CN104267423B - A kind of detecting system and detection method of X-ray degree of polarization - Google Patents
A kind of detecting system and detection method of X-ray degree of polarization Download PDFInfo
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Abstract
The invention provides a kind of detecting system and detection method of X-ray degree of polarization；The detecting system produces the principle of X-ray polarization spectrum by crystal diffraction X-ray, the crystal material that crystal microchip is used on diffraction platform is directed in the case that detected X-ray wavelength meets Bragg diffraction condition, from when the incident X-ray radiation of light incidence channel is on the crystal microchip in two diffraction work faces of diffraction platform, polarization spectrum of the X-ray on two orthogonal different directions can be accessed, clever structure, it is readily produced, solves the problem of X-ray degree of polarization detection product is lacked in the prior art；The detection method directly detects the X-ray polarization spectrum intensity of both direction to carry out the detection of X-ray degree of polarization by two X-ray detectors in detecting system, simple to operate, it is adaptable to the degree of polarization of X-ray is detected in any occasion, had wide range of applications.
Description
Technical field
The present invention relates to X-ray detection technical field, more particularly to a kind of detecting system of X-ray degree of polarization, and adopt
The detection method of X-ray degree of polarization is carried out with the detecting system.
Background technology
In high-temperature plasma, because high temperature, pressure and extremely complex electromagnetic field produce various complexity
Magnetic fluid motion, and produce experiencing between various forms of radiation, and each composition of plasma sufficiently complex particle and
Energy transport process and various interaction processes, will truly recognize the internal state and change procedure of high-temperature plasma,
Just must by the electron temperature in certain laboratory facilities plasma, density, ionization distribution, electric current and electromagnetic field when
Space division cloth and transport, fluctuate and the state parameter such as unstability carries out experiment measurement, i.e. plasma diagnostics.
The diagnosis to high-temperature plasma relies primarily on the completion of the analysis to the X-ray by plasma resonance at present.Cause
It is defeated that the electron density on plasma, temperature, plasma motion, distribution of charges and ion can be provided for X-ray energy spectrum
Transport the important informations such as parameter.
High-temperature plasma X-ray polarization spectrum can provide the information on plasma anisotropic, and it can be for
Accurate Diagnosis plasma electron temperature and density, research X-ray degree of polarization and plasma parameters and the correlation of environment, tool
There is important researching value.Detection plasma electron temperature, a kind of important method of density utilize class He spectral lines at present
Strength ratio, but do not consider that X-ray polarizes the influence to testing result, because the influence of degree of polarization, in different directions
It is inconsistent that detection obtains class He spectral line strength ratios, so would necessarily affect the accuracy of detection.Other X-ray polarization spectroscopy
It can be used in studying material atom spectral fine structure, there is extremely important effect to research material microstate.Therefore, it is right
The detection of X-ray degree of polarization has significant application value and meaning.
If a kind of detection means and method of X-ray degree of polarization can be provided, just it can be carried for high-temperature plasma diagnosis
For a kind of necessary detection means, it can be played a significant role in the research of detection plasma internal state.
The content of the invention
For the above-mentioned problems in the prior art, the invention provides a kind of X-ray degree of polarization simple in construction
Detecting system, is X-ray degree of polarization to obtain polarization spectrum intensity of the X-ray on two orthogonal different directions
Detection provide Equipment Foundations, to solve in the prior art X-ray degree of polarization detection product lack the problem of, be more accurate
Realize that high-temperature plasma diagnosis provides technical foundation in ground.
To achieve these goals, present invention employs following technical scheme：
A kind of detecting system of X-ray degree of polarization, including housing, diffraction platform, and be respectively used to detection level direction and spread out
Penetrate two X-ray detectors of light and vertical direction diffraction light；
The housing is made of rigid, hard material；There is a cavity space, the diffraction platform is fixedly mounted in housing
In the cavity space；Also there are the light incidence channel communicated with cavity space and two beam projectings to lead on housing
Road, wherein, the passage axis of light incidence channel and the first beam projecting passage in the horizontal direction and is mutually perpendicular to, the second light
The passage axis in the vertical direction of line exit channel, and light incidence channel, the first beam projecting passage and the second light goes out
Penetrating the extended line of the passage axis of passage can be intersected in a bit；Hermetically it is provided with the entrance port of the light incidence channel
The lens catch that X-ray and diopter are zero is transmissive to, the X-ray detector for detection level direction diffraction light is hermetically
Installed on housing at the exit portal of the first beam projecting passage, for detecting that the X-ray detector of vertical direction diffraction light is close
Feud is arranged on housing at the exit portal of the second beam projecting passage so that the cavity space in housing is closed close for one
Space is closed, and the cavity space is vacuum；
The diffraction platform has two diffraction work faces；Wherein, the first diffraction work face is being located at light incidence channel just
Project the intersection of the orthographic projection overlay area of overlay area and the first beam projecting passage, and the first diffraction work face respectively with
Light incidence channel and the passage axis of the first beam projecting passage are in 45 ° of ± 1 ° of angles；Second diffraction work face is located at light
The intersection of the orthographic projection overlay area of incidence channel and the orthographic projection overlay area of the second beam projecting passage, and the second diffraction
Working face is respectively with light incidence channel and the passage axis of the second beam projecting passage in 45 ° of ± 1 ° of angles；Described first spreads out
Penetrate and be installed with working face and the second diffraction work face from diffraction work is towards sunken inside and concave face is in spherical crown shape
Crystal microchip.
In the detecting system of above-mentioned X-ray degree of polarization, as a kind of preferred embodiment, the housing is using stainless
Steel, aluminium or aluminium alloy are made.
In the detecting system of above-mentioned X-ray degree of polarization, a kind of preferred embodiment, housing cavity room space are used as
It is pressure 10-2Vacuum below handkerchief.
In the detecting system of above-mentioned X-ray degree of polarization, as a kind of preferred embodiment, the housing glazed thread is incident
The lens catch that sealing is installed at the entrance port of passage is the glass plate catch for posting beryllium film.
In the detecting system of above-mentioned X-ray degree of polarization, selectable embodiment, the material of the crystal microchip are used as
For mica or quartz.
In the detecting system of above-mentioned X-ray degree of polarization, further improvement project, in addition to degree of polarization computer are used as；
The X-ray spectrum strength investigation signal of two data collection terminals of the degree of polarization computer respectively with two X-ray detectors
Output end enters row data communication connection.
On the basis of the detecting system of above-mentioned X-ray degree of polarization, the present invention should provide the detection of its X-ray degree of polarization
Method；Therefore, present invention employs following technical scheme：
A kind of detection method of X-ray degree of polarization, is detected using the detecting system of above-mentioned X-ray degree of polarization, tool
Body comprises the following steps：
1) detecting system is placed in X-ray radiation, by the light incidence channel of detecting system flatly just to X
The position of fixed inspection system behind ray emission source, and start two X-ray detectors of detecting system；
2) X-ray of X-ray emission source radiation is just injecting detecting system housing by the light incidence channel of detecting system
In cavity space, so that radiate on the crystal microchip in two diffraction work faces of diffraction platform, and in the crystalline substance in two diffraction work faces
X-ray diffraction occurs for the position that body thin slice meets Bragg diffraction condition；Wherein, by the crystal microchip institute in the first diffraction work face
The X-ray polarization spectrum of diffraction is reflected onto the first beam projecting passage of horizontal direction, the crystal by the second diffraction work face
The X-ray polarization spectrum of thin slice institute diffraction is reflected onto the second beam projecting passage of vertical direction；
3) by the X-ray detector of the exit portal installed in the first beam projecting passage by its detecting head to being diffracted into
The X-ray polarization spectrum of horizontal direction is detected, and draws the X-ray polarization spectrum intensity I of horizontal directionH；By installed in
X-ray detector at the exit portal of two beam projecting passages is polarized by its detecting head to the X-ray for being diffracted into vertical direction
Spectrum is detected, and draws the X-ray polarization spectrum intensity I of vertical directionV；
4) X-ray polarization spectrum intensity I of two X-ray detectors to horizontal direction is treatedHX-ray with vertical direction is inclined
Vibrational spectrum intensity IVAfter the completion of detection, the X-ray polarization spectrum intensity I in difference read level directionHWith Nogata to X-ray it is inclined
Vibrational spectrum intensity IVValue, the degree of polarization P for obtaining X-ray is calculated as follows：
Compared to prior art, the present invention has the advantages that：
1st, there is provided a kind of simple in construction for the principle of the invention by crystal diffraction X-ray generation X-ray polarization spectrum
Detecting system for detecting X-ray degree of polarization, its clever structure, is readily produced, and solves X-ray degree of polarization in the prior art
The problem of detection product is lacked.
2nd, in the detecting system of X-ray degree of polarization of the present invention, the crystal material that crystal microchip is used on diffraction platform is directed to
In the case that detected X-ray wavelength meets Bragg diffraction condition, due to light incidence channel and two beam projectings
Position of the layout and diffraction platform of passage in housing cavity space, angle arrangement so that from the incident X of light incidence channel
When ray radiation is on the crystal microchip in two diffraction work faces of diffraction platform, X-ray can be accessed orthogonal at two
Polarization spectrum on different directions.
3rd, in the detecting system of X-ray degree of polarization of the present invention, the cavity space that place occurs as X-ray diffraction is true
Sky, can avoid propagating in atmosphere from the X-ray that the incidence of light incidence channel enters cavity space and cause energy to subtract rapidly
It is weak, it is more beneficial for the X-ray polarization spectrum intensity after holding X-ray is diffracted so that two X-ray detectors of detecting system
X-ray polarization spectrum intensity data can more accurately be detected.
4th, the method for detecting system progress X-ray degree of polarization detection of the present invention is simple to operate, it is adaptable to X in any occasion
The degree of polarization of ray is detected, is had wide range of applications.
Brief description of the drawings
Fig. 1 is a kind of specific implementation structural representation of the detecting system of X-ray degree of polarization of the present invention.
Fig. 2 be X-ray degree of polarization of the present invention detecting system in diffraction platform a kind of specific implementation structural representation.
Fig. 3 is a kind of perspective view of specific implementation structure of the detecting system of X-ray degree of polarization of the present invention.
Embodiment
The X-ray degree of polarization detecting system of the present invention is made furtherly with specific embodiment below in conjunction with the accompanying drawings
It is bright, but should not be limited the scope of the invention with this.
The detecting system for the X-ray degree of polarization that the present invention is provided, it is a kind of specific implement structure as shown in figure 1, including
Housing 10, diffraction platform 20, and it is respectively used to two X-ray detections of detection level direction diffraction light and vertical direction diffraction light
Device 30 and 40.
Wherein, housing 10 is made of rigid, hard material；From the point of view of processing cost and technical maturity degree, shell
Body optimal selection is made of stainless steel, aluminium or aluminium alloy, also may be used certainly in the case where concrete application technical conditions are ripe
With using other rigid, hard materials.There is a cavity space, diffraction platform 20 is then fixedly mounted on the chamber in housing 10
In space, due to blocking for housing, diffraction platform 20 is not shown in Fig. 1.Also have what is communicated with cavity space on housing 10
One light incidence channel 11 and two beam projecting passages, two beam projecting passages are respectively the first beam projecting passage 12
With the second beam projecting passage 13；Wherein, the passage axis of the beam projecting passage 12 of light incidence channel 11 and first is in level
On direction and it is mutually perpendicular to, the passage axis in the vertical direction of the second beam projecting passage 13, and light incidence channel 11,
The extended line of the passage axis of one beam projecting passage 12 and the second beam projecting passage 13 can be intersected in a bit.From Fig. 1
It can be seen that, the passage axis XO of light incidence channel 11, the passage axis YO of the first beam projecting passage 12, the second light go out
The extended line for penetrating the passage axis ZO three of passage 13 is intersected at point O, is arranged so as to, primarily to making the X-ray of incidence
Can be respectively from the first light into polarised light of the rear diffraction on two orthogonal different directions from light incidence channel
Exit channel and the second beam projecting passage are projected and created conditions.Hermetically it is provided with the entrance port of light incidence channel 11
Can for X-ray project and diopter be zero lens catch 14, it is desirable to the diopter of lens catch 14 be zero be in order to avoid
To incident X-ray formation refraction, meanwhile, the X-ray detector 30 for detection level direction diffraction light is sealably mounted at
On housing at the exit portal of the first beam projecting passage 12, for detecting that the X-ray detector 40 of vertical direction diffraction light is sealed
Ground is arranged on housing at the exit portal of the second beam projecting passage 13 so that the cavity space in housing 10 is closed as one
Confined space, and the cavity space is vacuum.Wherein, the lens gear that sealing is installed at the entrance port of housing glazed thread incidence channel
Piece is preferably the glass plate catch for posting beryllium film, because glass plate can provide enough intensity to support the vacuum of cavity space
Degree, while X-ray has very high transmission ability to beryllium and glass (silica), can significantly weaken X-ray transparent lens
Catch enters the energy attenuation of light incidence channel.Meanwhile, the cavity space in housing is processed as vacuum, it is therefore an objective to also avoid
The X-ray for entering cavity space from the incidence of light incidence channel is propagated and causes energy to weaken rapidly in atmosphere, in a vacuum
Propagate and be more beneficial for the X-ray polarization spectrum intensity after holding X-ray is diffracted so that two X-ray detections of detecting system
Device can more accurately detect X-ray polarization spectrum intensity data.Housing uses rigid, hard material, also for ensuring chamber
The vacuum in space can obtain the support of housing.During concrete application, housing cavity room space should at least be processed as pressure and exist
10-2Pressure is lower in vacuum below handkerchief, cavity space, vacuum is higher, then Detection results are better.And X-ray detector is then
It can be achieved using X-ray ccd image sensor, naturally it is also possible to use other existing X-ray detection equipment.
In the detecting system of X-ray degree of polarization of the present invention, a kind of specific implementation structure of diffraction platform 20 is as shown in Fig. 2 spread out
Penetrate arrangement states of the platform 20 in the cavity space of housing 10 as shown in Figure 3.It can see by Fig. 2 and Fig. 3, diffraction platform 20
With two diffraction work faces, respectively the first diffraction work face 21 and the second diffraction work face 22；Wherein, the first diffraction work
Face 21 is positioned at the orthographic projection overlay area of light incidence channel 11 and the orthographic projection overlay area of the first beam projecting passage 12
Intersection, and passage axis of the first diffraction work face 21 respectively with the beam projecting passage 12 of light incidence channel 11 and first be in
45 ° of ± 1 ° of angles；Meanwhile, the second diffraction work face 22 of diffraction platform be located at the orthographic projection overlay area of light incidence channel 11 with
The intersection of the orthographic projection overlay area of second beam projecting passage 13, and the second diffraction work face 22 is logical with light incidence respectively
The passage axis of the beam projecting passage 13 of road 11 and second is in 45 ° of ± 1 ° of angles；First diffraction work face 21 and the second diffraction work
Make to be installed with face 22 from diffraction work towards sunken inside and concave face be in spherical crown shape crystal microchip 23.
In diffraction platform, the material of crystal microchip is mica or quartz.During concrete application, the material choosing of crystal microchip
Select, it is necessary to determined for the wavelength of X-ray according to the requirement for meeting Bragg diffraction condition, penetrated for the X of different wave length
Line is, it is necessary to select correspondence diffraction crystal, it is desirable to meet Bragg diffraction condition so that diffraction occurs for X-ray, i.e., satisfaction is such as following
Formula：
M λ=2dsin θB；
Wherein, m is reflection level；λ is the wavelength of incident X-ray；2d represents the crystalline substance of crystal material used in crystal microchip
Lattice constant, d is its interplanar distance；θBIt is Bragg diffraction angle.
During X-ray radiation to crystal microchip, reflection light field includes the component parallel with the plane of incidence and vertical with the plane of incidence
Component.When it is 0 that incidence angle, which is equal to Brewster's angle, i.e. the incident field component parallel with the plane of incidence, the light field of reflection is only
The component vertical with the plane of incidence, at this moment there is expression：
Here θBFor Bragg diffraction angle, n is refractive index of the X-ray in crystal microchip.Obtained after abbreviation：
tanθB=n；
I.e. accurately detecting X-ray radiation polarizability needs to make incidence angle be equal to Brewster's angle.In the wave-length coverage of X-ray
Interior scope, n closely 1, therefore all X-rays, when acting on crystal microchip, its Brewster's angle is close to 45° angle degree.Work as crystalline substance
When body Bragg angle is equal to Brewster's angle, by the polarization spectrum that the spectrum after crystal microchip diffraction is X-ray.Therefore using brilliant
The polarization spectrum that body studies X-ray closing on Brewster's angle diffracting X-rays is optimal selection.
The crystal microchip material of actual use, its lattice constant 2d is fixed value, and in the wave-length coverage of X-ray spectrum
Interior, according to bragg's formula, its Bragg angle is generally not quite identical with 45 ° of Brewster's angle, and its span can be set and is
45 ° of ± 1 ° of angles, so the degree of polarization detection error of gained will be no more than 3%, and optimal inspection is can obtain when Bragg angle is 45 °
Survey result.Two diffraction work faces of diffraction platform are both with respect to light in the detecting system of this X-ray degree of polarization exactly of the present invention
The reason for passage axis of incidence channel is in 45 ° of ± 1 ° of angles.But in actual applications, due to incident from detecting system light
The X-ray that passage is injected might not be parallel completely with the passage axis of light incidence channel, therefore the crystal on diffraction platform
The crystal material that thin slice is used is directed in the case that detected X-ray wavelength meets Bragg diffraction condition, diffraction platform
The crystal microchip installed on two diffraction work faces caves inward and concave face is in spherical crown shape, can so cause X-ray spoke
When penetrating on crystal microchip, always there is subregion to meet Bragg diffraction condition so that diffraction occurs for X-ray, produce X-ray inclined
Shake light.Simultaneously as the angle of inclination in two diffraction work faces of diffraction platform is different, therefore to institute after incident X-ray diffraction
The direction of the X-ray polarised light of generation is also differed.As seen from Figure 3, the first diffraction work face is logical with light incidence respectively
The passage axis of road and the first beam projecting passage is in 45 ° of ± 1 ° of angles, and the passage axis of the first beam projecting passage is water
It is mutually perpendicular to square to and with light incidence channel, therefore the X-ray of the crystal microchip institute diffraction on the first diffraction work face
Polarization spectrum is reflected onto the first beam projecting passage of horizontal direction；And the second diffraction work face respectively with light incidence channel
Passage axis with the second beam projecting passage is in 45 ° of ± 1 ° of angles, and the passage axis of the second beam projecting passage is vertical
Direction and it is mutually perpendicular to light incidence channel, therefore the X-ray of the crystal microchip institute diffraction by the second diffraction work face is polarized
Spectrum is reflected onto the second beam projecting passage of vertical direction.Just can so obtain X-ray two it is orthogonal not
Polarization spectrum on equidirectional.Thus, separately detected by two X-ray detectors in system obtain two it is orthogonal
Polarization spectrum intensity on direction, according to the definition calculating formula of X-ray degree of polarization, just can obtain X-ray degree of polarization.
The method detected using the detecting system of the X-ray degree of polarization of the present invention, specifically includes following steps：
1) detecting system is placed in X-ray radiation, by the light incidence channel of detecting system flatly just to X
Ray emission source, and start two X-ray detectors of detecting system；
2) X-ray of X-ray emission source radiation is just injecting detecting system housing by the light incidence channel of detecting system
In cavity space, so that radiate on the crystal microchip in two diffraction work faces of diffraction platform, and in the crystalline substance in two diffraction work faces
X-ray diffraction occurs for the position that body thin slice meets Bragg diffraction condition；Wherein, by the crystal microchip institute in the first diffraction work face
The X-ray polarization spectrum of diffraction is reflected onto the first beam projecting passage of horizontal direction, the crystal by the second diffraction work face
The X-ray polarization spectrum of thin slice institute diffraction is reflected onto the second beam projecting passage of vertical direction；
3) by the X-ray detector of the exit portal installed in the first beam projecting passage by its detecting head to being diffracted into
The X-ray polarization spectrum of horizontal direction is detected, and draws the X-ray polarization spectrum intensity I of horizontal directionH；By installed in
X-ray detector at the exit portal of two beam projecting passages is polarized by its detecting head to the X-ray for being diffracted into vertical direction
Spectrum is detected, and draws the X-ray polarization spectrum intensity I of vertical directionV；
4) X-ray polarization spectrum intensity I of two X-ray detectors to horizontal direction is treatedHX-ray with vertical direction is inclined
Vibrational spectrum intensity IVAfter the completion of detection, the X-ray polarization spectrum intensity I in difference read level directionHWith Nogata to X-ray it is inclined
Vibrational spectrum intensity IVValue, the degree of polarization P for obtaining X-ray is calculated as follows：
Above-mentioned calculation formula is the X-ray polarization spectrum intensity of the definition calculating formula of X-ray degree of polarization, i.e. horizontal direction
IHWith the X-ray polarization spectrum intensity I of vertical directionVDifference and sum of the two ratio.
The operation of X-ray degree of polarization is calculated according to two X-ray polarization spectrum intensity levels, detection system can be read by artificial
The polarization spectrum intensity level of two X-ray detector detections, has then been calculated according to the definition calculating formula of X-ray degree of polarization in system
Into.Certainly, because the calculating is relatively simple, conveniently, be used as easier mode of operation, it is possible to use single-chip microcomputer etc. is simple micro-
Process chip programming constitutes a degree of polarization computer as a constituting portion of the detecting system of X-ray degree of polarization of the present invention
Point, and by the use of two I/O ports of micro-chip processor as two data collection terminals of degree of polarization computer, or can also adopt
Used with personal computer loading X-ray degree of polarization calculation procedure as degree of polarization computer, utilize two data of the calculating
Serial ports as degree of polarization computer two data collection terminals；By two data collection terminals of the degree of polarization computer respectively with two
The X-ray spectrum strength investigation signal output part of platform X-ray detector enters row data communication connection, so that by degree of polarization computer
To be automatically performed the calculating to X-ray degree of polarization.Thus it can also be seen that carrying out X-ray polarization using detecting system of the present invention
The method for spending detection is simple to operate, and is not limited by use occasion, it is adaptable to the degree of polarization of X-ray is entered in any occasion
Row detection, has wide range of applications.
Finally illustrate, the above embodiments are merely illustrative of the technical solutions of the present invention and it is unrestricted, although with reference to compared with
The present invention is described in detail good embodiment, it will be understood by those within the art that, can be to skill of the invention
Art scheme is modified or equivalent substitution, and without departing from the objective and scope of technical solution of the present invention, it all should cover at this
Among the right of invention.
Claims (4)
1. a kind of detecting system of X-ray degree of polarization, it is characterised in that including housing, diffraction platform, and be respectively used to detect water
Square to diffraction light and two X-ray detectors of vertical direction diffraction light；
The housing is made of rigid, hard material；There is a cavity space, the diffraction platform is fixedly mounted on this in housing
In cavity space；Also there are the light incidence channel communicated with cavity space and two beam projecting passages on housing, its
In, the passage axis of light incidence channel and the first beam projecting passage in the horizontal direction and is mutually perpendicular to, and the second light goes out
The passage axis in the vertical direction of passage is penetrated, and light incidence channel, the first beam projecting passage and the second beam projecting are logical
The extended line of the passage axis in road can be intersected in a bit；Hermetically being provided with the entrance port of the light incidence channel can
The lens catch that transmission X-ray and diopter are zero, the lens catch is the glass plate catch for posting beryllium film, for detecting water
Square it is sealably mounted to the X-ray detector of diffraction light on housing at the exit portal of the first beam projecting passage, for examining
The X-ray detector for surveying vertical direction diffraction light is sealably mounted on housing at the exit portal of the second beam projecting passage, is made
Cavity space in housing is closed as a confined space, and the cavity space is pressure 10-2Vacuum below handkerchief；
The diffraction platform has two diffraction work faces；Wherein, the first diffraction work face is located at the orthographic projection of light incidence channel
The intersection of the orthographic projection overlay area of overlay area and the first beam projecting passage, and the first diffraction work face respectively with light
Incidence channel and the passage axis of the first beam projecting passage are in 45 ° of ± 1 ° of angles；It is incident that second diffraction work face is located at light
The intersection of the orthographic projection overlay area of passage and the orthographic projection overlay area of the second beam projecting passage, and the second diffraction work
Face is respectively with light incidence channel and the passage axis of the second beam projecting passage in 45 ° of ± 1 ° of angles；The first diffraction work
Make to be installed with face and the second diffraction work face from diffraction work towards sunken inside and concave face be in spherical crown shape crystal
Thin slice；The material of the crystal microchip be mica or quartz, and crystal microchip material selection, for X-ray wavelength according to
The requirement for meeting Bragg diffraction condition is determined：
M λ=2dsin θB；
Wherein, m is reflection level；λ is the wavelength of incident X-ray；2d represents that the lattice of crystal material used in crystal microchip is normal
Number, d is its interplanar distance；θBIt is Bragg diffraction angle.
2. the detecting system of X-ray degree of polarization according to claim 1, it is characterised in that the housing using stainless steel,
Aluminium or aluminium alloy are made.
3. the detecting system of X-ray degree of polarization according to claim 1, it is characterised in that also including degree of polarization computer；
The X-ray spectrum strength investigation signal of two data collection terminals of the degree of polarization computer respectively with two X-ray detectors
Output end enters row data communication connection.
4. a kind of detection method of X-ray degree of polarization, it is characterised in that using X-ray degree of polarization as claimed in claim 1
Detecting system is detected, specifically includes following steps：
1) detecting system is placed in X-ray radiation, by the light incidence channel of detecting system flatly just to X-ray
The position of fixed inspection system after emission source, and start two X-ray detectors of detecting system；
2) X-ray of X-ray emission source radiation is just being injected the chamber of detecting system housing by the light incidence channel of detecting system
In space, so that radiate on the crystal microchip in two diffraction work faces of diffraction platform, and the crystal in two diffraction work faces is thin
X-ray diffraction occurs for the position that piece meets Bragg diffraction condition；Wherein, by the crystal microchip institute diffraction in the first diffraction work face
X-ray polarization spectrum be reflected onto the first beam projecting passage of horizontal direction, the crystal microchip by the second diffraction work face
The X-ray polarization spectrum of institute's diffraction is reflected onto the second beam projecting passage of vertical direction；
3) by the X-ray detector of the exit portal installed in the first beam projecting passage by its detecting head to being diffracted into level
The X-ray polarization spectrum in direction is detected, and draws the X-ray polarization spectrum intensity I of horizontal directionH；By installed in the second light
X-ray detector at the exit portal of line exit channel is by its detecting head to being diffracted into the X-ray polarization spectrum of vertical direction
Detected, draw the X-ray polarization spectrum intensity I of vertical directionV；
4) X-ray polarization spectrum intensity I of two X-ray detectors to horizontal direction is treatedHWith the X-ray polarised light of vertical direction
Spectral intensity IVAfter the completion of detection, the X-ray polarization spectrum intensity I in difference read level directionHWith Nogata to X-ray polarised light
Spectral intensity IVValue, the degree of polarization P for obtaining X-ray is calculated as follows：
<mrow>
<mi>P</mi>
<mo>=</mo>
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<mrow>
<msub>
<mi>I</mi>
<mi>H</mi>
</msub>
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<msub>
<mi>I</mi>
<mi>V</mi>
</msub>
</mrow>
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<msub>
<mi>I</mi>
<mi>H</mi>
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<msub>
<mi>I</mi>
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2
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| CN101271024B (en) * | 2007-03-21 | 2010-10-13 | 中国科学院高能物理研究所 | Synchrotron radiation X-ray multilayer film synthetic polarization measuring apparatus |
| CN101937730B (en) * | 2010-07-15 | 2012-09-05 | 北京工商大学 | Reflective polarizing element and method for improving linear polarization degree of soft X-rays |
| CN102508406A (en) * | 2011-11-15 | 2012-06-20 | 重庆大学 | Annular tube surface meridian/sagittal homofocal crystal imager and manufacturing method thereof |
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