CN104313613A - Improved cleaner having no corrosion on equipment - Google Patents
Improved cleaner having no corrosion on equipment Download PDFInfo
- Publication number
- CN104313613A CN104313613A CN201410506587.3A CN201410506587A CN104313613A CN 104313613 A CN104313613 A CN 104313613A CN 201410506587 A CN201410506587 A CN 201410506587A CN 104313613 A CN104313613 A CN 104313613A
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- parts
- cleaner
- clean
- out system
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
Abstract
The invention discloses an improved cleaner having no corrosion on equipment. The improved cleaner is prepared from the following raw materials in parts by weight: 1.5-3.2 parts of glyoxal, 3.1-5.4 parts of polyoxyethylene glyceryl ether, 4.5-7.8 parts of histidine, 2.4-3.5 parts of N,N-diethyl-3-methylbenzamide, 10.5-12.2 parts of a water-solution fluorine-containing nonionic surfactant, 7.6-8.8 parts of dodecylphenol polyoxyethylene ether, 2.3-3.7 parts of a cosolvent and 1.3-3.5 parts of sodium metasilicate. The glyoxal is added in the improved cleaner having no corrosion on equipment so that the dissolving capability of the cleaner on organic pollutants such as oil contamination can be improved and the organic pollutants on the surfaces of metal materials can be dissolved; the water-solution fluorine-containing nonionic surfactant is added in the cleaner so that the surface tension of the cleaner can be reduced and the permeability of the cleaner can be enhanced, and therefore, the cleaner is safe and reliable.
Description
Technical field
The present invention relates to a kind of clean-out system, especially relate to a kind of clean-out system of not etching apparatus of improvement.
Background technology
When preparing metal parts or equipment, cleaning its material is before processing one important procedure in production process, for high-tech product, and the cleaning of work material key operation together especially.The degree of cleaning of work material are related to the performance of product, quality, work-ing life and reliability, especially high-tech product has the feature of high-performance, high reliability, high-accuracy property, high integration and microminiaturization, very responsive to degree of cleaning, small pollution will produce the performance of product, quality, work-ing life and reliability and have a strong impact on.Therefore, improve the degree of cleaning of work material become enhance product performance, quality, work-ing life and reliability important topic.Therefore urgently study new clean-out system, the environmental pollution brought is discharged in the process reducing discarded clean-out system, and can improve cleaning performance, reduces the corrodibility to equipment.
Summary of the invention
For the deficiency that prior art exists, technical problem to be solved by this invention is, provides a kind of clean-out system of not etching apparatus of improvement, can prevent hardware surface from again forming rust staining, meet environmental requirement, low to the corrodibility of equipment, effective reduction production cost, safe and reliable.
For solving the problems of the technologies described above, the technical scheme that the present invention takes is, a kind of clean-out system of not etching apparatus of improvement,
It is made up of the raw material of following parts by weight: oxalic dialdehyde 1.5-3.2 part, polyoxyethylene glycerol ether 3.1-5.4 part, Histidine 4.5-7.8 part, N, N-diethyl-3-methyl benzamide 2.4-3.5 part, water-soluble fluorine-containing nonionogenic tenside 10.5-12.2 part, dodecyl phenol polyethenoxy ether 7.6-8.8 part, solubility promoter 2.3-3.7 part, Starso 1.3-3.5 part.
Optimize, the clean-out system of the not etching apparatus of above-mentioned improvement, it is made up of the raw material of following parts by weight:
Oxalic dialdehyde 2.2 parts, polyoxyethylene glycerol ether 4.4 parts, Histidine 6.8 parts, DEET 2.7 parts, water-soluble fluorine-containing nonionogenic tenside 11.2 parts, dodecyl phenol polyethenoxy ether 7.9 parts, solubility promoter 2.8 parts, Starso 1.7 parts.
Optimize, the clean-out system of the not etching apparatus of above-mentioned improvement, its solubility promoter is polyoxyethanyl sulfonate.
Beneficial effect of the present invention: select oxalic dialdehyde in clean-out system, can improve the solubleness to organic pollutants such as greasy dirts, the organic pollutant of solubilized metal material surface; The water-soluble fluorine-containing nonionogenic tenside added in clean-out system, can reduce the surface tension of clean-out system, strengthens the perviousness of clean-out system, improves the cleaning performance to metal material surface; Water-soluble fluorine-containing nonionogenic tenside in clean-out system can strengthen mass transfer, ensures the homogeneity of cleaning, reduces the damage to metal material surface; There is the advantages such as good water solubility, seepage force be strong, pollution-free; The chemical reagent selected in clean-out system, free from environmental pollution, nonflammable, belong to non-demolition ozonosphere material, the waste liquid after cleaning is convenient to process discharge, can meet the requirement of environmental protection three waste discharge; Clean-out system, in alkalescence, does not corrode hardware, safe and reliable; Preparation technology is simple, easy to operate, safe and reliable.
Embodiment
embodiment 1
The present invention is a kind of clean-out system of not etching apparatus of improvement, and it is made up of the raw material of following parts by weight:
Oxalic dialdehyde 2.2 parts, polyoxyethylene glycerol ether 4.4 parts, Histidine 6.8 parts, DEET 2.7 parts, water-soluble fluorine-containing nonionogenic tenside 11.2 parts, dodecyl phenol polyethenoxy ether 7.9 parts, solubility promoter 2.8 parts, Starso 1.7 parts.Solubility promoter is polyoxyethanyl sulfonate.
embodiment 2
The present invention is a kind of clean-out system of not etching apparatus of improvement, and it is made up of the raw material of following parts by weight:
Oxalic dialdehyde 1.5 parts, polyoxyethylene glycerol ether 3.1 parts, Histidine 4.5 parts, DEET 2.4 parts, water-soluble fluorine-containing nonionogenic tenside 10.5 parts, dodecyl phenol polyethenoxy ether 7.6 parts, solubility promoter 2.3 parts, Starso 1.3 parts.Solubility promoter is polyoxyethanyl sulfonate.
embodiment 3
The present invention is a kind of clean-out system of not etching apparatus of improvement, and it is made up of the raw material of following parts by weight:
Oxalic dialdehyde 3.2 parts, polyoxyethylene glycerol ether 5.4 parts, Histidine 7.8 parts, DEET 3.5 parts, water-soluble fluorine-containing nonionogenic tenside 12.2 parts, dodecyl phenol polyethenoxy ether 8.8 parts, solubility promoter 3.7 parts, Starso 3.5 parts.Solubility promoter is polyoxyethanyl sulfonate.Beneficial effect of the present invention: select oxalic dialdehyde in clean-out system, can improve the solubleness to organic pollutants such as greasy dirts, the organic pollutant of solubilized metal material surface; The water-soluble fluorine-containing nonionogenic tenside added in clean-out system, can reduce the surface tension of clean-out system, strengthens the perviousness of clean-out system, improves the cleaning performance to metal material surface; Water-soluble fluorine-containing nonionogenic tenside in clean-out system can strengthen mass transfer, ensures the homogeneity of cleaning, reduces the damage to metal material surface; There is the advantages such as good water solubility, seepage force be strong, pollution-free; The chemical reagent selected in clean-out system, free from environmental pollution, nonflammable, belong to non-demolition ozonosphere material, the waste liquid after cleaning is convenient to process discharge, can meet the requirement of environmental protection three waste discharge; Clean-out system, in alkalescence, does not corrode hardware, safe and reliable; Preparation technology is simple, easy to operate, safe and reliable.
Certainly, above-mentioned explanation is not limitation of the present invention, and the present invention is also not limited to above-mentioned citing; those skilled in the art; in essential scope of the present invention, the change made, remodeling, interpolation or replacement, all should belong to protection scope of the present invention.
Claims (3)
1. a clean-out system for the not etching apparatus improved, is characterized in that: be made up of the raw material of following parts by weight:
Oxalic dialdehyde 1.5-3.2 part, polyoxyethylene glycerol ether 3.1-5.4 part, Histidine 4.5-7.8 part, N, N-diethyl-3-methyl benzamide 2.4-3.5 part, water-soluble fluorine-containing nonionogenic tenside 10.5-12.2 part, dodecyl phenol polyethenoxy ether 7.6-8.8 part, solubility promoter 2.3-3.7 part, Starso 1.3-3.5 part.
2. the clean-out system of the not etching apparatus of improvement according to claim 1, is characterized in that:
Be made up of the raw material of following parts by weight: oxalic dialdehyde 2.2 parts, polyoxyethylene glycerol ether 4.4 parts, Histidine 6.8 parts, N, N-diethyl-3-methyl benzamide 2.7 parts, water-soluble fluorine-containing nonionogenic tenside 11.2 parts, dodecyl phenol polyethenoxy ether 7.9 parts, solubility promoter 2.8 parts, Starso 1.7 parts.
3. the clean-out system of the not etching apparatus of improvement according to claim 2, is characterized in that: described solubility promoter is polyoxyethanyl sulfonate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410506587.3A CN104313613A (en) | 2014-09-28 | 2014-09-28 | Improved cleaner having no corrosion on equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410506587.3A CN104313613A (en) | 2014-09-28 | 2014-09-28 | Improved cleaner having no corrosion on equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104313613A true CN104313613A (en) | 2015-01-28 |
Family
ID=52368918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410506587.3A Pending CN104313613A (en) | 2014-09-28 | 2014-09-28 | Improved cleaner having no corrosion on equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104313613A (en) |
-
2014
- 2014-09-28 CN CN201410506587.3A patent/CN104313613A/en active Pending
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150128 |