CN104218109A - High-efficiency perovskite thin film solar cell and preparation method thereof - Google Patents

High-efficiency perovskite thin film solar cell and preparation method thereof Download PDF

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CN104218109A
CN104218109A CN201410485225.0A CN201410485225A CN104218109A CN 104218109 A CN104218109 A CN 104218109A CN 201410485225 A CN201410485225 A CN 201410485225A CN 104218109 A CN104218109 A CN 104218109A
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thin film
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CN104218109B (en
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张晓丹
丁艳丽
姚鑫
魏长春
赵颖
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Nankai University
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    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

The invention provides a high-efficiency perovskite thin film solar cell. The high-efficiency perovskite thin film solar cell is composed of a glass substrate, a front electrode, a compact layer, a porous TiO2 layer, a PVP modified perovskite thin film, a hole transport layer and a back electrode, and formed into a thin film laminated structure, wherein the front electrode is 350nm thick, the compact layer is 30-50nm thick, the porous TiO2 layer is 300-600nm, the PVP modified perovskite thin film is 300-600nm thick, the hole transport layer is 50-200nm thick and the back electrode is 50-200nm thick. The high-efficiency perovskite thin film solar cell has the advantages that the perovskite thin film is an intensively interconnected network formed by crystal grains relatively even in size and has a relatively smooth and continuous surface appearance, compared with a battery device with the perovskite thin film not doped with PVP and under the same conditions, the short circuit current, the open pressure and the fill factor of the high-efficiency perovskite thin film solar cell are all remarkably improved, and the battery efficiency is greatly improved, and therefore, a new preparation method is provided for the development of the low-cost high-efficiency perovskite thin film solar cells.

Description

A kind of high efficiency perovskite thin film solar cell and preparation method thereof
Technical field
The present invention relates to technical field of solar cells, particularly relate to a kind of high efficiency perovskite thin film solar cell and preparation method thereof.
Background technology
Photovoltaic, as a developing direction of future source of energy, significantly must raise the efficiency, reduce costs the requirement that could meet real world applications.Ca-Ti ore type thin film solar cell is simple with its structure, preparation cost is cheap and the advantages such as easy production have attracted the great interest of numerous researcher.Organo-mineral complexing perovskite CH 3nH 3(X is halogen element I to PbX, Cl, Br or halogen compound) be direct gap semiconductor material, there is the advantages such as the absorption coefficient of light is large, carrier mobility is high, the life-span is long, in perovskite solar cell, illustrate huge application prospect as light trapping material.Its cell photoelectric transformation efficiency brought up to 19.3% rapidly from 3.8% in nearly 5 years, but also had the larger space promoted further, became a new direction of following theCourse of PV Industry.
The preparation method of Ca-Ti ore type thin film solar cell has two kinds usually: vacuum vapour deposition and solwution method.Compared with vapour deposition method, solwution method, due to without the need to vacuum equipment, is the better approach of preparation low cost, efficient solar battery.Perovskite thin film is as the light absorbing zone of perovskite solar cell, and its pattern and performance are the key factors affecting battery.Concerning solution spin-coating method prepares thin film solar cell, acquisition is even, the perovskite thin film of high coverage rate remains the severe challenge that this low-cost technologies faces at present.
Polyvinylpyrrolidone (PVP) is a kind of nontoxic water-soluble high-molecular compound, has good stability and film forming characteristics.It not only can be used as surface agent, can also be used as chelating agent, controls crystal growth by modifying interfacial energy, or is used as surface agent and chelating agent application simultaneously.The present invention proposes in perovskite precursor solution, to add PVP to improve the film forming characteristics of perovskite, improves its coverage rate on porous layer, and then promotes the photoelectric characteristic of perovskite thin film solar cell.
Summary of the invention
The object of the invention is for above-mentioned existing problems, a kind of high efficiency perovskite thin film solar cell and preparation method thereof is provided, perovskite thin film prepared by the method is the dense interconnection network formed by the crystal grain that size is relatively uniform, present surperficial relative smooth and continuous print pattern, adopt surface agent polyvinylpyrrolidone (PVP) to strengthen perovskite thin film surface coverage, and then improve perovskite efficiency of solar cell.
Technical scheme of the present invention:
A kind of high efficiency perovskite thin film solar cell, by glass substrate, front electrode, compacted zone, porous TiO 2the perovskite thin film that layer, PVP modulate, hole transmission layer and back electrode form and form pellicular cascade structure, and film thickness is respectively front electrode 350nm, compacted zone 30-50nm, porous TiO 2layer 300-600nm, perovskite thin film 300-600nm, hole transmission layer 50-200nm and back electrode 50-200nm.
A preparation method for described high efficiency perovskite thin film solar cell, step is as follows:
1) chemical bath method is adopted to prepare TiO on clean transparent conductive film FTO substrate 2compacted zone
Clean transparent conductive film FTO substrate is put into the TiCl that concentration is 0.04mol/L 4in the aqueous solution, be then placed in baking box and heat 30min at 70 DEG C, take out substrate and rinse well, anneal 45min at 500 DEG C, obtains the TiO that thickness is 30-50nm 2compacted zone, as electronic barrier layer;
2) spin-coating method is adopted to prepare porous TiO 2layer
By porous TiO 2with absolute ethyl alcohol according to weight ratio 1:4 dilution, the porous TiO that spin coating has been diluted on compacted zone 2solution, 5000 revs/min rotate 60 seconds, spin coating twice, and then 500oC annealing 45min, obtains the porous TiO that thickness is 300-600nm 2layer, as insulating barrier;
3) spin-coating method is adopted to prepare perovskite thin film
By methylpyridinium iodide ammonium (CH 3nH 3and lead chloride (PbCl I) 2) be dissolved in DMF and obtain mixed liquor, in mixed liquor, the mol ratio of methylpyridinium iodide ammonium and lead chloride is 3:1, and magnetic agitation is clarified to solution, in mixed liquor, add PVP, and PVP addition is CH 3nH 3i and PbCl 2the 0-5wt% of total weight, continue to stir, the mixed liquor containing PVP dropped in porous TiO 2on layer, 5000 revs/min rotate 60 seconds, and air anneal 50min at 100-160 DEG C, obtains the perovskite thin film that thickness is 300-600nm in an oven;
4) spin coating Spiro-OMeTAD{2,2,7,7-tetra-[N, N-bis-(4-methoxyphenyl) is amino]-9,9-spiral shell two fluorenes on perovskite thin film } hole transmission layer (HTM)
First two for 520mg trifluoromethanesulfonimide lithium (Li-TFSI) is dissolved in 1mL acetonitrile solution, then the acetonitrile solution of 17.5 μ L Li-TFSI and 80mg spiro-OMeTAD, 28.5 μ L 4-tert .-butylpyridine are dissolved in 1mL chlorobenzene altogether, obtain HTM solution, the HTM solution prepared is dropped on perovskite thin film, 5000 revs/min rotate 60 seconds, spin coating twice, obtained thickness is the hole transmission layer of 50-200nm;
5) thermal evaporation is adopted to prepare back electrode
On hole transmission layer, thermal evaporation layer of Au, Ag or Al metallic film are as back electrode, and thickness is 50-200nm, obtained perovskite thin film solar cell.
Working mechanism of the present invention:
The method can strengthen perovskite thin film surface coverage, and then improves perovskite efficiency of solar cell.Utilize PVP stable performance, there is good film forming characteristics, joined in the precursor solution of perovskite thin film, improve the affinity between precursor solution and multichip semiconductor aperture layer or insulating barrier, strengthen the coverage rate of perovskite thin film on its surface.The lifting of perovskite thin film surface coverage, can reduce on the one hand and do not lost by the light transmission that perovskite thin film absorbs, enhance light absorption; On the other hand by reducing the cavity of surface of insulating layer, reducing the part that hole transmission layer directly contacts with insulating barrier, reducing the recombination losses of charge carrier.Therefore make the short-circuit current density of perovskite solar cell, open pressure and fill factor, curve factor all gets a promotion, and then battery efficiency is greatly improved
Advantage of the present invention and good effect are:
The perovskite thin film adopting the present invention to prepare is the dense interconnection network formed by the crystal grain that size is relatively uniform, presents surperficial relative smooth and continuous print pattern; By the adjustment of surface agent addition, conveniently can control the key parameter such as coverage rate, surface topography of film, thus affect optical absorption intensity and photoelectric properties; With the perovskite thin film not adding surface agent as the same terms of absorbed layer battery device compared with, short circuit current, open pressure and fill factor, curve factor be all significantly increased, battery efficiency obtains and significantly promotes, for the development of low cost, efficient calcium titanium ore thin film solar cell provides a kind of new preparation method.
Accompanying drawing explanation
Fig. 1 is atomic force microscope (AFM) shape appearance figure of the perovskite thin film of preparation.
Fig. 2 is the structure chart of this perovskite thin film solar cell.
Fig. 3 is the I-V performance diagram of this perovskite thin film solar cell.
Fig. 4 is the light absorption spectrogram of the perovskite thin film of preparation
Fig. 5 is the quantum efficiency curve chart with Fig. 4 solar cell corresponding to the perovskite thin film prepared.
Embodiment
Below in conjunction with the drawings and specific embodiments, technical solutions according to the invention are described in detail.
embodiment 1:
A kind of high efficiency perovskite thin film solar cell, by glass substrate, front electrode, compacted zone, porous TiO 2the perovskite thin film that layer, PVP modulate, hole transmission layer and back electrode form and form pellicular cascade structure, as shown in Figure 1, the preparation method of described high efficiency perovskite thin film solar cell, step is as follows:
1) chemical bath method is adopted to prepare TiO on clean transparent conductive film FTO substrate 2compacted zone
Be that the transparent conductive film FTO substrate of 350nm puts into the TiCl that concentration is 0.04mol/L by clean thickness 4in the aqueous solution, be then placed in baking box and heat 30min at 70 DEG C, take out substrate and rinse well, anneal 45min at 500 DEG C, obtains the TiO that thickness is about 30nm 2compacted zone, as electronic barrier layer;
2) spin-coating method is adopted to prepare porous TiO 2layer
By porous TiO 2with absolute ethyl alcohol according to weight ratio 1:4 dilution, the porous TiO that spin coating has been diluted on compacted zone 2solution, 5000 revs/min rotate 60 seconds, spin coating twice, and then 500oC annealing 45min, obtains the porous TiO that thickness is 400nm 2layer, as insulating barrier;
3) spin-coating method is adopted to prepare perovskite thin film
By methylpyridinium iodide ammonium (CH 3nH 3and lead chloride (PbCl I) 2) be dissolved in DMF and obtain mixed liquor, in mixed liquor, the mol ratio of methylpyridinium iodide ammonium and lead chloride is 3:1, and magnetic agitation 12h clarifies to solution.Mixed liquor is dropped in porous TiO 2on layer, 5000 revs/min rotate 60 seconds, and air anneal 50min at 140 DEG C, obtains the perovskite thin film that thickness is about 400nm in an oven, and Fig. 1 is atomic force microscope (AFM) shape appearance figure of the perovskite thin film of preparation;
4) spin coating Spiro-OMeTAD{2,2,7,7-tetra-[N, N-bis-(4-methoxyphenyl) is amino]-9,9-spiral shell two fluorenes on perovskite thin film } hole transmission layer (HTM)
First two for 520mg trifluoromethanesulfonimide lithium (Li-TFSI) is dissolved in 1mL acetonitrile solution, then the acetonitrile solution of 17.5 μ L Li-TFSI and 80mg spiro-OMeTAD, 28.5 μ L 4-tert .-butylpyridine are dissolved in 1mL chlorobenzene altogether, obtain HTM solution, the HTM solution prepared is dropped on perovskite thin film, 5000 revs/min rotate 60 seconds, spin coating twice, obtained thickness is about the hole transmission layer of 150nm;
5) thermal evaporation is adopted to prepare back electrode
On hole transmission layer, thermal evaporation one deck Ag metallic film is as back electrode, and thickness is about 150nm, obtained perovskite thin film solar cell.
Testing result is as in Figure 3-5: J sc, V oc13.12 mA/cm are respectively with FF 2, 0.787 V, 43.7; Photoelectric conversion efficiency η is 4.51%.
embodiment 2:
A kind of high efficiency perovskite thin film solar cell, by glass substrate, front electrode, compacted zone, porous TiO 2the perovskite thin film that layer, PVP modulate, hole transmission layer and back electrode form and form pellicular cascade structure, as shown in Figure 1, the preparation method of described high efficiency perovskite thin film solar cell, step 1), 2), 4) with 5) identical with embodiment 1, difference is that step 3) is:
3) by CH 3nH 3i and PbCl 2be dissolved in DMF and obtain mixed liquor, in mixed liquor, the mol ratio of methylpyridinium iodide ammonium and lead chloride is 3:1, and magnetic agitation 12h clarifies to solution, in mixed liquor, add PVP, and PVP addition is CH 3nH 3i and PbCl 2the 1.6wt% of total weight, continue to stir, the mixed liquor containing PVP dropped in porous TiO 2on layer, 5000 revs/min rotate 60 seconds, and air anneal 50min at 140 DEG C, obtains the perovskite thin film that thickness is about 400nm in an oven.
Testing result is as in Figure 3-5: J sc, V oc14.96 mA/cm are respectively with FF 2, 0.823 V, 48.5.Photoelectric conversion efficiency η is 5.97%.
embodiment 3:
A kind of high efficiency perovskite thin film solar cell, by glass substrate, front electrode, compacted zone, porous TiO 2the perovskite thin film that layer, PVP modulate, hole transmission layer and back electrode form and form pellicular cascade structure, as shown in Figure 1, the preparation method of described high efficiency perovskite thin film solar cell, step 1), 2), 4) with 5) identical with embodiment 1, difference is that step 3) is:
3) by CH 3nH 3i and PbCl 2be dissolved in DMF and obtain mixed liquor, in mixed liquor, the mol ratio of methylpyridinium iodide ammonium and lead chloride is 3:1, and magnetic agitation 12h clarifies to solution, adds the PVP of 3.3wt% in mixed liquor, continues to stir, and the mixed liquor containing PVP is dropped in porous TiO 2on layer, 5000 revs/min rotate 60 seconds, and air anneal 50min at 140 DEG C, obtains the perovskite thin film that thickness is about 400nm in an oven.
Testing result is as in Figure 3-5: J sc, V oc17.54 mA/cm are respectively with FF 2, 0.848 V, 58.8.Photoelectric conversion efficiency η is 8.74%.
embodiment 4:
A kind of high efficiency perovskite thin film solar cell, by glass substrate, front electrode, compacted zone, porous TiO 2the perovskite thin film that layer, PVP modulate, hole transmission layer and back electrode form and form pellicular cascade structure, as shown in Figure 1, the preparation method of described high efficiency perovskite thin film solar cell, step 1), 2), 4) with 5) identical with embodiment 1, difference is that step 3) is:
3) by CH 3nH 3i and PbCl 2be dissolved in DMF and obtain mixed liquor, in mixed liquor, the mol ratio of methylpyridinium iodide ammonium and lead chloride is 3:1, and magnetic agitation 12h clarifies to solution, adds the PVP of 5wt% in mixed liquor, continues to stir, and the mixed liquor containing PVP is dropped in porous TiO 2on layer, 5000 revs/min rotate 60 seconds, and air anneal 50min at 140 DEG C, obtains the perovskite thin film that thickness is about 400nm in an oven.
Testing result is as in Figure 3-5: J sc, V oc16.56 mA/cm are respectively with FF 2, 0.837 V, 36.8.Photoelectric conversion efficiency η is 5.10%.
?
The detailed performance parameter of solar cell prepared by embodiment of the present invention 1-4 is in table 1.
 
Table 1 adds and does not add the detailed performance parameter of PVP battery device
Samples J sc (mA/cm 2) V oc (V) FF η(%)
0% 13.12 0.787 43.7 4.51
1.6% 14.96 0.823 48.5 5.97
3.3% 17.54 0.848 58.8 8.74
5% 16.56 0.837 36.8 5.10
Because the emphasis of the present invention is providing high coverage rate, the perovskite thin film of high photoelectric properties for efficient, low cost perovskite thin film solar cell.The device efficiency of battery can be promoted to 8.74% from 4.51%, means that the present invention can make the photoelectric properties of battery be improved significantly.
To sum up, the invention provides the preparation method being strengthened perovskite thin film surface coverage and then lifting efficiency of solar cell by surface agent, the method is simple, by the adjustment of surface agent addition, conveniently can control the key parameter such as coverage rate, surface topography of film, thus affect its photoelectric properties, and then significantly promote the photoelectric conversion efficiency of solar cell.For the development of low cost, efficient calcium titanium ore thin film solar cell provides condition, make this novel solar cell be practical to become possibility.
The above; be only the present invention's preferably embodiment, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; the change that can expect easily or replacement, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection range of claim.

Claims (2)

1. a high efficiency perovskite thin film solar cell, is characterized in that: by glass substrate, front electrode, compacted zone, porous TiO 2the perovskite thin film that layer, PVP modulate, hole transmission layer and back electrode form and form pellicular cascade structure, and film thickness is respectively front electrode 350nm, compacted zone 30-50nm, porous TiO 2layer 300-600nm, perovskite thin film 300-600nm, hole transmission layer 50-200nm and back electrode 50-200nm.
2. a preparation method for high efficiency perovskite thin film solar cell as claimed in claim 1, is characterized in that step is as follows:
1) chemical bath method is adopted to prepare TiO on clean transparent conductive film FTO substrate 2compacted zone
Clean transparent conductive film FTO substrate is put into the TiCl that concentration is 0.04mol/L 4in the aqueous solution, be then placed in baking box and heat 30min at 70 DEG C, take out substrate and rinse well, anneal 45min at 500 DEG C, obtains the TiO that thickness is 30-50nm 2compacted zone, as electronic barrier layer;
2) spin-coating method is adopted to prepare porous TiO 2layer
By porous TiO 2with absolute ethyl alcohol according to weight ratio 1:4 dilution, the porous TiO that spin coating has been diluted on compacted zone 2solution, 5000 revs/min rotate 60 seconds, spin coating twice, and then 500oC annealing 45min, obtains the porous TiO that thickness is 300-600nm 2layer, as insulating barrier;
3) spin-coating method is adopted to prepare perovskite thin film
By methylpyridinium iodide ammonium (CH 3nH 3and lead chloride (PbCl I) 2) be dissolved in DMF and obtain mixed liquor, in mixed liquor, the mol ratio of methylpyridinium iodide ammonium and lead chloride is 3:1, and magnetic agitation is clarified to solution, in mixed liquor, add PVP, and PVP addition is CH 3nH 3i and PbCl 2the 0-5wt% of total weight, continue to stir, the mixed liquor containing PVP dropped in porous TiO 2on layer, 5000 revs/min rotate 60 seconds, and air anneal 50min at 100-160 DEG C, obtains the perovskite thin film that thickness is 300-600nm in an oven;
4) spin coating Spiro-OMeTAD{2,2,7,7-tetra-[N, N-bis-(4-methoxyphenyl) is amino]-9,9-spiral shell two fluorenes on perovskite thin film } hole transmission layer (HTM)
First two for 520mg trifluoromethanesulfonimide lithium (Li-TFSI) is dissolved in 1mL acetonitrile solution, then the acetonitrile solution of 17.5 μ L Li-TFSI and 80mg spiro-OMeTAD, 28.5 μ L 4-tert .-butylpyridine are dissolved in 1mL chlorobenzene altogether, obtain HTM solution, the HTM solution prepared is dropped on perovskite thin film, 5000 revs/min rotate 60 seconds, spin coating twice, obtained thickness is the hole transmission layer of 50-200nm;
5) thermal evaporation is adopted to prepare back electrode
On hole transmission layer, thermal evaporation layer of Au, Ag or Al metallic film are as back electrode, and thickness is 50-200nm, obtained perovskite thin film solar cell.
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CN105609645A (en) * 2015-12-22 2016-05-25 成都新柯力化工科技有限公司 Photovoltaic material with microporous perovskite structure and preparation method of photovoltaic material
CN105870336A (en) * 2016-06-01 2016-08-17 华东师范大学 Mesoporous perovskite solar cell
CN106328813A (en) * 2015-06-29 2017-01-11 清华大学 High-stability cesium-doped perovskite solar cell and preparation method therefor
CN107634119A (en) * 2016-07-13 2018-01-26 Lg电子株式会社 Series-connected solar cells and the series-connected solar cells module for including it
RU2645221C1 (en) * 2016-09-30 2018-02-19 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) Perovskite solar cell and method of its manufacture
CN109888103A (en) * 2019-03-01 2019-06-14 北京理工大学 A method of inhibit small molecule hole transport layer hole to generate
WO2019148326A1 (en) * 2018-01-30 2019-08-08 南方科技大学 Method for preparing perovskite thin film and application thereof
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CN106328813B (en) * 2015-06-29 2018-08-28 清华大学 A kind of high stability mixes caesium Ca-Ti ore type solar cell and preparation method thereof
CN105609645B (en) * 2015-12-22 2017-12-01 嵊州北航投星空众创科技有限公司 A kind of photovoltaic material of micropore perovskite structure and preparation method thereof
CN105609645A (en) * 2015-12-22 2016-05-25 成都新柯力化工科技有限公司 Photovoltaic material with microporous perovskite structure and preparation method of photovoltaic material
CN105870336A (en) * 2016-06-01 2016-08-17 华东师范大学 Mesoporous perovskite solar cell
CN107634119A (en) * 2016-07-13 2018-01-26 Lg电子株式会社 Series-connected solar cells and the series-connected solar cells module for including it
CN107634119B (en) * 2016-07-13 2020-09-01 Lg电子株式会社 Series solar cell and series solar cell module comprising same
RU2645221C1 (en) * 2016-09-30 2018-02-19 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) Perovskite solar cell and method of its manufacture
WO2019148326A1 (en) * 2018-01-30 2019-08-08 南方科技大学 Method for preparing perovskite thin film and application thereof
JP2019134159A (en) * 2018-02-01 2019-08-08 パナソニック株式会社 Solar cell
JP7232032B2 (en) 2018-02-01 2023-03-02 パナソニックホールディングス株式会社 solar cell
CN109888103A (en) * 2019-03-01 2019-06-14 北京理工大学 A method of inhibit small molecule hole transport layer hole to generate
CN110176546A (en) * 2019-04-28 2019-08-27 华南师范大学 A kind of light emitting diode and preparation method thereof based on multiple addition calcium titanium material layer
CN111403607A (en) * 2020-03-25 2020-07-10 华东理工大学 Chelated perovskite material, film, device and preparation method and application thereof

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