CN104339280A - Polishing disk device - Google Patents
Polishing disk device Download PDFInfo
- Publication number
- CN104339280A CN104339280A CN201410643402.3A CN201410643402A CN104339280A CN 104339280 A CN104339280 A CN 104339280A CN 201410643402 A CN201410643402 A CN 201410643402A CN 104339280 A CN104339280 A CN 104339280A
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- CN
- China
- Prior art keywords
- hole
- polishing
- evener
- disk body
- disk
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention provides a polishing disk device, which comprises a disk body, a smoothening part and a rubber mat, wherein a first through hole and a second through hole are formed in the disk body; a third through hole and a fourth through hole are formed in the smoothening part; the smoothening part is fixedly arranged on the disk body by fixedly connecting the first through hole with the third through hole and fixedly connecting the second through hole with the fourth through hole; a polishing die part is also arranged on the disk body; the shape of the polishing die part is the same as that of an object to be polished; the rubber mat is filled in the polishing die part, and is connected with the smoothening part through the polishing die part. The polishing disk device is simple in loading, free of a heating device and pollution-free, and is not required to wait for the solidification of wax, and time is saved; a polyurethane material is adopted, so that the polishing disk device is consistent in polished surface thickness, high in surface smoothness and accurate in position.
Description
Technical field
The present invention relates to burnishing device, be specifically related to a kind of polishing disk device.
Background technology
Polishing refers to and utilizes machinery, chemistry or electrochemical effect, workpiece surface roughness is reduced, to obtain the processing method of light, flat surface.Utilize flexible polishing instrument and abrasive grain or other polishing mediums to carry out modification processing to surface of the work.The fixing of polished material mostly adopts bonding wax technology, solidifies the polished material of bonding by the wax of melting.Along with bright finished popular on market, increasing of surface roughness requirements, the increase of capacity requirements, environmental requirement strict, bonding wax cannot meet the demands.Cannot large-scale production, and trivial operations during polishing, efficiency is low.
Summary of the invention
The object of the present invention is to provide a kind of polishing disk device, use vacuum suction fixing polishing object, and use FR4 glass cloth baseplate material, manufacture simple.
The invention provides a kind of polishing disk device, comprise, disk body body, evener and rubber cushion;
Disk body body is provided with the first through hole and the second through hole, and the first through hole and the second through hole are located on the two ends of the same diameter of disk body body;
Evener is provided with third through-hole and fourth hole, and third through-hole and fourth hole are located on the two ends of the same diameter of evener;
Disk body body and evener correspondingly with third through-hole to be fixedly connected with by the first through hole, the second through hole is fixedly connected with fourth hole is corresponding, for evener is fixed on disk body body;
Disk body body is also provided with polishing mold;
Elastic mounting is in polishing mold.
In some embodiments, disk body body adopts FR4 glass cloth baseplate material, and surface roughness is less than 0.1 μm, makes surface smoothness high.
In some embodiments, evener adopts FR4 glass cloth baseplate material, and surface roughness is less than 0.1 μm, makes surface smoothness high.
In some embodiments, rubber cushion adopts polyurethane material, and one end is connected with disk body body, and the other end is connected with the object of required polishing.
In some embodiments, the diameter of disk body body and evener is 100-300mm.Size can according to the size relative set of polishing machine.
In some embodiments, the thickness of disk body body and evener is 1.5-5mm.
The present invention inlays polyurethane material in disk body body, utilizes the principle of vacuum suction to adsorb polished object; Be different from traditional bonding ceroplastic, its material loading is simple, without the need to heater, pollution-free, without the need to waiting for that wax solidifies, saves time; Adopt polyurethane material, burnishing surface consistency of thickness, surface smoothness is high, and position is accurate.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of polishing disk device of one embodiment of the present invention.
Fig. 2 is the front view of a kind of polishing disk device of one embodiment of the present invention.
Structural representation when Fig. 3 is the polishing of a kind of polishing disk device of one embodiment of the present invention.
Detailed description of the invention
Below in conjunction with drawings and the specific embodiments the present invention is described in further detail explanation.
A kind of polishing disk device, as depicted in figs. 1 and 2, in figure, dotted line represents datum line.Comprise, disk body body 1, evener 2 and rubber cushion 3;
Disk body body 1 be provided with the first through hole 11 and the second through hole 12, first through hole 11 corresponding with fixed position on polishing machine with the position of the second through hole 12, the first through hole 11 and the second through hole 12 are located on the two ends of the same diameter of disk body body 1;
Evener 2 is provided with third through-hole 21 and fourth hole 22, disk body body 1 is identical with the size of evener 2, third through-hole 21 position of evener 2 is corresponding with the first through hole 11 on disk body body 1, the fourth hole 22 of evener 2 is corresponding with the second through hole 12 position, and third through-hole 21 and fourth hole 22 are located on the two ends of the same diameter of evener 2;
Disk body body 1 is corresponding with third through-hole 21 by the first through hole 11 with evener 2, by screw through the first through hole 11 and third through-hole 21, disk body body 1 and evener 2 to be fixedly connected on polishing machine, the second through hole 12 is corresponding with fourth hole 22, by screw through the first through hole 11 and third through-hole 21, disk body body 1 and evener 2 are fixed on polishing machine;
Disk body body 1 also offers polishing mold 13, and polishing mold 13 is identical with the article shape of required polishing; Polishing mold 13 is die hole.
Rubber cushion 3 is filled in polishing mold 13, contacts with evener 2 through polishing mold 13, rubber cushion 3 is pasted onto on evener 2, sticking double faced adhesive tape rubber cushion 3 can be selected.The shape of rubber cushion 3 is consistent with the shape of polishing mold 13.Adopt rubber cushion 3, burnishing surface consistency of thickness when can make polishing, surface smoothness is high, and position is accurate.
Disk body body 1 adopts FR4 glass cloth baseplate material, and surface roughness is less than 0.1 μm, and adopt the roughness of less than 0.1 μm, make surface smoothness high, make polishing meticulousr, disk body body 1 is circular slab, rotating operation when facilitating polishing.
Evener 2 adopts FR4 glass cloth baseplate material, and surface roughness is less than 0.1 μm, and adopt the roughness of less than 0.1 μm, make surface smoothness high, make polishing meticulousr, evener 2 is circular slab, rotating operation when facilitating polishing.
As shown in Figure 3, rubber cushion 3 adopts polyurethane material, and one end is connected with evener 2, the other end is connected with the object of required polishing, because polyurethane contains strong Polar Amides carbamate group, regulate the ratio of NCO/OH in formula, the different products of heat-curable urethane and thermoplastic polyurethane can be obtained.Line style and build two kinds can be divided into by its molecular structure.Because crosslink density is different in three-dimensional-structure, hard, soft or Jie's performance between the two can be presented, there is the features such as high strength, high abrasion and solvent resistant.The demand of polishing can be met.What in the present invention, rubber cushion 3 adopted is the ratio of NCO/OH is 2.3/1, can meet the demand of polishing operation like this.
Polishing mold 13 with 3-5 be one group for annular distribution, disk body body 1 is provided with 3-9 group polishing mold 13, and polishing mold 13 distributes circlewise on disk body body 1.Annular spread can improve the efficiency of polishing, and the same time can carry out polishing by multiple object together, has not only saved resource, and has improve production efficiency.
The diameter of disk body body 1 and evener 2 is 100-300mm, can meet the polishing machine of different size,
Disk body body 1 is 1.5-5mm with the thickness of evener 2, our experiments show that, when thickness is 3.5, the most durable.Moderate strength, and lightweight, facilitate operative and use.
Embodiment 1:
Polishing mold 13 with 3 be one group for annular distribution, disk body body 1 is provided with 3 groups of polishing mold 13, and each group polishing mold 13 distributes in the form of a ring on disk body body 1.
The diameter of disk body body 1 is 100mm, and the thickness of disk body body 1 is 1.5mm, and the thickness of evener 2 is 1.5mm.
Disk body body 1 adopts FR4 glass cloth baseplate material, and surface roughness is 0.05 μm.
Evener 2 adopts FR4 glass cloth baseplate material, and surface roughness is 0.05 μm.
Embodiment 2:
Polishing mold 13 with 4 be one group for annular distribution, disk body body 1 is provided with 7 groups of polishing mold 13, and each group polishing mold 13 distributes circlewise on disk body body 1.
The diameter of disk body body 1 is 200mm, and the thickness of disk body body 1 is 3.5mm, and the thickness of evener 2 is 3.5mm.
Disk body body 1 adopts FR4 glass cloth baseplate material, and surface roughness is 0.07 μm.
Evener 2 adopts FR4 glass cloth baseplate material, and surface roughness is 0.1 μm.
Embodiment 3:
Polishing mold 13 with 5 be one group for annular distribution, disk body body 1 is provided with 9 groups of polishing mold 13, and each group polishing mold 13 distributes circlewise on disk body body 1.
The diameter of disk body body 1 is 300mm, and the thickness of disk body body 1 is 5mm, and the thickness of evener 2 is 5mm.
Disk body body 1 adopts FR4 glass cloth baseplate material, and surface roughness is 0.1 μm.
Evener 2 adopts FR4 glass cloth baseplate material, and surface roughness is 0.1 μm.
The basic functional principle of this polishing disk is: during polishing article, is filled in polishing mold 13 by rubber cushion 3, and is coated with supernatant water on rubber cushion 3, is adsorbed on by polishing article on rubber cushion 3; The polishing disk installing polishing article to be placed on polishing machine and to make object towards buffing wheel, after polishing terminates, polished object can be obtained through cleaning.
This polishing disk is applicable to the various part of polishing, as enterprise LOGO etc.
The present invention inlays polyurethane adsorption gasket in disk body body 1, utilizes the principle of vacuum suction to adsorb polished material; Be different from traditional bonding ceroplastic, its material loading is simple, without the need to heater, pollution-free, without the need to waiting for that wax solidifies, saves time; Adopt polyurethane adsorption gasket, consistency of thickness, surface smoothness is high, and position is accurate.
The above is only preferred embodiment of the present invention; it should be pointed out that to those skilled in the art, without departing from the concept of the premise of the invention; can also make some similar distortion and improvement, these also should be considered as within protection scope of the present invention.
Claims (6)
1. a polishing disk device, is characterized in that, comprises, disk body body (1), evener (2) and rubber cushion (3);
Described disk body body (1) is provided with the first through hole (11) and the second through hole (12), and described first through hole (11) and described second through hole (12) are located on the two ends of the same diameter of described disk body body (1);
Described evener (2) is provided with third through-hole (21) and fourth hole (22), and described third through-hole (21) and described fourth hole (22) are located on the two ends of described evener (2) same diameter;
Described disk body body (1) and described evener (2) correspondingly with described third through-hole (21) to be fixedly connected with by described first through hole (11), described second through hole (12) is fixedly connected with described fourth hole (22) is corresponding, are fixed on by described evener (2) on described disk body body (1);
Described disk body body (1) is also provided with polishing mold (13);
Described rubber cushion (3) is fixed in described polishing mold (13).
2. a kind of polishing disk device according to claim 1, is characterized in that, described disk body body (1) adopts FR4 glass cloth baseplate material, and surface roughness is less than 0.1 μm.
3. a kind of polishing disk device according to claim 1, is characterized in that, described evener (2) adopts FR4 glass cloth baseplate material, and surface roughness is less than 0.1 μm.
4. a kind of polishing disk device according to claim 1, is characterized in that, described rubber cushion (3) adopts polyurethane material, and one end is connected with described evener (2), the isoelectric membrane of the other end and required polishing.
5. a kind of polishing disk device according to claim 1, is characterized in that, the diameter of described disk body body (1) and described evener (2) is 100-300mm.
6. a kind of polishing disk device according to claim 1, is characterized in that, described disk body body (1) is 1.5-5mm with the thickness of described evener (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410643402.3A CN104339280A (en) | 2014-11-13 | 2014-11-13 | Polishing disk device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410643402.3A CN104339280A (en) | 2014-11-13 | 2014-11-13 | Polishing disk device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104339280A true CN104339280A (en) | 2015-02-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410643402.3A Pending CN104339280A (en) | 2014-11-13 | 2014-11-13 | Polishing disk device |
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| Country | Link |
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| CN (1) | CN104339280A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109759906A (en) * | 2017-11-06 | 2019-05-17 | 蓝思科技（长沙）有限公司 | A kind of essence throws absorption layer and polishing method |
| CN110370124A (en) * | 2019-07-27 | 2019-10-25 | 丹阳丹耀光学有限公司 | Based on the technique for using the small eyeglass of polyurethane polishing in 20 axis equipment |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5871393A (en) * | 1996-03-25 | 1999-02-16 | Chiyoda Co., Ltd. | Mounting member for polishing |
| JP2004296898A (en) * | 2003-03-27 | 2004-10-21 | Ibiden Co Ltd | Vacuum chuck |
| CN1814411A (en) * | 2005-01-31 | 2006-08-09 | 三芳化学工业股份有限公司 | Adsorption sheet for fixing polishing substrate and its manufacturing method and polishing device |
| CN102248462A (en) * | 2011-07-25 | 2011-11-23 | 成都光明光电股份有限公司 | Polishing grinder |
| CN102615903A (en) * | 2012-03-27 | 2012-08-01 | 侯新义 | Wall stick without adhesive and manufacturing process for wall stick |
| CN103062204A (en) * | 2012-05-25 | 2013-04-24 | Ms因泰克有限公司 | Vacuum absorber pasting part |
| CN103659580A (en) * | 2013-12-03 | 2014-03-26 | 常州深倍超硬材料有限公司 | Clad sheet plane lapping tool |
| CN203751880U (en) * | 2013-12-25 | 2014-08-06 | 昆山国显光电有限公司 | Vacuum platform of edge grinding equipment |
| CN204135910U (en) * | 2014-11-13 | 2015-02-04 | 无锡市福吉电子科技有限公司 | A kind of polishing disk device |
-
2014
- 2014-11-13 CN CN201410643402.3A patent/CN104339280A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5871393A (en) * | 1996-03-25 | 1999-02-16 | Chiyoda Co., Ltd. | Mounting member for polishing |
| JP2004296898A (en) * | 2003-03-27 | 2004-10-21 | Ibiden Co Ltd | Vacuum chuck |
| CN1814411A (en) * | 2005-01-31 | 2006-08-09 | 三芳化学工业股份有限公司 | Adsorption sheet for fixing polishing substrate and its manufacturing method and polishing device |
| CN102248462A (en) * | 2011-07-25 | 2011-11-23 | 成都光明光电股份有限公司 | Polishing grinder |
| CN102615903A (en) * | 2012-03-27 | 2012-08-01 | 侯新义 | Wall stick without adhesive and manufacturing process for wall stick |
| CN103062204A (en) * | 2012-05-25 | 2013-04-24 | Ms因泰克有限公司 | Vacuum absorber pasting part |
| CN103659580A (en) * | 2013-12-03 | 2014-03-26 | 常州深倍超硬材料有限公司 | Clad sheet plane lapping tool |
| CN203751880U (en) * | 2013-12-25 | 2014-08-06 | 昆山国显光电有限公司 | Vacuum platform of edge grinding equipment |
| CN204135910U (en) * | 2014-11-13 | 2015-02-04 | 无锡市福吉电子科技有限公司 | A kind of polishing disk device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109759906A (en) * | 2017-11-06 | 2019-05-17 | 蓝思科技（长沙）有限公司 | A kind of essence throws absorption layer and polishing method |
| CN110370124A (en) * | 2019-07-27 | 2019-10-25 | 丹阳丹耀光学有限公司 | Based on the technique for using the small eyeglass of polyurethane polishing in 20 axis equipment |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150211 |
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| RJ01 | Rejection of invention patent application after publication |