CN104375686A - Touch panel - Google Patents
Touch panel Download PDFInfo
- Publication number
- CN104375686A CN104375686A CN201310366187.2A CN201310366187A CN104375686A CN 104375686 A CN104375686 A CN 104375686A CN 201310366187 A CN201310366187 A CN 201310366187A CN 104375686 A CN104375686 A CN 104375686A
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- CN
- China
- Prior art keywords
- contact panel
- refractive index
- conductive layer
- layer
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The invention discloses a touch panel. The touch panel comprises a substrate, a conducting layer and a protection layer. The conducting layer is arranged on the substrate and comprises a plurality of electrodes arranged at intervals, and the electrodes are made of nano-metallic materials. The protection layer covers the conducting layer and is made of hydrophobic materials. By change of the materials of the protection layer, rise of impedance of nanometals in the conducting layer after oxidization can be effectively avoided, and accordingly influences on touch sensitivity of the touch panel are avoided.
Description
Technical field
The present invention is about a kind of touch technology, refers to a kind of contact panel especially.。
Background technology
Along with the evolution of touch technology (Touch cont ro1), contact panel (touch pane1) has been widely used in various consumer electronics device, such as: the portable electric products such as intelligent mobile phone, flat computer, camera, e-book, MP3 player, or be applied to the display screen of operational control unit.
Contact panel generally includes substrate, conductive layer and protective seam, and on material, conductive is nano metal, and protective layer material is resin material.Structurally, protective seam is formed on conductive layer, in order to prevent conductive layer generation physical property or damage chemically.
But; because resin material does not have good hydrophobicity, extraneous steam easily infiltrate after protective seam with conductive layer generation oxidation reaction, cause the oxidized rear impedance of nano metal in protective seam to raise; affect being uniformly distributed of conductive layer impedance, and then affect the touch-control sensitivity of contact panel.
Summary of the invention
The present invention is improved by the material aspect of protective seam; hydrophobic material is adopted to do the main material of protective seam; by the hydrophobicity of hydrophobic material prevent extraneous steam in processing procedure process infiltrate after protective seam with conductive layer generation oxidation reaction, thus prevent the nano metal in conductive layer oxidized.
One embodiment of the invention provide a substrate; One conductive layer is arranged on the substrate, this conductive layer, and comprise multiple spaced electrode, wherein this electrode material comprises nano metal material; One protective seam, cover on this conductive layer, wherein this protective layer material comprises hydrophobic material.
By this, the present invention can avoid the oxidized rear impedance of the nano metal in conductive layer to raise by the change of protective layer material effectively, and then affects the touch-control sensitivity of contact panel.
In order to technology, method and effect that the present invention is taked by reaching set object further can be understood, refer to the detailed description of following relevant the present invention, graphic, believe the object of the present invention, feature and feature, when being goed deep into thus and concrete understanding, but institute's accompanying drawings and annex only provide with reference to and use is described, be not used for the present invention's in addition limitr.
For the feature of the present invention can be become apparent, special embodiment below, and coordinate institute's accompanying drawings, be described in detail below:
Accompanying drawing explanation
Fig. 1 shows the diagrammatic cross-section of the contact panel of one embodiment of the invention.
Fig. 2 shows the schematic top plan view of the conductive layer in one embodiment of the invention.
Fig. 3 shows the schematic top plan view of the conductive layer in another embodiment of the present invention.
Fig. 4 show the present invention one implementation column the diagrammatic cross-section of contact panel.
Fig. 5 show one embodiment of the invention the diagrammatic cross-section of contact panel.
Fig. 6 show one embodiment of the invention the diagrammatic cross-section of contact panel.
Embodiment
Orientation alleged in this instructions " on " and D score, be only used to represent relative position relationship, for this instructions graphic for, the top of contact panel is comparatively close to user, and below is then comparatively away from user.
Please refer to Fig. 1, Fig. 1 shows the diagrammatic cross-section of the contact panel of one embodiment of the invention.The contact panel 100 of the present embodiment comprises substrate 110, conductive layer 110, protective seam 120.Wherein, substrate 110 can adopt the transparent materials such as polyethylene terephthalate, glass, polycarbonate or poly-methyl methacrylate.Conductive layer 120 is arranged on substrate 110, and protective seam 130 covers on conductive layer 120.Conductive layer 120 will be illustrated with the detailed aspects of protective seam 130 in subsequent content.
The material of protective seam 130 comprises hydrophobic material, wherein the hydrophobic material mainly material such as bag fluorosilane compounds, fluorocarbon.The hydrophobic ability that hydrophobic material is good is utilized in this enforcement, make extraneous steam that partial air can be caused " to be closed to " between water and hydrophobic material solid surface because hydrophobic material surface has microspike when touching hydrophobic material solid surface, cause water major part to contact with air, greatly reduce to form drops with hydrophobic material solid surface direct contact surface is long-pending.Thus reach reduce extraneous steam infiltrate protective seam 130 after and conductive layer 120 there is oxidation reaction effect.In an implementation column, the material of protective seam 130 can further include resin material except comprising hydrophobic material, and wherein resin material mainly comprises polymethylmethacrylate, acryl resin, epoxy resin, acryl resin or aforementioned combination.Utilize the good tackness of resin material to increase the adhesion of hydrophobic material on conductive layer 120 in this implementation column.In another implementation column; the material of protective seam 130 is except comprising above-mentioned resin material and hydrophobic material; adjuvant can also be comprised; wherein adjuvant mainly includes stabilizing agent, hardening agent or activating agent, adjuvant etc.; adjuvant is mainly in order to become a stable potpourri with hydrophobic material proportioning by resin material; in this potpourri, hydrophobic material percentage composition is 80% to 90%; the percentage composition of resin material is 3% to 5%, and the percentage composition of adjuvant is 5% to 17%.In processing procedure, be the solute of 3% by the content that potpourri is formed, and with content be 97% propylene glycol monomethyl ether carry out being dissolved into corresponding solution in order to form protective seam 130 as solvent.
Please refer to Fig. 2, Fig. 2 shows the schematic top plan view of the conductive layer 120 in one embodiment of the invention.Conductive layer 120 comprises multiple spaced electrode, concrete structure can for comprising a plurality of arrangement the first electrode 121X in column, a plurality of the second electrode 121Y be arranged in rows and the plural connecting portion 122 connecting the second adjacent electrode 121Y in the row direction.First electrode 121X and the second electrode 121Y is arranged at interval respectively, and the material of the first electrode 121X and the second electrode 121Y can be silver nanoparticle silver, Nanometer Copper, the nano metal material such as nano aluminum or Nano-Zinc or aforementioned combination.Be insulation division 123 above each connecting portion 122 of conductive layer 120.In certain embodiments, insulation division 123 is the insulating material of organic or inorganic, such as, be the materials such as pi (p o l y i m i de), epoxy resin.Insulation division 123 is bridge 124, bridge 124 is electrically connected the first adjacent electrode 121X in a column direction.Bridge 124 can be the metal material such as silver, aluminium, also can be identical with the material that electrode adopts.
Please refer to Fig. 3, Fig. 3 shows the schematic top plan view of the conductive layer in another embodiment of the present invention.In another implementation column, conductive layer 120 has a plurality of first electrodes 121X, and the first electrode 121X interval is arranged, and wherein the first electrode 121X material comprises nano metal material.On a surface of substrate 110, the electrode in a direction is only had to illustrate for conductive layer 120 in Fig. 3.It should be noted that conductive layer 120 can also have the second electrode (not shown), this second electrode can be arranged on substrate 110 relative to the first electrode 121X another on the surface, also can be arranged on other one piece of substrate.
It should be noted that the mode forming conductive layer 120 mainly comprises the modes such as laser-induced thermal etching mode, lithography.The conduction region A adopting above-mentioned technique can be formed on conductive layer 120 there is nano metal material and because of etching remove after not there is the etching region B of nano metal material, and the refractive index of nano metal is generally 1.7 to 2.0 in the prior art, the refractive index of substrate 110 is generally 1.4 to 1.6, now the refractive index of etching region B is exactly the refractive index of substrate 110, the refractive index therefore with the conduction region A of nano metal material than do not have nano metal etching region B large, when extraneous light irradiates, because conduction region A is different from the refractive index of etching region B to light, thus, light can be different in the direction of propagation of respective regions, and in a certain region, the light that conduction region A and etching region B reflects can intersect, thus it is higher in the brightness of light focusing place, user observes to have obvious difference between conduction region A and etching region B easily via this focal position, cause the problem of whole contact panel 100 bad order.
In an implementation column, in conductive layer 120, the refractive index of electrode (the first electrode 121X and/or the second electrode 121Y) is n1, and as when electrode material is Nano Silver, n1 is 1.7 to 2.0.The refractive index of protective seam 130 is that n2, n2 are less than n1, and in some implementation columns, n2 is 1.2 to 1.5.The material of protective seam 130 adopts the hydrophobic material of resin material and low-refraction to adulterate, resin material is such as adopted to be that polymethylmethacrylate (refractive index size is 1.4 to 1.5) adulterates with the combination that the hydrophobic material of low-refraction is hydrophobic silica (refractive index size is 1.2 to 1.4), wherein can there is chemical reaction by hydrophilic silicon oxides and reactive silane (such as chlorosilane or HMDS) and make silica surface form unhydrolyzed hydrophobic grouping (as methyl group) and obtain in hydrophobic silica.In other implementation columns, the hydrophobic material of low-refraction also can be polysiloxane compound, and wherein the refractive index size of polysiloxane compound is 1.39 to 1.41.The present invention adopts the material of doping to form protective seam 130; protective seam 130 is made to have optical diffuser function; extraneous light major part protected seam 130 can be made to reflect away; the amount of light entering conductive layer 120 is reduced; and then the light to be reflected by conductive layer 120 is also less; thus the difference reduced in conductive layer 120 between conduction region A and etching region B, improve the problem of whole contact panel 100 bad order.
In other implementation columns; the material of protective seam 130 also can adopt other materials and hydrophobic material to adulterate, as long as the refractive index that the refractive index n2 of guarantee protective seam 130 is less than electrode in conductive layer 120 (the first electrode 121X and/or the second electrode 121Y) is n1.
Please refer to Fig. 4, the present embodiment and difference embodiment illustrated in fig. 1 are, arrange a first refractive rate layer 140 between conductive layer 120 and substrate 110, wherein the refractive index of conductive layer 120 electrode is n1, and as when electrode material is Nano Silver, n1 is 1.7 to 2.0.The refractive index of protective seam is n2, n2 is 1.2 to 1.5.First refractive rate layer refractive index is that n3, n3 are more than or equal to n1.The material of first refractive rate layer can select titania (refractive index size is 2.55 to 2.76), zirconium dioxide (refractive index size is 2.1 to 2.3), niobium pentaoxide (refractive index size is 2.2 to 2.35) or aforesaid combination.The refractive index n1 that refractive index n3 on the one hand by first refractive rate layer 140 in the present embodiment is more than or equal to conductive layer 120 electrode part reduces conduction region A and the different differences of etching region B because of refractive index, thus significantly reduces together with conduction region A and etching region B reflect when extraneous light irradiates light collection; The optical diffuser function had by protective seam 130 on the other hand can make extraneous light major part protected seam 130 reflect away; the amount of light entering conductive layer 120 is reduced; and then the light to be reflected by conductive layer 120 is also less, thus the difference reduced in conductive layer 120 between conduction region A and etching region B has good exterior quality to make whole contact panel 100.
Please refer to Fig. 5, it should be noted that the position of first refractive rate layer 140 is not limited in the aspect shown in Fig. 4, in another implementation column, first refractive rate layer 140 can between conductive layer 120 and this protective seam 130.
Please refer to Fig. 6, in another implementation column, between spaced electrode (the first electrode 121X and/or the second electrode 121Y), there is space C, the present embodiment only has the electrode 121X in a direction to illustrate for conductive layer 120 on a surface of substrate 110, first refractive rate layer 140 is at least filled in the C of space, in this embodiment, the refractive index of first refractive rate layer 140 is that n4, n4 and n1 are identical or close.The material of first refractive rate layer 140 can select different materials because of the difference of conductive layer 120 electrode material, during as being Nano Silver (refractive index size is 1.7 to 2.0) when conductive layer 120 material, the material of first refractive rate layer 140 can be silicon nitride (refractive index size is 1.7 to 2.0).Identical or close from the refractive index n1 of conductive layer 120 electrode part thus eliminate conduction region A and etching region B because the different differences of refractive index by the refractive index n4 of first refractive rate layer 140 in the present embodiment, make when extraneous light irradiates conduction region A and etching region B have identical light transmition direction thus make whole contact panel 100 have good exterior quality.
In an implementation column, also the refractive index of protective seam 130 can be improved, thus save the setting of first refractive rate layer 140, concrete scheme is as follows, protective seam 130 adopts the doping between resin material and the hydrophobic material of high index of refraction, such as employing resin material is the hydrophobic material of polymethylmethacrylate and high index of refraction is that hydrophobicity titania (refractive index size is 2.55 to 2.76) adulterates, wherein hydrophobicity titania can be obtained by the mode of surface modification, the method of surface modification mainly comprises inorganic surface modification method (as silicon is coated), organic surface modifying method is (as polymer encapsulation, modification by coupling, surfactant method) etc., the present invention adopts the hydrophobic material of the high index of refraction of doping to form protective seam 130, make protective seam 130 with optical diffuser function and high index of refraction.In the present embodiment, the refractive index of protective seam 130 is that n5, n5 are more than or equal to n1.Thus make protective seam 130 1 aspect have the function of aforementioned minimizing conduction region A refractive index and etching region refractive index difference; On the other hand there is aforesaid optical diffuser function, make whole contact panel 100 have good exterior quality.
In other implementation columns; the material of protective seam 130 also can adopt other materials and hydrophobic material to adulterate; the titania of high index of refraction, zirconium dioxide or niobium pentaoxide and hydrophobic material (as fluorosilane compounds, fluorocarbon) is such as adopted to adulterate, as long as the refractive index that the refractive index n5 of guarantee protective seam 130 is greater than electrode in conductive layer 120 (the first electrode 121X and/or the second electrode 121Y) is n1.
In an implementation column, because the thickness of protective seam 130 is directly proportional to its protective capability, protective seam 130 thickness is thicker, and defencive function is better, and corresponding difficulty of processing is larger.And the thickness of protective seam 130 is thinner, defencive function is just relatively poorer, and corresponding difficulty of processing is less.The experiment proved that, the thickness range of protective seam 130 is 110nm to 130nm, protective seam 130 can be made to balance preferably on difficulty of processing and protective capability, can meet the requirement of processing conditions, also have good protective capability.Accordingly, the thickness range of first refractive rate layer 140 is arranged on 100nm to 150nm.
In sum, the oxidized rear impedance of nano metal that the present invention can be reduced in conductive layer effectively by the change of protective layer material raises, and then affects the touch-control sensitivity of contact panel.In addition, the present invention forms protective seam by dopant material, makes protective seam have optical diffuser function, reduces the difference between conduction region and etching region in conductive layer, thus makes whole contact panel have good exterior quality; In addition the present invention arranges a high refractive index layer to reach the function reducing conduction region refractive index and etching region refractive index difference by the refractive index size of Control protection layer and collocation, thus makes whole contact panel have good exterior quality.
The foregoing is only embodiments of the invention, it is also not used to limit scope of patent protection of the present invention.Anyly have the knack of alike those skilled in the art, not departing from spirit of the present invention and scope, the equivalence of the change done and retouching is replaced, and is still in scope of patent protection of the present invention.
Claims (15)
1. a contact panel, is characterized in that, comprising:
One substrate;
One conductive layer, arrange on the substrate, this conductive layer comprises multiple spaced electrode, and wherein this electrode material comprises nano metal material;
One protective seam, cover on this conductive layer, wherein this protective layer material comprises hydrophobic material.
2. contact panel as claimed in claim 1, is characterized in that: this hydrophobic material is fluorosilane compounds, fluorocarbon.
3. contact panel as claimed in claim 1, is characterized in that: this protective layer material comprises resin material.
4. contact panel as claimed in claim 3, is characterized in that: this resin material comprises polymethylmethacrylate, acryl resin, epoxy resin, acryl resin.
5. contact panel as claimed in claim 3, it is characterized in that: this protective layer material comprises an adjuvant further, this adjuvant comprises stabilizing agent, hardening agent, activating agent.
6. contact panel as claimed in claim 5, it is characterized in that: this resin material percentage composition is 3% to 5%, this hydrophobic material percentage composition is 80% to 90%, and this additive material number percent is 5% to 17%.
7. contact panel as claimed in claim 1, is characterized in that: this nano metal material comprises Nano Silver, Nanometer Copper, nano aluminum or Nano-Zinc.
8. contact panel as claimed in claim 1, is characterized in that: the material of this substrate comprises polyethylene terephthalate, glass, polycarbonate or poly-methyl methacrylate.
9. contact panel as claimed in claim 3, is characterized in that: the refractive index of this electrode is n1, n1 is 1.7 to 2.0.
10. contact panel as claimed in claim 9, is characterized in that: the refractive index of this protective seam is that n2, n2 are less than n1.
11. contact panels as claimed in claim 10; it is characterized in that: more comprise a first refractive rate layer and be arranged between this conductive layer and this substrate or be arranged between this conductive layer and this protective seam; the refractive index of this first refractive rate layer is that n3, n3 are more than or equal to n1.
12. contact panels as claimed in claim 9, it is characterized in that: have space between those spaced electrodes, this first refractive rate layer is at least filled in this space, wherein the refractive index of this first refractive rate layer is that n4, n4 and n1 are identical or close.
13. contact panels as claimed in claim 1, it is characterized in that: this protective seam refractive index is n5, the refractive index of this electrode is n1, and wherein n5 is more than or equal to n1.
14. contact panels as claimed in claim 1, is characterized in that: this protective layer thickness scope is 110nm to 130nm.
15. contact panels as claimed in claim 10, is characterized in that: the thickness range of this first refractive rate layer is 100nm to 150nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310366187.2A CN104375686B (en) | 2013-08-17 | 2013-08-17 | Touch panel |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310366187.2A CN104375686B (en) | 2013-08-17 | 2013-08-17 | Touch panel |
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| CN104375686A true CN104375686A (en) | 2015-02-25 |
| CN104375686B CN104375686B (en) | 2018-09-25 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104867540A (en) * | 2015-04-16 | 2015-08-26 | 浙江科创新材料科技有限公司 | Low-haze transparent conductive film and preparation method thereof |
| CN105700739A (en) * | 2015-12-31 | 2016-06-22 | 奥特路（漳州）光学科技有限公司 | Antibacterial waterproof oil-stain-resisting wear-resistant touch display screen and manufacturing method thereof |
| CN106298860A (en) * | 2016-10-24 | 2017-01-04 | 上海天马微电子有限公司 | A kind of organic electroluminescence display panel and preparation method thereof |
| CN106775167A (en) * | 2017-01-13 | 2017-05-31 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, display device |
| CN114489361A (en) * | 2020-10-23 | 2022-05-13 | 苏州绘格光电科技有限公司 | Conductive electrode and touch screen with same |
| CN114489396A (en) * | 2020-10-23 | 2022-05-13 | 苏州绘格光电科技有限公司 | Conductive electrode and preparation method and application thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1617635A (en) * | 2003-11-12 | 2005-05-18 | 铼宝科技股份有限公司 | Organic luminous panel with hydrophobic layer |
| CN102414761A (en) * | 2009-04-23 | 2012-04-11 | 拓普纳诺斯株式会社 | Carbon nanotube conductive film and method for manufacturing same |
| US20120107558A1 (en) * | 2010-11-01 | 2012-05-03 | Shari Elizabeth Koval | Transparent substrate having durable hydrophobic/oleophobic surface |
-
2013
- 2013-08-17 CN CN201310366187.2A patent/CN104375686B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1617635A (en) * | 2003-11-12 | 2005-05-18 | 铼宝科技股份有限公司 | Organic luminous panel with hydrophobic layer |
| CN102414761A (en) * | 2009-04-23 | 2012-04-11 | 拓普纳诺斯株式会社 | Carbon nanotube conductive film and method for manufacturing same |
| US20120107558A1 (en) * | 2010-11-01 | 2012-05-03 | Shari Elizabeth Koval | Transparent substrate having durable hydrophobic/oleophobic surface |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104867540A (en) * | 2015-04-16 | 2015-08-26 | 浙江科创新材料科技有限公司 | Low-haze transparent conductive film and preparation method thereof |
| CN105700739A (en) * | 2015-12-31 | 2016-06-22 | 奥特路（漳州）光学科技有限公司 | Antibacterial waterproof oil-stain-resisting wear-resistant touch display screen and manufacturing method thereof |
| CN106298860A (en) * | 2016-10-24 | 2017-01-04 | 上海天马微电子有限公司 | A kind of organic electroluminescence display panel and preparation method thereof |
| CN106298860B (en) * | 2016-10-24 | 2019-04-12 | 上海天马微电子有限公司 | A kind of organic light emitting display panel and preparation method thereof |
| CN106775167A (en) * | 2017-01-13 | 2017-05-31 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, display device |
| WO2018130004A1 (en) * | 2017-01-13 | 2018-07-19 | 京东方科技集团股份有限公司 | Touch substrate and manufacturing method therefor, and display apparatus |
| CN106775167B (en) * | 2017-01-13 | 2020-12-18 | 京东方科技集团股份有限公司 | Touch substrate, preparation method thereof and display device |
| US11132092B2 (en) | 2017-01-13 | 2021-09-28 | Boe Technology Group Co., Ltd. | Touch substrate, manufacturing method thereof and display device |
| CN114489361A (en) * | 2020-10-23 | 2022-05-13 | 苏州绘格光电科技有限公司 | Conductive electrode and touch screen with same |
| CN114489396A (en) * | 2020-10-23 | 2022-05-13 | 苏州绘格光电科技有限公司 | Conductive electrode and preparation method and application thereof |
| CN114489396B (en) * | 2020-10-23 | 2024-01-23 | 苏州绘格光电科技有限公司 | Conductive electrode and preparation method and application thereof |
| CN114489361B (en) * | 2020-10-23 | 2024-01-23 | 苏州绘格光电科技有限公司 | Conductive electrode and touch screen with same |
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| CN104375686B (en) | 2018-09-25 |
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