined with inorganic pollution, thus avoiding inorganic dirt
The pollution that the dusts such as dye thing such as silicon dioxide are brought；In addition, when rainwater falls in nano surface functional layer, being diffused to rapidly
Functional layer whole surface, equably rinses out the pollutant on outdoor tile surface, will not leave behind ugly streak.
At present, the production technology of self-cleaning surface glass is more ripe, but the production technology of self-purging ceramic tile is big
Stay in laboratory stage more, and the unrealized marketization produces.
Content of the invention
In view of this, it is an object of the invention to provide a kind of method of large-scale production self-cleaning surface ceramic tile and dress
Put.
For reaching above-mentioned purpose, the present invention following technical scheme of offer:
A kind of method producing self-cleaning surface ceramic tile, including dipping plated film, water knife plated film and roller kilns sintering step；Porcelain
Brick through dipping plated film and is dried, and forms colloidal sol-gel film i on surface, then through water knife plated film and dry, in colloidal sol-coagulate
Form colloidal sol-gel film ii on glue thin film i, form nano self-cleaning in ceramic tile surface after eventually passing roller kilns sintering thin
Film.
Preferred as production method of the present invention, the described plated film and/or coating liquid used by water knife plating steps of impregnating is to receive
Rice titania sol liquid.
Preferred as production method of the present invention, in described dipping filming process, the dipping plated film time is 10～15 seconds, tiltedly
Face pull rate is 120～180cm/min, and baking temperature is 70-90 DEG C, and drying time is 10～15 seconds.
Preferred as production method of the present invention, the described water knife plating steps plated film time is 20～30 seconds.
Preferred as production method of the present invention, described roller kiln burning step is divided presintering, is burnt till and cooling stage；Its
In: pre-sintered state sintering temperature is 260～280 DEG C, and burn-in time is 35～45min；Burn till stage sintering temperature 460～
480 DEG C, sintering time 180～200min；Cooling stage adopts furnace cooling, and cool time is 150～160min.
Preferred as production method of the present invention, the thickness of described colloidal sol-gel film i is 4-6nm, described colloidal sol-solidifying
The thickness of glue thin film ii is 4-6nm.
Preferred as production method of the present invention, the described plated film and/or water knife coating times of impregnating is one or many, thin
Film gross thickness 10～50nm.
A kind of device producing self-cleaning surface ceramic tile, including sample introduction platform, impregnates plated film instrument, drying device, water knife plates
Film instrument, roller kilns and outfeed platforms；Ceramic tile enters dipping plated film instrument by sample introduction platform, is dried subsequently into drying device, then
Enter water knife plated film instrument plated film and be dried, finally enter roller kilns and film plating layer is fired into nano self-cleaning thin film.
The beneficial effects of the present invention is:
The present invention produces the method plated film that the method for self-cleaning surface ceramic tile is combined using dipping plated film and water knife plated film, and
Coating process parameter is optimized, can the thickness of strict control surface film plating layer and uniformity；Do not invent production surface
The method sintering step of self-purging ceramic tile is carried out in three stages, and determines the temperature and time in each stage, is conducive to surface
Coating is converted into the nano functional layer with excellent automatical cleaning ability.The present invention produces the apparatus structure letter of self-cleaning surface ceramic tile
Single, can be used for large-scale production.
Specific embodiment
Below the preferred embodiments of the present invention are described in detail.
Embodiment 1:
The present embodiment produces the technical scheme of self-cleaning surface ceramic tile, is related to processing step, technological parameter and production equipment,
Specifically, the method that the present embodiment produces self-cleaning surface ceramic tile, including dipping plated film, water knife plated film and roller kiln burning step；
Ceramic tile through dipping plated film and is dried, and forms colloidal sol-gel film i on surface, then through water knife plated film and dry, colloidal sol-
Form colloidal sol-gel film ii on gel film i, form nano self-cleaning in ceramic tile surface after eventually passing roller kiln burning thin
Film.
Wherein:
Dipping plated film and/or coating liquid used by water knife plating steps are nano titanic oxide sol liquid；Dipping filming process
The middle dipping plated film time is 10～15 seconds, and inclined-plane pull rate is 120～180cm/min, and baking temperature is 70-90 DEG C, is dried
Time is 10～15 seconds；The water knife plating steps plated film time is 20～30 seconds, and general coating times are 2～4 times；Roller kilns are fired
Step is divided presintering, is burnt till and cooling stage；Wherein: pre-sintered state sintering temperature is 260～280 DEG C, burn-in time is 35
～45min；Burn till 460～480 DEG C of stage sintering temperature, sintering time 180～200min；Cooling stage adopts furnace cooling,
Cool time is 150～160min；The thickness of colloidal sol-gel film i is about 5nm, and the thickness of colloidal sol-gel film ii is about
For 5nm；Described dipping plated film and/or water knife coating times are successively or repeatedly that general coating times are 2～4 times, total film thickness
Degree 10～50nm.
The present embodiment produces the device of self-cleaning surface ceramic tile, including sample introduction platform, impregnates plated film instrument, drying device, water
Knife plated film instrument, roller kilns and outfeed platforms；Ceramic tile enters dipping plated film instrument by sample introduction platform, is dried subsequently into drying device,
Subsequently enter water knife plated film instrument plated film and be dried, finally enter roller kilns and film plating layer is fired into nano self-cleaning thin film.
Specifically, the present embodiment produces the device of self-cleaning surface ceramic tile, is that the rod transmission of 10.8m roller is flat including total length
Platform, wherein feeding platform 0.6m, dipping plated film section 1.2m, dryer section 0.6m, water knife plated film section 1.5m, dryer section 0.6m, roller-way
Kiln 5.7m and outfeed platforms 0.6m.
The present embodiment water knife plated film section includes 1 group of (5～7) water knife, supercharger, container and liquid recovery system, control
System；Roller kilns include steel structure refractory material main furnace body a set of (steely structure body of heater, refractory material etc.), roller roller rod drive apparatus
1 set (containing roller rod, motor, decelerator etc.), 1 set of heated for controlling temperature system (containing siliconits, temperature measurer etc.), 1 set of electric control system
(containing control chamber, blower fan etc.), its agent structure is made up of several part such as kiln body, drive system, heating element heater and electric-control system.
Aptitude test:
Using jem2010 high resolution analysises transmission electron microscope, self-cleaning surface ceramic tile obtained by the present embodiment is carried out
Test, result shows, after result sintering, preferably, ratio is more uniform, and crystal grain mostly is nano-particle for the film morphology of ceramic tile surface
Structure；Through d8 advance x-ray diffraction instrument xrd analysis, the thin film being plated in ceramic tile surface is anatase crystalline structure.
Finally illustrate, preferred embodiment above only in order to technical scheme to be described and unrestricted, although logical
Cross above preferred embodiment the present invention to be described in detail, it is to be understood by those skilled in the art that can be
In form and various changes are made to it, without departing from claims of the present invention limited range in details.
Claims (3)
1. a kind of method producing self-cleaning surface ceramic tile it is characterised in that: include dipping plated film, water knife plated film and roller kiln burning
Knot step；Ceramic tile through dipping plated film and is dried, and forms colloidal sol-gel film i on surface, then through water knife plated film and dry,
Colloidal sol-gel film i forms colloidal sol-gel film ii, after eventually passing roller kilns sintering, forms nanometer in ceramic tile surface
Self-cleaning film；Described dipping plated film and coating liquid used by water knife plating steps are nano titanic oxide sol liquid；Described dipping
In filming process, the dipping plated film time is 10～15 seconds, and inclined-plane pull rate is 120～180cm/min, and baking temperature is 70-90
DEG C, drying time is 10～15 seconds；The described water knife plating steps plated film time is 20～30 seconds；Described roller kiln burning step is divided pre-
Sinter, burn till and cooling stage, wherein: pre-sintered state sintering temperature is 260～280 DEG C, burn-in time is 35～45min；
Burn till 460～480 DEG C of stage sintering temperature, sintering time 180～200min；Cooling stage adopts furnace cooling, cool time
For 150～160min.
2. according to claim 1 produce self-cleaning surface ceramic tile method it is characterised in that: described colloidal sol-gel film i
Thickness be 4-6nm, the thickness of described colloidal sol-gel film ii is 4-6nm.
3. according to claim 1 produce self-cleaning surface ceramic tile method it is characterised in that: described dipping plated film and/or
Water knife coating times are one or many, overall film thickness 10～50nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410603783.2A CN104446667B (en) | 2014-10-30 | 2014-10-30 | Method and device for producing surface self-cleaning tiles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410603783.2A CN104446667B (en) | 2014-10-30 | 2014-10-30 | Method and device for producing surface self-cleaning tiles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104446667A CN104446667A (en) | 2015-03-25 |
| CN104446667B true CN104446667B (en) | 2017-01-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201410603783.2A Expired - Fee Related CN104446667B (en) | 2014-10-30 | 2014-10-30 | Method and device for producing surface self-cleaning tiles |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109535782B (en) * | 2018-11-07 | 2021-01-26 | 三峡大学 | TiO22Composite hydrophobic ice-phobic coating and preparation method thereof |
| CN115180919B (en) * | 2022-08-08 | 2023-04-18 | 上海交通大学 | Purple pottery with antibacterial coating on surface and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101182034A (en) * | 2007-11-16 | 2008-05-21 | 华东理工大学 | Method for preparing hydrophilic titanium dioxide nano film |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1174938C (en) * | 2001-08-30 | 2004-11-10 | 武汉大学 | Photocatalystic self-cleaning TiO2 ceramic and its prepn. |
| CN102390936B (en) * | 2011-08-16 | 2015-10-28 | 清华大学 | The preparation method of corrosion-resistant automatic cleaning coating |
| CN102503548B (en) * | 2011-10-21 | 2013-01-02 | 福建农林大学 | Stone slab with self-cleaning function and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101182034A (en) * | 2007-11-16 | 2008-05-21 | 华东理工大学 | Method for preparing hydrophilic titanium dioxide nano film |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170125 Termination date: 20181030 |