CN104437569B - A kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film - Google Patents

A kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film Download PDF

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CN104437569B
CN104437569B CN201410657651.8A CN201410657651A CN104437569B CN 104437569 B CN104437569 B CN 104437569B CN 201410657651 A CN201410657651 A CN 201410657651A CN 104437569 B CN104437569 B CN 104437569B
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visible light
thin film
preparation
absorbing layer
light absorbing
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CN104437569A (en
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顾修全
张双
强颖怀
赵宇龙
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China University of Mining and Technology CUMT
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China University of Mining and Technology CUMT
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Abstract

A kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film, the preparation method belonging to photocatalysis, photoelectric material." co-precipitation spun-dried sintering " four step process are used to be prepared from, step: 1) adopt coprecipitation to obtain Ag3PO4Nano level superfine powder body, the yardstick of powder body is in 20~500nm scope;2) by Ag3PO4Powder ultrasonic is scattered in transparent organic solvent, then is spun in substrate by the colloidal sol shape dispersion liquid of acquisition, obtains prefabricated Ag3PO4Rete;3) by prefabricated Ag3PO4It is dry that rete is placed in the baking oven of 20-80 DEG C, and then load is placed in Muffle furnace to sinter to remove organic substance residues.This Ag3PO4The thickness of visible light absorbing layer, at 0.2~10 μ m, not only has good visible light-responded characteristic and adhesive force, and is easily recycled as photocatalyst, it is possible to for the light anode of photoelectrochemical cell.Bigger application potential is had in fields such as light degradation pollutant, photocatalytic water and opto-electronic conversion.Advantage: method is simple, nontoxic, and easily operated, and cost is low.

Description

A kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film
Technical field
The preparation method that the present invention relates to a kind of photocatalysis, photoelectric material, particularly a kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film.
Background technology
Since stepping into the seventies in last century, the problem such as environmental pollution and energy shortage causes people to outburst global the crisis even worry of disaster increasingly.Standing in the angle of human society sustainable development, development green environment pollutant abatement technology is extremely urgent with substituting clean energy resource.Current all technology carrying out contrast find, conductor photocatalysis is a kind of quite rising technology, this is because it is readily available the energy in nature light or artificial light source.Catalysis material is a based semiconductor, can produce electronics, hole, and then can be hydrogen and oxygen by water decomposition, or organic wastewater is resolved into innocuous substance under the irradiation of light.In numerous quasiconductor agent, TiO2It is proved to have photocatalytic activity height, stable chemical nature and the advantage such as nontoxic, fully shows advantage in the field such as photocatalytic degradation, hydrogen manufacturing.But, its energy gap is big, can only absorb and account for the ultraviolet light of small part in sunlight.
In recent years, people also develop some successively and have visible light-responded photocatalyst, such as CdS, BiOBr, Cu2O etc..But these materials or be susceptible to photoetch, or photocatalytic activity is not high, and photolysis or light degradation persistent period are long, fall far short from practical application.Until 2009, leaf JINHUA etc. finds a kind of novel photocatalysis materials A g3PO4, there is the feature such as visible light-responded (band gap is about 2.4eV), quantum yield high (~90%), can by pollutant mineralising within the extremely short time.Although have these advantages, but Ag3PO4Based photocatalyst there is also 3 fatefulue deficiencies: first, and the crystal grain general size synthesized is relatively big, adopts surfactant cladding to obtain nanocrystalline despite helping reduction crystallite dimension, but the Organic substance of grain surface cladding is difficult to remove.Second, stability is relatively poor, and not rarely seen light easily decomposes, and is also slightly soluble in water, being susceptible to " photoetch " and forms Ag simple substance particle, thus stoping the incidence of light, passing through Ag in course of reaction3PO4Outer wall form silver halide (AgBr, AgCl etc.) although shell can suppress its " photoetch " behavior, but light stability is still difficult to significantly improve.3rd, Ag3PO4Photocatalyst is generally powder type, is not only difficult to recycle, but also is not easily accomplished photoelectrocatalysis: a kind of catalyzed version more preferably.
From the angle of commercial Application and TiO2Deng in the development course of catalysis material, it is necessary to make thin film or coating form.The material of this form has at least three advantages: one is advantageous for the recycling of photocatalyst, improves service efficiency;Two are made as photoelectrochemistrpool pool (for hydrogen manufacturing or generating), just have visible light-responded because of himself, can not only save dye sensitization link, and be expected to realize better photovoltaic energy conversion.It addition, by Ag3PO4Making form of film, it is achieved photocatalytic water, photovoltaic energy conversion, compare traditional Si, TiO2Base solar cell, preparation cost is lower, and there is no bibliographical information mistake at present.
Summary of the invention
The invention aims to provide a kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film, solves current Ag3PO4Based photocatalyst is not easily recycled, and the problem being not easily accomplished photovoltaic energy conversion, photolysis water hydrogen.
Realize the technical scheme of the object of the invention: the preparation method of visible light absorbing layer is: use " co-precipitation spun-dried sintering " four step process to be prepared from;Concrete steps: 1) adopt coprecipitation to obtain Ag3PO4Nanometer grade powder, the yardstick of powder body is in 20~500nm scope;2) by Ag3PO4Powder dissolves and is scattered in transparent organic carrier, it is thus achieved that precursor sol, then utilizes spin-coating method to be spun in substrate the precursor sol of acquisition, obtains prefabricated Ag3PO4Thin film;3) by prefabricated Ag3PO4It is dry that thin film is placed in the baking oven of 20-80 DEG C;4), by dried Ag3PO4Prefabricated membrane is positioned in Muffle furnace and sinters to remove organic solvent residual, adopts two step temperature method sintering to form.
Described transparent organic carrier is made up of terpineol, ethyl cellulose, and their mass ratio is 10:1~5:1.
Ethyl cellulose and Ag in described precursor colloidal sol3PO4The mass ratio of powder is 0.03:1~0.1:1.
The holding stage of two described step temperature methods is divided into two, and low-temperature zone is at 125-150 DEG C, and high temperature section is then positioned at 350-400 DEG C of scope.
Beneficial effects of the present invention is as follows:
1. the inventive method is simple, nontoxic, and easily operated.
2. the inventive method need not use inert atmosphere protection, and cost is low, is appropriate to industrialized production.
3. the film adhesion obtained is better, and the thickness of rete is easily controllable.
Accompanying drawing explanation
Fig. 1 is Ag in the embodiment of the present invention 13PO4The XRD figure of base film light anode.
Fig. 2 is Ag in the embodiment of the present invention 13PO4The SEM exterior view of base film light anode.
Fig. 3 is based on Ag in the embodiment of the present invention 13PO4The I-V characteristic curve of the photoelectrochemistrpool pool of light anode.
Fig. 4 is based on Ag in the embodiment of the present invention 13PO4The photoresponse curve of the photoelectrochemistrpool pool of light anode.
Detailed description of the invention
The preparation method of visible light absorbing layer is: use " co-precipitation spun-dried sintering " four step process to be prepared from, step: 1) adopt coprecipitation to obtain Ag3PO4Nanometer grade powder, the yardstick of powder body is in 20~500nm scope;2) by Ag3PO4Powder dissolves and is scattered in transparent organic carrier, it is thus achieved that precursor sol, then utilizes spin-coating method to be spun in substrate the precursor sol of acquisition, obtains prefabricated Ag3PO4Thin film;3) by prefabricated Ag3PO4It is dry that thin film is placed in the baking oven of 20-80 DEG C;4), by dried Ag3PO4Prefabricated membrane is positioned in Muffle furnace and sinters to remove organic solvent residual.
Described transparent organic carrier is made up of terpineol, ethyl cellulose, and their mass ratio is 10:1~5:1.
Ethyl cellulose and Ag in described precursor sol3PO4The mass ratio of powder is 0.03:1~0.1:1.
The holding stage of described sintering process is divided into two, and low-temperature zone is at 125-150 DEG C, and high temperature section is then positioned at 350-400 DEG C of scope.
Embodiment 1: using fluorine tin-oxide (FTO) electro-conductive glass as substrate, adds 0.4g ethyl cellulose in 5mL terpineol, stirs 24h, obtain clear viscous liquids, take Ag prepared by 0.5g coprecipitation under room temperature3PO4Grind 30min, join in the 375 above-mentioned clear viscous liquids of μ L, stir 2h, obtain gel.FTO electro-conductive glass is placed on sol evenning machine, drips gel in centre, with the slow-speed of revolution spin coating 10s of 1000r/min, then obtain thin film with the high rotating speed spin coating 60s of 3000r/min.By thin film good for spin coating dry 12h in 60 DEG C of baking ovens, it is subsequently placed in Muffle furnace and sinters.From room temperature with the ramp of 1 DEG C/min to 125 DEG C, it is incubated 30min, then with the ramp of 10 DEG C/min to 400 DEG C, is incubated 90min, naturally cools to room temperature, obtain stronger thin film.Ag by preparation3PO4Base film is in DSSC, and Pt electrode is as to electrode, and many iodide ions are as electrolyte.This thin film has certain photoresponse as light anode, as shown in Figure 4.
Embodiment 2: using indium tin oxide (ITO) electro-conductive glass as substrate, adds 0.4g ethyl cellulose in 4.5mL terpineol, stirs 12h, obtain clear viscous liquids, take 0.4gAg at 60 DEG C3PO4Grind 30min, join in the 225 above-mentioned clear viscous liquids of μ L, stir 2h, obtain gel.Obtaining thin film by knife coating, in 50 DEG C of baking ovens, dry 12h, is subsequently placed in Muffle furnace and sinters.From room temperature with the ramp of 1 DEG C/min to 125 DEG C, it is incubated 30min, then with the ramp of 10 DEG C/min to 375 DEG C, is incubated 90min, naturally cools to room temperature, obtain stronger thin film.Ag by preparation3PO4Base film light anode is in electrochemical workstation, and Pt electrode is as to electrode, and calomel electrode is as reference electrode, and 0.1M Alkitrate is as electrolyte.
Embodiment 3:FTO electro-conductive glass, as substrate, adds 0.5g ethyl cellulose in 6mL terpineol, stirs 12h, obtain clear viscous liquids, take 0.45gAg at 60 DEG C3PO4Grind 30min, join in the 275 above-mentioned clear viscous liquids of μ L, stir 2h, obtain gel.Obtaining thin film by czochralski method, in 80 DEG C of baking ovens, dry 12h, is subsequently placed in Muffle furnace and sinters.From room temperature with the ramp of 1 DEG C/min to 125 DEG C, it is incubated 30min, then with the ramp of 10 DEG C/min to 400 DEG C, is incubated 90min, naturally cools to room temperature, obtain stronger thin film.Ag by preparation3PO4During base film light anode is used in electrochemical workstation, Pt electrode is as to electrode, and calomel electrode is as reference electrode, and 0.1M Alkitrate is as electrolyte.

Claims (3)

1. one kind based on Ag3PO4The preparation method of the visible light absorbing layer of thin film, it is characterised in that: the preparation method of visible light absorbing layer is: use " co-precipitation spun-dried sintering " four step process to be prepared from;Concrete steps: 1) adopt coprecipitation to obtain Ag3PO4Nanometer grade powder, the yardstick of powder body is in 20 ~ 500nm scope;2) by Ag3PO4Powder dissolves and is scattered in transparent organic carrier, it is thus achieved that precursor sol, then utilizes spin-coating method to be spun in substrate the precursor sol of acquisition, obtains prefabricated Ag3PO4Thin film;3) by prefabricated Ag3PO4It is dry that thin film is placed in the baking oven of 20-80 DEG C;4), by dried Ag3PO4Prefabricated membrane is positioned in Muffle furnace and sinters to remove organic solvent residual;Two step temperature method sintering are adopted to form;
Described transparent organic carrier is made up of terpineol, ethyl cellulose, and both mass percents are in 10:1 ~ 5:1 scope.
2. according to claim 1 based on Ag3PO4The preparation method of the visible light absorbing layer of thin film, it is characterised in that: ethyl cellulose and Ag in described precursor sol3PO4The mass percent of powder is in 0.03:1 ~ 0.1:1 scope.
3. according to claim 1 based on Ag3PO4The preparation method of the visible light absorbing layer of thin film, it is characterised in that: two described step temperature methods, wherein first paragraph is in 125-150 DEG C of interval, and second step is then positioned at 350-400 DEG C of interval.
CN201410657651.8A 2014-11-18 2014-11-18 A kind of based on Ag3PO4The preparation method of the visible light absorbing layer of thin film Expired - Fee Related CN104437569B (en)

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CN106944107A (en) * 2017-03-30 2017-07-14 常州大学 A kind of preparation method of silver phosphate photocatalyst film
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CN104014355A (en) * 2014-06-19 2014-09-03 中国矿业大学 Preparation method of visible-light catalyst
CN104014354A (en) * 2014-06-16 2014-09-03 中国矿业大学 Improve Ag3PO4Method for visible light catalytic performance

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104014354A (en) * 2014-06-16 2014-09-03 中国矿业大学 Improve Ag3PO4Method for visible light catalytic performance
CN104014355A (en) * 2014-06-19 2014-09-03 中国矿业大学 Preparation method of visible-light catalyst

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