CN104375686B - Touch panel - Google Patents
Touch panel Download PDFInfo
- Publication number
- CN104375686B CN104375686B CN201310366187.2A CN201310366187A CN104375686B CN 104375686 B CN104375686 B CN 104375686B CN 201310366187 A CN201310366187 A CN 201310366187A CN 104375686 B CN104375686 B CN 104375686B
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- Prior art keywords
- refractive index
- touch panel
- protective layer
- layer
- conductive layer
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Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The invention discloses a kind of touch panels, including：One substrate；One conductive layer, on the substrate, which includes multiple spaced electrodes, and the wherein electrode material includes nano metal material for setting；One protective layer is covered on the conductive layer, and wherein the protective layer material includes hydrophobic material.Impedance increases after nano metal of the present invention by the material of change protective layer to be effectively prevented from conductive layer is aoxidized, and then influences the touch-control sensitivity of touch panel.
Description
Technical field
The present invention is particularly relating to a kind of touch panel about a kind of touch technology..
Background technology
With the evolution of touch technology (Touch cont ro1), touch panel (touch pane1) is widely used to
Various consumer electronics devices, such as：The portable electronics such as smartphone, tablet computer, camera, e-book, MP3 player
Product, or the display screen applied to operational control unit.
Touch panel generally includes substrate, conductive layer and protective layer, and on material, conductive is nano metal,
Protective layer material is resin material.In structure, protective layer is formed on conductive layer, to prevent conductive layer occur it is physical or
Damage chemically.
However, since resin material does not have a preferable hydrophobicity, extraneous steam easily infiltrate into after protective layer with conductive layer
Oxidation reaction occurs, causes impedance after nano metal is aoxidized in protective layer to increase, influences being uniformly distributed for conductive layer impedance, into
And influence the touch-control sensitivity of touch panel.
Invention content
Improvement, the main material of protective layer is done using hydrophobic material in terms of the material that the present invention passes through protective layer, is led to
The hydrophobicity of hydrophobic material is crossed to prevent that oxidation reaction occurs with conductive layer after extraneous steam penetrates into protective layer during processing procedure,
To prevent the nano metal in conductive layer from being aoxidized.
One embodiment of the invention provides a substrate；One conductive layer is arranged on the substrate, the conductive layer, including multiple
Every the electrode of setting, wherein the electrode material includes nano metal material；One protective layer is covered on the conductive layer, wherein should
Protective layer material includes hydrophobic material.
Thereby, after the present invention is aoxidized by the nano metal that the change of protective layer material can be effectively prevented from conductive layer
Impedance increases, and then influences the touch-control sensitivity of touch panel.
In order to be further understood that technology, method and effect of the invention taken to reach set purpose, please refer to
Detailed description, schema below in connection with the present invention, it is believed that purpose, feature and the feature of the present invention, when can thus be able to deeply and
Specific understanding, however institute's accompanying drawings are only for reference and description with attachment, the person of being not intended to limit the present invention.
For the feature of the present invention can be clearer and more comprehensible, special embodiment below, and coordinate institute's accompanying drawings, it elaborates
It is as follows：
Description of the drawings
Fig. 1 shows the diagrammatic cross-section of the touch panel of one embodiment of the invention.
Fig. 2 shows the schematic top plan view of the conductive layer in one embodiment of the invention.
Fig. 3 shows the schematic top plan view of the conductive layer in another embodiment of the present invention.
The diagrammatic cross-section of the touch panel of Fig. 4 displays implementation column of the invention.
Fig. 5 shows the diagrammatic cross-section of the touch panel of one embodiment of the invention.
Fig. 6 shows the diagrammatic cross-section of the touch panel of one embodiment of the invention.
Specific implementation mode
So-called orientation "upper" and "lower", are intended merely to indicate opposite position relationship, for this explanation in this specification
For the schema of book, user is closer to above touch panel, and lower section is then further away from user.
Fig. 1 is please referred to, Fig. 1 shows the diagrammatic cross-section of the touch panel of one embodiment of the invention.The touch-control of the present embodiment
Panel 100 includes substrate 110, conductive layer 110, protective layer 120.Wherein, polyethylene terephthalate can be used in substrate 110
The transparent materials such as fat, glass, makrolon or poly-methyl methacrylate.Conductive layer 120 is set on substrate 110, protective layer 130
It is covered on conductive layer 120.Conductive layer 120 and the detailed aspects of protective layer 130 will be illustrated in subsequent content.
The material of protective layer 130 includes hydrophobic material, wherein hydrophobic material mainly packet fluorosilane compounds, carbon fluorination
Close the materials such as object.The good hydrophobic ability of hydrophobic material is utilized in this implementation so that extraneous steam is touching hydrophobicity material
Expect partial air can be caused by " pass is arrived " water and hydrophobicity material because hydrophobic material surface has microspike when the surface of solids
Between expecting the surface of solids, causes water largely to be contacted with air, subtract significantly with hydrophobic material surface of solids direct contact area
It is small to form drops.Oxidation reaction effect occurs with conductive layer 120 to reach to reduce after extraneous steam penetrates into protective layer 130.
In an implementation column, the material of protective layer 130 can further include resin material other than comprising hydrophobic material, wherein
Resin material includes mainly polymethyl methacrylate, acryl resin, epoxy resin, acrylic resin or aforementioned combination.
Increase adhesive force of the hydrophobic material on conductive layer 120 using the preferable tackness of resin material in this implementation column.Another
In one implementation column, the material of protective layer 130 can also include addition other than comprising above-mentioned resin material and hydrophobic material
Agent, wherein additive mainly include stabilizer, curing agent or activating agent, additive etc., and additive is mainly to by resinous wood
Material is with hydrophobic material proportioning at a stable mixture, and hydrophobic material percentage composition is 80% to arrive in the mixture
90%, the percentage composition of resin material is 3% to 5%, and the percentage composition of additive is 5% to 17%.In processing procedure, pass through
The solute that content by mixture composition is 3%, it is that 97% propylene glycol monomethyl ether carries out being dissolved into phase as solvent that content, which is used in combination,
The solution answered is forming protective layer 130.
Fig. 2 is please referred to, Fig. 2 shows the schematic top plan view of the conductive layer 120 in one embodiment of the invention.Conductive layer 120 wraps
Multiple spaced electrodes are included, concrete structure can be to include the first electrode 121X of a plurality of arrangements in column, a plurality of rows
It arranges rows of second electrode 121Y and connects the plural interconnecting piece 122 of adjacent second electrode 121Y in the row direction.First
Electrode 121X and second electrode 121Y are respectively separated setting, and the material of first electrode 121X and second electrode 121Y can be silver nanoparticle
The nano metal materials such as silver, Nanometer Copper, nano aluminum or Nano-Zinc or aforementioned combination.In each interconnecting piece 122 of conductive layer 120
Top is insulation division 123.In some embodiments, insulation division 123 is the insulating materials of organic or inorganic, for example, polyimide
The materials such as (p o l y i m i de), epoxy resin.It is bridge 124 on insulation division 123, bridge 124 is in column direction
It is upper to be electrically connected adjacent first electrode 121X.Bridge 124 can be the metal materials such as silver, aluminium, can also be used with electrode
Material identical.
Fig. 3 is please referred to, Fig. 3 shows the schematic top plan view of the conductive layer in another embodiment of the present invention.In another implementation column
In, conductive layer 120 has plural number first electrode 121X, the setting of the intervals first electrode 121X, wherein first electrode 121X materials
Including nano metal material.In Fig. 3 by conductive layer 120 on a surface of substrate 110 only there are one direction electrode for
Explanation.It is worth noting that, conductive layer 120 can also have second electrode (not shown), the second electrode is relative to first
Electrode 121X can be arranged on another surface of substrate 110, can also be arranged on other one piece of substrate.
It is worth noting that, the mode for forming conductive layer 120 includes mainly the modes such as laser-induced thermal etching mode, lithography.
Conduction region A with nano metal material can be formed on conductive layer 120 using above-mentioned technique and do not had after being removed because of etching
The etching region B of nano metal material, and the refractive index of nano metal is generally 1.7 to 2.0 in the prior art, substrate 110
Refractive index is generally 1.4 to 1.6, and the refractive index of etching region B is exactly the refractive index of substrate 110 at this time, therefore has nano metal
The refractive index of the conduction region A of material is bigger than the etching region B without nano metal, in the case of ambient irradiates,
Since conduction region A is different to the refractive index of light from etching region B, thus, which light can not in the direction of propagation of corresponding region
Together, and in a certain region, conduction region A and etching region B the light reflected can intersect, at light focusing brightness compared with
Height, user are easy to have apparent difference by being observed at the focusing between conduction region A and etching region B, cause entire
The problem of 100 bad order of touch panel.
In an implementation column, the refractive index of electrode (first electrode 121X and/or second electrode 121Y) is in conductive layer 120
N1, such as when electrode material is nano silver, n1 is 1.7 to 2.0.The refractive index of protective layer 130 is n2, and n2 is less than n1, at some
N2 is 1.2 to 1.5 in implementation column.The material of protective layer 130 is mixed using the hydrophobic material of resin material and low-refraction
It is miscellaneous, for example, by using the hydrophobicity that resin material is polymethyl methacrylate (refractive index size is 1.4 to 1.5) and low-refraction
Material is that the combination of hydrophobic silica (refractive index size is 1.2 to 1.4) is doped, and wherein hydrophobic silica can
Chemical reaction occurs so that two by hydrophilic silicon oxides and active silane (such as chlorosilane or hexamethyldisilazane)
Silicon oxide surface forms unhydrolyzed hydrophobic grouping (such as methyl group) and obtains.In other implementation columns, low-refraction it is hydrophobic
Property material may be polysiloxane compound, wherein the refractive index size of polysiloxane compound be 1.39 to 1.41.This hair
The bright material using doping forms protective layer 130 so that protective layer 130 has the function of optical diffuser, can make the big portion of ambient
Divide protected seam 130 to reflect away, the amount of light into conductive layer 120 is made to reduce, and then reflected by conductive layer 120
Light is also less, to reduce the difference in conductive layer 120 between conduction region A and etching region B, improves entire touch panel 100
The problem of bad order.
In other implementation columns, the material of protective layer 130 can also be doped using other materials with hydrophobic material,
As long as ensureing that the refractive index n2 of protective layer 130 is less than electrode (first electrode 121X and/or second electrode 121Y) in conductive layer 120
Refractive index be n1.
Please referring to Fig. 4, the present embodiment and embodiment illustrated in fig. 1, difference lies in one first refractive index layer 140 of setting is being led
Between electric layer 120 and substrate 110, wherein the refractive index of 120 electrode of conductive layer is n1, such as when electrode material is nano silver, n1
It is 1.7 to 2.0.The refractive index of protective layer is n2, and n2 is 1.2 to 1.5.First refractive index layer refractive index is n3, and n3 is more than or equal to
n1.The material of first refractive index layer can select titanium dioxide (refractive index size is 2.55 to 2.76), zirconium dioxide (refractive index
Size is 2.1 to 2.3), niobium pentaoxide (refractive index size is 2.2 to 2.35) or combination above-mentioned.A side in the present embodiment
The refractive index n1 that face is more than or equal to 120 electrode section of conductive layer by the refractive index n3 of first refractive index layer 140 reduces conduction region A
From etching region B because of the different differences of refractive index, to be greatly reduced in the case where ambient irradiate conduction region A and
The light that etching region B is reflected is gathered together；On the other hand the optical diffuser having the function of by protective layer 130 can make the external world
Light major part protected seam 130 reflects away, and so that the amount of light into conductive layer 120 is reduced, and then anti-by conductive layer 120
The light shot out is also less, to reduce the difference in conductive layer 120 between conduction region A and etching region B so that entire touch
Controlling panel 100 has preferable exterior quality.
Please refer to Fig. 5, it is notable that the position of first refractive index layer 140 is not limited in state shown in Fig. 4
Sample, in another implementation column, first refractive index layer 140 can be between conductive layer 120 and the protective layer 130.
Fig. 6 is please referred to, in another implementation column, spaced electrode (first electrode 121X and/or second electrode
There is gap C, only there are one the electrodes in direction on a surface of substrate 110 with conductive layer 120 for the present embodiment between 121Y)
Illustrating for 121X, first refractive index layer 140 is at least filled in the C of gap, in this embodiment, first refractive index layer 140
Refractive index is n4, and n4 is same or similar with n1.The material of first refractive index layer 140 can be because of the difference of 120 electrode material of conductive layer
And different materials is selected, and such as when 120 material of conductive layer is nano silver (refractive index size is 1.7 to 2.0), first refractive index
The material of layer 140 can be silicon nitride (refractive index size is 1.7 to 2.0).By first refractive index layer 140 in the present embodiment
Refractive index n4 and the refractive index n1 of 120 electrode section of conductive layer are same or similar to eliminate conduction region A and etching region B because of folding
The different differences for penetrating rate, in the case where ambient irradiates so that conduction region A and the light propagation sides having the same etching region B
To so that entire touch panel 100 has preferable exterior quality.
In an implementation column, the refractive index of protective layer 130 can also be improved, to save setting for first refractive index layer 140
It sets, specific scheme is as follows, and protective layer 130 uses the doping between resin material and the hydrophobic material of high refractive index, such as
It for the hydrophobic material of polymethyl methacrylate and high refractive index is that (refractive index is big for hydrophobicity titanium dioxide to use resin material
Small is 2.55 to 2.76) it is doped, wherein hydrophobicity titanium dioxide can be made in such a way that surface is modified, and surface changes
Property method mainly include inorganic surface modification method (such as silicon cladding), organic surface modifying method (such as polymer encapsulation, coupling agent
Method, surfactant method) etc., the present invention forms protective layer 130 using the hydrophobic material of the high refractive index of doping so that protection
Layer 130 is with optical diffuser function and high refractive index.In the present embodiment, the refractive index of protective layer 130 is n5, and n5 is more than
Equal to n1.So that 130 one side of protective layer has the aforementioned work(for reducing conduction region A refractive index and etching region refractive index difference
Energy；On the other hand has the function of optical diffuser above-mentioned so that entire touch panel 100 has preferable exterior quality.
In other implementation columns, the material of protective layer 130 can also be doped using other materials with hydrophobic material,
For example, by using the titanium dioxide of high refractive index, zirconium dioxide or niobium pentaoxide and hydrophobic material (such as fluorosilane compounds, carbon
Fluorine compounds) it is doped, as long as ensureing that the refractive index n5 of protective layer 130 is more than electrode (first electrode 121X in conductive layer 120
And/or second electrode 121Y) refractive index be n1.
In an implementation column, since the thickness of protective layer 130 is directly proportional to its protective capability, 130 thickness of protective layer is thicker,
Defencive function is better, and corresponding difficulty of processing is bigger.And the thickness of protective layer 130 is thinner, defencive function is just relatively poorer, phase
The difficulty of processing answered is with regard to smaller.The experiment proved that the thickness range of protective layer 130 is 110nm to 130nm, protective layer may make
130 preferably balance on difficulty of processing and protective capability, can meet the requirement of processing conditions, it may have preferably protect energy
Power.Correspondingly, the thickness range of first refractive index layer 140 is arranged in 100nm to 150nm.
In conclusion the present invention can efficiently reduce the nano metal in conductive layer by oxygen by the change of protective layer material
Impedance increases after change, and then influences the touch-control sensitivity of touch panel.In addition, the present invention forms protection by dopant material
Layer makes protective layer have the function of optical diffuser, reduces the difference between conduction region and etching region in conductive layer, so that entirely
Touch panel has preferable exterior quality；In addition the present invention is arranged one by the refractive index size and collocation for controlling protective layer
High refractive index layer reduces the function of conduction region refractive index and etching region refractive index difference to reach, so that entire touch panel
With preferable exterior quality.
Example the above is only the implementation of the present invention is not limited to the scope of patent protection of the present invention.It is any ripe
Practise alike those skilled in the art, do not departing from spirit and scope of the invention, made by change and retouching equivalence replacement, be still this hair
In bright scope of patent protection.
Claims (14)
1. a kind of touch panel, which is characterized in that including：
One substrate；
One conductive layer, on the substrate, which includes multiple spaced electrodes and between those electrodes for setting
Etching region, the material of wherein those electrodes includes nano metal material；
One protective layer is covered in those electrodes on the etching region, and wherein the protective layer material includes hydrophobic material doping tree
Fat material, and the protective layer has the function of optical diffuser by the doping of the hydrophobic material and the resin material, reduces
Difference between those electrodes and the etching region.
2. touch panel as described in claim 1, it is characterised in that：The hydrophobic material is that fluorosilane compounds or carbon are fluorinated
Close object.
3. touch panel as described in claim 1, it is characterised in that：The resin material includes polymethyl methacrylate, Asia
Gram force resin, epoxy resin or acrylic resin.
4. touch panel as described in claim 1, it is characterised in that：The protective layer material further comprises an additive, should
Additive includes stabilizer, curing agent or activating agent.
5. touch panel as claimed in claim 4, it is characterised in that：The resin material percentage composition is 3% to 5%, should
Hydrophobic material percentage composition is 80% to 90%, which is 5% to 17%.
6. touch panel as described in claim 1, it is characterised in that：The nano metal material includes nano silver, Nanometer Copper, receives
Rice aluminium or Nano-Zinc.
7. touch panel as described in claim 1, it is characterised in that：The material of the substrate includes polyethylene terephthalate
Fat, glass, makrolon or poly-methyl methacrylate.
8. touch panel as described in claim 1, it is characterised in that：The refractive index of the electrode is n1, and n1 is 1.7 to 2.0.
9. touch panel as claimed in claim 8, it is characterised in that：The refractive index of the protective layer is n2, and n2 is less than n1.
10. touch panel as claimed in claim 9, it is characterised in that：A first refractive index layer is further included to be arranged in the conduction
Between layer and the substrate or it is arranged between the conductive layer and the protective layer, the refractive index of the first refractive index layer is n3, and n3 is big
In equal to n1.
11. touch panel as claimed in claim 10, it is characterised in that：There is gap between those spaced electrodes,
The first refractive index layer is at least filled in the gap, wherein the refractive index of the first refractive index layer be n4, n4 and n1 it is identical or
Person is close.
12. touch panel as described in claim 1, it is characterised in that：The protective layer refractive index is n5, the refractive index of the electrode
It is more than or equal to n1 for n1, wherein n5.
13. touch panel as described in claim 1, it is characterised in that：The protective layer thickness ranging from 110nm to 130nm.
14. touch panel as claimed in claim 10, it is characterised in that：The thickness range of the first refractive index layer is 100nm
To 150nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310366187.2A CN104375686B (en) | 2013-08-17 | 2013-08-17 | Touch panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310366187.2A CN104375686B (en) | 2013-08-17 | 2013-08-17 | Touch panel |
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| CN104375686A CN104375686A (en) | 2015-02-25 |
| CN104375686B true CN104375686B (en) | 2018-09-25 |
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| CN201310366187.2A Active CN104375686B (en) | 2013-08-17 | 2013-08-17 | Touch panel |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104867540B (en) * | 2015-04-16 | 2018-02-02 | 浙江科创新材料科技有限公司 | A kind of low haze transparent conductive film and preparation method thereof |
| CN105700739A (en) * | 2015-12-31 | 2016-06-22 | 奥特路（漳州）光学科技有限公司 | Antibacterial waterproof oil-stain-resisting wear-resistant touch display screen and manufacturing method thereof |
| CN106298860B (en) * | 2016-10-24 | 2019-04-12 | 上海天马微电子有限公司 | A kind of organic light emitting display panel and preparation method thereof |
| CN106775167B (en) * | 2017-01-13 | 2020-12-18 | 京东方科技集团股份有限公司 | Touch substrate, preparation method thereof and display device |
| CN114489361B (en) * | 2020-10-23 | 2024-01-23 | 苏州绘格光电科技有限公司 | Conductive electrode and touch screen with same |
| CN114489396B (en) * | 2020-10-23 | 2024-01-23 | 苏州绘格光电科技有限公司 | Conductive electrode and preparation method and application thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1617635A (en) * | 2003-11-12 | 2005-05-18 | 铼宝科技股份有限公司 | Organic luminous panel with hydrophobic layer |
| CN102414761A (en) * | 2009-04-23 | 2012-04-11 | 拓普纳诺斯株式会社 | Carbon nanotube conductive film and method for manufacturing same |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120107558A1 (en) * | 2010-11-01 | 2012-05-03 | Shari Elizabeth Koval | Transparent substrate having durable hydrophobic/oleophobic surface |
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2013
- 2013-08-17 CN CN201310366187.2A patent/CN104375686B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1617635A (en) * | 2003-11-12 | 2005-05-18 | 铼宝科技股份有限公司 | Organic luminous panel with hydrophobic layer |
| CN102414761A (en) * | 2009-04-23 | 2012-04-11 | 拓普纳诺斯株式会社 | Carbon nanotube conductive film and method for manufacturing same |
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| CN104375686A (en) | 2015-02-25 |
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