CN104375263B - Large-numerical-aperture projection optical system comprising two reflecting mirrors - Google Patents
Large-numerical-aperture projection optical system comprising two reflecting mirrors Download PDFInfo
- Publication number
- CN104375263B CN104375263B CN201410669843.0A CN201410669843A CN104375263B CN 104375263 B CN104375263 B CN 104375263B CN 201410669843 A CN201410669843 A CN 201410669843A CN 104375263 B CN104375263 B CN 104375263B
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- group
- focal length
- transmission group
- plus lens
- lens
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
- G02B13/002—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design having at least one aspherical surface
- G02B13/0045—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design having at least one aspherical surface having five or more lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
Abstract
The invention provides a large-numerical-aperture projection optical system comprising two reflecting mirrors. The projection optical system is used for imaging images on an object plane into an image plane. The large-numerical-aperture projection optical system comprising the two reflecting mirrors comprises the two ellipsoid reflecting mirrors coaxially placed and seven transmission sets in the optical axis direction. The transmission set G1 with the positive focal distance, the transmission set G2 with the positive focal distance, the transmission set G3 with the positive focal distance, the transmission set G4 with the positive focal distance, the transmission set G5 with the negative focal distance, the transmission set G6 with the negative focal distance, the transmission set G7 with the positive focal distance and the transmission set G8 with the positive focal distance are sequentially arrayed in the incidence direction of light beams. The large-numerical-aperture projection optical system comprising the two reflecting mirrors has the advantages that the numerical aperture is large, and the imaging quality is good.
Description
Technical field
The present invention relates to a kind of for the large-numerical aperture projection optics system in lithography process, semiconductor element producing device
System, belongs to projection optics technical field.
Background technology
Photoetching is a kind of ic manufacturing technology, and it utilizes the principle of optical projection image by the ic figure on mask plate
High graphics is transferred to the optical exposure process on gluing silicon chip, the system of nearly all integrated circuit in the way of exposing
Make is all using optical projection lithography technology.
With scientific and technical continuous progress, classes of semiconductors chip is widely used in Aero-Space military field and calculating
The civil areas such as machine, with the continuous improvement that equipment performance is required, the resolution requirement more and more higher to semiconductor chip.Mesh
The manufacture of front litho machine in the world is nearly at monopoly position, and 3 maximum manufacturers are asml, nikon and canon.From
From 2004, this several company is provided with 193nm immersed photoetching machine sample and uses for each large chip manufacturer, so far, opens
Send the 193nm immersed photoetching machine of Multiple Type.Photoetching technique be the development of China chip industry important support type technology it
One, projection lithography device is the key equipment of large scale integrated circuit manufacturing process.Large-numerical aperture high accuracy projection optics system
System is the core component of high tip litho machine, and its performance directly decides the precision of litho machine.Domestic at present just start work
Make the projection optical system practical research of wavelength 193nm, conventional design value aperture is also all not bery high, and highest resolving power is
0.35-0.5 micron.Due to resolution low it is impossible to produce the figure of high-accuracy high-resolution, can not meet large-scale integrated
The demand that circuit manufactures and studies.
The formula that be can get litho machine resolving power by Rayleigh Diffraction Theorem is as follows:
R=k1λ/na
In above formula, r is the resolving power of litho machine, k1For the technological coefficient factor, λ is operation wavelength, and na is light projection photoetching objective lens
Numerical aperture.
From above formula, the wavelength of light source in order to obtain higher resolution, can be shortened by, or increase throwing
The numerical aperture of shadow lithographic objective realizing, but when optical source wavelength shortens, because optical glass is used for throwing to the absorption of light
The material category of shadow lithographic objective can be very limited.
Content of the invention
The deficiency little in order to solve existing lithographic objective numerical aperture, it is an object of the invention to provide a kind of operation wavelength is
193nm, numerical aperture is 0.93 large-numerical aperture projection optical system.For reaching described purpose, the present invention provides one kind to contain
There is the large-numerical aperture projection optical system of two reflecting mirrors, with the object plane input beam direction of propagation as systematic optical axis, be
It is sequentially placed transmission group g1, transmission group g2, transmission group g3, transmission group g4, transmission group g6, transmission group g7, transmission group on system optical axis
G8 and reflection group g5, wherein transmission group g1 focal length are just, transmission group g2 focal length is just, transmission group g3 focal length is just transmission group g4
Focal length is that just transmission group g6 focal length is negative, and transmission group g7 focal length is just, transmission group g8 focal length is that just reflection group g5 focal length is negative.
The ratio range of the focal length of the focal length of lens group g1 and reflection group g7 is interval to be [- 0.7, -0.62],
The ratio range of the focal length of the focal length of lens group g2 and reflection group g7 is interval to be [- 3.3；- 2.7],
The ratio range of the focal length of the focal length of lens group g3 and reflection group g7 is interval to be [- 1.6, -1.3],
The ratio range of the focal length of the focal length of lens group g4 and reflection group g7 is interval to be [- 2.4, -2.2],
The ratio range of the focal length of the focal length of lens group g6 and reflection group g7 is interval to be [1.0,1.3],
The ratio range of the focal length of the focal length of lens group g7 and reflection group g7 is interval to be [- 1.1, -0.9],
The ratio range of the focal length of the focal length of lens group g8 and reflection group g7 is interval to be [- 0.6, -0.4].
Transmission group g1 includes the first plus lens (1), the second plus lens (2), the 3rd plus lens (3), the 4th plus lens (4)；
Transmission group g2 includes the 5th plus lens (5), the 6th plus lens (6), the first minus lenses (7), the 7th plus lens (8)；
Transmission group g3 includes the 8th plus lens (9)；
Transmission group g4 includes the 9th plus lens (10), the tenth plus lens (11)；
Reflection group g5 includes the first reflecting mirror (12), the second reflecting mirror (13), and the wherein first reflecting mirror (12) focal length is just,
Second reflecting mirror focal length (13) is negative, and the focal length ratio range intervals of the focal length of the first reflecting mirror (12) and reflection group g5 are
[0.5,0.65], the focal length ratio range intervals of the focal length of the second reflecting mirror (13) and reflection group g5 are [- 0.5, -0.4]；
Transmission group g6 includes the 11st plus lens (14), the second minus lenses (15), the 12nd plus lens (16), the 13rd just
Lens (17)；
Transmission group g7 includes the 3rd minus lenses (18), the 14th plus lens (19), the 15th plus lens (20), the 16th just
Lens (21), the 17th plus lens (22)；
Transmission group g8 include the 18th plus lens (23), the 19th plus lens (24), the 20th plus lens (25), the 20th
One plus lens (26).
The invention has the advantages that
1st, the numerical aperture of the large-numerical aperture projection optical system of the present invention is 0.93, and operation wavelength is 193nm, image space
Visual field is 26mm × 5.5mm, because numerical aperture of objective is big, overcomes the little deficiency of existing light projection photoetching objective lens numerical aperture,
Improve photoetching resolution.
2nd, the large-numerical aperture projection optical system of the present invention is by transmission group g1, transmission group g2, transmission group g3, transmission group
G4, reflection group g5, transmission group g6, transmission group g7, transmission group g8 are constituted, and eight groups of mirrors are coaxial, reduce and debug integrated difficulty.
3rd, in the large-numerical aperture projection optical system of the present invention, transmission group g1 comprises 4 lens, and transmission group g2 comprises 4
Lens, transmission group g3 comprises 1 lens, and transmission group g4 comprises 2 lens, and reflection group g5 comprises 2 reflecting mirrors, transmission group g6 bag
Containing 4 lens, transmission group g7 comprises 5 lens, and transmission group g8 comprises 4 lens, the mirror in all transmission groups and reflection group
It is monolithic mirror, system structure is simply compact.
4th, the large-numerical aperture projection optical system of the present invention has good imaging characteristic.
Large-numerical aperture projection optical system proposed by the invention, can apply to lighting source wavelength is 193nm's
In deep ultraviolet immersion projection lithography device.
Brief description
Fig. 1 is a kind of structural representation of large-numerical aperture projection optical system containing two reflecting mirrors of the present invention；
Drawing reference numeral illustrates:
1- first plus lens, 2- second plus lens, 3- the 3rd plus lens, 4- the 4th plus lens, 5- the 5th plus lens, 6-
Six plus lens, 7- first minus lenses, 8- the 7th plus lens, 9- the 8th plus lens, 10- the tenth plus lens, 11- the 11st are just saturating
Mirror, 12- first reflecting mirror, 13- second reflecting mirror, 14- the 11st plus lens, 15- second minus lenses, 16- the 12nd plus lens,
17- the 13rd plus lens, 18- the 3rd minus lenses, 19- the 14th plus lens, 20- the 15th plus lens, 21- the 16th are just saturating
Mirror, 22- the 17th plus lens, 23- the 18th plus lens, 24- the 19th plus lens, 25- the 20th plus lens, 26- the 20th
One plus lens, 27- image planes.
Specific embodiment
In order to objects and advantages of the present invention are better described, with specific embodiment, the present invention is made below in conjunction with the accompanying drawings into
One step explanation.
Fig. 1 is large-numerical aperture projection optical system schematic layout pattern of the present invention, 26 optical elements formed transmission group g1,
Transmission group g2, transmission group g3, transmission group g4, reflection group g5, transmission group g6, transmission group g7, transmission group g8, incident from light beam successively
Direction is arranged.
Transmission group g1 is positive unit group for focal length, including the first plus lens 1, the second plus lens 2, the 3rd plus lens 3,
Four plus lens 4, light is projected by object plane and enters transmission group g2 after transmission group g1 is assembled.
Transmission group g2 is positive unit group for focal length, including the 5th plus lens 5, the 6th plus lens 6, the first minus lenses 7,
Seven plus lens 8, light enters transmission group g3 by transmission group 1 outgoing after the convergence of transmission group g2.
Transmission group g3 is positive unit group for focal length, and including the 8th plus lens 9, light is by transmission group g2 outgoing through transmission
Group g3 enters transmission group g4 after assembling.
Transmission group g4 is positive unit group for focal length, and including the 9th plus lens 10, the tenth plus lens 11, light is by transmission group
G3 outgoing enters reflection group g5 after the convergence of transmission group g4.
Reflection group g5 is negative unit group for focal length, and including the first reflecting mirror 12, the second reflecting mirror 13, light is by transmission group
G4 outgoing enters transmission group g6 after reflection group g5 dissipates.
Transmission group g6 is negative unit group for focal length, just saturating including the 11st plus lens 14, the second minus lenses the 15, the 12nd
Mirror 16, the 13rd plus lens 17, light enters transmission group g7 by reflecting group g5 outgoing after transmission group g6 dissipates.
Transmission group g7 is positive unit group for focal length, just saturating including the 3rd minus lenses 18, the 14th plus lens the 19, the 15th
Mirror 20, the 16th plus lens 21, the 17th plus lens 22, light is entered thoroughly after the convergence of transmission group g7 by transmission group g6 outgoing
Penetrate group g8.
Transmission group g8 is positive unit group for focal length, including the 18th plus lens 23, the 19th plus lens the 24, the 20th just
Lens (25), the 21st plus lens (26), light reaches image planes by transmission group g7 outgoing after the convergence of transmission group g8.
Transmission group g1, transmission group g2, transmission group g 3, transmission group g 4, transmission group g6, transmission group g7, institute in transmission group g8
Have diaphotoscope use is all fused quartz material, and when at centre wavelength 193nm, the absorbance of fused quartz glass is 1.560491.
For improving the picture matter of large-numerical aperture projection optical system, with the radius on each surface of object lens, thickness, interval, non-
As variable, Applied Optics Design software code-v constructs specific majorized function and system is optimized repeatedly asphere coefficient,
Successive optimization is existing result.
The present embodiment is realized by following technical measures: 193 nanometers of lighting source operation wavelength, and image space 26mm ×
5.5mm, the numerical aperture (na)=0.93 of projection optical system, projection optical system reduction magnification is 0.25 times, big numerical aperture
Footpath projection optical system the first plus lens 1 are apart from object plane 35mm.
Object plane is that mask is just being placed in the first of projection optical system by the large-numerical aperture projection optical system of the present invention
At 35mm before lens, light by object plane send through transmission group g1, transmission group g2, transmission group g3, transmission group g4, reflection group g5,
The picture arrival image planes becoming to reduce 0.25 times after transmission group g6, transmission group g7, eight unit groups of transmission group g8 are on silicon chip.
The distance from mask face to silicon chip face for the large-numerical aperture projection optical system of the present invention is only 1250mm, structure letter
Single compact.Light is reduced by the interval between the radius of curvature of each lens of optimization, thickness, asphericity coefficients and each lens of change
The various aberrations of system.
The large-numerical aperture projection optical system that the present embodiment is made is tested and assessed using following two evaluation meanses:
1st, modulation transfer function (MTF) (mtf) is evaluated
Optical-modulation transfer function (mtf) is to determine projection exposure optical system resolution and the direct evaluation of depth of focus.System
The optical-modulation transfer function of system has reached system diffraction limit, and the cut-off frequency of optical system is 9570lp/mm, has high
Resolution.
2nd, distort
Distortion is that a kind of light projects and focuses on the aberration on a point from a point mask.Exist astigmatism and
During the curvature of field, these points fall in the above or below of plane.And in the case of only existing distortion, these points fall vertical with optical axis
Plane on, but with the distance of optical axis be not to.When there is distortion, image is apparent from, but has dislocation, and full filed is maximum
Distort as 1.32nm.
The present invention passes through to optimize radius of curvature, thickness parameter, asphericity coefficients and the lens separation of each mirror, obtains
As good large-numerical aperture projection optical system of fine quality, have the advantages that overall structure is simply compact, imaging is excellent.
Above-described specific descriptions, have been carried out further specifically to the purpose of invention, technical scheme and beneficial effect
Bright, be should be understood that the specific embodiment that the foregoing is only the present invention, for explaining the present invention, be not used to limit this
The protection domain of invention, all any modification, equivalent substitution and improvement within the spirit and principles in the present invention, done etc., all should
It is included within protection scope of the present invention.
Claims (5)
1. a kind of large-numerical aperture projection optical system containing two reflecting mirrors is it is characterised in that with object plane input beam
The direction of propagation is systematic optical axis, is sequentially placed transmission group g1, transmission group g2, transmission group g3, transmission group g4, anti-on systematic optical axis
Penetrate group g5, transmission group g6, transmission group g7 and transmission group g8, wherein transmission group g1 focal length is just, transmission group g2 focal length is just transmission
Group g3 focal length is just, transmission group g4 focal length is that just transmission group g6 focal length is negative, and transmission group g7 focal length is just transmission group g8 focal length
For just, reflection group g5 focal length is negative；
The ratio range of the focal length of the focal length of lens group g1 and reflection group g5 is interval to be [- 0.7, -0.62],
The ratio range of the focal length of the focal length of lens group g2 and reflection group g5 is interval to be [- 3.3；- 2.7],
The ratio range of the focal length of the focal length of lens group g3 and reflection group g5 is interval to be [- 1.6, -1.3],
The ratio range of the focal length of the focal length of lens group g4 and reflection group g5 is interval to be [- 2.4, -2.2],
The ratio range of the focal length of the focal length of lens group g6 and reflection group g5 is interval to be [1.0,1.3],
The ratio range of the focal length of the focal length of lens group g7 and reflection group g5 is interval to be [- 1.1, -0.9],
The ratio range of the focal length of the focal length of lens group g8 and reflection group g5 is interval to be [- 0.6, -0.4]；
Transmission group g1 includes the first plus lens (1), the second plus lens (2), the 3rd plus lens (3), the 4th plus lens (4)；
Transmission group g2 includes the 5th plus lens (5), the 6th plus lens (6), the first minus lenses (7), the 7th plus lens (8)；
Transmission group g3 includes the 8th plus lens (9)；
Transmission group g4 includes the 9th plus lens (10), the tenth plus lens (11)；
Reflection group g5 includes the first reflecting mirror (12), the second reflecting mirror (13), and the wherein first reflecting mirror (12) focal length is just second
Reflecting mirror (13) focal length is negative, the focal length ratio range intervals of the focal length of the first reflecting mirror (12) and reflection group g5 be [- 0.65 ,-
0.5], the focal length ratio range intervals of the focal length of the second reflecting mirror (13) and reflection group g5 are [0.4,0.5]；
Transmission group g6 includes the 11st plus lens (14), the second minus lenses (15), the 12nd plus lens (16), the 13rd plus lens
(17)；
Transmission group g7 includes the 3rd minus lenses (18), the 14th plus lens (19), the 15th plus lens (20), the 16th plus lens
(21), the 17th plus lens (22)；
Transmission group g8 includes the 18th plus lens (23), the 19th plus lens (24), the 20th plus lens (25), the 21st just
Lens (26).
2. the large-numerical aperture projection optical system containing two reflecting mirrors according to claim 1 it is characterised in that: institute
The first reflecting mirror (12) in the large-numerical aperture projection optical system containing two reflecting mirrors stated and the second reflecting mirror (13)
It is ellipsoid, the clear aperture of the wherein first reflecting mirror (12) is 282mm, and the clear aperture of the second reflecting mirror (13) is
222mm.
3. the large-numerical aperture projection optical system containing two reflecting mirrors according to claim 1 it is characterised in that: institute
19 aspheric surfaces, transmission group is employed altogether in the transmission group of the large-numerical aperture projection optical system containing two reflecting mirrors stated
G1 includes at least 3 aspheric surfaces, and transmission group g2 includes at least 3 aspheric surfaces, and transmission group g4 includes at least 2 aspheric surfaces, reflection
Group g5 includes at least 2 aspheric surfaces, and transmission group g6 includes at least 4 aspheric surfaces, and transmission group g7 includes at least 3 aspheric surfaces, thoroughly
Penetrate group g8 and include at least 2 aspheric surfaces.
4. the large-numerical aperture projection optical system containing two reflecting mirrors according to claim 1 it is characterised in that: institute
The aperture diaphragm of the large-numerical aperture projection optical system containing two reflecting mirrors stated be arranged on the 17th plus lens (22) and
Between 18th plus lens (23).
5. the large-numerical aperture projection optical system containing two reflecting mirrors according to claim 1 it is characterised in that: institute
In the large-numerical aperture projection optical system containing two reflecting mirrors stated, the material of diaphotoscope is all fused quartz, the material of reflecting mirror
Material is all aluminum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410669843.0A CN104375263B (en) | 2014-11-20 | 2014-11-20 | Large-numerical-aperture projection optical system comprising two reflecting mirrors |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410669843.0A CN104375263B (en) | 2014-11-20 | 2014-11-20 | Large-numerical-aperture projection optical system comprising two reflecting mirrors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104375263A CN104375263A (en) | 2015-02-25 |
| CN104375263B true CN104375263B (en) | 2017-01-18 |
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| CN201410669843.0A Expired - Fee Related CN104375263B (en) | 2014-11-20 | 2014-11-20 | Large-numerical-aperture projection optical system comprising two reflecting mirrors |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007086220A (en) * | 2005-09-20 | 2007-04-05 | Fuji Xerox Co Ltd | Image forming apparatus, control method and control program thereof |
| EP1980890A1 (en) * | 2006-01-30 | 2008-10-15 | Nikon Corporation | Cata-dioptric imaging system, exposure device, and device manufacturing method |
| DE102009011329A1 (en) * | 2009-03-05 | 2010-09-09 | Carl Zeiss Smt Ag | Catadioptric projection lens for use in wafer-scanner for immersion lithography, has refractive objective portion with immersion lens group that is made of optical high-index material with refractive index greater than specific value |
| CN103499877A (en) * | 2013-10-10 | 2014-01-08 | 中国科学院光电技术研究所 | Large numerical aperture projection optical system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7929115B2 (en) * | 2007-06-01 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus for microlithography |
-
2014
- 2014-11-20 CN CN201410669843.0A patent/CN104375263B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007086220A (en) * | 2005-09-20 | 2007-04-05 | Fuji Xerox Co Ltd | Image forming apparatus, control method and control program thereof |
| EP1980890A1 (en) * | 2006-01-30 | 2008-10-15 | Nikon Corporation | Cata-dioptric imaging system, exposure device, and device manufacturing method |
| DE102009011329A1 (en) * | 2009-03-05 | 2010-09-09 | Carl Zeiss Smt Ag | Catadioptric projection lens for use in wafer-scanner for immersion lithography, has refractive objective portion with immersion lens group that is made of optical high-index material with refractive index greater than specific value |
| CN103499877A (en) * | 2013-10-10 | 2014-01-08 | 中国科学院光电技术研究所 | Large numerical aperture projection optical system |
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| CN104375263A (en) | 2015-02-25 |
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