CN104357785A - Method for rapidly preparing high-purity yttrium oxide coating for plasma etching machine - Google Patents
Method for rapidly preparing high-purity yttrium oxide coating for plasma etching machine Download PDFInfo
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- CN104357785A CN104357785A CN201410648588.1A CN201410648588A CN104357785A CN 104357785 A CN104357785 A CN 104357785A CN 201410648588 A CN201410648588 A CN 201410648588A CN 104357785 A CN104357785 A CN 104357785A
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Abstract
The invention discloses a method for rapidly preparing a high-purity yttrium oxide coating for a plasma etching machine, which comprises the following steps: 1) pretreating the surface of the part to be sprayed and protecting an uncoated area by using an adhesive tape; 2) adopting high-purity yttrium oxide powder produced by Beijing mining and metallurgy research institute (or with the same performance parameters), wherein the purity is more than or equal to 99.9 percent, and the particle size distribution is 20-40 microns; 3) and adopting a scheme of a three-anode plasma spraying system and a multi-axis manipulator to carry out rapid spraying. Compared with the traditional plasma spraying method, the spraying method adopted by the invention can effectively reduce the heat input of the matrix (the temperature of the matrix is lower than 100 ℃), improve the purity and uniformity of the coating, quickly prepare the high-purity yttrium oxide ceramic coating with the thickness of 120-180 micrometers and the purity of more than or equal to 99% within 1-2 minutes, improve the high-energy plasma erosion resistance of the parts of the very-large-scale integrated circuit etching machine and prolong the service life of the parts of the very-large-scale integrated circuit etching machine.
Description
Technical field
The present invention relates to a kind of method preparing silicate lining layer fast, particularly a kind of fast preparation method of plasma etching machine high-purity yttrium oxide coating.
Background technology
Along with the volume increase of semiconductor wafers processing units and the rising of plasma in process power, make great scale integrated circuit etching machine plasma reaction chamber aluminium matter piece surface barrier material at high-power CF
4, SF
6, O
2, Cl
2, life-span under the erosion of HBr plasma body reduces.When the silicon circular wafer size of processing increases to 12 inches, conventional oxidation aluminum coating Chinese People's Anti-Japanese Military and Political College power plasma erosion ability, can not meet the demands.
Because yttria coating has performance than the erosion of aluminum oxide better plasma resistant and longer work-ing life, become the development trend of plasma-reaction-chamber aluminium matter part coating.Yttria coating, except being applied to etching machine, also obtain application in other unicircuit equipment.
Yttrium oxide material fusing point, up to 2410 DEG C, adopts plasma spraying method preparation to form coating usually.Plasma spraying technology is the plasma body of employing temperatures as high 10,000 degrees Celsius is thermal source, the powder body materials such as pottery, alloy, metal are heated to melting or semi-melting state, and to spray to the method forming the upper layer of adhere firmly through pretreated workpiece surface at a high speed.
Because etching machine protective coating has very high requirement (purity requirement is greater than 99%) to its performance such as purity, homogeneity, therefore require that spraying equipment has stable use properties, spraying process can complete fast, to reduce the pollution that spraying process is introduced, and reduction inputs the heat of matrix component, thus ensure purity and the bonding strength of coating.Spraying is supportingly gathered dust simultaneously, the work cooperate degree of the subsystem such as cooling also requires very high.
Traditional plasma spraying technology exists electric arc makes spray parameters poor stability in the drift of anode root, (beam spot diameter, is little for powder jet temperature lack of homogeneity, fringing effect is remarkable), spraying ceramic materials powder feeding rate low (about 40g/min) causes that production efficiency is low, spray distance is short (about 100mm) and spray time is long causes the problems such as the input of matrix heat is large.And then larger negative effect is produced to the purity, bonding strength, homogeneity etc. of coating and matrix thermal distortion.
Summary of the invention
The object of this invention is to provide a kind of heat spraying method can preparing high-purity yttrium oxide ceramic coating fast, the method overcoming conventional plasma spraying coating process, to prepare coat speeds slow, and heat input is large, coating purity and the low problem of homogeneity.Be mainly used in but be not limited to great scale integrated circuit etching machine plasma reaction chamber aluminium matter part, improving its opposing high energy plasma erosion ability and work-ing life.
In order to solve the problems of the technologies described above, technical scheme of the present invention is: a kind of fast preparation method of plasma etching machine high-purity yttrium oxide coating, mainly comprises the following steps:
1) spraying before to environmental health, spray major-minor equipment and spraying matrix thoroughly clean, and to matrix to be sprayed beyond position effectively protect.The impurity of matrix surface oxide compound and attachment is removed, to increase the mechanical bonding strength of coating and matrix surface by sandblasting, ultrasonic cleaning.
2) purity >=99.9%, the size-grade distribution of Beijing Mine and Metallurgy General Inst being produced (or having equal performance perameter) are that 20-40 μm of high-purity yttrium oxide ceramic powder adds three anode plasma spray systems.Three anode plasma spray systems are equipped with three anode plasma gunes, compare common plasma gun have plasma arc not stable, the powder jet speed high (250-300m/s) of drift parameter and temperature homogeneity good (beam spot diameter, increases 1 times), powder feeding rate high (150-300g/min) production efficiency is high, spray distance is long (about 150mm) reduces the advantage that matrix heat inputs.Satisfactory high-purity yttrium oxide coating can be prepared fast.
3) spray gun of multi-spindle machining hand operation three anode plasma spray system is adopted, in matrix position to be sprayed spraying.Adopt multi-spindle machining hand clamping plasma spray gun, spray gun high speed, accurately movement can be realized, thus raising coating uniformity and spray efficiency, reduction input (substrate temperature is lower than 100 DEG C) to the heat of matrix further.
The scheme of multi-spindle machining hand+three anode plasma spray system that the present invention adopts, adopt Beijing Mine and Metallurgy General Inst to produce the high-purity yttrium oxide powder of (or having equal performance perameter), the processing parameter of typical spraying high-purity yttrium oxide erosion resistant coating is in table 1.Prepared coating has following characteristic: purity >=99%, thickness is 120-180 micron (± 2%), bonding strength >=5MPa, etch rate≤180nm/min when plasma energy is 800W.
The inventive method obtains the yttria coating of high purity, high bond strength and high resistance high energy plasma erosion property, improves the work-ing life of great scale integrated circuit plasma etching machine reaction chamber aluminium matter part.
Embodiment
Before spraying, removed the impurity of oxide on surface and attachment by sandblasting, ultrasonic cleaning.
First adopt appropriate ways to be installed part fixing, dry up surface with pure pressurized air, and with thermospray special protection adhesive tape, matrix is protected without coating position.
Thorough cleaning powder feeder, powder conveying pipe, spray gun, and keep painting environments cleanliness without any pollution, keep larger ventilation and dust removal air quantity in spraying process, guarantee to obtain high-purity yttrium oxide coating.
Adopt Beijing Mine and Metallurgy General Inst to produce the high-purity yttrium oxide ceramic powder of (or having equal performance perameter), and adopt processing parameter as shown in table 1 to spray.
Finally removed by part protective rubber band, thorough cleaning equipment and environmental health, complete spray process.
Table 1 three anode plasma spray system prepares high-purity yttrium oxide erosion resistant coating typical process parameter
Claims (2)
1. prepare a method for plasma etching machine high-purity yttrium oxide coating fast, it is characterized in that, comprise the following steps:
1) spraying before to environmental health, spray major-minor equipment and spraying matrix thoroughly clean, and to matrix to be sprayed beyond position effectively protect;
2) be that the high-purity yttrium oxide ceramic powder of 20-40 μm adds three anode plasma spray systems by purity >=99.9%, size-grade distribution;
3) spray gun of multi-spindle machining hand operation three anode plasma spray system is adopted, in matrix position to be sprayed spraying.
2. method according to claim 1, is characterized in that, spraying parameter is as follows: plasma arc power 65-70kW, powder feeding rate 100-150g/min, spray distance 130-150mm, mechanical manipulator translational speed 0.8-1.2m/s, spray time 1-2 minute.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410648588.1A CN104357785A (en) | 2014-11-14 | 2014-11-14 | Method for rapidly preparing high-purity yttrium oxide coating for plasma etching machine |
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| CN201410648588.1A CN104357785A (en) | 2014-11-14 | 2014-11-14 | Method for rapidly preparing high-purity yttrium oxide coating for plasma etching machine |
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| CN104357785A true CN104357785A (en) | 2015-02-18 |
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| CN201410648588.1A Pending CN104357785A (en) | 2014-11-14 | 2014-11-14 | Method for rapidly preparing high-purity yttrium oxide coating for plasma etching machine |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105701935A (en) * | 2016-03-04 | 2016-06-22 | 广东中威保安服务有限公司 | Magnetic induction type anti-theft alarm clock |
| CN106591763A (en) * | 2015-10-15 | 2017-04-26 | 沈阳富创精密设备有限公司 | Method for preparing high-purity yttrium oxide coating for IC equipment aluminum alloy part through explosion spraying |
| CN106591820A (en) * | 2015-10-15 | 2017-04-26 | 沈阳富创精密设备有限公司 | Preparation method of high-purity yttrium oxide coating for IC equipment critical parts |
| CN109468575A (en) * | 2018-11-29 | 2019-03-15 | 沈阳富创精密设备有限公司 | A kind of preparation method of the yttria coating applied to semiconductor field |
| CN110004393A (en) * | 2019-04-08 | 2019-07-12 | 中国科学院金属研究所 | A kind of supersonic flame spraying technology preparation Y2O3The method of ceramic coating |
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| CN103774082A (en) * | 2014-02-21 | 2014-05-07 | 北京矿冶研究总院 | Preparation method of thermal barrier coating |
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2014
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| WO2003066232A1 (en) * | 2002-02-06 | 2003-08-14 | Sames Technologies | Installation for spraying a coating product and method for cleaning same |
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| CN101182207A (en) * | 2007-11-16 | 2008-05-21 | 北京矿冶研究总院 | Spraying powder containing yttrium oxide and preparation method thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106591763A (en) * | 2015-10-15 | 2017-04-26 | 沈阳富创精密设备有限公司 | Method for preparing high-purity yttrium oxide coating for IC equipment aluminum alloy part through explosion spraying |
| CN106591820A (en) * | 2015-10-15 | 2017-04-26 | 沈阳富创精密设备有限公司 | Preparation method of high-purity yttrium oxide coating for IC equipment critical parts |
| CN106591763B (en) * | 2015-10-15 | 2019-05-03 | 沈阳富创精密设备有限公司 | Detonation flame spraying prepares IC and equips aluminum alloy spare part high-purity yttrium oxide coating process |
| CN106591820B (en) * | 2015-10-15 | 2019-05-03 | 沈阳富创精密设备有限公司 | A kind of preparation method of IC equipment key components and parts high-purity yttrium oxide coating |
| CN105701935A (en) * | 2016-03-04 | 2016-06-22 | 广东中威保安服务有限公司 | Magnetic induction type anti-theft alarm clock |
| CN109468575A (en) * | 2018-11-29 | 2019-03-15 | 沈阳富创精密设备有限公司 | A kind of preparation method of the yttria coating applied to semiconductor field |
| CN110004393A (en) * | 2019-04-08 | 2019-07-12 | 中国科学院金属研究所 | A kind of supersonic flame spraying technology preparation Y2O3The method of ceramic coating |
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