CN104331116A - Six-degree-of-freedom alignment device for mask and base - Google Patents
Six-degree-of-freedom alignment device for mask and base Download PDFInfo
- Publication number
- CN104331116A CN104331116A CN201410607056.3A CN201410607056A CN104331116A CN 104331116 A CN104331116 A CN 104331116A CN 201410607056 A CN201410607056 A CN 201410607056A CN 104331116 A CN104331116 A CN 104331116A
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- China
- Prior art keywords
- substrate frame
- screw
- substrate
- mask
- pedestal
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Abstract
The invention provides a six-degree-of-freedom alignment device for a mask and a base. The device comprises the mask, a mask bracket, an elastic reed, a press reed, a pressure spring pre-tensioner, a Y hand wheel, a tension spring pre-tensioner, the base, a base bracket, an X hand wheel, a substrate and pressing screws, wherein the mask bracket is disc-shaped and is used for bearing the mask; the elastic reed is provided with an inner ring and three bumps; the inner ring is connected with the mask bracket through screws; the three bumps are connected with a convex surface of the substrate through screws; one end of the press reed is connected with a supporting surface of the substrate through screws, and the other end of the press reed is pressed on a shoulder surface of the base bracket; the pressure spring pre-tensioner is connected with the supporting surface of the substrate through screws and is tangent with the substrate bracket; the Y hand wheel comprises a Y1 hand wheel and a Y2 hand wheel, is connected with the supporting surface of the substrate through screws and is tangent with the base bracket; one end of the tension spring pre-tensioner is connected with the supporting surface of the substrate through screws, and the other end of the tension spring pre-tensioner is connected with the base bracket through screws. The device has a compact structure, is suitable for environments of narrow spaces and can perform six-degree-of-freedom precision alignment of the mask and the base.
Description
Technical field
The invention belongs to ultra precise measurement technical field, relate to a kind of mask and substrate six degree of freedom alignment device.
Background technology
In plated film and photo-etching technological process, usually relate to the overlay alignment of existing graphics and mask graph in substrate, this has just required the high precision alignment of mask and substrate.Mask is aimed at substrate, not only will complete mask and substrate aiming in surface level, the adjustment both also having needed in vertical gap and collimation etc.Mask-substrate alignment device conventional mostly at present is the array configuration of multiple devices such as two-dimension translational platform, turntable, tilt adjustments platform, not only cost is high but also its volume is too huge, therefore existing mask and substrate alignment device can not meet the use in the equipment such as plated film instrument and litho machine.Now, people can complete in the urgent need to a kind of volume compact the experimental provision that mask-substrate six degree of freedom aims at.
Summary of the invention
In view of this, the object of the invention is to solve mask and substrate alignment device are not suitable for plated film instrument and litho machine problem because of bulky, the invention provides a kind of six degree of freedom, the mask of compact conformation and substrate alignment device for this reason.
For achieving the above object, the technical solution used in the present invention is as follows: a kind of mask and substrate six degree of freedom alignment device, containing mask, mask holder, elastic spring, making leaf spring, stage clip pretension, Y handwheel, extension spring pretension, substrate, substrate frame, X handwheel, pedestal, housing screw, wherein: mask holder is disc-shape, for carrying mask; Elastic spring has inner ring and three projections, and inner ring is connected with mask holder by screw, and three project through screw and are connected with pedestal convex surface; Making leaf spring one end and base supports face are connected by screw, and the other end to be pressed on substrate frame shoulder face and to apply vertical precompression to substrate frame; Stage clip pretension and base supports face are connected by screw and tangent with substrate frame, for providing the precompressed of substrate frame X-direction; Y handwheel comprises Y1 handwheel and Y2 handwheel, is connected by screw and tangent with substrate frame with base supports face, move for regulating the Y-direction of substrate frame and θ z to rotation; Extension spring pretension one end and base supports face are connected by screw, and the other end and substrate frame are connected by screw, for providing the precompressed of substrate frame Y-direction; Substrate frame is that convex shape structure has substrate frame shoulder face and substrate frame end face, and substrate frame is positioned on pedestal glide plane, and substrate frame end face moves together with both with affixed the making of substrate; X handwheel and base supports face are connected by screw and tangent with substrate frame, move for regulating the X-direction of substrate frame; Pedestal is cylindrical structural, containing pedestal convex surface, base supports face, pedestal glide plane; Elastic spring is connected with pedestal by housing screw, by adjust three housing screws can complete mask Z-direction lifting and θ x, θ y to leveling.
The beneficial effect that the present invention has is: adjusted to position by X, Y and θ z regulating Y1, Y2 and X handwheel can complete substrate, the Z-direction gap that can complete mask and substrate by adjusting three housing screws adjust and θ x, θ y to leveling, compare existing combined type alignment device, its structure is simple, compact, be applicable to the environment of narrow space, and the six degree of freedom high precision alignment of mask and substrate can be completed.The present invention is used for the design of mask and substrate alignment device in the equipment such as litho machine, plated film instrument.
Accompanying drawing explanation
Fig. 1 a, 1b and 1c are a kind of mask of the present invention and substrate six degree of freedom alignment device structural representation.
Fig. 2 is mask holder structural representation.
Fig. 3 is elastic spring structural representation.
Fig. 4 is making leaf spring structural representation.
Fig. 5 is stage clip pre-pressing structure schematic diagram.
Fig. 6 is Y hand wheel structure schematic diagram.
Fig. 7 is extension spring pre-pressing structure schematic diagram.
Fig. 8 is substrate frame structural representation.
Fig. 9 is X hand wheel structure schematic diagram.
Figure 10 is base construction schematic diagram.
Component description in figure:
1-mask, 2-mask holder,
3-elastic spring, 3a-is protruding,
3b-inner ring, 4-making leaf spring,
5-stage clip pretension, 6a-Y1 handwheel,
6b-Y2 handwheel, 7-extension spring pretension,
8-substrate, 9-substrate frame,
9a-substrate frame shoulder face, 9-substrate frame end face,
10-X handwheel, 11-pedestal,
11a-pedestal convex surface, 11b-base supports face,
11c-pedestal glide plane, 12-housing screw.
Embodiment
For making the object, technical solutions and advantages of the present invention definitely, below in conjunction with accompanying drawing, principle of work of the present invention, structure and embodiment are introduced further.
As Fig. 1 a, Fig. 1 b and Fig. 1 c illustrate mask provided by the invention and substrate six degree of freedom alignment device structural representation, this alignment device contains mask 1, mask holder 2, elastic spring 3, making leaf spring 4, stage clip pretension 5, Y1 handwheel 6a, Y2 handwheel 6b, extension spring pretension 7, substrate 8, substrate frame 9, X handwheel 10, pedestal 11, housing screw 12, wherein:
Mask holder 2 is disc-shape, for carrying mask; Elastic spring 3 is had inner ring 3b and three protruding 3a, inner ring 3b and is connected with mask holder 2 by screw, and three protruding 3a are connected with pedestal convex surface 11a by screw; Making leaf spring 4 one end and base supports face 11b are connected by screw, and the other end is pressed on substrate frame shoulder face 9a; Stage clip pretension 5 and base supports face 11b are connected by screw and tangent with substrate frame 9; Y handwheel comprises Y1 handwheel 6a and Y2 handwheel 6b, is connected by screw and tangent with substrate frame 9 with base supports face 11b; Extension spring pretension 7 one end and base supports face 11b are connected by screw, and the other end and substrate frame 9 are connected by screw; Substrate frame 9 takes on face 9a and substrate frame end face 9b for convex shape structure has substrate frame, and substrate frame 9 is positioned on pedestal glide plane 11c, and substrate frame end face 9b moves together with both with affixed the making of substrate 8; X handwheel 10 and base supports face 11b are connected by screw and tangent with substrate frame 9; Pedestal 11 is cylindrical structural, containing pedestal convex surface 11a, base supports face 11b, pedestal glide plane 11c; Elastic spring 3 is connected with pedestal 11 by housing screw 12, by adjust three housing screws can complete mask 1 Z-direction lifting and θ x, θ y to leveling.
Be mask holder 2 structure schematic diagram as shown in Figure 2, mask holder 2 is disc-shape, for carrying mask 1.
As Fig. 3 illustrates elastic spring 3 structural representation, elastic spring 3 is had inner ring 3b and three protruding 3a, inner ring 3b and is connected with mask holder 2 by screw, and three protruding 3a are connected with pedestal convex surface 11a by screw.
As shown in Figure 4 is making leaf spring 4 structural representation, and making leaf spring 4 and base supports face 11b are connected by screw, and apply precompression to substrate frame 9.
As shown in Figure 5 be stage clip pretension 5 structural representation, and stage clip pretension 5 and base supports face 11b are connected by screw and tangent with substrate frame 9, for providing the precompressed of substrate frame X-direction;
As Fig. 6 is depicted as Y hand wheel structure schematic diagram, Y handwheel comprises Y1 handwheel 6a and Y2 handwheel 6b, is connected by screw and tangent with substrate frame 9 with base supports face 11b, move for regulating the Y-direction of substrate frame 9 and θ z to rotation.
As Fig. 7 is depicted as extension spring pretension 7 structural representation, extension spring pretension 7 one end and base supports face 11b are connected by screw, and the other end and substrate frame 9 are connected by screw, for providing substrate frame 9Y to precompressed.
As Fig. 8 is depicted as substrate frame 9 structural representation, substrate frame 9 takes on face 9a and substrate frame end face 9b for convex shape structure has substrate frame, and substrate frame 9 is positioned on pedestal glide plane 11c, and substrate frame end face 9b moves together with both with affixed the making of substrate 8.
As Fig. 9 is depicted as X hand wheel structure 10 schematic diagram, X handwheel 10 and base supports face 11b are connected by screw and tangent with substrate frame 9, move for regulating the X-direction of substrate frame 9.
As Figure 10 is depicted as base construction 11 schematic diagram, pedestal 11 is cylindrical structural, containing pedestal convex surface 11a, base supports face 11b, pedestal glide plane 11c.
When alignment device uses, mask 1 is placed in mask holder 2, substrate 8 is fixed on substrate frame 9, moved by the Y-direction regulating Y1 handwheel 6a and Y2 handwheel 6b to realize substrate frame 9 and θ z to rotation, by the X-direction motion regulating X handwheel 10 to realize substrate frame 9, by regulating adjustment three housing screws 12 can complete the Z-direction lifting of mask 1 and θ x, θ y to leveling, and then mask 1 can be completed aim at the six degree of freedom of substrate 8.
Non-elaborated part of the present invention belongs to the known technology of those skilled in the art.
The foregoing is only the specific embodiment of the present invention; but protection scope of the present invention is not limited thereto; any those skilled in the art are in the technical scope disclosed by the present invention; the conversion or replacement expected can be understood; all should be encompassed in and of the present inventionly comprise in scope; therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.
Claims (11)
1. a mask and substrate six degree of freedom alignment device, it is characterized in that: described alignment device contains mask, mask holder, elastic spring, making leaf spring, stage clip pretension, Y handwheel, extension spring pretension, substrate, substrate frame, X handwheel, pedestal, housing screw, wherein:
Mask holder is disc-shape, for carrying mask; Elastic spring has inner ring and three projections, and inner ring is connected with mask holder by screw, and three project through screw and are connected with pedestal convex surface; Making leaf spring one end and base supports face are connected by screw, and the other end is pressed on substrate frame shoulder face; Stage clip pretension and base supports face are connected by screw and tangent with substrate frame; Y handwheel comprises Y1 handwheel and Y2 handwheel, is connected by screw and tangent with substrate frame with base supports face; Extension spring pretension one end and base supports face are connected by screw, and the other end and substrate frame are connected by screw; Substrate frame is that convex shape structure has substrate frame shoulder face and substrate frame end face, and substrate frame is positioned on pedestal glide plane, and substrate frame end face moves together with both with affixed the making of substrate; X handwheel and base supports face are connected by screw and tangent with substrate frame; Pedestal is cylindrical structural, containing pedestal convex surface, base supports face, pedestal glide plane; Elastic spring is connected with pedestal by housing screw.
2. alignment device as claimed in claim 1, is characterized in that: described mask holder is disc-shape, for carrying mask.
3. alignment device as claimed in claim 1, it is characterized in that: described elastic spring has inner ring and three projections, and inner ring is connected with mask holder by screw, three project through screw and are connected with pedestal convex surface.
4. alignment device as claimed in claim 1, is characterized in that: described making leaf spring and base supports face are connected by screw, and applies precompression to substrate frame.
5. alignment device as claimed in claim 1, is characterized in that: described stage clip pretension and base supports face are connected by screw and tangent with substrate frame, for providing the precompressed of substrate frame X-direction.
6. alignment device as claimed in claim 1, is characterized in that: described Y handwheel comprises Y1 handwheel and Y2 handwheel, is connected by screw and tangent with substrate frame with base supports face, move for regulating the Y-direction of substrate frame and θ z to rotation.
7. alignment device as claimed in claim 1, is characterized in that: described extension spring pretension one end and base supports face are connected by screw, and the other end and substrate frame are connected by screw, for providing the precompressed of substrate frame Y-direction.
8. alignment device as claimed in claim 1, is characterized in that: described substrate frame is that convex shape structure has substrate frame shoulder face and substrate frame end face, and substrate frame is positioned on pedestal glide plane, and substrate frame end face moves together with both with affixed the making of substrate.
9. alignment device as claimed in claim 1, is characterized in that: described X handwheel and base supports face are connected by screw and tangent with substrate frame, move for regulating the X-direction of substrate frame.
10. alignment device as claimed in claim 1, is characterized in that: described pedestal is cylindrical structural, containing pedestal convex surface, base supports face, pedestal glide plane.
11. alignment devices as claimed in claim 1, is characterized in that: elastic spring is connected with pedestal by described housing screw, can complete Z-direction lifting and the θ of mask by adjusting three housing screws
x, θ
yto leveling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410607056.3A CN104331116B (en) | 2014-10-30 | 2014-10-30 | A kind of mask and substrate six degree of freedom alignment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410607056.3A CN104331116B (en) | 2014-10-30 | 2014-10-30 | A kind of mask and substrate six degree of freedom alignment device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104331116A true CN104331116A (en) | 2015-02-04 |
| CN104331116B CN104331116B (en) | 2015-12-02 |
Family
ID=52405862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410607056.3A Expired - Fee Related CN104331116B (en) | 2014-10-30 | 2014-10-30 | A kind of mask and substrate six degree of freedom alignment device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104331116B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1325822A (en) * | 1970-03-31 | 1973-08-08 | Ibm | Alignment apparatus |
| JPH087755A (en) * | 1994-06-14 | 1996-01-12 | Sony Corp | Master device for reference position adjustment |
| CN101114135A (en) * | 2007-07-24 | 2008-01-30 | 上海微电子装备有限公司 | Aligning system photolithography equipment |
| CN101144926A (en) * | 2006-08-25 | 2008-03-19 | 爱德牌工程有限公司 | Substrate bonding apparatus having alignment unit and method of aligning substrates using the same |
| CN102540782A (en) * | 2010-12-28 | 2012-07-04 | 上海微电子装备有限公司 | Alignment device and method for photoetching equipment |
-
2014
- 2014-10-30 CN CN201410607056.3A patent/CN104331116B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1325822A (en) * | 1970-03-31 | 1973-08-08 | Ibm | Alignment apparatus |
| JPH087755A (en) * | 1994-06-14 | 1996-01-12 | Sony Corp | Master device for reference position adjustment |
| CN101144926A (en) * | 2006-08-25 | 2008-03-19 | 爱德牌工程有限公司 | Substrate bonding apparatus having alignment unit and method of aligning substrates using the same |
| CN101114135A (en) * | 2007-07-24 | 2008-01-30 | 上海微电子装备有限公司 | Aligning system photolithography equipment |
| CN102540782A (en) * | 2010-12-28 | 2012-07-04 | 上海微电子装备有限公司 | Alignment device and method for photoetching equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104331116B (en) | 2015-12-02 |
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Granted publication date: 20151202 Termination date: 20201030 |