CN104236709B - The cantilevered monitoring light supply apparatus of NEA GaAs photocathode - Google Patents
The cantilevered monitoring light supply apparatus of NEA GaAs photocathode Download PDFInfo
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- CN104236709B CN104236709B CN201410487768.6A CN201410487768A CN104236709B CN 104236709 B CN104236709 B CN 104236709B CN 201410487768 A CN201410487768 A CN 201410487768A CN 104236709 B CN104236709 B CN 104236709B
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Abstract
The invention discloses the cantilevered monitoring light supply apparatus of a kind of NEA GaAs photocathode, the light source with opposite side and fastener portion thereof is divided including the UHV chamber interior being positioned at observation window flange side, whole light path components in UHV chamber and reflector elements are suspended on the flange of UHV chamber, using oxygen-free copper material burnishing surface reflecting mirror, the UHV performance of UHV chamber is caused any adverse effect by the light supply apparatus decreasing the present invention to greatest extent.The present invention can realize transmission-type and reflective two kinds of photocurrent monitor mechanism in situ UHV active cavity indoor simultaneously.
Description
Technical field
The present invention relates to the making apparatus of image intensifier photocathode in night vision instrument, refer more particularly to image intensifier
NEA (Negative Electron Affinity, negative electron affinity (NEA)) GaAs photocathode manufacturing process in photoelectricity
Stream in-situ monitoring technology.
Background technology
Night vision instrument has been widely used for military affairs and non-military use.The core devices of night vision instrument is image intensifier.
NEA GaAs photocathode is the core component constituting modern image intensifier.As a kind of photo-electric conversion element, NEA
The function of GaAs photocathode is that sightless for human eye objective optics image is converted to electronics image.NEA GaAs
The quality of photocathode quality, decides the quality good or not of image intensifier.And the original position prison in photocathode manufacture process
Survey technology, is to ensure that one of important step of NEA GaAs photocathode quality.
NEA GaAs photocathode is generally by glass window, GaAs epitaxial layer, CsO2Surface layers etc. form.It manufactures
Technology contains: be hot bonding, surface chemistry burn into surface processes and the series of process process such as activation.Generally,
Process on surface and in activation technology, NEA GaAs photocathode be placed in ultrahigh vacuum (UHV) image tube General assembling table
Surface process in chamber, process according to well-known surface and " yo-yo be (with Cs and O2Alternately and repeatedly cover surface
Technique) " technique carries out surface activation process.NEA GaAs photocathode is made to produce good photoelectron emissions performance,
In fact the in-situ monitoring to NEA GaAs photocathode " yo-yo " technique, is to carry out period in " yo-yo " technique,
A light stimulus signal is inputted, the photoelectron that monitoring photocathode is launched the most in real time to NEA GaAs photocathode surface
Stream.
Generally, the input mode of this light stimulus signal has two kinds: i.e.: reflective and transmission-type.The eighties mid-term,
F.C.Tang etc. are at Rev.Sci.Instrum.57 (12), " Operating that Dec.1986, p3004-3011 deliver
Experience with a GaAs photoemission electron souce " and R.Calabrese etc. at Nuclear
" the Experimental that Instruments and Methods in Physics.Research A309 (1991) 21-24 delivers
Study on the production of high density electron bunches from a GaAs photocathode " intermediary
The research in-situ monitoring light supply apparatus continued, be all with light beam through UHV chamber observation window after direct projection to photocathode
Reflection mode work on surface, do not have transmission-type to monitor, thus be the original technology of comparison.And D.C.Rodway
Deng " the In situ surface study of the delivered on J.Phys.D:Appl.Phys.19 (1986) p1353-1371
Activating layer on GaAs (Cs, O) photocathodes " the in-situ monitoring light source introduced in a literary composition is better:
Have employed the in-situ monitoring mechanism that reflective/transmission-type is compatible, but after its incidence still it be observed that window for light beam, direct projection is arrived
On photocathode surface.As can be seen here, in the field, the subject matter that existing similar light sources device exists is:
Only possess reflective monitoring function, there is no transmission-type monitoring function；It addition, the light beam incident path of light supply apparatus is
After the glass window of UHV chamber, direct projection is on photocathode surface rather than through the observation window of UHV chamber
After, import on photocathode surface via certain reflection unit in UHV chamber.
For night vision instrument is with the activation of image intensifier photocathode, due to reflective and transmission type photoelectric sensitivity
Can reflect respectively is the different performance parameter of NEA GaAs photocathode, thus is provided simultaneously with reflective and transmission-type two
Plant and activate monitoring mechanism, be optimum selection.Only with reflective activate monitoring, either to further investigation activation technology,
Or improve the main performance index of image intensifier, have bigger limitation.
Obviously, light beam is directly incident on photocathode surface after passing glass window is a kind of preferably incidence.
But in most of practical UHV chamber, to accomplish crossing on the axis activating station, reflection is installed simultaneously
Formula and the monitoring device of two kinds of different mechanisms of transmission-type, have many concrete technical problems to there is no method and overcome.Thus be difficult to
Realize.
Summary of the invention
In order to overcome the deficiencies in the prior art, the invention provides a kind of cantilevered monitoring light supply apparatus, it is possible at one
UHV active cavity is indoor, realizes former during surface " yo-yo " activation technology of NEA GaAs photocathode simultaneously
Position transmission-type and reflective two kinds of photocurrent monitor mechanism.
The technical solution adopted for the present invention to solve the technical problems is: include the UHV being positioned at observation window flange side
Chamber interior divides the light source with opposite side and fastener portion thereof.
Described UHV chamber interior is divided and is included that two-sided sandwich flange, light path support tube, mirror support and plane are anti-
Penetrating mirror, analog sample is fixed in UHV chamber by specimen holder, at reflective light source and the simulation sample of UHV chamber
On the extended line of product line, plane mirror is fixed on light path support tube one end by mirror support, and light light path supports
Whole light path components in the cylinder other end and UHV chamber are by two-sided sandwich flange and observation window flange, with cantilevered
Structure connects firmly on CF35 flange pedestal, light source the collimated light beam that the light sent produces through collimator is worn
Cross the glass window of observation window flange and through the centre bore of two-sided sandwich flange and the inner chamber of light path support tube, projection
On plane mirror, then 45 ° of reflections through plane mirror, it is finally projected on analog sample；
Described light source and fastener portion thereof include incandescent lamp bulb, heat-dissipating cylinder, frosted glass plate, collimator and optical filtering
Sheet, installs incandescent lamp bulb inside described heat-dissipating cylinder one end, the other end is provided with frosted glass plate and coaxial UNICOM collimator,
It is additionally provided with neutral colour filter, optical lens, diaphragm and optical filter according to the order away from incandescent lamp bulb in collimator,
With guarantee observation window flange obtain a branch of NEA of disclosure satisfy that GaAs photocathode activate require, wave-length coverage be
400nm～1000nm, light intensity are milli lumen magnitude, the adjustable collimated light beam of spot diameter.
In described UHV chamber, in addition to reflecting mirror uses oxygenless copper material, whole components all use 316 rustless steels
Material.
Described two-sided sandwich flange is being designed with a concave step face on the flange face of UHV chamber side,
Described concave step face has the screw hole of 4 even cloth, the diameter in described concave step face and the end of light path support tube
Face diameter tight fit.
Described two-sided sandwich flange and observation window flange are connected firmly in CF35 method by flange seal bolt, nut, pad
On blue pedestal.
Described collimator is fixed on CF35 method by detachable light source clip, clip trip bolt and light source retaining ring
Lan Shang, is fixed on the table top of UHV system by the light source height adjustment bracket of its central authorities, to guarantee the stationarity of light path.
The invention has the beneficial effects as follows:
1. the whole components in chamber are arranged on CF35 flange pedestal with cantilever design by a two-sided sandwich flange,
Solve the problem such as the light path mechanism in UHV chamber and coaxial, the distortion between light-source system outside chamber well,
Ensure that this light supply apparatus has excellent spectrophotometric data；
2., owing to have employed cantilever design, eliminate because reflecting mirror and holder device thereof stop the gas stream of UHV system
Guide face amasss, and then causes the problem that the pumping speed of UHV system declines.On the other hand, due to the light in UHV chamber
Road parts, from selection, design, process, process to surface, all carried out standardization processing.Accordingly ensure that UHV
The UHV performance of chamber does not has any deterioration occur because of the light source reflection unit described in the indoor location of chamber；
3. owing to have employed described cantilever design, it is entirely avoided the problems with that traditional structure exists: make for a long time
During with, the reflecting mirror being in UHV chamber on platform at the bottom of grid type and support thereof are placed, because of vacuum air pump
The vibrations that produce during work and be subjected to displacement, and then cause light-source system stability, reliability increasingly to deteriorate, finally
The monitoring function causing light-source system is lost；
4., for the feature that there is in UHV chamber high-temperature baking, alkali metal pollutes, have employed described anaerobic copper
Reflecting mirror (reflectance sees Fig. 3) rather than use the reflecting mirror of traditional glass substrate+reflective coating structure, because of
And the most well meet the spectrophotometric data of described light-source system, eradicate again 250 DEG C repeatedly after high-temperature baking, instead
Penetrate the tilting of film layer, glass substrate bursts and Cs, O2And compound pollutes the hidden danger making its reflection efficiency decline；
5. from the point of view of configuration aspects, the cantilevered monitoring light supply apparatus that the present invention initiates, passes through at conventional incident beam
After the glass window of UHV chamber, outside the prior art being directly incident on sample surfaces, with incident illumination at chamber
Interior form after reflection on arrival sample, expands and supplements the light path incidence of monitoring light source.
In UHV chamber the most disclosed by the invention, cantilevered monitoring light supply apparatus, is a kind of succinct, ingenious, practical dress
Put.Table 1 gives the contrast of the three-generation image enhancer sensitivity index manufactured before and after using this monitoring light supply apparatus, Fig. 4
Give the typical NEA GaAs photocathode spectral response curve after employing.By table 1 and Fig. 4 it can be seen that use this
The performance of the three-generation image enhancer of the technology manufacture of invention is the most excellent.
The three-generation image enhancer sensitivity index that table 1 manufactures before and after using this monitoring light supply apparatus
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention；
Fig. 2 is the structural representation of 45 ° of plane mirrors of the present invention；
Fig. 3 is the reflectance measured curve that the present invention uses copper plane mirror；
Fig. 4 is to use the cantilevered of the present invention to activate monitoring light supply apparatus, it is thus achieved that the spectrum of NEA GaAs photocathode
Response curve.
In figure, 1-UHV chamber；2-photocathode sample matrices；3-analog sample；4-specimen holder；5-mirror support；
6-plane mirror；7-lock screw；8-light path support tube；9 CF35 flange pedestals；10-clip trip bolt；
The two-sided sandwich flange of 11-；12-observation window flange；13-glass window；14-flange seal bolt, nut, pad；
15-light source retaining ring；16-optical filter；17-light source support ring；18-aperture plate；19 stainless steel screws；20-sealing gasket
Circle；21-light source clip；22-collimator；23-light source height adjustment bracket；24-frosted glass plate；25 heat-dissipating cylinders；
26-incandescent lamp bulb；27-light source bonnet；28-fixes screw；29-supply socket；30-reflective light source observation window flange；
The reflective light source of 31-.
Detailed description of the invention
As shown in Figure 1, it is an object of the invention to manufacture and design a set of applicable night vision NEA GaAs photocathode surface swash
The transmission-type in-situ monitoring light supply apparatus of technique of living, it is achieved in " yo-yo " technical process, NEA GaAs photoelectricity is cloudy
The original position of aurora current sensitivity is reflective, transmission-type monitoring.Solve following technical problem: be in UHV chamber simultaneously
The parts of light supply apparatus must are fulfilled for: volume is little, discharge quantity is few, to final vacuum original in UHV chamber,
The UHV performances such as partial pressure composition and system pumping speed can not cause substantially destruction.If according to traditional light path system structure
One-tenth form, in order to ensure stationarity and the reliability of light path system, typically can lay the important spare part of light path system
On baseplane aperture plate in chamber, what kind of will necessarily reduce the gas conduction sectional area of UHV system, reduces aerofluxus and takes out
Speed, ultimately results in vacuum performance and deteriorates.On the other hand, the illuminator etc. in UHV chamber is in 420 DEG C the highest for a long time
Temperature baking and caesium (Cs) oxygen (O2) in the environment that repeatedly pollutes of atmosphere, how to ensure that the light reflection surface of reflecting mirror exists
420 DEG C repeatedly do not tilt after high-temperature baking, glass substrate bursts and reflecting mirror is by Cs, O2And compound pollutes
After, the optical property such as reflection efficiency still keeps stable, reliable, installation and debugging convenient, is also the master that the invention solves the problems that
Want technical problem.
In order to solve problem above, present invention employs following technical scheme: first, by the whole light in UHV chamber
Road component and reflector elements, be suspended on the flange of UHV chamber.Rather than as conventional art, placed
On the aperture plate of base.Second, use oxygen-free copper material burnishing surface reflecting mirror.And do not use in conventional conventional art
Reflecting mirror made by glass substrate+reflective coating.3rd, reduce the light supply apparatus of the present invention to greatest extent to UHV chamber
UHV performance cause any adverse effect.Concrete measure is: the parts in UHV chamber, except plane mirror it
Outward, all employing meets 316 stainless steels of UHV standard；On the premise of guaranteeing mechanical strength and reliability,
Reduce wall thickness and the volume of all parts as far as possible, to reduce they discharge quantities in UHV chamber；To whole zero
Parts strict implement UHV cleans, processing specification.
Present disclosure is divided into two parts.As it is shown in figure 1, Part I is in the UHV on the left of observation window flange
Chamber interior is divided, including: two-sided sandwich flange, seal washer, stainless steel screw, light path support tube, lock screw,
Mirror support, plane mirror.This part is the core technology of the present invention.Part II is in observation window flange
The light source on right side and fastener portion thereof, including: light source clip, clip trip bolt, light source locking ring, directional light
Pipe, optical filter, light source support ring, height adjustment bracket, frosted glass plate, bulb, tube face, heat-dissipating cylinder, bonnet
Deng.The feature of each parts and the locus annexation between them be: in the first portion, this cantilevered
Whole components of the vacuum chamber indoor section of monitoring light supply apparatus, in addition to reflecting mirror uses oxygenless copper material, remaining is
316 stainless steel materials.By means of 4 screws, they are arranged on a two-sided sandwich flange with cantilever design,
That is " cantilevered ".On the CF35 flange pedestal that described two-sided sandwich flange is arranged on UHV chamber.CF35 method
Blue pedestal belongs to the ingredient of UHV chamber, has good weight capacity.Described two-sided sandwich flange not only exists
It is respectively arranged with one on two faces of flange and seals the edge of a knife, on the flange face of chamber side, be also devised with a spill
Step surface, has the screw hole of 4 even cloth on described concave step face, and its diameter is straight with the baseplane of light path support tube
Footpath tight fit, to ensure the axiality of light path.The function of described 4 screw holes is by described two-sided sandwich flange and institute
State light path support tube and be connected as an entirety, it is achieved cantilever design.The function of described two-sided sandwich flange is: for being in
Whole light path components in UHV chamber provide a suspension strut point and guarantee and CF35 flange coaxial.This part
Locus annexation between remaining component and two-sided sandwich flange is: use 4 M3 screws, by described light
The circular planar lowermost of road support tube is fixed in the circular groove of described two-sided sandwich flange.Described light path support tube
Being a part being made up of circular planar lowermost and hollow cylinder barrel structure, the cylinder that left side external diameter is less is Φ 20
Precision-fit face, dynamic with the inner circle precision of described plane reflection mirror support right-hand member coordinate, with realize light path horizontal away from
From the axial angle regulation of regulation and reflecting mirror, lateral separation range of accommodation is more than 30mm.On the right side of this Φ 20 face of cylinder
Face of cylinder diameter more than Φ 20mm, define a step circle, its function except the consideration in terms of mechanical strength it
Outward, it is often more important that the lateral adjustments distance of mirror support is limited in certain scope.On this section of cylinder
Φ 8mm through hole has to be installed location and is easy to the dual function that gas is discharged.Described mirror support is from Design and Machining side
Face, it is ensured that the reflecting surface of reflecting mirror is 45 ° ± 30 ' with the angle of horizon light between centers.At described plane reflection mirror support
On the hollow cylinder coordinated with described light path support tube, it is provided with 2 locking screws, and two M3 screws is installed,
Its effect is after the optical path adjusting between described reflecting mirror and sample completes, and described plane reflection mirror support is fixed on
On described light path support tube, described plane mirror uses oxygen-free copper material to make through optics cold machining process, surface
On do not plate any film layer.The reflection efficiency curve of its actual measurement sees Fig. 3.Described plane mirror is fixed on described reflection
In the reflecting mirror clamp groove of mirror support.
As seen from Figure 1, the Part II of the present invention is in the light source on the right side of the observation window flange of UHV chamber and fastening thereof
Part part, i.e. by: supply socket, fixing screw, light source bonnet, tube face, incandescent lamp bulb, heat-dissipating cylinder, hair glass
Glass sheet, collimator, optical filter, light source retaining ring, light source clip, clip trip bolt, flange seal bolt etc.
Composition.Its locus annexation is: at described light supply apparatus low order end is light source bonnet, is arranged above with some
Louvre, bonnet left-side center is provided with tube face, and the incandescent lamp bulb of light source is arranged in tube face, on the right side of bonnet
Being provided with to the connector socket of bulb powered, one end of socket is connected with tube face, and the other end is exposed outside bonnet, just
In connecting and convenient disassembly to the wire of bulb powered.Bonnet is concentrically mounted to heat-dissipating cylinder dead astern, screw by 4 screws
Fixed structure is easy to the maintenance replacing of bulb, is more beneficial for heat radiation, the life-span improving bulb and the reliability of light-source system.
In heat-dissipating cylinder and collimator joint portion, it is provided with a frosted glass plate, in collimator, is additionally provided with optical lens and light
Door screen (not being given).Thus ensure that at observation window flange, obtain a branch of disclosure satisfy that NEA GaAs photocathode swash
Requirement alive, wave-length coverage are 400nm～1000nm, and light intensity is milli lumen magnitude, the adjustable collimated light beam of spot diameter.
The light intensity of light-source system can be regulated, by changing different-waveband by changing the neutral colour filter of different transmitance
Optical filter, it is thus achieved that NEA GaAs photocathode transmission-type integral sensitivity the most in situ at different wave length and radiation spirit
Sensitivity.
The outer portion of whole UHV chamber is fixed on by detachable light source clip, clip trip bolt and light source retaining ring
On CF35 flange pedestal, short transverse is fixed on UHV system by the light source height adjustment bracket being positioned at collimator central authorities
On table top (not being given), to guarantee the stationarity of light path.When UHV chamber needs to carry out 250 DEG C of high-temperature bakings, can
To unclamp the trip bolt of detachable light source clip very easily, by outside UHV chamber, observation window flange right part
Entirety is separated, to avoid high-temperature baking to bring damage to light supply apparatus.
Is observation window flange, seal washer, flange seal bolt etc. between first, second part, this observation
Window flange have employed the ZVPZQ38 observation window flange that VG company produces, and not only has wider spectral response range, and it is saturating
Crossing wave-length coverage is 200nm～2700nm, it is possible to fully meet the light stimulus letter needed for NEA GaAs photocathode activates
Number spectral region requirement.Described observation window flange passes through described two-sided sandwich flange, by means of described seal washer and
Flange seal bolt, is arranged on UHV and activates on the structural member CF35 flange pedestal of chamber.
By in Fig. 1 it is seen that, the transmission-type of the present invention activates the action principle of monitoring light supply apparatus and is: by incandescent lamp bulb
The diffusion light beam that 26 send, after frosted glass plate 24 carries out strength retrogression, enters collimator 22, through optical lens
Focusing on and become collimated light beam after diaphragm restriction spot diameter, this collimated light beam via optical filter 16 or directly arrives
On the glass window 13 of UHV chamber, pass through glass window 13, enter in UHV chamber, incide plane mirror 6
Working surface on, through 45 ° of reflections of plane mirror 6, change direction, incide photocathode sample 3 upward
The back side, pass through photocathode sample 3 and arrive NEA GaAs photocathode surface, and inhaled by NEA GaAs photocathode layer
Receive.
Be positioned at UHV activate chamber 1, constitute light path reflect and the mirror support 5 of governor motion, plane mirror 6,
Lock screw 7, light path support tube 8, be suspended on two-sided sandwich flange 11 by means of four stainless steel screws 19, Fig. 2
Give their detailed construction.Two-sided sandwich flange 11 is fixed on CF35 flange pedestal 9, and abundant and flange
Pedestal 9 is coaxial.Simultaneously by the light source part 15 29 outside observation window flange 12, by means of a detachable light source card
Hoop 21, clip trip bolt 10, retaining ring 15, and height adjustment bracket 23, be separately fixed at CF35 flange pedestal 9
With UHV activate chamber table top (not being given) on, to guarantee the stationarity of light source.
The laterally and axially adjusting function of light path in UHV chamber 1, by between light path support tube 8 and mirror support 5
Position adjustments relatively realizes.In the joint portion of light path support tube 8 with mirror support 5, except part uses precision-fit
Face, to guarantee outside the collimation of light path, additionally uses the fine setting on horizontal direction and 360 ° of directions of optical axis circumference and fixing
Mechanism, it is possible to achieve the lateral adjustments of 30mm, axial fine adjustment then relies on mirror support 5 to coordinate with light path support tube 8
The internal diameter in face realizes relative to the rotating against between the external diameter of face that coordinate of light path support tube 8, and optimum adjustment effect is to pass through
The collimated light beam of 45 ° of plane mirrors 6 is vertically projected to the centre of photocathode analog sample 3 and the circle in standard
Hot spot is as the criterion, and precision is better than ± 0.10mm.After regulation calibration completes, lock lock screw 7.
Specific embodiment is: be carried out processing according to related process specification by qualified part, especially the present invention the
A part, the whole parts that will load in UHV chamber, in strict accordance with UHV technological specification carry out Chemical cleaning,
Oven drying at low temperature, high-temperature vacuum process, surface blowing processes.
Then, special superclean bench completes following debuging:
By in the end stage+module of light path support tube 8 to the groove of two-sided sandwich flange 11 degree of depth 2mm, use 4 M3 × 10
Stainless steel screw 19, light path support tube 8 and two-sided sandwich flange 11 are connected as an entirety.In this installation process,
Perform following standard: make on the cylinder of light path support tube 8 central axis of Φ 8mm through hole with on two-sided sandwich flange 11
Leak detection groove vertical.Then reflecting mirror plane mirror 6 being arranged on mirror support 5 is laid in groove, and uses
Thickness is that the bar shaped nickel sheet of 0.05mm is embedded in the difference around plane mirror 6, simultaneously works as fastening and fine setting is anti-
Penetrate the dual function in mirror 6 orientation.Check reflecting mirror 6 so that it is plane in all directions with the upper plane of mirror support 5
It is substantially parallel, that is the work surface of guarantee reflecting mirror 6 is 45 °, and fully and inlay firmly between mirror support 5.Give anti-
Penetrate mirror support 5 and 2 M3 × 8 lock screw 7 are installed, then mirror support 5 is contained on support tube 8, and tightens gently
Lock screw 7.In this installation process, perform following standard: make mirror support 5 longitudinal centre line above with double
Leak detection groove center line on the sandwich flange in face 11 is vertical.So far, light path part in the UHV chamber of light supply apparatus of the present invention
Work of debuging on superclean bench is complete.
By above-mentioned that complete to debug on superclean bench, by: mirror support 5, reflecting mirror 6, lock screw 7,
Light path support tube 8, two-sided sandwich flange 11, the light path part of composition, and observation window flange 12, seal washer 20, borrow
Help 6 groups of flange seal bolts, nut, pad 14, be installed on the CF35 flange pedestal 9 of UHV chamber 1.Pacify at this
In process of assembling, performing following standard: first, the leak detection groove of two-sided sandwich flange 11 must be with the inspection of CF35 flange pedestal 9
Bakie completely heavy and.Second, each flange seal ring 20 enters in the sealing edge of a knife accurately.Confirmed errorless after,
During by flange seal bolt 14 tightly to sixty percent, to laying an analog sample 3 on specimen holder 4, block in UHV chamber 1
Veiling glare, outside observation window flange 12 install light source part 15 29, locking light source clip 21 card band tightener spiral shell
Nail 10, makes light source in running order, the light intensity of light source is regulated and is about 20Lx, with the analog sample in chamber
On can be clearly visible that hot spot is as the criterion.Then start to check the collimation of light path system 66 and the axiality of sample room,
The index such as spot diameter, ovality.Through adjustment inspection repeatedly, after confirming that over-all properties index has reached design requirement,
Finally tighten lock screw 7, take out analog sample 3, clean and close UHV chamber 1, start vacuum exhaust.
So far, the specific embodiment of the NEA GaAs photocathode transmission-type activation monitoring light supply apparatus of the present invention is the completeest
Become.
It should be noted that when flange seal bolt 14 tight to sixty percent after, carry out flange face to reflecting mirror 6 central point
Lateral separation when calculating, it is necessary to consider that flange seal bolt 14 also has the amount of tightening of four one-tenth will make chamber subsequently
Interior light path reflecting member is to the displacement about 2mm of chamber center position.This amount of tightening is that two copper sealing washers are by flange
Sealing bolt 14 is tight to sixty percent, until produce when being tightened to be fully achieved UHV seal degree.Therefore, lock is being tightened
Before determining screw 7, it is necessary to the regulation reflector bracket 5 relative position on light path support tube 8, the artificial sample that allows
On hot spot deflection flange face one survey about 2mm, the most just can tighten the lock screw 7 on mirror support 5.Finally take
Go out analog sample 3, clean and close UHV chamber 1, start vacuum exhaust.It is true that flange face is to reflecting mirror 6
The lateral separation of central point (or photocathode sample central point) is known in design drawing.
Claims (5)
1. a cantilevered monitoring light supply apparatus for NEA GaAs photocathode, including being positioned at observation window flange side
UHV chamber interior divides the light source with opposite side and fastener portion thereof, it is characterised in that: described UHV chamber
Indoor section includes two-sided sandwich flange, light path support tube, mirror support and plane mirror, analog sample
It is fixed in UHV chamber by specimen holder, in the reflective light source of UHV chamber and prolonging of analog sample line
On long line, plane mirror is fixed on light path support tube one end, the light path support tube other end by mirror support
With the whole light path components in UHV chamber by two-sided sandwich flange and observation window flange, solid with cantilever structure
It is associated on CF35 flange pedestal, light source the collimated light beam that the light sent produces through collimator, through seeing
Examine the glass window of window flange and through the centre bore of two-sided sandwich flange and the inner chamber of light path support tube, projection
On plane mirror, then 45 ° of reflections through plane mirror, it is finally projected on analog sample；Described
Light source and fastener portion thereof include incandescent lamp bulb, heat-dissipating cylinder, frosted glass plate, collimator and optical filter, institute
Stating installation incandescent lamp bulb inside heat-dissipating cylinder one end, the other end is provided with frosted glass plate and coaxial UNICOM collimator,
It is additionally provided with optical lens, diaphragm and optical filter according to the order away from incandescent lamp bulb, it is ensured that seeing in collimator
Examine window flange obtain a branch of NEA of disclosure satisfy that GaAs photocathode activate require, wave-length coverage be 400nm
1000nm, light intensity are milli lumen magnitude and the adjustable collimated light beam of spot diameter.
The cantilevered monitoring light supply apparatus of NEA GaAs photocathode the most according to claim 1, its feature exists
In: in described UHV chamber, in addition to plane mirror uses oxygenless copper material, other components all use 316
Stainless steel material.
The cantilevered monitoring light supply apparatus of NEA GaAs photocathode the most according to claim 1, its feature exists
In: described two-sided sandwich flange is being designed with a concave step face on the flange face of UHV chamber side,
Described concave step face has the screw hole of 4 even cloth, the diameter in described concave step face and light path support tube
End face diameter tight fit.
The cantilevered monitoring light supply apparatus of NEA GaAs photocathode the most according to claim 1, its feature exists
In: described two-sided sandwich flange, observation window flange and collimator are by detachable light source clip, card banding
Gu screw and light source retaining ring are fixed on CF35 flange pedestal.
The cantilevered monitoring light supply apparatus of NEA GaAs photocathode the most according to claim 1, its feature exists
In: described collimator is fixed on the table top of UHV chamber by the light source height adjustment bracket of its central authorities, with
Guarantee the stationarity of light path.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201410487768.6A CN104236709B (en) | 2014-09-22 | 2014-09-22 | The cantilevered monitoring light supply apparatus of NEA GaAs photocathode |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410487768.6A CN104236709B (en) | 2014-09-22 | 2014-09-22 | The cantilevered monitoring light supply apparatus of NEA GaAs photocathode |
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| CN104236709A CN104236709A (en) | 2014-12-24 |
| CN104236709B true CN104236709B (en) | 2016-08-24 |
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|---|---|---|---|
| CN201410487768.6A Expired - Fee Related CN104236709B (en) | 2014-09-22 | 2014-09-22 | The cantilevered monitoring light supply apparatus of NEA GaAs photocathode |
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| CN108919480B (en) * | 2018-06-25 | 2020-07-21 | 中国科学院长春光学精密机械与物理研究所 | Automatic alignment device for multi-channel laser beam combination in same wave band |
| CN110517551A (en) * | 2019-09-18 | 2019-11-29 | 中国人民解放军空军特色医学中心 | A kind of ground light optical analog system |
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| CN2497308Y (en) * | 2001-04-20 | 2002-06-26 | 南京理工大学 | Negative electron affinity photocathode home-position estimating apparatus |
| CN101435785A (en) * | 2008-12-20 | 2009-05-20 | 中国科学院西安光学精密机械研究所 | Multi-purpose ultrafast electric diffraction apparatus |
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| US5114373A (en) * | 1991-02-11 | 1992-05-19 | Itt Corporation | Method for optimizing photo cathode photo-response |
| CN2497308Y (en) * | 2001-04-20 | 2002-06-26 | 南京理工大学 | Negative electron affinity photocathode home-position estimating apparatus |
| CN101435785A (en) * | 2008-12-20 | 2009-05-20 | 中国科学院西安光学精密机械研究所 | Multi-purpose ultrafast electric diffraction apparatus |
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