CN104150431A - Gas intake system and substrate processing device - Google Patents
Gas intake system and substrate processing device Download PDFInfo
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- CN104150431A CN104150431A CN201310177549.3A CN201310177549A CN104150431A CN 104150431 A CN104150431 A CN 104150431A CN 201310177549 A CN201310177549 A CN 201310177549A CN 104150431 A CN104150431 A CN 104150431A
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Abstract
The invention provides a gas intake system and a substrate processing device. The gas intake system comprises multiple gas sources and multiple gas paths. One end of each gas path is communicated with at least one gas source in the multiple gas sources, and the other end of each gas path is communicated with a reaction cavity. The gas sources are used for supplying gas to the reaction cavity through the corresponding gas paths communicated with the gas sources, a current limiting unit is arranged on each gas path, and the limiting units are used for enabling the flow of gas passing the current limiting units to directly reach the preset flow values of the gas paths where the current limiting units are located. The gas intake system is high in response speed and capable of achieving the quick gas variety and/or flow switch.
Description
Technical field
The present invention relates to microelectronics technology, particularly, relate to a kind of gas handling system and substrate processing equipment.
Background technology
At present, dark silicon etching process becomes one of technique the most very powerful and exceedingly arrogant in MEMS manufacture field and TSV technology gradually, and dark silicon etching process is with respect to general silicon etching process, the main distinction is: the etching depth of dark silicon etching process is much larger than general silicon etching process, the etching depth of dark silicon etching process is generally tens microns even can reach microns up to a hundred, and the etching depth of general silicon etching process is less than 1 micron.Wanting etch thicknesses is the silicon materials of tens microns, just requires dark silicon etching process to have etch rate faster, when larger depth-to-width ratio of higher selection.
For this reason, carrying out in the process of dark silicon etching process, its whole etching process is generally the alternate cycles (as, the Bosch technique of German Robert Bosch company invention) of depositing operation and etching operation.But, due to depositing operation and each self-sustained time of etching operation all very short, even the shortest time of single operation only has 1 second, and this just needs the technological parameter such as gaseous species and flow, radio-frequency match etc. of depositing operation and etching operation can within the shortest time, realize stable switching.
The kind of process gas and flow are one of important technical parameters of dark silicon etching process, at present, conventionally adopt following gas handling system to realize kind to process gas and the switching of flow.Particularly, as shown in Figure 1, be the structural representation of existing a kind of gas handling system.This gas handling system comprises three gas circuits (1,2,3) and a main line.Wherein, the one end on main line and the internal communication of reaction chamber, the other end on main line is connected in series with three gas circuits (1,2,3) respectively, and on this main line, is provided with main line valve V5, in order to be switched on or switched off main line; Article three, gas circuit (1,2,3) for via main line to the process gas that passes into variety classes and/or flow in reaction chamber, and, above flow to the dirty manually-operated gate (MV01 that is disposed with from above in three gas circuits (1,2,3), MV02, MV03), filter (LF01, LF02, LF03), front end valve (V11, V21, V31), flow controller (MFC01, MFC02, MFC03) and rear end valve (V12, V22, V32).Connect a certain gas circuit at needs, so that it is during to reaction chamber delivery technology gas, first open main line valve V5, then open front end valve and rear end valve in this gas circuit, finally regulate the flow controller in gas circuit, so that the flow of gas reaches predetermined value (manually-operated gate keeps normally open conventionally); In the time that needs make a certain gas circuit stop air feed, first close the front end valve of the gas circuit of connection, and the flow value of the flow controller in this gas circuit is adjusted to zero, then close rear end valve and the main line valve V5 of this gas circuit.Easily understand, in the time that needs carry out gas circuit switching, repeat the flow process of above-mentioned connection, disconnection gas circuit.
Inevitably there is in actual applications following problem in above-mentioned gas handling system, that is: regulate the flow of its place gas circuit by flow controller due to above-mentioned gas handling system, flow controller is as electric elements, often there is the defect such as drift, poor linearity, cause not only less stable of system, and fault rate is higher, thereby reduce the service life of system, increased the maintenance cost of system.In addition, flow controller, after starting response, needs the regular hour just can complete the stable of flow, causes realizing the quick switching of gaseous species and/or flow, thereby brings harmful effect to the alternate cycles of operation.
Summary of the invention
The present invention is intended at least solve one of technical problem existing in prior art, has proposed a kind of gas handling system and substrate processing equipment, and its response speed is very fast, thereby can realize the quick switching of gaseous species and/or flow.
For this reason, the invention provides a kind of gas handling system, comprise multiple sources of the gas and many gas circuits, wherein, one end of every described gas circuit is communicated with wherein at least one source of the gas in described multiple sources of the gas, and the other end of every described gas circuit is communicated with described reaction chamber; Described source of the gas is for providing gas via the described gas circuit being communicated with it to described reaction chamber, and, in gas circuit every described, be provided with current limliting unit, described current limliting unit is for making directly to reach through its flow of gas the flow predetermined value of this place, current limliting unit gas circuit.
Wherein, described current limliting unit comprises flow-limiting valve and the first on-off valve, and wherein said flow-limiting valve is for making directly to reach through its flow of gas the flow predetermined value of its place gas circuit; Described the first on-off valve is used for being switched on or switched off gas circuit described in its place.
Wherein, described gas handling system also comprises control module, described control module for optionally control all described the first on-off valves wherein at least one is switched on or switched off gas circuit described in this first on-off valve place.
Wherein, described current limliting unit comprises at least two branch roads that are connected in parallel to each other, described at least two branch roads are connected in this place, current limliting unit gas circuit, and on branch road every described, be provided with flow-limiting valve and the first on-off valve, wherein said flow-limiting valve is for making directly to reach through its flow of gas the branch road predetermined value of this flow-limiting valve place branch road; Described the first on-off valve is positioned at the downstream of described flow-limiting valve, in order to be switched on or switched off branch road described in its place.
Wherein, in gas circuit every described, and the provided upstream that is positioned at described current limliting unit is equipped with the second on-off valve, in order to be switched on or switched off described gas circuit.
Wherein, described gas handling system also comprises control module, described control module for optionally control all described the second on-off valves wherein at least one connects the gas circuit at this second on-off valve place, simultaneously, optionally control in all described the first on-off valve in the gas circuit that is switched on wherein at least one, connect this first on-off valve place branch road; And described control module for control all described the second on-off valves wherein at least one disconnects the gas circuit at this second on-off valve place.
Wherein, in gas circuit every described, and the provided upstream that is positioned at described the second on-off valve is equipped with manual on-off valve, in order to adopt manual mode to be switched on or switched off the gas circuit at its place.
Wherein, in gas circuit every described, and the provided upstream that is positioned at described the second on-off valve is equipped with filter.
Wherein, described gas handling system also comprises a main line, and the other end of every described gas circuit is serially connected in the one end on described main line, and the other end on described main line is communicated with described reaction chamber; And, on described main line, be provided with total on-off valve, in order to be switched on or switched off described main line.
Wherein, in gas circuit every described, and the provided upstream that is positioned at described flow-limiting valve is equipped with manual on-off valve, in order to adopt manual mode to be switched on or switched off the gas circuit at its place.
Wherein, in gas circuit every described, and the provided upstream that is positioned at described flow-limiting valve is equipped with filter.
As another technical scheme, the present invention also provides a kind of substrate processing equipment, and it comprises reaction chamber and for carry the gas handling system of gas to described reaction chamber, described gas handling system has adopted gas handling system provided by the invention.
The present invention has following beneficial effect: gas handling system provided by the invention, it arranges the current limliting unit that can make the flow of gas directly reach the flow predetermined value of this gas circuit in every gas circuit, that is to say, this current limliting unit can be limited to an intrinsic flow by the flow value of the gas through it, therefore, the current limliting unit that only gas flow value required with technique intrinsic flow need be equated is arranged in corresponding gas circuit, can in the time connecting this gas circuit, make its flow reach the required gas flow value of technique, and without current limliting unit being carried out to any adjustment operation, thereby can make gas handling system can respond fast in the time that needs change gaseous species and/or flow, thereby can realize the quick switching of gaseous species and/or flow.
As a preferred technical scheme, above-mentioned current limliting unit comprises flow-limiting valve and for being switched on or switched off the first on-off valve of its place gas circuit, because flow-limiting valve is not electric elements, this is compared with available technology adopting MFC, not only can improve the stability of system, and the service life that can improve system, reduce the maintenance time of system, thereby can reduce use cost and the maintenance cost of system.
Substrate processing equipment provided by the invention, it,, by adopting above-mentioned gas handling system provided by the invention, can respond fast in the time that needs change gaseous species and/or flow, thereby can realize the quick switching of gaseous species and/or flow.
Brief description of the drawings
Fig. 1 is the structural representation of existing a kind of gas handling system;
The structural representation of the gas handling system that Fig. 2 provides for first embodiment of the invention;
The structural representation of the gas handling system that the variant embodiment that Fig. 3 is first embodiment of the invention provides;
The structural representation of the gas handling system that Fig. 4 provides for second embodiment of the invention; And
The structural representation of the gas handling system that the variant embodiment that Fig. 5 is second embodiment of the invention provides.
Detailed description of the invention
For making those skilled in the art understand better technical scheme of the present invention, below in conjunction with accompanying drawing, gas handling system provided by the invention and substrate processing equipment are described in detail.
The structural representation of the gas handling system that Fig. 2 provides for first embodiment of the invention.Refer to Fig. 2, gas handling system comprises multiple sources of the gas and many gas circuits, and wherein, one end that is arranged in gas circuit upstream of every gas circuit is communicated with wherein at least one source of the gas of multiple sources of the gas, and the other end that is positioned at gas circuit downstream of every gas circuit is communicated with reaction chamber; Source of the gas is for providing gas via the gas circuit being communicated with it to reaction chamber.In the present embodiment, gas handling system comprises three sources of the gas (1,2,3) and three gas circuit (1,2,3), and connect correspondingly, and, in gas circuit (1,2,3) on, be respectively arranged with current limliting unit (1,2,3), current limliting unit (1,2,3) is for making directly to reach through its flow of gas the flow predetermined value of this place, current limliting unit gas circuit.So-called flow predetermined value, refers in the time carrying out the corresponding operation of whole technical process, and the default gas circuit being switched on need to be to the flow value of the gas of carrying in reaction chamber.In the present embodiment, current limliting unit (1,2,3) comprises flow-limiting valve (1,2,3) and the first on-off valve (V12, V22, V32), wherein, flow-limiting valve (1,2,3) is for making directly to reach through its flow of gas the flow predetermined value of its place gas circuit; The first on-off valve (V12, V22, V32) is positioned at the downstream of flow-limiting valve (1,2,3), in order to be switched on or switched off its place gas circuit, thereby can realize the switching between each gas circuit.In actual applications, flow-limiting valve also can be positioned at the upstream of the first on-off valve, and the first on-off valve can be the valve of realizing quick break-make of pneumatic diaphragm valve etc.
Due to by flow-limiting valve (1,2,3) flow value of the gas through it is limited to an intrinsic flow, thereby the flow-limiting valve (1 that only intrinsic flow need be equated with flow predetermined value, 2,3) be arranged on accordingly gas circuit (1,2,3) on, can in the time connecting this gas circuit, make its flow reach flow predetermined value, and without flow-limiting valve being carried out to any adjustment operation, thereby can make gas handling system can respond fast in the time that needs change gaseous species and/or flow, and then can realize the quick switching of gaseous species and/or flow.In addition,, because flow-limiting valve is not electric elements, this is compared with available technology adopting MFC, not only can improve the stability of system, and the service life that can improve system, reduce the maintenance time of system, thereby can reduce use cost and the maintenance cost of system.
In the present embodiment, gas handling system also comprises control module (not shown), in order to optionally to control all the first on-off valve (V12, V22, V32) in wherein at least one is switched on or switched off this first on-off valve place gas circuit,, adopt the mode of automatically controlling to switch between each gas circuit.Control module can be computer, PLC etc.
In the present embodiment, in every gas circuit (1,2,3), and the provided upstream that is positioned at flow-limiting valve (1,2,3) is equipped with manual on-off valve (MV01, MV02, MV03), in order to adopt manual mode to be switched on or switched off the gas circuit at its place.
In the present embodiment, upper in every gas circuit (1,2,3), and the provided upstream that is positioned at flow-limiting valve (1,2,3) is equipped with filter (LF01, LF02, LF03), in order to filter through the impurity in its gas.
In the present embodiment, gas handling system also comprises a main line, and one end that is positioned at its downstream of every gas circuit is serially connected in the one end on main line, and the other end on main line is communicated with reaction chamber; And, on main line, be provided with total on-off valve V00, in order to be switched on or switched off this main line.Carrying out in the process of technique, if connect at least two gas circuits in all gas circuits simultaneously, the gas in these at least two gas circuits converges in main line, and mutually mixes; Mixed gas flows in reaction chamber via main line.But, the present invention is not limited thereto, in actual applications, also can make each gas circuit independent of one another, as shown in Figure 3, one end that is positioned at its downstream of every gas circuit is directly communicated with reaction chamber, in this case, if connect at least two gas circuits in all gas circuits simultaneously, before entering in reaction chamber, gas in these at least two gas circuits can not mix mutually, and remains each other separate.
It should be noted that, in the present embodiment, the quantity of gas circuit is three, but the present invention is not limited thereto, and in actual applications, the quantity of gas circuit can be set as two as the case may be, or more than four.In addition, in the present embodiment, the quantity of source of the gas is three, but the present invention is not limited thereto, and in actual applications, the quantity of source of the gas can be set as two as the case may be, or more than four.
Also it should be noted that, although in the present embodiment, adopt flow-limiting valve to realize the flow predetermined value that makes directly to reach through its flow of gas this place, current limliting unit gas circuit, but the present invention is not limited thereto, in actual applications, every can realization makes the control valve that directly reaches the flow predetermined value of its place gas circuit through its flow of gas all can be used as current limliting unit, realizes object of the present invention to reach.
The structural representation of the gas handling system that Fig. 3 provides for second embodiment of the invention.Refer to Fig. 3, gas handling system comprises multiple sources of the gas and many gas circuits, and wherein, one end that is arranged in gas circuit upstream of every gas circuit is communicated with wherein at least one source of the gas of multiple sources of the gas, and the other end that is positioned at gas circuit downstream of every gas circuit is communicated with reaction chamber; Source of the gas is for providing gas via the gas circuit being communicated with it to reaction chamber.In the present embodiment, gas handling system comprises three sources of the gas (1,2,3) and three gas circuits (1,2,3), and correspondingly connect, and, in gas circuit (1,2,3) on, be respectively arranged with current limliting unit (1,2,3), current limliting unit (1,2,3) comprises at least two branch roads that are connected in parallel to each other, in the present embodiment, each current limliting unit comprises three branch roads that are connected in parallel to each other, and is connected in this place, current limliting unit gas circuit.And, on every branch road, be provided with flow-limiting valve and the first on-off valve, wherein, flow-limiting valve is for making directly to reach through its flow of gas the branch road predetermined value of this flow-limiting valve place branch road, so-called branch road predetermined value, refer in the time carrying out the corresponding operation of whole technical process, the default branch road being switched on need to be to the flow value of the gas of carrying in reaction chamber.The first on-off valve is positioned at the downstream of flow-limiting valve, in order to be switched on or switched off its place branch road, thereby can realize the switching between each branch road.And, in every gas circuit (1,2,3), and the provided upstream that is positioned at current limliting unit (1,2,3) is equipped with the second on-off valve (V11, V12, V13), in order to be switched on or switched off its place gas circuit, thereby can realize the switching between each gas circuit.The first on-off valve and the second on-off valve can be all the valve of realizing quick break-make of pneumatic diaphragm valve etc.
In the present embodiment, gas handling system also comprises control module (not shown), control module is for optionally controlling all the second on-off valve (V11, V12, V13) in wherein at least one connects this second on-off valve (V11, V12, V13) gas circuit at place, meanwhile, optionally control in all the first on-off valves in the gas circuit that is switched on wherein at least one, connect this first on-off valve place branch road; And control module be used for controlling in all the second on-off valves (V11, V12, V13) wherein at least one disconnects the gas circuit at this second on-off valve (V11, V12, V13) place.
Because flow-limiting valve can be limited to an intrinsic flow by the flow value of the gas through it, thereby when control the second on-off valve is connected its place gas circuit, connect its place branch road by the first on-off valve of optionally controlling in this gas circuit, can obtain various flow rate combination,, the predetermined amount of flow value of every gas circuit is the intrinsic flow sum that is arranged on the flow-limiting valve on the branch road being switched on, thereby can realize, the flow of gas circuit is regulated, so that it reaches predetermined amount of flow value.And because this regulative mode only needs to control the break-make of corresponding the second on-off valve, and without flow-limiting valve being carried out to any adjustment operation, this can realize the flow of gas circuit is carried out to quick adjustment, thereby can realize the quick switching of gas flow.
In the present embodiment, in every gas circuit (1,2,3), and the provided upstream that is positioned at the second on-off valve (V11, V12, V13) is equipped with manual on-off valve (MV01, MV02, MV03), in order to adopt manual mode to be switched on or switched off the gas circuit at its place.
In the present embodiment, upper in every gas circuit (1,2,3), and the provided upstream that is positioned at the second on-off valve (V11, V12, V13) is equipped with filter (LF01, LF02, LF03), in order to filter through the impurity in its gas.
In the present embodiment, gas handling system also comprises a main line, and one end that is positioned at its downstream of every gas circuit is serially connected in the one end on main line, and the other end on main line is communicated with reaction chamber; And, on main line, be provided with total on-off valve V00, in order to be switched on or switched off this main line.Carrying out in the process of technique, if connect at least two gas circuits in all gas circuits simultaneously, the gas in these at least two gas circuits converges in main line, and mutually mixes; Mixed gas flows in reaction chamber via main line.But, the present invention is not limited thereto, in actual applications, also can make each gas circuit independent of one another, as shown in Figure 5, one end that is positioned at its downstream of every gas circuit is directly communicated with reaction chamber, in this case, if connect at least two gas circuits in all gas circuits simultaneously, before entering in reaction chamber, gas in these at least two gas circuits can not mix mutually, and remains each other separate.
In below taking needs gas circuit 1 to reaction chamber, carry gas as example, the gas handling system that the present embodiment is provided carries the course of work of gas to be described in detail in reaction chamber.Particularly, the total on-off valve V00 of control module control connects main line;
If control module, in controlling the second on-off valve V11 connection gas circuit 1, is controlled the first on-off valve V121 and connected its place branch road, in this case, the gas flow of gas circuit 1 is the intrinsic flow of flow-limiting valve 11.
If control module, in controlling the second on-off valve V11 connection gas circuit 1, is controlled the first on-off valve V122 and connected its place branch road, in this case, the gas flow of gas circuit 1 is the intrinsic flow of flow-limiting valve 12.
If control module, in controlling the second on-off valve V11 connection gas circuit 1, is controlled the first on-off valve V123 and connected its place branch road, in this case, the gas flow value of gas circuit 1 is the intrinsic flow of flow-limiting valve 13.
If control module, in controlling the second on-off valve V11 connection gas circuit 1, is controlled the first on-off valve V121 and V122 and connected place branch road separately, in this case, the gas flow of gas circuit 1 is the intrinsic flow sum of flow-limiting valve 11 and flow-limiting valve 12.
If control module, in controlling the second on-off valve V11 connection gas circuit 1, is controlled the first on-off valve V121 and V123 and connected place branch road separately, in this case, the gas flow of gas circuit 1 is the intrinsic flow sum of flow-limiting valve 11 and flow-limiting valve 13.
If control module, in controlling the second on-off valve V11 connection gas circuit 1, is controlled the first on-off valve V122 and V123 and connected place branch road separately, in this case, the gas flow of gas circuit 1 is the intrinsic flow sum of flow-limiting valve 12 and flow-limiting valve 13.
If control module is in controlling the second on-off valve V11 connection gas circuit 1, control the first on-off valve V121, V122 and V123 and connect place branch road separately, in this case, the gas flow of gas circuit 1 is the intrinsic flow sum of flow-limiting valve 11, flow-limiting valve 12 and flow-limiting valve 13.
As from the foregoing, if the intrinsic flow of three flow-limiting valves (11,12,13) is different, the gas flow of gas circuit 1 can obtain six kinds of different air flow stream values by carrying out above-mentioned six kinds of control modes.In actual applications, can set according to specific needs the intrinsic flow of the quantity of branch road and the flow-limiting valve of each branch road.
After the current operation completing in technique, and before carrying out next operation, control the second on-off valve V11 and the first on-off valve V121, V122 and/or V123 simultaneously and disconnect gas circuit 1; Meanwhile, control the second on-off valve V12 and/or V13 and connect gas circuit 2 and/or gas circuit 3, control the first on-off valve (V221 simultaneously, V222 and/or V223) and/or (V321, V322 and/or V323) connect corresponding branch road, can switch to gas circuit 2 and/or gas circuit 3 from original gas circuit 1, thereby can realize the quick switching of gaseous species.
It should be noted that, in the present embodiment, the quantity of gas circuit is three, but the present invention is not limited thereto, and in actual applications, the quantity of gas circuit can be set as two as the case may be, or more than four.In addition, in the present embodiment, the quantity of source of the gas is three, but the present invention is not limited thereto, and in actual applications, the quantity of source of the gas can be set as two as the case may be, or more than four.
Also it should be noted that, although in the present embodiment, adopt flow-limiting valve to realize the branch road predetermined value that makes directly to reach through its flow of gas this place, current limliting unit branch road, but the present invention is not limited thereto, in actual applications, every control valve that makes directly to reach the branch road predetermined value of its place branch road through its flow of gas of can realizing all can reach and realizes object of the present invention.
As another technical scheme, the present embodiment provides a kind of substrate processing equipment, and it comprises reaction chamber and for carry the gas handling system of gas to this reaction chamber, wherein, and the above-mentioned gas handling system that gas handling system has adopted the present embodiment to provide.
The substrate processing equipment that the present embodiment provides, it,, by adopting above-mentioned gas handling system provided by the invention, can respond fast in the time that needs change gaseous species and/or flow, thereby can realize the quick switching of gaseous species and/or flow.
Be understandable that, above embodiment is only used to principle of the present invention is described and the illustrative embodiments that adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (12)
1. a gas handling system, comprises multiple sources of the gas and many gas circuits, and wherein, one end of every described gas circuit is communicated with wherein at least one source of the gas in described multiple sources of the gas, and the other end of every described gas circuit is communicated with described reaction chamber; Described source of the gas is for providing gas via the described gas circuit being communicated with it to described reaction chamber, it is characterized in that, in gas circuit every described, be provided with current limliting unit, described current limliting unit is for making directly to reach through its flow of gas the flow predetermined value of this place, current limliting unit gas circuit.
2. gas handling system according to claim 1, is characterized in that, described current limliting unit comprises flow-limiting valve and the first on-off valve, wherein
Described flow-limiting valve is for making directly to reach through its flow of gas the flow predetermined value of its place gas circuit;
Described the first on-off valve is used for being switched on or switched off gas circuit described in its place.
3. gas handling system according to claim 2, it is characterized in that, described gas handling system also comprises control module, described control module for optionally control all described the first on-off valves wherein at least one is switched on or switched off gas circuit described in this first on-off valve place.
4. gas handling system according to claim 1, it is characterized in that, described current limliting unit comprises at least two branch roads that are connected in parallel to each other, and described at least two branch roads are connected in this place, current limliting unit gas circuit, and on branch road every described, be provided with flow-limiting valve and the first on-off valve, wherein
Described flow-limiting valve is for making directly to reach through its flow of gas the branch road predetermined value of this flow-limiting valve place branch road;
Described the first on-off valve is positioned at the downstream of described flow-limiting valve, in order to be switched on or switched off branch road described in its place.
5. gas handling system according to claim 4, is characterized in that, in gas circuit every described, and the provided upstream that is positioned at described current limliting unit is equipped with the second on-off valve, in order to be switched on or switched off described gas circuit.
6. gas handling system according to claim 5, it is characterized in that, described gas handling system also comprises control module, described control module for optionally control all described the second on-off valves wherein at least one connects the gas circuit at this second on-off valve place, simultaneously, optionally control in all described the first on-off valve in the gas circuit that is switched on wherein at least one, connect this first on-off valve place branch road; And
Described control module for control all described the second on-off valves wherein at least one disconnects the gas circuit at this second on-off valve place.
7. gas handling system according to claim 5, is characterized in that, in gas circuit every described, and the provided upstream that is positioned at described the second on-off valve is equipped with manual on-off valve, in order to adopt manual mode to be switched on or switched off the gas circuit at its place.
8. gas handling system according to claim 5, is characterized in that, in gas circuit every described, and the provided upstream that is positioned at described the second on-off valve is equipped with filter.
9. according to the gas handling system described in claim 2 or 4, it is characterized in that, described gas handling system also comprises a main line, and the other end of every described gas circuit is serially connected in the one end on described main line, and the other end on described main line is communicated with described reaction chamber; And,
On described main line, be provided with total on-off valve, in order to be switched on or switched off described main line.
10. gas handling system according to claim 2, is characterized in that, in gas circuit every described, and the provided upstream that is positioned at described flow-limiting valve is equipped with manual on-off valve, in order to adopt manual mode to be switched on or switched off the gas circuit at its place.
11. gas handling systems according to claim 2, is characterized in that, in gas circuit every described, and the provided upstream that is positioned at described flow-limiting valve is equipped with filter.
12. 1 kinds of substrate processing equipments, it comprises reaction chamber and for carry the gas handling system of gas to described reaction chamber, it is characterized in that, described gas handling system adopts the gas handling system described in claim 1-11 any one.
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| CN201310177549.3A CN104150431A (en) | 2013-05-14 | 2013-05-14 | Gas intake system and substrate processing device |
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| CN201310177549.3A CN104150431A (en) | 2013-05-14 | 2013-05-14 | Gas intake system and substrate processing device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111276421A (en) * | 2018-12-05 | 2020-06-12 | 北京七星华创流量计有限公司 | Flow distribution device, air inlet system and reaction chamber |
| CN111524778A (en) * | 2020-04-24 | 2020-08-11 | 北京北方华创微电子装备有限公司 | Gas transport pipeline, method for controlling gas transport and semiconductor equipment |
| CN113960083A (en) * | 2021-09-14 | 2022-01-21 | 散裂中子源科学中心 | Experimental device for small-angle scattering experiment and gas mixing pressurization system |
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| CN113960083A (en) * | 2021-09-14 | 2022-01-21 | 散裂中子源科学中心 | Experimental device for small-angle scattering experiment and gas mixing pressurization system |
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Application publication date: 20141119 |