CN104120387A - Electron beam-evaporation device and method used for electron beam-evaporation - Google Patents
Electron beam-evaporation device and method used for electron beam-evaporation Download PDFInfo
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- CN104120387A CN104120387A CN201410148851.0A CN201410148851A CN104120387A CN 104120387 A CN104120387 A CN 104120387A CN 201410148851 A CN201410148851 A CN 201410148851A CN 104120387 A CN104120387 A CN 104120387A
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30472—Controlling the beam
- H01J2237/30483—Scanning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to an electron beam-evaporation device and a method used for electron beam-evaporation. According to different embodiments, the electron beam-evaporation device (100) comprises a first electron beam source (102a) used to provide first electron beams (112a), a second electron beam source (102b) used to provide second electron beams (112b), a first holding region (106a) used to hold a first material (118a), a second holding region (106b) used to hold a second material (118b), a first steering structure (104a) used to steer the first electron beams (112a) to the first holding region (106a), a second steering structure (104b) used to steer the second electron beams (112b) to the second holding region (106b). The first steering structure (104a) and the second steering structure (104b) are coupled with each other by magnetic forces.
Description
Technical field
The present invention relates to a kind of electron beam-vapourizing unit, and for the method for electron beam-vaporization.
Background technology
Matrix or carrier can be coated by means of electron beam-vaporization.As long as the vapour pressure of material to be vaporized or material composition is mutually contiguous, for example can implement to merge vaporization and/or doping vaporization, for example single crucible vaporization (vaporizer also can be called as target material) of so-called multicomponent vaporizer.
In addition, can force definite composition vaporization ratio by so-called feeding (Nachf ü tterung), wherein, at least one material is added to vaporizer at vaporescence, for example provide or supplementary quota outside vaporizer, wherein, usually such fusion vaporization and/or doping vaporization is difficult to conversion technically, because this process has permanent stability very.Therefore, can use many crucible vaporizations (for example two crucible vaporizations), wherein, every kind of material composition can be disposed in respectively in a vaporization crucible, and wherein, vaporization crucible can regulate respectively on its locus.Due to set a distance really between each vapour source, when deposition of material and/or form layers, can there is concentration gradient (amount-concentration gradient).This concentration gradient can be because corresponding sputter (Bedampfung) geometry is built into and can bears in the layer being deposited.In addition, in the layer that should be deposited in concentration gradient, be accessible, for example can be used for forming cermet coating.
When if the distance between matrix and vapour source is very little on the surface of vaporizer, for electron beam vaporization, can improve steam rate of utilization.Therefore layout that can be such for generation of the magnetic steering structure of static magnetic field, can realize the respective guide to electron beam that is in vaporous environment.Can and treat at vapour source that thus the beam that realizes electron beam between the matrix of coating enters a little and the bundle guiding to electron beam, wherein, electron beam can be away from matrix, and can on the surface of vaporizer, realize the collision angle of inclination simultaneously.This structure example is carried out coating as can be used for to wide matrix, wherein, the electron beam by quick deflection can produce can perpendicular to and be symmetrical in the vapour source at matrix Liu center.
Yet the shortcoming of this structure can be for example, because the intensity of field that turns in space distributes, substantially only can use electron beam gun, by this electron beam gun, must in vaporescence, produce corresponding vapour source.The intensity of field distribution that turns in space can limit unequally by means of the attainable position of collision of electron beam gun on the vaporizer of bi-material in its surface range, wherein, electron beam is deflected to the corresponding position of collision (for example, beam deflection system can be a part for electron beam source) on vaporizer by means of beam deflection system.In other words, for the crucible of two corresponding layouts of the bi-material of vaporizing, by the electron beam of electron beam gun, realized in a different manner.For example, for the big area coating with large coating width, single rifle is arranged and is not suitable for, and produces the vapour source distribution of two expansions on two crucibles, makes to be difficult to guarantee on the whole width of matrix high bed thickness stability and/or stability of concentration.
Summary of the invention
The one side of different embodiments can obviously be, electron beam-vapourizing unit can have a plurality of electron beam sources, and wherein, electron beam-vapourizing unit can have improved steam rate of utilization when operation.
For example can be on the other hand, two kinds of different materials can be simultaneously by means of the vaporization of electron beam-vapourizing unit, wherein, two or more materials can be in different containers (for example, in different vaporization crucibles), yet and can arrange independently of each other for each vaporescence parameter of the material in different vessels.For these vaporescence parameters, for example can comprise: the power that enters each material enters, the pattern (pattern) of electron beam on each material surface, each material and the distance for the treatment of the matrix of coating, the collision angle of electron beam on each material surface, the vaporization rate of each material, the power of electron beam enters, the spatial arrangement of the spatial arrangement of dividing plate (Blende) and each container of material.In addition, the total power that can improve bi-material enters, because can use a plurality of electron beam sources.
In addition, the one side of different embodiments can be, electron beam-vapourizing unit is provided, and makes to produce to have high efficiency gradient layer, wherein, for electron beam-vaporization, can improve material use efficiency.
According to different embodiments, electron beam-vapourizing unit can have: the first electron beam source that is provided for providing the first electron beam, be provided for providing the second electron beam source of the second electron beam, for holding the first housing region of at least one the first material, for holding the second housing region of at least one the second material, be provided for the first electron beam to be diverted to the first magnetic steering structure of the first housing region, and the second magnetic steering structure that is provided for the second electron beam to be diverted to the second housing region, wherein, the first steering structure and the second steering structure be magnetic couplings mutually.
According to different embodiments, the first steering structure and the second steering structure can be by means of the mutual magnetic couplings of magnetic couplings structure.In addition, magnetic couplings structure can have iron yoke or be become by iron yoke piece.In addition, magnetic couplings structure can be electromagnetic coupled structure or electromagnetic coupled system.
According to different embodiments, the first electron beam source and the second electron beam source can have electron beam gun.In addition, the first electron beam source or the second electron beam source can have electron beam gun.
According to different embodiments, electron beam gun can have the deflection system (deflection structure) for deflection beam.According to different embodiments, electron beam gun can have electron source and the deflection system of the electron beam that produces for deflection.According to different embodiments, the direction of electron beam (from the reflection direction of the electron beam of electron source) is deflected or is changed in the angular range of roughly-60 ° to+60 ° by means of deflection system.
According to different embodiments, the first housing region and the second housing region can be disposed between the first electron beam source and the second electron beam source.
According to different embodiments, the first housing region can have at least one first container, for holding at least one first material; And/or second housing region can there is at least one second container, for holding at least one second material.
According to different embodiments, at least one first material can be contained in the first housing region; And at least one second material can be contained in the second housing region.
According to different embodiments, at least one first material and at least one second material can be different materials.
According to different embodiments, housing region can have a plurality of containers, and it for example can be used for holding multiple material or other materials.Thus, for example can realize vaporization simultaneously for the material more than two kinds.
According to different embodiments, the first housing region can be nearer apart from the first electron beam source than the second housing region; And the second housing region can be nearer apart from the second electron beam source than the first housing region.
According to different embodiments, the first magnetic steering structure or the second magnetic steering structure can have magnet arrangement and/or coil is arranged.
According to different embodiments, the first magnetic steering structure and the second magnetic steering structure can have magnet arrangement and/or coil is arranged.
According to different embodiments, the first magnetic steering structure can have the first magnet and/or the first coil; And the second magnetic steering structure can have the second magnet and/or the second coil.
According to different embodiments, the first magnetic steering structure and the second magnetic steering structure can have respectively two coils.
According to different embodiments, magnet arrangement and/or coil are arranged and can be arranged in this wise, that is, turn to the first magnetic field of the first electron beam and turn to the second magnetic field of the second electron beam mutually relatively directed.
According to different embodiments, the first steering structure and the second steering structure can be by means of the mutual magnetic couplings of at least one yoke.
According to different embodiments, coating device can have: vacuum chamber and be arranged in the electron beam-vapourizing unit in vacuum chamber, and as described in this article, for the coating area at vacuum chamber (or coated areas) sedimentation gradient layer on matrix.
According to different embodiments, gradient layer can be used as the layer along the direction of layer with material-gradient, for example, along the lateral of layer or along the thickness direction (along thickness) of layer.
According to different embodiments, coating area can be the region in vacuum chamber, wherein carries out vaporizer deposition.According to different embodiments, coating area can be at least by forming or have with one in lower area with one in lower area: vaporization zone, for example, near vapour source or near crucible surface, in this region, can vaporize for the material of coating; Deposition region, for example, at the near surface for the treatment of the matrix of coating, the material of vaporizing in vaporization zone in this region can be deposited on the matrix for the treatment of coating; And/or vapor diffusion region, for example, at crucible (or vapour source) and treat between the matrix of coating the diffuse of vaporizing in this region.According to different embodiments, can coating device be set in this wise, that is, coating area or deposition region are positioned near treating coat side of matrix, or in abutting connection with the matrix for the treatment of coating.
According to different embodiments, coating device can have conveyer in addition, for transporting matrix, passes through coating area.
According to different embodiments, electron beam-vapourizing unit can be arranged under coating area at least in part.
According to different embodiments, whole electron beam-vapourizing unit can be arranged under deposition region.
According to different embodiments, coating device can be set up in this wise, that is, coating area is at least in part between the face and electron beam-vapourizing unit for the treatment of coating of matrix.
According to different embodiments, for the method for settled layer on matrix, comprise: by means of the first magnetic steering structure, the first electron beam is redirect to the first housing region, in this region, can hold at least one first material, the part of at least one the first material can be vaporized; By means of the second magnetic steering structure, the second electron beam is redirect to the second housing region, in this region, can hold at least one second material, the part of at least one the second material can be vaporized; On matrix, deposit at least one first material and at least one second material; Wherein, the first magnetic steering structure and the second magnetic steering structure magnetic couplings mutually.
In addition, the method for settled layer on matrix comprises: matrix is transported by the coating area of vacuum chamber.
According to different embodiments, coating device can be inline-device.In addition, coating device can have conveyer, for conveyer belt matrix.
According to different embodiments, matrix can be in the same manner or same straight line move through coating area.
According to different embodiments, during the method for settled layer on matrix, at least one first material and at least one second material with material-gradient can be deposited on matrix.
According to different embodiments, the material of at least one first material and at least one the second material can have aluminium, and another material of at least one first material and at least one the second material can have silicon.
According to different embodiments, the first material and second material with material-gradient can be deposited on matrix.
In addition, the first material and the second material can be deposited on matrix, and wherein, the material depositing on matrix can have the space uneven distribution of the first material and the second material.
In addition, the first material and the second material can be deposited on matrix, and wherein, the deposition material on matrix can form gradient layer.
According to different embodiments, the first material and the second material can be deposited on matrix in this wise,, form one deck on matrix that is, and wherein, this layer can have material-gradient.
In addition, according to different embodiments, for the method for electron beam-vaporization, can comprise: by means of the first electron beam source, produce the first electron beam, and produce the second electron beam by means of the second electron beam source.
In addition,, according to different embodiments, for the method for electron beam-vaporization, can comprise and use or activate electron beam-vapourizing unit described herein.
According to different embodiments, can realize the deposition of at least one first material and at least one the second material on shape matrix or endless matrix.
According to different embodiments, electron beam-vapourizing unit can be provided, make to turn to two electron beams that produced by two electron beam gun to produce one or more vapour sources on two different crucibles by means of magnetic.In this arranges, for example, can implement to merge vaporization and/or doping vaporization as gradient-vaporization.At this, for example, can realize little sputter distance, and realize thus high steam rate of utilization.In addition, for example, can realize large coating width, high bed thickness homogeneity and/or high concentration homogeneity.
According to different embodiments, from each vaporization crucible single component vaporization can by use two independently electron beam device (for example there is respectively electron beam source, deflection system and/or steering structure) realize, make for example to pass through separate control and/or adjusting to electron beam device, vaporescence parameter simply mode is mated desirable anabolic process.
According to different embodiments, electron beam-vapourizing unit can be placed in the coating device for planar substrates, for example for to wafer-back side metal spraying carry out coating, or for example for the wafer-dorsal part having as the Al/Si alloy of material-gradient layer is carried out to coating.
According to different embodiments, for the method for electron beam-vaporization, can be used for planar substrates to carry out coating, for example, for generation of the spraying of wafer-back side metal, or for example for the wafer-dorsal part having as the Al/Si alloy of material-gradient layer is carried out to coating.
Accompanying drawing explanation
Embodiments of the invention shown in the drawings, and be described in more detail below.In accompanying drawing:
Figure 1A illustrates according to the perspective schematic view of the electron beam-vapourizing unit of different embodiments;
Figure 1B to Fig. 1 F illustrates respectively according to the schematic sectional view of the electron beam-vapourizing unit of different embodiments;
Fig. 2 A illustrates according to the schematic plan of the electron beam-vapourizing unit of different embodiments;
Fig. 2 B illustrates according to the schematic sectional view of the electron beam-vapourizing unit of different embodiments;
Fig. 3 A and Fig. 3 B illustrate respectively the lip-deep vapour source exemplary arrangement at vaporizer according to different embodiments; And
Fig. 4 illustrates according to the indicative flowchart of the method for electron beam-vaporization of different embodiments.
Embodiment
In detailed description, with reference to accompanying drawing, it forms the part of this explanation and to show for the concrete embodiment of explanation, with these embodiments, can implement the present invention below.Aspect this, with respect to the orientation of the accompanying drawing of describing, user is to term, as " on ", D score, " front ", " afterwards ", " front portion ", " rear portion " etc.Because the parts of embodiment can a plurality of different towards on location, direction term is for explanation, and is nonrestrictive.Note, in the case without departing from the scope of protection of the present invention, can use other embodiment and carry out change in structure or in logic.Note, if not explanation in addition, the feature of different demonstration embodiment described here can combine mutually.Therefore, description is not hereinafter restrictive, and protection scope of the present invention limits by claim.
In scope herein, use concept " connection ", " joint ", " coupling " described directly and is indirectly connected, directly or indirectly joint, and direct or indirect coupling.In the accompanying drawings, identical or close parts have identical mark, as long as this is useful.
Figure 1A is schematically illustrated according to the electron beam-vapourizing unit 100 of different embodiments, and wherein, electron beam-vapourizing unit 100 can have: the first electron beam source 102a, is provided for providing the first electron beam; The second electron beam source 102b, is provided for providing the second electron beam; The first housing region 106a, for holding the first material; The second housing region 106b, for holding the second material; The first steering structure 104a, is provided for the first electron beam to redirect to the first housing region 106a; The second steering structure 104b, is provided for the second electron beam to redirect to the second housing region 106b.
This steering structure for example also can be called and/or be interpreted as steering structure or steering.
In addition, the first steering structure 104a and the second steering structure 104b be magnetic couplings mutually, as being shown specifically in Fig. 2 A.Such magnetic couplings for example can realize by means of iron core or iron yoke, or realizes by means of other ferromagnetic materials.
As shown in Figure 1A, the first housing region 106a can correspondingly belong to the first electron beam source 102a, and for example by following manner, that is, the electron beam of the first electron beam source 102a turns to and enters the first housing region 106a by means of the first steering structure 104.Correspondingly, the second housing region 106b can belong to the second electron beam source 102b, and for example by following manner, that is, the electron beam of the second electron beam source 102b turns to and enters the second housing region 106b by means of the second steering structure 104b.
For example, by means of electron beam source 102a, the electron beam that 102b produces can, at housing region 106a, be propagated in the direction of 106b.In addition, electron beam can turn to by means of magnetic field, and wherein, magnetic field can correspondingly produce by the first steering structure 104a with by the second steering structure 104b.According to different embodiments, the first steering structure 104a and the second steering structure 104b can have respectively two steering structure elements, as shown at Figure 1A, wherein, these two steering structure elements can be arranged in corresponding housing region 106a, in the relative side of 106b.Thus for example can be on the first housing region 106a or near generation the first magnetic field, and on the second housing region 106b or near generation the second magnetic field.According to different embodiments, steering structure 104a, 104b can be formed or be had permanent magnet or coil by permanent magnet or coil, makes to produce static state or dynamic magnetic field.In addition, described steering structure element can have respectively magnet or coil.In addition, described steering structure element and/or steering structure 104a, 104b can connect by means of magnetic conductor.
In possible geometry arranges, the first housing region 106a can be nearer apart from the first electron beam source 102a with respect to the second housing region 106b, and similarly, the second housing region 106b can be nearer apart from the second electron beam source 102b with respect to the first housing region 106a.In other words, housing region 106a, 106b can be disposed in electron beam source 102a, between 102b.In addition, housing region can neighboringly be arranged 106a, 106b mutually.
Be similar to the electron beam-vapourizing unit 100 shown in Figure 1A, other possible settings can for example have the electron beam source more than two, and/or for example have the housing region more than two.In addition, electron beam source 102a, the layout of 102b can be different from shown layout, electron beam source 102a for example, 102b can directly relatively arrange, as the described herein, but with shown in be provided with deviation.To this, steering structure 104a, 104b can correspondingly be arranged to, and each incident beam from respective direction is turned to the housing region under it.
Figure 1B illustrates cross-sectional view or the side-view of the part of electron beam-vapourizing unit 100.Electron beam source 102a, 102b for example can be arranged in housing region 106a, on 106b (as along direction 105 by means of seeing apart from 105a), make by electron beam source 102a, the electron beam 112a that 102b produces, 102b turns to substantially in this wise,, electron beam 112a, 102b arrives each housing region 106a, 106b.According to magnetic field towards, electron beam can turn to (for example, can be parallel to the deflection that direction 105 realizes electron beam) in theory up or down, wherein, because effective lorentz's force can be realized direction and changes.Thus, the arrange accordingly of electron beam-vapourizing unit 100 for example can affect following characteristic: the speed of electronics (acceleration voltage of for example using for the electron institute in electron source thus), the intensity in magnetic field and spatial distribution, electron beam enters the angle in corresponding magnetic field, and electron beam source 102a, 102b, steering structure 104a, 104b and housing region 106a, the mutual relative spatial arrangement of 106b, wherein, key is, in desired mode, turn to electron beam 112a, 112b enters housing region 106a, 106b.
As shown in exemplary cross-sectional in Fig. 1 C, the first electron beam 112a being produced by the first electron source 102a is diverted into the first container 108a by means of the first magnetic field 110a producing by the first steering structure 104a.According to different embodiments, the first container 108a can be arranged among the first housing region 106a.The first container 108a can be for example vaporization crucible 108a, and can hold or comprise the first vaporizer or the first material to be vaporized.The the second electron beam 112b being produced by the second electron source 102b can be diverted into second container 108b by means of the second magnetic field 110b producing by the second steering structure 104b in a similar fashion.According to different embodiments, second container 108b can be arranged in the second housing region 106b.Second container 108b can be for example vaporization crucible, and it can hold the second vaporizer or the second material to be vaporized.
Container 108a, 108b can be also for example the target for electron beam vaporization, or also can have the target for electron beam vaporization.
As at Fig. 1 C corresponding to as shown in common physical record, the first magnetic field 110a can be by entering shown in drawing, and similarly, the second magnetic field 110b can be by out illustrating from drawing.At this, each magnetic field 110a, the direction of 110b correspondingly arranges, and makes electron beam 112a, and 112b is deflected in desired mode.
As shown at Fig. 1 D, container 108a, 108b can arrange in this wise, makes it have different height location.Container 108a, 108b for example can have along direction 105, measure apart from corresponding electron beam source 102a, the distance that 102b is different.As container 108a, when 108b should change apart from each distance until the matrix of coating, or should change while arranging, can use such setting, also referring to Fig. 1 E.
In this arranges, as shown in Figure 1 D, corresponding magnetic field 110a, the setting that 110b can be such, make for example the first electron beam 112a correspondingly in desired mode, redirect to the first container 108a, and the second electron beam 112b correspondingly redirect to second container 108b in desired mode.
According to different embodiments, magnetic field 110a, 110b can correspondingly arrange independently of each other, and configuration is controlled, and regulates or optimizes.According to different embodiments, magnetic field 110a, 110b can be correspondingly separate by means of steering structure 104a, and the coil of 104b is mutually on the spot arranging, and configuration, controls, and regulates or optimizes.According to different embodiments, magnetic field 110a, 110b can correspondingly configure independently of each other or arrange.
According to different embodiments, container 108a, 108b movably (101a, 103a, 105a) is installed in electron beam-vapourizing unit 100, makes for example container 108a, and the position of 108b can be mated.To container 108a, the location of 108b for example can be realized by means of motor or step motor, and these motors can be by means of suitable station-keeping system by container 108a, and 108b is placed in desired position.Because container for example can be located independently of each other, need, corresponding magnetic field 110a, 110b is by means of each steering structure 104a, and 104b can configure equally independently of each other, or can arrange independently of each other.
For example can be corresponding to direction 101,103,105 realize container 108a statically, the location 101a of 108b, 103a, 105a, make the container 108a in electron beam-vapourizing unit 100,108b can have position fixing but that clearly limit, wherein, corresponding magnetic field 110a, 110b can arrange equally statically.
For example can be corresponding to direction 101,103,105 dynamically realize container 108a, the location 101a of 108b, 103a, 105a, make the container 108a in electron beam-vapourizing unit 100,108b can change its position separately, wherein, corresponding magnetic field 110a, 110b equally dynamically configures (control, regulate), make magnetic field 110a, 110b can mate container 108a, each position 101a of 108b, 103a, 105a.
According to different embodiments, magnetic field 110a, therefore 110b can mate each container 108a, each position of 108b.
According to different embodiments, can be by means of steering structure 104a, the coil of 104b is realized magnetic field 110a, the coupling of 110b, wherein, magneticstrength can be affected by following manner, that is and, how many electric currents are by steering structure 104a, each coil of 104b.According to different embodiments, steering structure 104a, 104b for example can have a plurality of coils, wherein, can regulate independently or control each coil, or can be corresponding to desired magnetic field 110a to be generated, 110b and arranging.
According to different embodiments, electron beam-vapourizing unit 100 can arrange in this wise, that is, electron beam vertically impinges upon on target material, and this target material can be vaporized by means of electron beam.
As shown at Fig. 1 E, container 108a(is similarly, applicable equally for container 108b) can there is or comprise first object material 118a.According to different embodiments, container 108a can be vaporization crucible 108a, for example, be cooled or be not cooled, and target material 118a can be material to be vaporized, and maybe can have material to be vaporized.Vaporization for material 118a by means of electron beam 112a, can realize vaporization because electron beam 112a enters the energy for the treatment of in evaporation of materials 118a.When electron beam 112a vertical (wherein, angle 107 can in the angular regions of about 90 °) clashes into the surperficial 107a wait the material 118a vaporizing, the energy that enters of electron beam 112a can be for example maximum.In order to realize optimum efficiency for electron beam-vaporization, that is, for example, make angle 107 perpendicular to the surperficial 107a of material 118a to be vaporized, can correspondingly mate or arrange the geometry of magnetic field 110a and electron beam-vapourizing unit 100.
In addition,, as shown at Fig. 1 E, the material 120a of vaporization can be perpendicular to the surperficial 107a(of material 118a to be vaporized, perpendicular to target surface 107a) diffusion.According to different embodiments, the material 120a of vaporization can be along direction 105 diffusions, wherein, the material 120a of vaporization can be deposited on matrix, this matrix can be arranged in the 122a of region, when the material 120a making in vaporization for example spreads along direction 105 substantially, the material 120a of vaporization can clash into matrix.According to different embodiments, the material 120a of vaporization can limit deposition region 122a and/or vapor diffusion region 120a.
Be similar to the explanatory view in Fig. 1 E, electron beam-vapourizing unit 100 can arrange in this wise,, each electron beam 112a, 112b clashes into material 118a to be vaporized, the surperficial 107a of 118b, 107b, wherein, material 118a to be vaporized, the surperficial 107a of 118b, 107b and each incident beam 112a, angle 107 between 112b is right angle substantially, as shown at Fig. 1 F.Because clash into material 118a to be vaporized, each surperficial 107a of 118b, the electron beam 112a of 107b, 112b can configure independently of each other, as the described herein, treat evaporation of materials 118a for these two, the efficiency of electron beam-vaporization of 118b can be best or simultaneously optimised simultaneously.In addition,, for two electron beam source 102a, 102b can select power independently of each other, be corresponding target approach material 118a, heat energy in 118b, makes for each target material 118a, and the treatment condition of the vaporization of 118b can be best simultaneously or can be simultaneously optimised.Container 108a, the different material 118a to be vaporized in 108b, 118b for example can have different vaporization energy, and it for example needs thus, the corresponding target material 118a that vaporizes, each electron beam 102a of 118b, the power of 102b should be mated.
According to different embodiments, dividing plate 114 can be disposed in two region 114a, between 114b.In addition, dividing plate 114 for example can affect the target material 120a of vaporization, the deposition of 120b.Dividing plate 114 for example can limit the material 120a of each vaporization, the diffusion of 120b on the definite area of matrix.According to different embodiments, the position of dividing plate, shape and size can be coupling or mated, make can or improve and there is being deposited upon on matrix of material-gradient.
According to different embodiments, can use dividing plate 114 to be limited to the passage of target material, make to be necessary that, first object material 118a vaporizes by the first electron beam source 102a in the 114a of first area, and the second target material 118b correspondingly vaporizes by the second electron beam source 102b in second area 114b.
According to different embodiments, first area 114a can be symmetrical in second area 114b and build.In addition, magnetic field 110a, 110b can be mutually relatively directed.
Fig. 2 A and Fig. 2 B illustrate the electron beam-vapourizing unit 100 according to different embodiments with detailed schematic, are vertical view in Fig. 2 A, and in Fig. 2 B, are side-view or cross-sectional view.
Be similar to previously described, at electron beam-vapourizing unit 100 shown in Fig. 2 A, wherein, electron beam-vapourizing unit 100 can have: the first electron beam source 102a and the second electron beam source 102b, electron beam source 102a wherein, 102b can have respectively deflection system 202a, 202b; The first container 108a, and can there is the first material 118a to be vaporized, and second container 108b, and can there is the second material 118b to be vaporized; The first electron beam 112a, it can produce by means of the first electron beam source 102a, and can in the direction of the first material 118a to be vaporized, be deflected by means of the first deflection system 202a, and the second electron beam 112b, it can produce by means of the second electron beam source 102b, and can in the direction of the second material 118b to be vaporized, be deflected by means of the second deflection system 202b; The first steering structure 104a, it can produce at least one first magnetic field, make the first electron beam 112a because the first field region is diverted into the surface of the first material 118a to be vaporized, and the second steering structure 104b, it can produce at least one second magnetic field, make the second electron beam 112b because the second field region is diverted into the surface of the second material 118b to be vaporized, wherein, the first steering structure 104a and the second steering structure 104b can be by means of magnetic conductor 206 magnetic couplings in each side.
According to different embodiments, deflection system 202a, 202b can be electronic deflecting system, for example, based on charged plates, electron beam can be deflected by means of electrostatic force.
According to other embodiment, deflection system 202a, 202b can be bending magnet system, for example, based on magnetic field, electron beam can be deflected by means of electromagnetic force.
In addition, deflection system 202a, 202b can be also electromagnetic deflection system, maybe can have electro-magnetic deflection unit.
According to different embodiments, as shown at Fig. 2 A, steering structure 104a, 104b can have at least four coils, makes can produce the first and second field regions on the surface of material to be vaporized.According to different embodiments, steering structure 104a, 104b can be connected with Controlling System or regulation system, the setting that makes the magnetic field of corresponding generation can mate the parts in electron beam-vapourizing unit 100.In addition, steering structure 104a, 104b can mate container 108a in its spatial arrangement, the position of 108b, or steering structure 104a, 104b can have station-keeping system (not shown), make steering structure 104a, the spatial arrangement of 104b can be mated container 108a, the position of 108b.To this, described position can arrange in this wise, that is, each container 108a, 108b and affiliated steering structure 104a, the relative distance between 104b can be identical.In other words, for steering structure 104a, the location of 104b, for example, can consider target 118a, and the height of 118b is different.
According to different embodiments, by means of by steering structure 104a, the intensity in the magnetic field that 104b produces can change, arranges or mate electron beam 112a, and 112b is at material 118a to be vaporized, the lip-deep impact point of 118b.At this, electron beam 112a for example, 112b is at material 118a to be vaporized, and the lip-deep impact point of 118b can be parallel to direction 101 and be passed.
In addition, electron beam 112a, 112b is at material 118a to be vaporized, and the lip-deep impact point of 118b can be by means of deflection system 202a, and 202b is changed, arranges or mates.At this, electron beam 112a, 112b is at material 118a to be vaporized, and the lip-deep impact point of 118b for example can be parallel to direction 101 and/or be parallel to direction 103 and is passed.
According to different embodiments, deflection system 202a, 202b can be at material 118a to be vaporized, the pattern guiding electron beam 112a to determine on the surface of 118b, 112b.In addition, deflection changes in time fast, makes electron beam 112a, and 112b for example heats at material 118a to be vaporized, the surperficial different zones of 118b, and the material of vaporizing in this region at this.In other words, electron beam 112a, 112b is by means of deflection system 202a, and 202b is at material 118a to be vaporized, vapour source of lip-deep desired region generating or a plurality of vapour source of 118b.At this, the quantity of vapour source and/or each form can be mated each coating process.For example can be respectively at material 118a to be vaporized, on the surface of 118b, along direction 103, produce a plurality of vapour sources, make for example can on whole width, realize uniform coating (for example extension in direction 103 of the width of matrix of matrix, wherein, matrix can pass through container 108a, 108b is directed, as shown in fig. 2B).
In context, as described herein, steering structure 104a, 104b for example can be used for turning in this wise electron beam 212a, 212b, that is, and electron beam 212a, 212b collides material 118a to be vaporized with favourable angle 107 respectively, the surface of 118b, for example angle is in the scope of about 90 ° to 55 °, and for example angle is in the scope of about 90 ° to 70 °, for example angle is in the scope of about 90 ° to 85 °, and for example angle is in the scope of about 90 °.At this, due to electron beam and material 118a to be vaporized, the interaction of 118b, the angle of about 90 ° is for coating process or for target material 118a, and the vaporization of 118b can be most effective.At this, as has been described, the first electron beam 112a and the second electron beam 112b can arrange independently of each other, arrange, mate and/or optimize.
According to different embodiments, electron beam-vapourizing unit 100 can arrange in this wise, that is, the first electron beam 112a is not diverted into the second material 118b to be vaporized, and the second electron beam 112b is not diverted into the first material 118a to be vaporized.Thus, make for example can on each surface of material to be vaporized, effectively and independently produce vapour source.
According to different embodiments, electron beam-vapourizing unit 100 can arrange in this wise, that is, container is mounted at various height and goes up, or be positioned on different height, wherein, each electron beam 112a, 112b can vaporize best at container 108a, the material 118a corresponding to be vaporized in 108b, 118b.
According to different embodiments, the first steering structure 104a and the second steering structure 104b can be by means of yokes, for example, by means of iron yoke, magnetic couplings.
According to different embodiments, container 108a, the position of 108b can change at about several millimeters to the scope of 1m, for example, by means of station-keeping system.
As shown in fig. 2B, due to steering structure 104a, 104b, electron beam 112a, 112b can be made vaporizer 118a by lateral arrangement, and the distance variable between 118b and matrix 220 is little, or may be selected to enough little.Thus, the efficiency of vaporescence (material of vaporization and the ratio that is deposited on the material on matrix) for example can improve.
According to different embodiments, electron beam-vapourizing unit 100 can be disposed in vacuum processing chamber, or at the indoor use (not shown) of vacuum-treat.
Due to the described setting of electron beam-vapourizing unit 100, it can be disposed in coating device or use.According to different embodiments, layer can be deposited on matrix 220 by means of electron beam-vapourizing unit 100, and wherein, this layer can have material-gradient.In addition, coating device can have at least one conveyer 222, for transporting matrix 220.Matrix 220 on electron beam-vapourizing unit 100 for example can betransported by means of conveyer 222, wherein, the coatingsurface for the treatment of of matrix 220 can be shown in the direction of electron beam-vapourizing unit 100.
In addition, matrix 220 can betransported by means of conveyer 222 at least in part on electron beam-vapourizing unit 100, wherein, the coatingsurface for the treatment of of matrix 220 can be shown in the direction of electron beam-vapourizing unit 100.
According to different embodiments, container 108a, 108b can move along direction 101, and for example quiveringly 224.This for example can cause, material 118a to be vaporized, and 118 can evenly be vaporized.
According to different embodiments, parts (the electron beam source of electron beam-vapourizing unit 100 described herein, container, steering structure) layout can change aspect a plurality of parameters and position, wherein, two electron beams can be diverted into each surface of material to be vaporized substantially independently of each other, can produce thus advantage or the effect of corresponding description.
According to different embodiments, steering structure 104a, 104b can produce magnetic and turn to field, and wherein, magnetic turns to field can have effective field region, makes electron beam 112a, and 112b can be diverted into each vaporizer 118a by means of effective field region, on the surface of 118b.According to different embodiments, the magnetic gamma flux density in effective field region is in the scope of the extremely about 1T of about 0.1mT.
According to different embodiments, electron beam 112a, 112b can, by means of turning to magnetic field at vaporization crucible 108a, turn to downwards in the direction of 108b.
According to different embodiments, electron beam or electron beam 112a, 112b can have electronics, and it is accelerated to the acceleration voltage of about 60kV by about 30kV.Also referred to as the electron beam source 102a of electron beam gun, 102b can have the power in the scope of the extremely about 300kW of about 10kW.
According to different embodiments, container or container 108a, 108b can have the length in the scope of about several centimetres of extremely about 2m, for example, have length in the scope of the extremely about 2m of about 1m, for example, have in the length being greater than within the scope of 1.5m.In addition, container or container 108a, 108b can have the extremely approximately width of 1m of about 0.1m, has for example width in the scope of the extremely about 1m of about 0.5m, has for example width in the scope of about 70cm.In addition, container or container 108a, 108b can have about 5cm to the degree of depth of about 30m, for example, have the degree of depth in the extremely about 20cm scope of about 15cm.
According to different embodiments, container or container 108a, 108b(or crucible, or vaporization crucible) can water-cooled.In addition container or container 108a, 108b(or crucible, or vaporization crucible) can there is copper or be formed by copper.In addition container or container 108a, 108b(or crucible, or vaporization crucible) can there is graphite or be formed by graphite.According to different embodiments, vaporization crucible 108a, 108b can be so-called cold crucible or so-called hot crucible.
According to different embodiments, target (for example container 108a, 108b and vaporizer 118a, 118b) can have round shape, or for example has other shapes, as Polygons.
According to different embodiments, electron beam 112a, 112b can be by means of each deflection system 202a, 202b and/or by means of each steering structure 104a, 104b is controlled or is regulated.
According to different embodiments, vaporization crucible 108a, 108b can change on height location, makes for example can change vaporization crucible 108a, the distance 205(between 108b and matrix 220 is for example referring to Fig. 2 B).
According to different embodiments, electron beam-vapourizing unit 100 can arrange in this wise, that is, at least one in following material can be deposited on suitable matrix by means of electron beam-vapourizing unit 100: metal alloy, cermet coating, Al/Si-alloy (for example, dorsal part contact part for solar cell), gradient layer, molybdenum-oxide compound gradient layer, niobium-oxide compound gradient layer, tantalum carbide and tungsten carbide.Correspondingly, material 118a to be vaporized, 118b for example can have at least one of following material or consist of it: metal oxide, aluminum oxide, Zirconium oxide (zirconium dioxide), metallic compound, metal, niobium, molybdenum, titanium, cobalt, zircon, chromium, tantalum, tungsten, graphite, carbon compound, oxygen compound and nitrogen compound.
According to different embodiments, the first material 118a to be vaporized can be stupalith or pottery, and the second material 118b to be vaporized can be metallic substance or metal.According to different embodiments, the first material 118a to be vaporized can have stupalith or pottery; And the second material 118b to be vaporized can have metallic substance or metal.
According to different embodiments, can be deposited on form layers on matrix surface by means of the first and second target materials during vaporizing simultaneously, wherein, this layer can have material gradient.In other words, the layer being formed on matrix can have different chemical constitutions in different layer regions.In addition, first object material 118a can be deposited in the first matrix region, and the second target material 118b can be deposited in the second matrix region, and wherein, between depositional stage, matrix is parallel to direction 101 motions.
According to different embodiments, yoke 206 can be optional, and/or replaced by means of another magnetic conductor, and wherein, yoke 206 can consist of ferromagnetic material, maybe can have ferromagnetic material.In addition, steering structure 104a, 104b can have ferromagnetic material.
According to different embodiments, electron beam 112a, 112b can be by means of deflection system 202a, and 202b point-like ground collides target material, and produces thus vapour source, for example the pattern to limit in advance.
As shown at Fig. 3 A and Fig. 3 B, electron beam 112a, 112b can be by means of electron beam source 102a, the deflection system 202a of 102b, 202b(is under steering structure auxiliary) redirect to the surface of (vaporizer 118a, 118b's) target.The vapour source that produced thus can have shape arbitrarily, and vapour source can be for example linear 302c, circular or round 302a, and oval or long 302b, and/or shape 302d that can be desired arbitrarily provides vapour source.
Fig. 4 illustrates the indicative flowchart for the method for electron beam-vaporization.According to different embodiments, for the method for settled layer on matrix, comprise: at S410, the first electron beam redirect to the first housing region by means of the first magnetic steering structure, can hold at least one first material in this region, and the part of at least one the first material can be vaporized; (for example side by side), in S420, the second electron beam redirect to the second housing region by means of the second magnetic steering structure, can hold at least one second material in this region, and the part of at least one the second material can be vaporized; And in S430, at least one first material and at least one second deposition of material are on matrix; Wherein, the first steering structure and the second steering structure magnetic couplings mutually.
According to different embodiments, turn to and the turning to of the second electron beam of the first electron beam turns to when can have respectively from two electron beams of two electron beam sources.
According to different embodiments, in the coating device for the manufacture of material-gradient, treat the matrix 220 and each vaporizer 108a of coating, (the comparison diagram 2B) that the distance between the surface of 108b is little because electron beam-vapourizing unit 100 described herein is selected to.According to different embodiments, this distance can be in the scope of the extremely about 2m of about 0.2m, for example, in the scope of the extremely about 1.5m of about 0.4m, for example, in the scope of the extremely about 1.2m of about 0.5m.
According to different embodiments, matrix 220 and target 118a, the distance 205 between the lip-deep corresponding vapour source of 118b can affect the layer growth on matrix.Less distance 205 for example can cause, and on matrix 220, the layer of growth can have higher density and/or larger granularity.In addition, other characteristics of the layer depositing on matrix also can change, for example chemical constitution or surfaceness.
In addition, less distance can cause, and the speed of growth of the layer depositing on matrix becomes large, for example also can reduce process costs thus.
According to different embodiments, the parts of electron beam-vapourizing unit 100 can be fixedly arranged, container 108a, 108b and steering structure 104a, 104b(or dividing plate) for example can arrange statically (for example mating each coating process).According to other embodiment, the parts of electron beam-vapourizing unit 100 movably (for example can positioningly) are arranged, container 108a, 108b and steering structure 104a, 104b(or dividing plate) for example can positioningly arrange, wherein, each coating process is for example dynamically mated in position during coating.
According to different embodiments, dividing plate can be arranged between two vaporization crucibles, the deposition of the material that makes to affect vaporization on matrix.In addition, use dividing plate can be conducive to form gradient layer, for example by body portion by means of dividing plate, be blocked, make correspondingly to limit the region on matrix, material of each vaporization can collide this region.
According to different embodiments, material to be vaporized also can be described as vaporizer at this.In addition, container also can be described as vaporization crucible at this.Electron beam source can be for example electron beam gun, and wherein, the electronics conventionally accelerating leaves electron beam source, as electron beam.In addition, electron beam source can have at least one deflection system, makes electron beam under definite angle, along the direction limiting in advance, to leave electron beam source.
According to different embodiments, the magnetic field being produced by steering structure respectively can be inhomogeneous, makes the only part (or the region in the magnetic field producing) in produced magnetic field for example applicable to turning to electron beam.In other words, each magnetic field can have effective field region, and wherein, this effective field region in magnetic field only arranges in this wise, that is, electron beam is correspondingly diverted.
According to different embodiments, the magnetic field being produced by steering structure respectively can produce by means of one or more coils, and wherein, the magnetic field of coil is controlled or is conditioned or be set up by means of electric current.Correspondingly, can produce desired magnetic field by means of regulating or controlling electric current, wherein, magnetic field for example can be depending at least one of following parameter: strength of current and the timing relationship of the electric current by each coil, the geometrical shape of coil, the mutual magnetic couplings of the mutual layout of coil and/or for example coil.
According to different embodiments, as described in this article, can provide electron beam-bis-crucible vapourizing units with bundle guide portion, making to merge vaporization or adulterate vaporization for example can be advantageously as gradient-vaporization.
According to different embodiments, during electron beam-vaporization or electron beam-vaporescence, can be by means of using at least two separate electron beam devices be controlled independently of each other or regulate from the vaporization of the single component of each container, make the vaporization of single component can be as well as possible and mate simply desired vaporescence.
According to different embodiments, magnetic steering can turn to coil to form by four, and referring to Fig. 2 A, making becomes possibility for the electron beam incident structure of two relative electron beam guns.Magnetic steering for example can produce level Four magnetic field and arrange, wherein, first-phase produces the first territory, place to magnetic pole, this region can redirect to the first electron beam the first container (crucible), and second-phase can produce the second territory, place to magnetic pole, this region can redirect to the second electron beam second container (crucible).In order for example to reduce the controlling field of dorsal part, the coil utmost point of adjacent coil by means of magneticsubstance (for example, by means of magnetic yoke) mutually magnetic connect or short circuit, for example, by means of iron yoke that can connecting coil core.
According to different embodiments, magnetic steering 104a, 104b can turn to coil to form by two.In addition, corresponding magnetic pole also can be realized by means of corresponding yoke.
According to different embodiments, also can provide steering structure 104a, 104b is as public steering structure.In other words, steering structure 104a, 104b must not have single steering structure, as seen at this.According to different embodiments, the second magnetic pole of the first magnetic pole of the first steering structure 104a and the second steering structure 104 can be respectively by means of an only coil formation, wherein, this coil magneticsubstance that can be coupled, makes magneticsubstance (for example iron yoke) that each magnetic pole can be provided.
According to different embodiments, container 108a, 108b also can intercouple.In other words, can provide a plurality of crucibles as crucible system.
According to different embodiments, electron beam-vapourizing unit can be provided in this wise,, make the translation of crucible system on matrix transporting direction alternating motion slowly 224 become possibility, make the larger surf zone of material to be vaporized can be used for electron beam-vaporization, as seen in Fig. 2 B.
According to different embodiments, the crucible region of differing materials composition can prevent mutual crossed contamination by means of baffle arrangement 114.Baffle arrangement 114 for example can be used for the gradient-variation of impact in the layer being deposited.In addition, baffle arrangement can altitude mixture control (along direction 105) and/or can position adjustments (along direction 101 and/or direction 103).In other words, the distance between baffle arrangement and each container (or vaporization crucible) can arrange.In addition, the distance between baffle arrangement 114 and lip-deep each vapour source of material to be vaporized can arrange.
According to different embodiments, the container of each material composition can consist of two or more part containers, maybe can have two or more part containers.In this modification, the electron beam in spray Shu Fangfa (Springstrahlverfahren) can be for example by means of producing the source vaporize of matching coating in each of deflection beam entering part crucible fast.
In addition, for manifold part crucible, arrange, wherein at least one container can have two or more part containers, and these part crucibles are filled by different materials, thus extra (for example while) at least one other materials composition of vaporizing.
According to different embodiments, container can not have identical height location with respect to matrix, and is correspondingly provided for optimizing single-coating rate and gradient.In addition the magnetic coil that, belongs to each process points is to having each other and the position different with respect to process points.Under these circumstances, tiltably arrange that yoke connects.
According to different embodiments, the symmetry of the processing structure shown in Fig. 2 A and/or Fig. 2 B be not force necessary.In addition, along with the filling face height reduction of crucible, vaporizer surface can be mated in this wise by crucible altitude mixture control, that is, sputter distance can keep constant, and also can make thus the geometric proportion that is used to form concentration gradient keep constant.
According to different embodiments, container 108a, 108b can neighboringly arrange mutually.
According to different embodiments, in gradient layer or for example, in having the layer of material-gradient, the chemical composition of layer material can change along at least one direction.According to different embodiments, the bed thickness of the material of deposition can keep constant at this.
According to different embodiments, can by means of electron beam, on target material, produce vapour source, wherein, different vapour sources can be distributed in large region, and two vapour sources for example can have mutual spacing in the region of the extremely about 2m of about 0.5m.Therefore, by means of electron beam-vapourizing unit 100 described here, wide matrix (having the width in the region of the extremely about 2m of about 0.5m) can be coated, and this layer can have high bed thickness stability and/or stability of concentration.
According to different embodiments, can be provided for method or the device of many crucible vaporizations (for example two crucible vaporizations), wherein, each material composition can be arranged in respectively and vaporize in crucible, and wherein, vaporization crucible can independently be controlled and/or regulate.Due to set a distance really between each vapour source, for deposition of material and/or for form layers can, there is concentration gradient (or amount-concentration gradient).This concentration gradient in the layer being deposited can be designed to bear due to corresponding sputter geometry.In addition, can strive for reaching the concentration gradient in the layer being deposited, for example, can be used for forming cermet coating.
According to different embodiments, for electron beam vaporization, can improve steam rate of utilization, its mode is to make the distance between matrix and vapour source on the surface of vaporizer, can be set to little.To this, magnetic steering structure can be arranged for generation static magnetic field in this wise,, can in vaporous environment, realize the respective guide to electron beam that is.Thus, can be at vapour source and treat to realize between the matrix of coating bundle incident and the bundle guiding of two electron beams, wherein, electron beam can be kept away from matrix, and can realize the inclined impact angle of two electron beams on target surface simultaneously.For example this setting can be used for, and to wide basal body coating layer, wherein, can utilize the electron beam of two quick deflections to produce perpendicular to and be symmetrical in the middle vapour source of matrix stream.
According to different embodiments, for the big area coating with large coating width, electron beam-vapourizing unit described here is applicable to produce the vapour source distribution of two expansions on two crucibles, makes on the whole width of matrix, to realize high bed thickness stability and/or stability of concentration.
According to different embodiments, the direction of electron beam (electron beam comes from the radiation direction of electron source) can by means of deflection system approximately-60 ° to deflection or change in the approximately+angular range of 60 °.At this, electron beam for example can be deflected along direction 103, as shown at Fig. 2 A, the width (vaporizer 118a, 118b is along the expansion of direction 103) of vaporizer can be utilized better.In addition, can on the whole width (matrix is along the expansion of direction 103) of matrix, realize large-area coating thus.
According to different embodiments, the first housing region can have for holding the first container of the first material; And/or second housing region can have for holding the second container of the second material.
According to different embodiments, the first magnetic field producing by means of the first magnetic steering structure is nearer than the second magnetic field producing by means of the second steering structure apart from the first electron beam source; And the second magnetic field producing by means of the second magnetic field steering structure is nearer than the first magnetic field producing by means of the first magnetic steering structure apart from the second electron beam source.In addition, the first magnetic field can turn to the first electron beam at this, and the second magnetic field can turn to the second electron beam.
According to different embodiments, turning to of each electron beam is understood to, and from the electron beam of inceptive direction, is diverted into target, container, housing region and/or vaporizer.In addition, electron beam can correspondingly not collide target, container, housing region and/or vaporizer before turning to.
According to different embodiments, the first magnetic steering structure and the second magnetic steering structure can have respectively two coils, and wherein, the first coil of steering structure and the second coil are arranged on the opposite side of cell therefor, for example, compare Figure 1A.
According to different embodiments, magnetic steering structure can not be coupled or mechanical connection with each container.
According to different embodiments, in the situation that there is no container, target material or vaporizer can be arranged in corresponding housing region, for example in the following cases, that is, do not use pulverous target material or pulverous vaporizer.
According to different embodiments, magnetic field described here towards relating to electron beam-vapourizing unit, and for example do not relate to electron beam, or do not relate to self propagation direction of electron beam.
According to different embodiments, can be by means of crucible height, by means of dividing plate, and/or enter and affect the gradient of gradient layer characteristic by means of the power of electron beam target approach material.
According to different embodiments, the acting in conjunction of deflection system and steering structure can realize has high bed thickness homogeneity and the big area coating of high steam utilization.In addition, the interior deflector system of electron beam gun makes to produce the wide source region for big area coating.According to different embodiments, magnetic steering structure can be so that sputter distance be less.In addition, crucible arranges not to be symmetrical.For example, crucible is arranged and can be had the combination that larger and less crucible forms.According to different embodiments, during movable (Kampagne), can carry out the distance correction between crucible and matrix, make the position of each vapour source for example to keep constant, wherein, the coating parameter for gradient layer can remain unchanged thus.According to different embodiments, being arranged in of electron beam-vapourizing unit for example can make the less possibility that becomes of distance between crucible and matrix under coating area.In addition, this for example can make material have better utilised rate.
According to different embodiments, gas inlet can be integrated in crucible layout.At this, for example the first crucible, the second crucible and gas inlet can be arranged in corresponding housing region.In addition, the first crucible for example can have first object material at this, and for example Mo, and the second crucible can have the second target material, for example aluminum oxide (or Al
2o
3), and oxygen can for example enter by means of gas inlet, makes to deposit Mo/MoAl
xo
y/ Al
2o
3gradient layer.According to different embodiments, can additionally in vaporizer, provide process gas, for example oxygen.
According to different embodiments, by matrix transportation coating area or in coating area, can realize to same straight line.In addition, matrix can pass through cylinder at coating area, and for example logical overcooled conveying drum transports, and making matrix motion is circular substantially, or on circuit orbit, realizes at least in part.
According to different embodiments, the magnetic couplings between the first steering structure and the second steering structure can realize by means of magnetic conductor, for example, by means of the structure with magnetic or magnetisable material.In addition, magnetic couplings can be regarded as contiguous effect.
For example can realize magnetic couplings by means of yoke or iron yoke, make to produce thus the mandatory guidance to magnetic.
According to different embodiments, the target material of vaporization can produce vapor diffusion region, occurs coated areas in making for example near matrix.Coated areas, deposition region and/or coating area for example also can extend along crooked face.
As the described herein, twin coil steering structure can be for example the assembly of coating device (electron beam vaporization device), wherein, and magnetic steering, crucible system and electron beam device can be respectively the separated parts of this device, and it can mutually be coordinated best in geometrical shape.At this, for example, can, under the help of the deflection system of electron beam device, on the vaporizer of crucible with larger surface, produce the source pattern of a plurality of surface expansions.This for example can be used for or is used in big area coating.In addition because can not being independent of miscellaneous part by magnet system around, crucible, crucible selects in this wise aspect big or small at it,,, material preservation is for example enough for for a long time coating behavior, and crucible for example also can stand suitable crucible motion, smooth to be used in uniform planar.
Magnetic cluster for example turns to and can be used for, flat fire electron beam under matrix transportation region, and electron beam is redirect to vaporizer as far as possible obliquely.For example on the one hand big area vaporization thus, and on the other hand with little sputter apart from coating, make it possible to achieve high steam utilization.Can improve as follows the bed thickness accuracy during depositing treatment.By device described here, can realize with respect to electron beam and inject symmetrical source distribution and collision angle distributes.For example can or not provide this symmetry for used magnetic inclination (Magnetfalle) for the oblique incidence of electron beam.
The carburetion system (coating device) with twin coil-steering can be vaporized from the bi-material of two crucibles by means of two electron beam devices, wherein, for example can realize following aspect: little sputter distance, the large two dimensional source surface range of vapour source (for example also can produce a plurality of vapour sources by rifle respectively at this), the open architecture of magnetic system and the spatial arrangement (parts that for example separate with crucible, it does not limit crucible size), the vaporization crucible with large two-dimensional swelling surface, the adjustment possibility of crucible, power distribute and vapour density distribute the symmetry horizontal with respect to the matrix for the treatment of coating, wherein, it uses region to relate to fusion vaporization, gradient cladding and/or doping.
By the yoke for mandatory guidance magnetic field, the coil of magnetic couplings is to realizing electron beam vaporization by means of relatively opposed electron beam source.In addition, magnetic coil be to for example arranging one by one along the wire between electron beam gun (along matrix transporting direction), and wherein, each coil is to being disposed in the opposite of matrix stream opposite and vaporization crucible, with respect to the identical plane of symmetry and symmetry.
Claims (21)
1. an electron beam-vapourizing unit (100), has:
The first electron beam source (102a), is provided for providing the first electron beam (112a);
The second electron beam source (102b), is provided for providing the second electron beam (112b);
The first housing region (106a), for holding at least one first material (118a);
The second housing region (106b), for holding at least one second material (118b);
The first magnetic steering structure (104a), is provided for the first electron beam (112a) to redirect to the first housing region (106a); And
The second magnetic steering structure (104b), is provided for the second electron beam (112b) to redirect to the second housing region (106b);
Wherein, the mutual magnetic couplings of the first steering structure (104a) and the second steering structure (104b).
2. electron beam-vapourizing unit according to claim 1, wherein, the first steering structure (104a) and the second steering structure (104b) are by means of magnetic couplings structure (204) magnetic couplings mutually.
3. electron beam-vapourizing unit according to claim 1, wherein, the first electron beam source (102a) and/or the second electron beam source (102b) have electron beam gun.
4. electron beam-vapourizing unit according to claim 1, wherein, the first housing region (106a) and the second housing region (106b) are disposed between the first electron beam source (102a) and the second electron beam source (102b).
5. electron beam-vapourizing unit according to claim 1,
Wherein, the first housing region (106a) has at least one first container (108a), for holding at least one first material (118a); And/or
Wherein, the second housing region (106b) has at least one second container (108b), for holding at least one second material (118b).
6. electron beam-vapourizing unit according to claim 1,
Wherein, at least one first material (118a) is contained in the first housing region (106a); And
Wherein, at least one second material (118b) is contained in the second housing region (106b).
7. electron beam-vapourizing unit according to claim 1,
Wherein, at least one first material (118a) and at least one the second material (118b) are different materials.
8. electron beam-vapourizing unit according to claim 1,
Wherein, the first housing region (106a) is nearer apart from the first electron beam source (102a) than the second housing region (106b); And
Wherein, the second housing region (106b) is nearer apart from the second electron beam source (102b) than the first housing region (106a).
9. electron beam-vapourizing unit according to claim 1,
Wherein, the first magnetic steering structure (104a) and/or the second magnetic steering structure (104b) have magnet arrangement and/or coil layout.
10. electron beam-vapourizing unit according to claim 9,
Wherein, the first magnetic steering structure (104a) has the first magnet and/or the first coil;
Wherein, the second magnetic steering structure (104b) has the second magnet and/or the second coil.
11. electron beam-vapourizing units according to claim 9,
Wherein, magnet arrangement and/or coil are arranged in this wise and are arranged, that is, turn to the first magnetic field of the first electron beam (112a) and turn to the second magnetic field of the second electron beam (112b) mutually relatively directed.
12. electron beam-vapourizing units according to claim 1,
Wherein, the first steering structure (104a) and the second steering structure (104b) are by means of the mutual magnetic couplings of at least one yoke (204).
13. 1 kinds of coating devices, have:
Vacuum chamber; And
Be arranged in the electron beam-vapourizing unit (100) in vacuum chamber, for making, at the coating area gradient layer of vacuum chamber, be deposited on matrix, wherein, electron beam-vapourizing unit (100) has in addition:
The first electron beam source (102a), is provided for providing the first electron beam (112a);
The second electron beam source (102b), is provided for providing the second electron beam (112b);
The first housing region (106a), for holding at least one first material (118a);
The second housing region (106b), for holding at least one second material (118b);
The first magnetic steering structure (104a), is provided for the first electron beam (112a) to redirect to the first housing region (106a); And
The second magnetic steering structure (104b), is provided for the second electron beam (112b) to redirect to the second housing region (106b);
Wherein, the mutual magnetic couplings of the first steering structure (104a) and the second steering structure (104b).
14. coating devices according to claim 13, have in addition:
Conveyer, passes through coating area for transporting matrix.
15. coating devices according to claim 13,
Wherein, electron beam-vapourizing unit (100) is arranged under coating area at least in part.
16. coating devices according to claim 13,
Wherein, electron beam-vapourizing unit (100) is arranged under the deposition region in coating area completely.
17. 1 kinds for making to be deposited upon the method on matrix at vacuum chamber, wherein, the method comprises:
By means of the first magnetic steering structure (104a), the first electron beam (112a) is redirect to the first housing region (106a), in this region, hold at least one first material (118a), make the part vaporization of at least one the first material (118a);
By means of the second magnetic steering structure (104b), the second electron beam (102b) is redirect to the second housing region (106b), in this region, hold at least one second material (118b), make the part vaporization of at least one the second material (118b);
In the coating area of vacuum chamber, at least one first material (118a) and at least one the second material (118b) are deposited on matrix;
Wherein, the mutual magnetic couplings of the first magnetic steering structure (104a) and the second magnetic steering structure (104b).
18. methods according to claim 17, comprise in addition:
Transportation matrix is by the coating area of vacuum chamber.
19. methods according to claim 17,
Wherein, at least one first material (118a) and at least one the second material (118b) are had to material-gradient deposition on matrix.
20. methods according to claim 17,
Wherein, the material of at least one first material (118a) and at least one the second material (118b) has aluminium, and another material of at least one first material (118a) and at least one the second material (118b) has silicon.
21. methods according to claim 17,
Wherein, on band shape matrix or endless matrix, realize the deposition of at least one first material (118a) and at least one the second material (118b).
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|---|---|---|---|
| DE102013104086.1 | 2013-04-23 | ||
| DE102013104086.1A DE102013104086B3 (en) | 2013-04-23 | 2013-04-23 | Electron beam evaporation assembly and method of electron beam evaporation |
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| Publication Number | Publication Date |
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| CN104120387A true CN104120387A (en) | 2014-10-29 |
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| DE (1) | DE102013104086B3 (en) |
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| DE102017103746A1 (en) | 2017-02-23 | 2018-08-23 | VON ARDENNE Asset GmbH & Co. KG | Electron beam evaporator, coating apparatus and coating method |
| DE102018131904A1 (en) * | 2018-12-12 | 2020-06-18 | VON ARDENNE Asset GmbH & Co. KG | Evaporation arrangement and method |
| DE102020112220B9 (en) | 2020-05-06 | 2022-05-25 | Carl Zeiss Microscopy Gmbh | Particle beam device for removing at least one material from a material unit and arranging the material on an object |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3467057A (en) * | 1966-07-27 | 1969-09-16 | Hitachi Ltd | Electron beam evaporator |
| US3777704A (en) * | 1971-02-09 | 1973-12-11 | Bekaert Sa Nv | Apparatus for vaporizing metal on a substratum |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19523529A1 (en) * | 1995-06-28 | 1997-01-02 | Fraunhofer Ges Forschung | Appts. for high-rate electron-beam vapour coating of wide substrates |
| DE102010029690A1 (en) * | 2010-06-03 | 2011-12-08 | 44Solar S.A.R.L. | Control and / or regulating device, control route, computer program, computer-readable storage medium and method of downloading the computer program |
-
2013
- 2013-04-23 DE DE102013104086.1A patent/DE102013104086B3/en not_active Expired - Fee Related
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3467057A (en) * | 1966-07-27 | 1969-09-16 | Hitachi Ltd | Electron beam evaporator |
| US3777704A (en) * | 1971-02-09 | 1973-12-11 | Bekaert Sa Nv | Apparatus for vaporizing metal on a substratum |
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