CN104312141A - Photosensitive resin and preparation method thereof - Google Patents
Photosensitive resin and preparation method thereof Download PDFInfo
- Publication number
- CN104312141A CN104312141A CN201410648958.1A CN201410648958A CN104312141A CN 104312141 A CN104312141 A CN 104312141A CN 201410648958 A CN201410648958 A CN 201410648958A CN 104312141 A CN104312141 A CN 104312141A
- Authority
- CN
- China
- Prior art keywords
- photosensitive resin
- parts
- acrylate
- resin according
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Abstract
The invention belongs to the field of novel 3D printing material, in particular to the field of photosensitive resin. The photosensitive resin is prepared from the following constituents in percentage by weight: 35-80% of acrylate, 0.5-10% of a radical initiator, and 10-55% of a thinner. The viscosity of the photosensitive resin disclosed by the invention is lower than 220 cps, so that the photosensitive resin is low in viscosity and quick in molding, can guarantee the quick molding property of the 3D product, and meets the requirements of industrialized use.
Description
Technical field
The invention belongs to 3D and print field of new, specifically belong to low viscous photosensitive resin field.
Background technology
3D prints (3Dprinting) technology also known as three-dimensional printing technology, is a kind of based on digital model file, uses powdery metal or plastics etc. can jointing material, is carried out the technology of constructed object by the mode successively printed.It is without the need to mechanical workout or any mould, just directly can generate the part of any shape from computer graphics data, thus greatly shorten the lead time of product, boost productivity and reduce production cost.
DLP laser formation technology: use high-resolution Digital Light Processor (DLP) projector to solidify liquid photopolymer, successively carry out photocuring, solidified by sheet like lantern slide due to during every layer of solidification, therefore speed is faster than SLA stereolithography techniques speed of the same type.This technology formed precision is high, the durable plastic material parts of the injection moulding that can be equal in material properties, details and surface smoothness.
Projector is positioned over above photosensitive resin by shaping the referring to of upper light source, and by the forming technique that photosensitive resin upper strata is solidified, shaping compared to lower light source, upper light source is shaping can print the larger article of volume, but it is higher to the viscosity requirement of photosensitive resin.In prior art, for the shaping photosensitive resin viscosity of upper light source generally between 400-700cps, because viscosity is large, shaping speed is slow.
Summary of the invention
Invention broadly provides the photosensitive resin that a kind of DLP technology shaping for upper light source uses, reach low viscous service requirements.
The object of the present invention is to provide a kind of photosensitive resin, by weight percentage, described photosensitive resin comprises following component:
Acrylate 35 ~ 80%
Radical initiator 0.5 ~ 10%
Thinner 10 ~ 55%
Preferably, by weight percentage, described photosensitive resin also comprises following component:
Preferably, by weight percentage, described photosensitive resin comprises following component:
Preferably, for solidifying the UV-light that the light source of described photosensitive resin is wavelength 350 ~ 420nm.
Preferably, described acrylate is at least one in urethane acrylate, aromatic urethane acrylate, aliphatic urethane acrylate.
Preferably, described epoxy resin is at least one in epoxy acrylate, novolac epoxy.
Preferably; described radical initiator is phenyl two (2; 4; 6-trimethylbenzoyl) phosphine oxide, 2; 4,6 (trimethylbenzoyl) diphenyl phosphine oxide, fluorinated diphenyl titanium are luxuriant, at least one in diaryl phosphofluoric acid salt compounded of iodine, triaryl phosphofluoric acid salt compounded of iodine, benzophenone, diphenyl antimony chloride ketone.
Preferably, described cationic initiator is at least one in dimethoxybenzoin, 2,4-diethyl thioxanthones.
Preferably, described thinner is at least one in 1,6 hexanediol diacrylate, iso-bornyl acrylate, tetrahydrofuran (THF) acrylate ester.
Another object of the present invention is to the preparation method providing a kind of photosensitive resin, this preparation method comprises the steps:
(1) in the special glass there-necked flask that agitator and prolong are housed, add the acrylate 40 ~ 80 parts of formula ratio, epoxy resin 5 ~ 15 parts, radical initiator 0.5 ~ 8 part, cationic initiator 0.5 ~ 2 part, thinner 10 ~ 50 parts, Sudan red 0.5 ~ 2 part successively, make it Homogeneous phase mixing, limit mixing marginal not enters the aerosil of 0.5 ~ 3 part;
(2) mixture that step (1) obtains is warming up to 50 ~ 70 DEG C, at the uniform velocity stirs 35 ~ 40min, obtain faint yellow uniform liquid, keep in Dark Place, be low viscous photosensitive resin.
Adopt above-mentioned photosensitive resin and preparation method thereof, the present invention has the following advantages:
(1) photosensitive resin viscosity of the present invention is all lower than 220cps, and viscosity is low, soon shaping, has ensured the Quick-forming of 3D product;
(2) modulus in flexure of photosensitive resin of the present invention and tensile modulus all reach more than 2500Mpa, and it is large that photosensitive resin resists flexural deformation stress in elastic limit, and intensity is high, produce deformability relativity little, physical strength is large, greatly increases work-ing life, meets industrialization service requirements;
(3) volumetric shrinkage of photosensitive resin of the present invention is all about 1.0%, achieve extremely low volumetric shrinkage, make 3D printed product in use comparatively large deformation can not occur because of contraction, for obtaining, high-precision printed product is most important, is beneficial to the maintenance of shape of product;
(4) photosensitive resin that prepared by the present invention has the advantages such as shaping speed is fast, mechanical strength is high, dimensional stability, and preparation technology is simple in addition, easy to utilize.
Embodiment
Set forth the present invention further below by way of specific embodiment, but be not limited to following embodiment.
One, specific embodiment
Embodiment 1
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add urethane acrylate 35 parts, phenyl two (2 successively, 4,6-trimethylbenzoyl) phosphine oxide 10 parts, 1,6 hexanediol diacrylate 55 parts make it Homogeneous phase mixing;
(2) mixture that step (1) obtains is warming up to 60 DEG C, at the uniform velocity stirs 35min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 350nm.
Embodiment 2
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aliphatic urethane acrylate 30 parts, aromatic urethane acrylate 30 parts, 2 successively, 4,6 (trimethylbenzoyl) diphenyl phosphine oxide 0.5 part, iso-bornyl acrylate 39.5 parts make it Homogeneous phase mixing;
(2) mixture that step (1) obtains is warming up to 50 DEG C, at the uniform velocity stirs 40min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 370nm.
Embodiment 3
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add urethane acrylate 15 parts, aromatic urethane acrylate 25 parts, 2 successively, 4,6 (trimethylbenzoyl) diphenyl phosphine oxide 1 part, luxuriant 2 parts of fluorinated diphenyl titanium, triaryl phosphofluoric acid salt compounded of iodine 2 parts, iso-bornyl acrylate 25 parts, tetrahydrofuran (THF) acrylate ester 30 parts make it Homogeneous phase mixing;
(2) mixture that step (1) obtains is warming up to 70 DEG C, at the uniform velocity stirs 37min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 420nm.
Embodiment 4
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aliphatic urethane acrylate 80 parts, phenyl two (2 successively, 4,6-trimethylbenzoyl) phosphine oxide 2 parts, luxuriant 2 parts of fluorinated diphenyl titanium, benzophenone 3 parts, diaryl phosphofluoric acid salt compounded of iodine 3 parts, iso-bornyl acrylate 3 parts, tetrahydrofuran (THF) acrylate ester 4 parts, 1,6 hexanediol diacrylate 3 parts make it Homogeneous phase mixing;
(2) mixture that step (1) obtains is warming up to 55 DEG C, at the uniform velocity stirs 35min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 400nm.
Embodiment 5
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aliphatic urethane acrylate 30 parts, urethane acrylate 42 parts, phenyl two (2 successively, 4,6-trimethylbenzoyl) phosphine oxide 2 parts, 2,4,6 (trimethylbenzoyl) diphenyl phosphine oxide 2 parts, luxuriant 2 parts of fluorinated diphenyl titanium, diphenyl antimony chloride ketone 2 parts, iso-bornyl acrylate 10 parts, 1,6 hexanediol diacrylate 10 parts, make it Homogeneous phase mixing;
(2) mixture that step (1) obtains is warming up to 58 DEG C, at the uniform velocity stirs 38min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 390nm.
Embodiment 6
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add urethane acrylate 35 parts successively, epoxy acrylate 5 parts, luxuriant 3 parts of fluorinated diphenyl titanium, benzophenone 0.5 part, tetrahydrofuran (THF) acrylate ester 55 parts, Sudan red 0.5 part make it Homogeneous phase mixing, limit mixing marginal not enters the aerosil of 1 part;
(2) mixture that step (1) obtains is warming up to 50 DEG C, at the uniform velocity stirs 35min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 420nm.
Embodiment 7
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add urethane acrylate 30 parts, aliphatic urethane acrylate 30 parts, novolac epoxy 10 parts, diaryl phosphofluoric acid salt compounded of iodine 4 parts, diphenyl antimony chloride ketone 2 parts, 1 successively, 6-hexanediyl ester 20 parts, Sudan red 1 part make it Homogeneous phase mixing, and limit mixing marginal not enters the aerosil of 3 parts;
(2) mixture that step (1) obtains is warming up to 55 DEG C, at the uniform velocity stirs 38min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 350nm.
Embodiment 8
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aromatic urethane acrylate 80 parts, epoxy acrylate 3 parts, novolac epoxy 3 parts, triaryl phosphofluoric acid salt compounded of iodine 1 part, phenyl two (2 successively, 4,6-trimethylbenzoyl) phosphine oxide 1 part, dimethoxybenzoin 1 part, iso-bornyl acrylate 10 parts, Sudan red 0.5 part make it Homogeneous phase mixing, and limit mixing marginal not enters the aerosil of 0.5 part;
(2) mixture that step (1) obtains is warming up to 70 DEG C, at the uniform velocity stirs 34min, sealing is preserved, and obtains faint yellow uniform liquid, is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 410nm.
Embodiment 9
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add urethane acrylate 49 parts, novolac epoxy 11 parts, 2 successively, 4,6 (trimethylbenzoyl) diphenyl phosphine oxide 0.5 part, 2,4-diethyl thioxanthone 0.5 part, benzophenone 0.5 part, iso-bornyl acrylate 20 parts, 1,6-hexanediyl ester 15 parts, Sudan red 2 parts make it Homogeneous phase mixing, and limit mixing marginal not enters the aerosil of 1.5 parts;
(2) mixture that step (1) obtains is warming up to 65 DEG C, at the uniform velocity stirs 36min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 390nm.
Embodiment 10
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aliphatic acrylate 20 parts, aromatic urethane acrylate 26 parts, epoxy acrylate 15 parts, triaryl phosphofluoric acid salt compounded of iodine 2 parts, diaryl phosphofluoric acid salt compounded of iodine 2 parts, 2 successively, 4-diethyl thioxanthone 1 part, tetrahydrofuran (THF) acrylate ester 30 parts, Sudan red 1.5 parts make it Homogeneous phase mixing, and limit mixing marginal not enters the aerosil of 2.5 parts;
(2) mixture that step (1) obtains is warming up to 69 DEG C, at the uniform velocity stirs 39min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 370nm.
Embodiment 11
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aromatic urethane acrylate 30 parts successively, urethane acrylate 40 parts, epoxy acrylate 4 parts, novolac epoxy 4 parts, diaryl phosphofluoric acid salt compounded of iodine 3 parts, luxuriant 2 parts of fluorinated diphenyl titanium, dimethoxybenzoin 0.5 part, tetrahydrofuran (THF) acrylate ester 15 parts, Sudan red 1 part make it Homogeneous phase mixing, limit mixing marginal not enters the aerosil of 0.5 part;
(2) mixture that step (1) obtains is warming up to 56 DEG C, at the uniform velocity stirs 35min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 380nm.
Embodiment 12
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add urethane acrylate 10 parts, aliphatic urethane acrylate 10 parts, aromatic urethane acrylate 20 parts, novolac epoxy 6.5 parts, 2 successively, 4,6 (trimethylbenzoyl) diphenyl phosphine oxide 3 parts, benzophenone 4 parts, diphenyl antimony chloride ketone 1 part, 2,4-diethyl thioxanthone 0.5 part, iso-bornyl acrylate 40 parts, Sudan red 2 parts make it Homogeneous phase mixing, and limit mixing marginal not enters the aerosil of 3 parts;
(2) mixture that step (1) obtains is warming up to 54 DEG C, at the uniform velocity stirs 40min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 360nm.
Embodiment 13
1, photosensitive resin raw material is configured according to the following ratio
2, preparation method
(1) in the special glass there-necked flask that agitator and prolong are housed, add aliphatic urethane acrylate 52 parts successively, epoxy acrylate 3 parts, novolac epoxy 4 parts, phenyl two (2, 4, 6-trimethylbenzoyl) phosphine oxide 2 parts, 2, 4, 6 (trimethylbenzoyl) diphenyl phosphine oxide 3 parts, luxuriant 1 part of fluorinated diphenyl titanium, 2, 4-diethyl thioxanthone 1 part, dimethoxybenzoin 1 part, benzophenone 2 parts, diphenyl antimony chloride ketone 2 parts, iso-bornyl acrylate 13 parts, tetrahydrofuran (THF) acrylate ester 12 parts, Sudan red 2 parts makes it Homogeneous phase mixing, limit mixing marginal not enters the aerosil of 2 parts,
(2) mixture that step (1) obtains is warming up to 64 DEG C, at the uniform velocity stirs 36min, obtain faint yellow uniform liquid, sealing is preserved, and is low viscous photosensitive resin.
For solidifying the UV-light that the light source of described photosensitive resin is wavelength 350nm.
Two, performance test
Shore hardness
By the photosensitive resin sample of embodiment 1-13 gained under 23 ± 5 DEG C of conditions, measure with shore D type hardness tester.
Viscosity test
By the photosensitive resin sample of embodiment 1-13 gained under 25 DEG C of conditions, record with Bookfield DV-II+Pro type viscometer.
Photosensitive property is tested
The photosensitive property of photosensitive resin is the important indicator characterizing photocuring characteristic, comprises critical solidification amount E
cwith transmission depth D
p.E
crefer to that the photosensitive resin of unit surface under transmission depth reaches the minimum solidification energy needed for gel state; D
pthen characterize the relation of cured thickness and luminous energy.
The photosensitive resin sample obtained by embodiment 1-13 is under different laser scanning speeds and energy exposure condition, and each embodiment makes different samples respectively, then tests the thickness of these samples respectively.Make working curve with different thickness and energy in each embodiment, then rate of curve is D
p, curve and X-axis intersection point are E
c.
Shrinking percentage is tested
Use specific weight determine method, proportion when the photosensitive resin sample that first test above-described embodiment 1-13 is obtained is liquid, account form is as follows:
γ=G/V, wherein, γ represents proportion (unit g/cm
3), G representation quality (unit g),
V represents volume (unit cm
3).
Again with the sample proportion after same procedure test solidification, account form is as follows:
γ'＝G'/V'
Then shrinking percentage H=(γ '-γ)/γ × 100%
Three, test result analysis
The sample that above-described embodiment 1-13 is obtained measures shore hardness, viscosity, boundary's solidification amount E respectively
c, transmission depth D
p, modulus in flexure, tensile modulus, shrinking percentage, the data recorded are as follows:
The experimental result that the sample that table 1 embodiment 1-13 obtains records
The experimental result that embodiment 1-5 is the formula of photosensitive resin when being acrylate, radical initiator, thinner.As can be seen from Table 1, modulus in flexure and the tensile modulus of the photosensitive resin sample that embodiment 1-5 obtains all reach more than 2500Mpa, and shore hardness reaches more than 60 degree, and viscosity is all not more than 220cps.It can thus be appreciated that, can service requirements be reached when the formula of photosensitive resin is only acrylate, radical initiator, thinner.In elastic limit, resist flexural deformation stress large, intensity is high, and physical strength is large, and the 3D product obtained resistibility is to external world strong; Shrinking percentage, about 1.0%, produces deformability relativity little; Viscosity is low, reaches low viscous service requirements.
Embodiment 6-13 adds the obtained photosensitive resin sample of epoxy resin, cationic initiator, aerosil and Sudan red further on the basis of embodiment 1-5, gained sample bent modulus and tensile modulus all reach more than 2500Mpa, viscosity is all not more than 220cps, shore hardness all reaches more than 60 degree, reach the hardness requirement of medium hardness plastic cement, and viscosity is low, soon shaping, ensure the plasticity of 3D product.
The critical solidification ENERGY E of the photosensitive resin sample that embodiment 6-13 obtains
cincrease a little, at 10-12mJ/cm than the average of embodiment 1-5
2between, require lower to solidification light energy equally.Because UV-light penetrativity is strong, luminous energy is high, meets solidifying requirements by UV-irradiation, is beneficial to curing molding.
The volumetric shrinkage average of the photosensitive resin sample that embodiment 6-13 obtains is about 0.8%, lower than the average of embodiment 1-5 by about 0.2%, achieve extremely low volumetric shrinkage, make 3D printed product in use comparatively large deformation can not occur because of contraction, for obtaining, high-precision printed product is most important, is beneficial to the maintenance of shape of product.
Photosensitive resin viscosity prepared by the present invention is low, has the advantages such as shaping speed is fast, mechanical strength is high, dimensional stability under UV-irradiation, and preparation technology is simple in addition, easy to utilize.
To one skilled in the art, according to technical scheme described above and design, other various corresponding change and deformation can be made, and all these change and deformation all should belong within the protection domain of the claims in the present invention.
Claims (10)
1. a photosensitive resin, comprises following weight percents:
Acrylate 35 ~ 80%
Radical initiator 0.5 ~ 10%
Thinner 10 ~ 55%
2. photosensitive resin according to claim 1, also comprises following weight percents:
3. photosensitive resin according to claim 2, comprises following weight percents:
4. the photosensitive resin according to any one of claim 1-3, is characterized in that: for solidifying the UV-light that the light source of described photosensitive resin is wavelength 350 ~ 420nm.
5. the photosensitive resin according to Claims 2 or 3, is characterized in that: described acrylate is at least one in urethane acrylate, aromatic urethane acrylate, aliphatic urethane acrylate.
6. the photosensitive resin according to Claims 2 or 3, is characterized in that: described epoxy resin is at least one in epoxy acrylate, novolac epoxy.
7. the photosensitive resin according to Claims 2 or 3; it is characterized in that: described radical initiator is phenyl two (2; 4; 6-trimethylbenzoyl) phosphine oxide, 2; 4,6 (trimethylbenzoyl) diphenyl phosphine oxide, fluorinated diphenyl titanium are luxuriant, at least one in diaryl phosphofluoric acid salt compounded of iodine, triaryl phosphofluoric acid salt compounded of iodine, benzophenone, diphenyl antimony chloride ketone.
8. the photosensitive resin according to Claims 2 or 3, is characterized in that: described cationic initiator is at least one in dimethoxybenzoin, 2,4-diethyl thioxanthones.
9. the photosensitive resin according to Claims 2 or 3, is characterized in that: described thinner is at least one in 1,6 hexanediol diacrylate, iso-bornyl acrylate, tetrahydrofuran (THF) acrylate ester.
10. a preparation method for photosensitive resin, is characterized in that: comprise the following steps:
(1) in the special glass there-necked flask that agitator and prolong are housed, add the acrylate 40 ~ 80 parts of formula ratio, epoxy resin 5 ~ 15, radical initiator 0.5 ~ 8 part, cationic initiator 0.5 ~ 2 part, thinner 10 ~ 50 parts, Sudan red 0.5 ~ 2 part successively, make it Homogeneous phase mixing, limit mixing marginal not enters the aerosil of 0.5 ~ 3 part;
(2) mixture that step (1) obtains is warming up to 50 ~ 70 DEG C, at the uniform velocity stirs 35 ~ 40min, obtain faint yellow uniform liquid, keep in Dark Place, be low viscous photosensitive resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410648958.1A CN104312141B (en) | 2014-11-14 | 2014-11-14 | Photosensitive resin and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410648958.1A CN104312141B (en) | 2014-11-14 | 2014-11-14 | Photosensitive resin and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104312141A true CN104312141A (en) | 2015-01-28 |
| CN104312141B CN104312141B (en) | 2017-02-22 |
Family
ID=52367467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410648958.1A Active CN104312141B (en) | 2014-11-14 | 2014-11-14 | Photosensitive resin and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104312141B (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104804151A (en) * | 2015-05-06 | 2015-07-29 | 华东理工大学 | Preparation method of light-cured resin material for three-dimensional printing |
| CN105199058A (en) * | 2015-09-30 | 2015-12-30 | 惠州市安品新材料有限公司 | 3D printing light-cured resin composition and modeling matter prepared from same |
| CN106032425A (en) * | 2015-03-09 | 2016-10-19 | 优克材料科技股份有限公司 | Ceramic resin printing raw material for light cured three dimensional printing |
| CN106243635A (en) * | 2016-07-29 | 2016-12-21 | 华蓥友达精密模具制造有限公司 | A kind of 3D printed material with anti-mildew antibacterial functions |
| CN107501442A (en) * | 2017-08-15 | 2017-12-22 | 宁波七诺新材料科技有限公司 | For 3D printing technique by visible light-initiated photoinitiator composite and application |
| CN107815219A (en) * | 2017-09-18 | 2018-03-20 | 江山海维科技有限公司 | A kind of preparation method of 3D printing photosensitive resin |
| CN107936146A (en) * | 2017-06-05 | 2018-04-20 | 宁波七诺新材料科技有限公司 | For 3D printing technique by visible light-initiated photoinitiator composite and application |
| CN108410162A (en) * | 2018-04-13 | 2018-08-17 | 广州市有得油墨科技有限公司 | Photocuring 3D printing material and its preparation method and application |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100238558A1 (en) * | 2007-05-16 | 2010-09-23 | Sang-Hyuk Im | Composition for anti-glare film and anti-glare film prepared using the same |
| CN103305132A (en) * | 2012-03-06 | 2013-09-18 | 上海佑威新材料科技有限公司 | Fast-curing structural adhesive and preparation method thereof |
| CN103396689A (en) * | 2013-08-01 | 2013-11-20 | 苏州市明大高分子科技材料有限公司 | LED-UV light source curable coating and preparation method |
| CN103483905A (en) * | 2013-08-22 | 2014-01-01 | 广东理想彩色印务有限公司 | Ultraviolet (UV) curing ink and preparation method thereof |
-
2014
- 2014-11-14 CN CN201410648958.1A patent/CN104312141B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100238558A1 (en) * | 2007-05-16 | 2010-09-23 | Sang-Hyuk Im | Composition for anti-glare film and anti-glare film prepared using the same |
| CN103305132A (en) * | 2012-03-06 | 2013-09-18 | 上海佑威新材料科技有限公司 | Fast-curing structural adhesive and preparation method thereof |
| CN103396689A (en) * | 2013-08-01 | 2013-11-20 | 苏州市明大高分子科技材料有限公司 | LED-UV light source curable coating and preparation method |
| CN103483905A (en) * | 2013-08-22 | 2014-01-01 | 广东理想彩色印务有限公司 | Ultraviolet (UV) curing ink and preparation method thereof |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106032425A (en) * | 2015-03-09 | 2016-10-19 | 优克材料科技股份有限公司 | Ceramic resin printing raw material for light cured three dimensional printing |
| CN104804151A (en) * | 2015-05-06 | 2015-07-29 | 华东理工大学 | Preparation method of light-cured resin material for three-dimensional printing |
| CN105199058A (en) * | 2015-09-30 | 2015-12-30 | 惠州市安品新材料有限公司 | 3D printing light-cured resin composition and modeling matter prepared from same |
| CN105199058B (en) * | 2015-09-30 | 2018-09-21 | 惠州市安品新材料有限公司 | A kind of 3D printing light curing resin composition and moulder prepared therefrom |
| CN106243635A (en) * | 2016-07-29 | 2016-12-21 | 华蓥友达精密模具制造有限公司 | A kind of 3D printed material with anti-mildew antibacterial functions |
| CN107936146A (en) * | 2017-06-05 | 2018-04-20 | 宁波七诺新材料科技有限公司 | For 3D printing technique by visible light-initiated photoinitiator composite and application |
| CN107501442A (en) * | 2017-08-15 | 2017-12-22 | 宁波七诺新材料科技有限公司 | For 3D printing technique by visible light-initiated photoinitiator composite and application |
| CN107501442B (en) * | 2017-08-15 | 2022-06-17 | 宁波七诺新材料科技有限公司 | Photoinitiator composition initiated by visible light for 3D printing technology and application |
| CN107815219A (en) * | 2017-09-18 | 2018-03-20 | 江山海维科技有限公司 | A kind of preparation method of 3D printing photosensitive resin |
| CN108410162A (en) * | 2018-04-13 | 2018-08-17 | 广州市有得油墨科技有限公司 | Photocuring 3D printing material and its preparation method and application |
| CN108410162B (en) * | 2018-04-13 | 2021-06-08 | 广州有得新材料科技有限公司 | Photocuring 3D printing material and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104312141B (en) | 2017-02-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104312141A (en) | Photosensitive resin and preparation method thereof | |
| CN104387755A (en) | Photosensitive resin and preparation method thereof | |
| CN110341097A (en) | A kind of thermoplastic polymer and application based on DLP photocuring 3D printing | |
| CN106243290B (en) | A kind of rubber-type photocuring 3D printing material and preparation method thereof | |
| CN101592859A (en) | A kind of stereolithography rapid prototyping photosensitive resin and its production and application | |
| CN103476804B (en) | The manufacture method of active energy ray-curable resin composition, molding, minute concave-convex structure body, water repellency article, mould and minute concave-convex structure body | |
| US6664024B1 (en) | Organic-inorganic hybrid photocurable compositions | |
| CN104932197A (en) | Expansion polymerization imprinting glue for nano-imprinting | |
| US11491709B2 (en) | Photo-curable resin composition for three-dimensional molding, method for three-dimensional molding using the same, and three-dimensional molded product | |
| CN105754052A (en) | Photocuring resin material for 3D printing as well as preparation method and application thereof | |
| CN105199058A (en) | 3D printing light-cured resin composition and modeling matter prepared from same | |
| CN105666878A (en) | Material groove for 3D printer | |
| CN109523887A (en) | A kind of preparation method of the bionical vascular pattern of high transparency for hydrodynamics observation experiment | |
| CN110142959A (en) | A kind of method of quick determining DLP photosensitive resin 3D printing exposure time parameter | |
| CN108297398A (en) | A kind of photocuring three-dimensional manufacturing device | |
| CN111690096A (en) | Preparation method of 3D printing photosensitive resin material | |
| CN106079175A (en) | A kind of silica gel mould and preparation method thereof | |
| CN1188265C (en) | Method for designing mould, extruding mould and shaped core and apparatus thereof | |
| WO2019015335A1 (en) | Transparent sla photosensitive resin composition | |
| JP2019513842A (en) | Additive shaping radiation curable composition having improved toughness and high temperature resistance | |
| Napadensky | Inkjet 3D printing | |
| CN115230163A (en) | Rapid DLP3D printing control parameter optimization method combining continuous and layered forming | |
| US20220073753A1 (en) | Photocurable composition for three-dimensional molding, three-dimensional molded product, and method for producing three-dimensional molded product | |
| EP3756847A1 (en) | Mold production method, and molded article production method using same | |
| CN110305510A (en) | A kind of method for stamping of UV gloss oil and its 3D imprinting apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |