CN104341593B - There is polyimides of low dielectric property and its preparation method and application - Google Patents

There is polyimides of low dielectric property and its preparation method and application Download PDF

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CN104341593B
CN104341593B CN201310329402.1A CN201310329402A CN104341593B CN 104341593 B CN104341593 B CN 104341593B CN 201310329402 A CN201310329402 A CN 201310329402A CN 104341593 B CN104341593 B CN 104341593B
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张艺
刘亦武
许家瑞
吴欣慧
石杰
刘四委
池振国
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Sun Yat Sen University
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Abstract

The invention discloses a kind of polyimides with low dielectric property and its preparation method and application.It is raw material that the polyimides of the present invention uses containing triphenylamine and aromatic diamines and various tetracarboxylic dianhydrides with the big side base containing triphenylethylene/tetraphenyl ethylene, is prepared from by imidizate method.Polyimides of the present invention has ultralow dielectric constant and relatively low dielectric loss, and has the performances such as excellent solubility, higher glass transition temperature and heat stability, excellent mechanical performance and luminescence generated by light.The synthetic method craft of the present invention is simple, various, thus is suitable to commercial production;The polyimides of the present invention can be applicable to prepare dielectric materials, is widely used in the new high-tech industry fields, particularly super large-scale integration field such as electronics, microelectronics, information, luminescent material and Aero-Space.

Description

There is polyimides of low dielectric property and its preparation method and application
Technical field
The present invention relates to material science, particularly one class polyimides with low dielectric property and its preparation method and application.
Technical background
High density, at high speed, Mobyneb, high-performance super large-scale integration (ULSI) require large chip area and little characteristic size, wiring density must be increased for this, reduce the distance between the width of metal wire and line.Device density and line density are greatly increased, so that resistance and line capacitance coupling increase rapidly in interconnection system.Make signal transmission delay even distortion, interference noise strengthen and power dissipation increases, become the bottleneck of high-performance super large-scale integration (ULSI) development further.According to signal transmission delay (RC) and the computing formula model of power (P) and correlation theory, the RC realizing reducing integrated circuit postpones and reduces energy consumption P, and the solution of this problem depends on exploitation and the application of material (ILD) between novel low dielectric layer.
The advanced low-k materials of research is broadly divided into inorganic, organic and hybrid inorganic-organic three major types at present.Organic polymer itself has low polarity, its dielectric constant relatively low (k=2.0-4.0).But the most glass transition temperature low (Tg < 200 DEG C) of organic polymer, poor heat stability, it is impossible to meet the heatproof requirement in ULSI.And full aromatic polyimide is one of kind that in polymer, heat stability is the highest, become the polymer base dielectric materials that research is the most active.
General Intrinsical PI film is about 3.4;K containing naphthalene side chain and aromatic ether structure PI is 2.78 (Tg=294);The K of diamantane (obsolete) race homopolymerization PI and alicyclic homopolymerization PI is 2.5-2.8 at the K of 2.5-2.6, linear aliphatic race PI in the K value of 2.8-2.9, the copolymerization PI of linear aliphatic race and diamantane (obsolete) race, there is good dissolubility and film property, hot strength is that 79-88MPa, Tg are 220-225 DEG C;Fluorine-containing PI is up to 2.49 (Tg=234).Main chain contains the K of on-plane surface big conjugated structure PI up to 2.7, and good film-forming property, hot strength is that 115-130MPa, Tg are 360-409 DEG C, has significant advantage in mechanical property and heat stability;Main chain contain fluorene structured non-fluorine-containing PI up to 2.6.Being consulted reference materials display according to us, can reach less than 2.0 except the dielectric constant of the zeolitic material containing porous at present, the dielectric constant of other intrinsic materials fails less than 2.0.
Major part scholar concentrates on the research of nano-porous polymer material and hybrid inorganic-organic materials in recent years, the micro-nano sky of introducing is used to make the dielectric constant of material reach the requirement of current high-performance super large-scale integration dielectric constant, but in these materials, the overwhelming majority fails to reach other performance requirements of ultra-low dielectric constant material, there is also a lot of problem: (1) complex process, be difficult to control to, production cost high;(2) structure in hole is wayward;(3) it is difficult to control the size in aperture, and pore-size distribution is wider;(4) material mechanical performance is bad, and mechanical strength is relatively low;(5) material is easily generated crackle;(6) during removed template method, void collapse is easily caused;(7) template is by selecting different surfactants to regulate hole size, but optional template limited amount, and expensive.
By the advantage that polyimide molecule structure design is strong, some are used simply to synthesize, synthesis has good space steric effect and the new diamine of hypopolarization rate or dianhydride, it is expected to reach this purpose for synthesis of polyimides, and can effectively overcome the defect of the aspects such as mechanical performance, hot property and preparation technology.
Summary of the invention
It is an object of the invention to provide a class and have the polyimides of low dielectric property, it has the performances such as excellent solubility, higher glass transition temperature and heat stability, excellent mechanical performance and luminescence generated by light.
Another object of the present invention is to provide the preparation method of the above-mentioned polyimides with low dielectric property, its preparation technology is simple and various, and condition requires low, thus is suitable to commercial production.
It is a still further object of the present invention to provide a kind of low dielectric polyimide material, there is ultralow dielectric constant and relatively low dielectric loss, and there is the performances such as excellent solubility, higher glass transition temperature and heat stability, excellent mechanical performance and luminescence generated by light, can be applicable to the field such as dielectric materials, optical material.
The object of the present invention is achieved like this: a kind of polyimides with low dielectric property, it is characterised in that containing following construction unit in general formula of molecular structure:
Wherein: n >=1;X is the aromatic hydrocarbyl of tetravalence;Y is diamidogen residue, and its general structure is one or more in I, II or III
Wherein, Ar1Selected from any one of following structural:
Ar2、Ar3And Ar4Selected from any one of following structural:
X is the aromatic hydrocarbyl of tetravalence, includes but not limited to one or more in following general structure:
The preparation method of the above-mentioned polyimides with low dielectric property, the course of reaction of the method is: in argon gas atmosphere, the hybrid diamine by the diamidogen containing Y structure or containing Y structure and the dianhydride containing X architecture are in molar ratio for 1:(0.9~1.1) it is dissolved in polar non-proton organic solvent,-10~40 DEG C of stirring reactions 0.5~72h, obtain homogeneous, transparent, the polyamic acid solution of thickness, finally polyamic acid solution being carried out is dehydrated imidizate method and obtains the polyimides of solubility.
The polyimides with low dielectric property proposed by the invention, this quasi-polyimide has ultralow dielectric constant and relatively low dielectric loss, and there is the performances such as excellent solubility, higher glass transition temperature and heat stability, excellent mechanical performance and luminescence generated by light, and its preparation technology is simple and various, condition requires low, thus is suitable to commercial production.The polyimides of the present invention can be applicable to prepare dielectric materials and optical material, is widely used in the new high-tech industry fields, particularly super large-scale integration field such as electronics, microelectronics, information, luminescent material and Aero-Space.
Accompanying drawing explanation
Fig. 1 is the infrared spectrogram of four kinds of polyimide films in the embodiment of the present invention, wherein:
A corresponds to Tri-TPA-2NH2/ 6-FDA-PI, b correspond to TPA-TPE-2NH2/ 6FDA-PI,
C corresponds to Tetra-TPA-2NH2/ 6-FDA-PI, d correspond to TPE-TPA-CF3-2NH2/ 6FDA-PI,
E corresponds to TPE-TPA-CF3-2NH2/ BPDA-PI, f correspond to TPE-O-TPA-CF3-2NH2/6FDA-PI。
From the figure, it can be seen that at 1775cm-1And 1715cm-1Place occurs in that and absorbs into asymmetrical stretching vibration peak and the symmetrical stretching vibration of carbonyl on acid imide five-membered ring.At 3049cm-1Place occurs in that=the characteristic absorption frequency of C-H, and 1605cm-1And 1502cm-1Place occurs in that the phenyl ring skeleton stretching vibration absworption peak of feature, 820cm-1Place is the characteristic absorption frequency of para-position two replacement Ar-H, 718cm-1The characteristic absorption frequency that absworption peak is monosubstituted Ar-H that place occurs, these all illustrate that synthesized product all has the feature structure of aromatic polyimide.1165cm-1The characteristic absorption peak that absworption peak is C-F that place occurs.
Detailed description of the invention
The present invention is a kind of polyimides with low dielectric property, can be made into powder body material or thin-film material, is applied to prepare dielectric materials.Its general formula of molecular structure is:
Wherein: n >=1;X is the aromatic hydrocarbyl of tetravalence;Y is diamidogen residue, and its general structure is one or more in I, II or III:
Wherein, Ar1Selected from any one of following structural:
Ar2、Ar3And Ar4Selected from any one of following structural:
X is the aromatic hydrocarbyl of tetravalence, includes but not limited to one or more in following general structure:
During preparation, in argon gas atmosphere, the hybrid diamine by the diamidogen containing Y structure or containing Y structure and the dianhydride containing X architecture are in molar ratio for 1:(0.9~1.1) it is dissolved in polar non-proton organic solvent,-10~40 DEG C of stirring reactions 0.5~72h, obtain homogeneous, transparent, the polyamic acid solution of thickness, finally polyamic acid solution being carried out is dehydrated imidizate and obtains the polyimides of solubility.Preferably, the diamidogen containing Y structure or the hybrid diamine containing Y structure account for the 2~50% of reaction mass gross mass with the dianhydride gross mass containing X architecture.The preferred N-Methyl pyrrolidone of described polar non-proton organic solvent, dimethyl sulfoxide, dimethyl sulfone, sulfolane, 1,4-dioxane, N, one or more mixture in N-dimethyl acetylamide, DMF, metacresol, oxolane etc..
It is hot-imide or chemical imidization that polyamic acid solution dehydration imidizate obtains the method for polyimides.The step of hot-imide method is: by polyamic acid solution blade coating on clean glass plate, again glass plate is placed in baking oven (preferably vacuum drying oven), temperature programming carries out hot-imide, preferably temperature programming program is: first room temperature is to constant temperature after 50~180 DEG C, whole process 10-240 minute;Constant temperature after being warming up to 180~250 DEG C the most again, whole process 10-240 minute;Constant temperature after being finally warming up to 250 DEG C~380 DEG C, whole process 10-360 minute;Polyimide film is i.e. obtained after cooling.The step of chemical imidization method is: add dehydrant in polyamic acid solution, after the stirring that heats up, it is heated to 50~200 DEG C and continues stirring 0.5~72h, pour into after being cooled to room temperature and methanol or acetone obtain polyimides precipitation, filtration drying, i.e. obtains polyimides powder body;Polyimides powder body is dissolved in N-Methyl pyrrolidone (NMP), dimethyl sulfoxide (DMSO), N, N-dimethyl acetylamide (DMAc), N, in dinethylformamide (DMF), metacresol (m-Cresol) or oxolane (THF), after being heated to being completely dissolved, by polyimide solution blade coating on clean glass plate, 70~300 DEG C are dried removal solvent, i.e. obtain polyimide film after cooling.Preferred pyridine/the acetic anhydride of above-mentioned dehydrant, triethylamine/acetic anhydride or sodium acetate/acetic anhydride.
nullFor the diamidogen containing Y structure,Those skilled in the art can design synthetic route according to actually required concrete molecular structure,Use Witting、Witting-Horner、The series reaction synthesis such as Suzuki,Such as may comprise steps of: (A1) utilizes benzophenone to pass through Wittig or Wittig-Horner reaction and change into the big conjugated system monomer containing a halogen atom with triphenylethylene/tetraphenyl ethylene structure,Or,Utilize the substitution reaction of two halogen atoms in monohaloalkyl benzophenone or dihalo benzophenone monomer,Obtain the one monomers containing big conjugated system,Its ketone carbonyl changes into the big conjugated system monomer containing a halogen atom with triphenylethylene/tetraphenyl ethylene structure by Wittig or Wittig-Horner reaction again;(A2) halogen atom of the big conjugated system monomer containing a halogen atom with triphenylethylene/tetraphenyl ethylene structure of step (A1) gained is utilized, reacted by step Suzuki, or by multistep reaction, obtain the monoamine monomer containing the big conjugated system of triphenylethylene/tetraphenyl ethylene;(A3) the monoamine monomer containing the big conjugated system of triphenylethylene/tetraphenyl ethylene utilizing step (A2) gained reacts with halogenated nitrobenzene, obtains containing triphenylamine and the dinitro monomer of the big conjugated system of triphenylethylene/tetraphenyl ethylene;(A4) the dinitro monomer reduction containing triphenylamine conjugated system big with triphenylethylene/tetraphenyl ethylene of step (A3) gained is become diamidogen.
Example is given below so that the present invention will be described in more detail; it is important to point out that following example can not be construed to the restriction to invention protection domain; some nonessential improvement and adjustment that the present invention is made by the person skilled in the art in this field according to foregoing invention content, must belong to protection scope of the present invention.
Embodiment 1
Benzophenone is utilized to react to obtain Tri-Br by Wittig or Wittig-Horner;Then reacted by step Suzuki or by multistep reaction, obtain TrP-NHi2;React with p-fluoronitrobenzene again, obtain Tri-TPA-2NO2;Finally reduction obtains Tri-TAP-2NH2
Under room temperature, by 5.2967g (0.01mol) (Tri-TPA-2NH2) and 64.9g (68.8ml) N, dinethylformamide adds to the there-necked flask of 100ml, it is passed through argon, stirring, after being completely dissolved, add 4.4424g (0.01mol) 4,4-hexafluoro isopropyl phthalic anhydride (6-FDA), continue stirring reaction 12h, it is thus achieved that the polyamic acid solution of homogeneous thickness.Gained polyamic acid solution is scratched on cleaned glass plate, again glass plate is placed in vacuum drying oven, evacuation, heating schedule is: constant temperature (whole process 1h) after room temperature to 100 DEG C → 100 DEG C be warming up to 200 DEG C after constant temperature (whole process 1h) → 200 DEG C be warming up to 300 DEG C after constant temperature (whole process 1h), can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 1.89, and dielectric loss is 0.009, and the thermal weight loss temperature of 5% is 528 DEG C, and glass transition temperature is 270 DEG C, and its fluorescence highest peak corresponding wavelength is 528nm, it is seen that light transmission rate is 85%, and infrared spectrogram is as shown in Figure 1.
Polyimides (the Tri-TPA-2NH with low dielectric property in the present embodiment2/ 6-FDA-PI) molecular structural formula of thin film is as follows:
Embodiment 2
Under room temperature, by 5.2967g (0.01mol) (TPA-TPE-2NH2) and 64.9g (68.8ml) N, dinethylformamide adds to the there-necked flask of 100ml, it is passed through argon, stirring, after being completely dissolved, adds 4.4424g (0.01mol) 4,4-hexafluoro isopropyl phthalic anhydride (6-FDA), continue stirring reaction 12h, it is thus achieved that the polyamic acid solution of homogeneous thickness, its molecular weight is 32.6 × 104, molecular weight distribution is 2.08.Gained polyamic acid solution is scratched on cleaned glass plate, again glass plate is placed in vacuum drying oven, evacuation, heating schedule is: constant temperature (whole process 1h) after room temperature to 100 DEG C → 100 DEG C be warming up to 200 DEG C after constant temperature (whole process 1h) → 200 DEG C be warming up to 300 DEG C after constant temperature (whole process 1h), can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 1.44, and dielectric loss is 0.003, and the thermal weight loss temperature of 5% is 543 DEG C, and glass transition temperature is 306 DEG C, and its fluorescence highest peak corresponding wavelength is 547nm, it is seen that light transmission rate is 88%, and infrared spectrogram is as shown in Figure 1.
Polyimides (the TPA-TPE-2NH with low dielectric property in the present embodiment2/ 6-FDA-PI) molecular structural formula of thin film is as follows:
Embodiment 3
Polyamic acid solution is prepared with the method that embodiment 1 is identical, then chemical imidization is used to prepare polyimides, step is such as: adds 5mL acetic anhydride in gained polyamic acid solution, continues stirring, be slow added into 2.5mL triethylamine, and it is warming up to 70 DEG C, after continuing stirring 6h, solution scratches on cleaned glass plate, then is placed in vacuum drying oven by glass plate, evacuation, 100 DEG C of dry 12h, can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 1.58, dielectric loss is 0.003, the thermal weight loss temperature of 5% is 531 DEG C, glass transition temperature is 302 DEG C, its fluorescence highest peak corresponding wavelength is 539nm, visible light transmissivity is 87%, and the solubility test result of polyimide film and infrared spectrogram are same as in Example 1.
Embodiment 4
Under room temperature, by 1.2115g (2mmol) (Tetra-TPA-2NH2) and 64.9g (68.8ml) N, dinethylformamide adds to the there-necked flask of 100ml, is passed through argon, stirring, after being completely dissolved, add 0.6445g (2mmol) 3,3 ', 4,4 '-benzophenone tetracarboxylic dianhydride (BTDA), continue stirring reaction 12h, it is thus achieved that the polyamic acid solution of homogeneous thickness, its molecular weight is 37.4 × 104, molecular weight distribution is 1.65.Gained polyamic acid solution is scratched on cleaned glass plate, again glass plate is placed in vacuum drying oven, evacuation, heating schedule is: constant temperature (whole process 1h) after room temperature to 100 DEG C → 100 DEG C be warming up to 200 DEG C after constant temperature (whole process 1h) → 200 DEG C be warming up to 300 DEG C after constant temperature (whole process 1h), can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 2.44, and dielectric loss is 0.019, and the thermal weight loss temperature of 5% is 545 DEG C, and glass transition temperature is 306 DEG C, and its fluorescence highest peak corresponding wavelength is 616nm, it is seen that light transmission rate is 85%, and infrared spectrogram is as shown in Figure 1.
Polyimides (the Tetra-TPA-2NH with low dielectric property in the present embodiment2/ 6-FDA-PI) molecular structural formula of thin film is as follows:
Embodiment 5
The substitution reaction utilizing 4-bromine benzophenone obtains PTBM, and its ketone carbonyl changes into TPE-CF by Wittig or Wittig-Horner reaction again3-Br;Then reacted by step Suzuki or by multistep reaction, obtain TPE-CF3-NH2;Carry out reaction with p-fluoronitrobenzene again and obtain TPE-TPA-CF3-2NO2;Finally reduction obtains TPE-TPA-CF3-2NH2
Under room temperature, by 6.7377g (0.01mol) (E)-N1-(4-aminophenyl)-N1-(4'-(2-phenyl-2-(4'-(trifluoromethyl)-biphenyl-4-yl) vinyl) biphenyl-4-yl) benzene-1,4-diamine. (TPE-TPA-CF3-2NH2) and 74.5g (79ml) N, dinethylformamide adds to the there-necked flask of 100ml, it is passed through argon, stirring, after being completely dissolved, adds 4.4424g (0.01mol) 4,4-hexafluoro isopropyl phthalic anhydride (6-FDA), continue stirring reaction 12h, it is thus achieved that the polyamic acid solution of homogeneous thickness, its molecular weight is 29.7 × 104, molecular weight distribution is 2.23.Gained polyamic acid solution is scratched on cleaned glass plate, again glass plate is placed in vacuum drying oven, evacuation, heating schedule is: constant temperature (whole process 1h) after room temperature to 100 DEG C → 100 DEG C be warming up to 200 DEG C after constant temperature (whole process 1h) → 200 DEG C be warming up to 300 DEG C after constant temperature (whole process 1h), can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 1.52, and dielectric loss is 0.008, and the thermal weight loss temperature of 5% is 472 DEG C, and glass transition temperature is 280 DEG C, and its fluorescence highest peak corresponding wavelength is 542nm, it is seen that light transmission rate is 85%, and infrared spectrogram is as shown in Figure 1.
Polyimides (the TPE-TPA-CF with low dielectric property in the present embodiment3-2NH2/ 6FDA-PI) molecular structural formula of thin film is as follows:
Embodiment 6
Under room temperature, by 6.7377g (0.01mol) (E)-N1-(4-aminophenyl)-N1-(4'-(2-phenyl-2-(4'-(trifluoromethyl)-biphenyl-4-yl) vinyl) biphenyl-4-yl) benzene-1,4-diamine. (TPE-TPA-CF3-2NH2) and 64.3g (68.1ml) N, dinethylformamide adds to the there-necked flask of 100ml, it is passed through argon, stirring, after being completely dissolved, add 2.9027g (0.01mol) 4,4'-bibenzene tetracarboxylic dianhydride (BPDA), continue stirring reaction 12h, it is thus achieved that the polyamic acid solution of homogeneous thickness.Gained polyamic acid solution is scratched on cleaned glass plate, again glass plate is placed in vacuum drying oven, evacuation, heating schedule is: constant temperature (whole process 1h) after room temperature to 100 DEG C → 100 DEG C be warming up to 200 DEG C after constant temperature (whole process 1h) → 200 DEG C be warming up to 300 DEG C after constant temperature (whole process 1h), can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 1.94, and dielectric loss is 0.008, and the thermal weight loss temperature of 5% is 465 DEG C, and glass transition temperature is 284 DEG C, and its fluorescence highest peak corresponding wavelength is 559nm, it is seen that light transmission rate is 84%, and infrared spectrogram is as shown in Figure 1.
Polyimides (the TPE-TPA-CF with low dielectric property in the present embodiment3-2NH2/ BPDA-PI) molecular structural formula of thin film is as follows:
Embodiment 7
Under room temperature, by 7.6586g (0.01mol) (TPE-O-TPA-CF3-2NH2) and 80.7g (85.5ml) N, dinethylformamide adds to the there-necked flask of 100ml, it is passed through argon, stirring, after being completely dissolved, add 4.4424g (0.01mol) 4,4-hexafluoro isopropyl phthalic anhydride (6-FDA), continue stirring reaction 12h, it is thus achieved that the polyamic acid solution of homogeneous thickness.Gained polyamic acid solution is scratched on cleaned glass plate, again glass plate is placed in vacuum drying oven, evacuation, heating schedule is: constant temperature (whole process 1 h) after room temperature to 100 DEG C → 100 DEG C be warming up to 200 DEG C after constant temperature (whole process 1h) → 200 DEG C be warming up to 320 DEG C after constant temperature (whole process 1h), can be taken off polyimide film after cooling.The dielectric constant of this polyimide film is up to 2.33, and dielectric loss is 0.02, and the thermal weight loss temperature of 5% is 515 DEG C, and glass transition temperature is 253 DEG C, and its fluorescence highest peak corresponding wavelength is 553nm, it is seen that light transmission rate is 84%, and infrared spectrogram is as shown in Figure 1.
Polyimides (the TPE-O-TPA-CF with low dielectric property in the present embodiment3-2NH2/ 6FDA-PI) molecular structural formula of thin film is as follows:

Claims (10)

1. a polyimides with low dielectric property, it is characterised in that general formula of molecular structure contains following construction unit:
Wherein: n >=1;X is the aromatic hydrocarbyl of tetravalence, and Y is diamidogen residue, general structure be in I, II or III one or both with Upper:
Wherein, Ar1Selected from any one of following structural:
Ar2、Ar3And Ar4Selected from any one of following structural:
The polyimides with low dielectric property the most according to claim 1, it is characterised in that: X is the aromatic hydrocarbyl of tetravalence, is selected from One or more in following general structure:
The polyimides with low dielectric property the most according to claim 1 and 2, it is characterised in that: described polyimides is powder body material Material or thin-film material.
4. the preparation method of the polyimides with low dielectric property described in claim 1 or 2, it is characterised in that: in argon gas atmosphere, will contain The diamidogen of Y structure or the hybrid diamine containing Y structure are 1:(0.9~1.1 in molar ratio with the dianhydride containing X architecture) to be dissolved in aprotic, polar organic molten In agent ,-10~40 DEG C of stirring reactions 0.5~72h, obtain homogeneous, transparent, the polyamic acid solution of thickness, finally to polyamic acid solution Carry out being dehydrated imidizate and obtain the polyimides of solubility.
The preparation method of the polyimides with low dielectric property the most according to claim 4, it is characterised in that: the diamidogen containing Y structure Or the hybrid diamine containing Y structure accounts for the 2~50% of reaction mass gross mass with the dianhydride gross mass containing X architecture.
The preparation method of the polyimides with low dielectric property the most according to claim 4, it is characterised in that: described aprotic, polar has Machine solvent selected from N-Methyl pyrrolidone, dimethyl sulfoxide, dimethyl sulfone, sulfolane, Isosorbide-5-Nitrae-dioxane, N,N-dimethylacetamide, One or more mixture in DMF, metacresol, oxolane.
The preparation method of the polyimides with low dielectric property the most according to claim 4, it is characterised in that: described polyamic acid solution It is hot-imide or chemical imidization that dehydration imidizate obtains the method for polyimides.
The preparation method of the polyimides with low dielectric property the most according to claim 7, it is characterised in that: described hot-imide The step of method is: by polyamic acid solution blade coating on clean glass plate, then being placed in baking oven by glass plate, temperature programming carries out hot acid imide Changing, heating schedule is: first room temperature is to constant temperature after 50~180 DEG C, whole process 10-240 minute;After being warming up to 180~250 DEG C the most again Constant temperature, whole process 10-240 minute;Constant temperature after being finally warming up to 250 DEG C~380 DEG C, whole process 10-360 minute;After cooling and get final product To polyimide film.
The preparation method of the polyimides with low dielectric property the most according to claim 7, it is characterised in that: described chemical acid imide The step of change method is: add dehydrant in polyamic acid solution, after the stirring that heats up, is heated to 50~200 DEG C and continues stirring 0.5~72h, Pour into after being cooled to room temperature and methanol or acetone obtain polyimides precipitation, filtration drying, i.e. obtain polyimides powder body;By polyimides powder body It is dissolved in N-Methyl pyrrolidone, dimethyl sulfoxide, N,N-dimethylacetamide, DMF, metacresol or oxolane, After being heated to being completely dissolved, by polyimide solution blade coating on clean glass plate, 70~300 DEG C are dried removal solvent, are i.e. gathered after cooling Acid imide film.
10. the polyimides with low dielectric property described in claim 1 or 2 is applied to prepare dielectric materials, optical material.
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