The preparation method of magnesium silicon on silicon nano wire composite thermoelectric material
Technical field
The preparation method of magnesium silicon on silicon nano wire composite thermoelectric material, belong to semi-conductor thermoelectric material preparation field, specifically utilize chemical etching method to prepare silicon nanowires, realize that silicon nanowires is peeled off and synchronize evenly mixing with the silica-based powder of magnesium through sonic oscillation, prepare the technical scheme of magnesium silicon on silicon nano wire composite thermoelectric material through electric field assisted sintering.
Background technology
Thermoelectric material is to utilize thermoelectric effect (thermoelectric effect) to realize a class functional material of mutually changing between electric energy and heat energy.Thermoelectricity conversion using be the charge carrier of solid interior, the application device that therefore utilizes thermoelectric material to make have be easy to control, reliability is high; Movement-less part, the advantages such as noiseless, at solar power generation, the application in the fields such as used heat recycling and military aviation has obvious advantage.The performance of thermoelectric material characterizes ZT=S with dimensionless thermoelectric figure of merit ZT
2σ T/ κ, wherein S is that Seebeck coefficient, σ are that conductivity, κ are thermal conductivity.ZT value is higher, and conversion efficiency of thermoelectric is higher.A kind of good thermoelectric material should have high conductivity and low thermal conductivity.
Low-dimensional nano structure utilizes quantum limitation effect to improve near density of electronic states Fermi level by the coordinated regulation of electricity, sound transport property being optimized to thermoelectricity capability, thereby in not reducing conductivity, improves Seebeck coefficient; In not increasing electron scattering, significantly strengthen the scattering process to phonon based on boundary scattering effect, thereby reduce lattice thermal conductivity simultaneously.Novel nano structure thermoelectric material has the material such as one-dimensional nano line and two-dimensional nano film, and wherein silicon nanowires has excellent thermoelectricity capability.Bibliographical information diameter be 50-100nm silicon nanowires at room temperature ZT value be about 1, continue to reduce its diameter, ZT value further increases.
Mg
2si base thermoelectricity material belongs to middle temperature (500K-800K) thermoelectric material, has cheapness, the feature that nontoxic, corrosion-resistant, high temperatures is good, is a kind of new green power material.With Mg
2si is the solid solution of base, and effective mass is large, mobility is large, and lattice thermal conductivity is little, is with a wide range of applications.But simple Mg
2the lattice thermal conductivity of Si is higher, has limited the raising of its thermoelectricity capability.
Summary of the invention
The preparation method's of magnesium silicon on silicon nano wire composite thermoelectric material of the present invention object is: for solving the problem of above-mentioned prior art, open one is utilized silicon nanowires and Mg
2the compound effective reduction matrix thermal conductivity of Si thermoelectric material, improves and optimizes Mg by doping Sb, Bi, La or Ag
2si sill thermoelectricity capability, synchronously realize that silicon nanowires is peeled off and mixing avoids silicon nanowires in composite block material preparation, be wound around and reunite, in later stage electric field assisted sintering process, prepare silicon nanowire distribution evenly and be combined the method for good magnesium silicon on silicon nano wire composite thermoelectric material with matrix, the method technique is simple, rate of finished products is high, the thermoelectricity capability that can effectively improve the silica-based thermoelectric material of magnesium, has important scientific meaning and using value for the exploitation of high performance thermoelectric material.
The preparation method of magnesium silicon on silicon nano wire composite thermoelectric material of the present invention, it is characterized in that one utilizes silicon nanowires and Mg
2the compound effective reduction matrix thermal conductivity of Si thermoelectric material, improves and optimizes Mg by doping Sb, Bi, La or Ag
2si sill thermoelectricity capability, synchronously realize that silicon nanowires is peeled off and mixing avoids silicon nanowires in composite block material preparation, be wound around and reunite, in later stage electric field assisted sintering process, prepare silicon nanowire distribution evenly and be combined the method for good magnesium silicon on silicon nano wire composite thermoelectric material with matrix, the method is to utilize AgNO
3the mixed liquor of solution and HF acid is etching liquid, and on monocrystalline silicon piece, normal temperature etching 3h-4h prepares silicon nanowires, and the silicon chip after etching goes silver to process and cleans rear and purity >99%, granularity≤850 μ mMg
2si powder and X are the ultrasonic mixing of ethanol solution that the element of Sb, Bi, La and Ag is placed in water content < 0.03wt.% simultaneously, mixed solution is drying and processing under the environment of vacuum degree > 0.09MPa, powder after drying is carried out to ball milling, for fear of the pollution in mechanical milling process, adopt ball grinder and the ZrO of polytetrafluoroethylene
2abrading-ball, the powder after ball milling is placed in graphite jig and adopts FAPAS method to sinter block nanometer compound thermal material into, and as shown in Figure 1, concrete steps are as follows for whole process:
1) measure respectively AgNO with graduated cylinder and dropper
3solution and HF acid mix the two and are made into etching liquid 1 in beaker, and twin polishing monocrystalline silicon piece 2 is placed in to etching liquid, etching 3-4h under normal temperature;
2) after the silicon chip after etching goes silver to process in red fuming nitric acid (RFNA), clean 5-10min with distilled water, the beaker that the silicon chip cleaning up 3 is placed in to ethanol solution 4 is for subsequent use, the water content < 0.03wt.% of ethanol solution 4;
3) in vacuum glove box, take the Mg that mole mixture ratio example is 0.96≤x≤0.99
2si powder and Bi powder, form mixed powder 5 and be placed in solution 4;
4) beaker sonic oscillation 20-25min in supersonic wave cleaning machine 6 of solution 4 will be filled, then take out silicon chip, surplus solution 7 is placed in vacuum environment and on temperature control magnetic stirring apparatus 8, carries out magnetic agitation and vacuum drying simultaneously, vacuum degree > 0.09MPa, bake out temperature is 35 DEG C, and the time is 120min.
5) powder after drying is placed in to polytetrafluoroethylene ball grinder ball milling 4h on planetary ball mill, ratio of grinding media to material is 8:1, forms powder 9;
6) powder 9 is placed in to graphite jig 10, in the vacuum FAPAS stove of vacuum degree > 10Pa, rises to 750 DEG C through 15min temperature, insulation 20min, in insulating process, pressure is 60MPa, after insulation finishes, and close current heating, release, sample is cooling with stove.
The beneficial effect that the preparation method of magnesium silicon on silicon nano wire composite thermoelectric material of the present invention has is: the silicon nanowires of peeling off that the silicon chip after etching obtains through sonic oscillation, diameter has reached nanoscale (as shown in Figure 2).Synchronously realize peeling off of silicon line and mixing of powder, efficiently solved the easy agglomeration traits of silicon nanowires, made silicon nanowires can be uniformly distributed (as shown in Figure 3) in matrix.Magnesium silicon on silicon nano wire composite thermoelectric material prepared by the present invention, silicon nanowires can be stored in basis material crystal grain, runs through two to three crystal grain (as shown in Figure 4), has successfully realized the preparation of magnesium silicon on silicon nano wire composite thermoelectric material.The thermal conductivity of magnesium silica-based nanowire composite thermoelectric material is starkly lower than the thermal conductivity (as shown in Figure 5) of magnesium silica-base material.
Brief description of the drawings
Fig. 1 prepares the procedure chart of magnesium silicon on silicon nano wire composite thermoelectric material, in figure
1-etching liquid 2-monocrystalline silicon piece 3-removes the silicon chip 4-ethanol solution 5-Mg after silver cleans
2powder 10-graphite jig after the mixed liquor 8-temperature control magnetic stirring apparatus 9-ball milling of Si powder and Bi powder 6-ultrasonic washing instrument 7-silicon nanowires, powder and absolute ethyl alcohol.
The free silicon nanowires SEM pattern that Fig. 2 utilizes chemical etching method to peel off from silicon chip surface, white box part is single silicon nanowire local magnification region.
Fig. 3 utilizes the silicon nanowires powder shown in Fig. 2 and Bi powder and Mg
2the section SEM figure of magnesium silicon on silicon nano wire composite thermoelectric material prepared by Si powder, brilliant white part is silicon nanowires.
The transmission photo of Fig. 4 magnesium silicon on silicon nano wire composite thermoelectric material, the diffraction spot in figure is corresponding with the silicon nanowires in the region of white box shown in arrow.
The thermal conductivity of magnesium silicon on silicon nano wire composite thermoelectric material prepared by Fig. 5 different technical parameters varies with temperature curve chart.
Embodiment
execution mode 1
Measure respectively the AgNO that 20mL concentration is 0.035mol/L with graduated cylinder and dropper
3the HF acid of solution and 20mL 20 wt.% mixes the two and is made into etching liquid 1 in beaker.The twin polishing p-type monocrystalline silicon piece 2 of 10mm × 10mm is placed in to etching liquid, etching 3h under normal temperature; Silicon chip after etching cleans 5min with distilled water after 40mL concentration is to go silver to process in 60wt.% red fuming nitric acid (RFNA), and the silicon chip cleaning up 3 is placed in and fills 20mL ethanol solution 4(water content < 0.03wt.%) beaker for subsequent use; In vacuum glove box, take 2g mixed powder, wherein Mg
2si powder (purity >99%, granularity≤850 μ m) and Bi powder (purity 99.99%, μ mole mixture ratio example m) in granularity≤75 is 0.99, mixed powder 5 is placed in solution 4; By the beaker that fills solution 4 at supersonic wave cleaning machine 6(model: PS-20) in sonic oscillation 20min, then take out silicon chip, surplus solution 7 is placed in vacuum environment at temperature control magnetic stirring apparatus 8(model: 85-2) on carry out magnetic agitation and vacuum drying simultaneously, vacuum degree > 0.09MPa, bake out temperature is 35 DEG C, and the time is 120min; Powder after drying is placed in to polytetrafluoroethylene ball grinder ball milling 4h on planetary ball mill, and ratio of grinding media to material is 8:1, forms powder 9; Powder 9 is placed in to the graphite jig 10 that diameter is 20mm, in vacuum FAPAS stove, (vacuum degree > 10Pa) rises to 750 DEG C through 15min temperature, insulation 20min, in insulating process, pressure is 60MPa, after insulation finishes, close current heating, release, sample is cooling with stove, obtains buik silicon nano wire composite material.
execution mode 2
Measure respectively the AgNO that 20mL concentration is 0.035mol/L with graduated cylinder and dropper
3the HF acid of solution and 20mL 20 wt.% mixes the two and is made into etching liquid 1 in beaker.The twin polishing p-type monocrystalline silicon piece 2 of 15mm × 20mm is placed in to etching liquid, etching 4h under normal temperature; Silicon chip after etching cleans 10min with distilled water after 40mL concentration is to go silver to process in 60wt.% red fuming nitric acid (RFNA), and the silicon chip cleaning up 3 is placed in and fills 20mL ethanol solution 4(water content < 0.03wt.%) beaker for subsequent use; In vacuum glove box, take 2g mixed powder, wherein Mg
2si powder (purity >99%, granularity≤850 μ m) and Bi powder (purity 99.99%, μ mole mixture ratio example m) in granularity≤75 is 0.99, mixed powder 5 is placed in solution 4; By the beaker that fills solution 4 at supersonic wave cleaning machine 6(model: PS-20) in sonic oscillation 25min, then take out silicon chip, surplus solution 7 is placed in vacuum environment at temperature control magnetic stirring apparatus 8(model: 85-2) on carry out magnetic agitation and vacuum drying simultaneously, vacuum degree > 0.09MPa, bake out temperature is 35 DEG C, and the time is 120min; Powder after drying is placed in to polytetrafluoroethylene ball grinder ball milling 4h on planetary ball mill, and ratio of grinding media to material is 8:1, forms powder 9; Powder 9 is placed in to the graphite jig 10 that diameter is 20mm, in vacuum FAPAS stove, (vacuum degree > 10Pa) rises to 750 DEG C through 15min temperature, insulation 20min, in insulating process, pressure is 60MPa, after insulation finishes, close current heating, release, sample is cooling with stove, obtains buik silicon nano wire composite material.
execution mode 3
Measure respectively the AgNO that 20mL concentration is 0.035mol/L with graduated cylinder and dropper
3the HF acid of solution and 20mL 20 wt.% mixes the two and is made into etching liquid 1 in beaker.The twin polishing N-shaped monocrystalline silicon piece 2 of 10mm × 10mm is placed in to etching liquid, etching 3h under normal temperature; Silicon chip after etching cleans 5min with distilled water after 40mL concentration is to go silver to process in 60wt.% red fuming nitric acid (RFNA), and the silicon chip cleaning up 3 is placed in and fills 20mL ethanol solution 4(water content < 0.03wt.%) beaker for subsequent use; In vacuum glove box, take 2g mixed powder, wherein Mg
2si powder (purity >99%, granularity≤850 μ m) and Bi powder (purity 99.99%, μ mole mixture ratio example m) in granularity≤75 is 0.99, mixed powder 5 is placed in solution 4; By the beaker that fills solution 4 at supersonic wave cleaning machine 6(model: PS-20) in sonic oscillation 20min, then take out silicon chip, surplus solution 7 is placed in vacuum environment at temperature control magnetic stirring apparatus 8(model: 85-2) on carry out magnetic agitation and vacuum drying simultaneously, vacuum degree > 0.09MPa, bake out temperature is 35 DEG C, and the time is 120min; Powder after drying is placed in to polytetrafluoroethylene ball grinder ball milling 4h on planetary ball mill, and ratio of grinding media to material is 8:1, forms powder 9; Powder 9 is placed in to the graphite jig 10 that diameter is 20mm, in vacuum FAPAS stove, (vacuum degree > 10Pa) rises to 750 DEG C through 15min temperature, insulation 20min, in insulating process, pressure is 60MPa, after insulation finishes, close current heating, release, sample is cooling with stove, obtains buik silicon nano wire composite material.
contrast scheme
In magnesium silica-base material, do not add silicon nanowires, other operating process is identical with execution mode 1.
In vacuum glove box, take 2g mixed powder, wherein Mg
2si powder (purity >99%, granularity≤850 μ m) and Bi powder (purity 99.99%, granularity≤75 μ mole mixture ratio example 0.99 m), form mixed powder 5, mixed powder 5 is placed in to polytetrafluoroethylene ball grinder ball milling 4h on planetary ball mill, ratio of grinding media to material is 8:1, forms powder 9; Powder 9 is placed in to the graphite jig 10 that diameter is 20mm, in vacuum FAPAS stove, (vacuum degree > 10Pa) rises to 750 DEG C through 15min temperature, insulation 20min, in insulating process, pressure is 60MPa, after insulation finishes, close current heating, release, sample is cooling with stove, obtains block composite material.