CN104338333A - Space water droplet positioning substrate and preparation method thereof - Google Patents

Space water droplet positioning substrate and preparation method thereof Download PDF

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Publication number
CN104338333A
CN104338333A CN201410230935.9A CN201410230935A CN104338333A CN 104338333 A CN104338333 A CN 104338333A CN 201410230935 A CN201410230935 A CN 201410230935A CN 104338333 A CN104338333 A CN 104338333A
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substrate
hydrophobic
hydrophilic
region
water base
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吴赛
蓝鼎
王育人
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Institute of Mechanics of CAS
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Institute of Mechanics of CAS
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Abstract

The invention provides a space water droplet positioning substrate. The surface of the substrate is provided with a film with an alternating structure of a hydrophilic region and a hydrophobic region, wherein the hydrophilic region can be designed to be of any geometric shape; the hydrophobic region encircles the hydrophilic region, and achieves an effect of limiting a water droplet. According to the invention, the defects that the size of a droplet, a contact angle of the droplet and the like cannot be limited effectively in traditional droplet evaporation are overcome; a novel substrate material is provided for droplet evaporation, is beneficial to fluid management in space, and also can be applied to positioning and quantitative research of biological reaction containers and the like; a preparation method is simple, convenient and effective; the hydrophilic and hydrophobic alternating region structure can be controlled; the size is precise to be micron order, and the space water droplet positioning substrate and the preparation method are suitable for multiple substrate materials.

Description

A kind of space water base fluid drips positioning substrate and preparation method thereof
Technical field
The present invention relates to the surface modification of base material needed for the drop evaporation experiment of a kind of space, be specifically related to a kind of space water base fluid and drip positioning substrate and preparation method thereof.
Background technology
Intellectual material is the class advanced composite material (ACM) developed rapidly the nineties in 20th century, it since development the achievement that obtains and on the impact of every field and infiltration always noticeable.The material that the surface of solids infiltrates the change of physical property structure is a kind of important intellectual material.Surface of solids Wettability refers to the wellability of liquid versus solid, and this character is divided into hydrophily and hydrophobicity, if solid material surface infiltration angle is greater than 65 ° illustrate that these material surfaces are hydrophobic; Otherwise infiltration angle is less than 65 ° illustrates that these material surfaces are hydrophilic.Comparatively common water-wetted surface has glass, metal etc.; There are sapphire, polyolefin, silicon etc. in the surface of hydrophobic/oleophylic; There is polytetrafluoroethylene (PTFE) etc. on the surface of hydrophobic/oleophylic.Usually, the surperficial hydrophobe character of material is single, the material that the surface of solids infiltrates the change of physical property structure is then by carrying out surperficial hydrophobe modification to certain certain material, the special surface structure film that a kind of hydrophobe replaces is formed on its surface, there is special wellability on this modified surface, instead of single hydrophilic or hydrophobic.Such as: chemical composition gradient surface is the surface graded material of one grown up the earliest, diffusion is utilized to control the method for vapour deposition, in level and smooth silicon base, the hydrophobic alkyl monofilm that density presents graded is modified with silylating reagent, show wellability journey graded, the spontaneous movement of drop of surface tension driving can be observed at this on the surface.
Droplet drying deposition has a wide range of applications, such as: " optics " assignment of genes gene mapping of the micro-arrangement of DNA/RAN, DNA, ink jet printing, the preparation being applied to photonic propulsion and other colloidal crystals received, colloidal self-assembly, high-throughput drug discovery, chemical detection, graphically polymer deposits, nano particle and nanotube deposition, combinatorial chemistry and bacterial deposition.Completing the wherein important step of these application is that drop carries out hydatogenesis at substrate surface.And infiltration angle, the droplet size of drop evaporation process can be controlled to the infiltrating modification of substrate surface, thus change some physical propertys in drop evaporation process, and then affect its application.
Summary of the invention
The technical problem that the present invention solves is, for drop evaporation experiment provides a kind of space water base fluid to drip positioning substrate, i.e. and the base material that replaces of a kind of novel hydrophobe region.Graded area is hydrophobe-hydrophile-hydrophobic alternant, and make evaporation drop Droplet in Experiment be dropped in midparent aqua region like this, periphery hydrophobic region carries out liquid drop boundary restriction; In hydrophilic region, droplet size is adjustable, and because drop substrate topography is fixed, the change of volume can bring again the change of drop height.
In order to solve the problem, the invention provides a kind of space water base fluid and dripping positioning substrate, the surface of described substrate is a kind of film with hydrophilic area and hydrophobic region alternating structure; The form of described hydrophilic region can be designed to random geometry, and described hydrophilic area surrounds by described hydrophobic region, plays the effect limiting water base drop.
Further, described positioning substrate is two layers, to be respectively at the bottom of hydrophilic group and to cover described hydrophilic suprabasil hydrophobic membrane, described hydrophobic membrane non-fully covers at the bottom of described hydrophilic group; Described hydrophilic area is the region of exposing at the bottom of described hydrophilic group, and described hydrophobic region is the region that described hydrophobic membrane covers.
Further, described positioning substrate is two layers, is respectively hydrophobic substrate and covers hydrophilic film in described hydrophobic substrate, described hydrophilic film non-fully covers described hydrophobic substrate; Described hydrophobic region is the region that described hydrophobic substrate is exposed, and described hydrophilic area is the region that described hydrophilic film covers.
Further, described positioning substrate is three layers, is followed successively by hydrophobic membrane, hydrophilic film, substrate from top to bottom; Described hydrophilic film covers described substrate completely, described hydrophobic membrane non-fully covers described hydrophilic film; Described hydrophilic area is the region that described hydrophilic film is exposed, and described hydrophobic region is the region that described hydrophobic membrane covers; Described substrate can be at the bottom of hydrophilic group or hydrophobic substrate.
Further, described positioning substrate is three layers, is followed successively by hydrophilic film, hydrophobic membrane, substrate from top to bottom; Described hydrophobic membrane covers described substrate completely, described hydrophilic film non-fully covers described hydrophobic membrane; Described hydrophobic region is the region that described hydrophobic membrane is exposed, and described hydrophilic area is the region that described hydrophilic film covers; Described substrate can be at the bottom of hydrophilic group or hydrophobic substrate.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
(a) at the bottom of hydrophilic group on cover middle required hydrophilic region by template, expose hydrophobic region needed for periphery;
(b) coating hydrophobic membrane;
C space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () covers hydrophobic region needed for periphery by template in hydrophobic substrate, expose middle required hydrophilic region;
(b) coating hydrophilic film;
C space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () be overall coating hydrophilic film in the substrate of hydrophilic or hydrophobic property arbitrarily;
B () then covers middle required hydrophilic region by template, expose hydrophobic region needed for periphery;
(c) coating hydrophobic membrane;
D space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () be overall coating hydrophobic membrane in the substrate of hydrophilic or hydrophobic property arbitrarily;
B () then covers middle required hydrophobic region by template, expose hydrophilic region needed for periphery;
(c) coating hydrophilic film;
D space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
Further, at the bottom of described hydrophilic group be sheet glass, quartz plate or silicon chip; Described hydrophobic substrate is sapphire or PTFE; Described hydrophobic membrane can adopt the coating containing silane to carry out spray coating or the coating of chemical vapor deposition method; Described hydrophilic film can adopt containing TiO 2coating carry out spray coating; Template is covered and is adopted silica gel piece cladding process, aluminium film cladding process or photoresist cladding process.
Relative to prior art, the present invention has the following advantages:
The present invention improves in the evaporation of traditional drop cannot effectively limit the defect such as drop volume size and liquid-drop contact angle, for drop evaporation provides a kind of novel base material and is conducive to carrying out fluid management in space, also can be used for location and the quantitative study of biological reaction container etc.; Preparation method is simple and effective, hydrophobe graded area structure-controllable, and precision size to micron order, and is applicable to multiple base material.
Accompanying drawing explanation
Fig. 1 is that the first space water base fluid of the present invention drips positioning substrate schematic diagram.
Fig. 2 is that the second space of the present invention water base fluid drips positioning substrate schematic diagram.
Fig. 3 is that the third space water base fluid of the present invention drips positioning substrate schematic diagram.
Fig. 4 is that the 4th kind of space water base fluid of the present invention drips positioning substrate schematic diagram.
Detailed description of the invention
Hereinafter will be described in detail to embodiments of the invention by reference to the accompanying drawings.It should be noted that, when not conflicting, the embodiment in the application and the feature in embodiment can be combined mutually.
Embodiment one:
A kind of space water base fluid that the invention provides as shown in Figure 1 drips positioning substrate, and the surface of substrate is a kind of film with hydrophilic area and hydrophobic region alternating structure; The form of hydrophilic region can be designed to random geometry, and hydrophilic area surrounds by hydrophobic region, plays the effect limiting water base drop 1.
Positioning substrate is two layers, the hydrophobic membrane 2 being respectively at the bottom of hydrophilic group 3 and covering at the bottom of hydrophilic group on 3, and hydrophobic membrane 2 non-fully to cover at the bottom of hydrophilic group 3; Hydrophilic area is 3 regions of exposing at the bottom of hydrophilic group, and hydrophobic region is the region that hydrophobic membrane 2 covers.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () covers middle required hydrophilic region by template on 3 at the bottom of hydrophilic group, expose hydrophobic region needed for periphery;
(b) coating hydrophobic membrane 2;
C space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
Concrete, be sheet glass, quartz plate, silicon chip etc. at the bottom of hydrophilic group, the present embodiment is for sheet glass, but the method is not limited to sheet glass, also feasible at the bottom of other hydrophilic groups.Especially, the present embodiment cladding process adopts silica gel piece cladding process.Concrete steps are as follows:
(1) clean at the bottom of hydrophilic group: sheet glass is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up sheet glass, repeatedly clean to totally by absolute ethyl alcohol and deionized water.In the present embodiment, base material length, width and height select 25mm*80mm*1mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) cover layer preparation: the present embodiment adopts silica gel piece cladding process.In the present embodiment, middle required hydrophilic region is covered in the effect of cover layer, exposes hydrophobic region needed for periphery, hydrophobic membrane to be coated; Covering of substrate specific region is the structure control of hydrophobe region alternating structure film in fact.It is make regular shape silica gel piece that silica gel piece covers rule, and silica gel piece thickness is 0.2mm-1mm.Size shape distribution sets needed for hydrophilic region according in alternating structure, and such as circular, square etc., the present embodiment adopts circle to be example, and diameter is 1mm-5mm, interval 5mm-20mm, is evenly distributed on silica gel piece center line; Ready-made silica gel piece is covered on the glass sheet, waits for sheet glass entirety coating hydrophobic coating.
(3) hydrophobic coating coating: hydrophobic coating of the present invention has two kinds, and these two kinds of coating all possess superhydrophobic characteristic, and liquid-drop contact angle is greater than 150 °; Wherein one is whitewash, its main component is based on organic siliconresin, be aided with the compound resin of multiple low surface resin, mix inorganic nano and micron filler and various auxiliary agent and the environment-friendly type super hydrophobic coating made, the present invention of this coating adopts spraying process to apply: the spray gun selecting 0.3mm-0.8mm bore, and under 1-4 atmospheric pressure effect, gun slot footpath has the substrate 10-30cm of cover layer to spray hydrophobic coating apart from above-mentioned, spray gun atomizing effect is better, and coating effect is better; Another is water white transparency coating, its composition is the 1-1-1 trichloroethanes of 80% and the dioxy trimethyl silane (DMDC) of 20%, this solution is volatile, the present invention adopts chemical vapor deposition method to apply this hydrophobic coating: have the substrate of cover layer to cover to fill on the beaker of hydrophobic sol at one above-mentioned, cover film to put in cup, be convenient to volatile hydrophobic sol evaporation, the evaporation time is 5min-15min.
(4) hydrophobic coating solidification: the above-mentioned substrate dry 30min-60min at normal temperatures applied with silica gel piece cover layer and hydrophobic coating, then place heating cure 1-3h at the temperature of 60-90 DEG C in an oven.
(5) remove cover layer: take out the substrate that above-mentioned heating cure is good, remove the substrate being coated with pellosil with tweezers gently; Obtaining middle is hydrophilic region, and periphery is coated with the hydrophobe alternating structure of hydrophobic membrane, and namely a kind of space water base fluid drips positioning substrate.
Embodiment two
The another kind of space water base fluid that the invention provides as shown in Figure 1 drips positioning substrate, is with embodiment one difference:
Be quartz plate at the bottom of the present embodiment hydrophilic group, cladding process adopts aluminium film cladding process.Concrete steps are as follows:
(1) clean at the bottom of hydrophilic group: quartz plate is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up quartz plate, repeatedly clean to totally by absolute ethyl alcohol and deionized water.In the present embodiment, base material length, width and height select 25mm*80mm*1mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) cover layer preparation: this enforcement adopts aluminium film cladding process.In the present embodiment, middle required hydrophilic region is covered in the effect of cover layer, exposes hydrophobic region needed for periphery, hydrophobic membrane to be coated; Covering of substrate specific region is the structure control of hydrophobe region alternating structure film in fact.It is prepare aluminium film on the glass substrate that aluminium film covers rule, its manufacturing process is divided into the following steps: the first step: make mask plate, middle area of knockout is determined with distribution by the size of hydrophilic region in required hydrophilic thin alternating structure, in present case for midparent aqua region for circle, hollow out round diameter 1mm-5mm, interval 5mm-20mm, is evenly distributed on substrate center line; Second step: apply photoresist on substrate; 3rd step: the mask plate of preparation is covered and above-mentionedly scribbles on the substrate of photoresist, carry out photoetching; 4th step: development; 5th step: AM aluminum metallization film; 6th step: except glue, photoresist is removed, is left the circular hole for the coating of aluminium film, i.e. the final hydrophilic region needing to cover.
(3) hydrophobic coating coating: hydrophobic coating of the present invention has two kinds, and these two kinds of coating all possess superhydrophobic characteristic, and liquid-drop contact angle is greater than 150 °; Wherein one is whitewash, its main component is based on organic siliconresin, be aided with the compound resin of multiple low surface resin, mix inorganic nano and micron filler and various auxiliary agent and the environment-friendly type super hydrophobic coating made, the present invention of this coating adopts spraying process to apply: the spray gun selecting 0.3mm-0.8mm bore, and under 1-4 atmospheric pressure effect, gun slot footpath has the substrate 10-30cm of cover layer to spray hydrophobic coating apart from above-mentioned, spray gun atomizing effect is better, and effect is better; Another is water white transparency coating, its composition is the 1-1-1 trichloroethanes of 80% and the dioxy trimethyl silane (DMDC) of 20%, this solution is volatile, the present invention adopts chemical vapor deposition method to apply this hydrophobic coating: have the substrate of cover layer to cover to fill on the beaker of hydrophobic sol at one above-mentioned, cover film to put in cup, be convenient to volatile hydrophobic sol evaporation, the evaporation time is 5min-15min.
(4) hydrophobic coating solidification: the above-mentioned substrate dry 30min-60min at normal temperatures applied with aluminium film cover layer and hydrophobic coating, then place heating cure 1-3h at the temperature of 60-90 DEG C in an oven.
(5) remove cover layer: take out the substrate that above-mentioned heating cure is good, remove aluminium film with watery hydrochloric acid, then use washed with de-ionized water quartz plate; Obtaining middle is hydrophilic region, and periphery is coated with the hydrophobe alternating structure of hydrophobic membrane, and namely a kind of space water base fluid drips positioning substrate.
Embodiment three
The another kind of space water base fluid that the invention provides as shown in Figure 1 drips positioning substrate, is with embodiment one difference:
Be silicon chip at the bottom of the present embodiment hydrophilic group, cladding process adopts photoresist cladding process, and photoresist adopts anti-glue.Concrete steps are as follows:
(1) clean at the bottom of hydrophilic group: silicon chip is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up silicon chip, repeatedly clean to totally by absolute ethyl alcohol and deionized water.In the present embodiment, base material length, width and height select 25mm*80mm*1mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) cover layer preparation: the present embodiment adopts photoresist cladding process.In the present embodiment, middle required hydrophilic region is covered in the effect of cover layer, exposes hydrophobic region needed for periphery, hydrophobic membrane to be coated; Covering of substrate specific region is the structure control of hydrophobe region alternating structure film in fact.Because adopting photoresist method, so cover region can be fine to micron order, i.e. 500 μm of-5mm.Its manufacturing process of photoresist cladding process is divided into the following steps: the first step: make mask plate, middle area of knockout is determined with distribution by the size of hydrophilic region in required hydrophilic thin alternating structure, in present case for midparent aqua region for circle, hollow out round diameter 500 μm of-5mm, interval 5mm-20mm, is evenly distributed on substrate center line; Second step: apply photoresist on substrate, applies anti-glue; 3rd step: the mask plate of preparation is covered on the above-mentioned substrate scribbling anti-glue, exposes; 4th step: development, except glue, because be the anti-glue of coating, is insoluble to developer solution through the sex change photoresist of exposure, except leaving the exposure area being coated with photoresist after glue, i.e. the final hydrophilic region needing to cover.
(3) hydrophobic coating coating: hydrophobic coating of the present invention has two kinds, and these two kinds of coating all possess superhydrophobic characteristic, and liquid-drop contact angle is greater than 150 °; Wherein one is whitewash, its main component is based on organic siliconresin, be aided with the compound resin of multiple low surface resin, mix inorganic nano and micron filler and various auxiliary agent and the environment-friendly type super hydrophobic coating made, the present invention of this coating adopts spraying process to apply: the spray gun selecting 0.3mm-0.8mm bore, and under 1-4 atmospheric pressure effect, gun slot footpath has the substrate 10-30cm of cover layer to spray hydrophobic coating apart from above-mentioned, spray gun atomizing effect is better, and effect is better; Another is water white transparency coating, its composition is the 1-1-1 trichloroethanes of 80% and the dioxy trimethyl silane (DMDC) of 20%, this solution is volatile, the present invention adopts chemical vapor deposition method to apply this hydrophobic coating: have the substrate of cover layer to cover to fill on the beaker of hydrophobic sol at one above-mentioned, namely cover film to put in cup, be convenient to volatile hydrophobic sol evaporation, the evaporation time is 5min-15min.
(4) hydrophobic coating solidification: the above-mentioned substrate dry 30min-60min at normal temperatures applied with photoresist cover layer and hydrophobic coating, then place heating cure 1-3h at the temperature of 60-90 DEG C in an oven.
(5) remove cover layer: take out the substrate that above-mentioned heating cure is good, removing photoresist, then uses washed with de-ionized water silicon chip; Obtaining middle is hydrophilic region, and periphery is coated with the hydrophobe alternating structure of hydrophobic membrane, and namely a kind of space water base fluid drips positioning substrate.
Embodiment four
The another kind of space water base fluid that the invention provides as shown in Figure 2 drips positioning substrate, and the surface of substrate is a kind of film with hydrophilic area and hydrophobic region alternating structure; The form of hydrophilic region can be designed to random geometry, and hydrophilic area surrounds by hydrophobic region, plays the effect limiting water base drop 1.
Positioning substrate is two layers, the hydrophilic film 4 being respectively hydrophobic substrate 5 and covering in hydrophobic substrate, and hydrophilic film 4 also non-fully covers hydrophobic substrate 5; Hydrophobic region is the region that hydrophobic substrate 5 is exposed, and hydrophilic area is the region that hydrophilic film 4 covers.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () covers hydrophobic region needed for periphery by template in hydrophobic substrate 5, expose middle required hydrophilic region;
(b) coating hydrophilic film 4;
C space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
Hydrophobic substrate has sapphire, PTFE etc., and the present embodiment is for sapphire sheet, but the method is not limited to sapphire sheet, and other hydrophobic substrate are also feasible.Especially, the present embodiment cladding process adopts silica gel piece cladding process.Concrete steps are as follows:
(1) clean hydrophobic substrate: sapphire sheet is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up sapphire sheet, repeatedly clean to totally by absolute ethyl alcohol and deionized water.In the present embodiment, base material length, width and height select 25mm*80mm*1mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) cover layer preparation: the present embodiment adopts silica gel piece cladding process.In the present embodiment, hydrophobic region needed for periphery is covered in the effect of cover layer, exposes middle required hydrophilic region, hydrophilic film substrate specific region to be coated, covers the real structure control for hydrophobe region alternating structure film.The silica gel piece of cutting and the measure-alike size of substrate length and width, silica gel piece thickness 0.2mm-1mm, then at silica gel piece central bore, pore size according to the hydrophilic film that will apply determine, it is 1mm-5mm that present case sets diameter, interval 5mm-20mm, be evenly distributed on silica gel piece center line, the silica gel piece having drawn hole is covered on substrate, in hollow part coating hydrophilic film, obtains hydrophilic region.
(3) hydrophilic coating coating: containing TiO 2coating carry out spray coating, preparation hydrophilic film; Select the spray gun of 0.3mm-0.5mm bore, under 1-4 atmospheric pressure effect, gun slot footpath has the substrate 10-20cm of cover layer to spray hydrophilic coating apart from above-mentioned, and spray gun atomizing effect is better, and effect is better.
(4) hydrophilic coating solidification: the above-mentioned substrate dry 30min-60min at normal temperatures applied with cover layer and hydrophilic film, then place heating cure 1-4h at the temperature of 80-120 DEG C in an oven.
(5) remove cover layer: take out the substrate that above-mentioned heating cure is good, remove the substrate being coated with pellosil with tweezers gently, washed with de-ionized water substrate, obtaining periphery is hydrophobic region, and middle circular hole is that a kind of space water base fluid of hydrophilic film drips positioning substrate.
Embodiment five
The another kind of space water base fluid that the invention provides as shown in Figure 2 drips positioning substrate, is with embodiment four difference:
The present embodiment hydrophobic substrate is PTFE sheet, but the method is not limited to PTFE substrate, and other hydrophobic substrate are also feasible.Especially, the present embodiment cladding process adopts photoresist lid method, and photoresist adopts positive glue.Concrete steps are as follows:
(1) clean hydrophobic substrate: PTFE sheet is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up PTFE sheet, repeatedly clean to totally by absolute ethyl alcohol and deionized water.In the present embodiment, base material length, width and height select 25mm*80mm*1mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) cover layer preparation: the present embodiment adopts photoresist epiphragma method.In the present embodiment, hydrophobic region needed for periphery is covered in the effect of cover layer, exposes middle required hydrophilic region, hydrophilic film substrate specific region to be coated, covers the real structure control for hydrophobe region alternating structure film.Because adopting photoresist method, so cover region can be fine to micron order, i.e. 500 μm of-5mm.Its manufacturing process of photoresist cladding process is divided into the following steps: the first step: make mask plate, middle area of knockout is determined with distribution by the size of hydrophilic region in required hydrophilic thin alternating structure, in present case for midparent aqua region for circle, hollow out round diameter 500 μm of-5mm, interval 5mm-20mm, is evenly distributed on substrate center line; Second step: apply photoresist on substrate, applies positive glue; 3rd step: the mask plate of preparation is covered on the above-mentioned substrate scribbling positive glue, exposes; 4th step: development is except glue, because be the positive glue of coating, so be dissolved in developer solution through the sex change photoresist of exposure, after glue, do not have photoresist region to be hydrophilic film region to be coated, the unexposed area that non-mask plate covers is required hydrophobic region.
(3) hydrophilic coating coating: containing TiO 2coating carry out spray coating, preparation hydrophilic film; Select the spray gun of 0.3mm-0.5mm bore, under 1-4 atmospheric pressure effect, gun slot footpath has the substrate 10-20cm of cover layer to spray hydrophilic coating apart from above-mentioned, and spray gun atomizing effect is better, and effect is better.
(4) hydrophilic coating solidification: the above-mentioned substrate dry 30min-60min at normal temperatures applied with photoresist cover layer and hydrophilic film, then place heating cure 1-4h at the temperature of 80-120 DEG C in an oven.
(5) remove cover layer: take out the substrate that above-mentioned heating cure is good, removing photoresist, washed with de-ionized water substrate, obtaining periphery is hydrophobic region, and middle circular hole is that a kind of space water base fluid of hydrophilic film drips positioning substrate.
Embodiment six
The another kind of space water base fluid that the invention provides as shown in Figure 3 drips positioning substrate, and the surface of substrate is a kind of film with hydrophilic area and hydrophobic region alternating structure; The form of hydrophilic region can be designed to random geometry, and hydrophilic area surrounds by hydrophobic region, plays the effect limiting water base drop 1.
Positioning substrate is three layers, is followed successively by hydrophobic membrane 2, hydrophilic film 4, substrate 6 from top to bottom; Hydrophilic film 4 covers substrate 6 completely, and hydrophobic membrane 2 also non-fully covers hydrophilic film 4; Hydrophilic area is the region that hydrophilic film 4 is exposed, and hydrophobic region is the region that hydrophobic membrane 2 covers; Substrate 6 can be at the bottom of hydrophilic group or hydrophobic substrate.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () be overall coating hydrophilic film 4 in the substrate 6 of hydrophilic or hydrophobic property arbitrarily;
B () then covers middle required hydrophilic region by template, expose hydrophobic region needed for periphery;
(c) coating hydrophobic membrane 2;
D space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
Substrate is the substrate of hydrophilic or hydrophobic property arbitrarily, and as sheet glass, quartz plate, silicon chip, sapphire, PTFE etc., the present embodiment is for sapphire sheet, but the method is not limited to sapphire sheet, and other are hydrophilic or hydrophobic property substrate is also feasible arbitrarily.Concrete steps are as follows:
(1) clean sapphire substrate: sapphire sheet is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up sapphire sheet, repeatedly clean to totally by absolute ethyl alcohol and deionized water.In the present embodiment, base material length, width and height select 25mm*80mm*2mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) substrate entirety coating hydrophilic film, can adopt infusion process, substrate is put into main containing TiO 2hydrophilic coating in, leave standstill 10-15 minute, take out, at room temperature dry, obtain the substrate that surface integral is hydrophilic film.
(3) can regard as to its own face through the substrate properties of step (2) is that the material of hydrophilic nmature is similar, therefore the step that a kind of space of following preparation water base fluid drips positioning substrate is identical with (2)-(5) in (2)-(5) in (2) in embodiment one-(5) or case study on implementation two or case study on implementation three, then this does not repeat.
Embodiment seven
The another kind of space water base fluid that the invention provides as shown in Figure 4 drips positioning substrate, and the surface of substrate is a kind of film with hydrophilic area and hydrophobic region alternating structure; The form of hydrophilic region can be designed to random geometry, and hydrophilic area surrounds by hydrophobic region, plays the effect limiting water base drop 1.
Positioning substrate is three layers, is followed successively by hydrophilic film 4, hydrophobic membrane 2, substrate 6 from top to bottom; Hydrophobic membrane 2 covers substrate 6 completely, and hydrophilic film 4 also non-fully covers hydrophobic membrane 2; Hydrophobic region is the region that hydrophobic membrane 2 is exposed, and hydrophilic area is the region that hydrophilic film 4 covers; Substrate 6 can be at the bottom of hydrophilic group or hydrophobic substrate.
The invention provides the preparation method that a kind of space water base fluid drips positioning substrate, comprise the steps:
A () be overall coating hydrophobic membrane 2 in the substrate 6 of hydrophilic or hydrophobic property arbitrarily;
B () then covers middle required hydrophobic region by template, expose hydrophilic region needed for periphery;
(c) coating hydrophilic film 4;
D space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
The substrate of choice of the substrates hydrophilic or hydrophobic property is arbitrarily as sheet glass, quartz plate, silicon chip, sapphire, PTFE etc., and the present embodiment is silicon chip, but the method is not limited to silicon chip, and other are hydrophilic or hydrophobic property substrate is also feasible arbitrarily.Concrete steps are as follows:
(1) cleaning silicon chip: silicon chip is first used washing agent clean surface dirt, be then placed in acetone soln and carry out ultrasonic cleaning 30-60min, ultrasonic rear taking-up silicon chip, cleans to totally by absolute ethyl alcohol and deionized water repeatedly.In the present embodiment, base material length, width and height select 25mm*80mm*2mm, but substrate sizes of the present invention is not limit so, can adjust as required.
(2) substrate entirety coating hydrophobic membrane, can adopt infusion process.The silicon chip cleaned up is put into hydrophobic coating, leaves standstill 10-15 minute, take out, at room temperature dry, then put into baking oven with the temperature baking and curing 1-4h of 80 DEG C, take out and obtain the substrate that surface integral is hydrophobic membrane.
(3) can regard as to its own face through the substrate properties of step (2) is that the material of hydrophobic property is similar, therefore the step that a kind of space of following preparation water base fluid drips positioning substrate is identical with (2)-(5) in (2) in case study on implementation 4-(5) or case study on implementation 5, then this does not repeat.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (10)

1. space water base fluid drips a positioning substrate, it is characterized in that: the surface of described substrate is a kind of film with hydrophilic area and hydrophobic region alternating structure; The form of described hydrophilic region can be designed to random geometry, and described hydrophilic area surrounds by described hydrophobic region, plays the effect limiting water base drop.
2. a kind of space as claimed in claim 1 water base fluid drips positioning substrate, it is characterized in that:
Described positioning substrate is two layers, to be respectively at the bottom of hydrophilic group and to cover described hydrophilic suprabasil hydrophobic membrane, described hydrophobic membrane non-fully covers at the bottom of described hydrophilic group; Described hydrophilic area is the region of exposing at the bottom of described hydrophilic group, and described hydrophobic region is the region that described hydrophobic membrane covers.
3. a kind of space as claimed in claim 1 water base fluid drips positioning substrate, it is characterized in that:
Described positioning substrate is two layers, is respectively hydrophobic substrate and covers hydrophilic film in described hydrophobic substrate, described hydrophilic film non-fully covers described hydrophobic substrate; Described hydrophobic region is the region that described hydrophobic substrate is exposed, and described hydrophilic area is the region that described hydrophilic film covers.
4. a kind of space as claimed in claim 1 water base fluid drips positioning substrate, it is characterized in that:
Described positioning substrate is three layers, is followed successively by hydrophobic membrane, hydrophilic film, substrate from top to bottom; Described hydrophilic film covers described substrate completely, described hydrophobic membrane non-fully covers described hydrophilic film; Described hydrophilic area is the region that described hydrophilic film is exposed, and described hydrophobic region is the region that described hydrophobic membrane covers; Described substrate can be at the bottom of hydrophilic group or hydrophobic substrate.
5. a kind of space as claimed in claim 1 water base fluid drips positioning substrate, it is characterized in that:
Described positioning substrate is three layers, is followed successively by hydrophilic film, hydrophobic membrane, substrate from top to bottom; Described hydrophobic membrane covers described substrate completely, described hydrophilic film non-fully covers described hydrophobic membrane; Described hydrophobic region is the region that described hydrophobic membrane is exposed, and described hydrophilic area is the region that described hydrophilic film covers; Described substrate can be at the bottom of hydrophilic group or hydrophobic substrate.
6. a kind of space as claimed in claim 2 water base fluid drips the preparation method of positioning substrate, it is characterized in that, comprises the steps:
(a) at the bottom of hydrophilic group on cover middle required hydrophilic region by template, expose hydrophobic region needed for periphery;
(b) coating hydrophobic membrane;
C space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
7. a kind of space as claimed in claim 3 water base fluid drips the preparation method of positioning substrate, it is characterized in that, comprises the steps:
A () covers hydrophobic region needed for periphery by template in hydrophobic substrate, expose middle required hydrophilic region;
(b) coating hydrophilic film;
C space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
8. a kind of space as claimed in claim 4 water base fluid drips the preparation method of positioning substrate, it is characterized in that, comprises the steps:
A () be overall coating hydrophilic film in the substrate of hydrophilic or hydrophobic property arbitrarily;
B () then covers middle required hydrophilic region by template, expose hydrophobic region needed for periphery;
(c) coating hydrophobic membrane;
D space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
9. a kind of space as claimed in claim 5 water base fluid drips the preparation method of positioning substrate, it is characterized in that, comprises the steps:
A () be overall coating hydrophobic membrane in the substrate of hydrophilic or hydrophobic property arbitrarily;
B () then covers middle required hydrophobic region by template, expose hydrophilic region needed for periphery;
(c) coating hydrophilic film;
D space water base fluid that () goes template to obtain required hydrophobe alternating structure drips positioning substrate.
10. a kind of space water base fluid according to any one of claim 6 or 7 or 8 or 9 drips the preparation method of positioning substrate, it is characterized in that:
Be sheet glass, quartz plate or silicon chip at the bottom of described hydrophilic group; Described hydrophobic substrate is sapphire or PTFE; Described hydrophobic membrane can adopt the coating containing silane to carry out spray coating or the coating of chemical vapor deposition method; Described hydrophilic film can adopt containing TiO 2coating carry out spray coating; Template is covered and is adopted silica gel piece cladding process, aluminium film cladding process or photoresist cladding process.
CN201410230935.9A 2014-05-28 2014-05-28 Space water droplet positioning substrate and preparation method thereof Pending CN104338333A (en)

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