CN104195528A - High-frequency vibration coupled micro plasma-enhanced chemical vapor deposition device - Google Patents

High-frequency vibration coupled micro plasma-enhanced chemical vapor deposition device Download PDF

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Publication number
CN104195528A
CN104195528A CN 201410449665 CN201410449665A CN104195528A CN 104195528 A CN104195528 A CN 104195528A CN 201410449665 CN201410449665 CN 201410449665 CN 201410449665 A CN201410449665 A CN 201410449665A CN 104195528 A CN104195528 A CN 104195528A
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China
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plate
gas
system
chemical vapor
connected
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CN 201410449665
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Chinese (zh)
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郑建毅
杨群峰
庄明凤
郑高峰
陈新敏
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厦门大学
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Priority to CN 201410449665 priority Critical patent/CN104195528A/en
Publication of CN104195528A publication Critical patent/CN104195528A/en

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Abstract

The invention relates to the technical field of chemical vapor deposition and provides a high-frequency vibration coupled micro plasma-enhanced chemical vapor deposition device. The high-frequency vibration coupled micro plasma-enhanced chemical vapor deposition device comprises a gas supply system, an exhaust system, a vacuum reaction chamber, a support, a gas ejection system, a vibration exciter, a deposition table and an electric control device. The high-frequency vibration coupled micro plasma-enhanced chemical vapor deposition device is characterized in that the exhaust system is adopted to vacuumize a vacuum chamber, a radio-frequency electric field is formed between an ejection plate connected with a positive electrode of a radio-frequency power source RF and a carrying plate connected with a negative electrode of the radio-frequency power source RF, the gas supply system is capable of providing an inert gas and a reactant gas, the reactant gas ejected by the gas ejection system is induced by the radio-frequency electric field to glow discharge so as to generate a large amount of electrons, a thin film can be deposited on the surface of a collection sheet by virtue of a series of chemical reactions, and then the heating power of a heating sheet, the vibration frequency of the vibration exciter, the power of the radio-frequency power source RF and the space between the ejection plate and the carrying plate are regulated so that a thin film better in quality can be deposited by virtue of parameter adjustment.

Description

一种耦合高频振动的微型等离子增强化学气相沉积装置 COUPLED dither micro plasma enhanced chemical vapor deposition apparatus

技术领域 FIELD

[0001] 本发明涉及化学气相沉积技术领域,具体涉及一种耦合高频振动的微型等离子增强化学气相沉积装置。 [0001] A micro-coupled high-frequency vibration of plasma enhanced chemical vapor deposition apparatus according to the present invention relates to the field of chemical vapor deposition techniques, particularly directed.

背景技术 Background technique

[0002] 等离子增强化学气相沉积法是借助微波或射频等使含有薄膜组成原子的气体电离,在局部形成等离子体,等离子体化学活性很强,很容易发生化学反应,在基片上沉积出所期望的薄膜,具有沉积温度低、沉积速率快。 [0002] Plasma enhanced chemical vapor deposition method is a means like microwave or radio frequency containing film composition of the gas ionized atoms to form a plasma in the localized plasma chemically very active, it is prone to chemical reaction, deposited as desired on the substrate film, having a low deposition temperature, deposition rate. 但由于其沉积的薄膜内部含有较大的残余应力,使得薄膜在沉积过程中直接产生裂纹,无法沉积出满意厚度的薄膜。 However, due to internal deposited film containing large residual stress, so cracks directly in the film deposition process, the deposited film can not be satisfactory thickness.

[0003] 目前等离子增强化学气相沉积装置价格较为昂贵,其内部结构固定紧凑不能进行一些必要的改装,沉积薄膜的可调参数较少、可调节范围大,由于沉积参数间隔大往往难以找出最佳沉积点,利用改变沉积参数来沉积出质量优良的薄膜往往比较困难,并且设备巨大、价格高昂,由于实验用设备所沉积薄膜面积较小,大的腔体造成沉积薄膜所需材料浪费,并且实现真空沉积环境需花费过多抽真空时间。 [0003] Currently, plasma enhanced chemical vapor deposition apparatus more expensive, its internal structure can not be fixed to compact the necessary modifications, the deposited film is less tunable large adjustable range, the intervals between the deposition parameters are often difficult to identify the most good deposition point, by varying the deposition parameters to high quality deposited film is often difficult, and a great equipment, expensive, since the experimental device small and thin film deposition area, a large cavity wasted material required to deposit a thin film, and achieve a vacuum deposition vacuum environment takes too much time.

发明内容 SUMMARY

[0004] 解决上述技术问题,本发明提供了一种耦合高频振动的微型等离子增强化学气相沉积装置,采用高频振动对所沉积薄膜残余应力在沉积过程中进行消除,调节沉积时射频电源RF功率大小、喷射板位置与收集片间距、收集片温度、收集片振动频率等参数使收集片上沉积出质量优良的薄膜。 [0004] solve the above problems, the present invention provides a radio frequency power supply COUPLED dither micro plasma enhanced chemical vapor deposition apparatus, high-frequency vibration of the deposited film to eliminate the residual stress in the deposition process, the deposition adjusted RF power level, the injection plate and the collection plate spacing position, collection sheet temperature, collected in the vibration frequency and other parameters so that excellent quality films deposited on the collection plate. 该设备具有在量程范围内任意对沉积参数进行调整,同时采用高频振动对薄膜残余应力进行消除,设备结构简单、经济性好,适合研究沉积参数与薄膜质量关系。 The apparatus having any of the deposition parameters be adjusted within the range, while high-frequency vibration to eliminate the residual stress of the film, the device structure is simple, economical, and suitable Deposition film quality parameters and relationships.

[0005] 为了达到上述目的,本发明所采用的技术方案是,一种耦合高频振动的微型等离子增强化学气相沉积装置,包括供气系统、排气系统、真空反应室、支架、喷气系统、激振器、 沉积台和电控装置,所述支架固定设置在真空反应室内,所述激振器设置在支架底部,所述沉积台位于支架上,所述激振器输出杆与沉积台固定连接,用于产生高频振动能量传递给沉积台,所述喷气系统设置在沉积台上方,且所述喷气系统通过升降台可相对所述支架上下移动,所述喷气系统的喷嘴相对于所述沉积台,所述供气系统分别为真空反应室以及喷气系统提供惰性气体和反应气体,所述排气系统与真空反应室相通,用于为真空反应室抽真空,所述激振器、供气系统和排气系统均与电控装置电性连接,所述电控装置还包括射频电源RF,所述喷气系统和沉积台分别与射 [0005] To achieve the above object, the technical solution adopted by the present invention a miniature high-frequency vibration coupled plasma-enhanced chemical vapor deposition apparatus, comprising a gas supply system, exhaust system, the vacuum reaction chamber, a stent, jet system, exciter, deposition station and electronic control means, a bracket disposed in a vacuum reaction chamber, said exciter disposed at the bottom of the holder, the holder of the deposition station is located, the exciter output rod fixed to the deposition station connection, for generating a high-frequency vibration energy transferred to the deposition station, depositing a jet system arranged in the platform side, and the system is moved up and down by the lift jet relative to the support table may be, the jet nozzles with respect to the system deposition station, the air supply system, respectively, the reaction chamber and the vacuum system provides a jet of inert and reactive gases, the exhaust system in communication with the vacuum chamber, for evacuating the reaction chamber to a vacuum, the exciter for air system and exhaust system are electrically connected to the electrical control means, said control means further comprises a radio frequency electric power RF, a jet system and exit respectively deposition station 频电源RF的正极和负极连接。 Frequency RF power source connected to the positive and negative electrodes.

[0006] 进一步的,所述真空反应室由腔壁、上盖和下盖密封形成,所述腔壁为圆筒形腔壁,所述上盖和下盖分别罩设在圆筒形腔壁的上端和下端,且上盖和下盖均与圆筒形腔壁密封连接,所述圆筒形腔壁的外壁上开设有石英窗,透过该石英窗可以观测到腔壁内部。 [0006] Further, the vacuum chamber wall of the reaction chamber, upper and lower covers seal is formed, the cavity wall is a cylindrical chamber wall, the upper and lower covers are provided in a cylindrical housing cavity wall the upper and lower ends, and upper and lower covers are sealingly connected with the cylindrical chamber wall, an outer wall of the cylindrical cavity wall defines a quartz window, through the quartz window into the inner cavity walls can be observed.

[0007] 进一步的,所述供气系统包括气体发生装置、第一进气管、惰性气体阀、第二进气管和反应气体阀,所述惰性气体阀安装在第一进气管中段,所述第一进气管一端与气体发生装置连通,第一进气管另一端穿过所述上盖与真空反应室内连通,所述反应气体阀安装在第二进气管中段,所述第二进气管一端与气体发生装置连通,所述第二进气管另一端与喷气系统连通,为喷气系统提供反应气体。 [0007] Further, the air supply system comprises a gas generating means, a first intake pipe, an inert gas valve, a second intake valve and the reaction gas, the inert gas inlet valve installed in the middle of the first pipe, the second an intake duct communicating at one end with the gas generating means, the other end of the first intake pipe through the vacuum reaction chamber in communication with the upper cover, the second reaction gas inlet valve installed in the middle of the pipe, the second end of the gas intake pipe generating means for communication, the other end of the second intake pipe system communicates with the jet, the jet is a reactive gas system.

[0008] 更进一步的,所述喷气系统包括连接杆、门型连接架和喷气板,所述喷气板包括连接板、中板和喷射板,所述连接杆顶部穿过上盖并可相对该上盖上下移动,所述连接杆底部与□型连接架顶部焊接固定,所述□型连接架两脚底部与所述连接板顶部焊接固定,所述连接板底面四周通过绝缘层与中板顶面四周连接,所述中板底面四周通过绝缘层与喷射板顶面四周连接,所述连接板和中板之间的空间为上腔、所述中板和喷射板之间的空间为下腔,所述连接板上设有进气口,该进气口与第一进气管连通,所述中板上均匀设有气流孔, 所述喷射板上均匀设有气流喷射孔,所述喷射板与射频电源RF的正极连接。 [0008] Further still, the jet system comprises a connecting rod connected to the door frame and jet plate type, said web comprising a jet plate, intermediate plate and spray plate, the connecting rod passes through the top cover and the opposite cover moves up and down, the connecting rod top of the bottom frame is welded connector □, □ bottom of the rack-type connection legs is welded and fixed to the top of the connecting plate, the connecting plate and the bottom surface of the insulating layer by four weeks in the top plate four weeks plane connection, a bottom plate connected by four weeks four weeks in the top surface of the insulating layer and the ejection plate, a space between the plate and the web space between the upper chamber, the injector plate and the lower plate chamber the upper connecting plate is provided with intake port, the intake port communicates with the first intake pipe, the air flow hole provided in the plate uniform, homogeneous board is provided with the air-jet injection hole, the injection plate a radio frequency RF power source connected to the positive of. 上腔对进气口送来的反应气体预分布,预分布后气体经气流孔进入下腔,进一步对反应气体进行分布,反应气体经气流喷射孔均匀喷向沉积台,采用绝缘层使得接射频电源RF正电极的喷射板与其它部位绝缘。 The reaction chamber of the gas intake port distribution of pre sent, after pre-distribution of the gas stream through the hole into the lower chamber, a further distribution of the reaction gases, the reaction gas is uniformly sprayed through the air jet holes deposition station using radio connection such that the insulating layer RF power source positive electrode plate insulated from other parts of the jet.

[0009] 更进一步的,所述升降台包括下连接板、上连接板、滑块、滑轨、丝杆、第二连接杆和滚轮,所述滑轨为两根并列的滑轨,所述上连接板和下连接板分别连接在两根并列的滑轨的上下两端,所述下连接板与上盖的上表面固定连接,所述滑块与两根并列的滑轨滑动配合,所述滑块上端与丝杆连接,丝杆上端穿出所述上连接板中心孔,且所述丝杆与上连接板螺纹配合连接,所述滑块下端与连接杆连接,所述下连接杆下端穿出所述下连接板中心孔,所述上盖还开设有供第二连接杆穿过的通孔,所述第二连接杆下端与连接杆固定连接, 所述丝杆顶部连接滚轮的中心转轴,由滚轮的转动带动丝杆的转动,进而推动滑块沿轨道滑动,而连接在滑块下的连接杆相应地上下运动。 [0009] Furthermore, said lifting platform including a lower connection plate, connecting plate, slide, rails, screw, the second connecting rod and the roller, said two parallel rails for the slide, the fixedly connected to the upper surface and lower webs are connected across two parallel vertical rails, the lower connection plate and the upper cover, the slide fit with two parallel slide rails, the the upper end of said slider and screw connection, the screw piercing an upper end of the upper connecting plate center hole, and said screw threaded fitting connected to the upper connecting plate, the connecting rod and the lower end of the slider, the lower connecting rod piercing the lower end of the lower connection plate central aperture, said cover further defines a through hole for passing through a second connecting rod, said second connecting rod is fixedly connected to the lower end of the connecting rod, the connecting screw top roller of the central shaft, driven by the rotation of the roller screw is rotated, thus pushing the slider slides along the track, the connecting rod is connected to the slider moved up and down correspondingly.

[0010] 进一步的,所述沉积台包括载物板和U型热板,所述载物板设置在U型热板上,该载物板底面和U型热板内表面围成一通气腔,所述通气腔内的U型热板的底面均匀设有多个加热片,所述通气腔内的载物板上均匀设有多个热传感器,所述U型热板的底面还开设有多个通气孔,所述载物板上还设有收集片,所述U型热板外底面中部连接有一根支撑杆, 所述支撑杆与所述激振器输出杆固定连接,激振器产生高频振动能量通过输出杆及支撑杆传递给沉积台。 [0010] Further, the deposition station includes a loading plate and a U-shaped heat plate, the loading plate disposed U-shaped heat plate, the bottom surface of the loading plate and the U-shaped heat plate surface enclose a venting chamber bottom surface of the U-shaped breather chamber is provided with a plurality of uniformly hot plate heating plate, the vent chamber is provided with a plurality of evenly loading plate heat sensors, a bottom surface of the U-shaped heat plate further defines a plurality of vent holes, the carrier plate was further provided with collection sheet, an outer bottom surface of a hot plate with a middle portion of a U-shaped connecting rod, the support rod and the output rod is fixedly connected to the exciter, the exciter generating a high-frequency vibration energy is transmitted to the output rod through the deposition station and the support rods. 将加热片设置在通气腔内的U型热板的U型槽底的内表面,使得加热片的受热变形不影响载物板的形状,U型热板的U型槽底贯穿开设有多个通气孔,避免通气腔受热体积变化影响载物板形状,受热时通气腔由通气孔与真空反应室进行气体交换,热传感器贴附于载物板下表面实时测量载物板温度并将参数传送给电控装置,收集片置于载物板上表面,在压紧块压紧力下紧贴载物板,防止在沉积台振动过程中收集片位置变动。 The heated sheet is provided in the bottom surface of the U-shaped U-shaped breather chamber hot plate, heating the sheet such that heat deformation does not affect the shape of the loading plate, a U-shaped bottom of the U-shaped heat plate defines a plurality of through- vent, to avoid heat breather chamber volume change on loading plate shape, a breather chamber vent gas exchange with the vacuum chamber when heated, thermal sensor attached to the lower surface of the loading plate loading plate temperature measured in real time and transfer parameters electrical control system for collecting sheet was placed on the surface of the carrier plate, the pressing force at the pressing block against the loading plate, to prevent the sheet collecting position changes during deposition station vibration.

[0011] 更进一步的,所述收集片四周通过L型压紧块紧压在载物板上。 [0011] Still further, the sheet was collected four weeks by the compression block is pressed against the L-shaped loading plates.

[0012] 更进一步的,所述U型热板和载物板均为圆形。 [0012] Further still, the hot plate and the U-shaped loading plate are circular.

[0013] 进一步的,所述支架包括底座、固定板、第一固定架、第一圆形滑块、第一绝热层、 第二固定架、第二圆形滑块和第二绝热层,所述底座设置在下盖上,所述固定板设置在底座上,所述激振器固定设置在固定板上,所述第一固定架底部与固定板固定连接,所述第一固定架顶部与第一圆形滑块连接,所述第一绝热层与设置在第一圆形滑块上,所述第二固定架底部与第一绝热层固定连接,所述第二固定架顶部与第二绝热层固定连接,所述第二圆形滑块设置在第二绝热层上。 [0013] Further, the bracket includes a base, a fixed plate, a first holder, a first circular slide, a first insulating layer, a second holder, the second insulating layer and a second circular slider, the said base is provided on the lower cover, the fixing plate is provided on the base, the exciter is fixed to the mounting plate, a bottom plate fixed to the first bracket fixedly connected with the first holder and the second top a circular slide connector, the first circular slider, the second bottom bracket fixedly connected with the first thermal insulation layer and the first insulating layer is disposed, the second insulating holder and the second top layer is fixedly connected to the second circular slider disposed on the second insulating layer.

[0014] 更进一步的,固定板和底座之间还通过两个减震器连接,起到减震效果。 [0014] Further still, between the fixed plate and the base is connected through two dampers, shock absorption effect.

[0015] 更进一步的,所述底座中轴上嵌入一柱形滤网。 [0015] Still further, the base shaft fitted in a cylindrical screen.

[0016] 更进一步的,所述排气系统包括输出管、排气阀和抽气装置,所述输出管一端与下盖相连通,另一端与抽气装置连通,所述排气阀设置在输出管上,所述输出管穿过该下盖并与柱形滤网固定连接。 [0016] Further still, the exhaust system comprises an output tube, the exhaust valve and exhaust means, the output end of the tube communicating with the lower lid, and the other end communicates with the suction means, disposed in the exhaust valve an output tube, the outlet tube passing through the lower cover and is fixedly connected with the cylindrical screen.

[0017] 本发明通过采用上述技术方案,与现有技术相比,具有如下优点: 本发明采用排气系统可对真空腔抽真空,在连接射频电源RF正极的喷射板、连接负极的载物板之间形成射频电场,供气系统提供惰性气体和反应气体,喷气系统喷出的反应气体在射频电场作用下辉光放电产生大量电子,经一系列化学反应在收集片表面沉积出薄膜,调节加热片加热功率、激振器振动频率、射频电源RF功率、喷射板与载物板间距,通过调整参数沉积出更优质量的薄膜。 [0017] The present invention adopts the above technical solution, compared with the prior art, has the following advantages: the present invention may employ an exhaust system for evacuating the vacuum chamber, the RF power source connected to the positive RF ejection plate connected to the negative electrode loading radio frequency electric field is formed between the plates, provide an inert gas supply system and the reaction gas, the reaction gas jet system of discharging the electric field at a radio frequency glow discharge a large amount of electrons through a series of chemical reactions to deposit a thin film on the surface of the collection sheet, adjusting heating power of the heating plate, the vibration frequency of the exciter, the radio frequency power source RF power, and the ejection loading plate spacing plate, by adjusting the deposition parameters of the thin film of better quality. 本发明具有在量程范围内任意对沉积参数进行调整,同时采用高频振动对薄膜残余应力进行消除,设备结构简单、经济性好,适合研究沉积参数与薄膜质量关系。 The present invention has any of the deposition parameters be adjusted within the range, while high-frequency vibration to eliminate the residual stress of the film, the device structure is simple, economical, and suitable Deposition film quality parameters and relationships.

附图说明 BRIEF DESCRIPTION

[0018] 图1是本发明的实施例的剖视图。 [0018] FIG. 1 is a cross-sectional view of an embodiment of the present invention.

[0019] 图2是本发明的实施例升降台A的剖视图。 [0019] FIG. 2 is a cross-sectional view of the embodiment A lifting platform of the present invention.

[0020] 图3是本发明的实施例喷气系统剖视图。 [0020] FIG. 3 is a sectional view of an embodiment of a jet system of the present invention.

[0021] 图4是本发明的实施例沉积台剖视图。 [0021] FIG. 4 is an embodiment of the present invention, deposition station sectional view.

[0022] 图5是本发明的实施例固定架32的俯视图。 [0022] FIG. 5 is a top view of an embodiment of the present invention, the holder 32 of FIG.

[0023] 图6是本发明的实施例固定架32的侧视图。 [0023] FIG. 6 is a side view of the embodiment of the present invention, the holder 32.

[0024] [符号说明] 1、气体发生装置,2、惰性气体阀,3、反应气体阀,4、第二进气管,5、第一进气管,6、连接杆,105、下连接板,101、滚轮,107、丝杠,106、连接杆,102、上连接板,103、滑块,104、滑轨,7、第一预留管路,8、压力计,9、上盖,10、连接架,11、腔壁,12、观察口,13、石英窗,14、输出杆,15、激振器,16、减振器,17、下盖,18、线路,19、显示器,20、排气阀,21、输出管,22、抽气装置,23、第二预留管路,24、柱形滤网,25、底座,26、固定板,27、第一固定架,28、第一圆形滑块,29、第一绝热层,30、沉积台,31、喷气板,32、第二固定架,33、第二绝热层,34、第二圆形滑块,35、真空反应室,201、进气口,202、连接板,203、绝缘层,204、中板,205、绝缘层, 206、喷射板,207、气流喷射孔,208、下腔,209、气流孔a,210、上腔,301 [0024] [Description of Symbols] 1, the gas generating means 2, an inert gas valve 3, the reaction gas valve, a 4, a second intake pipe 5, the first intake pipe 6, connecting rod 105, the connecting plate, 101, rollers 107, screw 106, connecting rod 102, the connecting plate 103, the slider 104, slide, 7, a first reserve line 8, a pressure gauge, 9, the upper cover, 10 , the connecting frame 11, chamber wall 12, viewing port 13, quartz window 14, the output rod 15, the exciter 16, the damper 17, the lower cover 18, line 19, the display 20 , exhaust valve 21, delivery pipe 22, exhaust means 23, the second reserve line 24, the cylindrical filter 25, base 26, the fixing plate 27, a first holder, 28, a first circular slider, 29, a first insulating layer 30, deposition station 31, the jet plate 32, a second holder 33, a second insulating layer 34, a second circular slider, 35, in vacuo the reaction chamber 201, the intake port 202, connecting plate 203, the insulating layer 204, intermediate plate 205, the insulating layer 206, the ejection plate 207, air injection hole 208, lower chamber 209, a gas flow hole , 210, the cavity 301 、收集片,302、压紧块,303、载物板,304、通气腔,305、热板,306、支撑杆,307、加热片,308、通气孔,309、热传感器,A、升降台。 , Collection sheet, 302, compression block 303, loading plate 304, the vent chamber 305, heating plate 306, the support bar 307, heating plate 308, a vent 309, a heat sensor, A, lifts .

具体实施方式 Detailed ways

[0025] 现结合附图和具体实施方式对本发明进一步说明。 [0025] The present invention will now be further described in conjunction with the accompanying drawings and specific embodiments.

[0026] 作为一个具体的实施例,如图1至图6所示,本发明的一种耦合高频振动的微型等离子增强化学气相沉积装置,包括供气系统、排气系统、真空反应室、支架、喷气系统、激振器、沉积台30和电控装置19,所述真空反应室35由腔壁11、上盖9和下盖17密封形成,所述腔壁11为圆筒形腔壁11,采用圆筒形腔壁11其内部真空时,其腔壁的受力是均匀的,所述上盖9和下盖17分别罩设在圆筒形腔壁11的上端和下端,且上盖9和下盖17均与圆筒形腔壁11密封连接,所述圆筒形腔壁11的外壁上开设有石英窗13,透过该石英窗13可以观测到腔壁11内部,所述石英窗13可以在圆筒形腔壁11侧面开设多个开口,然后在开口上蒙设一石英玻璃即可。 [0026] As a specific embodiment, shown in FIGS. 1 to 6. A coupling according to the present invention, dither micro plasma enhanced chemical vapor deposition apparatus, comprising a gas supply system, exhaust system, the vacuum reaction chamber, stent, jet system, the exciter, the deposition station 30 and the electric control device 19, the reaction chamber 35 by the vacuum chamber wall 11, an upper cover 9 and the lower seal cover 17 is formed, the lumen wall 11 is a cylindrical chamber wall 11, a cylindrical cavity wall 11 which uses internal vacuum force which is uniform cavity wall, the upper cover and the lower cover 9 covers 17 are provided at upper and lower ends of the cylindrical cavity wall 11, and the cover 9 and the lower cover 17 are connected to the cylindrical seal chamber wall 11, an outer wall of the cylindrical chamber wall 11 defines a quartz window 13, through the quartz window 13 into the inner cavity walls 11 can be observed, the quartz window 13 defines a plurality of openings 11 may be cylindrical side surface of the cavity wall, and then opening a mask of quartz glass can be provided.

[0027] 所述支架固定设置在真空反应室35内,所述支架包括底座25、固定板26、第一固定架27、第一圆形滑块28、第一绝热层29、第二固定架32、第二圆形滑块34和第二绝热层33,所述底座25设置在下盖17上,该底座25为圆形底座25,所述底座25底部紧紧贴设在下盖17上表面,所述底座25中轴开设一中心孔,中心孔内嵌入一柱形滤网24。 [0027] The bracket is provided in the vacuum chamber 35, the bracket comprising a base 25, the fixing plate 26, a first holder 27, a first circular slide 28, a first insulating layer 29, a second holder 32, the second slider 34 and the second circular heat insulating layer 33, the base 25 is provided on the lower cover 17, the base 25 is a circular base 25, the base 25 firmly attached to the bottom surface of the lower cover 17 is provided, the base 25 defines a central hole axis, embedded in a center hole of the cylindrical screen 24.

[0028] 所述固定板26为圆形固定板26,圆形固定板26受力均勻,设置在底座25上,固定板26和底座25之间还通过两个减震器16连接,减振器16将激振器16产生的振动进行衰减,起到减震效果。 [0028] The fixing plate 26 is fixed to a circular plate 26, the fixed circular plate 26 uniform force is provided on the base 25, the fixing plate 26 and the base 25 is also connected through two damper 16, damper the vibration exciter 16 produced 16 attenuates shock absorption effect. 所述第一固定架27为圆筒形固定架27,为了实现对第一固定架27内的反应情况的观察,在所述固定架27侧面相对于石英窗13的位置开设观察口12,透过石英窗13和观察口12可以观察到沉积台上的反应情况。 The first holder 27 is a cylindrical holder 27, in order to achieve in the case of observation of the reaction of the first holder 27, the holder 27 with respect to the side surface of the quartz window 13 defines a viewing port 12, through through the quartz window 13 and observation port 12 can be observed that the deposition stage reactions.

[0029] 其第一固定架27底部与固定板26圆周相匹配,并通过螺栓、螺母相固定连接,所述第一固定架27顶部与第一圆形滑块28连接,所述第一绝热层29与设置在第一圆形滑块28上,所述第二固定架32底部与第一绝热层29固定连接,所述第二固定架32顶部与第二绝热层33固定连接,所述第二圆形滑块34设置在第二绝热层33上。 [0029] a first holder 27 and the bottom plate 26 periphery fixing matches, and is fixedly connected by a bolt, nut, holder 27 and the top of the first slider 28 connected to the first round, the first insulating layer 29 is provided on the first circular slider 28, the bottom of the second holder 32 and the first insulating layer 29 is fixedly connected to the top of the second insulating layer 32 and the second holder 33 is fixedly connected to the the second circular slider 34 is disposed on the second insulating layer 33.

[0030] 所述激振器15固定设置在固定板26上,所述激振器15设置在支架底部,所述沉积台30位于支架上,所述激振器15输出杆14与沉积台30固定连接,用于产生高频振动能量传递给沉积台30,所述喷气系统设置在沉积台30上方,且所述喷气系统通过升降台A可相对所述支架上下移动,所述喷气系统的喷嘴相对于所述沉积台30,所述供气系统分别为真空反应室35以及喷气系统提供惰性气体和反应气体,所述排气系统与真空反应室35相通,用于为真空反应室35抽真空,所述激振器15、供气系统和排气系统均与电控装置电性连接,所述电控装置19还包括射频电源RF,所述喷气系统和沉积台30分别与射频电源RF 的正极和负极连接。 [0030] The exciter 15 is fixed on the fixed plate 26, the exciter 15 is provided at the bottom of the bracket, the deposition station 30 is in the cradle, the exciter 15 and the output rod 14 deposition station 30 fixedly connected, for generating high-frequency vibration energy to the deposition station 30, the jet system 30 is disposed above the deposition station, and the station a by the lift jet system may move up and down relative to the support, the jet nozzle system with respect to the deposition station 30, the air supply system, respectively, the reaction chamber 35 and the vacuum system provides a jet of inert gas and the reaction gas, the exhaust system in communication with the vacuum chamber 35, a vacuum chamber 35 evacuated the exciter 15, a gas supply system and exhaust system are connected electrically to the electrical control means, said electric control device 19 further comprises a radio frequency RF power source, the jet system and the deposition station 30 are radio frequency RF power source connecting positive and negative electrodes.

[0031] 所述供气系统包括气体发生装置1、第一进气管5、惰性气体阀2、第二进气管4和反应气体阀3,所述惰性气体阀2安装在第一进气管5中段,所述第一进气管5 -端与气体发生装置连通,第一进气管5另一端穿过所述上盖9与真空反应室35内连通,所述反应气体阀3安装在第二进气管4中段,所述第二进气管4 一端与气体发生装置连通,所述第二进气管4另一端与喷气系统连通,为喷气系统提供反应气体。 [0031] The supply system comprises a gas generating means, a first intake pipe 5, an inert gas valve 2, the second reaction gas inlet tube 4 and valve 3, the inert gas valve 2 is mounted in the middle of the first intake pipe 5 the first intake pipe 5 - end in communication with the gas generating means, the other end of the first intake pipe 5 through the top cover 9 communicates with the vacuum chamber 35, a reactant gas valve 3 is mounted on the second intake pipe 4 middle, the second communication means 4 one end of the intake pipe gas occurs, the second intake pipe 4 and the other end communicates with the jet system, to provide a reaction gas jet system.

[0032] 所述排气系统包括输出管21、排气阀20和抽气装置22,所述输出管21 -端与下盖17相连通,另一端与抽气装置22连通,所述排气阀20设置在输出管21上,所述输出管21穿过该下盖17并与柱形滤网24固定连接。 [0032] The exhaust system 21 includes an output tube, the exhaust valve 20 and exhaust means 22, the outlet tube 21 - the lower end cap 17 in communication, and the other end communicates with the suction means 22, the exhaust valve 20 is provided on the outlet tube 21, the outlet pipe 21 through which the cylindrical screen 17 and lower cover 24 is fixedly connected.

[0033] 所述喷气系统包括连接杆6、门型连接架10和喷气板31,所述喷气板31包括连接板202、中板204和喷射板206,所述连接杆6顶部穿过上盖9并与升降台A连接,所述连接杆6在升降台A的作用下可相对该上盖9上下移动,具体参考图2所示,所述升降台A包括下连接板105、上连接板102、滑块103、滑轨104、丝杆107、连接杆106和滚轮101,所述滑轨104为两根并列的滑轨104,所述上连接板102和下连接板105分别连接在两根并列的滑轨104的上下两端,所述下连接板105与上盖9的上表面固定连接,所述滑块103与两根并列的滑轨104滑动配合,所述滑块103上端与丝杆107连接,丝杆107上端穿出所述上连接板102中心孔,且所述丝杆107与上连接板102螺纹配合连接,所述滑块103下端与连接杆106连接,所述下连接杆106下端穿出所述下连接板105中心孔,所述上盖还开设有供连接杆106穿过的通孔,所 [0033] The jet system comprises a connecting rod 6, the door frame 10 and the connector plate 31 jet, the jet plate 31 includes a connecting plate 202, plate 204 and spray plate 206, the connecting rod through the top cover 6 9 a and connected to the lifting platform, the connecting rod 6 may be moved up and down relative to the cover 9 at station a lifting effect, particularly with reference to FIG. 2, the a lifting platform comprising a lower connection plate 105, the upper connecting plate 102, the slider 103, slide 104, screw 107, connecting rod 106 and the roller 101, the slide 104 is two parallel rails 104, 102 of the upper connecting plate 105 and the lower connecting plate are respectively connected to two root parallel upper and lower ends of the slide rail 104, the lower connecting plate 105 is fixedly connected to the upper surface of the upper cover 9, the slide rails 103 and 104 slide with two parallel, upper end 103 of the slider and connecting screw 107, the screw 107 on the upper end of piercing the web central bore 102, and the screw 107 is connected to the connecting plate 102 is screwed, the lower end of the slider 103 and the connecting rod 106 connected to a lower the lower end of the connecting rod 106 piercing the central aperture 105 of the lower link plate, said cover further defines a through-hole for the connecting rod 106 passes, the 述连接杆106下端与连接杆6固定连接,所述丝杆107顶部连接滚轮101的中心转轴,由滚轮101的转动带动丝杆107的转动,进而推动滑块103沿轨道104 滑动,而连接在滑块103下的连接杆106相应地上下运动,所述连接杆6底部与门型连接架10顶部焊接固定,所述门型连接架10两脚底部与所述连接板202顶部焊接固定,所述连接板202底面四周通过绝缘层203与中板204顶面四周连接,所述中板204底面四周通过绝缘层205与喷射板206顶面四周连接,所述连接板202和中板204之间的空间为上腔210、 所述中板204和喷射板206之间的空间为下腔208,所述连接板202上设有进气口201,该进气口201与第一进气管5连通,压力计8测量端与真空反应室35相通,所述中板204上均匀设有气流孔209,所述喷射板206上均匀设有气流喷射孔207,所述喷射板206与射频电源RF的正极连接。 Said connecting rod is fixedly connected to the lower end 1066 connecting rod, the screw top 107 is connected to the central rotational axis of the roller 101, rotation of the screw 107 by the rotation of the roller 101, driven in turn pushes the slider 103 slides along the track 104, are connected in 106 accordingly, the vertical movement of the connecting rod of the slider 103, the connecting rod 6 and the bottom frame 10 connected to the top gate type welded and fixed, the portal frame 10 is connected to the feet bottom top web 202 is welded and fixed, the said web 202 between the bottom surface 203 is connected to four weeks four weeks plate 204 through the top surface of the insulating layer, a bottom surface 204 of the middle plate connected by four weeks four weeks surface of the insulating layer 206 and the spray plate 205, the connecting plate 202 and the plate 204 the upper chamber space 210, the space between the plate 204 and the injector plate 206 for the lower chamber 208, the connecting plate 202 is provided with an intake port 201, 201 in communication with the first intake pipe of the intake port 5 , a pressure gauge 8 measures the reaction chamber 35 end in communication with the vacuum, provided with the uniform gas flow holes 204 in plate 209, the ejection plate is provided with a uniform air jet holes 207 206, the ejection plate 206 of a radio frequency RF power source connected to the positive. 上腔210对进气口201送来的反应气体预分布,预分布后气体经气流孔209进入下腔208,进一步对反应气体进行分布,反应气体经气流喷射孔207均匀喷向沉积台30,采用绝缘层使得接射频电源RF正电极的喷射板206与其它部位绝缘。 210 pairs of the reaction chamber gas inlet 201 fed pre-distribution, after pre-distribution of the gas stream through the hole 209 into the lower chamber 208, a further distribution of the reaction gases, the reaction gas stream through the injection holes 207 uniformly sprayed deposition station 30, using the insulating layer such that the positive electrode connected to RF power RF ejection plate 206 is insulated from other parts.

[0034] 本实施例中,所述沉积台30包括载物板303和U型热板305,所述U型热板305和载物板303均为圆形。 [0034] In this embodiment, the deposition station 30 includes a loading plate 303 and the U-shaped heat plate 305, the U-shaped heat plate 305 and the loading plate 303 are circular. 所述载物板303设置在U型热板305上,且载物板303和U型热板305均良好连接射频电源RF负极,该载物板303底面和U型热板305内表面围成一通气腔304,所述通气腔304内的U型热板305的底面均匀设有多个加热片307,所述通气腔304内的载物板303上均匀设有多个热传感器309,所述U型热板305的底面还开设有多个通气孔308,具体地是U型热板305的U型槽底贯穿开设有多个通气孔308,避免通气腔304受热体积变化影响载物板303形状,受热时通气腔304由通气孔308与真空反应室35进行气体交换。 The loading plate 303 is provided on the U-shaped heat plate 305, and the carrier 305 are well-connected RF RF source 303 and the negative electrode plate was U-shaped heat plate, the inner surface 305 of the loading plate 303 and the bottom surface of the U-shaped heat plate surrounded a venting chamber 304, the bottom surface 305 of the U-shaped heat plate within the venting chamber 304 is provided with a plurality of uniformly heating sheet 307, a plurality of thermal sensor 309 is provided uniformly on the loading plate 303 in the venting chamber 304, the a bottom surface of said U-shaped heat plate 305 further defines a plurality of vent holes 308, in particular a U-shaped heat plate through the U-shaped bottom 305 defines a plurality of vent holes 308, 304 to avoid the heat influence breather chamber volume changes loading plate shape 303, breather chamber 304 when heated by a gas exchange vent hole 308 to the vacuum chamber 35. 所述载物板303上还设有收集片301,所述U型热板305外底面中部连接有一根支撑杆306,所述支撑杆306与所述激振器15输出杆14固定连接,第一圆形滑块28、第二圆形滑块34分别保证支撑杆306、连接架10在运动过程中的直线性,以保证沉积台30和喷气板31位置上下对应。 The carrier sheet 301 is also provided on the object collecting plate 303, the U-shaped heat plate 305 is connected to a bottom surface of the outer middle support bar 306, the support bar 306 is connected to the exciter 14 is fixed to the output rod 15, the first a circular slider 28, second slider 34 are rounded to ensure that the support bar 306, a straight line connecting frame 10 during movement to ensure that the deposition position of the table 31 corresponding to the vertical plate 30 and the jet.

[0035] 将加热片307设置在通气腔304内的U型热板305的U型槽底的内表面,使得加热片307的受热变形不影响载物板303的形状,热传感器309贴附于载物板303下表面实时测量载物板303温度并将参数传送给电控装置19,收集片301置于载物板303上表面, 所述收集片301四周通过L型压紧块302紧压在载物板303上,在压紧块302压紧力下紧贴载物板303,防止在沉积台30振动过程中收集片301位置变动。 [0035] The inner surface of the heated sheet 307 is provided in the venting chamber 304 of U-shaped heat plate 305 of the U-shaped bottom, so that the heating sheet 307 of heat deformation does not affect the shape of the loading plate 303, the thermal sensor 309 is attached to the lower surface of the loading plate 303 is measured in real time the temperature of the loading plate 303 and a parameter to the electronic control device 19 for collecting sheet 301 is placed on the surface of the loading plate 303, the collection plate 301 by four weeks L-shaped block 302 is pressed against the pressing on the loading plate 303, at block 302 a pressing force pressing against the loading plate 303, 301 to prevent the collection sheet 30 during the deposition position fluctuation vibration Taichung. 所述电控装置19包括一壳体,以及设置在壳体上的显示器和操控面板,射频电源RF和控制电路均设置在壳体内部,所述显示器、操控面板、热传感器309、加热片307、抽气装置22、激振器15均与该控制电路电性连接。 The electric control device 19 includes a housing, and a display disposed on the housing and the control panel, a radio frequency RF power source and the control circuit are disposed within the housing, a display, a control panel, a thermal sensor 309, heating plate 307 suction means 22, the exciter 15 is connected electrically to the control circuit. 激振器15产生高频振动能量通过输出杆14及支撑杆306传递给沉积台30。 Exciter 15 generates a high frequency vibration energy through the output rod 14 and the support bar 306 is transmitted to the deposition station 30. 激振器15产生的高频振动经输出杆14、支撑杆306传给紧贴于载物板303的收集片301,使得收集片301收集薄膜时产生高频振动,将振动能量传给沉积薄膜;射频电源RF正极连接喷射板206,负极连接载物板303,工作时喷射板206、载物台303之间形成射频电场;射频电场使得喷射板206气流喷射孔207喷出的反应气体发生辉光放电,在辉光放电区域产生大量电子,经一系列化学反应在高频振动的收集片301表面沉积薄膜;旋动升降台A的滚轮101,与连接板102螺纹配合的丝杠107转动带动滑块103沿滑轨104移动,使得与滑块103 相固定连接的连接杆6、连接架10、喷气系统上下移动,对喷气系统、沉积台30之间距离调节;第二绝热层33、第一绝热层29对加热片307产生的热进行绝缘,防止过热影响上盖9、 下盖17与腔壁11连接的密封性,及对激振器15工作性能产生影响,柱形滤网24置于输 Dithering by the exciter 15 generates the output rod 14, the support bar 306 to pass close to the collection plate 301 of the loading plate 303, so that the high-frequency vibration generated when the collection plate 301 and collected on the vibration energy to the deposited film ; RF power source connected to the positive RF injection plate 206, a negative electrode was connected to the carrier plate 303, the ejection plate 206 during operation, radio frequency electric field is formed between the loading station 303; 206 radio frequency electric field such that the gas flow ejected ejection orifice plate 207 of the gas generating reaction hui glow discharge, a large amount of electrons in the glow discharge region through a series of chemical reactions in the sheet collecting film 301 deposited on the surface of the high frequency vibration; a lifting platform rotating rollers 101, 102 engaged with the threaded lead screw 107 rotatably driven web the slider 103 moves along the slide rail 104, and fixed to the slider 103 such that the connecting rod 6 connected to the connection frame 10, moving up and down jet system, the system of the jet, adjust the distance between the deposition station 30; a second insulating layer 33, a first a heat insulating layer 29 is heated to heat generated by an insulating sheet 307, the upper cover 9 to prevent overheating impact, sealing the chamber wall 17 and the lower cover 11 is connected, and the performance impact on the exciter 15, the cylindrical filter 24 is set to lose 管21端口以对排出的残余气体内固体颗粒过滤;调节加热片307加热功率改变收集片301 收集温度,热传感器309测量载物板303温度参数并通过电控装置19的显示器显示。 Tube 21 of the port to filter the residual solid particles discharged gas; adjusting the heating plate 307 to change the heating power collecting sheet 301 to collect temperature, the thermal sensor 309 measuring the temperature of the loading plate 303 and the parameters displayed by the display 19 of the electronic control device.

[0036] 为了更好地对本发明进行后期拓展,本实施例还设有第一预留管路7、第二预留管路23,其上均设有阀门。 [0036] For a better post-expansion of the present invention, the present embodiment is also provided with a first reserve line 7, the second reserve line 23, which are provided with a valve.

[0037] 本发明的工作原理为:作时,先对真空腔35抽真空,关闭混合气体阀3、第一预留管路7、第二预留管路23阀门,打开惰性气体阀2、排气阀20、排气系统22,对真空腔35内的残余气体排放同时对真空腔35用惰性气体填充10分钟,关闭惰性气体阀2,真空腔35真空度通过压力计8观察,待达到要求真空值时,激振器15激振、加热片307加热,待激振器15达到所需的激振频率、收集片301达到反应所需温度,打开混合气体阀3对真空腔35充反应气体,反应气体经喷气系统31进气口201、上腔210、气流孔a 209、下腔208、气流孔b 207均匀喷出,打开射频电源RF并旋转滚轮101调节喷射板206位置,均匀喷出的反应气体在射频电场作用下辉光放电产生大量电子,经一系列化学反应在高温、振动的收集片301 表面沉积出薄膜,透过石英窗13、观察口12对真空腔35内反应情况观察,调节射频电 [0037] The working principle of the present invention is: when making, the first vacuum chamber 35 is evacuated, a mixed gas close valve 3, a first reserve line 7, second line 23 reserved for the valve, the inert gas valve 2 is opened, an exhaust valve 20, exhaust system 22, the residual gases in the vacuum chamber 35 while the vacuum chamber 35 is filled with an inert gas for 10 minutes, the inert gas valve 2 is closed, the vacuum degree of the vacuum chamber 35 through the observation of a pressure gauge 8, to be achieved when vacuum is required, excitation exciter 15, the heating plate 307 is heated, the exciter 15 to be the desired frequency of excitation, collection plate 301 reaches the desired reaction temperature, open the vacuum valve 3 mixed gas filling the reaction chamber 35 gas, the reaction gas plate 101 by adjusting the position of the injection jet 206 31 air intake system 201, the chamber 210, a 209, lower chamber 208, the gas flow hole b 207 uniformly discharge air flow hole, RF and RF power is opened rotating roller, uniform spray reaction gas out of the radio frequency electric field in a glow discharge a large amount of electrons through a series of chemical reactions at the hot surfaces 301, collect pieces of vibration of the thin film is deposited through the quartz window 13, viewing port 35 within the vacuum chamber 12 pairs reactions observation adjusted rf 源RF 功率大小、喷射板206位置、加热片307加热功率、激振器15激振频率等参数使收集片301 上沉积出质量更佳的薄膜,沉积完成后,关闭激振器15电源、关闭射频电源RF、关闭混合气体阀3、打开惰性气体阀2,真空腔35内残余反应气体经柱形滤网24后固体颗粒被残留在柱形滤网24、气体被排出,直到真空腔内压力达到与外界气压一致时,关闭排气系统22,待加热片307冷却至室温,打开上盖取出收集片301,在收集片301表面获得沉积薄膜。 RF source power level, the position of the ejection plate 206, the heating power of the heating sheet 307, the exciter 15 on exciting frequency and other parameters that the collecting sheet 301 deposited better quality film after deposition is complete, the exciter 15 power off, off RF power RF, a mixed gas close valve 3, the inert gas valve 2 is opened, the residual gas in the vacuum reaction chamber 35 through the cylindrical filter 24 are solid particles remaining in the cylindrical filter 24, the gas is discharged until the pressure in the vacuum chamber consistent with the ambient air pressure is reached, closing the exhaust system 22, the heater chip 307 to be cooled to room temperature, remove the cover open collection sheet 301, 301 in the surface of the deposited film obtained collection sheet.

[0038] 尽管结合优选实施方案具体展示和介绍了本发明,但所属领域的技术人员应该明白,在不脱离所附权利要求书所限定的本发明的精神和范围内,在形式上和细节上可以对本发明做出各种变化,均为本发明的保护范围。 [0038] While the preferred embodiment in conjunction with the specific embodiment shown and described the present invention, those skilled in the art will appreciate that within the spirit and scope of the invention without departing from the appended claims as defined by the form and details various changes may be made to the present invention, the scope of the present invention are.

Claims (10)

1. 一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:包括供气系统、排气系统、真空反应室、支架、喷气系统、激振器、沉积台和电控装置,所述支架固定设置在真空反应室内,所述激振器设置在支架底部,所述沉积台位于支架上,所述激振器输出杆与沉积台固定连接,用于产生高频振动能量传递给沉积台,所述喷气系统设置在沉积台上方,且所述喷气系统通过升降台可相对所述支架上下移动,所述喷气系统的喷嘴相对于所述沉积台,所述供气系统分别为真空反应室以及喷气系统提供惰性气体和反应气体,所述排气系统与真空反应室相通,用于为真空反应室抽真空,所述激振器、供气系统和排气系统均与电控装置电性连接,所述电控装置还包括射频电源RF,所述喷气系统和沉积台分别与射频电源RF的正极和负极连接。 A miniature high-frequency vibration is coupled plasma-enhanced chemical vapor deposition apparatus comprising: a gas supply system, exhaust system, the vacuum reaction chamber, a stent, jet system, the exciter, deposition station and electronic control means, the bracket is provided in a vacuum reaction chamber, said exciter disposed at the bottom of the holder, the holder of the deposition station is located, the exciter output rod is fixedly connected with a deposition station, for generating a high-frequency vibration energy transmitted to the deposition station, depositing a jet system arranged in the platform side, and the jet system by the lifting table can be moved up and down relative to the support, the jet nozzle system with respect to the deposition station, said vacuum supply system, respectively a reaction chamber and a jet system providing an inert and reactive gases, the exhaust system in communication with the vacuum chamber for vacuum evacuating the reaction chamber, said exciter gas supply system and exhaust system are the electric control device electrically connected to said electronic control device further comprises a radio frequency RF power source, and the jet deposition station system are connected to the positive and negative electrodes of a radio frequency RF power source.
2. 根据权利要求1所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:所述真空反应室由腔壁、上盖和下盖密封形成,所述腔壁为圆筒形腔壁,所述上盖和下盖分别罩设在圆筒形腔壁的上端和下端,且上盖和下盖均与圆筒形腔壁密封连接, 所述圆筒形腔壁的外壁上开设有石英窗,透过该石英窗可以观测到腔壁内部。 2. A coupling according to one of the high-frequency vibration to claim 1 micro plasma enhanced chemical vapor deposition apparatus, wherein: said vacuum chamber is formed by the reaction chamber walls, upper and lower covers sealed to the chamber wall cylindrical chamber wall, the upper and lower covers are disposed at the upper and lower covers of the cylindrical cavity wall, and upper and lower covers are sealingly connected to the cylindrical chamber wall, the cylindrical chamber wall the outer wall defines a quartz window, through the quartz window into the inner cavity walls can be observed.
3. 根据权利要求1所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:所述供气系统包括气体发生装置、第一进气管、惰性气体阀、第二进气管和反应气体阀,所述惰性气体阀安装在第一进气管中段,所述第一进气管一端与气体发生装置连通,第一进气管另一端穿过所述上盖与真空反应室内连通,所述反应气体阀安装在第二进气管中段,所述第二进气管一端与气体发生装置连通,所述第二进气管另一端与喷气系统连通,为喷气系统提供反应气体。 3. A coupling according to one of claim 1 dither claim micro plasma enhanced chemical vapor deposition apparatus, wherein: said second gas feeding system comprises a gas generating means, a first intake pipe, an inert gas valve, valve tube and the reaction gas, the inert gas valve is installed in the middle of the first intake pipe, the first intake duct communicating at one end with the gas generating means, the other end of the first intake pipe through the vacuum reaction chamber in communication with the upper lid, the second reaction gas inlet valve installed in the middle of the pipe, said second intake pipe communicating with an end of the gas generating other end of the second intake pipe system communicates with the jet, the jet is a reactive gas system.
4. 根据权利要求3所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:所述喷气系统包括连接杆、□型连接架和喷气板,所述喷气板包括连接板、中板和喷射板,所述连接杆顶部穿过上盖并可相对该上盖上下移动,所述连接杆底部与门型连接架顶部焊接固定,所述□型连接架两脚底部与所述连接板顶部焊接固定,所述连接板底面四周通过绝缘层与中板顶面四周连接,所述中板底面四周通过绝缘层与喷射板顶面四周连接,所述连接板和中板之间的空间为上腔、所述中板和喷射板之间的空间为下腔,所述连接板上设有进气口,该进气口与第一进气管连通,所述中板上均匀设有气流孔,所述喷射板上均匀设有气流喷射孔,所述喷射板与射频电源RF的正极连接。 4. A coupling according to one of the three dither micro plasma enhanced chemical vapor deposition apparatus as claimed in claim wherein: said jet system comprising a connecting rod, and □ jet type connector frame plate, said connector comprising a jet plate plate, intermediate plate and spray plate, the connecting rod through the top cover and the cover moved up and down relative to the connecting rod and the top of the bottom gate type connector bracket fixed by welding, the bottom of said legs and frame connector □ the top web is welded and fixed, the bottom surface of the connecting plate connected by four weeks four weeks top surface of the insulating layer and the intermediate plate, a bottom surface of a perimeter of said plates are connected by four weeks in the top surface of the insulating layer and the injection plate, the plate and the connecting plate the space between the upper chamber to the space between the plate and the plate for the next injection chamber, the air inlet is provided on the connecting plate, the intake port communicates with the first intake pipe, the uniformity of the plate gas flow hole is provided, the injection gas flow is provided evenly on the injection hole, the injection of the positive electrode plate connected to a radio frequency power source RF.
5. 根据权利要求4所述的一种耦合高频振动的微型等离子增强化学气相沉积装置, 其特征在于:所述升降台包括下连接板、上连接板、滑块、滑轨、丝杆、第二连接杆和滚轮,所述滑轨为两根并列的滑轨,所述上连接板和下连接板分别连接在两根并列的滑轨的上下两端,所述下连接板与上盖的上表面固定连接,所述滑块与两根并列的滑轨滑动配合,所述滑块上端与丝杆连接,丝杆上端穿出所述上连接板中心孔,且所述丝杆与上连接板螺纹配合连接,所述滑块下端与连接杆连接,所述下连接杆下端穿出所述下连接板中心孔,所述上盖还开设有供第二连接杆穿过的通孔,所述第二连接杆下端与连接杆固定连接,所述丝杆顶部连接滚轮的中心转轴,由滚轮的转动带动丝杆的转动,进而推动滑块沿轨道滑动,而连接在滑块下的连接杆相应地上下运动。 5. A coupling according to one of claims 4 dither micro plasma enhanced chemical vapor deposition apparatus, wherein: said lifting platform comprises a lower connection plate, connecting plate, slide, rails, screw, second connecting rod and the roller, said two parallel rails for the slide, said upper and lower connecting plates connecting the upper and lower ends of the rails two parallel, respectively, the lower and the upper cover web fixedly connected to the upper surface of the slider and with two parallel slide rails, said upper slider and screw connection, the screw piercing an upper end of the upper connecting plate central aperture and on the screw and mating threaded connection plate connected to a lower end of the connecting rod connecting slider, the lower connection web of the central hole piercing the lower end of the rod, the upper cover is also provided with a through hole for passing a second connecting rod, said second connecting rod is fixedly connected to the lower end of the connecting rod, connected to the top of the screw shaft center roller, driven by the rotation of the roller screw is rotated, thus pushing the slider slides along the track, the slider is connected at connection accordingly, the rod up and down.
6. 根据权利要求1所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:所述沉积台包括载物板和U型热板,所述载物板设置在U型热板上,该载物板底面和U型热板内表面围成一通气腔,所述通气腔内的U型热板的底面均匀设有多个加热片, 所述通气腔内的载物板上均匀设有多个热传感器,所述U型热板的底面还开设有多个通气孔,所述载物板上还设有收集片,所述U型热板外底面中部连接有一根支撑杆,所述支撑杆与所述激振器输出杆固定连接,激振器产生高频振动能量通过输出杆及支撑杆传递给沉积台。 6. A coupling according to one of claim 1 dither claim micro plasma enhanced chemical vapor deposition apparatus, wherein: said deposition station comprises a loading plate and a U-shaped heat plate, the loading plate disposed U type hot plate, the bottom surface of the loading plate and the U-shaped heat plate surface enclose a venting chamber, the bottom surface of the U-shaped breather chamber is provided with a plurality of uniformly hot plate heater chip, said vent cavity carrier was evenly on a plurality of thermal sensors, a bottom surface of the U-shaped heat plate further defines a plurality of vent holes, the carrier plate was further provided with collection sheet, an outer bottom surface of the middle of the hot plate is connected with a U-shaped support rods, said support bar and said exciter output rod is fixedly connected to the exciter to generate a high frequency vibration energy transmitted through the deposition station and the output rod support rods.
7. 根据权利要求1所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:所述支架包括底座、固定板、第一固定架、第一圆形滑块、第一绝热层、第二固定架、第二圆形滑块和第二绝热层,所述底座设置在下盖上,所述固定板设置在底座上,所述激振器固定设置在固定板上,所述第一固定架底部与固定板固定连接,所述第一固定架顶部与第一圆形滑块连接,所述第一绝热层与设置在第一圆形滑块上,所述第二固定架底部与第一绝热层固定连接,所述第二固定架顶部与第二绝热层固定连接,所述第二圆形滑块设置在第二绝热层上。 7. A coupling according to one of claim 1 dither claim micro plasma enhanced chemical vapor deposition apparatus, wherein: said holder includes a base, a fixed plate, a first holder, a first circular slider, first a heat insulating layer, a second holder, the second slider and a second circular heat insulating layer, said base disposed on the lower cover, the fixing plate is provided on the base, fixed to the exciter disposed on the fixing plate, bottom of the first bracket and the fixing plate is fixedly connected to the first holder and the first circular top slider is connected, said first insulating layer provided on the first circular slider, the second bottom bracket fixedly connected with the first insulating layer, the second top mounting bracket fixedly connected with the second insulating layer, the second circular slider disposed on the second insulating layer.
8. 根据权利要求7所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:固定板和底座之间还通过两个减震器连接,起到减震效果。 8. The coupling according to claim 7 requires a dither micro plasma enhanced chemical vapor deposition apparatus, wherein: between the fixing plate and the base is connected through two dampers, shock absorption effect.
9. 根据权利要求7所述的一种耦合高频振动的微型等离子增强化学气相沉积装置,其特征在于:所述底座中轴上嵌入一柱形滤网。 9. A coupling according to claim 7 requires a dither micro plasma enhanced chemical vapor deposition apparatus, wherein: said base is embedded in the shaft a cylindrical screen.
10. 根据权利要求9所述的一种耦合高频振动的微型等离子增强化学气相沉积装置, 其特征在于:所述排气系统包括输出管、排气阀和抽气装置,所述输出管一端与下盖相连通,另一端与抽气装置连通,所述排气阀设置在输出管上,所述输出管穿过该下盖并与柱形滤网固定连接。 9 A coupling according dither micro plasma according to claim enhanced chemical vapor deposition apparatus, wherein: the exhaust system includes an output tube, the exhaust valve and exhaust means, the output end of tube communicating with the lower lid, and the other end communicates with the suction means, the exhaust valve is provided on the outlet tube, the outlet tube passing through the lower cover and is fixedly connected to the cylindrical screen.
CN 201410449665 2014-09-05 2014-09-05 High-frequency vibration coupled micro plasma-enhanced chemical vapor deposition device CN104195528A (en)

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