CN104403575B - A kind of preparation method of high accuracy aluminum oxide polishing powder - Google Patents
A kind of preparation method of high accuracy aluminum oxide polishing powder Download PDFInfo
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- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Abstract
The invention discloses the preparation method of a kind of high accuracy aluminum oxide polishing powder, this polishing powder, as grinding-material, mainly contains aluminium oxide, silicon oxide, cerium oxide, titanium oxide.Al of the present invention2O3:SiO2=12:1～8:3, CeO2:TiO2=1:1～3:1.In order to improve polishing effect, adding dispersant in synthetically prepared operation, obtained aluminum oxide polishing powder can preferably be polished lapped face.The present invention is by aluminum nitrate, Ludox, cerous nitrate, titanium oxide powder and dispersant, it is sufficiently mixed, then spray drying, roasting, obtain aluminum oxide polishing powder, it has good suspension, dispersibility, having narrow particle size distribution, polishing lapped face is highly polished, and throwing erosion amount is big, long advantage in service life.
Description
Technical field
The invention belongs to inorganic particle preparation field, particularly to the preparation method of a kind of high accuracy alpha-alumina polishing powder, the alpha-alumina polishing powder of preparation has the highest polishing precision and minimum medium particle diameter, narrower particle size distribution.
Background technology
In recent years, the domestic demand to Alpha-alumina is the most vigorous, sapphire glass is all used mainly due to its glass screen of current high-end handsets market, glass supplier at China's Mobile Phone Market is mainly U.S. CORNING, and mainly the mobile phone of sapphire glass uses business for us it is known that they are the high-end mobile-phone manufacturers such as Semen setariae, association, Huawei, Samsung, LG, Fructus Mali pumilae.Thus have stimulated the domestic research to sapphire glass polishing powder.
Alpha-alumina is the polishing material of a kind of extreme hardness, its hardness is 8.8, simultaneously because its good stability and uniformity are widely used in the polishing of the components and parts such as integrated circuit, glass substrate, sapphire glass, therefore, alpha-alumina polishing powder is widely studied, and how to be obtained in that preferable surface topography for alpha-alumina polishing powder, less Abrasive Particle Size, narrower particle size distribution, more succinct preparation technology, related scientific research worker is made that substantial amounts of effort and work.
As CN 101824279 A discloses a kind of aluminum oxide polishing powder and production method thereof, its preparation method comprises the steps: to pull an oar raw material Alpha-alumina with water, then classification, it is thus achieved that product.The aluminum oxide polishing powder of this invention, has meso-position radius grain little, and the feature that particle size distribution is narrow can be used for LCDs glass, the precise polished processing of the electronic product components and parts such as plane shows, optical element, ultrathin glass substrate, glass disk.But the surface roughness of workpiece after workpiece polishing to the polishing speed of polishing powder and is not claimed by this invention.
As CN 1398939 discloses a kind of polishing composition, it is a kind of at least containing silica, the grinding agent of aluminium oxide, but does not claim the granularity of polishing material.
Along with the fast development of science and technology, the scientific and technological content for polish abrasive industry improves constantly requirement, how to improve the quality of polish abrasive, strengthens the study hotspot that its wearability is always in industry.
Summary of the invention
The technical issues that need to address of the present invention are that the defect overcoming prior art, it is provided that the preparation method of a kind of high accuracy aluminum oxide polishing powder.
The present invention adopts the following technical scheme that
The each constituent mass of the present invention compares Al2O3:
SiO2=12:1～8:3, CeO2: TiO2=1:1～3:1；
Polishing powder crystal formation of the present invention is Alpha-alumina, and its polishing powder initially throws erosion amount more than 0.30 mg/ (cm2Min), after continuous polishing 8h the throwing erosion amount of polishing powder still greater than 0.15 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to below 0.15nm.
The preparation method of a kind of high accuracy aluminum oxide polishing powder is as follows:
1) mass ratio of aluminum nitrate, Ludox is pressed, cerous nitrate compares feeding with the quality of titanium dioxide powder, first Ludox is dissolved in the mixed solution of second alcohol and water and obtains solution 1., taking the nitrate reagent of aluminum and cerium respectively, 2. and 3. it is respectively configured to solution, obtains solution, the most 3. will be mixed and added into titanium dioxide powder by solution, it is subsequently adding dispersant, to solution mix homogeneously in the case of stirring；
2) the spray-dried machine of the solution of mix homogeneously step 1) obtained is spray-dried, and obtains solid powder particle；
3) gained powder particle in step 2 is calcined in rotary tube furnace, first by powder particle pre-burning, insulation, then high-temperature calcination, insulation, furnace cooling subsequently, obtain alpha-alumina polishing powder.
It is fast that the present invention uses spray drying method to prepare aluminum oxide polishing powder rate of drying, and products obtained therefrom is spherical particle, epigranular, good fluidity, and dissolubility is good, and product purity is high, and quality is good；Product cut size, bulk density, moisture can regulate within the specific limits.
The roasting system present invention employs first pre-burning, calcining again, reasonably pre-burning condition can first remove moisture and some foreign gases, product is avoided to produce bubble and crackle, eliminate internal stress simultaneously, increase granule strength, presintering can also transmit some energy to sample particle, increase whole burning stage driving energy, shortening sintering time.
The present invention uses rotary tube furnace to calcine powder body temperature-controlled precision height, high insulating effect, fire box temperature uniformity height, regulates and controls rational roasting parameter and makes the polishing powder even particle size of preparation, and particle size distribution range is little, and powder dispersity is good.
The present invention is by introducing SiO in aluminum oxide polishing powder2、CeO2、TiO2Synergism between being intended to by each polishing powder, improves the polishing performance of aluminum oxide polishing powder.
The present invention is by introducing Ludox in aluminum nitrate solution, utilize the special nature parcel aluminum nitrate particle of colloid, utilize affinity interaction special between silicon ion and aluminum particulate simultaneously, making aluminum nitrate and silicon ion form atom replacement during calcining causes particle surface charged, so that it has good dispersibility during polishing, make it when calcining simultaneously, possess narrower particle size distribution；Also as silicon oxide preparation is simple, cheap, substitute aluminium oxide with silicon oxide and be possible not only to improve the polishing performance of polishing powder, the most good economic benefit.
The present invention, by introducing cerium oxide in aluminum nitrate solution, is due to CeO2Polishing agent has the character of multivalence, Ce(III)/Ce(IV) redox reaction can break glass lattice, and by chemisorption, the material (including glass and Hydrolysis of compound) making glass surface contact with polishing agent is oxidized or forms complex and is removed.
The present invention is by introducing titania powder in aluminum nitrate solution, it is because titanium dioxide in dry powder generally with electrostatic charge, diffusion electric double layer is formed because surface will adsorb contrary electric charge with electric charge in liquid medium, when granule is closer to each other, arrange because of each tool same sex electric charge, beneficially the stablizing of dispersion.Therefore, when containing CeO2、SiO2Al2O3When polishing powder is configured to polishing slurries, TiO2The stablizing of the beneficially polishing slurries system of there was added.
Detailed description of the invention
Embodiment
1
Take Al (NO3)3·9H2O solid 110g, 184.2g/l cerous nitrate solution 3ml, mass fraction 30% Ludox 83g, titanium dioxide powder 0.55g, ethanol solution 80ml, cetyl trimethylammonium bromide 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.2g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 200 DEG C of temperature, it is incubated 1h, then is warmed up to 1150 DEG C, furnace cooling after sintering soak 2h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 1.473 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 0.5MHz, and air mass flow is set to 650 L/h, and outlet temperature is 75 DEG C, air compressor machine pressure 2.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 5%, cleansing pin frequency 5s/ time；It is 5 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 4 revs/min, and angle of inclination is 8 degree.
Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.330 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.178 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.145nm.
Embodiment
2
Take Al (NO3)3·9H2O solid 110g, 184.2g/l cerous nitrate solution 3ml, mass fraction 30% Ludox 83g, titanium dioxide powder 0.55g, ethanol solution 80ml, cetyl trimethylammonium bromide 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.3g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 250 DEG C of temperature, it is incubated 1.5h, then is warmed up to 1250 DEG C, furnace cooling after sintering soak 4h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 1.032 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 1.0 MHz, and air mass flow is set to 750 L/h, and outlet temperature is 80 DEG C, air compressor machine pressure 2.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 10 %, cleansing pin frequency 10 s/ time；It is 10 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 8 revs/min, and angle of inclination is 3 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.325 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.160 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.140nm.
Embodiment
3
Take Al (NO3)3·9H2O solid 90g, 184.2g/l cerous nitrate solution 4ml, mass fraction 30% Ludox 88g, titanium dioxide powder 0.74g, ethanol solution 80ml, many Polymeric sodium metaphosphate ies 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.2g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 300 DEG C of temperature, it is incubated 2h, then is warmed up to 1350 DEG C, furnace cooling after sintering soak 5h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 0.932 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 1.5 MHz, and air mass flow is set to 750 L/h, and outlet temperature is 80 DEG C, air compressor machine pressure 3.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 20 %, cleansing pin frequency 10 s/ time；It is 15 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 5 revs/min, and angle of inclination is 3 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.342 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.172 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.148nm.
Embodiment
4
Take Al (NO3)3·9H2O solid 90g, 184.2g/l cerous nitrate solution 4ml, mass fraction 30% Ludox 88g, titanium dioxide powder 0.74g, ethanol solution 80ml, many Polymeric sodium metaphosphate ies 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.25g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 350 DEG C of temperature, it is incubated 2.5h, then is warmed up to 1400 DEG C, furnace cooling after sintering soak 7 h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 1.002 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 2.0 MHz, and air mass flow is set to 850 L/h, and outlet temperature is 85 DEG C, air compressor machine pressure 3.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 30 %, cleansing pin frequency 15 s/ time；It is 20 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 8 revs/min, and angle of inclination is 2 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.327 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.165 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.141nm.
Embodiment
5
Take Al (NO3)3·9H2O solid 110g, 184.2g/l cerous nitrate solution 3ml, mass fraction 30% Ludox 60g, titanium dioxide powder 0.35g, ethanol solution 80ml, many Polymeric sodium metaphosphate ies 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.15g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 400 DEG C of temperature, it is incubated 1.5h, then is warmed up to 1450 DEG C, furnace cooling after sintering soak 4 h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 0.843 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 2.5 MHz, and air mass flow is set to 850 L/h, and outlet temperature is 85 DEG C, air compressor machine pressure 3.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 40 %, cleansing pin frequency 20 s/ time；It is 10 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 5 revs/min, and angle of inclination is 5 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.318 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.162 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.139nm.
Embodiment
6
Take Al (NO3)3·9H2O solid 110g, 184.2g/l cerous nitrate solution 3ml, mass fraction 30% Ludox 60g, titanium dioxide powder 0.35g, ethanol solution 80ml, many Polymeric sodium metaphosphate ies 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.35g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 500 DEG C of temperature, it is incubated 2.5h, then is warmed up to 1500 DEG C, furnace cooling after sintering soak 10 h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 0.543 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 2.5 MHz, and air mass flow is set to 950 L/h, and outlet temperature is 90 DEG C, air compressor machine pressure 4.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 45 %, cleansing pin frequency 25 s/ time；It is 10 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 5 revs/min, and angle of inclination is 0 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.321 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.152 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.129nm.
Embodiment
7
Take Al (NO3)3·9H2O solid 110g, 184.2g/l cerous nitrate solution 3ml, mass fraction 30% Ludox 83g, titanium dioxide powder 0.55g, ethanol solution 80ml, many Polymeric sodium metaphosphate ies 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.2g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 180 DEG C of temperature, it is incubated 0.5h, then is warmed up to 1050 DEG C, furnace cooling after sintering soak 0.3 h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 2.373 μm.The test parameters being spray-dried instrument in experiment is set as: the frequency of ultrasonic atomization instrument is 3.0 MHz, and air mass flow is set to 950 L/h, and outlet temperature is 90 DEG C, air compressor machine pressure 4.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 50 %, cleansing pin frequency 25 s/ time；It is 30 DEG C/min that Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 15 revs/min, and angle of inclination is 25 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.310 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.159 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.149nm.
Embodiment
8
Take Al (NO3)3·9H2O solid 90g, 184.2g/l cerous nitrate solution 4ml, mass fraction 30% Ludox 88g, titanium dioxide powder 0.74g, ethanol solution 80ml, many Polymeric sodium metaphosphate ies 0.2g.First Ludox is poured in ethanol solution and fully shake up, then take 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and the most fully shakes up, be subsequently adding titanium dioxide powder.The most backward solution adds deionized water to 400ml, is simultaneously introduced dispersant cetyl trimethylammonium bromide 0.40g.Above-mentioned solution is carried out spray drying by spray drying instrument and obtains powder body, carry out roasting.First by powder particle pre-burning between 550 DEG C of temperature, it is incubated 3h, then is warmed up to 1550 DEG C, furnace cooling after sintering soak 12h, obtain alpha-alumina polishing powder, the D of powder body50Medium particle diameter is 1.902 μm.The test parameters of laboratory spray drying instrument is set as: the frequency of ultrasonic atomization instrument is 3.5 MHz, and air mass flow is set to 1000 L/h, and outlet temperature is 95 DEG C, air compressor machine pressure 4.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 60 %, cleansing pin frequency 30 s/ time；It is 3 DEG C/min that middle Rotary pipe type furnace parameters is set to stove heating rate, and barrel body rotation speed is 2 revs/min, and angle of inclination is 0 degree.Sapphire glass is polished by polishing powder of the present invention, and erosion amount initially thrown by its polishing powder is 0.309 mg/ (cm2Min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.160 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to 0.144nm.
It is last that it is noted that obviously above-described embodiment is only for clearly demonstrating example of the present invention, and not restriction to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here without also cannot all of embodiment be given exhaustive.And the obvious change thus amplified out or variation still in protection scope of the present invention among.
Claims (3)
1. the preparation method of a high accuracy aluminum oxide polishing powder, it is characterised in that method step is:
1) aluminum nitrate in mass ratio: Ludox=6:1～1:1, cerous nitrate: titanium dioxide powder=5:2～21:25 feeding, first Ludox is dissolved in the mixed solution of second alcohol and water and obtains solution 1., taking the nitrate reagent of aluminum and cerium respectively, 2. and 3. it is respectively configured to solution, obtains solution, the most 3. will be mixed and added into titanium dioxide powder by solution, it is subsequently adding dispersant, to solution mix homogeneously in the case of stirring；
2) the spray-dried instrument of the solution of mix homogeneously step 1) obtained is spray-dried, and obtains solid powder particle；
3) by step 2) in gained powder particle calcine in rotary tube furnace, first by powder particle pre-burning between 180～300 DEG C of temperature, be incubated 0.5～3h, then be warmed up to 1050～1450 DEG C, furnace cooling after sintering soak 0.3～11h, obtain alpha-alumina polishing powder；In experiment, Rotary pipe type furnace parameters is set to stove heating rate is 3～15 DEG C/min, and barrel body rotation speed is 2～10 revs/min, and angle of inclination is 0-25 degree；
Described polishing powder crystal formation is Alpha-alumina, and each constituent mass of this alpha-alumina polishing powder compares Al2O3:SiO2=12:1～8:3, CeO2:TiO2=1:1～3:1；This alpha-alumina polishing powder initially throws erosion amount more than 0.30 mg/ (cm2Min), after continuous polishing 8h the throwing erosion amount of polishing powder still greater than 0.15 mg/ (cm2·min)；After polishing sapphire glass, glass surface roughness RMS value in 10 μ m 10 μ m is down to below 0.15nm.
The preparation method of a kind of high accuracy aluminum oxide polishing powder the most according to claim 1, it is characterised in that the addition of dispersant is 0.1～1%.
The preparation method of a kind of high accuracy aluminum oxide polishing powder the most according to claim 1, it is characterized in that, the test parameters being spray-dried instrument is set as: the frequency of ultrasonic atomization instrument is 0.5～3.5MHz, air mass flow is set to 650～1000L/h, outlet temperature is 75～95 DEG C, air compressor machine pressure 2.0～4.5Bar, blower fan rotational frequency 50Hz, inlet amount 5%～60%, cleansing pin frequency 5～30s/ time.
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| CN105647391B (en) * | 2016-01-13 | 2017-12-15 | 上海欧柏森环境工程管理有限公司 | A kind of stone polishing powder |
| CN106591950B (en) * | 2016-12-15 | 2019-07-02 | 安阳方圆研磨材料有限责任公司 | Rotary polishing powder crystal growing furnace |
| CN106675519A (en) * | 2016-12-21 | 2017-05-17 | 安徽中创电子信息材料有限公司 | Inorganic compound abrasive and preparation method thereof |
| CN107325789B (en) * | 2017-07-15 | 2018-12-21 | 无锡易洁工业介质有限公司 | A kind of preparation method of the sial abrasive compound for Sapphire Substrate polishing |
| CN113563801A (en) * | 2021-07-26 | 2021-10-29 | 杭州智华杰科技有限公司 | Preparation method of aluminum oxide polishing powder |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5759917A (en) * | 1996-12-30 | 1998-06-02 | Cabot Corporation | Composition for oxide CMP |
| CN1188465A (en) * | 1995-06-20 | 1998-07-22 | 美国3M公司 | Alpha alumina-based abrasive grain containing silica and iron oxide |
| CN1296049A (en) * | 1999-11-12 | 2001-05-23 | 第一毛织株式会社 | Compositions for chemical-mechanical polishing |
| US6299795B1 (en) * | 2000-01-18 | 2001-10-09 | Praxair S.T. Technology, Inc. | Polishing slurry |
| JP2006310362A (en) * | 2005-04-26 | 2006-11-09 | Sumitomo Electric Ind Ltd | Surface treatment method of group-iii nitride crystal, group-iii nitride crystal substrate, group-iii nitride crystal substrate having epitaxial layer, and semiconductor device |
| WO2012102978A1 (en) * | 2011-01-26 | 2012-08-02 | 3M Innovative Properties Company | Abrasive article with replicated microstructured backing and method of using same |
| CN103896321A (en) * | 2012-12-28 | 2014-07-02 | 上海新安纳电子科技有限公司 | Cerium oxide composite particles, as well as preparation method and application thereof |
| CN103965790A (en) * | 2014-04-25 | 2014-08-06 | 泰安麦丰新材料科技有限公司 | Zr-Al-Ce polishing solution and preparation method thereof |
-
2014
- 2014-12-23 CN CN201410807470.9A patent/CN104403575B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1188465A (en) * | 1995-06-20 | 1998-07-22 | 美国3M公司 | Alpha alumina-based abrasive grain containing silica and iron oxide |
| US5759917A (en) * | 1996-12-30 | 1998-06-02 | Cabot Corporation | Composition for oxide CMP |
| CN1296049A (en) * | 1999-11-12 | 2001-05-23 | 第一毛织株式会社 | Compositions for chemical-mechanical polishing |
| US6299795B1 (en) * | 2000-01-18 | 2001-10-09 | Praxair S.T. Technology, Inc. | Polishing slurry |
| JP2006310362A (en) * | 2005-04-26 | 2006-11-09 | Sumitomo Electric Ind Ltd | Surface treatment method of group-iii nitride crystal, group-iii nitride crystal substrate, group-iii nitride crystal substrate having epitaxial layer, and semiconductor device |
| WO2012102978A1 (en) * | 2011-01-26 | 2012-08-02 | 3M Innovative Properties Company | Abrasive article with replicated microstructured backing and method of using same |
| CN103896321A (en) * | 2012-12-28 | 2014-07-02 | 上海新安纳电子科技有限公司 | Cerium oxide composite particles, as well as preparation method and application thereof |
| CN103965790A (en) * | 2014-04-25 | 2014-08-06 | 泰安麦丰新材料科技有限公司 | Zr-Al-Ce polishing solution and preparation method thereof |
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