CN104176871B - A kind of recycling processing method for acidic etching waste liquid - Google Patents

A kind of recycling processing method for acidic etching waste liquid Download PDF

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CN104176871B
CN104176871B CN201410449353.XA CN201410449353A CN104176871B CN 104176871 B CN104176871 B CN 104176871B CN 201410449353 A CN201410449353 A CN 201410449353A CN 104176871 B CN104176871 B CN 104176871B
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copper ion
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CN104176871A (en
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林晓
刘晨明
李志强
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Beijing Saike Kanglun Environmental Science & Technology Co Ltd
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Abstract

The invention discloses a kind of recycling processing method for acidic etching waste liquid, described waste liquid is after heat treated, utilize hydrophobic membrane assembly to remove hydrogen chloride gas and obtain pure hydrochloric acid solution and the salting liquid containing heavy metal copper ion, described copper ion salting liquid separates the dense water and the sodium chloride solution that obtain containing heavy metal copper ion by nanofiltration system, the dense water of described heavy metal copper ion is for evaporative crystallization, and described sodium chloride solution is by Bipolar Membrane system recoveries bronsted lowry acids and bases bronsted lowry; The present invention fully utilize membrane separation technique realized the full constituent to acidic etching waste liquid resource reclaim, the method technique is simple, easy to operate, and whole processing procedure does not need to add any chemical reagent, and seeing through liquid can recycle, non-secondary pollution produces, the CuCl obtaining2Crystal and Nacl crystal purity are higher, have good market value, and application prospect is inestimable.

Description

A kind of recycling processing method for acidic etching waste liquid
Technical field:
The present invention relates to the waste water advanced process field of chemical industry, particularly a kind of recycling processing method for acidic etching waste liquid.
Background technology:
In industrial production, particularly in the production process of pcb board, acid etching is a kind of common etching mode, in etching process, when copper ion concentration in acidic etching liquid and cuprous ion concentration are increased to certain value, etching solution just can not stablize, etching Copper Foil fast, etching solution now becomes etching waste liquor, due to acidic etching waste liquid contain a large amount of heavy metal coppers with and compared with highly acid, directly discharge, not only can bring considerable damage to surrounding environment, and relate to the serious waste of resource, concern the dual problem of environment and factory's benefit.
The conventional treatment method of acidic etching waste liquid mainly comprises chemical regeneration method and electrolytic regeneration method, and chemical regeneration method is used such as hydrogen peroxide, sodium chloride etc. waste liquid is oxidized or neutralisation treatment. Compared with chemical regeneration method, electrolytic regeneration method is comparatively conventional. As: Chinese invention patent CN201110184362.7 discloses a kind of regeneration of printed-board acid etching waste liquid and the method that copper reclaims, by a kind of mode of real-time electrolysis, by regeneration etching waste liquor direct reuse in etching, the method is all had relatively high expectations to oxidation-reduction potential, electric current, once electrolytic process goes wrong, be easy to cause that etching solution pollutes, affect etching efficiency.
Chinese invention patent CN200910110744.8 discloses a kind of processing method of acidic etching waste liquid of printed circuit board (PCB), it is first adjusted to PH after more than 7.5 ammonia etching solution systems by adding ammonia regulator solution in oxytropism etching waste liquor, carry out again copper extraction, in the method, hydrogen chloride organic efficiency is not high, and very easily cause secondary pollution, meanwhile copper extraction need to be after extracting-back extraction be got the generation copper-bath that combines, carry out again the recovery that electrolysis just can complete copper, copper removal process is more complicated, electrode easily pollutes, and cost is higher.
Membrane separation technique is as a novel efficient separation, concentrated, purification and purification techniques, can operate at normal temperatures, not exist because it has phase-state change, energy-efficient, do not produce the advantages such as secondary pollution in process of production and be widely used in the fields such as control, chemical industry, electric power, food, metallurgy, oil, machinery; Meanwhile, membrane separation technique process has sizable selective, and applicable object is extensive, not only can be for separating of macroscopic molecule, and can be for separating of ion and gas etc., existing membrane separation technique has: ultrafiltration, nanofiltration, electrodialysis, counter-infiltration, Bipolar Membrane etc. Separate in application process and do not need to add any foreign substance at film, seeing through liquid can recycle, and reduces costs, and application is stronger. But, not yet find at present to utilize merely membrane separation technique to process the precedent of acidic etching waste liquid.
In sum, inventor sums up forefathers and researches and develops experience and fully utilize existing membrane separation technique, develop a kind of new recycling processing method for acidic etching waste liquid processing, this process method equipment is simple, easy to operate, see through liquid recycles, in wastewater treatment process, realize the recycling that can realize full constituent resource without any chemical reagent of introducing, non-secondary pollution produces, and energy-conserving and environment-protective, have good market prospects.
Summary of the invention:
In order to solve the problems of the technologies described above, the invention provides a kind of recycling processing method for acidic etching waste liquid, the method equipment is simple, easy to operate, do not need additional any chemical reagent can realize the recycling of resource in wastewater treatment process.
The present invention is by the following technical solutions:
A kind of recycling processing method for acidic etching waste liquid, described waste liquid is after heat treated, utilize hydrophobic membrane assembly to remove hydrogen chloride gas and obtain pure hydrochloric acid solution and the salting liquid containing heavy metal copper ion, described copper ion salting liquid separates the dense water and the sodium chloride solution that obtain containing heavy metal copper ion by nanofiltration system, the dense water of described heavy metal copper ion is for evaporative crystallization, and described sodium chloride solution is by Bipolar Membrane system recoveries bronsted lowry acids and bases bronsted lowry.
The dense water of described heavy metal copper ion is prepared CuCl by evaporative crystallization2Crystal, distilled water is by reuse pool reuse.
The sodium hydroxide solution that described sodium chloride solution obtains by Bipolar Membrane system and hydrochloric acid solution further hybrid reaction generate after NaCl solution, and evaporative crystallization is prepared NaCl crystal, and distilled water is by reuse pool reuse.
First described waste liquid is heated to after 45-60 DEG C, after cartridge filter filters, enters hydrophobic membrane assembly, and the absorption liquid of described hydrophobic membrane assembly is deionized water.
The etching solution lateral pressure of described hydrophobic membrane assembly is greater than the pressure of absorption liquid side, and pressure differential is preferably 0.02-0.1MPa
Preferably, described hydrophobic membrane assembly adopts polypropylene hollow fiber membrane;
Preferably, described film progression is 5-8 level.
The water outlet of described hydrophobic membrane assembly enters nanofiltration treatment system, obtains dense water and the sodium chloride solution containing heavy metal copper ion through nanofiltration system isolated by filtration.
Preferably, described nanofiltration system preferably adopts DK or the DL series membranes element of GE company;
Preferably, the operating pressure of described nanofiltration system is 0.5-0.8MPa;
Preferably, operating pressure is 0.6MPa.
The salt chamber of the described Bipolar Membrane system pure solution of sodium chloride obtaining for described nanofiltration system processing of intaking, the initial soln of He Jian chamber, sour chamber is deionized water, obtains sodium hydroxide solution and hydrochloric acid solution for reclaiming.
It is sulfuric acid solution that the anode of described Bipolar Membrane system draws liquid, and it is metabisulfite solution that negative electrode draws liquid;
Preferably, described sulfuric acid solution and metabisulfite solution are 0.05-0.1mol/L;
Preferably, adopt the membrane stack that module number is 5, membrane stack voltage is 12.5-15V;
Preferably, anode and cathode voltage is 4-5V.
A kind of acidic etching waste liquid, described waste liquid CuCl2Content is 160g/L, and NaCl content is 100g/L, and Hcl content is 10g/L, solution PH=0.52.
Compared with prior art, the present invention has following beneficial effect:
1, the invention discloses a kind of new recycling processing method for acidic etching waste liquid processing;
2, the present invention makes full use of the overall advantage of membrane separation technique, has only been realized the resource of acidic etching waste liquid full constituent is reclaimed by membrane separating method;
3, technique of the present invention is simple, easy to operate, and whole processing procedure does not need to add any chemical reagent, and seeing through liquid can recycle, and hydrogen chloride extrusion rate is higher, and non-secondary pollution produces;
4, utilize technique of the present invention to carry out resource recovery to acidic etching waste liquid, the pure water reuse of acquisition, the CuCl obtaining2Crystal and Nacl crystal purity are higher, have good market value, and application prospect is inestimable.
Brief description of the drawings
Fig. 1 is the recycling processing method process chart of acidic etching waste liquid of the present invention.
Detailed description of the invention
Further illustrate technical scheme of the present invention below in conjunction with drawings and Examples:
As shown in Figure 1, a kind of recycling processing method for acidic etching waste liquid, described waste liquid is after heat treated, utilize hydrophobic membrane assembly to remove hydrogen chloride gas and obtain pure hydrochloric acid solution and the salting liquid containing heavy metal copper ion, described hydrochloric acid solution is for reclaiming, described copper ion salting liquid separates the dense water and the sodium chloride solution that obtain containing heavy metal copper ion by nanofiltration system, the dense water of described heavy metal copper ion is for evaporative crystallization, and described sodium chloride solution is by Bipolar Membrane system recoveries bronsted lowry acids and bases bronsted lowry. The dense water of described heavy metal copper ion is prepared CuCl by evaporative crystallization2Crystal, distilled water is by reuse pool reuse, thereby made the recovery of full constituent real.
The sodium hydroxide solution that described sodium chloride solution obtains by Bipolar Membrane system and hydrochloric acid solution directly reclaim as product, can also reclaim by the form of Nacl, sodium hydroxide solution and hydrochloric acid solution are first carried out to hybrid reaction generation NaCl solution, again further through evaporation and crystallization system Evaporation preparation NaCl crystal, distilled water by reuse pool reuse, is realized the recovery of full constituent equally.
Hydrophobic membrane assembly is in the process that removes hydrogen chloride gas, taking deionized water as absorption liquid, etching solution lateral pressure is greater than the pressure of absorption liquid side, pressure differential is preferably 0.02-0.1MPa, preferably, described hydrophobic membrane assembly adopts polypropylene hollow fiber membrane, and preferably, described film progression is 5-8 level. The water outlet of hydrophobic membrane assembly enters nanofiltration treatment system, obtains dense water and the sodium chloride solution containing heavy metal copper ion through nanofiltration system isolated by filtration, and preferably, described nanofiltration system preferably adopts DK or the DL series membranes element of GE company; Preferably, the operating pressure of described nanofiltration system is 0.5-0.8MPa, and preferably, operating pressure is 0.6MPa.
The salt chamber of the Bipolar Membrane system pure solution of sodium chloride obtaining for described nanofiltration system processing of intaking, the initial soln of He Jian chamber, sour chamber is deionized water, obtains sodium hydroxide solution and hydrochloric acid solution for reclaiming. The anode of described Bipolar Membrane system draws liquid and is made as sulfuric acid solution, negative electrode draws liquid and is made as metabisulfite solution, preferably, described sulfuric acid solution and metabisulfite solution concentration are 0.05-0.1mol/L, preferably, adopt the membrane stack that module number is 5, membrane stack voltage is 12.5-15V, preferably, anodic-cathodic voltage is 4-5V.
A kind of acidic etching waste liquid, this waste liquid CuCl2Content is 160g/L, and NaCl content is 100g/L, and Hcl content is 10g/L, solution PH=0.52.
Embodiment 1
A kind of acidic etching waste liquid, wherein CuCl2Content is 160g/L, and NaCl content is 100g/L, and HCl content is 10g/L, pH value of solution=0.52, and inflow is 5m3/h。
First acidic etching waste liquid is heated to 45 DEG C, then after filtering by cartridge filter, enter from hollow fiber hydrophobic membrane assembly bottom, film opposite side passes into deionized water, is absorbed by deionized water by the hydrogen chloride gas of hydrophobic membrane, obtains dilute hydrochloric acid solution and flows into hydrochloric acid medial launder. In this process, the hydrogen chloride removal efficiency of single stage membrane is 60%, and film progression is 5 grades, and every grade is 10 films, and in water outlet, content of hydrochloric acid is 150mg/L, and hydrogen chloride gas removal efficiency reaches 97%, obtains 0.1% dilute hydrochloric acid solution. In addition, the pressure of etching solution side is greater than the pressure of absorption liquid side, and both pressure differentials are made as 0.02MPa.
The salting liquid of hydrophobic membrane assembly water outlet copper ions enters nanofiltration treatment system, and nanofiltration treatment system operating pressure is made as 0.5MPa, Cu in this process2+Rejection reach more than 99.5%, the removal efficiency of NaCl reaches 95%, obtains 50%CuCl2Solution, further evaporative crystallization reclaims CuCl2Crystal, 15% the NaCl solution obtaining enters Bipolar Membrane system recoveries sodium hydroxide solution and hydrochloric acid solution, Bipolar Membrane system adopts the membrane stack that film group number is 5, membrane stack voltage is 12.5V, anodic-cathodic voltage is respectively 4V, and total voltage is 20.5V, and anode draws the sulfuric acid solution that liquid is 0.05mol/L, it is the metabisulfite solution of 0.05mol/L too that negative electrode draws liquid, and the initial soln of He Suan chamber, alkali chamber is deionized water. Finally obtain 15% sodium hydroxide solution and 8% hydrochloric acid solution.
Embodiment 2
A kind of acidic etching waste liquid, wherein CuCl2Content is 160g/L, and NaCl content is 100g/L, and hydrochloric acid HCl content is 10g/L, pH value of solution=0.52, and inflow is 5m3/h。
First acidic etching waste liquid is heated to 46 DEG C, is then filtered from hollow fiber hydrophobic membrane assembly bottom and entered by cartridge filter, film opposite side passes into deionized water and absorbs by the hydrogen chloride gas of hydrophobic membrane, obtains dilute hydrochloric acid solution and flows into hydrochloric acid medial launder. The selected single stage membrane removal efficiency of hydrophobic membrane assembly is 60%, film progression is made as 6 grades, every grade is similarly 10 films, etching solution lateral pressure is greater than absorption liquid lateral pressure, pressure differential is made as 0.04MPa, water outlet hydrogen chloride content is 180mg/L, obtains 0.3% dilute hydrochloric acid solution simultaneously, and hydrogen chloride removal efficiency reaches 98%.
The water outlet of hydrophobic membrane assembly enters nanofiltration treatment system containing the salting liquid of heavy metal copper ion, and nanofiltration treatment system operating pressure is made as 0.6MPa, this process Cu2+Rejection reach more than 99.5%, the removal efficiency of NaCl is 96%, obtains 52%CuCl2The further evaporative crystallization of solution reclaims CuCl2Crystal. Obtain 18%NaCl solution simultaneously and enter Bipolar Membrane system, Bipolar Membrane system adopts the membrane stack that film group number is 5, membrane stack voltage is 13.5V, anode and cathode voltage is respectively 4.5V, total voltage is 22.5V, anode draws the sulfuric acid solution that liquid is 0.08mol/L, and negative electrode draws the metabisulfite solution that liquid is 0.08mol/L, and the initial soln of He Suan chamber, alkali chamber is deionized water. Finally can obtain 18% sodium hydroxide solution and 10% hydrochloric acid solution.
Embodiment 3
A kind of acidic etching waste liquid, wherein CuCl2Content is 160g/L, and NaCl content is 100g/L, and hydrochloric acid HCl content is 10g/L, pH value of solution=0.52, and inflow is 5m3/h。
First acidic etching waste liquid is heated to 48 DEG C, is then filtered from hollow fiber hydrophobic membrane assembly bottom and entered by cartridge filter, film opposite side passes into deionized water and absorbs by the hydrogen chloride gas of hydrophobic membrane, obtains dilute hydrochloric acid solution and flows into hydrochloric acid medial launder. The hydrogen chloride removal efficiency of hydrophobic membrane assembly single stage membrane used is 60%, and film progression is 7 grades, and every grade is similarly 10 films, and etching waste liquid lateral pressure is greater than absorption liquid lateral pressure, and both are made as 0.06MPa at pressure differential. Water outlet HCl content is 210mg/L, can obtain 0.5% dilute hydrochloric acid solution simultaneously, and HCl removal efficiency reaches 98%.
The water outlet of hydrophobic membrane assembly enters nanofiltration treatment system containing the salting liquid of heavy metal copper ion, and nanofiltration treatment system operating pressure is made as 0.7MPa, Cu2+Rejection reach more than 99.5%, the removal efficiency of NaCl is 97%, obtains 55%CuCl2The further evaporative crystallization of solution reclaims CuCl2Crystal. Obtain 19%NaCl solution simultaneously and enter Bipolar Membrane system, this Bipolar Membrane system adopts the membrane stack that film group number is 5, membrane stack voltage is 14V, anode and cathode voltage is respectively 4.5V, total voltage is 23V, anode draws the sulfuric acid solution that liquid is 0.09mol/L, and negative electrode draws the metabisulfite solution that liquid is 0.09mol/L, and the initial soln of He Suan chamber, alkali chamber is deionized water. Finally can obtain 20% sodium hydroxide solution and 11% hydrochloric acid solution.
Embodiment 4
A kind of acidic etching waste liquid, wherein CuCl2Content is 160g/L, and NaCl content is 100g/L, and hydrochloric acid HCl content is 10g/L, pH value of solution=0.52, and inflow is 5m3/h。
First acidic etching waste liquid is heated to 60 DEG C, after then filtering by cartridge filter, enters from hollow fiber hydrophobic membrane assembly bottom, film opposite side passes into deionized water and absorbs by the HCl gas of hydrophobic membrane, obtains dilute hydrochloric acid solution and flows into hydrochloric acid medial launder. The hydrogen chloride removal efficiency of hydrophobic membrane assembly single stage membrane used is 60%, and film progression is 8 grades, and every grade is similarly 10 films, and etching waste liquid lateral pressure is greater than absorption liquid lateral pressure, and both are made as 0.1MPa at pressure differential. Water outlet hydrogen chloride content is 300mg/L, can obtain 1% dilute hydrochloric acid solution simultaneously, and hydrogen chloride removal efficiency reaches 98.5%.
The water outlet of hydrophobic membrane assembly enters nanofiltration treatment system containing the salting liquid of heavy metal copper ion, and nanofiltration treatment system operating pressure is made as 0.8MPa, Cu2+Rejection reach more than 99.5%, the removal efficiency of NaCl is 98%, obtains 60%CuCl2The further evaporative crystallization of solution reclaims CuCl2Crystal. Obtain 20%NaCl solution simultaneously and enter Bipolar Membrane system, this Bipolar Membrane system adopts the membrane stack that film group number is 5, membrane stack voltage is 14V, anode and cathode voltage is respectively 5V, total voltage is 24V, anode draws the sulfuric acid solution that liquid is 0.1mol/L, and negative electrode draws the metabisulfite solution that liquid is 0.1mol/L, and the initial soln of He Suan chamber, alkali chamber is deionized water. Finally can obtain 25% sodium hydroxide solution and 12% hydrochloric acid solution.
The comprehensive forefathers' research experience of the present invention, make full use of the comprehensive advantage of membrane separation technique, only can carry out the recovery of full constituent resource to acidic etching waste liquid by membrane separating method, the method technique is simple, easy and simple to handle, be a kind of resource engineering chemistry process according with the demands of the market, there are good market prospects.
Finally it should be noted that; above embodiment is only unrestricted in order to technical scheme of the present invention to be described; although the present invention is had been described in detail with reference to preferred embodiment; those of ordinary skill in the art is to be understood that; can modify or be equal to replacement technical scheme of the present invention; and not departing from the spirit and scope of technical solution of the present invention, it all should be encompassed in the middle of the protection domain of claim of the present invention.

Claims (6)

1. for a recycling processing method for acidic etching waste liquid, it is characterized in that described waste liquid CuCl2Content is 160g/L, NaCl contentFor 100g/L, HCl content is 10g/L, and pH is 0.52; First described waste liquid is heated to after 45-60 DEG C, after cartridge filter filters, entersHydrophobic membrane assembly, utilizes hydrophobic membrane assembly to remove hydrogen chloride gas and obtains pure hydrochloric acid solution and the salting liquid containing heavy metal copper ion; Described containing a huge sum of moneyThe salting liquid that belongs to copper ion separates the dense water and the sodium chloride solution that obtain containing heavy metal copper ion by nanofiltration system; Described containing heavy metal copper ionDense water is prepared CuCl by evaporative crystallization2Crystal, distilled water is by reuse pool reuse; Described sodium chloride solution is by the acid of Bipolar Membrane system recoveriesAnd alkali; The further hybrid reaction of the sodium hydroxide solution that described sodium chloride solution obtains by Bipolar Membrane system and hydrochloric acid solution generates NaCl solutionAfter, evaporative crystallization is prepared NaCl crystal, and distilled water is by reuse pool reuse; The absorption liquid of described hydrophobic membrane assembly is deionized water;
The etching waste liquor lateral pressure of described hydrophobic membrane assembly is greater than the pressure of absorption liquid side, and pressure differential is 0.02-0.1MPa; Described hydrophobic membrane progression is 5-8Level; Described hydrophobic membrane assembly adopts polypropylene hollow fiber membrane;
The operating pressure of described nanofiltration system is 0.6MPa;
Described Bipolar Membrane system adopts the membrane stack that film group number is 5, and membrane stack voltage is 12.5-15V.
2. recycling processing method as claimed in claim 1, is characterized in that, nanofiltration system adopts DK or the DL series membranes element of GE company.
3. recycling processing method as claimed in claim 1 or 2, is characterized in that, the salt chamber water inlet of described Bipolar Membrane system is described nanofiltration systemThe sodium chloride solution that processing obtains, the initial soln of He Jian chamber, sour chamber is deionized water, obtains sodium hydroxide solution and hydrochloric acid solution for reclaiming.
4. recycling processing method as claimed in claim 3, is characterized in that, it is sulfuric acid solution that the anode of described Bipolar Membrane system draws liquid, negative electrodeDrawing liquid is metabisulfite solution.
5. recycling processing method as claimed in claim 4, is characterized in that, described sulfuric acid solution and metabisulfite solution are 0.05-0.1mol/L.
6. recycling processing method as claimed in claim 5, is characterized in that, anode and cathode voltage is 4-5V.
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CN105540975B (en) * 2015-12-30 2018-10-16 北京赛科康仑环保科技有限公司 A kind of recycling processing method and its system of PCB circuit board etching waste liquor
CN114075003A (en) * 2020-08-18 2022-02-22 中石化南京化工研究院有限公司 Method for recycling copper and zinc in catalyst production wastewater
CN114349240A (en) * 2021-11-19 2022-04-15 苏州金渠环保科技有限公司 Resource utilization method of copper in etching waste liquid
CN114561669B (en) * 2022-03-03 2023-06-27 无锡中天固废处置有限公司 Method for recycling acidic copper-containing ammonium-containing etching waste liquid
CN116022838A (en) * 2022-12-15 2023-04-28 广东臻鼎环境科技有限公司 Method for recycling copper resources by utilizing circuit board acid etching waste liquid

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