CN104327248A - Preparation process of photocuring material - Google Patents
Preparation process of photocuring material Download PDFInfo
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- CN104327248A CN104327248A CN201410569076.6A CN201410569076A CN104327248A CN 104327248 A CN104327248 A CN 104327248A CN 201410569076 A CN201410569076 A CN 201410569076A CN 104327248 A CN104327248 A CN 104327248A
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Abstract
The invention relates to a preparation process of a photocuring material, which comprises the following steps: adding 30-50g of epoxy resin and 5g of 4,4'-bis-sec-butyl amino diphenylmethane into a four-neck flask provided with a stirrer, a thermometer, a condensation tube and a constant pressure dropping funnel, heating to 150 DEG C, reacting for 3.5 hours, cooling to 100 DEG C, adding 1-3g of polymerization inhibitor butadiene, stirring uniformly, slowly and dropwisely adding 10-20g of methacrylic acid within 1 hour, continuing the reaction for some time, starting detecting the acid number until the acid number of the reaction product is at most 8 mg KOH/g, cooling to 60 DEG C, adding 5-10g of 2-hydroxyethyl acrylate, stirring for 1 hour until the materials are uniformly mixed, and discharging.
Description
Technical field
The present invention relates to a kind of preparation process of photo-curing material, belong to technical field of material chemistry.
Background technology
Photo-curing material, have not containing organic solvent (low VOC discharge) and quick-setting distinguishing feature, and must not be heating and curing, there is the features such as energy consumption is low, efficiency is high, shrinking percentage is little, chemical stability is good, suitability is wide, make multiple base material such as its extensive application and paper, plastics, metal, glass, pottery etc.In recent years, along with the constantly dark people studied it, ultraviolet curing coating is also applied to the fields such as metal finishing and electronic components fabrication, optical fiber are coated and bonding, leather Lacquer finish, and ultraviolet curing technology is more and more paid attention to.
Summary of the invention
The invention provides a kind of preparation process of photo-curing material, comprise: agitator is being housed, thermometer, prolong, in the four-hole boiling flask of constant pressure funnel, add 30-50 gram of epoxy resin and 4, 4 '-bis-Zhong Ding aminodiphenylmethane 5 grams, be warming up to 150 DEG C, react 3.5 hours at this temperature, be cooled to 100 DEG C, add stopper divinyl 1-3 gram, after stirring, slowly drip methacrylic acid 10-20 gram again, within 1 hour, drip, start to survey acid number after continuing reaction certain hour, to the acid number≤8mgKOH/g of reactant, be cooled to 60 DEG C, add Hydroxyethyl acrylate 5-10 gram, stir 1 little even up to mixing of materials, discharging.
The invention has the beneficial effects as follows: photo-curing material transparency prepared by the present invention is good, completion of cure, the good operability of material.
Embodiment
Be described principle of the present invention and feature below, example, only for explaining the present invention, is not intended to limit scope of the present invention.
Embodiment 1
In the four-hole boiling flask that agitator, thermometer, prolong, constant pressure funnel are housed, add 30 grams of epoxy resin and 4,4 '-bis-Zhong Ding aminodiphenylmethane 5 grams, be warming up to 150 DEG C, react 3.5 hours at this temperature, be cooled to 100 DEG C, add stopper divinyl 1 gram, after stirring, slowly drip methacrylic acid 10 grams again, within 1 hour, drip, start to survey acid number, to the acid number≤8mgKOH/g of reactant after continuing reaction certain hour, be cooled to 60 DEG C, add Hydroxyethyl acrylate 5 grams, stirring 1 is little even up to mixing of materials, discharging.
Embodiment 2
In the four-hole boiling flask that agitator, thermometer, prolong, constant pressure funnel are housed, add 50 grams of epoxy resin and 4,4 '-bis-Zhong Ding aminodiphenylmethane 5 grams, be warming up to 150 DEG C, react 3.5 hours at this temperature, be cooled to 100 DEG C, add stopper divinyl 3 grams, after stirring, slowly drip methacrylic acid 20 grams again, within 1 hour, drip, start to survey acid number, to the acid number≤8mgKOH/g of reactant after continuing reaction certain hour, be cooled to 60 DEG C, add Hydroxyethyl acrylate 10 grams, stirring 1 is little even up to mixing of materials, discharging.
Embodiment 3
In the four-hole boiling flask that agitator, thermometer, prolong, constant pressure funnel are housed, add 40 grams of epoxy resin and 4,4 '-bis-Zhong Ding aminodiphenylmethane 5 grams, be warming up to 150 DEG C, react 3.5 hours at this temperature, be cooled to 100 DEG C, add stopper divinyl 2 grams, after stirring, slowly drip methacrylic acid 20 grams again, within 1 hour, drip, start to survey acid number, to the acid number≤8mgKOH/g of reactant after continuing reaction certain hour, be cooled to 60 DEG C, add Hydroxyethyl acrylate 8 grams, stirring 1 is little even up to mixing of materials, discharging.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (2)
1. the preparation process of a photo-curing material, comprise: agitator is being housed, thermometer, prolong, in the four-hole boiling flask of constant pressure funnel, add 30-50 gram of epoxy resin and 4, 4 '-bis-Zhong Ding aminodiphenylmethane 5 grams, be warming up to 150 DEG C, react 3.5 hours at this temperature, be cooled to 100 DEG C, add stopper divinyl 1-3 gram, after stirring, slowly drip methacrylic acid 10-20 gram again, within 1 hour, drip, start to survey acid number after continuing reaction certain hour, to the acid number≤8mgKOH/g of reactant, be cooled to 60 DEG C, add Hydroxyethyl acrylate 5-10 gram, stir 1 little even up to mixing of materials, discharging.
2. the preparation process of a kind of photo-curing material described in claim 1, described stopper is divinyl.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410569076.6A CN104327248A (en) | 2014-10-23 | 2014-10-23 | Preparation process of photocuring material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410569076.6A CN104327248A (en) | 2014-10-23 | 2014-10-23 | Preparation process of photocuring material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104327248A true CN104327248A (en) | 2015-02-04 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410569076.6A Pending CN104327248A (en) | 2014-10-23 | 2014-10-23 | Preparation process of photocuring material |
Country Status (1)
| Country | Link |
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| CN (1) | CN104327248A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101585766A (en) * | 2009-07-03 | 2009-11-25 | 武汉工程大学 | Epoxy acrylate containing alicyclic structure and preparation method thereof |
| CN101942072A (en) * | 2010-09-30 | 2011-01-12 | 烟台德邦科技有限公司 | Synthetic method of epoxy acrylate |
| CN104098755A (en) * | 2014-07-23 | 2014-10-15 | 程玉萍 | Preparation method of epoxy resin |
-
2014
- 2014-10-23 CN CN201410569076.6A patent/CN104327248A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101585766A (en) * | 2009-07-03 | 2009-11-25 | 武汉工程大学 | Epoxy acrylate containing alicyclic structure and preparation method thereof |
| CN101942072A (en) * | 2010-09-30 | 2011-01-12 | 烟台德邦科技有限公司 | Synthetic method of epoxy acrylate |
| CN104098755A (en) * | 2014-07-23 | 2014-10-15 | 程玉萍 | Preparation method of epoxy resin |
Non-Patent Citations (1)
| Title |
|---|
| 李青山 主编: "《高分子化学教程》", 31 August 2012, 化学工业出版社 * |
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| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150204 |