CN104296683B - A kind of method measuring free-curved-surface-type - Google Patents

A kind of method measuring free-curved-surface-type Download PDF

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CN104296683B
CN104296683B CN201410616939.0A CN201410616939A CN104296683B CN 104296683 B CN104296683 B CN 104296683B CN 201410616939 A CN201410616939 A CN 201410616939A CN 104296683 B CN104296683 B CN 104296683B
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electroluminescent
layer
microelectrode
sample
film
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CN104296683A (en
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刘俭
谭久彬
王红婷
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Rongyi Shangke Photoelectric Technology Harbin Co ltd
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Harbin Institute of Technology
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Abstract

A kind of apparatus and method measuring free-curved-surface-type belong to optical microphotograph imaging field;This device includes: testing sample, it is plated in the electroluminescent film of sample surfaces, positive and negative microelectrode, object lens, optical filter, Guan Jing, CCD, electroluminescent membrane illumination part, Optical imaging measurement part, the method is by plating electroluminescent fluorescent media film at sample surfaces, after energising, sample surfaces is lit, the measurement of free-curved-surface-type can be realized in conjunction with optical detection light path, the odd even striped being lighted sample surfaces by electroluminescent respectively replaces traditional illumination optical, avoid the immesurable problem of deep camber part brought due to illumination aperture, the sample surface morphology that normal is big with axial angle can be measured.

Description

A kind of method measuring free-curved-surface-type
Technical field
A kind of apparatus and method measuring free-curved-surface-type belong to optical microphotograph imaging field.
Background technology
In measuring surface form, micro-imaging field, freeform optics surface is measured a difficult problem for always great challenge.Common optical gauge, such as confocal microscope etc., is all to be illuminated sample surfaces by the way of the structures such as lens project light onto on sample.But traditional illumination optical pattern, all cannot carry out adequate illumination and effectively collect sample surfaces flashlight the region that sample surfaces normal and optical axis are more than 45 degree of inclination angles.
Summary of the invention
In order to solve the problems referred to above, the invention discloses a kind of apparatus and method measuring free-curved-surface-type, solve free form surface sample surface morphology high-acruracy survey problem.
The object of the present invention is achieved like this:
A kind of apparatus and method measuring free-curved-surface-type, including:
A kind of device measuring free-curved-surface-type, including:
Electroluminescent membrane illumination part and Optical imaging measurement part;
Electroluminescent film and microelectrode that described electroluminescent membrane illumination part by testing sample, is plated in sample surfaces form;
Described Optical imaging measurement part is followed successively by object lens, optical filter, Guan Jing and CCD along collecting lightray propagation direction.
The device of above-mentioned measurement free-curved-surface-type, described electroluminescent film is by cathode layer in uniform thickness, luminescent layer and transparent anode layer composition, gross thickness is less than 4 μm, light emitting layer thickness is less than 1 μm, described luminescent layer is organic matter layer, by electron transfer layer, monochromatic organic luminous layer and hole injection layer composition, described electroluminescent membrane is made up of parallel electroluminescent bar, with or without plated film between adjacent two electroluminescent bars, the width small white space less than 5nm, all there is microelectrode at each electroluminescent bar two ends, cathode layer is connected with microelectrode negative pole, transparent anode layer is connected with microelectrode positive pole.
The method measuring free-curved-surface-type realized on the device of above-mentioned measurement free-curved-surface-type, comprises the following steps:
The first step, at testing sample Surface Creation electroluminescent film, described electroluminescent film is by cathode layer in uniform thickness, luminescent layer and transparent anode layer composition, gross thickness is less than 4 μm, light emitting layer thickness is less than 1 μm, described luminescent layer is organic matter layer, by electron transfer layer, monochromatic organic luminous layer and hole injection layer composition, described electroluminescent membrane is made up of parallel electroluminescent bar, with or without plated film between adjacent two electroluminescent bars, the width small white space less than 5nm, all there is microelectrode at each electroluminescent bar two ends, cathode layer is connected with microelectrode negative pole, transparent anode layer is connected with microelectrode positive pole;
Second step, the distance between regulation object lens and testing sample, make the image planes of testing sample surface Rotating fields overlap with CCD photo-sensitive cell image planes, object lens total movement travel a, object lens step distance b are set, make variable i be equal to 0;
3rd step, makes object lens distance b axially movable;
4th step, from left to right direction, give the microelectrode energising of the electroluminescent bar being positioned at odd positions, the electroluminescent bar making correspondence is luminous, complete the luminous work of a part of electroluminescent membrane in testing sample surface, shoot the image of this layer of sample, obtain the odd zone 2-D data D of this Rotating fieldsxym
5th step, from left to right direction, give the microelectrode energising of the electroluminescent bar being positioned at even number position, the electroluminescent bar making correspondence is luminous, complete the luminous work of testing sample surface another part electroluminescent membrane, shoot the image of this layer of sample, obtain the even number region 2-D data D of this Rotating fieldsxyn
6th step, by DxymAnd DxynIt is combined into 2-D data D according to odd zone and even number regionxyi, make variable i add 1;
7th step, it is judged that whether i × b is more than or equal to a, if yes then enter the 8th step, otherwise repeats the 3rd step to the 6th step;
All axial locations are measured the 2-D data D of gained by the 8th stepxyiComposition three-dimensional matrice, extracts one-dimension array for each pixel xy along z, finds maximum of points in this array, and record the axial location corresponding to this maximum;
The position grouping that 9th step, axial location that all xy pixels are recorded and xy pixel are corresponding, thus reconstruct sample surfaces face type.
The method of above-mentioned measurement free-curved-surface-type, also includes the tenth step, washes testing sample surface electroluminescent film and microelectrode.
Beneficial effect:
Due to the present invention compared with micrometering technology compare, first electroluminescent membrane fluorescent illumination film is plated at sample surfaces, make its stimulated radiation luminous, the most on this basis, disclose a kind of method measuring free-curved-surface-type, this technological improvement, pass through electroluminescent, make to instant invention overcomes the problem that the slope of the free form surface surface more than 45 degree cannot carry out uniformly, illuminate fully and collect under common survey method light illumination mode flashlight, thus measure the sample surface morphology comprising normal and axial angle more than 45 ° of regions.It addition, illuminated respectively with even number bar by odd number bar, separating the interference of adjacent area imaging signal, the mode simultaneously illuminated than whole sample improves measurement resolution.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of device measuring free-curved-surface-type of the present invention.
Fig. 2 is electroluminescent film schematic diagram.
In figure: 1 testing sample, 2 be plated in the electroluminescent film of sample surfaces, 3 positive and negative microelectrodes, 4 object lens, 5 optical filters, 6 pipe mirrors, 7CCD, 8 electroluminescent membrane illumination parts, 9 Optical imaging measurement parts.
Detailed description of the invention
Below in conjunction with the accompanying drawings the specific embodiment of the invention is described in further detail.
Specific embodiment one
The present embodiment is device embodiment.
A kind of device measuring free-curved-surface-type of the present embodiment, structural representation is as shown in Figure 1.This device includes:
Electroluminescent membrane illumination part 8 and Optical imaging measurement part 9;
Electroluminescent film 2 and positive and negative microelectrode that described electroluminescent membrane illumination part by testing sample 1, is plated in sample 1 surface form 3;
Optical imaging moieties is followed successively by object lens 4, optical filter 5, pipe mirror 6 and CCD7 along collecting lightray propagation direction.
Above-mentioned a kind of device measuring free-curved-surface-type, described electroluminescent film, as in figure 2 it is shown, its thickness is less than 4 μm, is made up of cathode layer, luminescent layer and transparent anode layer, and each layer thickness is uniform;Described luminescent layer thickness is less than 1 μm, its luminescent layer is organic matter layer, it is made up of electron transfer layer, monochromatic organic luminous layer and hole injection layer, described electroluminescent membrane subregion makes, and is arranged in sample 1 surface in bar shaped, has small clear area without plated film between different bars, clear area width is less than 5nm, two ends, each region all have positive and negative microelectrode, cathode layer to be connected with negative microelectrode, and transparent anode layer is connected with positive microelectrode.Wherein, thickness is less than 4 μm, and luminescent layer thickness is less than 1 μm, can improve measurement accuracy, can introduce interference signal when thickness is more than 4 μm;Each layer thickness uniformly can be avoided puncturing thin film during energising;Having small clear area to be less than 5nm without plated film, clear area width between different bars, clear area is avoided that when thin film is energized, adjacent two regions are lighted simultaneously, thus reduces system resolution;When clear area width is more than 5nm, measure blind area bigger, it is impossible to ensure measurement resolution.
Specific embodiment two
The present embodiment is the embodiment of the method realized on device described in specific embodiment one.
A kind of method measuring free-curved-surface-type of the present embodiment, comprises the following steps:
The first step, in sample 1 Surface Creation gross thickness less than the cathode layer of 4 μm, luminescent layer, transparent anode layer and microelectrode, each layer thickness is uniform;Described luminescent layer thickness is less than 1 μm, its luminescent layer is organic matter layer, it is made up of electron transfer layer, monochromatic organic luminous layer and hole injection layer, described electroluminescent membrane subregion makes, and is arranged in sample 1 surface in bar shaped, has small clear area without plated film between different bars, clear area width is less than 5nm, two ends, each region all have positive and negative microelectrode, cathode layer to be connected with negative microelectrode, and transparent anode layer is connected with positive microelectrode;
Second step, regulates the distance between the object lens 4 of described Optical imaging measurement part and sample 1, makes the image planes of sample 1 surface Rotating fields overlap with CCD photo-sensitive cell image planes, arranges the total movement travel a of object lens 4, object lens 4 step distance b, makes variable i be equal to 0;
3rd step, makes object lens 4 distance b axially movable;
4th step, arranging sample 1 surface from left to right odd number block zone number is odd number, and even numbered blocks zone number is even number;To upper unidirectional current logical between the positive microelectrode in all odd number regions and negative microelectrode, make described electroluminescent film luminous, complete the work of a part of luminescent film in electroluminescence lighting sample 1 surface, shoot the image of this layer of sample 1, obtain the odd zone 2-D data D of this Rotating fieldsxym;Above-mentioned odd even subregion lighting system, can improve the resolving power of measurement apparatus;
5th step, to upper unidirectional current logical between the positive microelectrode in all even number regions and negative microelectrode, make described electroluminescent film luminous, complete the work of electroluminescence lighting sample 1 surface another part luminescent film, shoot the image of this layer of sample 1, obtain the 2-D data D of this Rotating fields even numberxyn
6th step, by Dxy0Dxy1It is combined into 2-D data D according to odd zone and even number regionxyi, make variable i add 1;
7th step, it is judged that whether i × b is more than or equal to a, if yes then enter the 8th step, otherwise repeats the 3rd step to the 6th step;
All axial locations are measured the 2-D data D of gained by the 8th stepxyiComposition three-dimensional matrice, extracts one-dimension array for each pixel xy along z, finds maximum of points in this array, and record the axial location corresponding to this maximum;
The position grouping that 9th step, axial location that all xy pixels are recorded and xy pixel are corresponding, thus reconstruct face, sample 1 surface type.
Specific embodiment three
The present embodiment is embodiment of the method.
The present embodiment is on the basis of specific embodiment two, increases by the 11st step, washes sample 1 surface layers film and the microelectrode of sample 1 near surface.This step, it is possible to achieve the recovery to sample surface morphology.
The present invention is not limited to above-mentioned preferred forms, and anyone should learn that the structure change made under the enlightenment of the present invention or method are improved, and every have same or like technical scheme, within each falling within protection scope of the present invention with the present invention.

Claims (2)

1. the method measuring free-curved-surface-type,
The device measuring free-curved-surface-type used, including:
Electroluminescent membrane illumination part (8) and Optical imaging measurement part (9);
Described electroluminescent membrane illumination part (8) is by testing sample (1), the electroluminescent film that is plated in sample (1) surface (2) form with microelectrode (3);
Described Optical imaging measurement part (9) is followed successively by object lens (4), optical filter (5), pipe along collecting lightray propagation direction Mirror (6) and CCD (7);
Described electroluminescent film is made up of cathode layer in uniform thickness, luminescent layer and transparent anode layer, and gross thickness is less than 4 μm, light emitting layer thickness is less than 1 μm, and described luminescent layer is organic matter layer, by electron transfer layer, monochromatic organic luminous layer Forming with hole injection layer, described electroluminescent membrane is made up of parallel electroluminescent bar, has between adjacent two electroluminescent bars Without plated film, width less than the small white space of 5nm, all there is a microelectrode (3) at each electroluminescent bar two ends, cathode layer with Microelectrode (3) negative pole is connected, and transparent anode layer is connected with microelectrode (3) positive pole;
It is characterized in that, comprise the following steps:
The first step, at testing sample (1) Surface Creation electroluminescent film (2), described electroluminescent film is uniform by thickness Cathode layer, luminescent layer and transparent anode layer composition, gross thickness be less than 4 μm, light emitting layer thickness be less than 1 μm, described Luminescent layer is organic matter layer, is made up of electron transfer layer, monochromatic organic luminous layer and hole injection layer, described electroluminescent membrane by Parallel electroluminescent bar composition, with or without plated film, small clear area that width is less than 5nm between adjacent two electroluminescent bars Territory, each electroluminescent bar two ends all have microelectrode (3), cathode layer to be connected with microelectrode (3) negative pole, and transparent anode layer is with micro- Electrode (3) positive pole is connected;
Second step, the distance between regulation object lens (4) and testing sample (1), make testing sample (1) surface Rotating fields Image planes overlap with CCD photo-sensitive cell image planes, arrange the total movement travel a of object lens (4), object lens (4) step distance b, and order becomes Amount i is equal to 0;
3rd step, makes object lens (4) distance b axially movable;
4th step, from left to right direction, give microelectrode (3) energising of the electroluminescent bar being positioned at odd positions, make the electricity of correspondence Photoluminescence bar is luminous, completes the luminous work of a part of electroluminescent membrane in testing sample (1) surface, shoots this layer of sample (1) Image, obtain the odd zone 2-D data D of this Rotating fieldsxym
5th step, from left to right direction, give microelectrode (3) energising of the electroluminescent bar being positioned at even number position, make the electricity of correspondence Photoluminescence bar is luminous, completes the luminous work of testing sample (1) surface another part electroluminescent membrane, shoots this layer of sample (1) Image, obtain the even number region 2-D data D of this Rotating fieldsxyn
6th step, by DxymAnd DxynIt is combined into 2-D data D according to odd zone and even number regionxyi, make variable i add 1;
7th step, it is judged that whether i × b is more than or equal to a, if yes then enter the 8th step, otherwise repeats the 3rd step to the 6th step;
All axial locations are measured the 2-D data D of gained by the 8th stepxyiComposition three-dimensional matrice, for each pixel xy edge Z extracts one-dimension array, finds maximum of points in this array, and records the axial location corresponding to this maximum;
The position grouping that 9th step, axial location that all xy pixels are recorded and xy pixel are corresponding, thus reconstruct sample (1) Face, surface type.
A kind of method measuring free-curved-surface-type the most according to claim 1, it is characterised in that also include the tenth step, Wash testing sample (1) surface electroluminescent film (2) and microelectrode (3).
CN201410616939.0A 2014-11-05 2014-11-05 A kind of method measuring free-curved-surface-type Active CN104296683B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1105038B1 (en) * 1998-08-20 2002-06-19 Bioshape AG Device for determining the surface shape of biological tissue
CN1474637A (en) * 2002-08-09 2004-02-11 ��ʽ����뵼����Դ�о��� Electroluminescence element and luminescent device using it
CN101105390A (en) * 2007-08-08 2008-01-16 北京交通大学 Synthetic wave interference nano surface tri-dimensional on-line measuring system and method
CN102305601A (en) * 2011-05-18 2012-01-04 天津大学 High-precision non-contact measurement method and device for three-dimensional profile of optical freeform curved surface
CN102353342A (en) * 2011-06-13 2012-02-15 苏州大学 Free-curved-surface-type detecting system
CN103090787A (en) * 2013-01-29 2013-05-08 哈尔滨工业大学 Confocal microscopy measuring device based on measured surface fluorescence excitation

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040124421A1 (en) * 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and manufacturing method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1105038B1 (en) * 1998-08-20 2002-06-19 Bioshape AG Device for determining the surface shape of biological tissue
CN1474637A (en) * 2002-08-09 2004-02-11 ��ʽ����뵼����Դ�о��� Electroluminescence element and luminescent device using it
CN101105390A (en) * 2007-08-08 2008-01-16 北京交通大学 Synthetic wave interference nano surface tri-dimensional on-line measuring system and method
CN102305601A (en) * 2011-05-18 2012-01-04 天津大学 High-precision non-contact measurement method and device for three-dimensional profile of optical freeform curved surface
CN102353342A (en) * 2011-06-13 2012-02-15 苏州大学 Free-curved-surface-type detecting system
CN103090787A (en) * 2013-01-29 2013-05-08 哈尔滨工业大学 Confocal microscopy measuring device based on measured surface fluorescence excitation

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