CN104149241A - Photo-curing molding device - Google Patents
Photo-curing molding device Download PDFInfo
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- CN104149241A CN104149241A CN201410372056.XA CN201410372056A CN104149241A CN 104149241 A CN104149241 A CN 104149241A CN 201410372056 A CN201410372056 A CN 201410372056A CN 104149241 A CN104149241 A CN 104149241A
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- galvanometer
- focusing mirror
- dynamic focusing
- photo
- diaphragm
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Abstract
The invention discloses a photo-curing molding device which comprises a laser, reflecting mirrors, a diaphragm, a dynamic focusing mirror, a convex lens focusing mirror and a galvanometer, wherein the laser, the reflecting mirror, the diaphragm, the other reflecting mirror, the dynamic focusing mirror, the convex lens focusing mirror and the galvanometer are sequentially arranged; a working table is arranged just below the galvanometer; photocurable resin is arranged in the working table; a coating plate is arranged on the top of the working table. According to the photo-curing molding device, the laser with specific wave length and intensity is focused on the surface of a photo-curing material and is cured from a point to a line and from the line to a plane sequentially, so that the drawing operation of a layer surface can be completed; after that, a lifting platform is moved by the height of one laminate along the vertical direction, and another layer surface is cured. Therefore, by overlapping layer upon layer, a three-dimensional entity is formed.
Description
Technical field
The present invention relates to a kind of Stereolithography device, belong to laser formation technical field.
Background technology
At present, the molding mode the most often using is injection moulding, and injection moulding is to use injection machine that thermoplastic melt is under high pressure injected in mould through method cooling, that solidify acquisition product.Injection moulding also can be for the moulding of thermosetting plastics and foamed plastics.The advantage of injection moulding is that speed of production is fast, efficiency is high, and operation can automation, and part that can forming shape complexity, is particularly suitable for a large amount of production.But shortcoming is that equipment and die cost are high, injection machine cleaning is more difficult.
Summary of the invention
Object: in order to overcome the deficiencies in the prior art, the invention provides a kind of Stereolithography device.
Technical scheme: for solving the problems of the technologies described above, the technical solution used in the present invention is:
A Stereolithography device, comprises laser instrument, speculum, also comprises diaphragm, dynamic focusing mirror, convex lens focus lamp, galvanometer, and described laser instrument, speculum, diaphragm, speculum, dynamic focusing mirror, convex lens focus lamp, galvanometer are arranged in order.
Also comprise workbench, described workbench is arranged under galvanometer.
Also comprise light-cured resin, described light-cured resin is arranged in workbench.
Also comprise coating plate, described coating plate is arranged on bench-top.
Described dynamic focusing mirror is set to double dynamic focusing.
Described galvanometer comprises X-axis galvanometer, Y-axis galvanometer, electric drive amplifier, optical reflecting lens.
Beneficial effect: Stereolithography device provided by the invention, surperficial to photo-curing material with the Laser Focusing of specific wavelength and intensity, make it by point to line, by line to face consecutive solidification, complete the drawing performance of an aspect, then lifting platform moves the height of a synusia in the vertical direction, then solidifies another aspect. and be layering like this and form a 3D solid.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
The specific embodiment
Below in conjunction with accompanying drawing, the present invention is further described.
As shown in Figure 1, a kind of Stereolithography device, comprise laser instrument 1, speculum 2, also comprise diaphragm 3, dynamic focusing mirror 4, convex lens focus lamp 5, galvanometer 6, described laser instrument 1, speculum 2, diaphragm 3, speculum 2, dynamic focusing mirror 4, convex lens focus lamp 5, galvanometer 6 are arranged in order.
Also comprise workbench 9, described workbench 9 is arranged under galvanometer 6.
Also comprise light-cured resin 8, described light-cured resin 8 is arranged in workbench 9.
Also comprise coating plate 10, described coating plate 10 is arranged on workbench 9 tops.
Described dynamic focusing mirror 4 is set to double dynamic focusing.
Described galvanometer 6 comprises X-axis galvanometer, Y-axis galvanometer, electric drive amplifier, optical reflecting lens.
Specific embodiment is as follows, and the laser beam 7 that diameter is 1.5-3mm sends from laser instrument 1, and laser beam reflects and passes diaphragm 3 through speculum 2 and arrives speculum 2, then refraction enters dynamic focusing mirror 4.Laser beam 7, through the beam expanding lens beam-expanding collimation of dynamic focusing system, then passes through convex lens focus lamp 5.Laser beam 7 after focusing projects X-axis galvanometer, from X-axis galvanometer, is refracted to Y-axis galvanometer again, and last laser beam 7 projects liquid light-cured resin 8 surfaces.Liquid light-cured resin 8 by coating plate 10 piling up in layer in workbench 9.
The above is only the preferred embodiment of the present invention; be noted that for those skilled in the art; under the premise without departing from the principles of the invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (6)
1. a Stereolithography device, comprise laser instrument, speculum, it is characterized in that: also comprise diaphragm, dynamic focusing mirror, convex lens focus lamp, galvanometer, described laser instrument, speculum, diaphragm, speculum, dynamic focusing mirror, convex lens focus lamp, galvanometer are arranged in order.
2. Stereolithography device according to claim 1, is characterized in that: also comprise workbench, described workbench is arranged under galvanometer.
3. Stereolithography device according to claim 2, is characterized in that: also comprise light-cured resin, described light-cured resin is arranged in workbench.
4. Stereolithography device according to claim 3, is characterized in that: also comprise coating plate, described coating plate is arranged on bench-top.
5. according to the Stereolithography device described in claim 1-4 any one, it is characterized in that: described dynamic focusing mirror is set to double dynamic focusing.
6. according to the Stereolithography device described in claim 1-4 any one, it is characterized in that: described galvanometer comprises X-axis galvanometer, Y-axis galvanometer, electric drive amplifier, optical reflecting lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410372056.XA CN104149241A (en) | 2014-07-31 | 2014-07-31 | Photo-curing molding device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410372056.XA CN104149241A (en) | 2014-07-31 | 2014-07-31 | Photo-curing molding device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104149241A true CN104149241A (en) | 2014-11-19 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410372056.XA Pending CN104149241A (en) | 2014-07-31 | 2014-07-31 | Photo-curing molding device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104149241A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106950804A (en) * | 2017-05-19 | 2017-07-14 | 深圳市斯普莱特激光科技有限公司 | A kind of novel high-precision three-dimensional laser exposure curing equipment |
| CN107024837A (en) * | 2017-05-19 | 2017-08-08 | 深圳市斯普莱特激光科技有限公司 | A kind of high-precision three-dimensional laser explosure curing process |
| CN107234809A (en) * | 2017-06-22 | 2017-10-10 | 中山大简科技有限公司 | A kind of changeable optical path system based on dynamic focusing |
| CN107263872A (en) * | 2017-06-22 | 2017-10-20 | 中山大简科技有限公司 | A kind of changeable optical path system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04103339A (en) * | 1990-08-22 | 1992-04-06 | Fujitsu Ltd | Method for forming three-dimensional matter |
| CN1300667A (en) * | 1999-11-19 | 2001-06-27 | 美科有限公司株式会社 | Method and apparatus for forming three-layer laminated products from optical solidified liquid |
| CN204095002U (en) * | 2014-07-31 | 2015-01-14 | 苏州市华宁机械制造有限公司 | Stereolithography device |
-
2014
- 2014-07-31 CN CN201410372056.XA patent/CN104149241A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04103339A (en) * | 1990-08-22 | 1992-04-06 | Fujitsu Ltd | Method for forming three-dimensional matter |
| CN1300667A (en) * | 1999-11-19 | 2001-06-27 | 美科有限公司株式会社 | Method and apparatus for forming three-layer laminated products from optical solidified liquid |
| CN204095002U (en) * | 2014-07-31 | 2015-01-14 | 苏州市华宁机械制造有限公司 | Stereolithography device |
Non-Patent Citations (1)
| Title |
|---|
| 莫健华: "《液态树脂光固化增材制造技术》", 30 June 2013, article "光固化成形系统及成形工艺", pages: 57 - 58 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106950804A (en) * | 2017-05-19 | 2017-07-14 | 深圳市斯普莱特激光科技有限公司 | A kind of novel high-precision three-dimensional laser exposure curing equipment |
| CN107024837A (en) * | 2017-05-19 | 2017-08-08 | 深圳市斯普莱特激光科技有限公司 | A kind of high-precision three-dimensional laser explosure curing process |
| CN107234809A (en) * | 2017-06-22 | 2017-10-10 | 中山大简科技有限公司 | A kind of changeable optical path system based on dynamic focusing |
| CN107263872A (en) * | 2017-06-22 | 2017-10-20 | 中山大简科技有限公司 | A kind of changeable optical path system |
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| C12 | Rejection of a patent application after its publication | ||
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Application publication date: 20141119 |